CN105177581A - System for circulating and regenerating waste acidic etching solutions with tail gas treatment function - Google Patents
System for circulating and regenerating waste acidic etching solutions with tail gas treatment function Download PDFInfo
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- CN105177581A CN105177581A CN201510569176.3A CN201510569176A CN105177581A CN 105177581 A CN105177581 A CN 105177581A CN 201510569176 A CN201510569176 A CN 201510569176A CN 105177581 A CN105177581 A CN 105177581A
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Abstract
The invention discloses a system for circulating and regenerating waste acidic etching solutions with a tail gas treatment function. The system comprises an etching solution treatment system and a chlorine gas recycling system, wherein the etching solution treatment system comprises an etching production line (1), a mother solution storage tank (2), an electrolytic tank and a dissolving and absorbing system (6); the electrolytic tank comprises a cathode tank (3) and an anode tank (5); the mother solution storage tank (2), the cathode tank (3), the anode tank (5) and the dissolving and absorbing system (6) are connected with one another in sequence; the etching production line (1) is connected with the mother solution storage tank (2) and the dissolving and absorbing system (6) respectively; the chlorine gas recycling system comprises a gas inlet system (7) and a tail gas treatment system (8); the anode tank (5), a gas washing system (7) and the tail gas treatment system (8) are connected with one another in sequence. The system has the beneficial effects that the system can be used for treating the waste acidic etching solutions, the off-line production can be implemented, the cost can be reduced, the resources can be saved, and the environmental pollution can be avoided.
Description
Technical field
The present invention relates to liquid waste treatment system, particularly a kind of acidic etching waste liquid indirect regeneration with tail gas treating function.
Background technology
Acidic etching liquid is a kind of etching solution made for the making of printed circuit board fine-line, multi-ply wood internal layer.The high speed development of modern electronics industry, board production enterprise rapidly increases, the trade effluent environmental pollution of this type of enterprise is more serious, and content of copper ion is very high in this type of trade effluent, the waste water therefore produced by wiring board manufacturing enterprise, waste liquid cause serious environmental pollution and problem of resource waste be day by day subject to society common concern.In order to avoid waste and protection of the environment, need to carry out recycling to acidic etching liquid.
The regeneration of the old liquid of acid etching is changed into the acidic solution of suitable proportion, transparent and high redox potential mainly through chemistry, electrochemical method, with maintain printed circuit board stable, etch fast.Wherein chemical regeneration is the main method of acid copper chloride etching liquid regeneration, and its principle is by discharging the old liquid of a certain proportion of etching (high specific gravity), adds a certain amount of sub-liquid (low-gravity), or is adding a certain amount of water, regulate the proportion of etching solution.Univalent copper ion is oxidized to bivalent cupric ion by the oxygenant simultaneously in sub-liquid, or adds oxygenant separately, improves etching solution redox potential, thus recovers original performance of etching solution.Common oxygenant has air, oxygen, chlorine, ozone, clorox, sodium chlorate, hydrogen peroxide etc.But total copper constantly increases, the final acidic etching liquid externally getting rid of a part that needs, to maintain certain total copper concentration, not only contaminate environment, also can cause the waste of a large amount of copper and acid; Electrochemical regeneration method is a kind of online renovation process, and output can have the metallic copper of commercial value by electrolysis, but can produce chlorine simultaneously, form the tail gas with pollution, not only contaminate environment also causes waste.
Chinese Patent Application No. is the patent of 201020567155.0, disclose a kind of regeneration system of acid etching liquid containing copper ions, this system be used for online treatment acidic etching liquid, be subject to the restriction of etching line production time, can only with etching line synchronous production, and the emission-control equipment of its internal system, consume the chlorine element of internal system, although achieve environmental protection, cause the waste of resource, make internal system chlorine loss of elements, need extra acid solution of adding to ensure the benefit of etching solution.
Summary of the invention
The object of the invention is to the shortcoming overcoming prior art, a kind of acidic etching waste liquid indirect regeneration with tail gas treating function is provided.
Object of the present invention is achieved through the following technical solutions: a kind of acidic etching waste liquid indirect regeneration with tail gas treating function, comprise etching solution treatment system, the regenerated liquid recycle system, liquid mixing system and chlorine recovery system, etching solution treatment system comprises etching production line, mother liquor hold tank, electrolyzer and solution absorption system, electrolyzer comprises cathode can, film and anode slot, mother liquor hold tank, cathode can, anode slot, solution absorption system is communicated with successively, etching production line respectively with mother liquor hold tank and solution absorption system connectivity, solution absorption system is communicated with etching production line,
Chlorine recovery system comprises scrubber system and exhaust treatment system, and anode slot, scrubber system are communicated with successively with exhaust treatment system.
Described filtering membrane is barrier film, cationic membrane or anionic membrane.
Described cathode can obtains electrolytic copper by electrolysis.
Ionic concn proofing unit is provided with in described electrolyzer.
This described intrasystem device and pipeline all use acidproof, alkaline-resisting, corrosion-resistant material to make.
The present invention has the following advantages:
1. this system is for the treatment of acidic etching waste liquid, the reuse of etching solution reprocessing cycle can be made while extraction metallic copper, realize etching solution process can carry out by off-line, improve processing efficiency, be conducive to making etching and etching solution process reach running balance by reasonably distributing resource, avoid the wasting of resources, realize Sustainable Production;
3. electrolytic chlorine gas can be reclaimed by the present invention, when linking with product line, chlorine goes solution absorption system and cuprous ion to react generation bivalent cupric ion, regeneration etching solution is directly got back to and is produced line recycle, if do not produce line with etching to link, electrolytic chlorine gas can by washing and process further, make chloride price product, contaminate environment, waste resource can be avoided with this, realize chlorine element and water in intrasystem circulation, reduce extra interpolation additive or oxygenant, reduce production cost, save resource.
Accompanying drawing explanation
Fig. 1 is a kind of structural representation with the acidic etching waste liquid indirect regeneration of tail gas treating function;
In figure, 1-etches production line, 2-mother liquor hold tank, 3-cathode can, 4-filtering membrane, 5-anode slot, 6-solution absorption system, 7-scrubber system, 8-exhaust treatment system, 9-electrolytic copper.
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described, and protection scope of the present invention is not limited to the following stated:
As shown in Figure 1, a kind of acidic etching waste liquid indirect regeneration with tail gas treating function, comprise etching solution treatment system, the regenerated liquid recycle system, liquid mixing system and chlorine recovery system, etching solution treatment system comprises etching production line 1, mother liquor hold tank 2, electrolyzer and solution absorption system 6, electrolyzer comprises cathode can 3, film 4 and anode slot 5, mother liquor hold tank 2, cathode can 3, anode slot 5, solution absorption system 6 is communicated with successively, etching production line 1 is communicated with solution absorption system 6 with mother liquor hold tank 2 respectively, solution absorption system 6 is communicated with etching production line 1,
Chlorine recovery system comprises scrubber system 7 and exhaust treatment system 8, and anode slot 5, scrubber system 7 are communicated with successively with exhaust treatment system 8.
In the present embodiment, described filtering membrane 4 is barrier film, cationic membrane or anionic membrane, can carry out which kind of concrete filtering membrane of choice for use according to the concrete condition of production.
In the present embodiment, described cathode can 3 obtains electrolytic copper 9 by electrolysis, the cupric ion in liquid can be made to reach balance with this, ensures the benefit of etching solution, and avoid copper to run off with ionic forms and cause environmental pollution, and copper metal can as the commodity with commercial value.
In the present embodiment, ionic concn proofing unit is provided with in described electrolyzer, by the ionic concn in ionic concn proofing unit tracer liquid, resource and regulating flow is reasonably distributed according to the information detected, etching is produced and can reach running balance with etching solution process, being conducive to can the realization of continuous production.
In the present embodiment, this described intrasystem device and pipeline all use acidproof, alkaline-resisting, corrosion-resistant material to make, and can increase the work-ing life of system with this, reduce the difficulty of maintaining.
Working process of the present invention is as follows: the etching solution part that etching production line 1 flows out enters solution absorption system 6 and stores, another part enters mother liquor hold tank 2 and stores, controlling flow by mother liquor hold tank 2 makes the etching solution in mother liquor hold tank 2 enter cathode can 3, under electrolytic action in cathode can 3, cuprous ion is reduced into bivalent cupric ion, bivalent cupric ion is reduced into electrolytic copper, and electrolytic copper is recycled through washing after copper device 9 cleans.The remaining cupric ion that is not reduced and other ions enter anode slot 5 by film 4.
Oxidized formation chlorine under the electrolytic action of chlorion in anode slot 5, when etching production line 1 when producing, chlorine enters solvent absorption systems 6, obtain cupric ion and acidic liquid with cuprous ion generation redox reaction, this liquid can enter etching production line 1 as etching solution and complete production; When etching production line 1 and not producing; chlorine enters in scrubber system 7 and obtains pure chlorine after removal of impurities; make the chlorinated products of valency through reaction after pure chlorine enters exhaust treatment system 8; it may be used for increasing the acidity of this system or makes cuprous ion be reduced into cupric ion; realize the circulation of part chlorine element, and protection of the environment is not polluted.Can running balance be realized by the control degree of electrolysis and the flow of liquid, be conducive to realizing automatic production and acidic etching waste liquid processed offline.
Claims (5)
1. one kind has the acidic etching waste liquid indirect regeneration of tail gas treating function, it is characterized in that: comprise etching solution treatment system, the regenerated liquid recycle system, liquid mixing system and chlorine recovery system, etching solution treatment system comprises etching production line (1), mother liquor hold tank (2), electrolyzer and solution absorption system (6), electrolyzer comprises cathode can (3), film (4) and anode slot (5), mother liquor hold tank (2), cathode can (3), anode slot (5), solution absorption system (6) is communicated with successively, etching production line (1) is communicated with solution absorption system (6) with mother liquor hold tank (2) respectively, solution absorption system (6) is communicated with etching production line (1),
Chlorine recovery system comprises scrubber system (7) and exhaust treatment system (8), and anode slot (5), scrubber system (7) are communicated with successively with exhaust treatment system (8).
2. a kind of acidic etching waste liquid indirect regeneration with tail gas treating function according to claim 1, is characterized in that: described filtering membrane (4) is barrier film, cationic membrane or anionic membrane.
3. a kind of acidic etching waste liquid indirect regeneration with tail gas treating function according to claim 1, is characterized in that: described cathode can (3) obtains electrolytic copper (9) by electrolysis.
4. a kind of acidic etching waste liquid indirect regeneration with tail gas treating function according to claim 1, is characterized in that: be provided with ionic concn proofing unit in described electrolyzer.
5. a kind of acidic etching waste liquid indirect regeneration with tail gas treating function according to claim 1, is characterized in that: this described intrasystem device and pipeline all use acidproof, alkaline-resisting, corrosion-resistant material to make.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510569176.3A CN105177581A (en) | 2015-09-09 | 2015-09-09 | System for circulating and regenerating waste acidic etching solutions with tail gas treatment function |
| PCT/CN2016/077064 WO2017041470A1 (en) | 2015-09-09 | 2016-03-23 | Acidic etching waste solution reuse and recovery system having tail-gas treatment function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510569176.3A CN105177581A (en) | 2015-09-09 | 2015-09-09 | System for circulating and regenerating waste acidic etching solutions with tail gas treatment function |
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| Publication Number | Publication Date |
|---|---|
| CN105177581A true CN105177581A (en) | 2015-12-23 |
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| CN201510569176.3A Pending CN105177581A (en) | 2015-09-09 | 2015-09-09 | System for circulating and regenerating waste acidic etching solutions with tail gas treatment function |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106498401A (en) * | 2017-01-06 | 2017-03-15 | 深圳市新锐思环保科技有限公司 | A kind of recoverying and utilizing method of acidic etching waste liquid and recovery and processing system |
| WO2017041470A1 (en) * | 2015-09-09 | 2017-03-16 | 成都虹华环保科技股份有限公司 | Acidic etching waste solution reuse and recovery system having tail-gas treatment function |
| WO2017041472A1 (en) * | 2015-09-09 | 2017-03-16 | 成都虹华环保科技股份有限公司 | Zero-emission acidic etching waste solution reuse and recovery method and system |
| CN110184607A (en) * | 2019-06-20 | 2019-08-30 | 深圳市祺鑫天正环保科技有限公司 | Acidic etching waste liquid proposes chlorine treatment method and processing system in copper recovery system |
| CN111101157A (en) * | 2019-12-27 | 2020-05-05 | 合肥恒力装备有限公司 | Zero-emission treatment process for PCB etching waste liquid |
| CN111394726A (en) * | 2019-09-10 | 2020-07-10 | 长沙利洁环保科技有限公司 | Acid etching solution recycling process |
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| WO2008139021A1 (en) * | 2007-05-16 | 2008-11-20 | Pp Recycling Ltd. | Metthod of regeneration method of acid cupper(ii)chloride etching waste |
| CN201834972U (en) * | 2010-10-19 | 2011-05-18 | 深圳市洁驰科技有限公司 | Regeneration system of acid etching liquid containing copper ions |
| CN202492581U (en) * | 2012-02-03 | 2012-10-17 | 昆山市洁驰环保科技发展有限公司 | Acid etching solution cyclic regeneration unit for printed wiring board |
| CN104152905A (en) * | 2014-06-24 | 2014-11-19 | 深圳市新锐思环保科技有限公司 | Acidic copper chloride etching liquid electrolytic regeneration recycling and copper plate recovery device and method |
| CN104630825A (en) * | 2015-01-20 | 2015-05-20 | 昆山美源达环保科技有限公司 | Device and process for electrolytically extracting copper in acidic etching liquid |
| CN204982053U (en) * | 2015-09-09 | 2016-01-20 | 成都虹华环保科技股份有限公司 | Acid etching waste liquid recycle and regeneration system with tail gas treatment function |
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2015
- 2015-09-09 CN CN201510569176.3A patent/CN105177581A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2008139021A1 (en) * | 2007-05-16 | 2008-11-20 | Pp Recycling Ltd. | Metthod of regeneration method of acid cupper(ii)chloride etching waste |
| CN201834972U (en) * | 2010-10-19 | 2011-05-18 | 深圳市洁驰科技有限公司 | Regeneration system of acid etching liquid containing copper ions |
| CN202492581U (en) * | 2012-02-03 | 2012-10-17 | 昆山市洁驰环保科技发展有限公司 | Acid etching solution cyclic regeneration unit for printed wiring board |
| CN104152905A (en) * | 2014-06-24 | 2014-11-19 | 深圳市新锐思环保科技有限公司 | Acidic copper chloride etching liquid electrolytic regeneration recycling and copper plate recovery device and method |
| CN104630825A (en) * | 2015-01-20 | 2015-05-20 | 昆山美源达环保科技有限公司 | Device and process for electrolytically extracting copper in acidic etching liquid |
| CN204982053U (en) * | 2015-09-09 | 2016-01-20 | 成都虹华环保科技股份有限公司 | Acid etching waste liquid recycle and regeneration system with tail gas treatment function |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017041470A1 (en) * | 2015-09-09 | 2017-03-16 | 成都虹华环保科技股份有限公司 | Acidic etching waste solution reuse and recovery system having tail-gas treatment function |
| WO2017041472A1 (en) * | 2015-09-09 | 2017-03-16 | 成都虹华环保科技股份有限公司 | Zero-emission acidic etching waste solution reuse and recovery method and system |
| CN106498401A (en) * | 2017-01-06 | 2017-03-15 | 深圳市新锐思环保科技有限公司 | A kind of recoverying and utilizing method of acidic etching waste liquid and recovery and processing system |
| CN110184607A (en) * | 2019-06-20 | 2019-08-30 | 深圳市祺鑫天正环保科技有限公司 | Acidic etching waste liquid proposes chlorine treatment method and processing system in copper recovery system |
| CN111394726A (en) * | 2019-09-10 | 2020-07-10 | 长沙利洁环保科技有限公司 | Acid etching solution recycling process |
| CN111394726B (en) * | 2019-09-10 | 2021-01-19 | 长沙利洁环保科技有限公司 | Acid etching solution recycling process |
| CN111101157A (en) * | 2019-12-27 | 2020-05-05 | 合肥恒力装备有限公司 | Zero-emission treatment process for PCB etching waste liquid |
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Application publication date: 20151223 |