CN109073815A - 光学元件 - Google Patents
光学元件 Download PDFInfo
- Publication number
- CN109073815A CN109073815A CN201780024993.8A CN201780024993A CN109073815A CN 109073815 A CN109073815 A CN 109073815A CN 201780024993 A CN201780024993 A CN 201780024993A CN 109073815 A CN109073815 A CN 109073815A
- Authority
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- China
- Prior art keywords
- axis
- optical element
- light
- photonic crystal
- wave plate
- Prior art date
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- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 88
- 239000004038 photonic crystal Substances 0.000 claims abstract description 76
- 230000010287 polarization Effects 0.000 claims abstract description 33
- 238000003475 lamination Methods 0.000 claims abstract description 18
- 238000000926 separation method Methods 0.000 claims description 11
- 230000008859 change Effects 0.000 claims description 10
- 239000002131 composite material Substances 0.000 claims description 7
- 239000004615 ingredient Substances 0.000 claims description 7
- 239000007787 solid Substances 0.000 abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 22
- 238000009826 distribution Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 239000000377 silicon dioxide Substances 0.000 description 10
- 238000010276 construction Methods 0.000 description 9
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 9
- 230000002093 peripheral effect Effects 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910052681 coesite Inorganic materials 0.000 description 5
- 229910052906 cristobalite Inorganic materials 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 239000013307 optical fiber Substances 0.000 description 5
- 229910052682 stishovite Inorganic materials 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 229910052905 tridymite Inorganic materials 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 230000000644 propagated effect Effects 0.000 description 3
- 230000011218 segmentation Effects 0.000 description 3
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 208000031481 Pathologic Constriction Diseases 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 230000029553 photosynthesis Effects 0.000 description 1
- 238000010672 photosynthesis Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000036262 stenosis Effects 0.000 description 1
- 208000037804 stenosis Diseases 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
- G01J4/04—Polarimeters using electric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1833—Diffraction gratings comprising birefringent materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Polarising Elements (AREA)
- Optical Integrated Circuits (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016039854 | 2016-03-02 | ||
JP2016-039854 | 2016-03-02 | ||
PCT/JP2017/007958 WO2017150568A1 (ja) | 2016-03-02 | 2017-02-28 | 光学素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109073815A true CN109073815A (zh) | 2018-12-21 |
CN109073815B CN109073815B (zh) | 2021-01-15 |
Family
ID=59744064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201780024993.8A Active CN109073815B (zh) | 2016-03-02 | 2017-02-28 | 光学元件 |
Country Status (4)
Country | Link |
---|---|
US (1) | US11125925B2 (zh) |
JP (1) | JP6745516B2 (zh) |
CN (1) | CN109073815B (zh) |
WO (1) | WO2017150568A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI829204B (zh) * | 2022-06-20 | 2024-01-11 | 國立中央大學 | 超穎光學元件 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7101954B2 (ja) * | 2017-10-30 | 2022-07-19 | 株式会社フォトニックラティス | 光マトリクススイッチ |
JP7048962B2 (ja) * | 2017-12-21 | 2022-04-06 | 株式会社フォトニックラティス | 光学素子 |
JP7303619B2 (ja) * | 2018-10-16 | 2023-07-05 | 株式会社フォトニックラティス | 光ビーム分岐光回路及びレーザ加工機 |
US12055676B2 (en) * | 2019-03-29 | 2024-08-06 | Sony Group Corporation | Transparent optical portion, optical device and method for manufacturing an optical device |
JP6896262B1 (ja) * | 2019-12-16 | 2021-06-30 | 日本分光株式会社 | 反射型の偏光分離回折素子、および、これを備えた光学測定装置 |
US11860414B2 (en) | 2020-12-30 | 2024-01-02 | Globalfoundries U.S. Inc. | Edge couplers including a grooved membrane |
CN115128715B (zh) * | 2022-07-20 | 2023-09-22 | 中国人民解放军火箭军工程大学 | 利用谐振腔与干涉膜层协同增强的高效吸光构型复合材料 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005114704A (ja) * | 2003-09-17 | 2005-04-28 | Photonic Lattice Inc | 偏光解析装置 |
CN2842451Y (zh) * | 2005-07-29 | 2006-11-29 | 浙江大学 | 基于光子晶体正负折射的偏振分束器 |
CN1890603A (zh) * | 2003-12-01 | 2007-01-03 | 伊利诺伊大学评议会 | 用于制造三维纳米级结构的方法和装置 |
JP2009295838A (ja) * | 2008-06-06 | 2009-12-17 | Tohoku Univ | レーザー共振器 |
CN103221740A (zh) * | 2010-11-18 | 2013-07-24 | 日本电气株式会社 | 光源单元和具有其的投影显示设备 |
CN103389534A (zh) * | 2012-05-08 | 2013-11-13 | 香港科技大学 | 偏振转换器和偏振转换系统 |
US20150247617A1 (en) * | 2012-05-08 | 2015-09-03 | The Hong Kong University Of Science And Technology | Patterned Polarization Grating Polarization Converter |
CN105229499A (zh) * | 2013-03-13 | 2016-01-06 | 北卡罗莱纳州立大学 | 具有几何相位全息图的偏振转换系统 |
US20160025914A1 (en) * | 2014-07-27 | 2016-01-28 | The Board Of Trustees Of The Leland Stanford Junior University | Dielectric Metasurface Optical Elements |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3325825B2 (ja) | 1997-03-29 | 2002-09-17 | 彰二郎 川上 | 3次元周期構造体及びその作製方法並びに膜の製造方法 |
WO2002069029A1 (en) * | 2001-02-28 | 2002-09-06 | Board Of Control Of Michigan Technological University | Magneto-photonic crystal isolators |
US8363185B2 (en) * | 2008-10-10 | 2013-01-29 | Samsung Electronics Co., Ltd. | Photonic crystal optical filter, transmissive color filter, transflective color filter, and display apparatus using the color filters |
JP5218079B2 (ja) * | 2009-01-15 | 2013-06-26 | 株式会社リコー | 光学素子、光ピックアップ、光情報処理装置、光減衰器、偏光変換素子、プロジェクタ光学系、光学機器 |
JP2012159802A (ja) * | 2011-02-02 | 2012-08-23 | Ricoh Co Ltd | 光学素子、光ピックアップ、光情報処理装置、光減衰器、偏光変換素子、プロジェクタ光学系、アイソレータ及び光学機器 |
JP2017072526A (ja) * | 2015-10-09 | 2017-04-13 | 株式会社ニコン | 偏光測定装置、偏光測定方法、検査装置、露光装置、露光方法、およびデバイス製造方法 |
-
2017
- 2017-02-28 WO PCT/JP2017/007958 patent/WO2017150568A1/ja active Application Filing
- 2017-02-28 CN CN201780024993.8A patent/CN109073815B/zh active Active
- 2017-02-28 US US16/081,913 patent/US11125925B2/en active Active
- 2017-02-28 JP JP2018503351A patent/JP6745516B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005114704A (ja) * | 2003-09-17 | 2005-04-28 | Photonic Lattice Inc | 偏光解析装置 |
CN1890603A (zh) * | 2003-12-01 | 2007-01-03 | 伊利诺伊大学评议会 | 用于制造三维纳米级结构的方法和装置 |
CN2842451Y (zh) * | 2005-07-29 | 2006-11-29 | 浙江大学 | 基于光子晶体正负折射的偏振分束器 |
JP2009295838A (ja) * | 2008-06-06 | 2009-12-17 | Tohoku Univ | レーザー共振器 |
CN103221740A (zh) * | 2010-11-18 | 2013-07-24 | 日本电气株式会社 | 光源单元和具有其的投影显示设备 |
CN103389534A (zh) * | 2012-05-08 | 2013-11-13 | 香港科技大学 | 偏振转换器和偏振转换系统 |
US20150247617A1 (en) * | 2012-05-08 | 2015-09-03 | The Hong Kong University Of Science And Technology | Patterned Polarization Grating Polarization Converter |
CN105229499A (zh) * | 2013-03-13 | 2016-01-06 | 北卡罗莱纳州立大学 | 具有几何相位全息图的偏振转换系统 |
US20160025914A1 (en) * | 2014-07-27 | 2016-01-28 | The Board Of Trustees Of The Leland Stanford Junior University | Dielectric Metasurface Optical Elements |
Non-Patent Citations (4)
Title |
---|
D.R. SOLLI ETC.: ""Photonic crystal polarizers and polarizing beam splitters"", 《JOURNAL OF APPLIED PHYSICS》 * |
DIANMIN LIN ETC.: ""Dielectric gradient metasurface optical elements"", 《APPLIED OPTICS》 * |
N.YU ETC.: ""Flat optics with designer metasurfaces"", 《NATURE MATERIALS》 * |
李明宇等: ""光子晶体偏振分光镜的优化设计"", 《物理学报》 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI829204B (zh) * | 2022-06-20 | 2024-01-11 | 國立中央大學 | 超穎光學元件 |
Also Published As
Publication number | Publication date |
---|---|
JP6745516B2 (ja) | 2020-08-26 |
US11125925B2 (en) | 2021-09-21 |
CN109073815B (zh) | 2021-01-15 |
WO2017150568A1 (ja) | 2017-09-08 |
US20190086597A1 (en) | 2019-03-21 |
JPWO2017150568A1 (ja) | 2019-02-14 |
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PB01 | Publication | ||
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Effective date of registration: 20201207 Address after: 6-3icr building, 6dingmu, nanjicheng, Qingya District, Sendai City, Miyagi Prefecture, Japan Applicant after: PHOTONIC LATTICE Inc. Applicant after: School Corp. Applicant after: Keio school Corp. Address before: No.12-1104, no.5-3-dingmu-5-xinsi, Sendai City, Miyagi Prefecture, Japan Applicant before: Limited company photo clone Applicant before: PHOTONIC LATTICE Inc. Applicant before: School Corp. Applicant before: Keio school Corp. |
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Address after: 6-3icr building, 6dingmu, nanjicheng, Qingya District, Sendai City, Miyagi Prefecture, Japan Applicant after: PHOTONIC LATTICE Inc. Applicant after: School Corp. Applicant after: Keio school Corp. Address before: 6-3icr building, 6dingmu, nanjicheng, Qingya District, Sendai City, Miyagi Prefecture, Japan Applicant before: PHOTONIC LATTICE Inc. Applicant before: School Corp. Applicant before: Keio school Corp. |
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