CN108942572A

CN108942572A - Silicon single crystal rod multiplexing position processing method and silicon single crystal rod Multi-position processing machine

Info

Publication number: CN108942572A
Application number: CN201710359458.XA
Authority: CN
Inventors: 卢建伟; 李鑫
Original assignee: Zhejiang Ji Ying Precision Machinery Co Ltd
Current assignee: Zhejiang Ji Ying Precision Machinery Co Ltd
Priority date: 2017-05-19
Filing date: 2017-05-19
Publication date: 2018-12-07
Anticipated expiration: 2037-05-19
Also published as: CN108942572B

Abstract

This application discloses a kind of silicon single crystal rod multiplexing position processing method and silicon single crystal rod Multi-position processing machines, this method is applied to the circle of contact and roughly grinds in the silicon single crystal rod multiplexing processing machine of device, comprising steps of the silicon single crystal rod to be processed is placed in the circle of contact and roughly grinds the operation area of device；The circle of contact and corase grinding device is enabled to carry out circle of contact operation to first pair of the silicon single crystal rod and second pair connection faceted pebble；The circle of contact and corase grinding device is enabled to carry out corase grinding operation to first pair of the silicon single crystal rod and second pair of side.Using silicon single crystal rod multiplexing position processing method disclosed in the present application and silicon single crystal rod Multi-position processing machine, silicon single crystal rod can be carried out to include the circle of contact and the multistation processing operation for roughly grinding operation, production efficiency can be improved and improve the quality of silicon single crystal rod processing operation.

Description

Silicon single crystal rod multiplexing position processing method and silicon single crystal rod Multi-position processing machine

Technical field

This application involves silicon workpiece processing technologies, more particularly to silicon single crystal rod multiplexing position processing method and monocrystalline silicon Stick Multi-position processing machine.

Background technique

Currently, with attention and opening that society utilizes green regenerative energy sources, photovoltaic solar power field is more next More paid attention to and is developed.In field of photovoltaic power generation, common crystal silicon solar energy battery be made of the high quality silicon on piece, This silicon wafer is formed after the silicon ingot for lifting or casting by multi-thread saw cut and following process.

The production process of existing silicon wafer, by taking single crystal silicon product as an example, generally, rough flow chart can include: first make Truncation operation is carried out to form the short silicon rod of multistage to long silicon rod originally with silicon rod shear；After the completion of truncation, and use silicon rod Excavation machine forms silicon single crystal rod after carrying out evolution operation to the short silicon rod after truncation；Round as a ball, mill is carried out to each silicon single crystal rod again Face etc. processes operation, so that the surface shaping of silicon single crystal rod reaches corresponding flatness and size tolerance requirements；It is subsequent to reuse Slicer carries out slice operation to silicon single crystal rod, then obtains monocrystalline silicon piece.

But, in the related art, round as a ball and flour milling processing operation, flow chart complexity and effect are carried out to monocrystalline silicon Not good enough, operation needed for (such as grinding, chamfering, barreling or round as a ball etc.) is independent arrangement in addition, each procedures, accordingly Processing unit (plant) is dispersed in the different production areas of different production unit or workshop or workshop, executes different processes and makees The conversion of the workpiece of industry needs to carry out carrying allotment, and may require to carry out pretreatment work before executing each procedures Make, in this way, process is many and diverse, inefficiency, and easily influence the quality of silicon single crystal rod processing operation.

Apply for content

In view of the disadvantages of the above existing the relevant technologies, the purpose of the application is to disclose a kind of silicon single crystal rod multistation Processing method and silicon single crystal rod Multi-position processing machine are round as a ball in execution for solving silicon single crystal rod present in existing the relevant technologies And flour milling flow chart is complicated, less effective and multistation process the problems such as operation is coordinated.

To achieve the above object and other purposes, the application disclose a kind of silicon single crystal rod multistation processing side on the one hand Method, applied to the circle of contact and roughly grind device silicon single crystal rod multiplexing processing machine in, the silicon single crystal rod multiplexing position processing method The following steps are included: the silicon single crystal rod to be processed is placed in the circle of contact and roughly grinds the operation area of device；Enable the circle of contact And corase grinding device carries out circle of contact operation to first pair of the silicon single crystal rod and second pair connection faceted pebble；Enable the circle of contact and corase grinding Device carries out corase grinding operation to first pair of the silicon single crystal rod and second pair of side.

In some embodiments, described to enable the circle of contact and roughly grind device to first pair of the silicon single crystal rod and the Two pairs of connection faceted pebbles carry out circle of contact operations include: enable the circle of contact and corase grinding device respectively first pair to the silicon single crystal rod and Operation is at least slightly cut in second pair of connection faceted pebble progress three times.

In some embodiments, described to enable the circle of contact and corase grinding device to first pair of the silicon single crystal rod and second Operation slightly at least is cut three times the following steps are included: enabling the silicon single crystal rod to the one pair of them connection faceted pebble progress in connection faceted pebble In a pair of of connection faceted pebble turn to and cut position slightly initially to correspond to the circle of contact and roughly grind the first grinding tool of a pair in device；Enable institute The first grinding tool is stated the pair of connection faceted pebble is carried out slightly to cut operation for the first time；Enable the silicon single crystal rod is relatively described initially slightly to cut Position rotates forward the first deflection angle, and first grinding tool is enabled slightly to be cut work for the second time to first pair of connection faceted pebble Industry；It enables the silicon single crystal rod is relatively described initially slightly to cut the second deflection angle of position backwards rotation, enables first grinding tool to institute A pair of of connection faceted pebble is stated to carry out slightly cutting operation for the third time.

In some embodiments, the range of first deflection angle is 3 ° to 7 °, the model of second deflection angle Enclose is 3 ° to 7 °.

In some embodiments, described to enable the circle of contact and roughly grind device to first pair of the silicon single crystal rod and the A pair of of side in two pairs of sides carries out corase grinding operation the following steps are included: a pair of of side in silicon single crystal rod is enabled to turn to initially Position is roughly ground to correspond to a pair of first grinding tool；First grinding tool is enabled to carry out corase grinding operation to the pair of side.

In some embodiments, the silicon single crystal rod Multi-position processing machine further includes round as a ball and fine grinding device；Wherein, institute State silicon single crystal rod multiplexing position processing method further include: be placed in the silicon single crystal rod to be processed described round as a ball and fine grinding device Operation area；Described round as a ball and fine grinding device is enabled to carry out round as a ball operation to the connection faceted pebble of the silicon single crystal rod；Enable it is described round as a ball and Fine grinding device carries out fine grinding operation to first pair of the silicon single crystal rod and second pair of side.

In some embodiments, it is described enable described round as a ball and fine grinding device to the connection faceted pebble of the silicon single crystal rod into The round as a ball operation of row is the following steps are included: adjust the grinding spacing of the second grinding tool of a pair in described round as a ball and fine grinding device；Rotation The silicon single crystal rod enables second grinding tool carry out round as a ball operation to the connection faceted pebble of the silicon single crystal rod.

In some embodiments, described to enable described round as a ball and fine grinding device to first pair of the silicon single crystal rod and A pair of of side in two pairs of sides carries out fine grinding operation the following steps are included: a pair of of side in silicon single crystal rod is enabled to turn to initially Position is refined to correspond to a pair of second grinding tool；Second grinding tool is enabled to carry out fine grinding operation to the pair of side.

In some embodiments, the silicon single crystal rod multiplexing position processing method further includes to the monocrystalline silicon to be processed Stick carries out the step of correction operation.

The application discloses a kind of silicon single crystal rod using silicon single crystal rod multiplexing position processing method above-mentioned on the other hand Multi-position processing machine.

Detailed description of the invention

Fig. 1 is shown as stereochemical structure of the silicon single crystal rod Multi-position processing machine under a certain visual angle in the application embodiment and shows It is intended to.

Fig. 2 is shown as the top view of silicon single crystal rod Multi-position processing machine in the application embodiment.

Fig. 3 is shown as the side view of silicon single crystal rod Multi-position processing machine in the application embodiment.

Fig. 4 is shown as the structure of silicon rod clamping piece in one embodiment in the application silicon single crystal rod Multi-position processing machine and shows It is intended to.

Fig. 5 is shown as the structure of silicon rod clamping piece in another embodiment in the application silicon single crystal rod Multi-position processing machine Schematic diagram.

Fig. 6 is shown as the rearview of silicon rod clamper in the application silicon single crystal rod Multi-position processing machine.

Fig. 7 is shown as the flow diagram in one embodiment of the application silicon single crystal rod multiplexing position processing method.

Fig. 8 is shown as refinement flow diagram of the Fig. 7 in an alternative embodiment.

Fig. 9 is shown as refinement flow diagram of the Fig. 7 in another alternative embodiment.

Figure 10 is shown as the flow diagram in another embodiment of the application silicon single crystal rod multiplexing position processing method.

Figure 11 is shown as refinement flow diagram of the Figure 10 in an alternative embodiment.

Figure 12 is shown as refinement flow diagram of the Figure 10 in another alternative embodiment.

The process signal in yet another embodiment that Figure 13 is shown as the application silicon single crystal rod multiplexing position processing method Figure.

Figure 14 is shown as silicon single crystal rod and is straightened the status diagram being placed on silicon rod plummer.

Figure 15 is shown as the status diagram that silicon single crystal rod is clamped by silicon rod clamper.

Figure 16 is shown as the status diagram that silicon single crystal rod is placed in pre-treatment job area by commutation carrier.

Figure 17 is shown as the status diagram that height testing instrument detection is located at silicon single crystal rod height on handling plummer.

Figure 18 and Figure 19 is shown as the status diagram of flatness detector detection silicon single crystal rod planar smoothness.

Figure 20 is shown as carrying out silicon single crystal rod in the schematic diagram of correction operation.

Figure 21 shows the state being loaded to the first silicon single crystal rod progress circle of contact and corase grinding operation and the second silicon single crystal rod Schematic diagram.

Figure 22 is shown as state change schematic diagram of the silicon single crystal rod in circle of contact processing operation.

Figure 23 is shown as state change schematic diagram of the silicon single crystal rod in corase grinding processing operation.

Figure 24 shows that the silicon single crystal rod Multi-position processing machine of the application carries out processing operation to three silicon single crystal rods simultaneously Status diagram.

Figure 25 is shown as status diagram of the silicon single crystal rod in round as a ball processing operation.

Figure 26 is shown as status diagram of the silicon single crystal rod in fine grinding operation.

Figure 27 is shown as completing the status diagram of the silicon single crystal rod discharging of processing operation.

It is the status diagram that three stations are processed in operation that Figure 28, which is shown as the application silicon single crystal rod Multi-position processing machine,.

Specific embodiment

Illustrate presently filed embodiment below by way of specific specific example, those skilled in the art can be by this specification Disclosed content understands other advantages and effect of the application easily.The application can also pass through in addition different specific realities The mode of applying is embodied or practiced, the various details in this specification can also based on different viewpoints and application, without departing from Various modifications or alterations are carried out under spirit herein.

It should be noted that this specification structure depicted in this specification institute accompanying drawings, ratio, size etc., only to cooperate The bright revealed content of book is not limited to the enforceable limit of the application so that those skilled in the art understands and reads Fixed condition, therefore do not have technical essential meaning, the modification of any structure, the change of proportionate relationship or the adjustment of size, not It influences still fall in techniques disclosed in this application content under the effect of the application can be generated and the purpose that can reach and obtain In the range of capable of covering.Meanwhile it is cited such as "upper", "lower", "left", "right", " centre " and " one " in this specification Term is merely convenient to being illustrated for narration, rather than to limit the enforceable range of the application, the change of relativeness or tune It is whole, under the content of no substantial changes in technology, when being also considered as the enforceable scope of the application.

It please refers to Fig.1 to Fig.3, is shown as the structure of the application silicon single crystal rod Multi-position processing machine in one embodiment Schematic diagram, wherein Fig. 1 is that stereochemical structure of the silicon single crystal rod Multi-position processing machine under a certain visual angle is shown in the application embodiment It is intended to, Fig. 2 is the top view of silicon single crystal rod Multi-position processing machine in the application embodiment, and Fig. 3 is in the application embodiment The side view of silicon single crystal rod Multi-position processing machine.In one embodiment, the application silicon single crystal rod Multi-position processing machine is to be used for Processing operation is carried out to silicon single crystal rod, herein, the silicon single crystal rod is class rectangle silicon rod.

For silicon single crystal rod, the formation process of silicon single crystal rod can include: first using silicon rod shear to length originally Silicon rod carries out truncation operation to form the short silicon rod of multistage；After the completion of truncation, and use squaring silicon bar machine to the short silicon rod after truncation Carry out the silicon single crystal rod that evolution operation Formation cross-section is in class rectangle.Wherein, long silicon rod originally is carried out using silicon rod shear Truncation operation with formed the specific implementation of the short silicon rod of multistage can refer to for example, CN105856445A, CN105946127A, And the patent publication us such as CN105196433A, using squaring silicon bar machine to shape after the short silicon rod progress evolution operation after truncation It then can refer to the patent publication us such as CN105818285A in the specific embodiment of the silicon single crystal rod of class rectangle at section.But it is single The formation process of crystalline silicon rod simultaneously loses and is limited to aforementioned techniques, and in optional example, the formation process of silicon single crystal rod may also include that elder generation Long silicon single crystal rod of the evolution operation with Formation cross-section in class rectangle is carried out to long silicon rod originally using total silicon stick excavation machine；Evolution After the completion, and truncation operation is carried out to the long silicon single crystal rod after evolution using silicon rod shear and forms short crystalline silicon rod.Wherein, above-mentioned It is middle using total silicon stick excavation machine to originally long silicon rod carry out evolution operation with formed be in class rectangle long silicon single crystal rod it is specific Implementation can refer to the patent publication us such as example, CN106003443A.

It is formed after silicon single crystal rod, corresponding following process operation must be all carried out to it, these following process operations can The for example, circle of contact, corase grinding, round as a ball and fine grinding etc., and these following process operations can pass through monocrystalline silicon disclosed in the present application Stick Multi-position processing machine is implemented.

In conjunction with Fig. 1 to Fig. 3, the application silicon single crystal rod Multi-position processing machine includes: base 1, silicon rod handler 2, the circle of contact And corase grinding device 3, round as a ball and fine grinding device 4 and silicon rod conversion equipment 5.

Main element of the base 1 as the application silicon single crystal rod Multi-position processing machine has silicon rod processing platform, wherein The silicon rod processing platform can process the specific job content of operation according to silicon single crystal rod and be divided into multiple operation areas.Specifically Ground, in the present embodiment, the silicon rod processing platform include at least pre-treatment job area, the first operation area and the second operation Area.

Silicon rod conversion equipment 5 is set to the centered region of the silicon rod processing platform, for that will be loaded by silicon rod handler 2 Pre-treatment job area, first operation area and second operation area of the silicon single crystal rod 100 to come up on the silicon rod processing platform Between convert.In one embodiment, 5 rotary setting of silicon rod conversion equipment is on the silicon rod processing platform, silicon rod converting means Set 5 include: disc or circular ring shape conveying ontology 51；Silicon rod positioning mechanism 53 is set on conveying ontology 51, for monocrystalline Silicon rod 100 is positioned；Driving mechanism is converted for driving the conveying rotation of ontology 51 to drive silicon rod positioning mechanism 53 to be positioned Silicon single crystal rod 100 convert position.

As previously mentioned, silicon rod processing platform in one embodiment include pre-treatment job area, the first operation area, with And second operation area, to be adapted with these operation areas, the quantity for conveying the silicon rod positioning mechanism 53 on ontology 51 be may be configured as Three, each silicon rod positioning mechanism 53 can position a silicon single crystal rod.Further, 53 liang of these three silicon rod positioning mechanisms Set angle is also consistent with the angular distribution of three operation areas between any two between two.In this way, working as some silicon rod Positioning mechanism 53 correspond to some operation area when, inevitably, other two silicon rod positioning mechanisms 53 be also respectively with other two A operation area is corresponding.In this way, in continuous productive process, any moment, when being located one on each silicon rod positioning mechanism 53 A silicon single crystal rod and when silicon rod positioning mechanism 53 is corresponding with operation area, then these silicon single crystal rods are located in corresponding a certain work Corresponding processing operation is executed at industry area, such as: the silicon single crystal rod positioned at pre-treatment job area can carry out pre-treatment job, position Silicon single crystal rod in the first operation area can carry out the circle of contact and corase grinding operation, and the silicon single crystal rod positioned at the second operation area can carry out round as a ball And fine grinding operation.In an alternative embodiment, the pre-treatment job area on the silicon rod processing platform, the first operation area, with And second operation area be between any two in 120 ° of distributions, be on the conveying ontology 51 of disc or circular ring shape correspondingly therefore Three silicon rod positioning mechanisms 53 between any two also in 120 ° distribution.Certainly, the quantity of silicon rod positioning mechanism 53 can be according to reality Demand is changed and is not limited thereto, for example, what the quantity of silicon rod positioning mechanism 53 can be arranged according to silicon rod processing platform Depending on the quantity of operation area.

In one embodiment, silicon rod positioning mechanism 53 is more can include: rotation plummer 531, rotary compacting device 533, Lifting drive (not indicated in figure) and rotation drive device (not indicated in figure).

Rotation plummer 531 is set in silicon rod conversion equipment 5 on the conveying ontology 51 of disc or circular ring shape, for holding It carries silicon single crystal rod 100 and silicon single crystal rod 100 is placed to erect, that is, the bottom of silicon single crystal rod 100 is seated rotation plummer On 531.In the present embodiment, plummer 531 and disc or the conveying sheet of circular ring shape in silicon rod conversion equipment 531 are rotated Body 51 rotates together when rotating.Particularly, rotation plummer 531 can also be designed as can spinning motion, such as rotation plummer 531 Have shaft to realize spinning motion relative to conveying ontology 51, in this way, when rotation 531 support of plummer silicon single crystal rod 100 Later, rotating plummer 531 and silicon single crystal rod 100 thereon can rotate together.Further, it rotates and is used in plummer 531 There is damping in the contact surface contacted with silicon single crystal rod 100, to provide the frictional force that silicon single crystal rod 100 can be driven certain.Rotation Plummer 531 is adapted to silicon single crystal rod 100, and in an alternative embodiment, rotation plummer 531 be can be and silicon single crystal rod 100 The compatible round plummer of sectional dimension.

Rotary compacting device 533 is relatively arranged on the top of rotation plummer 531, for pressing in silicon single crystal rod 100 Top is to compress silicon single crystal rod 100.Rotary compacting device 533 can further comprise the support 532 of activity setting and be set to The press movable block 534 of 532 bottom of support.Support 532 is movably set on a central mounting rack 13, the center mounting rack 13 It is to be located at the middle section of conveying ontology 51 and be followed by conveying ontology 51 to rotate together.In specific implementation, central mounting rack 13 can include at least the six roots of sensation mounting post 131 being vertically arranged, and be divided into three groups in a manner of every group two, wherein two in every group Root mounting post 131 is for activity one support 532 of setting, each support 532 is by lifting drive driving and along peace It fills column 131 and makees elevating movement.In an alternative embodiment, mounting post 131 is the relatively smooth cylindrical structure in surface, necessary When, lubricating oil can be coated on 131 surface of mounting post, in favor of the smoothness of 532 elevating movement of support.Extraly, mounting post 131 On can be arranged with protective sleeve, to be protected mounting post 131, avoid dust, sundries etc. pollute.Press movable block 534 with Silicon single crystal rod 100 is adapted to, and in an alternative embodiment, press movable block 534 can be the sectional dimension phase with silicon single crystal rod 100 The patty briquetting of adaptation.Further, 534 axis of press movable block in rotary compacting device 533 turns to be connected to support 532 And can relative seat 532 and can rotate.

It lives in the foregoing it is found that rotating plummer 531 and being designed to the press in spinning motion and rotary compacting device 533 534 axis of motion block turns to be connected to support 532, therefore, rotates plummer 531 or press 534 linkage of movable block and drives in a rotation Dynamic device.In one case, when rotation plummer 531 is in linkage with a rotation drive device, by 531 conduct of rotation plummer Active rotatable parts and press movable block 534 then as driven rotation component；In another scenario, when press movable block 534 When being in linkage with a rotation drive device, rotated by press movable block 534 as active rotatable parts plummer 531 then as from Turn dynamic component.

In practical applications, rotary compacting device 533 can cooperate with the rotation plummer 531 under it, specifically, when By silicon single crystal rod 100 it is vertical be placed in rotation plummer 531 on after, by lifting drive driving support 532 along installation Column 131 makees descending motion until the press movable block 534 on support 532 presses on the top of silicon single crystal rod 100.It is subsequent, it is needing 534 turns of movable block of rotation plummer 531 or press when rotating silicon single crystal rod 100, by rotation drive device driving linkage It is dynamic, using rotation plummer 531, silicon single crystal rod 100 and the mutual frictional force of movable block 534 is pressed, takes advantage of a situation and drives list Crystalline silicon rod 100 also rotates together, the adjustment of work surface or operating area in silicon single crystal rod 100 is realized, so as to monocrystalline silicon Work surface adjusted or operating area carry out processing operation in stick 100.The velocity of rotation and rotational angle of silicon single crystal rod 100 It can be controlled by rotation drive device.In specific implementation, lifting drive may be, for example, cylinder or lifting motor, rotation Rotary driving device then may be, for example, rotating electric machine.

The conveying ontology 51 of disc or circular ring shape is controllable by the driving of conversion driving mechanism and rotates, and passes through disc Or the conveying ontology 51 of circular ring shape rotation and realize conveying ontology 51 on silicon rod positioning mechanism 53 and by silicon rod positioning mechanism 53 silicon single crystal rods 100 positioned are converted between different operation areas.In one embodiment, the conversion driving machine Structure further comprises: conversion tooth band, set on disc or the side of the conveying ontology 51 of circular ring shape；Driving motor and connection driving Motor and be driven motor-driven linkage structure, on the silicon rod processing platform of base 1, the linkage structure includes and institute State the rotate gear that conversion tooth band is meshed.In this way, the rotate gear the driving motor driving under drive disc or Conveying ontology 51 rotation of circular ring shape is to drive silicon rod positioning mechanism 53 and the conversion of silicon single crystal rod 100 thereon to other operation areas Conveying is completed, the driving motor can be servo motor.

Silicon rod handler 2 is set to the pre-treatment job area of the silicon rod processing platform, for by monocrystalline silicon to be processed Stick load to the pre-treatment job area of silicon rod processing platform and will be processed after silicon single crystal rod from the pre- of silicon rod processing platform Handle operation area unloading.Further, silicon rod handler 2 is used to load to silicon rod to process by silicon single crystal rod to be processed and put down The pre-treatment job area of platform and will be processed after silicon single crystal rod it is specific from the unloading of the pre-treatment job area of silicon rod processing platform It refers to for silicon single crystal rod to be processed to be loaded to the pre-treatment job area pair into conveying ontology 51 with silicon rod processing platform Pre- place of the silicon single crystal rod from conveying ontology 51 with silicon rod processing platform on the rotation plummer 531 answered and after will be processed It is unloaded on the corresponding rotation plummer 531 in reason operation area.

In one embodiment, silicon rod handler 2 further includes: silicon rod loads and unloads position, and commutate carrier 23 and silicon rod folder Tool 25.

Silicon rod handling position is equipped with the silicon rod plummer 21 vertically placed for carrying silicon single crystal rod 100；Commutate carrier 23 For making commutation movement；Silicon rod clamper 25 is set to the first mounting surface of commutation carrier 23.It is commutated by driving commutation carrier 23 Movement so that the silicon rod clamper 25 of commutation carrier 23 the silicon rod load and unload between position and the pre-treatment job area conversion with Transfer silicon single crystal rod 100.

Silicon rod handler is arranged on a bottom installation structure, and the bottom installation structure is convexly equipped in base 1.Bottom peace The side of assembling structure is then used as silicon rod to load and unload position, is equipped with silicon rod plummer 21, silicon rod plummer 21 on silicon rod handling position For carrying silicon single crystal rod 100.It in a preferred embodiment, is the clamping convenient for silicon rod clamper 25, if can to hold The silicon single crystal rod 100 of load can adjust position in due course to adapt to silicon rod clamper 25, and therefore, silicon rod plummer 21 is rotatably to set Meter, silicon rod plummer 21 are equipped with rotation axis and driving motor, and silicon rod plummer 21 is under the control of driving motor around rotation axis It rotates to adjust the angle of the silicon single crystal rod 100 on silicon rod plummer 21.In addition to this, in an alternative embodiment, silicon rod is held Lift design more can be used in microscope carrier 21, that is, can make expanding-contracting action after the rotation axis of 21 lower section of silicon rod plummer is controlled with band Dynamic silicon rod plummer 21 makees elevating movement, so as to adjust the height of the silicon single crystal rod on silicon rod plummer 21.

Commutation carrier 23 is set on bottom installation structure and can the work commutation movement of opposing floor portion mounting structure.Implement one In mode, commutation carrier 23 is that commutation movement is realized by a reversing mechanism.So that commutation carrier 23 realizes commutation movement Reversing mechanism may include rotation axis and reversing motor, commutation carrier 23 is tied by bottom installation of the rotation axis axis connection in it under Structure.When implementing divertical motion, then start reversing motor, the rotation of driving rotation axis is to drive commutation carrier 23 to rotate to realize Commutation movement.Aforementioned driving rotation axis rotation may be designed as one-directional rotation and be also designed to Double-directional rotary, and the one-directional rotation can It for example, rotates clockwise or rotates counterclockwise, the Double-directional rotary then may be, for example, to rotate clockwise and rotate counterclockwise.Separately Outside, the angle of driving rotation axis rotation can be set according to actual configuration of silicon rod handler etc., wherein the silicon rod handling dress The actual configuration set may be, for example, to drive the angle of rotation axis rotation that can be loaded and unloaded between position and pre-treatment job area according to silicon rod Positional relationship or commutate carrier 23 structure etc..231 central location of commutation pedestal and rotation axis in commutation carrier 23 connect Connect, generally, the structure of disk can be used in the shape of commutation pedestal 231, but is not limited thereto, can also be used square plate or Oval plate.

In addition, due to Design of Mechanical Structure, silicon rod loads and unloads position and pre-treatment job area in the case of necessity Between positional relationship be not able to satisfy commutation carrier 23 by commutate movement enable commutation carrier 23 on silicon rod clamper 25 just Correspond to silicon rod loading place and pre-treatment job area well, at this point, silicon rod handler may also include translation mechanism, is changed for driving Make the translational motion towards/away from pre-treatment job area to 23 opposing floor portion mounting structure of carrier.In one embodiment, silicon rod Handler is separately provided with a conversion chassis 241 between commutation carrier 23 and bottom installation structure, wherein commutation carrier 23 is logical Rotation axis axis connection is crossed in conversion chassis 241, conversion chassis 241 is set up on bottom installation structure by translation mechanism.

In a kind of achievable mode, the translation mechanism further comprises: translation rack rails is laid in along translation direction On bottom installation structure；Rotate gear is translated, be set on conversion chassis 241 and is meshed with translation rack rails；Driven in translation electricity Machine (is not illustrated), for driving shiftable gear to be rotated such that conversion chassis 241 and commutation carrier 23 thereon along flat Rack rails is moved to retreat relative to bottom installation structure.

In practical applications, translation rack rails may be, for example, at least one rack gear with certain length, this at least one tooth Item is mountable on bottom installation structure.To convert chassis 241 and commutation carrier 23 thereon more stablely along translation Direction is mobile, can configure at least two shiftable gears, the setting of at least two shiftable gear intervals for each rack gear.Translate tooth Wheel can be sequentially connected by transmission shaft and pan drive motor.Pan drive motor may be, for example, servo motor.

In practical applications, as previously mentioned, the translation mechanism includes translation rack rails, shiftable gear and driven in translation electricity Machine is driven shiftable gear to be rotated such that conversion chassis 241 and commutation carrier 23 thereon along flat by pan drive motor Move the purpose that rack rails is mobile, and realization is precisely moved.Above-mentioned translation mechanism is only one to illustrate, but be not intended to limit this Shen Please, ground, in other alternative embodiments, the translation mechanism are changed can include: lead screw and servo motor, lead screw have high-precision Degree, invertibity and efficient feature improve conversion chassis 241 and thereon in this way, pass through the cooperation of servo motor and lead screw Commutate the horizontal precision advanced in a transverse direction of carrier 23, that is, so that conversion chassis 241 and commutation carrier 23 thereon exist The distance for being translated towards horizontal traveling is more accurate.

Further, the translation mechanism may also include translating rails and translation slide, wherein translating rails are along translation side To the bottom for being laid in conversion chassis 241, translation slide is installed on bottom installation structure, passes through translating rails and translation slide Cooperation, auxiliary conversion chassis 241 and commutation carrier 23 thereon are moved along translation direction.In practical applications, by translating Driving motor drives the shiftable gear to be rotated such that conversion chassis 241 and commutation carrier 23 thereon are moved along translation rack rails It is dynamic, meanwhile, as the translating rails and translation slide of auxiliary equipment, translating rails slide in translation slide, turn to realize It refoots disk 241 and commutation carrier 23 thereon is moved along translation direction.Change ground, in other embodiments, the translation Mechanism may also include translating rails and translator slider, wherein translating rails are laid on bottom installation structure along translation direction, are put down Move slide be installed on conversion chassis 241 bottom, by the cooperation of translating rails and translator slider may make translator slider along Translating rails sliding, so that conversion chassis 241 and commutation carrier 23 thereon be assisted to move along translation direction.

Silicon rod clamper 25 is for clamping silicon single crystal rod.In one embodiment, silicon rod clamper 25 includes: fixture installation part 251 and at least two silicon rod clamping pieces 253.Fixture installation part 251 is set on commutation carrier 23.At least two silicon rod clamping pieces 253 are arranged along 251 spacing of fixture installation part.In one embodiment, the Workpiece carrier platform at aforementioned silicon rod handling position Silicon single crystal rod can be carried and erect placement, therefore, at least two silicon rod clamping pieces 253 are vertical interval setting, that is, at least two silicon Stick clamping piece 253 is setting up and down.

In specific implementation, each silicon rod clamping piece 253 is further included: clamp arm mounting base 252 and at least two folders Arm 254, wherein clamp arm mounting base 252 is provided on fixture installation part 251, and at least two clamp arm 254 are to be movably arranged at clamp arm peace It fills on seat 252.It is in class rectangle in view of the section as silicon single crystal rod to be processed more, therefore, in one embodiment, silicon rod folder Generally speaking gripping member 253 is square workpiece fixture, the clamp arm 254 of composition silicon rod clamping piece 253 is two of symmetric design, individually Clamp arm 254 is designed as having single clamped flat face (referring to fig. 4) or dog-ear clamping face (referring to Fig. 5), the dog-ear clamping face It is made of continuous two clamped flat faces, there is a dog-ear between two clamped flat faces.Certainly, flat in clamp arm 254 On straight clamping face can also additional cushion, caused during clamping silicon single crystal rod to silicon single crystal rod surface for avoiding Damage, play protection silicon single crystal rod good result.Extraly, the adjusting that centers can more be had both using silicon rod clamping piece 253 Effect.

Under general scenario, the clamp arm 254 in silicon rod clamping piece 253 is under clamping state, folder that two clamp arm 254 are constituted The center for holding space is coincided with the center of silicon rod plummer 21.Therefore, with the silicon rod with clamp arm 254 shown in fig. 5 For clamping piece 253, the silicon single crystal rod of placement is erect on using 253 de-clamping silicon single crystal rod plummer 21 of silicon rod clamping piece When 100, the clamp arm 254 in silicon rod clamping piece 253 is shunk, and is resisted against silicon single crystal rod 100 by the dog-ear clamping face in clamp arm 254, Wherein, two clamped flat faces in the dog-ear clamping face correspond respectively to two sides adjacent in silicon single crystal rod 100.? During clamp arm 254 shrinks simultaneously clamping silicon single crystal rod 100, silicon single crystal rod 100 pushes simultaneously court by two clamp arm 254 of both sides It is mobile to the middle section of grasping part, until silicon single crystal rod 100 is clamped by two clamp arm 254 in silicon rod clamping piece 253, At this point, the center of silicon single crystal rod 100 can be located at the center of the grasping part of silicon rod clamping piece 253.Particularly, to make silicon rod At least two clamp arm 254 in clamping piece 253 can monocrystalline silicon that is smooth and being held fixedly different type difference dimensions Stick, silicon rod clamping piece 253 further include clamp arm driving mechanism, for driving at least two clamp arm 254 to make opening and closing movement.

Referring to Fig. 6, its rearview for being schematically shown as silicon rod clamper 25.In specific implementation, as shown in fig. 6, clamp arm drives Mechanism further comprises: folding gear 255, gear drive 256 and driving source 257.

Opening and closing gear 255 is set in corresponding clamp arm 254.Gear drive 256 has and the folding in clamp arm 254 The groove that gear 255 engages.Driving source is connected to gear drive 256, for driving gear drive 256 to move.In one kind On implementation, gear drive 256 is rack gear, which is located at the centre of two clamp arm 254, in rack gear respectively for Corresponding tooth is engaged with the folding gear 255 in two clamp arm 254 in being respectively equipped on two lateral surfaces of the clamp arm 254 of two sides Line, driving source 257 may be, for example, driving motor or or cylinder.

In this way, according to above-mentioned implementation, in practical applications, when that need to realize 254 clamping of clamp arm, by as driving source Driving motor or cylinder driving moved up as the rack gear 256 of gear drive, drive what both sides engaged to open by rack gear 256 It closes gear 255 and makees outward turning movement, folding gear 255 drives clamp arm 254 during revolving outside (folding gear 255 and clamp arm 254 can Connected by shaft) make decentralization movement to be transferred to clamping state by releasing orientation；Conversely, when that need to realize that clamp arm 254 is unclamped, by Driving motor (or cylinder) driving as driving source is moved down as the rack gear 256 of gear drive, is driven by rack gear 256 The folding gear 255 of both sides engagement makees pronation, and folding gear 255 drives (the folding gear of clamp arm 254 during revolving inside 255 can be connect with clamp arm 254 by shaft) raising up acts to be transferred to releasing orientation by clamping state.Certainly, it above are only one Embodiment is not intended to limit the working condition of silicon rod clamping piece 253, in fact, " upward ", " outward turning " in aforementioned, " under Put ", " downward ", " inward turning ", " raising up " and " release " and " clamping " state change can be according to the structure and fortune of clamp arm 254 Make mode, clamp arm driving mechanism construction and have other changes.

In one implementation, silicon rod clamper 25 uses fixed silicon rod clamping piece, that is, the first of commutation carrier 23 Silicon rod clamping piece 253 as much as possible is fixedly installed on mounting surface in a manner of vertical, and, it is adjacent in these silicon rod clamping pieces 253 The spacing of two silicon rod clamping pieces 253 is as small as possible, in this way, using these silicon rod clamping pieces 253 can cover all kinds specification it is long The silicon single crystal rod of degree.For example, using silicon rod clamping piece 253 more on commutation carrier 23 if the length of silicon single crystal rod is longer Participate in clamping；If the length of silicon single crystal rod is shorter, clamping is participated in using silicon rod clamping piece 253 less on commutation carrier 23.

And in other implementations, silicon rod clamper 25 uses movable silicon rod clamping piece, that is, the of commutation carrier 23 Silicon rod clamping piece 253 is arranged in activity in a manner of vertical on one mounting surface, due to, silicon rod clamping piece 253 is movable design, because This, the quantity of silicon rod clamping piece 253 can be greatly decreased, and generally two or three can meet.In this way, utilizing these activities Formula silicon rod clamping piece 253 can cover all kinds scale lengths silicon single crystal rod.For example, being moved if the length of silicon single crystal rod is longer Silicon rod clamping piece 253 extends the clamping spacing of two silicon rod clamping pieces 253；If the length of silicon single crystal rod is shorter, silicon rod is moved Clamping piece 253 shortens the clamping spacing of two silicon rod clamping pieces 253.In silicon rod clamper 25 using movable silicon rod clamping piece In implementation, to be smooth smoothly up and down to adjust position convenient for movable silicon rod clamping piece, using silicon rod clamper Fixture installation part 251 in 25 plays the guiding role of boot activity formula silicon rod clamping piece 253, in a kind of achievable mode, Guide post structure can be used in fixture installation part 251, and clamp arm mounting base 252 is then using the movable agllutination for being socketed on guide post structure Structure.Specifically, include erectting setting and two parallel guide posts as the guide post structure of fixture installation part 251, make To be then equipped with and two guide posts corresponding two in the guide post structure in the movable block structure of clamp arm mounting base 252 A perforation or two clips.According to perforation, the movable block is sheathed on the guide post and can realize along the guide post Sliding.According to clip, the movable block is clipped on the guide post and can realize and slides along the guide post, wherein In practical application, the clip can be clipped on an at least half part for the guide post.

For the silicon rod clamper 25 of movable silicon rod clamping piece 253, different change case is also had.It is clamped with two silicon rods For part 253, in an alternative embodiment, a silicon rod clamping piece 253 in two silicon rod clamping pieces 253 is movable sets Counting another silicon rod clamping piece 253 then is fixed design, in this way, being all by the movable design of movement in practical applications That silicon rod clamping piece 253 adjust the clamping spacing between the silicon rod clamping piece 253 of fixed design.It can from above To know, silicon single crystal rod 100 is to erect to place, therefore, no matter the scale lengths of silicon single crystal rod, always the bottom of silicon single crystal rod 100 can It is relatively easy to determination, it is thus preferable to, that silicon rod clamping piece that can will be located above in two silicon rod clamping pieces 253 253 be designed as it is movable, in this way, need to only adjust top silicon rod clamping piece 253 position.To realize silicon rod clamping piece The silicon rod clamping piece 253 of 253 movement, the movable design can be equipped with guiding driving mechanism.It can using guiding driving mechanism The silicon rod clamping piece 253 of movable design is driven to move up and down along fixture installation part 251.

In one implementation, guiding driving mechanism can for example, guiding leading screw 258 and guide motor 259, In, guiding leading screw 258 is to erect setting, and one end of guiding leading screw 258 is connected to clamp arm mounting base 252, guiding leading screw 258 it is another One end is then connected to guide motor 259, and guide motor 259 may be provided at the top of commutation carrier 23, but be not limited thereto, and leads It may also be arranged on the bottom of commutation carrier 23 to motor 259.Guiding leading screw 258 has high-precision, invertibity and efficient spy Point, in this way, driving guiding leading screw 258 to revolve by guide motor 259 when needing the position of the silicon rod clamping piece 253 above adjustment Turn, drives silicon rod clamping piece 253 to move up and down along fixture installation part 251 in 258 rotary course of guiding leading screw, such as: guiding Motor 259 drives guiding leading screw 258 to rotate in the forward direction, then drives the silicon rod clamping piece 253 of top upward along fixture installation part 251 Movement is with the silicon rod clamping piece 253 far from lower section；Guide motor 259 drives 258 counter-rotating of guiding leading screw, then drives top Silicon rod clamping piece 253 is moved downward along fixture installation part 251 close to the silicon rod clamping piece 253 of lower section.Adjust two silicon rods Clamping spacing between clamping piece 253, so that the silicon single crystal rod 100 to different size length is effectively clamped.

In another alternative embodiment, two silicon rod clamping pieces 253 are movable design, in this way, in practical application In, mutual clamping spacing can be adjusted by the movement of two silicon rod clamping pieces 253 of movable design.Due to silicon rod Clamping piece 253 is movable design, then, at least one silicon rod clamping piece 253 in two silicon rod clamping pieces 253, which need to be arranged, leads To driving mechanism, for driving two silicon rod clamping pieces 253 to move along fixture installation part 251.

Relative to a kind of this preceding alternative embodiment, in this alternative embodiment, since two silicon rods in silicon rod clamper 25 Clamping piece 253 is movable, then will exist on some silicon rod clamping piece 253 in two silicon rod clamping pieces 253 The situation that guiding driving mechanism is still respectively provided with guiding driving mechanism on two silicon rod clamping pieces 253 is set.Now at two The silicon rod clamping piece 253 of top is provided with for guiding driving mechanism in silicon rod clamping piece 253, in this case, one, two It is to be flexibly connected between clamp arm mounting base 252 and fixture installation part 251 in a silicon rod clamping piece 253, that is, any one silicon rod folder Clamp arm mounting base 252 and clamp arm 254 thereon are up and down along fixture installation part 251 in gripping member 253, in addition, setting Guiding driving mechanism includes guiding leading screw 258 and guide motor, wherein one end of guiding leading screw 258 is connected to the silicon rod of top In clamp arm mounting base 252 in clamping piece 253, the other end of guiding leading screw 258 is then connected to guide motor 259, guide motor 259 may be provided at the top of commutation carrier 23, in this way, when the position of the silicon rod clamping piece 253 above needing to adjust, by being oriented to Motor 259 drives guiding leading screw 258 to rotate, and drives silicon rod clamping piece 253 to install along fixture in 258 rotary course of guiding leading screw Part 251 moves up and down, such as: guide motor 259 drives guiding leading screw 258 to rotate in the forward direction, then drives the silicon rod clamping piece of top 253 move upwards along fixture installation part 251 with the silicon rod clamping piece 253 far from lower section；Guide motor 259 drives guiding leading screw 258 counter-rotatings then drive the silicon rod clamping piece 253 of top to move downward along fixture installation part 251 close to the silicon of lower section Stick clamping piece 253.The silicon rod clamping piece 253 moves up and down along fixture installation part 251 and then adjusts two silicon rod clamping pieces Clamping spacing between 253, so that the silicon single crystal rod 100 to different size length is effectively clamped.

In fact, in the case of two silicon rod clamping pieces 253 are movable design, not only using guiding driving mechanism Clamping spacing between adjustable two silicon rod clamping pieces 253 is effectively pressed from both sides come the silicon single crystal rod 100 to different size length Except holding, the purpose of lifting can be also realized to the silicon single crystal rod 100 of clamping, when two silicon rod clamping pieces 253 effectively clamp list After crystalline silicon rod, by driving the movement of silicon rod clamping piece 253 to go up and down silicon single crystal rod 100.Specifically, still with the silicon rod of top Clamping piece 253 be provided with guiding driving mechanism for, firstly, the silicon rod clamping piece 253 of top by guiding driving mechanism along Fixture installation part 251 moves up and down and has adjusted the clamping spacing between lower section silicon rod clamping piece 253；Then, utilization is each Clamp arm driving mechanism in a silicon rod clamping piece 253 drives corresponding two clamp arm to make clamping movement with smooth and be held fixedly Firmly silicon single crystal rod；Then, the silicon rod clamping piece 253 of top is driven by guiding driving mechanism along fixture installation part 251 again It moves upwards, at this point, the silicon rod clamping piece 253 of the silicon single crystal rod 100 and lower section that clamp is together therewith since frictional force acts on Move upwards, wherein the silicon single crystal rod 100 clamped move upwards utilize be top silicon rod clamping piece 253 and monocrystalline silicon Frictional force effect between stick 100, silicon rod clamping piece 253 move upwards, and what is utilized is the silicon rod of silicon single crystal rod 100 Yu lower section Frictional force effect between clamping piece 253.The silicon rod clamping piece 253 of top drives monocrystalline silicon under the driving of guiding driving mechanism It is also identical process that stick 100 and the silicon rod clamping piece 253 of lower section, which move downward, and details are not described herein.

It should be noted that in other change case, the silicon rod clamping piece of lower section e.g. in two silicon rod clamping pieces 253 Guiding driving mechanism, structure, set-up mode and driving working method and the aforementioned top of guiding driving mechanism are set on 253 The guiding driving mechanism of silicon rod clamping piece 253 is similar, for example, by lower section silicon rod clamping piece 253 guiding driving mechanism drive It moves up and down under dynamic along fixture installation part 251 and adjusts the clamping spacing between top silicon rod clamping piece 253, and under The silicon rod clamping piece 253 of side drives the silicon rod clamping piece 253 1 of silicon single crystal rod 100 and top under the driving of guiding driving mechanism It rises along modes such as the up and down motions of fixture installation part 251.For example two silicon rod clamping pieces 253 are provided with guiding driving machine again Structure, then the motion mode of the set-up mode of guiding driving mechanism and driving working method and two silicon rod clamping pieces 253 is not from Wait say, details are not described herein.

It is long to adapt to different size moving up and down for movable silicon rod clamping piece 253 along fixture installation part 251 In the situation that the silicon single crystal rod of degree is clamped, in addition to silicon rod clamping piece 253 is using movable structure design, silicon rod clamping piece 253 need to be arranged except guiding driving mechanism etc., certainly will also need to know the scale lengths for the silicon single crystal rod for currently needing to clamp.Have In consideration of it, the silicon rod handler in the application may also include height testing instrument 7, carried for detecting silicon rod plummer 21 The height for erectting the silicon single crystal rod placed, thus as movable silicon rod clamping piece 253 subsequent along silicon rod clamper installation part 251 move up or move down mobile and moving distance foundation.

It is loaded when silicon single crystal rod to be processed is loaded and unloaded position by silicon rod using the silicon rod clamper 25 in silicon rod handler 2 To the pre-treatment job area of silicon rod processing platform 11 for subsequent processing operation, generally, subsequent to silicon single crystal rod progress Processing operation before, certainly will need to know the current flatness situation of silicon single crystal rod 100.In view of this, the application monocrystalline silicon Stick Multi-position processing machine may also include flatness detector, at least for carrying out coplanar flat to silicon single crystal rod 100 to be processed Degree detection.In one embodiment, flatness detector is set to the second mounting surface of commutation carrier 23, specifically includes: contact Detection structure, detector shift mechanism and detection controller.

Contact measurement structure in flatness detector is used for be measured to implement by the tested surface for contacting silicon single crystal rod The flatness detection in face.In general, contact measurement structure implements tested surface by contacting the tested surface of silicon single crystal rod Flatness detection specifically refers to: contacting each test point of the tested surface of silicon single crystal rod sequentially by contact measurement structure to detect The relative distance value for obtaining corresponding to each test point determines the flatness of the tested surface according to these relative distance values.

In the present embodiment, determine that the flatness of the tested surface is then logical according to the relative distance value of each test point It crosses the difference in these relative distance values that will be measured between maxima and minima to determine, if the difference is less than mark Quasi- value is fallen into critical field, then shows that the flatness of the tested surface meets specification.In specific implementation, contact measurement Structure 61 is more can include: telescopic contact probe head and on-off switch.

Telescopic contact probe head is used to contact the tested surface of silicon single crystal rod 100.On-off switch is then associated with telescopic contact It pops one's head in and is connect with detection controller, for touching the tested surface of silicon single crystal rod 100 in telescopic contact probe head one i.e. to inspection It surveys controller and sends corresponding on-off signal, currently touched so that detection controller converses telescopic contact probe head accordingly Tested surface in relative distance of the test point relative to datum mark.

In an alternative embodiment, the telescopic contact probe head in contact measurement structure is more can include: contact is visited Head, is at least partly built in probe base and the bullet for shoring contact probe at the probe base for contact probe is arranged Property supporting element.Contact probe may be, for example, the club in cylindrical body, and the top of the club can be made at tipping and sphering Reason or additional salient point, in practical applications, high rigidity can be used in contact probe, the hard alloy of high abrasion is made Make.Probe base may be, for example, cylinder table, and the cylinder table is hollow structure, for accommodating the contact probe for being in club. When probe base is after accommodating contact probe, the top of contact probe protrudes from probe base.In elastic supporting member for supporting optical member It is placed in probe base and for shoring contact probe, and, elastic supporting member for supporting optical member is also associated with on-off switch.Elastic supporting member for supporting optical member top Support contact probe is mainly reflected in the conduction of power, and herein, the conduction of power is at least embodied in two following aspects: one, connecing What receipts contact probe was subject to by contact measured face compresses power and supports pressure conduction by described in on-off switch, so that on-off is opened Pass compresses power according to and generates corresponding on-off signal.Two, restorable restoring force is provided to contact probe, received Relative probe pedestal inside contracts contact probe due to contact measured face, according to the effect of power and to connecing after elastic supporting member for supporting optical member stress Touch probe provides restorable restoring force so that contact probe according to the restoring force and relative probe pedestal towards outward transport It moves to restore.In practical applications, such as compression spring can be used in elastic supporting member for supporting optical member, and the opposite end of compression spring can divide It Dui Yingyu not contact probe and on-off switch.But, the knot of the building block of contact measurement structure and each building block Structure is not limited in aforementioned embodiments,

In other embodiments, contact measurement structure can still make other variations, such as: contact probe may be, for example, In tetrahedral club, and, probe base also may be, for example, tetrahedral tubulose platform.Pliability can also be used in elastic supporting member for supporting optical member The opposite end of elastic slice, flexible elastic slice can correspond respectively to contact probe and on-off switch.On-off switch is that high-precision is opened It closes, sensitivity with higher, even very subtle active force can perceive to obtain.In addition, the alternative embodiment its In his implementation, it may also include signal transmission device part or signal circuit between on-off switch and detection controller, in this way, On-off signal caused by on-off switch can be transmitted to detection controller by signal transmission device part or signal circuit.

Contact measurement structure in the present embodiment in practical applications, when telescopic contact probe head touches silicon single crystal rod When 100 tested surface, telescopic contact probe head is just under the blocking of the tested surface of silicon single crystal rod 100 in relative probe pedestal work Contracting, elastic supporting member for supporting optical member receive compressing power and described supporting pressure conduction to logical for contact probe and shoring contact probe It disconnects and closing, so that on-off switch compresses power according to and generates corresponding Continuity signal or cut-off signal, the Continuity signal Or cut-off signal is transmitted to detection controller by signal transmission device part or signal circuit, detection controller is led according to Messenger or cut-off signal can converse the test point in the tested surface that contact probe is currently touched relative to benchmark The relative distance of point.

Detector shift mechanism in flatness detector is for driving contact measurement structure 61 to shift.In the present embodiment In, detector shift mechanism may be, for example, three-dimensional displacement mechanism, in specific implementation, the three-dimensional displacement mechanism can include: the One direction shift mechanism, second direction shift mechanism and third direction shift mechanism, for ease of description, by the first party To X-axis is denoted as, the second direction is denoted as Y-axis, the third direction is denoted as Z axis.In conjunction with Fig. 1 it is found that second Direction Y-axis be it is consistent with the translation direction of translation mechanism in aforementioned silicon rod handler, therefore, in a kind of optional embodiment In, second direction shift mechanism can coincide with translation mechanism above-mentioned, that is, second direction shift mechanism is just by translation above-mentioned Mechanism is held a concurrent post, and the structure and its function mode of the translation mechanism can be found in preceding description, therefore for second direction moving machine Structure repeats no more.

It is described in detail emphatically below for first direction shift mechanism and third direction shift mechanism.

The first direction shift mechanism further includes: sidesway pedestal 243 and first direction shift unit pass through first direction Shift unit can provide displacement of the sidesway pedestal 243 in a first direction in (such as X-direction).First direction shift unit is into one Step includes: first direction rack rails, is laid on bottom installation structure along first direction；First rotate gear is set to sidesway bottom It is meshed on seat 243 and with first direction rack rails；First driving motor, for driving the first rotate gear to be rotated such that sidesway Pedestal 243 along a first direction retreat by rack rails.Specifically, first direction rack rails may be, for example, at least one with certain length Rack gear, this at least one rack gear are installed on bottom installation structure.To make sidesway pedestal 243 more stablely along a first direction It is mobile, it can configure at least two first rotate gears, the setting of at least two first rotate gear intervals for each rack gear.The One rotate gear can be sequentially connected by transmission shaft and the first driving motor, the first driving motor with detect controller connect and by Detect controller control.First driving motor may be, for example, servo motor.In practical applications, as previously mentioned, first direction moves Bit location includes first direction rack rails, the first rotate gear and the first driving motor, and the first driving motor, which receives, carrys out self-test control The shift control of device processed instructs, and is instructed according to the shift control to drive the first rotate gear to be rotated such that sidesway pedestal 243 requirements of the rack rails displacement up to meeting displacement numerical value along a first direction, realize the purpose precisely shifted.The shift control Displacement numerical value or parameter relevant to displacement numerical value are included at least in instruction.

In addition, above-mentioned first direction shift unit be only one illustrate, but be not intended to limit the application, for example, In one alternative embodiment, first direction shift unit can include: lead screw and servo motor, lead screw have high-precision, invertibity and Efficient feature improves the horizontal line in a first direction of sidesway pedestal 243 in this way, passing through the cooperation of servo motor and lead screw Into precision.In addition, first direction shift unit may also include first direction guide rail and the first sliding block, wherein first direction Guide rail is laid on bottom installation structure along first direction, the first sliding block be then set to sidesway pedestal 243 and with first party guide Rail matches, and by the cooperation of first direction guide rail and the first sliding block, sidesway pedestal 243 is assisted to shift along a first direction.

In practical applications, the first driving motor receives shift control instruction (the displacement control for carrying out self-test controller Included at least in system instruction displacement numerical value or to the relevant parameter of displacement numerical value) and instructed according to the shift control and to drive the One rotate gear is rotated such that rack rails shifts sidesway pedestal 243 along a first direction, at least wraps in the shift control instruction Include displacement numerical value or to the relevant parameter of displacement numerical value, meanwhile, as the first direction guide rail and the first sliding block of auxiliary equipment, the Guide rail slides one sliding block along a first direction, to realize that sidesway pedestal 243 shifts along a first direction.

Ground is changed, in other embodiments, first direction shift unit may also include first direction guide rail and first and slide Seat, wherein first direction guide rail is laid in sidesway pedestal 243 along first direction, and first slide is installed on bottom installation structure, By the cooperation of first direction guide rail and first slide, sidesway pedestal 243 is assisted to shift along a first direction.As previously mentioned, flat Whole degree detector is for carrying out surface smoothness detection to silicon single crystal rod, and therefore, under general scenario, flatness detector can be with What other process equipments were used cooperatively, this kind of process equipments can be simple function process equipment (such as cutting processing machine, mill Side machining apparatus or polishing machine) it is also possible to the combined-machining equipment of multiple function, the simple function process equipment can example For example such as cutting processing machine, flour milling processing machine or polishing machine, the combined-machining equipment may be, for example, flour milling polishing one Body machine.

Since in one embodiment, second direction shift mechanism is held a concurrent post by translation mechanism above-mentioned, therefore, is With the cooperation of first direction translation mechanism, in the structure of the translation mechanism, conversion chassis 241 is set up in by translation mechanism It is substantially exactly the sidesway bottom converted chassis 241 and be set up in first direction shift mechanism by translation mechanism on bottom installation structure On seat, illustrate herein.

The third direction shift mechanism can provide contact measurement structure 61 with respect to commutation carrier 23 and in third direction (such as Z-direction for the displacement on third direction, can also be colloquially called displacement up and down below herein) moves up Position.In one embodiment, contact measurement structure 61 is that commutation carrier 23 is set to by a detection structure installation part 63 On.Guide post structure can be used in detection structure installation part 63, and contact measurement structure then uses and is socketed on guide post structure Movable block structure.It specifically, include erectting two be arranged and parallel as the guide post structure of detection structure installation part 63 A guide post, and contact measurement structure 61 is then equipped with two perforations corresponding with two guide posts in the guide post structure Or two clips.

According to perforation, the contact measurement structure is sheathed on the guide post and can realize sliding along the guide post It moves.According to clip, the contact measurement structure is clipped on the guide post and can realize and slides along the guide post, In, the clip can be clipped on an at least half part for the guide post.It therefore, is realization 61 edge of contact measurement structure Detection structure installation part 63 and shift up and down, third direction shift mechanism can further comprise: lead screw and lifting motor, In, lead screw is to erect setting, and one end of lead screw is connected to contact measurement structure 61, and the other end of lead screw is then connected to lifting electricity Machine, lifting motor may be provided at the top of commutation carrier 23, but be not limited thereto, and lifting motor may also be arranged on commutation carrier 23 bottom.Lead screw has the characteristics that high-precision, invertibity and efficient, in this way, needing to adjust contact measurement structure 61 Position when, by lifting motor driving lead screw rotation, drive contact measurement structure 61 to tie along detection in screw rod rotary course Structure installation part 63 moves up and down, such as: driving motor driving lead screw rotates in the forward direction, then drives the contact measurement structure 61 of top It is moved upwards along detection structure installation part 63；Driving motor drives lead screw counter-rotating, then drives contact measurement structure 61 It is moved downward along detection structure installation part 63.

In practical applications, lifting motor receive come self-test controller issued include at least displacement numerical value or with The shift control instruction of the relevant parameter of displacement numerical value is simultaneously instructed according to the shift control to drive lead screw to rotate to drive and connect Touch detection structure 61 moves up and down along detection structure installation part 63 until satisfaction shifts the requirement of numerical value, realization precisely displacement Purpose.It should be noted that above-mentioned third direction shift mechanism is only a kind of example using the combination of lead screw and driving motor, and It is non-to be used to limit the application third direction shift mechanism, change ground, in other embodiments, the third direction shift mechanism Tooth band shift mechanism can also be used, in tooth band shift mechanism, it may include synchronous toothed belt, rotate gear and driving motor, In, synchronous toothed belt is set on the second mounting surface of commutation carrier 23, and contact measurement structure 61 can pass through connector and synchronous gear Band connection, rotate gear are then meshed with synchronous toothed belt, and driving motor is then used to that rotate gear to be driven to rotate to utilize synchronous gear Band drives contact measurement structure 61 to move up and down along detection structure installation part 63.

Detection controller is connect with contact measurement structure and detector shift mechanism, for controlling detector shift mechanism Contact measurement structural shift and control contact measurement structure is driven sequentially to detect each inspection on tested surface in silicon single crystal rod The relative distance of measuring point.In one embodiment, detector shift mechanism may include first direction shift mechanism, second direction shifting Position mechanism and third direction shift mechanism, therefore, detection controller can be shifted to first direction shift mechanism, second direction Mechanism and third direction shift mechanism send corresponding shift control instruction respectively, logical with drive control contact measurement structure It crosses three-dimensional displacement and reaches scheduled detection position and can be able to contact the tested surface of silicon single crystal rod 100 in the inspection positions In test point.Contact measurement structure can include: telescopic contact probe head and on-off switch, wherein on-off switch and detection Controller connection, on-off switch control when touching the tested surface of silicon single crystal rod 100 to detection in telescopic contact probe head Device sends on-off signal, detects controller according to the on-off signal and converses the tested surface that contact probe is currently touched In relative distance of the test point relative to datum mark.

It should be noted that in one embodiment, flatness detector is set to the second mounting surface of commutation carrier 23, and preceding The silicon rod clamper stated then is set to the first mounting surface of commutation carrier 23, and herein, the first mounting surface and the second mounting surface can be according to realities Border apparatus structure and set.For example, the first mounting surface and the second mounting surface are two installations in commutation carrier 23 backwards to setting Face, further, the first mounting surface and the second mounting surface can differ 180 °, so that the silicon rod for being located at silicon rod handling position is held The rotation plummer 531 for being located at pre-treatment job area in microscope carrier 21 and silicon rod conversion equipment 5 connects being aligned, in this way, when that will commutate After carrier 23 rotates 180 °, the first original mounting surface can be switched to the second mounting surface or the second original mounting surface and can cut It is changed to the first mounting surface, but in practical application, the first mounting surface and the second mounting surface can also for example differ 90 °, even, first Mounting surface and the second mounting surface can differ any position in OK range, if between the first mounting surface and the second mounting surface or Person is located at the rotation plummer for being located at pre-treatment job area in the silicon rod plummer 21 and silicon rod conversion equipment 5 of silicon rod handling position If ensuring that unnecessary interference will not be generated between 531.In addition, aforementioned mentioned height testing instrument 7, both can be set in the It is also can be set on one mounting surface in the other parts for the carrier 23 that on the second mounting surface, even commutates.

Particularly, it by the cooperation of flatness detector 7 and silicon rod clamper 25, can also rectify a deviation to silicon single crystal rod 100 Operation.It is found that can be clamped silicon single crystal rod 100 using silicon rod clamper 25 and be made again by the carrier 23 that commutates in being described above Silicon single crystal rod 100 is transferred on the rotation plummer 531 of the silicon rod positioning mechanism 53 at pre-treatment job area after commutation movement. But thus and thus, it is possible that following situation: middle section of the rotation plummer 531 not at silicon single crystal rod 100.? Under such situation, the silicon single crystal rod product after following process operation is likely to not meet specification of workpieces requirement.Therefore, To silicon single crystal rod carry out following process operation before, can also silicon single crystal rod 100 carry out correction operation, correction operation in, easily It in operation and is ideally exactly the coincidence that the center of silicon single crystal rod 100 is corresponding with the center of plummer 531 is rotated.

In practical applications, it is carried out by the silicon single crystal rod 100 carried on 7 pairs of rotation plummers 531 of flatness detector flat Surface evenness detection, to obtain the integral position overview of silicon single crystal rod 100；By the integral position of the silicon single crystal rod 100 of acquisition Overview and the position of rotation plummer 531 are compared, and then obtain center and the rotation plummer of silicon single crystal rod 100 Deviation information between 531 center；The carrier 23 that commutates rotates 180 ° of work commutation movements, by the silicon rod clamper on commutation carrier 23 25 silicon single crystal rods 100 corresponded on rotation plummer 531 simultaneously clamp silicon single crystal rod 100；Utilize aforementioned three-dimensional displacement mechanism In first direction shift mechanism and second direction shift mechanism driving commutation carrier 23 in a first direction and/or second direction Upper movement, so that silicon rod clamper 25 and 100 relative rotation plummer 531 of the silicon single crystal rod clamped by silicon rod clamper 25 be driven to make position Adjustment is set, is finally able to complete the coincidence corresponding with the rotation center of plummer 531 of the center of silicon single crystal rod 100 to be directed to monocrystalline The correction operation of silicon rod 100.

The circle of contact and corase grinding device 3 are set to the first operation area of silicon rod processing platform 11, for cutting to silicon single crystal rod 100 Circle and corase grinding operation.Round as a ball and fine grinding device 4 is set to the second operation area of silicon rod processing platform 11, for by the circle of contact and slightly The circle of contact and the post-job silicon single crystal rod 100 of corase grinding of mill apparatus 3 carry out round as a ball and fine grinding operation.In the present embodiment, as before It is described, silicon single crystal rod 100 can be positioned, therefore, the circle of contact and corase grinding by silicon rod positioning mechanism 53 to erect modes of emplacement What 3 pairs of the device progress circle of contacts of silicon single crystal rods 100 for erectting placement and corase grinding operation and round as a ball and 4 pairs of fine grinding device settings were placed Silicon single crystal rod 100 carries out round as a ball and fine grinding operation use being exactly vertical processing method.

Specifically, in one embodiment, between the pre-treatment job area and first operation area And protective door can be also added between second operation area and the pre-treatment job area, it is used for the pre-treatment job area It is isolated with first operation area and second operation area, to play the role of protecting silicon single crystal rod, avoids monocrystalline silicon Stick is contaminated or damages.

The circle of contact and corase grinding device 3 are set to the first operation area on base 1 and being located at silicon rod processing platform, for monocrystalline silicon Stick 100 carries out the circle of contact and corase grinding operation.The circle of contact and corase grinding device 3 have first receiving space, are converted for receiving by silicon rod The silicon single crystal rod 100 that the conveying conveying of ontology 51 in device 5 comes.The circle of contact and corase grinding device 3 mainly include the first rack 31 and extremely The first grinding tool 33 of few a pair, at least a pair of first grinding tool 33 are arranged oppositely in the first rack 31, are used for positioned at the first operation Silicon single crystal rod 100 on silicon rod conversion equipment 5 at area carries out the circle of contact and corase grinding operation.Further, each first mill Tool 33 further includes the first main shaft 32 and the first grinding wheel 34, wherein the first main shaft 32 and the mounting surface of the first rack 31 are equipped with laterally The combination of such as sliding rail and sliding block can be used in sliding guide mechanism and longitudinal sliding motion guide mechanism, the guide mechanism that slides laterally Deng the longitudinal sliding motion guide mechanism can be used such as the combination of sliding rail and sliding block.Using guide mechanism is slid laterally, can enable First main shaft 32 or the first grinding wheel 34 the first rack 31 can make laterally advancing and retreating movement relatively.Using longitudinal sliding motion guide mechanism, Opposite first rack 31 of 32 energy of the first main shaft can be enabled longitudinally to move up and down.

In a practical application, at least a pair of first grinding tool 33 is set on a grinding tool pedestal, the grinding tool pedestal and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the first rack 31, at least a pair of first grinding tool 33 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool pedestal, wherein the grinding tool pedestal is controlled by a lifting motor and indulges To sliding guide mechanism longitudinal sliding motion in the first rack 31, each of at least a pair of first grinding tool 33 first grinding tool 33 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool pedestal.First grinding wheel 34 is set to the operation end of the first main shaft 32, The first frosted particle with the first granularity.Herein, silicon single crystal rod 100 to be processed is the silicon side that section is substantially in class rectangle Body, tool are formed with the connection faceted pebble in the angle R there are four side between two neighboring side.Therefore, the circle of contact and corase grinding device 3 in The first grinding tool of a pair 33 be oppositely arranged, between the two there are for accommodate silicon single crystal rod 100 first receiving space, work as monocrystalline silicon After stick 100 is transported between the first grinding wheel of a pair 34 in the first receiving space, the i.e. accessible monocrystalline of the first grinding wheel 34 Opposite a pair of of side or a pair of of connection faceted pebble carry out corresponding processing operation in silicon rod 100.

In practical applications, silicon single crystal rod 100 is transferred to the first of silicon rod processing platform first with silicon rod conversion equipment 5 Operation area carries out positioning adjustment to silicon single crystal rod 100 by silicon rod positioning mechanism 53, so that a pair of of connection in silicon single crystal rod 100 Faceted pebble corresponds to a pair of first grinding tool 33, carries out the circle of contact by connection faceted pebble of first grinding tool 33 to silicon single crystal rod 100 and processes operation. The circle of contact processing operation can for example, and positioning adjustment is carried out to silicon single crystal rod 100 with silicon rod positioning mechanism 53 and is matched, root It according to the amount of feeding, rotates the first grinding wheel 34 in the first grinding tool 33 and the first grinding tool 33 is driven to move up and down to implement to grind, to the A pair of connection faceted pebble and its adjacent domain repeatedly slightly cut and are carried out to second pair of connection faceted pebble and its adjacent domain multiple It slightly cuts, so that the connection between each connection faceted pebble and adjacent side forms preliminary arc and connects.Again by silicon rod positioning mechanism 53 pairs of silicon single crystal rods 100 carry out positioning adjustment, so that a pair of of side in silicon single crystal rod 100 corresponds to a pair of first grinding tool 33, Corase grinding processing operation is carried out by side of first grinding tool 33 to silicon single crystal rod 100.

Corase grinding operation may be, for example: positioning adjustment be carried out to silicon single crystal rod 100 by silicon rod positioning mechanism 53, so that monocrystalline silicon First opposite side face of stick 100 corresponds to a pair of first grinding tool 33, by the first grinding wheel 34 in a pair of first grinding tool 33 to monocrystalline silicon First pair of side of stick 100 carries out corase grinding processing operation；Then, silicon single crystal rod 100 is positioned by silicon rod positioning mechanism 53 Adjustment, so that the second opposite side face of silicon single crystal rod 100 corresponds to a pair of first grinding tool 33, by first in a pair of first grinding tool 33 Grinding wheel 34 carries out corase grinding processing operation to second pair of side of silicon single crystal rod 100.Wherein, the corase grinding of any pair of side processes operation It can for example, an amount of feeding is provided, the first grinding wheel 34 in a pair of first grinding tool 33 is driven to be moved from top to bottom to grind list A pair of of side of crystalline silicon rod 100；A pair of first grinding wheel 34 is ground to after 100 bottom of silicon single crystal rod and passes through silicon single crystal rod 100 Lower limit is stayed in later, is further added by an amount of feeding, and a pair of first grinding wheel 34 is driven to be moved from the bottom up to grind silicon single crystal rod 100；A pair of first grinding wheel 34, which is ground to after 100 top of silicon single crystal rod and passes through silicon single crystal rod 100, stays in upper limit later, An amount of feeding is continued growing, a pair of first grinding wheel 34 is driven to be moved from top to bottom to grind silicon single crystal rod 100；In this way, grinding, increases Add the amount of feeding, it is reversed to grind, increase the amount of feeding, after being repeated several times, a pair of of side of silicon single crystal rod 100 can be ground to pre- If size.

Round as a ball and fine grinding device is set to the second operation area on base 1 and being located at silicon rod processing platform, for through the circle of contact And the silicon single crystal rod 100 after corase grinding processing operation carries out round as a ball and fine grinding operation.Round as a ball and fine grinding device 4 has second Accommodation space, for receive by silicon rod conversion equipment 5 conveying ontology 51 conveying come silicon single crystal rod 100.It is round as a ball and smart Mill apparatus 4 mainly includes the second rack 41 and at least a pair of second grinding tool 43, and at least the second grinding tool 43 of a pair is arranged oppositely in the In two racks 41, for carrying out round as a ball and fine grinding to the silicon single crystal rod 100 on the silicon rod conversion equipment 5 being located at the second operation area Process operation.

Further, each second grinding tool 43 further includes the second main shaft 42 and the second grinding wheel 44, wherein the second main shaft 42 and second rack 41 mounting surface be equipped with slide laterally guide mechanism and longitudinal sliding motion guide mechanism, it is described to slide laterally guiding Mechanism can be used such as the combination of sliding rail and sliding block, and the group of such as sliding rail and sliding block can be used in the longitudinal sliding motion guide mechanism Close etc..Using guide mechanism is slid laterally, the second main shaft 42 or the second grinding wheel 44 can be enabled the second rack 41 to make laterally relatively Advancing and retreating movement can enable opposite second rack 41 of 42 energy of the second main shaft longitudinally move up and down using longitudinal sliding motion guide mechanism.

In a practical application, at least a pair of second grinding tool 43 is set on a grinding tool pedestal, the grinding tool pedestal and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the second rack 41, at least a pair of second grinding tool 43 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool pedestal, wherein the grinding tool pedestal is controlled by a lifting motor and indulges To sliding guide mechanism longitudinal sliding motion in the second rack 41, each of at least a pair of second grinding tool 43 second grinding tool 43 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool pedestal.Second grinding wheel 44 is set to the operation end of the second main shaft 42, The second frosted particle with the second granularity.In contrast, the granularity of the second frosted particle in the second grinding wheel 44 is to want small The granularity of the first frosted particle in the circle of contact and corase grinding device 3 in first grinding wheel 34.Therefore, in round as a ball and fine grinding device 4 The second grinding tool of a pair 43 be oppositely arranged, between the two there are for accommodate silicon single crystal rod 100 the second accommodation space, work as monocrystalline silicon After stick 100 is transported between the second grinding wheel of a pair 44 in second accommodation space, the i.e. accessible monocrystalline of the second grinding wheel 44 Silicon rod 100 carries out processing operation accordingly.

In practical applications, silicon single crystal rod 100 is transferred to the second of silicon rod processing platform first with silicon rod conversion equipment 5 Operation area is positioned to silicon single crystal rod 100 by silicon rod positioning mechanism 53 and is rotated silicon single crystal rod 100, right by the second grinding tool 43 The connection faceted pebble of silicon single crystal rod 100 carries out round as a ball processing operation.The round as a ball processing operation can for example, by silicon rod localization machine Structure 53 positions silicon single crystal rod 100, so that the second grinding wheel of a pair 44 in the second grinding tool 43 is right against silicon single crystal rod 100 Side, the spacing between a pair of second grinding wheel 44 is to be less than the current diagonal pitch of silicon single crystal rod 100, the difference of the two spacing Away from the amount of feeding for being this at least a pair of second grinding wheel 44；Silicon single crystal rod 100 is positioned in second accommodation space by silicon rod Mechanism 53 drives rotation, and a pair of second grinding wheel 44 is by a pair of of chamfering corresponding one in 100 section of silicon single crystal rod in the rotation Arc-shaped is ground to connection faceted pebble, wherein the revolving speed when contacting grinding by the second grinding wheel 44 of silicon single crystal rod 100 is slower, monocrystalline The revolving speed after passing through the second grinding wheel 44 after it connects faceted pebble by the grinding of the second grinding wheel 44 of silicon rod 100 is very fast, also, silicon single crystal rod 100 continue to rotate and make corresponding the second grinding wheel of another pair connecting edge face contact 44 of its another pair chamfering and by the second grinding wheel 44 It is ground into arc-shaped；A pair of second grinding wheel 44 continues downwards, each to next section of silicon single crystal rod 100 such as abovementioned steps Connection faceted pebble grind round as a ball, until grinding the round as a ball bottom to silicon single crystal rod 100, completes the single company of silicon single crystal rod 100 It is round as a ball to connect faceted pebble grinding；An amount of feeding is continued growing, drives a pair of second grinding wheel 44 to move from the bottom up, is ground by the second grinding wheel 44 Grind each connection faceted pebble of silicon single crystal rod 100；In this way, grinding, increases the amount of feeding, and it is reversed to grind, increase the amount of feeding, is repeated several times Later, the connection faceted pebble of silicon single crystal rod 100 can be ground to preset size and whole rounding, that is, connection faceted pebble and side Rounding off.

Positioning adjustment is carried out to silicon single crystal rod 100 by silicon rod positioning mechanism 53 again, so that the opposite side in silicon single crystal rod 100 Face corresponds to a pair of second grinding tool 43, carries out fine grinding operation by side of second grinding tool 43 to silicon single crystal rod 100.Fine grinding adds Work industry may be, for example: positioning adjustment be carried out to silicon single crystal rod 100 by silicon rod positioning mechanism 53, so that the of silicon single crystal rod 100 A pair of of side corresponds to a pair of second grinding tool 43, by the second grinding wheel 44 in a pair of second grinding tool 43 to the of silicon single crystal rod 100 A pair of of side carries out fine grinding operation；Then, positioning adjustment is carried out to silicon single crystal rod 100 by silicon rod positioning mechanism 53, so that Second opposite side face of silicon single crystal rod 100 corresponds to a pair of second grinding tool 43, right by the second grinding wheel 44 in a pair of second grinding tool 43 Second pair of side of silicon single crystal rod 100 carries out fine grinding operation.Wherein, the fine grinding operation of any pair of side can be wrapped for example It includes: an amount of feeding is provided, the second grinding wheel 44 in a pair of second grinding tool 43 is driven to be moved from top to bottom to grind silicon single crystal rod 100 A pair of of side；Under a pair of second grinding wheel 44 is ground to after 100 bottom of silicon single crystal rod and stays in after silicon single crystal rod Limit is further added by an amount of feeding, and a pair of second grinding wheel 44 is driven to be moved from the bottom up to grind silicon single crystal rod；A pair of second grinding wheel 44 are ground to after 100 top of silicon single crystal rod and stay in upper limit after silicon single crystal rod 100, continue growing a feeding Amount drives a pair of second grinding wheel 44 to be moved from top to bottom to grind silicon single crystal rod 100；In this way, grinding, increases the amount of feeding, reversely Grinding increases the amount of feeding, after being repeated several times, a pair of of side of silicon single crystal rod 100 can be ground to preset size.

As seen from the above description, in an alternative embodiment, as round as a ball and fine grinding device round as a ball and fine grinding device 4 The grinding work ground trailing flank is ground using first connection faceted pebble to the round as a ball and fine grinding operation that silicon single crystal rod 100 carries out Sequence, but be not limited thereto, in other change embodiments, round as a ball and fine grinding device 4 to carry out round as a ball of silicon single crystal rod 100 and The grinding process of connection faceted pebble grinding after first side grinding can also be used in fine grinding operation, answers technical effect having the same.

Subsequent, silicon single crystal rod 100 is after the circle of contact and corase grinding device 3 and round as a ball and fine grinding device 4 processing operation, then by silicon Stick conversion equipment 5 converts silicon single crystal rod 100 to pre-treatment job area from the second operation area, and again will be through by silicon rod handler Silicon single crystal rod 100 after processing is unloaded from the pre-treatment job area of silicon rod processing platform.Certainly, unloading silicon single crystal rod 100 it Before, if it is necessary, in pre-treatment job area, still can by flatness detector to the silicon single crystal rod 100 after processed operation into The detection of row planar smoothness.Utilize flatness detector, on the one hand, can detect by the planar smoothness to silicon single crystal rod 100 Examine whether silicon single crystal rod 100 meets product requirement after each processing operation, with the effect of each processing operation of determination； On the other hand, it is detected by the planar smoothness to silicon single crystal rod 100, can also obtain processing component in each processing unit (plant) indirectly Wear condition, in favor of real-time perfoming calibrate or correct, or even maintenance or replacement.

The application silicon single crystal rod Multi-position processing machine, has gathered multiple processing unit (plant)s, can incite somebody to action using silicon rod handler Silicon single crystal rod quickly, it is steady and loaded and unloaded with no damage, silicon single crystal rod can be filled in each processing using silicon rod conversion equipment Multiple procedures that are orderly and seamlessly being shifted and automated realization silicon single crystal rod processing, multiple processing unit (plant)s between setting Corresponding processing operation can be carried out to corresponding silicon single crystal rod simultaneously, improve the quality of production efficiency and product processing operation.

The application separately discloses a kind of silicon single crystal rod multiplexing position processing method, adds for carrying out multistation to silicon single crystal rod Work industry.Referring to Fig. 7, be the flow diagram in one embodiment of the application silicon single crystal rod multiplexing position processing method, In said embodiment, silicon single crystal rod multiplexing position processing method is applied to the circle of contact and roughly grinds the silicon single crystal rod multiplexing of device In processing machine.As shown in fig. 7, the application silicon single crystal rod multiplexing position processing method the following steps are included:

Silicon single crystal rod to be processed is placed in the circle of contact and roughly grinds the operation area of device by step S11.

Step S13 enables the circle of contact and corase grinding device cut respectively to first pair of silicon single crystal rod and second pair connection faceted pebble Justify operation and corase grinding operation is carried out to first pair of the silicon single crystal rod and second pair of side.

Referring to Fig. 8, it is refinement flow diagram of the Fig. 7 in an alternative embodiment.As shown in figure 8, step S13 can Further comprise: step S13A enables the circle of contact and corase grinding device to cut first pair of silicon single crystal rod and second pair connection faceted pebble Circle operation.Step S13B enables the circle of contact and corase grinding device carry out corase grinding operation to first pair of silicon single crystal rod and second pair of side.

Referring to Fig. 9, it is refinement flow diagram of the Fig. 7 in another alternative embodiment.As shown in figure 9, step S13 Can further comprise: step S13a enables the circle of contact and corase grinding device to roughly grind first pair of silicon single crystal rod and second pair of side Operation.Step S13b enables the circle of contact and corase grinding device carry out circle of contact operation to first pair of silicon single crystal rod and second pair connection faceted pebble.

It is above-mentioned that the circle of contact and corase grinding device is enabled to carry out circle of contact operation packet to first pair of silicon single crystal rod and second pair connection faceted pebble It includes: the circle of contact and corase grinding device being enabled at least slightly to cut work three times to first pair of silicon single crystal rod and second pair connection faceted pebble progress respectively Industry.Further, enable the circle of contact and corase grinding device in first pair of the silicon single crystal rod and second pair connection faceted pebble One pair of them connection faceted pebble carries out at least slightly cutting operation three times the following steps are included: a pair of of connection faceted pebble in silicon single crystal rod is enabled to turn It moves to position is initially slightly cut to correspond to the circle of contact and roughly grind the first grinding tool of a pair in device；Enable the first grinding tool in silicon single crystal rod A pair of of connection faceted pebble carry out slightly cutting operation for the first time；Enabling silicon single crystal rod, initially slightly cutting position rotates forward the first deflection angle relatively Degree, enables the first grinding tool slightly be cut operation for the second time to first pair of connection faceted pebble；Silicon single crystal rod is enabled initially slightly to cut position relatively The second deflection angle of backwards rotation is set, enables first grinding tool carry out third time to a pair of of connection faceted pebble in silicon single crystal rod and slightly cuts Operation.Optionally, the range of first deflection angle is 3 ° to 7 °, and the range of second deflection angle is 3 ° to 7 °.

It is above-mentioned that the circle of contact and corase grinding device is enabled to carry out slightly a pair of of side in first pair of silicon single crystal rod and second pair of side Mill operation is ground the following steps are included: a pair of of side in silicon single crystal rod is enabled to turn to initial corase grinding position with corresponding to a pair first Tool；First grinding tool is enabled to carry out corase grinding operation to the pair of side.

In the case of silicon single crystal rod multiplexing processing machine further includes having round as a ball and fine grinding device, the application silicon single crystal rod multiplexing Position processing method is also used to carry out silicon single crystal rod round as a ball and fine grinding operation.Referring to Fig. 10, being the application silicon single crystal rod multiplexing The flow diagram in another embodiment of position processing method.As shown in Figure 10, the application silicon single crystal rod multistation is processed Method the following steps are included:

Silicon single crystal rod to be processed is placed in described round as a ball and fine grinding device operation area by step S15.

Step S17 enables round as a ball and fine grinding device carry out round as a ball operation to the connection faceted pebble of silicon single crystal rod respectively and to list First pair of crystalline silicon rod and second pair of side carry out fine grinding operation.

Figure 11 is please referred to, is refinement flow diagram of the Figure 10 in an alternative embodiment.As shown in figure 12, step S17 can further comprise: step S17A, and round as a ball and fine grinding device is enabled to carry out round as a ball operation to the connection faceted pebble of silicon single crystal rod.Step Rapid S17B enables round as a ball and fine grinding device carry out fine grinding operation to first pair of silicon single crystal rod and second pair of side respectively.

Figure 12 is please referred to, is refinement flow diagram of the Figure 10 in another alternative embodiment.As shown in figure 9, step S13 can further comprise: step S17a, enable round as a ball and fine grinding device respectively to first pair of silicon single crystal rod and second pair of side into Row fine grinding operation.Step S17b enables round as a ball and fine grinding device carry out round as a ball operation to the connection faceted pebble of silicon single crystal rod.

It is above-mentioned that round as a ball and fine grinding device is enabled to carry out round as a ball operation to the connection faceted pebble of silicon single crystal rod the following steps are included: adjustment The grinding spacing of the second grinding tool of a pair in described round as a ball and fine grinding device；Silicon single crystal rod is rotated, enables the second grinding tool to the list The connection faceted pebble of crystalline silicon rod carries out round as a ball operation.

It is above-mentioned to enable described round as a ball and fine grinding device to the opposite side in first pair of the silicon single crystal rod and second pair of side Face carries out fine grinding operation the following steps are included: a pair of of side in silicon single crystal rod is enabled to turn to initial fine grinding position to correspond to one To the second grinding tool；The second grinding tool is enabled to carry out fine grinding operation to a pair of of side in silicon single crystal rod.

Figure 13 is please referred to, is the process signal in yet another embodiment of the application silicon single crystal rod multiplexing position processing method Figure.As shown in figure 13, the application silicon single crystal rod multiplexing position processing method the following steps are included:

Step S10 carries out correction operation to the silicon single crystal rod to be processed.

The application silicon single crystal rod multiplexing position processing method can carry out silicon single crystal rod to include the circle of contact and the multiplexing for roughly grinding operation Position processing operation, can be improved the quality of silicon single crystal rod processing operation.

In addition, the application silicon single crystal rod multiplexing position processing method, it can be by silicon rod quickly, steadily using silicon rod handler And loaded and unloaded with no damage, silicon rod can be carried out orderly and seamlessly between each processing unit (plant) using silicon rod conversion equipment The multiple procedures for realizing silicon rod processing are shifted and automate, multiple processing unit (plant)s can simultaneously carry out corresponding silicon rod corresponding Processing operation, improve production efficiency and product processing operation quality.

Below in conjunction with Figure 14 to Figure 28, it is more that silicon rod is executed in some instances to the application silicon single crystal rod Multi-position processing machine Station processing operation is described in detail.In the following example, silicon single crystal rod to be processed is the silicon that section is substantially in class rectangle Cube, tool are formed with the connection faceted pebble in the angle R there are four side between two neighboring side；Polycrystalline silicon rod to be processed is to cut Face is in the silicon cube of rectangle, and there are four side and four corner angle for tool.Used silicon single crystal rod Multi-position processing machine includes silicon Stick processing platform, silicon rod handler, the circle of contact and corase grinding device, round as a ball and fine grinding device and silicon rod conversion equipment, certainly, Silicon single crystal rod Multi-position processing machine may also include height testing instrument, flatness detector etc..In addition, silicon rod processing platform is equipped with Pre-treatment job area, the first operation area and the second operation area, pre-treatment job area, the first operation area and the second operation area The process of operation is processed according to silicon rod and is sequentially arranged, and correspondingly, silicon rod conversion equipment also is provided with three silicon rod localization machines Structure, wherein pre-treatment job area, the first operation area and the second operation area are in 120 ° of distributions, therefore, three silicon between any two Stick positioning mechanism is between any two also in 120 ° of distributions.It is assumed herein that according to pre-treatment job area, the first operation area, Yi Ji The trend of the sequence of two operation areas is forward direction, and the trend of the sequence opposite with the forward direction is reverse.

Step 1, the first silicon rod to be processed is placed on the Workpiece carrier platform of silicon rod handler.In the present embodiment In, the first silicon single crystal rod 101 is to erect to be placed on silicon rod plummer 21, and the first silicon single crystal rod 101 is placed in silicon rod dress The operation for unloading the silicon rod plummer 21 in position can be used manual work and corresponding jig can also be used to implement, and the jig can For example, silicon rod transfer tool.In addition, when necessary, the on silicon rod plummer 21 can be adjusted by rotation silicon rod plummer 21 The angle of one silicon single crystal rod 101, the angle may be, for example, 45 ° of placements, that is, two diagonal lines of the first silicon single crystal rod 101 point It Dui Yingyu not sidesway direction (X-direction) and translation direction (Y direction).Silicon single crystal rod multistation is processed after implementing aforesaid operations The state of machine is shown as silicon rod for details, reference can be made to Figure 14, Figure 14 and is straightened the status diagram being placed on silicon rod plummer.

Step 2, the first silicon rod to be processed is loaded into the pre-treatment job area of silicon rod processing platform.In the present embodiment In, the first silicon single crystal rod 101 to be processed, which is loaded into the pre-treatment job area of silicon rod processing platform 11, to be loaded and unloaded by silicon rod What the silicon rod clamper 25 in device 2 was implemented.Specifically, first, it is ensured that the silicon rod clamper 25 in silicon rod handler 2 corresponds to silicon Stick loads and unloads position, for example, can make commutation movement by driving commutation carrier 23, so that the silicon rod clamper 25 of commutation carrier 23 is converted Position is loaded and unloaded to silicon rod；Then, it drives the clamp arm 254 in silicon rod clamping piece 253 to make decentralization to act to be transferred to folder by releasing orientation Conjunction state simultaneously is able to clamp the first silicon single crystal rod 101, implements the state tool of silicon single crystal rod Multi-position processing machine after aforesaid operations Body can be found in Figure 15, and Figure 15 is shown as the status diagram that silicon rod is clamped by silicon rod clamper；Then, by the first silicon single crystal rod 101 It is detached from and loads and unloads position in silicon rod.Disengaging operation, in an alternative embodiment, 253 retaining clip conjunction state of silicon rod clamping piece, benefit Make descending motion with the silicon rod plummer 21 in silicon rod handling position, so that the first silicon single crystal rod 101 is detached from silicon rod plummer 21；In another alternative embodiment, by driving the ascending motion of silicon rod clamping piece 253, (silicon rod clamping piece 253 is movable Design) to drive the first silicon single crystal rod 101 to be detached from silicon rod plummer 21；Then, driving commutation carrier 23 makees commutation movement (example Such as rotate 180 °) so that the silicon rod clamper 25 on commutation carrier 23 is converted by silicon rod handling position to pre-treatment job area；It connects , the first silicon single crystal rod 101 is placed in the rotation plummer of the first silicon rod positioning mechanism 53 at pre-treatment job area On 531, and descending motion is made to compress by lifting drive by the rotary compacting device 533 of the first silicon rod positioning mechanism 53 First silicon single crystal rod 101 realizes positioning, and for details, reference can be made to figures for the state of silicon single crystal rod Multi-position processing machine after implementation aforesaid operations 16, Figure 16 are shown as the status diagram that silicon rod is placed in pre-treatment job area by commutation carrier.

It should be noted that in an alternative embodiment, it, can also benefit before clamping the first silicon rod using silicon rod clamper 25 The height that the first silicon single crystal rod 101 is detected with height testing instrument 7, in this way, the silicon rod clamping piece 253 in silicon rod clamper 25 can basis The testing result of height testing instrument 7 is moved up or is moved down to adjust between multiple silicon rod clamping pieces 253 subsequent Clamping spacing, for details, reference can be made to Figure 17, Figure 17 to be shown as the state of silicon single crystal rod Multi-position processing machine after implementing aforesaid operations Height testing instrument detection is located at the status diagram of silicon rod height on handling plummer.

Step 3, planar smoothness detection is carried out to the first silicon rod at pre-treatment job area.Monocrystalline after implementation aforesaid operations For details, reference can be made to Figure 18 and Figure 19 for the state of silicon rod Multi-position processing machine, are shown as flatness detector detection silicon rod coplanar flat The status diagram of degree.

In the present embodiment, it is logical for carrying out planar smoothness detection to the first silicon single crystal rod 101 at pre-treatment job area Cross flatness detector implementation.Specifically, driving commutation carrier 23 makees commutation movement (such as 180 ° of rotation), so that commutation carries Flatness detector on tool 23 is converted by silicon rod handling position to pre-treatment job area, wherein silicon rod clamper 25 and flatness Detector is respectively arranged at the first mounting surface and the second mounting surface in commutation carrier 23 backwards to setting, in this stage, when necessary, By driving the rotary compacting device 533 of the first silicon rod positioning mechanism 53 to rotate to adjust the first silicon single crystal rod 101 Angle, such as the first silicon single crystal rod 101 is driven to rotate 45 °, so that the first silicon single crystal rod 101 is right respectively by original two diagonal lines Two adjacent sides should be adjusted to and correspond respectively to sidesway in sidesway direction (X-direction) and translation direction (Y direction) Direction and translation direction, that is, one of side is right against the flatness detector on commutation carrier 23；Then, using flat Whole degree detector carries out planar smoothness detection, the plane of any one side to four sides of the first silicon single crystal rod 101 Flatness detection further includes: driving contacting gauge 61 to shift and control by detection controller control detector shift mechanism and connects Touch detector 61 sequentially detects each test point on side to be measured current in the first silicon single crystal rod 101.

Specifically, on the one hand, include: to be controlled by detection for the detection of each test point in any one tested surface Device control detector shift mechanism (including first direction shift mechanism, second direction shift mechanism and third direction shifting machine Structure) drive contacting gauge in plane of motion internal shift so that contacting gauge corresponds to current detection point to be measured； By detection controller control detector shift mechanism (mainly second direction shift mechanism) drive contacting gauge face to The current detection point of survey is mobile until silicon rod is touched, at this point, detection controller will receive and be transmitted across from contacting gauge Next Continuity signal (or cut-off signal) simultaneously suspends detection controller control detection according to the Continuity signal (or cut-off signal) The operation of instrument shift mechanism, and by benchmark information and detector shift mechanism (mainly second direction shift mechanism) the Moving distance on two directions extrapolates the test point in the tested surface that contacting gauge is currently touched relative to base Relative distance on schedule；Contacting gauge is driven to deviate from current inspection to be measured by detection controller control detector shift mechanism Measuring point is mobile to reset, and completes the detection of a test point.

On the other hand, it for the detection of multiple test points on tested surface, certainly will need to carry out position between test point Switching, therefore, after the detection for completing a upper test point, to reset contacting gauge by detector shift mechanism It is displaced to the position of next test point by detector shift mechanism again later, wherein belong to the more of a side to be measured The dot matrix way arrangement of rule can be used in a test point.It should be noted that when a side for completing the first silicon single crystal rod 101 Flatness detection after, it is also necessary to switch to next side and carry out flatness detection.The switching of side can pass through transfer the One silicon single crystal rod 101 is realized, for example, can pass through the rotation of the first silicon rod positioning mechanism 53 of driving in workpiece filling structure Pressing device 533 rotate with adjust the first silicon single crystal rod 101 angle (such as drive the first silicon single crystal rod 101 rotate 90 °) and switch to neighbouring next side.

Extraly, in step 3, in addition to utilizing flatness detector 7 to the first silicon single crystal rod at pre-treatment job area 101 carry out except planar smoothness detection, can also be by the cooperation of flatness detector 7 and silicon rod clamper 25 come to the first monocrystalline Silicon rod 101 carries out correction operation.

It in the present embodiment, is mainly by the center of the first silicon single crystal rod 101 generally in the correction operation It is corresponding with the rotation center of plummer 531 to be overlapped.The concrete operations of the correction operation can include: right by flatness detector 7 The first silicon single crystal rod 101 carried on rotation plummer 531 carries out planar smoothness detection, to obtain the first silicon single crystal rod 101 integral position overview；By the position of the integral position overview of the first silicon single crystal rod 101 of acquisition and rotation plummer 531 It is compared, and then the deviation obtained between the center of the first silicon single crystal rod 101 and the center for rotating plummer 531 is believed Breath；The carrier 23 that commutates rotates 180 ° of work commutation movements, corresponds to rotation plummer 531 by the silicon rod clamper 25 on commutation carrier 23 On the first silicon single crystal rod 101 and clamp the first silicon single crystal rod 101；Using in detection controller control detector shift mechanism First direction shift mechanism and/or second direction shift mechanism driving commutation carrier 23 in a first direction and/or second party It moves up, thus the 101 relative rotation plummer of the first silicon single crystal rod for driving silicon rod clamper 25 and being clamped by silicon rod clamper 25 531 make position adjustment, are finally able to the coincidence corresponding with the center of plummer 531 is rotated by the center of the first silicon single crystal rod 101, complete At the correction operation for being directed to the first silicon single crystal rod 101.

In addition, being directed to the silicon rod of different kenels, difference in detail is deposited in the correction operation.

By taking silicon single crystal rod as an example, Figure 20 is please referred to, is shown as carrying out silicon single crystal rod in the schematic diagram of correction operation.Such as Figure 20 Shown, silicon single crystal rod to be processed is the silicon cube that section is substantially in class rectangle, and tool is there are four side, between two neighboring side It is formed with the connection faceted pebble in the angle R.Therefore, it may particularly include for the correction operation of silicon single crystal rod: by flatness detector pair Four sides of the silicon single crystal rod carried on rotation plummer carry out planar smoothness detection, to obtain by four side institute structures At silicon single crystal rod side center O₁；Four connections by flatness detector to the silicon single crystal rod carried on rotation plummer Faceted pebble carries out planar smoothness detection, to obtain the center for connecting the silicon single crystal rod connection faceted pebble that faceted pebble is constituted by four O₂；The size of the silicon single crystal rod finished product after silicon single crystal rod is processed through multistation is calculated；According to the ruler of silicon single crystal rod finished product Very little, silicon single crystal rod side center O₁, silicon single crystal rod connection faceted pebble center O₂, extrapolate the center O of silicon single crystal rod finished product₃；It will The center O of the silicon single crystal rod finished product of acquisition₃It is compared with the center O of rotation plummer, and then the deviation information of the two； The carrier that commutates makees commutation movement, and the silicon single crystal rod corresponded on rotation plummer by the silicon rod clamper on commutation carrier simultaneously clamps Silicon single crystal rod controls first direction shift mechanism and/or second direction shifting in detector shift mechanism using detection controller Position mechanism driving commutation carrier is in a first direction and/or second party moves up, to drive silicon rod clamper and be pressed from both sides by silicon rod The silicon single crystal rod relative rotation plummer of tool clamping makees position adjustment, is finally able to the center O of silicon single crystal rod finished product₃With rotation The center O of plummer is corresponding to be overlapped, the correction operation for completing to be directed to silicon single crystal rod.

Step 4, the first silicon rod for completing planar smoothness detection is converted by pre-treatment job area by pre-treatment job area To the first operation area and the circle of contact is carried out to the first silicon rod on the first operation area and corase grinding operation will be to be processed in this stage Second silicon rod is loaded into pre-treatment job area and is pre-processed.The shape of silicon single crystal rod Multi-position processing machine after implementation aforesaid operations State is shown as showing the state that the first silicon rod progress circle of contact and corase grinding operation and the second silicon rod are loaded for details, reference can be made to Figure 21 It is intended to.

In the present embodiment, the first silicon rod completion planar smoothness detected is by pre-treatment job area by pre-treatment job It is to implement to complete by enabling silicon rod conversion equipment rotate the first predetermined angle that area, which is converted to the first operation area, as previously mentioned, in advance Processing operation area, the first operation area and the second operation area are in 120 ° of distributions between any two, and three silicon rod positioning mechanisms 53 are two-by-two Between also in 120 ° of distributions, therefore, enabling silicon rod conversion equipment 5 rotate the first predetermined angle is actually to enable silicon rod conversion equipment 5 rotate forward 120 °, the first monocrystalline silicon of the first silicon rod positioning mechanism 53 and its positioning that are initially positioned in pre-treatment job area Stick 101 is just on conversion to the first operation area.

The circle of contact is carried out to the first silicon single crystal rod 101 on the first operation area and corase grinding operation is then by the circle of contact and corase grinding device 3 implementations.In the case of the first silicon single crystal rod 101 is silicon single crystal rod, the circle of contact and corase grinding device 3 are the circle of contact and corase grinding device. Carrying out the circle of contact and corase grinding processing operation to silicon single crystal rod by the circle of contact and corase grinding device can generally comprise: the circle of contact processes operation and corase grinding Process operation.

Circle of contact processing operation further comprises: first silicon single crystal rod 101 being transferred to first first with silicon rod conversion equipment 5 Operation area carries out positioning adjustment to the first silicon single crystal rod 101 by the first silicon rod positioning mechanism 53；Initially, in silicon rod converting means When setting 5 first silicon single crystal rod 101 being transferred to the first operation area, the side of the first silicon single crystal rod 101 corresponds to the circle of contact and thick Therefore the first grinding tool of a pair 33 in mill apparatus carries out positioning tune to the first silicon single crystal rod 101 by the first silicon rod positioning mechanism 53 It is whole can be for example including driving positive (or reverse) 45 ° of the rotation of the first silicon single crystal rod 101, so that the in the first silicon single crystal rod 101 A pair of connection faceted pebble, which reaches, initially slightly to be cut position and corresponds to the circle of contact and roughly grind the first grinding tool of a pair 33 in device, and the first mill is enabled Opposite first rack 31 of tool 33 makees traverse feed according to the amount of feeding, rotates the first grinding wheel 34 in the first grinding tool 33 and drives first Grinding tool 33 moves up and down slightly cut for the first time to first pair of connection faceted pebble in the first silicon single crystal rod 101；By the first silicon rod Positioning mechanism 53 drives the first silicon single crystal rod 101 to rotate forward 5 °, rotates the first grinding wheel 34 in the first grinding tool 33 and drives the One grinding tool 33 moves up and down slightly to be cut for the second time to first pair of connection faceted pebble in the first silicon single crystal rod 101；By the first silicon Stick positioning mechanism 53 drives the first silicon single crystal rod 101 to rotate forward 80 °, so that second pair in the first silicon single crystal rod 101 connects Faceted pebble corresponds to the circle of contact and roughly grinds the first grinding tool of a pair 33 in device, rotates the first grinding wheel 34 in the first grinding tool 33 and drives First grinding tool 33 moves up and down slightly cut for the first time to second pair of connection faceted pebble in the first silicon single crystal rod 101；By first Silicon rod positioning mechanism 53 drives the first silicon single crystal rod 101 to rotate forward 5 °, at this time second pair of connecting edge of the first silicon single crystal rod 101 Face, which reaches, initially slightly cuts position and corresponds to the circle of contact and roughly grind the first grinding tool of a pair 33 in device, rotates in the first grinding tool 33 First grinding wheel 34 simultaneously drives the first grinding tool 33 to move up and down to second pair of connection faceted pebble progress the in the first silicon single crystal rod 101 It is secondary slightly to cut；It drives the first silicon single crystal rod 101 to rotate forward 5 ° by the first silicon rod positioning mechanism 53, rotates in the first grinding tool 33 First grinding wheel 34 simultaneously drives the first grinding tool 33 to move up and down to second pair of connection faceted pebble progress the in the first silicon single crystal rod 101 It slightly cuts three times；It drives the first silicon single crystal rod 101 to rotate forward 80 ° by the first silicon rod positioning mechanism 53, rotates in the first grinding tool 33 The first grinding wheel 34 and drive the first grinding tool 33 move up and down in the first silicon single crystal rod 101 first pair of connection faceted pebble progress Third time is slightly cut.Silicon single crystal rod as the first silicon single crystal rod 101 implement the state of above-mentioned circle of contact processing operation for details, reference can be made to Figure 22, Figure 22 are shown as state change schematic diagram of the silicon single crystal rod in circle of contact processing operation.

It should be strongly noted that driving the first monocrystalline by the first silicon rod positioning mechanism 53 in aforementioned circle of contact processing operation Silicon rod 101 rotates respective angles, such as: the first silicon rod positioning mechanism 53 drives the first silicon single crystal rod 101 to rotate forward 5 °, not Be suitable for adjusting the angle in other alternative embodiments for unique implementation, for example, 3 ° to 7 °, including 3 °, 4 °, 5 °, 6 °, 7 ° or other angles, correspondingly, the feelings for driving the first silicon single crystal rod 101 to rotate forward 80 ° by the first silicon rod positioning mechanism 53 Angle is then adaptively adjusted in condition.Please refer to following table one, table one is shown as rotational angle each numerical value within the scope of 3 ° to 7 ° and shows Example situation.

Table one

Above-mentioned circle of contact processing operation process is only the embodiment in circle of contact processing operation, but is not limited thereto, such as: First silicon single crystal rod 101 is transferred into the first operation area first with silicon rod conversion equipment 5, is driven by the first silicon rod positioning mechanism 53 First silicon single crystal rod 101 rotates forward 40 ° so that first pair of connecting edge face in the first silicon single crystal rod 101 correspond to the circle of contact and The first grinding tool of a pair 33 in device is roughly ground, the first grinding wheel 34 in the first grinding tool 33 is rotated and drives the first about 33 grinding tool fortune It moves slightly cut for the first time to first pair of connection faceted pebble in the first silicon single crystal rod 101；By 53 band of the first silicon rod positioning mechanism Dynamic first silicon single crystal rod 101 rotates forward 5 °, rotates the first grinding wheel 34 in the first grinding tool 33 and drives the first about 33 grinding tool Movement slightly to cut first pair of connection faceted pebble in the first silicon single crystal rod 101 for the second time；By the first silicon rod positioning mechanism 53 It drives the first silicon single crystal rod 101 to rotate forward 5 °, rotate the first grinding wheel 34 in the first grinding tool 33 and drives on the first grinding tool 33 Lower movement is slightly cut with carrying out third time to first pair of connection faceted pebble in the first silicon single crystal rod 101；By the first silicon rod positioning mechanism 53 the first silicon single crystal rods 101 of drive rotate forward 80 °, rotate the first grinding wheel 34 in the first grinding tool 33 and drive the first grinding tool 33 It moves up and down slightly cut for the first time to second pair of connection faceted pebble in the first silicon single crystal rod 101；By the first silicon rod localization machine Structure 53 drives the first silicon single crystal rod 101 to rotate forward 5 °, rotates the first grinding wheel 34 in the first grinding tool 33 and drives the first grinding tool 33 move up and down slightly to be cut for the second time to second pair of connection faceted pebble in the first silicon single crystal rod 101；It is positioned by the first silicon rod Mechanism 53 drives the first silicon single crystal rod 101 to rotate forward 5 °, rotates the first grinding wheel 34 in the first grinding tool 33 and drives the first mill Tool 33 moves up and down to carry out third time to second pair of connection faceted pebble in the first silicon single crystal rod 101 and slightly cut.

Corase grinding processing operation further comprises: first silicon single crystal rod 101 being transferred to first first with silicon rod conversion equipment 5 Operation area carries out positioning adjustment to the first silicon single crystal rod 101 by the first silicon rod positioning mechanism 53, so that the first silicon single crystal rod 101 In first pair of side reach initial corase grinding position and correspond to the circle of contact and roughly grind the first grinding tool of a pair 33 in device, enable first Grinding tool 33 makees traverse feed according to the amount of feeding with respect to the first rack 31, rotates the first grinding wheel 34 in the first grinding tool 33 and drives the One grinding tool 33 moves up and down to roughly grind to first pair of side in the first silicon single crystal rod 101；By the first silicon rod positioning mechanism 53 drive positive (or reverse) 90 ° of the rotation of the first silicon single crystal rod 101, so that second pair of side in the first silicon single crystal rod 101 is arrived Up to initial corase grinding position and correspond to the circle of contact and roughly grind the first grinding tool of a pair 33 in device, rotates first in the first grinding tool 33 Grinding wheel 34 simultaneously drives the first grinding tool 33 to move up and down to roughly grind to second pair of side in the first silicon single crystal rod 101.As The silicon single crystal rod of first silicon single crystal rod 101 implements the state of above-mentioned corase grinding processing operation, and for details, reference can be made to Figure 23, Figure 23 to be shown as State change schematic diagram of the silicon single crystal rod in corase grinding processing operation.

In step 4, the second silicon rod to be processed is loaded into pre-treatment job area and carries out pretreated implementation process It can refer to the description in abovementioned steps 2 and step 3, details are not described herein.

Step 5, by complete the circle of contact and roughly grind operation the first silicon rod converted by the first operation area to the second operation area and Pretreated second silicon rod will be completed to be converted by pre-treatment job area to the first operation area；To the first silicon rod on the second operation area Carry out round as a ball and fine grinding operation, in this stage, enable to the second silicon rod on the first operation area carry out the circle of contact and corase grinding operation and Third silicon rod to be processed is loaded into pre-treatment job area and is pre-processed.Silicon single crystal rod multistation after implementation aforesaid operations For details, reference can be made to Figure 24, Figure 24 to show the silicon single crystal rod Multi-position processing machine of the application simultaneously to three silicon rods for the state of processing machine Carry out the status diagram of processing operation.

In the present embodiment, by complete the circle of contact and roughly grind operation the first silicon single crystal rod 101 by the first operation area convert to Second operation area and pretreated second silicon single crystal rod 102 will be completed to be converted by pre-treatment job area to the first operation area to be logical Cross enable silicon rod conversion equipment 5 rotate the second predetermined angle implement complete, as previously mentioned, pre-treatment job area, the first operation area, And second operation area be between any two 120 ° distribution, three silicon rod positioning mechanisms 53 between any two also in 120 ° distribution, therefore, Enabling silicon rod conversion equipment 5 rotate the second predetermined angle is actually that silicon rod conversion equipment 5 is enabled to rotate forward 120 °, is initially positioned at First silicon single crystal rod 101 of the first silicon rod positioning mechanism 53 and its positioning on the first operation area is just on conversion to the second operation area And the second silicon single crystal rod 102 of the second silicon rod positioning mechanism 53 and its positioning being initially positioned in pre-treatment job area is just converted To the first operation area.

Carrying out round as a ball and fine grinding operation to the first silicon single crystal rod 101 on the second operation area is then by round as a ball and fine grinding device 4 implementations.In the case of the first silicon single crystal rod 101 is silicon single crystal rod, round as a ball and fine grinding device 4 is round as a ball and fine grinding device. Carrying out round as a ball and fine grinding operation to silicon single crystal rod by round as a ball and fine grinding device can generally comprise: round as a ball processing operation and fine grinding Process operation.Round as a ball processing operation further comprises: will be as the first silicon single crystal rod of silicon single crystal rod using silicon rod conversion equipment 5 101 transfer to the second operation area of silicon rod processing platform, are determined by the first silicon rod positioning mechanism 53 the first silicon single crystal rod 101 Position simultaneously rotates the first silicon single crystal rod 101, and opposite second rack 41 of the second grinding tool 43 is enabled to make traverse feed according to the amount of feeding, rotation the The second grinding wheel 44 and the second grinding tool 43 of driving in two grinding tools 43 move up and down with each connecting edge to the first silicon single crystal rod 101 Face grind it is round as a ball so that the connection faceted pebble of the first silicon single crystal rod 101 is ground to preset size and whole rounding, that is, even Connect faceted pebble and side rounding off.Silicon single crystal rod as the first silicon single crystal rod 101 implements the state of above-mentioned round as a ball processing operation For details, reference can be made to Figure 25, Figure 25 to be shown as status diagram of the silicon single crystal rod in round as a ball processing operation.

Fine grinding operation further comprises: being positioned by the first silicon rod positioning mechanism 53 to the first silicon single crystal rod 101 Adjustment, so that first pair of side in the first silicon single crystal rod 101 reaches initial fine grinding position and correspond to round as a ball and fine grinding device 4 In the second grinding tool of a pair 43, enable opposite second rack 41 of the second grinding tool 43 make traverse feed, the second mill of rotation according to the amount of feeding Tool 43 in the second grinding wheel 44 and drive the second grinding tool 43 move up and down with to first pair of side in the first silicon single crystal rod 101 into Row fine grinding；Positive (or reverse) 90 ° of the rotation of first silicon single crystal rod 101 is driven by the first silicon rod positioning mechanism 53, so that first is single Second pair of side in crystalline silicon rod 101 reaches initial fine grinding position and a pair second corresponded in round as a ball and fine grinding device 4 is ground Tool 43 rotates the second grinding wheel 44 in the second grinding tool 43 and the second grinding tool 43 is driven to move up and down to the first silicon single crystal rod 101 In second pair of side refine.Silicon single crystal rod as the first silicon single crystal rod 101 implements the shape of above-mentioned fine grinding operation For details, reference can be made to Figure 26, Figure 26 to be shown as status diagram of the silicon single crystal rod in fine grinding operation for state.

In steps of 5, the second silicon rod completion planar smoothness detected is by pre-treatment job area by pre-treatment job area It converts to the first operation area and the circle of contact is carried out to the second silicon single crystal rod 102 on the first operation area and roughly grinds the implementation process of operation It can refer to the description of abovementioned steps 4, and third silicon rod to be processed be loaded into pre-treatment job area and carries out pretreated reality The description that can refer to abovementioned steps 2 and step 3 is applied, details are not described herein.

Step 6, will complete it is round as a ball and fine grinding operation the first silicon rod by the second operation area convert to pre-treatment job area with And the second silicon rod for completing the circle of contact and corase grinding operation is converted to the second operation area and will be completed pretreated by the first operation area Third silicon rod is converted by pre-treatment job area to the first operation area；By the first silicon rod in pre-treatment job area carry out unloading and 4th silicon rod to be processed is loaded into pre-treatment job area and the 4th silicon rod being located at the pre-treatment job area is carried out Pretreatment carries out round as a ball and fine grinding operation to the second silicon rod on the second operation area and on the first operation area in this stage Third silicon rod carry out the circle of contact and corase grinding operation.The state of silicon single crystal rod Multi-position processing machine can specifically join after implementation aforesaid operations See that Figure 27, Figure 27 are shown as completing the status diagram of the silicon rod discharging of processing operation.

In the present embodiment, will complete it is round as a ball and fine grinding operation the first silicon single crystal rod 101 by the second operation area convert to Pre-treatment job area and by complete the circle of contact and roughly grind operation the second silicon rod converted by the first operation area to the second operation area and It will complete pretreated third silicon rod to be converted by pre-treatment job area to the first operation area to be by enabling silicon rod conversion equipment 5 rotate Third predetermined angle implement complete, as previously mentioned, pre-treatment job area, the first operation area and the second operation area two-by-two it Between in 120 ° distribution, three silicon rod positioning mechanisms 53 between any two also in 120 ° distribution, therefore, enable silicon rod conversion equipment 5 rotate Third predetermined angle is actually to enable 240 ° of 5 backwards rotation of silicon rod conversion equipment or silicon rod conversion equipment 5 is enabled to rotate forward 120 ° can be realized, the first silicon single crystal rod of the first silicon rod positioning mechanism 53 and its positioning that are initially positioned on the second operation area 101 just conversion in pre-treatment job area, the second silicon rod positioning mechanism 53 for being initially positioned on the first operation area and its positioning Second silicon single crystal rod 102 is just on conversion to the second operation area and the third silicon rod positioning that is initially positioned in pre-treatment job area Mechanism 53 and its third silicon single crystal rod 103 of positioning are just converted to the first operation area.

Particularly, for 5 rotary setting of silicon rod conversion equipment on silicon rod processing platform, for silicon rod to be made in pretreatment It is converted between industry area, the first operation area and the second operation area, it is necessary to be described in detail.

Figure 28 is please referred to, being shown as the application silicon single crystal rod Multi-position processing machine is that the state that three stations are processed in operation is shown It is intended to.As shown in figure 28, in this embodiment, the pre-treatment job area on the silicon rod processing platform, the first operation area and Second operation area is set in sequence, wherein silicon rod handler is correspondingly provided at pre-treatment job area, the first operation area is correspondingly provided with The circle of contact and corase grinding device, the second operation area is correspondingly provided with round as a ball and fine grinding device, and, pre-treatment job area, the first operation area, with And second operation area be between any two in 120 ° of distributions, correspondingly, for three silicon on round or circular ring shape conveying ontology Stick positioning mechanism is between any two also in 120 ° of distributions.

It is assumed herein that being positive according to the trend of the sequence in pre-treatment job area, the first operation area and the second operation area To the trend of the sequence opposite with the forward direction is reverse.Correspondingly, the process for executing the processing of silicon rod multistation can be wrapped substantially It includes: under initial conditions, enabling silicon rod handler 2 that first silicon single crystal rod 101 to be processed is loaded into silicon rod processing platform Pre-treatment job area, and the first silicon single crystal rod 101 being located at the pre-treatment job area is pre-processed；Silicon rod is enabled to convert Device 5 rotates forward 120 ° and is converted with that will complete pretreated first silicon single crystal rod 101 by pre-treatment job area to the first operation Area enables the circle of contact and roughly grinds device 3 to the first silicon single crystal rod 101 progress circle of contact on the first operation area and roughly grind operation, in this rank Section, enables silicon rod handler 2 that second silicon single crystal rod 102 to be processed is loaded into pre-treatment job area and pre-processes；It enables Silicon rod conversion equipment 5 rotates forward 120 ° will complete the circle of contact and roughly grind the first silicon single crystal rod 101 of operation by the first operation area Conversion is to the second operation area and will complete pretreated second silicon single crystal rod 102 and be converted by pre-treatment job area to the first operation Area enables round as a ball and fine grinding device 4 carry out round as a ball and fine grinding operation to the first silicon single crystal rod 101 on the second operation area, in this rank Section enables the circle of contact and roughly grinds device 3 to the second silicon single crystal rod 102 progress circle of contact on the first operation area and roughly grind operation and enable silicon Third silicon single crystal rod 103 to be processed is loaded into pre-treatment job area and pre-processed by stick handler 5；Silicon rod is enabled to convert Device 5 rotates forward 120 ° or 240 ° of backwards rotation will complete round as a ball and fine grinding operation the first silicon single crystal rod 101 by second It converts to pre-treatment job area and the circle of contact will be completed and roughly grind the second silicon single crystal rod 102 of operation by the first operation area in operation area Conversion to the second operation area and will complete pretreated third silicon single crystal rod 103 by pre-treatment job area convert to first make Industry area unloads the first silicon single crystal rod 101 in pre-treatment job area.

In view of the cables such as the power supply line laid in the silicon single crystal rod Multi-position processing machine or signal wire will not be because of silicon rod Conversion equipment it is excessive rotation and drive those cables excessively wind in turn result in those cables around break.In specific embodiment In, technical solution consideration provided by the present application limits the maximum rotation angle of the silicon rod conversion equipment, that is, is enabling silicon During stick conversion equipment is converted the first silicon single crystal rod 101 to pre-treatment job area by the second operation area, may include with Lower two kinds of situations:

The first situation is that the rotation angle range of silicon rod conversion equipment 5 is ± 240 °, in particular to makes silicon rod converting means It sets 5 and original position is returned to after 120 ° and 240 ° primary of backwards rotation by rotating forward twice, round as a ball and fine grinding will be completed and made First silicon single crystal rod 101 of industry is converted by the second operation area to pre-treatment job area.This kind of situation bring beneficial effect is also wrapped It includes, more flexible design space can be provided for the internal structure design of entire silicon single crystal rod Multi-position processing machine, for example, can With consider the second processing district to be arranged between pretreating zone other components without regard to hinder silicon rod conversion equipment rotation Situation.

Second situation is that the rotation angle range of the silicon rod conversion equipment is ± 360 °, and silicon rod conversion equipment 5 is made to exist Round as a ball and fine grinding operation the first silicon single crystal rod 101 will be completed after 360 ° and be converted by the second operation area to pretreatment to make by rotating a circle Industry area, then, the cable that another mistake is wound during rotating in the forward direction to 360 ° of releases that rotate a circle.

In short, above two rotating manner may achieve essentially identical effect, but the setting of silicon rod conversion equipment still and with This is limited, as long as the silicon rod that can allow to carry out processing operation can be smooth, steady and expeditiously completes every processing operation, then The conversion regime (such as rotation direction and rotational angle etc.) of silicon rod conversion equipment can make other variations.

Certainly, if not considering the risk or set in the second processing district between pretreating zone that above-mentioned cable is excessively wound The problem of setting other components, the silicon rod conversion equipment can also continue to use this unidirectional unlimited rotary mode.

Due to executing the handling of silicon rod, planar smoothness detects, the circle of contact and corase grinding operation, round as a ball and fine grinding operation are aforementioned It has been described, details are not described herein.

Pass through above-mentioned each step, it can be seen that Each performs its own functions for the processing unit (plant) on each processing stations, each processing dress Multiple procedures that are orderly and seamlessly being shifted and automated realization silicon rod processing, form pipelining between setting, Improve the quality of production efficiency and product processing operation.

The principles and effects of the application are only illustrated in above-described embodiment, not for limitation the application.It is any ripe Know the personage of this technology all can without prejudice to spirit herein and under the scope of, carry out modifications and changes to above-described embodiment.Cause This, those of ordinary skill in the art is complete without departing from spirit disclosed herein and institute under technical idea such as At all equivalent modifications or change, should be covered by claims hereof.

Claims

1. a kind of silicon single crystal rod multiplexing position processing method, applied to the silicon single crystal rod multiplexing processing machine with the circle of contact and corase grinding device In, which is characterized in that the silicon single crystal rod multiplexing position processing method the following steps are included:

The silicon single crystal rod to be processed is placed in the circle of contact and roughly grinds the operation area of device；

The circle of contact and corase grinding device is enabled to carry out circle of contact operation to first pair of the silicon single crystal rod and second pair connection faceted pebble；With And

The circle of contact and corase grinding device is enabled to carry out corase grinding operation to first pair of the silicon single crystal rod and second pair of side.

2. silicon single crystal rod multiplexing position processing method according to claim 1, which is characterized in that it is described enable the circle of contact and It includes: to enable the circle of contact and slightly that corase grinding device, which carries out circle of contact operation to first pair of the silicon single crystal rod and second pair connection faceted pebble, Mill apparatus at least slightly cuts operation to first pair of the silicon single crystal rod and second pair connection faceted pebble progress respectively three times.

3. silicon single crystal rod multiplexing position processing method according to claim 2, which is characterized in that the circle of contact and thick of enabling Mill apparatus carries out at least three times first pair of the silicon single crystal rod and second pair one pair of them connected in faceted pebble connection faceted pebble Slightly cut operation the following steps are included:

It enables a pair of of connection faceted pebble in the silicon single crystal rod turn to and cuts position slightly initially to correspond in the circle of contact and corase grinding device The first grinding tool of a pair；

First grinding tool is enabled to carry out slightly cutting operation for the first time to the pair of connection faceted pebble；

It enables the silicon single crystal rod is relatively described initially slightly to cut position and rotate forward the first deflection angle, enables first grinding tool to institute It states first pair of connection faceted pebble and is slightly cut operation for the second time；And

It enables the silicon single crystal rod is relatively described initially slightly to cut the second deflection angle of position backwards rotation, enables first grinding tool to institute A pair of of connection faceted pebble is stated to carry out slightly cutting operation for the third time.

4. silicon single crystal rod multiplexing position processing method according to claim 3, which is characterized in that first deflection angle Range is 3 ° to 7 °, and the range of second deflection angle is 3 ° to 7 °.

5. silicon single crystal rod multiplexing position processing method according to claim 1, which is characterized in that it is described enable the circle of contact and It includes following step that corase grinding device, which carries out corase grinding operation to a pair of of side in first pair of the silicon single crystal rod and second pair of side, It is rapid:

A pair of of side in silicon single crystal rod is enabled to turn to initial corase grinding position to correspond to a pair of first grinding tool；

First grinding tool is enabled to carry out corase grinding operation to the pair of side.

6. silicon single crystal rod multiplexing position processing method according to claim 1, it is characterised in that: the silicon single crystal rod multistation Processing machine further includes round as a ball and fine grinding device；Wherein, the silicon single crystal rod multiplexing position processing method further include:

The silicon single crystal rod to be processed is placed in described round as a ball and fine grinding device operation area；

Described round as a ball and fine grinding device is enabled to carry out round as a ball operation to the connection faceted pebble of the silicon single crystal rod；And

Described round as a ball and fine grinding device is enabled to carry out fine grinding operation to first pair of the silicon single crystal rod and second pair of side.

7. silicon single crystal rod multiplexing position processing method according to claim 6, which is characterized in that it is described enable it is described round as a ball and Fine grinding device round as a ball operation is carried out to the connection faceted pebble of the silicon single crystal rod the following steps are included:

Adjust the grinding spacing of the second grinding tool of a pair in described round as a ball and fine grinding device；And

The silicon single crystal rod is rotated, second grinding tool is enabled to carry out round as a ball operation to the connection faceted pebble of the silicon single crystal rod.

8. silicon single crystal rod multiplexing position processing method according to claim 6, which is characterized in that it is described enable it is described round as a ball and It includes following step that fine grinding device, which carries out fine grinding operation to a pair of of side in first pair of the silicon single crystal rod and second pair of side, It is rapid:

A pair of of side in silicon single crystal rod is enabled to turn to initial fine grinding position to correspond to a pair of second grinding tool；And

Second grinding tool is enabled to carry out fine grinding operation to the pair of side.

9. silicon single crystal rod multiplexing position processing method according to claim 1, which is characterized in that further include to described to be processed Silicon single crystal rod the step of carrying out correction operation.

10. a kind of silicon single crystal rod multistation using the described in any item silicon single crystal rod multiplexing position processing methods of claim 1-9 Processing machine.