CN108963050A - A kind of small spacing LED chip and preparation method thereof - Google Patents
A kind of small spacing LED chip and preparation method thereof Download PDFInfo
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- CN108963050A CN108963050A CN201810666611.8A CN201810666611A CN108963050A CN 108963050 A CN108963050 A CN 108963050A CN 201810666611 A CN201810666611 A CN 201810666611A CN 108963050 A CN108963050 A CN 108963050A
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0095—Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Abstract
The present invention provides a kind of small spacing LED chips and preparation method thereof.Wherein, LED chip includes substrate, the first semiconductor layer on substrate, active layer and first electrode on the first semiconductor layer, the second semiconductor layer on active layer, reflecting layer on the second semiconductor layer, diffusion barrier layer on reflecting layer, passivation layer on diffusion barrier layer, second electrode on passivation layer, insulating layer in second electrode, seed layer on insulating layer, metal support layer in seed layer, solder layer in first electrode and second electrode, the melt temperature of the solder layer is 200-350 DEG C.The present invention by solder layer can direct fixed chip, chip and substrate are formed and are conductively connected；Further, solder layer can also be used as heat transfer, the heat of chip is transmitted on substrate, chip of the invention does not need routing, effectively reduces the spacing between chip, improves the resolution ratio of display screen.
Description
Technical field
The present invention relates to LED technology fields more particularly to a kind of small spacing LED chip and preparation method thereof.
Background technique
LED (Light Emitting Diode, light emitting diode) be it is a kind of using Carrier recombination when release energy shape
At luminous semiconductor devices, LED chip is with power consumption is low, coloration is pure, the service life is long, small in size, the response time is fast, energy conservation and environmental protection
Equal many advantages.
Present requirement of the LED display to resolution ratio is higher and higher, how to reduce the spacing of LED packaging, at
For the hot issue of field of LED display.
Traditional LED chip is mainly welded on substrate by way of tin cream weldering and eutectic weldering.Fig. 1 is formal dress LED core
The welding manner of piece, packed LED chip need routing, and occupied space is big, are unfavorable for reducing the encapsulation spacing of LED chip.
The patent that notification number is CN104733600B discloses a kind of flip LED chips and preparation method thereof, in the P of chip
On electrode and N electrode formed one layer of tin paste layer, flip-chip obtained by this method can directly pressure welding on package substrate, simplify
Packaging technology reduces production cost.Wherein, the material of the tin paste layer is one of following alloy: Sn63 alloy, Sn62
Alloy, Sn60 alloy.Since the material of the tin paste layer is mainly Sn alloy, the flip LED chips in pressure welding, be easy because
For temperature is excessively high and leads to dead lamp.
In addition, above-mentioned patent is electric in p-shaped welding electrode and the N-type welding not covered by metal barrier using tin ball is planted
One layer of tin paste layer is formed on polar region domain, this method cannot be precisely controlled the raw material for being used to form tin paste layer to amount, control tin paste layer
Thickness not can solve a problem that chip sticks up weldering, rosin joint in the welding process, welds partially, and therefore, above-mentioned patent is needed in electrode
Edge surrounding formed metal barrier, for stopping tin paste layer, due to chip of the tin ball to small spacing cause squeeze and occur
Short circuit.
Further, when welding, pressure applied is placed to components, chip is be easy to cause to damage.
Summary of the invention
Technical problem to be solved by the present invention lies in, a kind of small spacing LED chip is provided, can directly pressure welding encapsulating
On substrate, reduce the chip chamber that is welded on package substrate away from.
Technical problem to be solved by the present invention lies in provide a kind of production method of small spacing LED chip, improve weldering
It connects precision, mitigate the effect of part operation pressure, while accurately controlling solder dosage and chip position.
In order to solve the above-mentioned technical problems, the present invention provides a kind of small spacing LED chips, including substrate, are set to lining
The first semiconductor layer on bottom, active layer and first electrode on the first semiconductor layer, the second half on active layer
Conductor layer, the reflecting layer on the second semiconductor layer, the diffusion barrier layer on reflecting layer, on diffusion barrier layer
Passivation layer, the second electrode on passivation layer, the insulating layer in second electrode, the seed layer on insulating layer, if
In the metal support layer in seed layer, solder layer in first electrode and second electrode, the melt temperature of the solder layer
It is 200-350 DEG C, wherein second electrode is conductively connected through the passivation layer and with diffusion barrier layer.
As an improvement of the above scheme, the solder layer with a thickness of 1-50 microns.
As an improvement of the above scheme, the solder layer with a thickness of 5-20 microns.
As an improvement of the above scheme, the area of the solder layer is less than the area of first electrode and/or second electrode.
As an improvement of the above scheme, area is not more than 1200 square microns.
Correspondingly, invention also improves a kind of production methods of small spacing LED chip, comprising:
It is proposed light emitting structure, the light emitting structure includes substrate, the first semiconductor layer on substrate, is set to the first half
Active layer and first electrode in conductor layer, the second semiconductor layer on active layer, on the second semiconductor layer
Two electrodes；
Low-temperature annealing is carried out to light emitting structure, annealing temperature is 200-350 DEG C；
Solder layer is formed in first electrode and second electrode surface, the melt temperature of the solder layer is 200-350 DEG C.
As an improvement of the above scheme, the solder layer with a thickness of 1-50 microns.
As an improvement of the above scheme, the solder layer is made of one or more of Au, In, Cu, Ni, Co metal.
As an improvement of the above scheme, using electron beam evaporation or magnetron sputtering mode in first electrode and second electrode
Surface deposit solder layer.
As an improvement of the above scheme, it is formed by the way of ion chemistry plating on the surface of first electrode and second electrode
Solder layer.
The invention has the following beneficial effects:
1, the present invention provides a kind of small spacing LED chip, including substrate, the first semiconductor layer on substrate,
Active layer and first electrode on the first semiconductor layer, the second semiconductor layer on active layer are led set on the second half
Reflecting layer on body layer, the diffusion barrier layer on reflecting layer, the passivation layer on diffusion barrier layer are set on passivation layer
Second electrode, the insulating layer in second electrode, the seed layer on insulating layer, metal in seed layer supports
Layer, the solder layer in first electrode and second electrode, the melt temperature of the solder layer are 200-350 DEG C, wherein second
Electrode is conductively connected through the passivation layer and with diffusion barrier layer.The present invention by solder layer can direct fixed chip, prevent
Only chip is displaced on substrate, is conductively connected in addition, the solder layer can also be formed chip and substrate；Further,
Solder layer can also be used as heat transfer, and the heat of chip is transmitted on substrate；Compared with packed LED chip, chip of the invention
Routing is not needed, the spacing between chip is effectively reduced, improves the resolution ratio of display screen.
2, in package substrate, solder layer acts also as the effect of solder, and welding temperature is excessively high and lead to LED core in order to prevent
The dead lamp of piece, solder layer will form eutectic phase transformation at a lower temperature, and therefore, the melt temperature of solder layer is 200-350 DEG C.
3, the production method of a kind of small spacing LED chip provided by the invention, before forming solder layer, to light-emitting junction
The melt temperature of structure progress low-temperature annealing, annealing temperature and solder layer is consistent, so that solder layer and electrode become whole knot
Structure further strengthens the integral strength of chip, and when applying external force to chip, chip does not generate damage.
4, the present invention forms solder layer in electrode surface using material resources or chemical mode, by the manufacturing process of chip
Control solder to amount, to, since array pitch is smaller on substrate, when Surface Welding at High Temperature, be easy to cause when reducing chip welding
The problem of short circuit or the extruding of tin ball cause chip section.
5, the present invention uses material resources or chemical mode that solder-coated in electrode surface, is realized the accurate control of welding, had
The thickness of effect control welding layer solves a problem that sticking up weldering, rosin joint in chip bonding process, welding partially, chip is protected not damaged
It is bad.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the small spacing LED chip of the present invention；
Fig. 2 is the schematic diagram that the small spacing LED chip of the present invention is installed on substrate；
Fig. 3 is the production flow diagram of the small spacing LED chip of the present invention；
Fig. 4 is the production flow diagram of light emitting structure of the present invention.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, the present invention is made into one below in conjunction with attached drawing
Step ground detailed description.
Referring to Fig. 1, a kind of small spacing LED chip provided by the invention, including substrate 10, first on substrate 10
Semiconductor layer 21, active layer 22 and first electrode 31 on the first semiconductor layer 21, the second half on active layer 22
Conductor layer 23, the reflecting layer 41 on the second semiconductor layer 23, the diffusion barrier layer 42 on reflecting layer 41 are set to diffusion
Passivation layer 43 on barrier layer 42, the second electrode 32 on passivation layer 42, the insulating layer 44 in second electrode 32, if
In the seed layer 45 on insulating layer 44, metal support layer 46 in seed layer 45 is set to first electrode 31 and second electrode
Solder layer 50 on 32, the melt temperature of the solder layer 50 are 200-350 DEG C, wherein second electrode 42 runs through the passivation
Layer 43 is simultaneously conductively connected with diffusion barrier layer 42.
The material of substrate 10 can be sapphire, silicon carbide or silicon, or other semiconductor materials, in the present embodiment
Substrate be preferably Sapphire Substrate.
First semiconductor layer 21 provided by the embodiments of the present application and the second semiconductor layer 23 are gallium nitride-based semiconductor,
Active layer 22 is gallium nitride base active layer；In addition, the first semiconductor layer 21 provided by the embodiments of the present application, the second semiconductor layer 23
Material with active layer 22 can also be other materials, be not particularly limited to this application.
Wherein, the first semiconductor layer 21 can be n type semiconductor layer, then the second semiconductor layer 23 is p type semiconductor layer；Or
Person, the first semiconductor layer 21 is p type semiconductor layer, and the second semiconductor layer 23 is n type semiconductor layer, for the first semiconductor layer
21 and second semiconductor layer 23 conduction type, need to be designed according to practical application, this application be not particularly limited.
It should be noted that in the other embodiments of the application, the substrate 10 and first semiconductor layer 21 it
Between be equipped with caching rush layer (not shown).
It should be noted that LED chip of the invention makes light for flip LED chips in order to mention the light-out effect of chip
Line goes out light from the back side of substrate, it is therefore desirable to one layer of reflecting layer 41 be arranged on the surface of the second semiconductor layer 23.Preferably, described
Reflecting layer 40 is metallic reflector.More preferably, the reflecting layer 40 is made of Ag, but not limited to this.
It should be noted that diffusion barrier layer 42 is used to prevent the metal ion in reflecting layer 41 from spreading and forming electric leakage,
Influence the performance of LED chip.In order to protect LED chip, prevents chip from short circuit occurs, make 32 phase of first electrode 31 and second electrode
Mutually insulation, the application form the passivation layer 42 on the surface of the diffusion barrier layer 42.Wherein, the passivation layer 42 is by insulating
Material is made.Specifically, the passivation layer 42 is covered on the surface of diffusion barrier layer 42 and is covered on diffusion barrier layer 42, anti-
The side wall for penetrating layer 41, the second semiconductor layer 23, active layer 22 and the first semiconductor layer 21, so that the side wall of chip be protected
Come, prevent chip from colliding when arranging on substrate and causes short circuit.
The insulating layer 44 is used to get up the solder layer insulation in first electrode 31 and second electrode 32.Preferably, institute
State one or more layers deielectric-coating groove that insulating layer 44 is formed by one or more of silicon nitride, silica, silicon oxynitride.Tool
Body, the insulating layer 44 makes insulated from each other between diffusion barrier layer 42 and metal supporting layer 46.Seed layer 45 by Pd, Pt, Au,
W, one of Ni, Ta, Co, Ti are made, thickness range 100nm-500nm.The material of the metal supporting layer 46 be Ni,
One of Cu, Au, Mo, Mn, Sn, thickness range are about 40 μm -500 μm.
Referring to fig. 2, the present invention is by forming solder layer 50 on the surface of the first electrolysis 31 and second electrode 32, so that solder
Layer 50 with chip be overall structure, in package substrate, by the solder layer 50 can direct fixed chip, prevent chip from existing
It is displaced on substrate 1, is conductively connected in addition, the solder layer 50 can also be formed chip and substrate 1；Further, solder
Layer 50 can also be used as heat transfer, and the heat of chip is transmitted on substrate 1；Compared with packed LED chip, chip of the invention is not
Routing is needed, the spacing between chip is effectively reduced, improves the resolution ratio of display screen.
Preferably, the melt temperature of the solder layer 50 is 200-350 DEG C.In package substrate, solder layer 50 also needs
The effect of solder is served as, welding temperature is excessively high and lead to the dead lamp of LED chip in order to prevent, and solder layer 50 will shape at a lower temperature
At eutectic phase transformation, therefore, the melt temperature of solder layer 50 is 200-350 DEG C.When the melt temperature of solder layer 50 is lower than 200 DEG C
When, melt temperature is too low, and when LED chip works, the heat generated is easy to make solder melting layer, so that LED chip and substrate
It is detached from；When solder layer 50 melt temperature be higher than 350 DEG C, be easy to cause LED chip that dead lamp occurs because temperature is excessively high.It is preferred that
, the solder layer is made of one or more of Au, In, Cu, Ni, Co metal.
It should be noted that the area of the small spacing LED chip of the present invention is not more than 1200 square microns.The application's
LED chip is used for the field of mini/micro chip, therefore the thickness of solder layer 50 is applied to play an important role.
In order to improve welding effect, reduce the spacing between chip, the solder layer 50 with a thickness of 1-50 microns.Work as weldering
When the thickness of the bed of material is less than 1 micron, solder is very little, and the welding is not firm, and chip is easy to fall off from substrate；When the thickness of solder layer
When greater than 50 microns, solder is too many, is easy to overflow from the edge of chip, causes chip short-circuit, increases the spacing between chip.It is excellent
Choosing, the solder layer with a thickness of 5-20 microns.More preferably, the solder layer with a thickness of 10 microns.
In order to further increase welding effect, prevent solder layer from spilling into the edge of chip, the area of the solder layer is small
In the area of first electrode and/or second electrode.
Correspondingly, Fig. 3 is a kind of production flow diagram of small spacing LED chip of the present invention, and the present invention also provides one kind
The production method of small spacing LED chip, comprising:
S101, light emitting structure is proposed, the light emitting structure includes substrate, and the first semiconductor layer on substrate is set to
Active layer and first electrode on first semiconductor layer, the second semiconductor layer on active layer are set to the second semiconductor layer
On second electrode.
Specifically, as shown in figure 4, the production method of the light emitting structure, comprising the following steps:
S201, substrate is provided.
The material of the substrate can be sapphire, silicon carbide or silicon, or other semiconductor materials, the present embodiment
In substrate be preferably Sapphire Substrate.
S202, epitaxial layer is formed over the substrate, the epitaxial layer includes the first semiconductor being sequentially arranged on substrate
Layer, active layer and the second semiconductor layer.
Specifically, the first semiconductor layer provided by the embodiments of the present application and the second semiconductor layer are gallium nitride-based semiconductor
Layer, active layer are gallium nitride base active layer；In addition, the first semiconductor layer provided by the embodiments of the present application, the second semiconductor layer and
The material of active layer can also be other materials, be not particularly limited to this application.
Wherein, the first semiconductor layer can be n type semiconductor layer, then the second semiconductor layer is p type semiconductor layer；Alternatively,
First semiconductor layer is p type semiconductor layer, and the second semiconductor layer is n type semiconductor layer, for the first semiconductor layer and second
The conduction type of semiconductor layer needs to be designed according to practical application, is not particularly limited to this application.
It should be noted that being equipped with caching between the substrate and the epitaxial layer in the other embodiments of the application
Rush layer.
S203, the epitaxial layer is performed etching, forms exposed region, the exposed region through the second semiconductor layer and
Active layer, and extend to the first semiconductor layer.
Specifically, using photoresist or SiO2As exposure mask, and use inductively coupled plasma etching technique or reaction
Ion etching etching technics performs etching the epitaxial layer, through second semiconductor layer and active layer and extends to described
First semiconductor layer exposes first semiconductor layer, to form exposed region.Due to photoresist and SiO2Have
High etching ratio, convenient for etching, so that the etching pattern needed for being formed, improves the precision of etching.In the other embodiments of the application
In, it can also be using the substance of other high etching selection ratios as exposure mask.Exposed region is used to form first electrode.
In order to improve the light extraction efficiency of chip, the side light extraction efficiency of epitaxial layer is improved, the shape of the exposed region is
Inverted trapezoidal.In the other embodiments of the application, the shape of the exposed region can also be polygon.
S204, on the first semiconductor layer deposited metal form first electrode, the deposited metal shape on the second semiconductor layer
At second electrode.
Gold is deposited on the first semiconductor layer of exposed region using electron beam evaporation plating, hot evaporation or magnetron sputtering technique
Belong to, form first electrode, the deposited metal in the first hole forms second electrode.Wherein, first electrode and second electrode by
One or more of Cr, Al, Ti, Pt, Au, Ni, Ag, W metal are made.
S102, low-temperature annealing is carried out to light emitting structure, annealing temperature is 200-350 DEG C.
Since the first electrolysis, the second electrolysis and solder layer are all made of metal, for the ease of by solder layer adequate relief
At on the surface of first electrode and second electrode, the stress between metal is reduced, integral strength between electrode and solder layer is enhanced,
The conduction and heating conduction between electrode and solder layer are improved, before forming solder layer, needs to carry out low temperature to light emitting structure
Annealing, annealing temperature are 200-350 DEG C.The melt temperature of annealing temperature and solder layer is consistent, so that solder layer and electrode
As overall structure, the integral strength of chip is further strengthened, when applying external force to chip, chip does not generate damage
Wound.
S103, solder layer is formed in first electrode and second electrode surface, the melt temperature of the solder layer is 200-350
℃。
It should be noted that solder layer also needs to serve as the effect of solder, in order to prevent welding temperature in package substrate
Excessively high and lead to the dead lamp of LED chip, solder layer will form eutectic phase transformation at a lower temperature, therefore, the melt temperature of solder layer
It is 200-350 DEG C.When the melt temperature of solder layer is lower than 200 DEG C, melt temperature is too low, when LED chip works, generates
Heat is easy to make solder melting layer, so that LED chip and substrate are detached from；When solder layer melt temperature be higher than 350 DEG C, be easy to lead
Cause LED chip that dead lamp occurs because temperature is excessively high.Preferably, the solder layer is by one or more of Au, In, Cu, Ni, Co
Metal is made.
In order to improve welding effect, reduce the spacing between chip, the solder layer with a thickness of 1-50 microns.Work as solder
When the thickness of layer is less than 1 micron, solder is very little, and the welding is not firm, and chip is easy to fall off from substrate；When the thickness of solder layer is big
When 50 microns, solder is too many, is easy to overflow from the edge of chip, causes chip short-circuit, increases the spacing between chip.It is preferred that
, the solder layer with a thickness of 5-20 microns.More preferably, the solder layer with a thickness of 10 microns.
In order to further increase welding effect, prevent solder layer from spilling into the edge of chip, the area of the solder layer is small
In the area of first electrode and/or second electrode.
Specifically, the present invention forms solder layer on the surface of electrode by the way of physically or chemically.
Wherein, the mode of physics includes:
Solder layer is formed on the surface of first electrode and second electrode by the way of electron beam evaporation or magnetron sputtering；
Solder layer is formed on the surface of first electrode and second electrode by the way of surface coating, ion implanting.
Chemistry mode include:
Solder layer is formed on the surface of first electrode and second electrode by the way of ion chemistry plating.
The present invention forms solder layer in electrode surface using aforesaid way, by controlling solder in the manufacturing process of chip
To amount, to, since array pitch is smaller on substrate, when Surface Welding at High Temperature, be easy to cause short circuit or tin when reducing chip welding
The problem of ball extruding causes chip section.
In addition, solder-coated is realized into the accurate control of welding in electrode surface through the above way, effectively control welding
The thickness of layer solves a problem that sticking up weldering, rosin joint in chip bonding process, welding partially, chip is protected not to be damaged.
In the other embodiments of the application, in order to improve the light extraction efficiency of chip, after forming the second semiconductor layer,
It is formed before electrode, forms reflecting layer on the second semiconductor layer, then using electron beam evaporation process in the reflection layer surface
Diffusion barrier layer is formed, leakage current is formed to prevent the metal ion in metallic reflector from spreading, influences the property of LED chip
Can, passivation layer is formed on the diffusion barrier；After forming passivation layer, first electrode is formed on the first semiconductor layer, is being passivated
Second electrode is formed on layer, then forms insulating layer on the second electrode again.The insulating layer can by silicon nitride, silica,
One or more layers deielectric-coating that one or more of silicon oxynitride is formed is constituted.Specifically, using plasma enhancing chemistry
Gas-phase deposition, in the surface depositing insulating layer of diffusion barrier layer, make metal supporting layer of reflecting layer and subsequent production etc. it
Between it is insulated from each other.
After forming the insulating layer, it is first formed uniformly using electron beam evaporation or magnetron sputtering technique on the surface of insulating layer
Fine and close metal seed layer, and sufficiently annealed, to guarantee the good Ohmic contact of metal seed layer, make the metal to be formed
Electric conductivity between seed layer and the metal supporting layer being subsequently formed is more excellent, wherein the metal seed layer can by Pd,
The alloy of one of Pt, Au, W, Ni, Ta, Co, Ti or various metals is constituted, and thickness range is about 100nm-500nm.Gold
After category seed layer completes, metal supporting layer is formed on the surface of metal seed layer by electroplating technology.Wherein, the metal
The alloy that the material of supporting layer can be constituted for one or more of Ni, Cu, Au, Mo, Mn, Sn, thickness range is about 40 μ
m-500μm.In plating metal supporting layer, can by adjusting rate of deposition and plating solution composition, formed different structure, ingredient and
The metal supporting layer of hardness, to eliminate due to light emitting structure, diffusion barrier layer and insulating layer, metal seed layer and metal branch
It supports between layer, the internal stress generated since the coefficient of expansion is different.After plating forms metal supporting layer, low-temperature annealing 10min-
100min further eliminates the internal stress between dielectric layer, reduces in subsequent technique after the first substrate desquamation, due to internal stress
The metal layer warpage of generation.After forming metal supporting layer, the metal supporting layer is ground and polished, to adapt to subsequent work
The needs of skill.
Above disclosed is only a preferred embodiment of the present invention, cannot limit the power of the present invention with this certainly
Sharp range, therefore equivalent changes made in accordance with the claims of the present invention, are still within the scope of the present invention.
Claims (10)
1. a kind of small spacing LED chip, including substrate, the first semiconductor layer on substrate are set to the first semiconductor layer
On active layer and first electrode, the second semiconductor layer on active layer, the reflecting layer on the second semiconductor layer, if
In the diffusion barrier layer on reflecting layer, passivation layer on diffusion barrier layer, the second electrode on passivation layer is set to the
Insulating layer on two electrodes, the seed layer on insulating layer, the metal support layer in seed layer, be set to first electrode and
Solder layer in second electrode, the melt temperature of the solder layer are 200-350 DEG C, wherein second electrode runs through the passivation
Layer is simultaneously conductively connected with diffusion barrier layer.
2. small spacing LED chip as described in claim 1, which is characterized in that the solder layer with a thickness of 1-50 microns.
3. small spacing LED chip as claimed in claim 2, which is characterized in that the solder layer with a thickness of 5-20 microns.
4. small spacing LED chip as described in claim 1, which is characterized in that the area of the solder layer is less than the first electricity
The area of pole and/or second electrode.
5. small spacing LED chip as described in claim 1, which is characterized in that its area is not more than 1200 square microns.
6. a kind of production method of small spacing LED chip, comprising:
It is proposed light emitting structure, the light emitting structure includes substrate, the first semiconductor layer on substrate, is set to the first semiconductor
Active layer and first electrode on layer, the second semiconductor layer on active layer, the second electricity on the second semiconductor layer
Pole；
Low-temperature annealing is carried out to light emitting structure, annealing temperature is 200-350 DEG C；
Solder layer is formed in first electrode and second electrode surface, the melt temperature of the solder layer is 200-350 DEG C.
7. the production method of small spacing LED chip as claimed in claim 6, which is characterized in that the thickness of the solder layer
It is 1-50 microns.
8. the production method of small spacing LED chip as claimed in claim 6, which is characterized in that the solder layer by Au,
One or more of In, Cu, Ni, Co metal are made.
9. the production method of small spacing LED chip as claimed in claim 6, which is characterized in that using electron beam evaporation or
Surface deposit solder layer of person's magnetron sputtering mode in first electrode and second electrode.
10. the production method of small spacing LED chip as claimed in claim 6, which is characterized in that using ion chemistry plating
Mode forms solder layer on the surface of first electrode and second electrode.
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