CN108976454B - 一种光学显示用氟硅离型膜的制备方法 - Google Patents
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Abstract
本发明公开了一种光学显示用氟硅离型膜的制备方法,该方法为:先利用胺基硅氧烷单体水解制备端羟基氨基硅油,然后加入硅氧烷环体、封端剂、有机碱催化剂进行本体聚合制备乙烯基氨基硅油,最后加入含氟碳链封端异氰酸酯改性制得含氟乙烯基硅油;再加入含氢硅油、铂金催化剂及抑制剂混匀得氟硅离型剂,再将该离型剂与复合溶剂混配成涂布液,将该涂布液均匀涂布于有机基材上,经热固化得离型膜。该光学显示用氟硅离型膜的雾度低,透光率高,离型力为5~15g/25mm之间,且具有较高的残余附着率,涂膜与聚对苯二甲酸乙二醇酯膜的附着力为1级,可广泛用于平板显示器用的偏光板、有机EL等各种显示器的构成部件。
Description
技术领域
本发明属于高分子材料合成领域,具体涉及光学显示用氟硅离型膜及其制备方法。
背景技术
离型膜是一种具有防粘效果的膜,与特定的材料在一定条件下接触不具有粘附力或者具有轻微粘附力。常用的离型膜主要包括有机硅离型膜、氟素离型膜、非硅离型膜等。其中,有机硅离型膜以其良好的剥离力、耐热性、稳定性成为当前研究最热的离型材料之一,且其成本较低,使其得到了广泛的应用。氟原子具有很强的电负性,氟原子核对核外电子及成键电子云的束缚作用较强,C-F键的可极化性低,因此含氟聚合物分子间作用力较低,显示出极低的表面自由能,难于被液体或固体湿润或粘附,且含氟聚合物具有较好的稳定性、耐热性和耐候性。
现有光学显示用离型膜产品普遍存在雾度值、透光率低的缺点。在有机硅离型膜的基础上,引入氟元素,可以在一定程度上降低离型涂层的表面张力,产生优异的剥离性能,增加离型膜的透光率,降低雾度,从而应用于平板显示器用的偏光板、偏光板保护膜、有机EL等各种显示器的构成部件。
目前,现有的氟硅离型膜虽具有较好的剥离效果,但却出现了离型剂与基材表面结合力差,且残余附着率低等问题。这是因为氟元素的引入,在降低离型涂层表面张力的同时,也使得离型剂与基材表面的结合牢度变差。专利CN103694892A公开了一种含氟聚硅氧烷离型剂及其制备方法,通过引入酰亚胺杂环取代基提高离型剂与聚酯或聚酰亚胺基材的结合力,虽然粘合牢度与残余附着率得到了一定的改善,但是增加了工艺成本。
发明内容
技术问题:本发明的目的在于解决现有技术中存在的问题,提出一种光学显示用氟硅离型膜的制备方法,降低离型力的同时能够增强涂膜与基材表面的结合牢度,提高残余附着率、透光率,降低雾度。
技术方案:本发明的一种光学显示用氟硅离型膜的制备方法为:该离型膜先利用胺基硅氧烷单体水解制备端羟基氨基硅油,然后加入硅氧烷环体、封端剂、有机碱催化剂进行本体聚合制备乙烯基氨基硅油,最后加入含氟封端碳链封端异氰酸酯改性制得含氟乙烯基硅油;再加入含氢硅油、铂金催化剂及抑制剂混匀得氟硅离型剂,再将该氟硅离型剂与复合溶剂混配成涂布液,将该涂布液均匀涂布于有机基材上,经热固化制得。
该制备方法具体为:
步骤a)在室温、N2氛下,按水与氨基硅氧烷单体的摩尔比为9:1~15:1,将氨基硅氧烷单体与水加入到反应釜中搅匀,升温至60~95℃水解反应4~8h,80~100℃下真空脱除醇类低沸物2~4h,降至室温,按硅氧烷环体与氨基硅氧烷单体的摩尔比为0.5:1~0.9:1、按封端剂四甲基二乙烯基硅氧烷与氨基硅氧烷单体的摩尔比为0.0025:1~0.0045:1,将硅氧烷环体、封端剂加入到上述反应釜中,同时加入有机碱催化剂,有机碱催化剂的加入量为上述硅氧烷环体质量的0.1wt.%~7.0wt.%,升温至90~110℃,聚合反应5~8h后,再升温至150~180℃有机碱催化剂分解2~4h,150~180℃下真空脱除未反应单体及低聚物1~2h,降至室温得乙烯基氨基硅油;
步骤b)在室温、N2氛下,按二异氰酸酯:含氟一元单体的质量比为1:1.3~1:2.8将二异氰酸酯、含氟一元反应单体加入到反应釜中,同时加入有机锡催化剂混匀,有机锡催化剂的加入量为上述二异氰酸酯与全氟一元单体总质量的0.3wt.%~0.5wt.%,50~70℃反应2~4h,得含氟碳链封端异氰酸酯;
步骤c)在室温、N2氛下,将上述乙烯基氨基硅油与含氟碳链封端异氰酸酯的质量比为1:1.5~1:2.5加入到反应釜中,40~70℃下反应2~4h,降至室温得含氟乙烯基硅油;
步骤d)室温下,将上述含氟乙烯基硅油与含氢硅油按质量比为10:1~16:1加入到复合釜中,同时加入铂金催化剂及乙炔基环己醇抑制剂,室温复合0.5~1h,得离型剂;
步骤e)室温下,将步骤d)中制备的离型剂加入反应釜,再加入8~20倍离型剂质量的复合溶剂,混配成涂布液,使用涂布器将该涂布液均匀涂布于有机基材上,140~160℃下固化0.5~3min后得光学显示用氟硅离型膜。
其中,
该制备方法步骤a)中所述的氨基硅氧烷单体为γ-氨丙基甲基二甲氧基硅烷、γ-氨丙基甲基二乙氧基硅烷、N-(β-氨乙基-γ-氨丙基)甲基二甲氧基硅烷或N-(β-氨乙基-γ-氨丙基)甲基二乙氧基硅烷中的一种;所述的硅氧烷环体为八甲基环四硅氧烷或三氟丙基甲基环三硅氧烷中的一种或两者的组合;所述的有机碱催化剂为四甲基氢氧化铵或碱含量1.5wt.%的四甲基氢氧化铵碱胶中的一种。
该制备方法步骤b)中所述的含氟一元单体为1H,1H,2H,2H-全氟辛醇、1H,1H,2H,2H-全氟癸醇、1H,1H,-全氟辛胺或1H,1H,2H,2H-全氟癸胺或十五氟辛酸或十七氟壬酸中的一种;所述的二异氰酸酯为六亚甲基二异氰酸酯、异佛尔酮二异氰酸酯、二苯基甲烷二异氰酸酯或二环己基甲烷二异氰酸酯中的一种;所述的有机锡催化剂为二月桂酸二丁基锡或辛酸亚锡中的一种。
所述步骤e)中的复合溶剂为甲苯与120号溶剂油按质量比1:5~1:10配置成的混合液。
所述步骤e)中的有机基材为聚对苯二甲酸乙二醇酯膜、聚苯乙烯膜、聚氯乙烯膜、聚乙烯膜或聚丙烯膜中的一种。
所述步骤d)中含氢硅油的重均分子量为4000、活泼含氢量为0.8wt.%。
所述步骤d)中铂金催化剂的加入量为含氟乙烯基硅油与含氢硅油总质量的1000~5000ppm。
所述步骤d)中铂金催化剂为2wt.%Pt含量的卡斯特催化剂。
所述步骤d)中乙炔基环己醇抑制剂的加入量为含氟乙烯基硅油与含氢硅油总质量的500~1000ppm。
有益效果:本发明提供光学显示用氟硅离型膜及其制备方法,该光学显示用氟硅离型膜的雾度低,透光率高,离型力为5~15g/25mm之间,且具有较高的残余附着率,涂膜与聚对苯二甲酸乙二醇酯膜的附着力为1级,可广泛用于平板显示器用的偏光板、有机EL等各种显示器的构成部件。本发明的特点是:
(1)该光学显示用氟硅离型膜表面富集含氟、含硅基团,因此该离型膜具有较低的表面能,离型效果好;氟烷基、硅氧基基团的引入,使该离型膜具有较好的化学稳定性,同时还具有较好的耐溶剂性能。
(2)该光学显示用氟硅离型膜由于氟元素的引入,使该离型膜具有较高的透光率与较低的雾度。
(3)该光学显示用氟硅离型膜由于氨基甲酸酯基、丙烯酸酯基强极性基团的引入,使该离型膜具有较高残余附着率,涂膜与基材之间具有较高的附着力。
具体实施方式
下面通过具体实施例对本发明作进一步详述,但本发明并不仅限于此。
实施例1:
在室温、N2保护下,将94.71gγ-氨丙基甲基二甲氧基硅烷与99g水加入到反应釜中搅匀,升温至80℃水解反应4h,80℃下真空脱除甲醇低沸物2h,降至室温,将148.31g八甲基环四硅氧烷、0.41g四甲基二乙烯基硅氧烷加入到上述反应釜中,同时加入0.16g四甲基氢氧化铵,110℃聚合反应5h后,升温至180℃进行有机碱催化剂分解,分解2h后180℃下真空脱除未反应单体及低聚物1h,降至室温制得乙烯基氨基硅油;在室温、N2保护下,将222.29g异氟尔酮二异氰酸酯与364.10g 1H,1H,2H,2H-全氟辛醇加入到反应釜中,同时加入1.8g二月桂酸二丁基锡混匀,50℃反应4h,得含氟碳链封端异氰酸酯;在室温、N2保护下,将制得的乙烯基氨基硅油100g与合成的含氟碳链封端异氰酸酯157g加入到反应釜中,70℃下反应2h,降至室温得含氟乙烯基硅油;
室温下,将9.5g含氢硅油与制得的含氟乙烯基硅油100g加入到复合釜中,同时加入0.11g卡斯特催化剂及0.07g乙炔基环己醇搅拌复合0.5h,得氟硅离型剂;
室温下,将制备的氟硅离型剂50g加入反应釜,再加入100g甲苯与500g120号溶剂油的复合溶剂,混配成涂布液,使用涂布器均匀涂布于聚对苯二甲酸乙二醇酯膜上,140℃下固化1.5min后得光学显示用氟硅离型膜。
本实施方式所得的氟硅离型剂制成离型膜后,涂膜与聚对苯二甲酸乙二醇酯膜的附着力为1级,用四维胶带MY-2G测得离型力为6.3g/25mm,残余附着率为97%,透过率为96.4%,雾度为1.33%。
实施例2:
在室温、N2保护下,将110.98gγ-氨丙基甲基二乙氧基硅烷与104.40g水加入到反应釜中搅匀,升温至85℃水解反应3.5h,85℃下真空脱除乙醇低沸物1.5h,降至室温,将136.45g八甲基环四硅氧烷、18.74g三氟丙基甲基环三硅氧烷、0.36g四甲基二乙烯基硅氧烷加入到上述反应釜中,同时加入9g四甲基氢氧化铵碱胶,105℃聚合反应6h后,升温至180℃进行有机碱催化剂分解,分解2h后180℃下真空脱除未反应单体及低聚物1h,降至室温制得乙烯基氨基硅油;在室温、N2保护下,将222.29g异氟尔酮二异氰酸酯与399.10g1H,1H,-全氟辛胺加入到反应釜中,同时加入2.2g辛酸亚锡混匀,50℃反应4h,得含氟碳链封端异氰酸酯;在室温、N2保护下,将制得的乙烯基氨基硅油100g与合成的含氟碳链封端异氰酸酯161g加入到反应釜中,70℃下反应2h,降至室温得含氟乙烯基硅油;
室温下,将7.6g含氢硅油与制得的含氟乙烯基硅油100g加入到复合釜中,同时加入0.2g卡特斯催化剂及0.08g乙炔基环己醇搅拌复合0.5h,得氟硅离型剂;
室温下,将制备的氟硅离型剂50g加入反应釜,再加入90g甲苯与540g 120号溶剂油的复合溶剂,混配成涂布液,使用涂布器均匀涂布于聚对苯二甲酸乙二醇酯膜上,140℃下固化1.5min后得光学显示用氟硅离型膜。
本实施方式所得的氟硅离型剂制成离型膜后,涂膜与聚对苯二甲酸乙二醇酯膜的附着力为1级,用四维胶带MY-2G测得离型力为6.1g/25mm,残余附着率为97%,透过率为96.8%,雾度为1.27%。
实施例3:
在室温、N2保护下,将119.69g N-(β-氨乙基-γ-氨丙基)甲基二甲氧基硅烷与156.60g水加入到反应釜中搅匀,升温至70℃水解反应4h,70℃下真空脱除甲醇低沸物2h,降至室温,将124.58g八甲基环四硅氧烷、0.37g四甲基二乙烯基硅氧烷加入到上述反应釜中,同时加入0.13g四甲基氢氧化铵,110℃聚合反应5h后,升温至160℃进行有机碱催化剂分解,分解3h后160℃下真空脱除未反应单体及低聚物2h,降至室温制得乙烯基氨基硅油;在室温、N2保护下,将250.24g二苯基甲烷二异氰酸酯与464.12g 1H,1H,2H,2H-全氟癸醇加入到反应釜中,同时加入2.9g二月桂酸二丁基锡混匀,60℃反应3h,得含氟碳链封端异氰酸酯;在室温、N2保护下,将制得的乙烯基氨基硅油100g与合成的含氟碳链封端异氰酸酯190g加入到反应釜中,50℃下反应4h,降至室温得含氟乙烯基硅油;
室温下,将8.5g含氢硅油与制得的含氟乙烯基硅油100g加入到复合釜中,同时加入0.18g卡斯特催化剂及0.08g乙炔基环己醇搅拌复合0.7h,得氟硅离型剂;
室温下,将制备的氟硅离型剂50g加入反应釜,再加入120g甲苯与720g120号溶剂油的复合溶剂,混配成涂布液,使用涂布器均匀涂布于聚对苯二甲酸乙二醇酯膜上,150℃下固化1min后得光学显示用氟硅离型膜。
本实施方式所得的氟硅离型剂制成离型膜后,涂膜与聚对苯二甲酸乙二醇酯膜的附着力为1级,用四维胶带MY-2G测得离型力为5.5g/25mm,残余附着率为98%,透过率为97.3%,雾度为1.24%。
实施例4:
在室温、N2保护下,将119.69g N-(β-氨乙基-γ-氨丙基)甲基二甲氧基硅烷与156.60g水加入到反应釜中搅匀,升温至70℃水解反应4h,70℃下真空脱除甲醇低沸物2h,降至室温,将109.75g八甲基环四硅氧烷、23.43g三氟丙基甲基环三硅氧烷、0.34g四甲基二乙烯基硅氧烷加入到上述反应釜中,同时加入9g四甲基氢氧化铵碱胶,105℃聚合反应6h后,升温至160℃进行有机碱催化剂分解,分解3h后,160℃下真空脱除未反应单体及低聚物2h,降至室温制得乙烯基氨基硅油;在室温、N2保护下,将250.24g二苯基甲烷二异氰酸酯与463.13g 1H,1H,2H,2H-全氟癸胺加入到反应釜中,同时加入2.9g辛酸亚锡混匀,60℃反应3h,得含氟碳链封端异氰酸酯;在室温、N2保护下,将制得的乙烯基氨基硅油100g与合成的含氟碳链封端异氰酸酯183g加入到反应釜中,50℃下反应4h,降至室温得含氟乙烯基硅油;
室温下,将7.1g含氢硅油与制得的含氟乙烯基硅油100g加入到复合釜中,同时加入0.32g卡特斯催化剂及0.1g乙炔基环己醇搅拌复合0.7h,得氟硅离型剂;
室温下,将制备的氟硅离型剂50g加入反应釜,再加入110g甲苯与660g 120号溶剂油的复合溶剂,混配成涂布液,使用涂布器均匀涂布于聚对苯二甲酸乙二醇酯膜上,150℃下固化1min后得光学显示用氟硅离型膜。
本实施方式所得的氟硅离型剂制成离型膜后,涂膜与聚对苯二甲酸乙二醇酯膜的附着力为1级,用四维胶带MY-2G测得离型力为5.6g/25mm,残余附着率为98%,透过率为97.5%,雾度为1.12%。
实施例5:
在室温、N2保护下,将135.96g N-(β-氨乙基-γ-氨丙基)甲基二乙氧基硅烷与126g水加入到反应釜中搅匀,升温至75℃水解反应3h,75℃下真空脱除乙醇低沸物2h,降至室温,将103.82g八甲基环四硅氧烷、0.32g四甲基二乙烯基硅氧烷、加入到上述反应釜中,同时加入0.11g四甲基氢氧化铵,110℃聚合反应5h后,升温至170℃进行有机碱催化剂分解,分解2.5h后,170℃下真空脱除未反应单体及低聚物1.5h,降至室温制得乙烯基氨基硅油;在室温、N2保护下,将262.35g二环己基甲烷二异氰酸酯与414.07g十五氟辛酸加入到反应釜中,同时加入3.3g二月桂酸二丁基锡混匀,70℃反应2h,得含氟碳链封端异氰酸酯;在室温、N2保护下,将制得的乙烯基氨基硅油100g与合成的含氟碳链封端异氰酸酯199g加入到反应釜中,65℃下反应3h,降至室温得含氟乙烯基硅油;
室温下,将8.1g含氢硅油与制得的含氟乙烯基硅油100g加入到复合釜中,同时加入0.28g卡斯特催化剂及0.09g乙炔基环己醇搅拌复合1h,得氟硅离型剂;
室温下,将制备的氟硅离型剂50g加入反应釜,再加入80g甲苯与640g 120号溶剂油的复合溶剂,混配成涂布液,使用涂布器均匀涂布于聚对苯二甲酸乙二醇酯膜上,160℃下固化0.5min后得光学显示用氟硅离型膜。
本实施方式所得的氟硅离型剂制成离型膜后,涂膜与聚对苯二甲酸乙二醇酯膜的附着力为1级,用四维胶带MY-2G测得离型力为5.3g/25mm,残余附着率为99%,透过率为98.2%,雾度为1.15%。
实施例6:
在室温、N2保护下,将135.96g N-(β-氨乙基-γ-氨丙基)甲基二乙氧基硅烷与126g水加入到反应釜中搅匀,升温至75℃水解反应3h,75℃下真空脱除乙醇低沸物2h,降至室温,将88.99g八甲基环四硅氧烷、23.43g三氟丙基甲基环三硅氧烷、0.37g四甲基二乙烯基硅氧烷加入到上述反应釜中,同时加入9g四甲基氢氧化铵碱胶,105℃聚合反应6h后,升温至170℃进行有机碱催化剂分解,分解3.5h后,170℃下真空脱除未反应单体及低聚物1.5h,降至室温制得乙烯基氨基硅油;在室温、N2保护下,将262.35g二环己基甲烷二异氰酸酯与464.08g十七氟壬酸加入到反应釜中,同时加入3.6g辛酸亚锡混匀,70℃反应2h,得含氟碳链封端异氰酸酯;在室温、N2保护下,将制得的乙烯基氨基硅油100g与合成的含氟碳链封端异氰酸酯205g加入到反应釜中,65℃下反应3h,降至室温得含氟乙烯基硅油;
室温下,将9.0g含氢硅油与制得的含氟乙烯基硅油100g加入到复合釜中,同时加入0.35g卡特斯催化剂及0.1g乙炔基环己醇搅拌复合1h,得氟硅离型剂;
室温下,将制备的氟硅离型剂50g加入反应釜,再加入70g甲苯与700g 120号溶剂油的复合溶剂,混配成涂布液,使用涂布器均匀涂布于对苯二甲酸乙二醇酯膜上,160℃下固化0.5min后得光学显示用氟硅离型膜。
本实施方式所得的氟硅离型剂制成离型膜后,涂膜与聚对苯二甲酸乙二醇酯膜的附着力为1级,用四维胶带MY-2G测得离型力为5.1g/25mm,残余附着率为99%,透过率为98.5%,雾度为1.10%。
离型膜的透光率、雾度测试方法:
Denshoku NDH-4000按ASTM D1003规定方法进行测试。
离型膜的附着力测试方法:
根据GB/T9286-1998标准进行测试,将离型膜样品用网格划格器划出方格,每条都划透涂层至底材,以目视放大镜检查十字交叉切割区的表面外观有无离型涂层脱落。
离型膜的离型力测试方法:
按照GB2792-1998,将待测试离型膜制成25mm×200mm的标准试样。将四维胶带MY-2G按标准方法贴于被测离型膜上,用标准压辊来回滚压4次后,室温下放置24h,之后用离型力测试机(AR-1500)进行180°剥离强度的测试,测试拉伸速度为300mm/min,所测得的力即为离型力。
离型膜的残余附着率测试方法:
将待测试离型膜制成25mm×200mm的标准试样,Nitto31B胶带按标准方法贴于被测离型膜上,标准压辊来回滚压4次,用两块标准不锈钢条将被测样条平压其中,用1Kg的标准砝码压在钢条中间,在70℃烘箱内压20h,取出后在室温下放置4h,将Nitto31B胶带撕下贴于擦拭干净的1.5mm×40mm×120mm的不锈钢板上,用离型力测试机(AR-1500)测试,其拉伸速度为300mm/min,拉伸角度为180°时的拉力即为离型力。将贴于离型膜的胶带与干净的不锈钢板的离型力除以对照胶带与擦拭干净的不锈钢板间的离型力即为残余附着率:
表1离型膜附着力评定的等级标准
以上所述仅是本发明的较佳实施例,并不用以限制本发明,在不脱离本发明原理的前提下,所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。
Claims (9)
1.一种光学显示用氟硅离型膜的制备方法,其特征在于该离型膜先利用氨基硅氧烷单体水解制备端羟基氨基硅油,然后加入硅氧烷环体、封端剂、有机碱催化剂进行本体聚合制备乙烯基氨基硅油,最后加入含氟碳链封端异氰酸酯改性制得含氟乙烯基硅油;再加入含氢硅油、铂金催化剂及抑制剂混匀得氟硅离型剂,再将该氟硅离型剂与复合溶剂混配成涂布液,将该涂布液均匀涂布于有机基材上,经热固化制得。
2.根据权利要求1所述的光学显示用氟硅离型膜的制备方法,其特征在于该制备方法具体为:
步骤a) 在室温、N2气氛下,按水与氨基硅氧烷单体的摩尔比为9:1~15:1,将氨基硅氧烷单体与水加入到反应釜中搅匀,升温至60~95 ℃水解反应4~8 h,80~100 ℃下真空脱除醇类低沸物2~4 h,降至室温,按硅氧烷环体与氨基硅氧烷单体的摩尔比为0.5:1~0.9:1、按封端剂四甲基二乙烯基硅氧烷与氨基硅氧烷单体的摩尔比为0.0025:1~0.0045:1,将硅氧烷环体、封端剂加入到上述反应釜中,同时加入有机碱催化剂,有机碱催化剂的加入量为上述硅氧烷环体质量的0.1wt.%~7.0 wt.%,升温至90~110 ℃,聚合反应5~8 h后,再升温至150~180 ℃有机碱催化剂分解2~4 h,150~180 ℃下真空脱除未反应单体及低聚物1~2 h,降至室温得乙烯基氨基硅油;
步骤b) 在室温、N2气氛下,按二异氰酸酯:含氟一元单体的质量比为1:1.3~1:2.8将二异氰酸酯、含氟一元单体加入到反应釜中,同时加入有机锡催化剂混匀,有机锡催化剂的加入量为上述二异氰酸酯与含氟一元单体总质量的0.3wt.%~0.5 wt.%,50~70 ℃反应2~4 h,得含氟碳链封端异氰酸酯;
步骤c) 在室温、N2气氛下,将上述乙烯基氨基硅油与含氟碳链封端异氰酸酯的质量比为1:1.5~1:2.5加入到反应釜中,40~70 ℃下反应2~4 h,降至室温得含氟乙烯基硅油;
步骤d) 室温下,将上述含氟乙烯基硅油与含氢硅油按质量比为10:1~16:1加入到复合釜中,同时加入铂金催化剂及乙炔基环己醇抑制剂,室温复合0.5~1 h,得离型剂;
步骤e) 室温下,将步骤d) 中制备的离型剂加入反应釜,再加入8~20倍离型剂质量的复合溶剂,混配成涂布液,使用涂布器将该涂布液均匀涂布于有机基材上,140~160 ℃下固化0.5~3 min后得光学显示用氟硅离型膜;
其中步骤b)中所述的含氟一元单体为1H,1H,2H,2H-全氟辛醇、1H,1H,2H,2H-全氟癸醇、1H,1H,-全氟辛胺或1H,1H,2H,2H-全氟癸胺或十五氟辛酸或十七氟壬酸中的一种;所述的二异氰酸酯为六亚甲基二异氰酸酯、异佛尔酮二异氰酸酯、二苯基甲烷二异氰酸酯或二环己基甲烷二异氰酸酯中的一种;所述的有机锡催化剂为二月桂酸二丁基锡或辛酸亚锡中的一种。
3.根据权利要求2所述的光学显示用氟硅离型膜的制备方法,其特征在于该制备方法步骤a)中所述的氨基硅氧烷单体为γ-氨丙基甲基二甲氧基硅烷、γ-氨丙基甲基二乙氧基硅烷、N-(β-氨乙基-γ-氨丙基)甲基二甲氧基硅烷或N-(β-氨乙基-γ-氨丙基)甲基二乙氧基硅烷中的一种;所述的硅氧烷环体为八甲基环四硅氧烷或三氟丙基甲基环三硅氧烷中的一种或两者的组合;所述的有机碱催化剂为四甲基氢氧化铵或碱含量1.5 wt.%的四甲基氢氧化铵碱胶中的一种。
4.根据权利要求2所述的光学显示用氟硅离型膜的制备方法,其特征在于所述步骤e)中的复合溶剂为甲苯与120号溶剂油按质量比1:5~1:10配置成的混合液。
5.根据权利要求2所述的光学显示用氟硅离型膜的制备方法,其特征在于所述步骤e)中的有机基材为聚对苯二甲酸乙二醇酯膜、聚苯乙烯膜、聚氯乙烯膜、聚乙烯膜或聚丙烯膜中的一种。
6.根据权利要求2所述的光学显示用氟硅离型膜的制备方法,其特征在于所述步骤d)中含氢硅油的重均分子量为4000、活泼含氢量为0.8wt.%。
7.根据权利要求2所述的光学显示用氟硅离型膜的制备方法,其特征在于所述步骤d)中铂金催化剂的加入量为含氟乙烯基硅油与含氢硅油总质量的1000~5000 ppm。
8.根据权利要求2所述的光学显示用氟硅离型膜的制备方法,其特征在于所述铂金催化剂为2wt.% Pt含量的卡斯特催化剂。
9.根据权利要求2所述的光学显示用氟硅离型膜的制备方法,其特征在于所述乙炔基环己醇抑制剂的加入量为含氟乙烯基硅油与含氢硅油总质量的500~1000 ppm。
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