CN109154678B - 光学部件及激光加工机 - Google Patents

光学部件及激光加工机 Download PDF

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Publication number
CN109154678B
CN109154678B CN201780028538.5A CN201780028538A CN109154678B CN 109154678 B CN109154678 B CN 109154678B CN 201780028538 A CN201780028538 A CN 201780028538A CN 109154678 B CN109154678 B CN 109154678B
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CN
China
Prior art keywords
film
optical member
thickness
substrate
transmittance
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CN201780028538.5A
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English (en)
Chinese (zh)
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CN109154678A (zh
Inventor
福永圭佑
中井秀和
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Publication date
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Publication of CN109154678A publication Critical patent/CN109154678A/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B23K26/382—Removing material by boring or cutting by boring
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laser Beam Processing (AREA)
CN201780028538.5A 2016-05-13 2017-04-26 光学部件及激光加工机 Active CN109154678B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016-096876 2016-05-13
JP2016096876 2016-05-13
PCT/JP2017/016545 WO2017195603A1 (ja) 2016-05-13 2017-04-26 光学部品及びレーザ加工機

Publications (2)

Publication Number Publication Date
CN109154678A CN109154678A (zh) 2019-01-04
CN109154678B true CN109154678B (zh) 2021-03-26

Family

ID=60266604

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780028538.5A Active CN109154678B (zh) 2016-05-13 2017-04-26 光学部件及激光加工机

Country Status (5)

Country Link
JP (1) JP6625207B2 (ja)
KR (1) KR102105306B1 (ja)
CN (1) CN109154678B (ja)
TW (1) TWI655453B (ja)
WO (1) WO2017195603A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6873283B2 (ja) * 2018-01-25 2021-05-19 三菱電機株式会社 光学部品及びレーザ加工機
WO2020153046A1 (ja) * 2019-01-22 2020-07-30 三菱電機株式会社 光学部品およびレーザ加工機
CN115201941B (zh) * 2021-04-13 2023-09-12 中国科学院上海技术物理研究所 一种适用于空间环境的高效红外宽光谱减反射膜
WO2023162616A1 (ja) * 2022-02-24 2023-08-31 三菱電機株式会社 光学部品およびレーザ加工機

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04217202A (ja) * 1990-12-19 1992-08-07 Sumitomo Electric Ind Ltd 赤外線光学部品
JPH07331412A (ja) * 1994-06-10 1995-12-19 Sumitomo Electric Ind Ltd 赤外線用光学部品及びその製造方法
JP2009086533A (ja) * 2007-10-02 2009-04-23 Sumitomo Electric Hardmetal Corp 赤外用多層膜、赤外反射防止膜及び赤外レーザ用反射ミラー
JP2010181514A (ja) * 2009-02-04 2010-08-19 Sumitomo Electric Hardmetal Corp 光学部品、及びレーザ加工機の保護部材
JP2011008070A (ja) * 2009-06-26 2011-01-13 Ricoh Co Ltd マイクロミラー装置
CN105296926A (zh) * 2015-12-04 2016-02-03 中国航空工业集团公司洛阳电光设备研究所 一种硬质增透复合膜光学窗口及其制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02141701A (ja) * 1988-11-24 1990-05-31 Idemitsu Petrochem Co Ltd 赤外用光学部材の製造方法
US5349467A (en) * 1992-10-27 1994-09-20 Texas Instruments Incorporated Thorium-free coating for germanium IR window
JP2000147205A (ja) * 1998-11-06 2000-05-26 Minolta Co Ltd 赤外反射防止膜
JP2006153976A (ja) * 2004-11-25 2006-06-15 Nippon Shinku Kogaku Kk 赤外光透過フィルタ
JP4763318B2 (ja) * 2005-03-07 2011-08-31 株式会社トプコン 赤外反射防止膜
JP2008268277A (ja) 2007-04-16 2008-11-06 Sei Hybrid Kk 赤外線透過構造体および赤外線センサー
CN101464528B (zh) * 2008-01-23 2011-01-12 四川大学 一种dlc红外抗反射保护膜及其制备方法
JP5730147B2 (ja) * 2011-06-30 2015-06-03 日東光学株式会社 炭酸ガスレーザー光を透過させる光学素子および反射防止膜

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04217202A (ja) * 1990-12-19 1992-08-07 Sumitomo Electric Ind Ltd 赤外線光学部品
JPH07331412A (ja) * 1994-06-10 1995-12-19 Sumitomo Electric Ind Ltd 赤外線用光学部品及びその製造方法
JP2009086533A (ja) * 2007-10-02 2009-04-23 Sumitomo Electric Hardmetal Corp 赤外用多層膜、赤外反射防止膜及び赤外レーザ用反射ミラー
JP2010181514A (ja) * 2009-02-04 2010-08-19 Sumitomo Electric Hardmetal Corp 光学部品、及びレーザ加工機の保護部材
JP2011008070A (ja) * 2009-06-26 2011-01-13 Ricoh Co Ltd マイクロミラー装置
CN105296926A (zh) * 2015-12-04 2016-02-03 中国航空工业集团公司洛阳电光设备研究所 一种硬质增透复合膜光学窗口及其制备方法

Also Published As

Publication number Publication date
TW201809731A (zh) 2018-03-16
JPWO2017195603A1 (ja) 2018-08-23
CN109154678A (zh) 2019-01-04
KR102105306B1 (ko) 2020-04-28
TWI655453B (zh) 2019-04-01
WO2017195603A1 (ja) 2017-11-16
JP6625207B2 (ja) 2019-12-25
KR20180123157A (ko) 2018-11-14

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