CN109143780A - 感光性树脂组合物、黄光浆料及其制备方法 - Google Patents
感光性树脂组合物、黄光浆料及其制备方法 Download PDFInfo
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- CN109143780A CN109143780A CN201810887952.8A CN201810887952A CN109143780A CN 109143780 A CN109143780 A CN 109143780A CN 201810887952 A CN201810887952 A CN 201810887952A CN 109143780 A CN109143780 A CN 109143780A
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- monomer
- photosensitive polymer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- Polymerisation Methods In General (AREA)
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Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810887952.8A CN109143780B (zh) | 2018-08-06 | 2018-08-06 | 感光性树脂组合物、黄光浆料及其制备方法 |
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CN201810887952.8A CN109143780B (zh) | 2018-08-06 | 2018-08-06 | 感光性树脂组合物、黄光浆料及其制备方法 |
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CN109143780A true CN109143780A (zh) | 2019-01-04 |
CN109143780B CN109143780B (zh) | 2022-03-15 |
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CN201810887952.8A Active CN109143780B (zh) | 2018-08-06 | 2018-08-06 | 感光性树脂组合物、黄光浆料及其制备方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110335700A (zh) * | 2019-06-28 | 2019-10-15 | 乾宇电子材料(苏州)有限公司 | 高温烧结型黄光导电浆料、导电线路及制备方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3890683A (en) * | 1972-12-22 | 1975-06-24 | Ceskoslovenska Akademie Ved | Roller with an elastic hydrogel layer for dye application or printing on glass and other materials |
US6245483B1 (en) * | 1997-06-09 | 2001-06-12 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
CN102757526A (zh) * | 2011-04-26 | 2012-10-31 | 锦湖石油化学株式会社 | 用于有机抗反射膜的共聚物、单体及包含该共聚物的组合物 |
CN102768464A (zh) * | 2011-05-04 | 2012-11-07 | 上海鑫力新材料科技有限公司 | 感光导电银浆及制备方法 |
CN106168737A (zh) * | 2015-05-18 | 2016-11-30 | 台湾积体电路制造股份有限公司 | 化学增幅光阻材料、共聚物及微影方法 |
-
2018
- 2018-08-06 CN CN201810887952.8A patent/CN109143780B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3890683A (en) * | 1972-12-22 | 1975-06-24 | Ceskoslovenska Akademie Ved | Roller with an elastic hydrogel layer for dye application or printing on glass and other materials |
US6245483B1 (en) * | 1997-06-09 | 2001-06-12 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
CN102757526A (zh) * | 2011-04-26 | 2012-10-31 | 锦湖石油化学株式会社 | 用于有机抗反射膜的共聚物、单体及包含该共聚物的组合物 |
CN102768464A (zh) * | 2011-05-04 | 2012-11-07 | 上海鑫力新材料科技有限公司 | 感光导电银浆及制备方法 |
CN106168737A (zh) * | 2015-05-18 | 2016-11-30 | 台湾积体电路制造股份有限公司 | 化学增幅光阻材料、共聚物及微影方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110335700A (zh) * | 2019-06-28 | 2019-10-15 | 乾宇电子材料(苏州)有限公司 | 高温烧结型黄光导电浆料、导电线路及制备方法 |
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CN109143780B (zh) | 2022-03-15 |
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Effective date of registration: 20210805 Address after: 518000 Room 401, No.7, LianJian Industrial Park, Huarong Road, Tongsheng community, Dalang street, Longhua District, Shenzhen City, Guangdong Province Applicant after: HANYU ELECTRONIC MATERIAL (SHENZHEN) Co.,Ltd. Applicant after: Yu Yong Applicant after: QIANYE TECHNOLOGY DEVELOPMENT (DONGGUAN) Co.,Ltd. Address before: 518000 Room 401, No.7, LianJian Industrial Park, Huarong Road, Tongsheng community, Dalang street, Longhua District, Shenzhen City, Guangdong Province Applicant before: HANYU ELECTRONIC MATERIAL (SHENZHEN) Co.,Ltd. Applicant before: Yu Yong Applicant before: QIANYE TECHNOLOGY (SHENZHEN) Co.,Ltd. Applicant before: QIANYE TECHNOLOGY DEVELOPMENT (DONGGUAN) Co.,Ltd. |
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Address after: 518000 Building 1, Hengtai Yu Building, Tangwei Community, Fenghuang Street, Guangming District, Shenzhen City, Guangdong Province, 514-2 (one photo multi site enterprise) Patentee after: Qianyu Micro Nano Technology (Shenzhen) Co.,Ltd. Patentee after: Yu Yong Patentee after: QIANYE TECHNOLOGY DEVELOPMENT (DONGGUAN) Co.,Ltd. Address before: 518000 Room 401, No.7, LianJian Industrial Park, Huarong Road, Tongsheng community, Dalang street, Longhua District, Shenzhen City, Guangdong Province Patentee before: HANYU ELECTRONIC MATERIAL (SHENZHEN) Co.,Ltd. Patentee before: Yu Yong Patentee before: QIANYE TECHNOLOGY DEVELOPMENT (DONGGUAN) Co.,Ltd. |
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Effective date of registration: 20230711 Address after: 518000 Building 1, Hengtai Yu Building, Tangwei Community, Fenghuang Street, Guangming District, Shenzhen City, Guangdong Province, 514-2 (one photo multi site enterprise) Patentee after: Qianyu Micro Nano Technology (Shenzhen) Co.,Ltd. Address before: 518000 Building 1, Hengtai Yu Building, Tangwei Community, Fenghuang Street, Guangming District, Shenzhen City, Guangdong Province, 514-2 (one photo multi site enterprise) Patentee before: Qianyu Micro Nano Technology (Shenzhen) Co.,Ltd. Patentee before: Yu Yong Patentee before: QIANYE TECHNOLOGY DEVELOPMENT (DONGGUAN) Co.,Ltd. |