CN207058287U - Silicon rod Multi-position processing machine - Google Patents

Abstract

A kind of silicon rod Multi-position processing machine of disclosure, including：Support, there is silicon rod processing platform；Silicon rod handler, for carrying out the handling operation of silicon rod in the pretreatment position of silicon rod processing platform；First processing unit (plant), the silicon rod on the first processing position to silicon rod processing platform carry out the first processing operation；Second processing unit (plant), the silicon rod on the second processing position to silicon rod processing platform carry out the second processing operation；Silicon rod conversion equipment, for silicon rod to be changed between pretreatment position, the first processing position and the second processing position.The application silicon rod Multi-position processing machine, multiple processing unit (plant)s are gathered, silicon rod is quick, steady and changed with no damage in each processing district interdigit, the multiple processing operations for realizing silicon rod processing can be automated, each processing operation seamless connection, save labour turnover and improve production efficiency, improve the quality of silicon rod processing operation.

Description

Silicon rod Multi-position processing machine

Technical field

The application is related to silicon work pieces process technical field, more particularly to silicon rod Multi-position processing machine.

Background technology

At present, as the attention and opening that society utilizes to green regenerative energy sources, photovoltaic solar power field are more next More paid attention to and developed.In field of photovoltaic power generation, common crystal silicon solar energy battery be on high quality silicon chip made of, This silicon chip is formed after the silicon ingot for lifting or casting by multi-thread saw cut and following process.

The Making programme of existing silicon chip, by taking single crystal silicon product as an example, usually, flow chart substantially may include：First make Long silicon rod originally is carried out blocking operation to form the short silicon rod of multistage with silicon rod shear；After the completion of blocking, silicon rod is used again Excavation machine forms silicon single crystal rod after carrying out evolution operation to the short silicon rod after blocking；Round as a ball, mill is carried out to each silicon single crystal rod again Face etc. processes operation so that the surface shaping of silicon single crystal rod reaches corresponding flatness and size tolerance requirements；Subsequently reuse Slicer carries out section operation to silicon single crystal rod, then obtains monocrystalline silicon piece.And by taking polysilicon product as an example, usually, substantially Flow chart may include：Evolution processing is first carried out to first grade silicon ingot (large scale silicon ingot) using silicon ingot excavation machine to form secondary silicon Ingot (small size silicon ingot)；After evolution, reuse silicon ingot shear and secondary grade silicon ingot is carried out blocking processing to form polysilicon Rod；The processing operation such as chamfering, barreling is carried out to each polycrystalline silicon rod again so that the surface shaping of polycrystalline silicon rod reaches corresponding flat Whole degree and size tolerance requirements；Subsequently reuse slicer carries out section operation to polycrystalline silicon rod, then obtains polysilicon chip.

But, under general scenario, in the related art, each procedures (such as grinding, chamfering, barreling or round as a ball Deng) needed for operation be independent arrangement, corresponding processing unit (plant) be dispersed in different production units or workshop or production car Between different producing regions, performing the conversion of the workpiece of different procedures needs to carry out carrying allotment, and is performing each work It may be required for carrying out pretreatment work before sequence operation, so, process is numerous and diverse, and efficiency is low, and easily influences silicon rod processing and make The quality of industry, more manpowers or transloading equipment are needed, potential safety hazard is big, in addition, the flowing between the implement of each process Link is more, and the risk of workpiece damage is improved during workpiece transfer, is also easy to produce unqualified, reduction caused by nonproductive factors Unreasonable loss caused by the qualification rate of product and existing processing mode, is the major improvement class that each company faces Topic.

Utility model content

In view of the disadvantages of existing correlation technique, the purpose of the application are to disclose a kind of silicon rod multistation processing above Machine, for solving present in existing correlation technique, efficiency is low, silicon rod transfer is numerous and diverse and silicon rod is processed between each procedures Not the problems such as operation effectiveness is not good enough.

To achieve the above object and other purposes, the application disclose a kind of silicon rod Multi-position processing machine on the one hand, including： Support, there is silicon rod processing platform；Silicon rod handler, located at the pretreatment position of the silicon rod processing platform, for that will treat The silicon rod of processing load to the pretreatment position of the silicon rod processing platform and will be processed after silicon rod add from the silicon rod The pretreatment position unloading of work platform；First processing unit (plant), located at the silicon rod processing platform first process position, for pair The silicon rod carries out the first processing operation；Second processing unit (plant), second located at the silicon rod processing platform processes position, is used for To carrying out the second processing operation by the first post-job silicon rod of processing of first processing unit (plant)；Silicon rod conversion equipment, rotation Turn be arranged on the silicon rod processing platform, for by by the silicon rod handler load Lai silicon rod processed in the silicon rod Changed between pretreatment position, the first processing position and the second processing position on platform.

The application silicon rod Multi-position processing machine, has gathered multiple processing unit (plant)s, can be by silicon rod using silicon rod handler Quickly, it is steady and loaded and unloaded with no damage, using silicon rod conversion equipment can by silicon rod between each processing unit (plant) in order and The multiple procedures for realizing silicon rod processing are seamlessly shifted and are automated, multiple processing unit (plant)s can be simultaneously to corresponding silicon Rod carries out corresponding processing operation, improves production efficiency and the quality of Product processing operation.

In some embodiments, the silicon rod handler includes：Silicon rod loads and unloads position, provided with for carrying the silicon Rod erects the silicon rod plummer placed；Commutate carrier, for making commutation motion；Silicon rod clamper, located at the of the commutation carrier One mounting surface；Wherein, by driving the commutation carrier to make commutation motion so that the silicon rod clamper of the commutation carrier is described Silicon rod loads and unloads to be changed to transfer the silicon rod between position and the pretreatment position.

In some embodiments, the silicon rod clamper includes：Fixture installed part, on the commutation carrier；At least Two silicon rod holders, set along the fixture installed part spacing；Each described silicon rod holder includes：Jig arm is installed Seat, on the fixture installed part；At least two jig arm, it is movably arranged in the jig arm mounting seat；Jig arm drive mechanism, use Make opening and closing movement in driving at least two jig arm.

In some embodiments, at least one silicon rod holder at least two silicon rods holder, which is provided with, is oriented to Drive mechanism, for driving it along the fixture installed part motion, to adjust at least two silicon rod holder Spacing.

In some embodiments, the silicon rod handler also includes：Height testing instrument, located at the commutation carrier On, for detecting the height of the silicon rod.

In some embodiments, the silicon rod Multi-position processing machine also includes flatness detector, located at the commutation Second mounting surface of carrier, for carrying out planar smoothness detection to the silicon rod.

In some embodiments, the flatness detector includes：Contact measurement structure；Detector shift mechanism； Controller is detected, is connected with the contact measurement structure and the detector shift mechanism, for controlling the detector to move Position mechanism drives the contact measurement structural shift and the control contact measurement structure sequentially to detect in the silicon rod The relative distance of each test point on tested surface.

In some embodiments, the silicon rod conversion equipment includes：The conveying body of disc or annular；Silicon rod is determined Position mechanism, on the conveying body, for being positioned to the silicon rod；Drive mechanism is changed, it is described defeated for driving The silicon rod for sending body to rotate to drive the silicon rod detent mechanism to be positioned changes position.

In some embodiments, the silicon rod detent mechanism includes：Plummer is rotated, located at the disc or annulus On the conveying body of shape, for carrying the silicon rod；Rotary compacting device, the top of the rotation plummer is relatively arranged on, For compressing the silicon rod；Lifting drive, for driving the rotary compacting device vertically to make elevating movement；Rotation Rotary driving device, for driving the rotary compacting device and driving the rotary compacting device to rotate.

In some embodiments, first processing unit (plant) includes：First frame；At least one pair of first grinding tool, to It is arranged in first frame, the silicon rod for being pointed on the silicon rod conversion equipment at the first processing position carries out first and added Work industry.

In some embodiments, first grinding tool includes：First main shaft；At least one first emery wheel, it is arranged at described The operation end of first main shaft；First emery wheel has the first frosted particle of the first granularity.

In some embodiments, second processing unit (plant) includes：Second frame；At least one pair of second grinding tool, to It is arranged in second frame, the silicon rod for being pointed on the silicon rod conversion equipment at the second processing position carries out second and added Work industry.

In some embodiments, second grinding tool includes：Second main shaft；At least one second emery wheel, it is arranged at described The operation end of second main shaft；Second emery wheel has the second frosted particle of the second granularity.

In some embodiments, the silicon rod Multi-position processing machine also includes protective door, for will pretreatment position with The first processing position and the second processing position are isolated.

In some embodiments, the pretreatment position on the silicon rod processing platform, the first processing position and second Position is processed between any two in 120 ° of distributions, and the rotation angle range of the silicon rod conversion equipment is ± 240 °.

In some embodiments, described silicon rod Multi-position processing machine also includes the 3rd processing unit (plant), located at the silicon 3rd processing position of rod processing platform；Pretreatment position, the first processing position on the silicon rod processing platform, the second processing In 90 ° of distributions between position and the 3rd processing district are adjacent two-by-two, the rotation angle range of the silicon rod conversion equipment for ± 270°。

In some embodiments, the rotation angle range of the silicon rod conversion equipment is ± 360 ° or the silicon rod turns Changing device uses unidirectional unlimited rotary mode.

Brief description of the drawings

Fig. 1 is shown as stereochemical structure signal of the silicon rod Multi-position processing machine under a certain visual angle in the application embodiment Figure.

Fig. 2 is shown as the top view of silicon rod Multi-position processing machine in the application embodiment.

Fig. 3 is shown as the side view of silicon rod Multi-position processing machine in the application embodiment.

Fig. 4 is shown as the structural representation of silicon rod holder in one embodiment in the application silicon rod Multi-position processing machine Figure.

Fig. 5 is shown as structural representation of the silicon rod holder in another embodiment in the application silicon rod Multi-position processing machine Figure.

Fig. 6 is shown as the rearview of silicon rod clamper in the application silicon rod Multi-position processing machine.

Fig. 7 is shown as the flow of the application silicon rod Multi-position processing machine execution silicon rod processing operation in one embodiment and shown It is intended to.

Fig. 8 is shown as the application silicon rod Multi-position processing machine and performs the flow of silicon rod processing operation in another embodiment Schematic diagram.

Fig. 9 is shown as silicon rod and is straightened the view being positioned on silicon rod plummer.

Figure 10 is shown as the view that silicon rod is clamped by silicon rod clamper.

Figure 11 is shown as the view that silicon rod is positioned over pretreatment position by commutation carrier.

Figure 12 is shown as the view of height testing instrument detection silicon rod height on handling plummer.

Figure 13 and Figure 14 is shown as the view of flatness detector detection silicon rod planar smoothness.

Figure 15 is shown as carrying out silicon single crystal rod the schematic diagram of correction operation.

Figure 16 is shown as carrying out polycrystalline silicon rod the schematic diagram of correction operation.

Figure 17 is shown as the view for the first processing operation being carried out to the first silicon rod and the second silicon rod is loaded.

Figure 18 is shown as the state change schematic diagram that silicon single crystal rod is processed in operation in the circle of contact.

Figure 19 is shown as the state change schematic diagram that silicon single crystal rod is processed in operation in corase grind.

Figure 20 is shown as the state change schematic diagram that polycrystalline silicon rod is processed in operation in corase grind.

Figure 21 shows the silicon rod Multi-position processing machine of the application while three silicon rods is processed with the state signal of operation Figure.

Figure 22 is shown as view of the silicon single crystal rod in round as a ball processing operation.

Figure 23 is shown as view of the silicon single crystal rod in fine grinding operation.

Figure 24 is shown as view of the polycrystalline silicon rod in chamfer machining operation.

Figure 25 is shown as view of the polycrystalline silicon rod in fine grinding operation.

Figure 26 is shown as completing the view of the silicon rod discharging of processing operation.

Figure 27 is shown as the view that the application silicon rod Multi-position processing machine is processed in operation for three stations.

Figure 28 is shown as the view that the application silicon rod Multi-position processing machine is processed in operation for four stations.

Embodiment

Illustrate presently filed embodiment below by way of specific instantiation, those skilled in the art can be by this specification Disclosed content understands other advantages and effect of the application easily.The application can also pass through specific realities different in addition The mode of applying is embodied or practiced, the various details in this specification can also be based on different viewpoints with application, without departing from Various modifications or alterations are carried out under spirit herein.

It should be noted that structure, ratio, size depicted in this specification institute accompanying drawings etc., only coordinating Content disclosed in bright book, so that those skilled in the art understands and reads, it is not limited to the enforceable limit of the application Fixed condition, therefore do not have technical essential meaning, the modification of any structure, the change of proportionate relationship or the adjustment of size, not Influence under the effect of the application can be generated and the purpose that can reach, all should still fall and be obtained in techniques disclosed in this application content In the range of covering.It is meanwhile cited such as " on ", " under ", "left", "right", " centre " and " one " etc. in this specification Term, understanding for narration is merely convenient to, and is not used to limit the enforceable scope of the application, the change of its relativeness or tune It is whole, in the case where changing technology contents without essence, when being also considered as the enforceable category of the application.

Inventors herein have recognized that in the processing operation technique for silicon rod of correlation, the grinding that is related to, chamfering, The processing unit (plant)s such as barreling are scattered each other and independently arrange, performing the conversion of the silicon rod of different procedures needs to be carried , the problems such as process is numerous and diverse and efficiency is low be present in the pretreatment before allotment and processing.

In view of this, present applicant proposes a kind of silicon rod Multi-position processing machine, by scrap build, collect within one device Multiple processing unit (plant)s have been closed, silicon rod is quick, steady and changed with no damage in each processing district interdigit, it can automate reality Multiple processing operations of existing silicon rod processing simultaneously can carry out corresponding processing operation to corresponding silicon rod simultaneously, it is each process operation it Between seamless connection, save labour turnover and improve production efficiency, improve the quality of silicon rod processing operation.

Fig. 1 to Fig. 3 is referred to, is shown as the structural representation of the application silicon rod Multi-position processing machine in one embodiment Figure, wherein, Fig. 1 be the application embodiment in dimensional structure diagram of the silicon rod Multi-position processing machine under a certain visual angle, Fig. 2 For the top view of silicon rod Multi-position processing machine in the application embodiment, Fig. 3 is that silicon rod multistation adds in the application embodiment The side view of work machine.In one embodiment, the application silicon rod Multi-position processing machine is to be used to be processed operation to silicon rod, Here, the silicon rod is class rectangle silicon rod, and it can be silicon single crystal rod or polycrystalline silicon rod, should belong to the guarantor of the application Protect scope.

By taking silicon single crystal rod as an example, the formation process of silicon single crystal rod may include：First using silicon rod shear to long silicon originally Rod carries out blocking operation to form the short silicon rod of multistage；After the completion of blocking, and the short silicon rod after blocking is entered using squaring silicon bar machine Row evolution operation Formation cross-section is in the silicon single crystal rod of class rectangle.Wherein, long silicon rod originally is cut using silicon rod shear Disconnected operation with formed the specific implementation of the short silicon rod of multistage refer to for example, CN105856445A, CN105946127A, with And the patent publication us such as CN105196433A, shape after evolution operation is carried out to the short silicon rod after blocking using squaring silicon bar machine Into section the patent publication us such as CN105818285A are then referred in the embodiment of the silicon single crystal rod of class rectangle.It is but single The formation process of crystalline silicon rod simultaneously loses and is limited to aforementioned techniques, and in optional example, the formation process of silicon single crystal rod may also include：First Long silicon single crystal rod of the evolution operation with Formation cross-section in class rectangle is carried out to long silicon rod originally using total silicon rod excavation machine；Evolution After the completion of, and the long silicon single crystal rod after evolution is carried out blocking operation using silicon rod shear and forms short crystalline silicon rod.Wherein, it is above-mentioned It is middle using total silicon rod excavation machine to originally long silicon rod carry out evolution operation with formed be in class rectangle long silicon single crystal rod it is specific Implementation refers to the patent publication us such as example, CN106003443A.

And by taking polycrystalline silicon rod as an example, the formation process of polycrystalline silicon rod may include：First using silicon ingot excavation machine to first grade silicon ingot Or silicon cube (large scale silicon ingot) carries out evolution processing to form time grade silicon ingot (small size silicon ingot)；After evolution, reuse Silicon ingot shear carries out blocking processing to form polycrystalline silicon rod to secondary grade silicon ingot.Wherein, using silicon ingot excavation machine to first grade silicon ingot (large scale silicon ingot) carries out evolution processing and referred to form the specific implementation of time grade silicon ingot (small size silicon ingot) The patent publication us such as CN102172997A, CN105216128A, CN105690582A, using silicon ingot shear to secondary grade silicon ingot Block processing and refer to the patents such as example, CN105196434A to form the specific implementation of polycrystalline silicon rod and disclose text Offer.

Either silicon single crystal rod also or polycrystalline silicon rod, must all carry out corresponding following process operation, these it is follow-up plus Work industry may be, for example, grinding, chamfering, barreling or round as a ball etc., and these following process operations can pass through silicon described herein Rod Multi-position processing machine is implemented.

With reference to Fig. 1 to Fig. 3, the application silicon rod Multi-position processing machine includes：Support 1, silicon rod handler 2, first are processed Device 3, the second processing unit (plant) 4 and silicon rod conversion equipment 5.

The application silicon rod Multi-position processing machine is described in detail below.

Main element of the support 1 as the application silicon rod Multi-position processing machine, there is silicon rod processing platform, wherein, it is described Silicon rod processing platform can process the specific job content of operation according to silicon rod and be divided into multiple function positions.Specifically, at this In embodiment, the silicon rod processing platform comprises at least pretreatment position, the first processing position and the second processing position.

Silicon rod conversion equipment 5 is located at the centered region of the silicon rod processing platform, for will be loaded by silicon rod handler 2 Pretreatment position of the silicon rod 100 to come up on the silicon rod processing platform, the first processing position and the second processing position it Between change.In one embodiment, the rotary setting of silicon rod conversion equipment 5 is on the silicon rod processing platform, silicon rod conversion equipment 5 Including：The conveying body 51 of disc or annular；Silicon rod detent mechanism 53 is on conveying body 51, for being carried out to silicon rod Positioning；Conversion drive mechanism is used to drive conveying body 51 to rotate the silicon rod translation bit to drive silicon rod detent mechanism 53 to be positioned Put.

As it was previously stated, silicon rod processing platform in one embodiment include pretreatment position, first processing position, with And the second processing position, to be adapted with these function positions, conveying the quantity of the silicon rod detent mechanism 53 on body 51 can set Three are set to, each silicon rod detent mechanism 53 can position a silicon rod.Further, 53 liang of these three silicon rod detent mechanisms Set angle is also that the angular distribution with three function positions between any two is consistent between two.In this way, work as some silicon When rod detent mechanism 53 corresponds to some function position, inevitably, other two silicon rod detent mechanisms 53 and respectively with its His two function positions are corresponding.So, in continuous productive process, any instant, when fixed on each silicon rod detent mechanism 53 There is a silicon rod position and when silicon rod detent mechanism 53 is corresponding with function position, then these silicon rods be located in corresponding to a certain work( Corresponding processing operation can be performed at position, such as：Silicon rod positioned at pretreatment position can carry out pre-treatment job, positioned at the The silicon rod of one processing position can carry out the first processing operation, and the silicon rod positioned at the second processing position can carry out the second processing operation. In a kind of alternative embodiment, pretreatment position, the first processing position and the second processing district on the silicon rod processing platform Position is between any two three silicon rods on the conveying body 51 of disc or annular correspondingly therefore in 120 ° of distributions Detent mechanism 53 is between any two also in 120 ° of distributions.Certainly, the quantity of silicon rod detent mechanism 53 can be become according to the actual requirements Change and not so limited, for example, the function position that the quantity of silicon rod detent mechanism 53 can be set according to silicon rod processing platform Depending on quantity.

In one embodiment, silicon rod detent mechanism 53 more may include：Rotate plummer 531, rotary compacting device 533, Lifting drive (not indicated in figure) and rotating driving device (not indicated in figure).

Rotation plummer 531 is arranged in silicon rod conversion equipment 5 on the conveying body 51 of disc or annular, for holding Carry silicon rod 100 and silicon rod 100 is placed to erect, i.e. the bottom of silicon rod 100 is seated on rotation plummer 531.In this reality Apply in mode, rotate plummer 531 and in silicon rod conversion equipment 531 one during the rotation of the conveying body 51 of disc or annular And rotate.Especially, rotation plummer 531 can also be designed as can spinning motion, such as rotation plummer 531 relative to conveying this Body 51 has rotating shaft to realize spinning motion, in this way, after the support of plummer 531 silicon rod 100 are rotated, rotates plummer 531 and silicon rod 100 thereon can together rotate.Further, the contact surface for being used for contacting in plummer 531 with silicon rod is rotated With damping, the certain frictional force of silicon rod can be driven to provide.Rotation plummer 531 is adapted to silicon rod 100, in an optional implementation In example, rotation plummer 531 can be the circular plummer being adapted with the sectional dimension of silicon rod 100.

Rotary compacting device 533 is relatively arranged on the top of rotation plummer 531, for top pressure in the top of silicon rod 100 To compress silicon rod 100.Rotary compacting device 533 can further comprise the bearing 532 of activity setting and be arranged at the bottom of bearing 532 The top pressure movable block 534 in portion.Bearing 532 is movably set on a central mounting bracket 13, and the central mounting bracket 13 is positioned at defeated Send the middle section of body 51 and followed by conveying body 51 and rotate together.In specific implementation, central mounting bracket 13 can be at least Including the six roots of sensation mounting post 131 being vertically arranged, it is divided into three groups in a manner of every group two, wherein, two mounting posts in every group 131, which are used for activity, sets a bearing 532, each bearing 532 by a lifting drive drive and along mounting post 131 and Make elevating movement.In an alternative embodiment, mounting post 131 is the relatively smooth cylindrical structure in surface, if necessary, can installed The surface of post 131 coats lubricating oil, in favor of the smoothness of the elevating movement of bearing 532.Extraly, can be arranged with mounting post 131 Protective sleeve, to be protected mounting post 131, dust, debris etc. is avoided to pollute.Top pressure movable block 534 is suitable with silicon rod 100 Match somebody with somebody, in an alternative embodiment, top pressure movable block 534 can be the patty briquetting being adapted with the sectional dimension of silicon rod 100. Further, top pressure movable block 534 axle in rotary compacting device 533 turn to be connected to bearing 532 and can relative seat 532 and It can rotate.

Understand in the preamble, the top pressure that rotation plummer 531 is designed in spinning motion and rotary compacting device 533 is lived The axle of motion block 534 turns to be connected to bearing 532, therefore, rotates plummer 531 or the linkage of top pressure movable block 534 and is driven in a rotation Dynamic device.In one case, when rotation plummer 531 is in linkage with a rotating driving device, by the conduct of rotation plummer 531 Active rotation part and top pressure movable block 534 is then used as driven rotation part；In another scenario, when top pressure movable block 534 When being in linkage with a rotating driving device, rotated by top pressure movable block 534 as active rotation part plummer 531 be then used as from Turn dynamic component.

In actual applications, rotary compacting device 533 can cooperate with the rotation plummer 531 under it, specifically, when By silicon rod 100 is vertical be positioned on rotation plummer 531 after, bearing 532 is driven along mounting post 131 by lifting drive Make descending motion until the top pressure movable block 534 on bearing 532 presses on the top of silicon rod 100.Subsequently, needing to rotate silicon rod When 100, drive the rotation plummer 531 of linkage or top pressure movable block 534 to rotate by rotating driving device, carried using rotation Platform 531, silicon rod 100 and the mutual frictional force of top pressure movable block 534, take advantage of a situation and drive silicon rod 100 also to rotate in the lump, real The adjustment of the scope of operation or operating area in existing silicon rod 100, so as to the scope of operation after being adjusted in silicon rod 100 or operating area It is processed operation.The velocity of rotation and rotational angle of silicon rod 100 can be controlled by rotating driving device.In specific implementation side In formula, lifting drive may be, for example, cylinder or lifting motor, and rotating driving device may be, for example, then electric rotating machine.

Further, from the foregoing, it will be observed that in some cases, rotation can be controlled by by rotating plummer 531 or top pressure movable block 534 Rotary driving device and rotate and change the scope of operation or operating area to drive silicon rod 100 to rotate, sometimes, when silicon rod 100 turns to Then need to stop start when the required scope of operation or operating area and position to receive processing unit (plant) in corresponding function position Processing operation.Therefore, in this application, if the silicon rod detent mechanism is necessary to can also configure a lockable mechanism.In one kind In implementation, a plummer lockable mechanism can be configured (not at the bottom of central mounting bracket 13 and neighbouring rotation plummer 531 Show in the drawings), the plummer lockable mechanism may include locking latch and the lock-up cylinder being connected with locking latch.In reality In the application of border, when needing to lock rotation plummer 531, the lock-up cylinder in plummer lockable mechanism just drives locking latch to stretch Go out and act on bottom or the neck of rotation plummer 531, it is ensured that rotation plummer 531 consolidates motionless；Wait to need to rotate silicon rod During changing the scope of operation or operating area, then by the lock-up cylinder in the plummer lockable mechanism locking latch is driven to shrink, Unblock rotation plummer 531, so that rotation plummer 531 can rotate.

The conveying body 51 of disc or annular is controllable by changing the driving of drive mechanism and rotating, and passes through disc Or the conveying body 51 of annular rotation and realize conveying body 51 on silicon rod detent mechanism 53 and by silicon rod detent mechanism 53 silicon rods 100 positioned are changed between different function positions.

In one embodiment, the conversion drive mechanism further comprises：Conversion tooth band, located at disc or annular Conveying body 51 the week side of boss；Motor and connection motor and motor-driven linkage structure driven, located at support 1 Silicon rod processing platform on, the linkage structure includes the rotate gear that is meshed with the conversion tooth band.In this way, the rotation Gear drives the conveying body 51 of disc or annular to rotate to drive silicon rod detent mechanism under motor driving 53 and silicon rod 100 thereon change to other function positions complete convey, the motor can be servomotor.

Silicon rod handler 2 is located at the pretreatment position of the silicon rod processing platform, for silicon rod to be processed to be loaded To the pretreatment position of silicon rod processing platform and will be processed after silicon rod unloaded from the pretreatment position of silicon rod processing platform. Further, silicon rod handler 2 be used to load silicon rod to be processed to the pretreatment position of silicon rod processing platform and Silicon rod after will be processed is referred specifically to for silicon rod to be processed to be filled from the unloading of the pretreatment position of silicon rod processing platform Be loaded onto conveying body 51 in it is corresponding with the pretreatment position of silicon rod processing platform rotation plummer 531 on and will be processed Silicon rod afterwards is unloaded from conveying body 51 on rotation plummer 531 corresponding with the pretreatment position of silicon rod processing platform Carry.

In one embodiment, silicon rod handler 2 further includes：Silicon rod loads and unloads position, and commutate carrier 23, and silicon rod folder Tool 25.

Silicon rod handling position, which is provided with, to be used to carry the silicon rod plummer 21 that silicon rod 100 is vertically placed；Commutation carrier 23 is used for Make commutation motion；First mounting surface of the silicon rod clamper 25 located at commutation carrier 23.By driving commutation carrier 23 to make commutation motion, Changed so that the silicon rod clamper 25 of commutation carrier 23 loads and unloads in the silicon rod between position and the pretreatment position to transfer silicon Rod 100.

Silicon rod handler is arranged on a bottom installation structure, and the bottom installation structure is convexly equipped in support 1.Pacify bottom As silicon rod handling position, silicon rod plummer 21, silicon rod plummer 21 then are provided with silicon rod handling position for the side of assembling structure For carrying silicon rod 100.In a preferred embodiment, for ease of the clamping of silicon rod clamper 25, if carrying can be caused Silicon rod 100 can adjustment position be to adapt to silicon rod clamper 25 in good time, and therefore, silicon rod plummer 21 is swiveling design, and silicon rod is held Microscope carrier 21 is provided with rotary shaft and motor, and silicon rod plummer 21 is rotated to adjust under the control of motor around rotary shaft The angle of silicon rod 100 on whole silicon rod plummer 21.In addition, in an alternative embodiment, silicon rod plummer 21 can more be adopted Designed with lift, i.e. can make expanding-contracting action after the rotary shaft of the lower section of silicon rod plummer 21 is controlled to drive silicon rod plummer 21 make elevating movement, so as to adjust the height of the silicon rod on silicon rod plummer 21.

Commutation carrier 23 is arranged on bottom installation structure and can the work commutation motion of opposing floor portion mounting structure.Implement one In mode, commutation carrier 23 is to realize commutation motion by a changement.So that commutation carrier 23 realizes commutation motion Changement may include rotary shaft and reversing motor, commutation carrier 23 is tied by bottom installation of the rotary shaft axis connection in it under Structure.When implementing divertical motion, then start reversing motor, driving rotary shaft is rotated to drive commutation carrier 23 to rotate to realize Commutation motion.Foregoing driving rotary shaft rotation may be designed as one-directional rotation and be also designed to Double-directional rotary, and the one-directional rotation can For example, rotate clockwise or rotate counterclockwise, the Double-directional rotary may be, for example, then to rotate clockwise and rotate counterclockwise.Separately Outside, the angle for driving rotary shaft to rotate can be set according to actual configuration of silicon rod handler etc., wherein, the silicon rod handling dress The actual configuration put may be, for example, that the angle for driving rotary shaft to rotate can load and unload between position and pretreatment position according to silicon rod Structure of position relationship or the carrier 23 that commutates etc..The middle position of commutation base 231 and rotation axis connection in commutation carrier 23, Usually, the shape of commutation base 231 can use the structure of disk, but be not limited thereto, and it can also use square plate or ellipse Disk.

In addition, in the case of necessity, due to Design of Mechanical Structure, silicon rod handling position and pretreatment position it Between position relationship can not meet to commutate carrier 23 can be lucky by commutating the silicon rod clamper 25 moved on commutation carrier 23 Corresponding to silicon rod loading place and pretreatment position, now, silicon rod handler may also include translation mechanism, for driving commutation to carry Have 23 opposing floor portion mounting structures to make towards/away from the translational motion for pre-processing position.In one embodiment, silicon rod handling dress Put and be separately provided with a conversion chassis 241 between commutation carrier 23 and bottom installation structure, wherein, commutation carrier 23 passes through rotation Axle axis connection is set up on bottom installation structure in conversion chassis 241, conversion chassis 241 by translation mechanism.

In a kind of achievable mode, the translation mechanism further comprises：Rack rails is translated, is laid in along translation direction On bottom installation structure；Rotate gear is translated, is arranged on conversion chassis 241 and is meshed with translation rack rails；Driven in translation electricity Machine (is not illustrated), for driving shiftable gear to be rotated such that conversion chassis 241 and commutation carrier 23 thereon along flat Rack rails is moved to be retreated relative to bottom installation structure.

In actual applications, translation rack rails may be, for example, at least one rack with certain length, this at least one tooth Bar is mountable on bottom installation structure.To change chassis 241 and commutation carrier 23 thereon more smoothly along translation Direction is moved, and can configure at least two shiftable gears for each rack, at least two shiftable gears are arranged at intervals.Translate tooth Wheel can be connected by power transmission shaft and pan drive motor.Pan drive motor may be, for example, servomotor.

In actual applications, as it was previously stated, the translation mechanism includes translation rack rails, shiftable gear and driven in translation electricity Machine, shiftable gear is driven to be rotated such that conversion chassis 241 and commutation carrier 23 thereon along flat by pan drive motor Rack rails movement is moved, realizes the purpose precisely moved.Above-mentioned translation mechanism is only one to illustrate, but is not intended to limit this Shen Please, ground is changed, in other alternative embodiments, the translation mechanism may include：Leading screw and servomotor, leading screw have high-precision Degree, invertibity and efficient feature, in this way, by the cooperation of servomotor and leading screw, improve conversion chassis 241 and thereon Commutate the horizontal precision advanced in a transverse direction of carrier 23, i.e. so that conversion chassis 241 and commutation carrier 23 thereon exist The distance for being translated towards horizontal traveling is more accurate.

Further, in the present embodiment, for cause change chassis 241 and thereon the opposing floor portion of commutation carrier 23 installation Structure moves along translation direction can be more steady and more smooth, and the translation mechanism may also include translating rails and translation slide, Wherein, translating rails are laid in the bottom on conversion chassis 241 along translation direction, and translation slide is installed on bottom installation structure, By the cooperation of translating rails and translation slide, auxiliary conversion chassis 241 and commutation carrier 23 thereon move along translation direction It is dynamic.In actual applications, shiftable gear is driven to be rotated such that conversion chassis 241 and commutation thereon by pan drive motor Carrier 23 moves along translation rack rails, meanwhile, translating rails and translation slide, translating rails as auxiliary equipment are slided in translation Slid in seat, so as to realize that conversion chassis 241 and commutation carrier 23 thereon are moved along translation direction.Ground is changed, at it In his embodiment, the translation mechanism may also include translating rails and translator slider, wherein, translating rails are laid along translation direction In on bottom installation structure, translation slide is installed on the bottom on conversion chassis 241, passes through the cooperation of translating rails and translator slider It may be such that translator slider slides along translating rails, so as to aid in changing chassis 241 and commutation carrier 23 thereon along translation Move in direction.

Silicon rod clamper 25 is used to clamp silicon rod.In one embodiment, silicon rod clamper 25 includes：The He of fixture installed part 251 At least two silicon rod holders 253.Fixture installed part 251 is on commutation carrier 23.At least two silicon rod holders 253 are edges The setting of the spacing of fixture installed part 251.In one embodiment, the Workpiece carrier platform at foregoing silicon rod handling position can carry silicon Rod, which is erect, to be placed, and therefore, at least two silicon rod holders 253 are arranged at intervals to be vertical, i.e. at least two silicon rod holders 253 To be setting up and down.

In specific implementation, each silicon rod holder 253 further includes：Jig arm mounting seat 252 and at least two is pressed from both sides Arm 254, wherein, jig arm mounting seat 252 is provided on fixture installed part 251, and at least two jig arm 254 are to be movably arranged at jig arm peace Fill on seat 252.In view of as silicon rod to be processed either silicon single crystal rod or polycrystalline silicon rod, the section of silicon rod is polygon Shape, in the related art, the section of silicon rod is in class rectangle more, therefore, in one embodiment, silicon rod holder 253 it is overall and Say that for square workpiece fixture, the jig arm 254 of composition silicon rod holder 253 be two of symmetric design, single jig arm 254 is designed as With single clamped flat face (referring to Fig. 4) or knuckle clamping face (referring to Fig. 5), the knuckle clamping face is by continuous two Clamped flat face forms, and has a knuckle between two clamped flat faces.Certainly, may be used also on the clamped flat face in jig arm 254 Additional cushion pad, for avoiding causing the damage to silicon rod surface during silicon rod is clamped, play protection silicon rod Good result.Extraly, the effect for the regulation that centers can more be had concurrently using silicon rod holder 253.

Under general scenario, the jig arm 254 in silicon rod holder 253 is under clamping state, folder that two jig arm 254 are formed The center for holding space is coincided with the center of silicon rod plummer 21.Therefore, with the silicon rod with the jig arm 254 shown in Fig. 5 Exemplified by holder 253, when erectting the silicon rod 100 of placement on using the de-clamping silicon rod plummer 21 of silicon rod holder 253, silicon rod Jig arm 254 in holder 253 is shunk, and silicon rod 100 is resisted against by the knuckle clamping face in jig arm 254, wherein, the knuckle folder Hold two in face clamped flat faces and correspond respectively to two sides adjacent in silicon rod 100.Simultaneously clamping silicon is shunk in jig arm 254 During rod 100, silicon rod 100 is promoted and moved towards the middle section of grasping part by two jig arm 254 of both sides, directly Clamped to silicon rod 100 by two jig arm 254 in silicon rod holder 253, now, the center of silicon rod 100 can be located at silicon rod The center of the grasping part of holder 253.Especially, to enable at least two jig arm 254 in silicon rod holder 253 suitable Freely and the silicon rod of different type difference dimensions is held fixedly, silicon rod holder 253 also includes jig arm drive mechanism, uses Make opening and closing movement in driving at least two jig arm 254.

Referring to Fig. 6, it is schematically shown as the rearview of silicon rod clamper 25.In specific implementation, as shown in fig. 6, jig arm drives Mechanism further comprises：Folding gear 255, gear drive 256 and driving source 257.

Folding gear 255 is disposed in corresponding jig arm 254.Gear drive 256 has and the folding in jig arm 254 The groove that gear 255 engages.Driving source is connected to gear drive 256, is moved for driving gear drives part 256.In one kind In implementation, gear drive 256 is rack, the rack 256 in the centre of two jig arm 254, rack respectively for In being respectively equipped with two lateral surfaces of the jig arm 254 of both sides corresponding tooth is engaged with the folding gear 255 in two jig arm 254 Line, driving source 257 may be, for example, motor or or cylinder.

So, according to above-mentioned implementation, in actual applications, when 254 clamping of jig arm need to be realized, by as driving source Motor or cylinder driving moved up as the rack 256 of gear drive, opening for both sides engagement is driven by rack 256 Close gear 255 and make outward turning action, folding gear 255 drives jig arm 254 (folding gear 255 and jig arm 254 during revolving outside Can be connected by rotating shaft) make decentralization action to be transferred to clamping state by releasing orientation；Conversely, when that need to realize that jig arm 254 is unclamped, Moved down by motor (or cylinder) driving as driving source as the rack 256 of gear drive, by rack 256 The folding gear 255 of both sides engagement is driven to make pronation, folding gear 255 drives (the folding tooth of jig arm 254 during revolving inside Wheel 255 can be connected with jig arm 254 by rotating shaft) action is raised up to be transferred to releasing orientation by clamping state.Certainly, above are only One embodiment, the working condition of silicon rod holder 253 is not intended to limit, in fact, " upward ", " outward turning " in foregoing, " under Put ", " downward ", " inward turning ", " raising up " and " release " and " clamping " state change can be according to the structure and fortune of jig arm 254 Make mode, jig arm drive mechanism construction and have other changes.

Just as it is known by a person skilled in the art that silicon single crystal rod or polycrystalline silicon rod are directed to, due to long silicon rod originally or just The specification of grade silicon ingot (large scale silicon ingot) is different, and long silicon rod originally is carried out blocking operation or carries out evolution to first grade silicon ingot Operation and operation difference is blocked, certainly will caused between silicon single crystal rod and polycrystalline silicon rod, between silicon single crystal rod individual and polysilicon Size difference between rod individual is totally different, in view of silicon rod clamper 25 is for being pressed from both sides to erectting the silicon rod 100 under laying state Hold, therefore, for silicon rod clamper 25, the influence of aforementioned dimensions difference mainly just shows the length difference opposite sex of silicon rod to silicon Whether the silicon rod holder 253 in rod clamp 25 can correspond to the secret worry for being clamped to silicon rod.

The risk of silicon rod may can not be clamped to by even exempting above-mentioned silicon rod holder 253 for reduction.A kind of real In existing mode, silicon rod clamper 25 uses fixed silicon rod holder, i.e. with vertical side on the first mounting surface of commutation carrier 23 Silicon rod holder 253 as much as possible is fixedly installed in formula, and, two neighboring silicon rod holder 253 in these silicon rod holders 253 Spacing it is small as much as possible, in this way, using these silicon rod holders 253 can cover all kinds scale lengths silicon rod.If for example, silicon The length of rod is longer, then participates in clamping using silicon rod holder 253 more on commutation carrier 23；If the length of silicon rod is shorter, Then clamping is participated in using silicon rod holder 253 less on commutation carrier 23.

And in other implementations, silicon rod clamper 25 uses movable silicon rod holder, i.e. the of commutation carrier 23 Activity sets silicon rod holder 253 in a manner of vertical on one mounting surface, due to, silicon rod holder 253 is movable design, because This, the quantity of silicon rod holder 253 can be greatly decreased, and generally two or three can meet.In this way, utilize these activities Formula silicon rod holder 253 can cover all kinds scale lengths silicon rod.For example, if the length of silicon rod is longer, silicon rod clamping is moved Part 253, extend the clamping spacing of two silicon rod holders 253；If the length of silicon rod is shorter, silicon rod holder 253 is moved, Shorten the clamping spacing of two silicon rod holders 253.In implementation of the silicon rod clamper 25 using movable silicon rod holder, It is smooth smoothly up and down with adjustment position for ease of movable silicon rod holder, pacify using the fixture in silicon rod clamper 25 The guide effect of boot activity formula silicon rod holder 253 is played in piece installing 251, in a kind of achievable mode, fixture installed part 251 can use guide post structure, and jig arm mounting seat 252 is then using the movable block structure for being socketed on guide post structure.Specifically, make Include erectting setting and two parallel leads for the guide post structure of fixture installed part 251, as jig arm mounting seat Two perforations corresponding with two leads in the guide post structure or two are then provided with the 252 movable block structure Clip.According to perforation, the movable block is sheathed on the lead and can realized and slid along the lead.According to folder Button, the movable block are clipped on the lead and can realized and slid along the lead, wherein, in actual applications, institute An at least half part for the lead can be clipped on by stating clip.

For the silicon rod clamper 25 of movable silicon rod holder 253, different change case is also had.Clamped with two silicon rods Exemplified by part 253, in a kind of alternative embodiment, a silicon rod holder 253 in two silicon rod holders 253 is movable It is then fixed design to design another silicon rod holder 253, in actual applications, is set by the way that movement is movable so That silicon rod holder 253 of meter adjusts the clamping spacing between the silicon rod holder 253 of fixed design.Can from above To know, silicon rod 100 is placed to erect, therefore, no matter the scale lengths of silicon rod, always the bottom of silicon rod 100 can be relatively easy to determine , it is thus preferable to, that silicon rod holder 253 above in two silicon rod holders 253 can be designed as activity Formula, so, it need to only adjust the position of the silicon rod holder 253 of top.It is described to realize the movement of silicon rod holder 253 The silicon rod holder 253 of movable design can be provided with guiding driving mechanism.Movable design can be driven using guiding driving mechanism Silicon rod holder 253 moved up and down along fixture installed part 251.

In one implementation, guiding driving mechanism can for example including：Guiding leading screw 258 and guide motor 259, its In, guiding leading screw 258 is set to erect, and one end of guiding leading screw 258 is connected to jig arm mounting seat 252, guiding leading screw 258 it is another One end is then connected to guide motor 259, and guide motor 259 may be provided at the top of commutation carrier 23, but be not limited thereto, and lead The bottom of commutation carrier 23 is may also be arranged on to motor 259.Guiding leading screw 258 has high accuracy, invertibity and efficient spy Point, in this way, at the position for needing the silicon rod holder 253 above adjustment, guiding leading screw 258 is driven to revolve by guide motor 259 Turn, drive silicon rod holder 253 to be moved up and down along fixture installed part 251 in the rotary course of guiding leading screw 258, such as：It is oriented to Motor 259 drive guiding leading screw 258 rotate forward, then drive top silicon rod holder 253 along fixture installed part 251 to Upper motion is with the silicon rod holder 253 away from lower section；Guide motor 259 drives the counter-rotating of guiding leading screw 258, then drives top Silicon rod holder 253 along fixture installed part 251 move downward with close to lower section silicon rod holder 253.Adjust two silicon Clamping spacing between rod holder 253, so as to effectively be clamped to the silicon rod 100 of different size length.

In another alternative embodiment, two silicon rod holders 253 are movable design, so, in practical application In, mutual clamping spacing can be adjusted by the movement of two silicon rod holders 253 of movable design.Due to silicon rod Holder 253 is movable design, then, at least one silicon rod holder 253 in two silicon rod holders 253, which need to be set, leads To drive mechanism, for driving two silicon rod holders 253 to be moved along fixture installed part 251.

Relative to a kind of this preceding alternative embodiment, in this alternative embodiment, since two silicon rods in silicon rod clamper 25 Holder 253 is movable, then will be existed on some silicon rod holder 253 in two silicon rod holders 253 Guiding driving mechanism is set still to be respectively provided with the situation of guiding driving mechanism on two silicon rod holders 253.Now with two The silicon rod holder 253 of top is provided with exemplified by guiding driving mechanism in silicon rod holder 253, in this case, one, two It is to be flexibly connected between jig arm mounting seat 252 and fixture installed part 251 in individual silicon rod holder 253, i.e. any one silicon rod presss from both sides In gripping member 253 jig arm mounting seat 252 and jig arm 254 thereon along fixture installed part 251 and it is up and down, in addition, setting Guiding driving mechanism includes guiding leading screw 258 and guide motor, wherein, one end of guiding leading screw 258 is connected to the silicon rod of top In jig arm mounting seat 252 in holder 253, the other end of guiding leading screw 258 is then connected to guide motor 259, guide motor 259 may be provided at the top of commutation carrier 23, in this way, at the position for needing the silicon rod holder 253 above adjustment, by being oriented to Motor 259 drives guiding leading screw 258 to rotate, and drives silicon rod holder 253 to be installed along fixture in the rotary course of guiding leading screw 258 Part 251 moves up and down, such as：Guide motor 259 drives guiding leading screw 258 to rotate forward, then drives the silicon rod holder of top 253 move with the silicon rod holder 253 away from lower section upwards along fixture installed part 251；Guide motor 259 drives guiding leading screw 258 counter-rotatings, then the silicon rod holder 253 of top is driven to be moved downward along fixture installed part 251 with close to the silicon of lower section Rod holder 253.The silicon rod holder 253 moves up and down along fixture installed part 251 and then adjusts two silicon rod holders Clamping spacing between 253, so as to effectively be clamped to the silicon rod 100 of different size length.

In fact, in the case of two silicon rod holders 253 are movable design, using guiding driving mechanism not only The clamping spacing between two silicon rod holders 253 be can adjust effectively to be clamped it to the silicon rod 100 of different size length Outside, the purpose of lifting can be also realized to the silicon rod 100 of clamping, after two silicon rod holders 253 effectively clamp silicon rod, is led to Overdrive silicon rod holder 253 motion and lift silicon rod 100.Specifically, still it is provided with and is led with the silicon rod holder 253 of top To exemplified by drive mechanism, first, the silicon rod holder 253 of top is by guiding driving mechanism along fixture installed part about 251 Move and have adjusted the clamping spacing between lower section silicon rod holder 253；Then, using in each silicon rod holder 253 Jig arm drive mechanism drive corresponding two jig arm to make clamping action with smooth and be held fixedly silicon rod；Then, top Silicon rod holder 253 driven by guiding driving mechanism moved upwards along fixture installed part 251 again, now, due to rubbing Power effect is wiped, the silicon rod 100 and the silicon rod holder 253 of lower section clamped moves upwards therewith in the lump, wherein, the silicon clamped Rod 100 upwards motion utilize be top silicon rod holder 253 and silicon rod 100 between frictional force effect, silicon rod holder What 253 upward motions then utilized is the frictional force effect between silicon rod 100 and the silicon rod holder 253 of lower section.The silicon rod of top Holder 253 drives silicon rod 100 under the driving of guiding driving mechanism and the silicon rod holder 253 of lower section to move downward also be phase Same process, will not be repeated here.

It should be noted that in other change case, the silicon rod holder of lower section e.g. in two silicon rod holders 253 Guiding driving mechanism, structure, set-up mode and the driving working method of guiding driving mechanism and foregoing top are set on 253 Silicon rod holder 253 guiding driving mechanism it is similar, such as by lower section silicon rod holder 253 in guiding driving mechanism Moved up and down under driving along fixture installed part 251 and adjust the clamping spacing between top silicon rod holder 253, Yi Jiyou The silicon rod holder 253 of lower section drives silicon rod 100 and the silicon rod holder 253 of top together under the driving of guiding driving mechanism Along modes such as the up and down motions of fixture installed part 251.For example two silicon rod holders 253 are provided with guiding driving mechanism again, Then the set-up mode of guiding driving mechanism and the motion mode of driving working method and two silicon rod holders 253 are from needless to say Speech, will not be repeated here.

Grown being moved up and down for movable silicon rod holder 253 along fixture installed part 251 with adapting to different size In the situation that the silicon rod of degree is clamped, except silicon rod holder 253 is using movable structure design, silicon rod holder 253 It need to set outside guiding driving mechanism etc., certainly will also need to know the scale lengths for the silicon rod for being currently needed for clamping.In view of this, Silicon rod handler in the application may also include height testing instrument 7, be put for detecting the setting that silicon rod plummer 21 is carried The height for the silicon rod put, so as to subsequently moved up as movable silicon rod holder 253 along silicon rod clamper installed part 251 Or move down and the foundation of displacement.

Silicon rod clamper 25 in using silicon rod handler 2 is loaded silicon rod to be processed to silicon by silicon rod handling position The pretreatment position of rod processing platform 11 is for follow-up processing operation, in one embodiment, such as the He of the first processing unit (plant) 3 Second processing unit (plant) 4 carries out the first processing operation and the second processing operation to silicon rod 100 respectively, in following process operation at least Include corresponding silicon rod surface Shape correction.Therefore, before follow-up processing operation is carried out to silicon rod, certainly will need to know The current flatness situation of silicon rod 100.In view of this, the application silicon rod Multi-position processing machine may also include flatness detector, At least it is used to carry out planar smoothness detection to silicon rod 100 to be processed.In one embodiment, flatness detector is located at and changed To the second mounting surface of carrier 23, specifically include：Contact measurement structure, detector shift mechanism and detection controller.

Contact measurement structure in flatness detector is used to implement tested surface by contacting the tested surface of silicon rod Flatness detection.In general, contact measurement structure is examined by contacting the tested surface of silicon rod to implement the flatness of tested surface Survey specifically refers to：Each test point that the tested surface of silicon rod is sequentially contacted by contact measurement structure is corresponding each to detect to obtain The relative distance value of test point, judge the flatness of the tested surface according to these relative distance values.

In the present embodiment, judge that the flatness of the tested surface is then logical according to the relative distance value of each test point Cross the difference in these relative distance values that will be measured between maxima and minima to judge, if the difference is less than marking Quasi- value is fallen into critical field, then shows that the flatness of the tested surface meets specification.In specific implementation, contact measurement Structure 61 more may include：Telescopic contact probe head and on-off switch.

Telescopic contact probe head is used for the tested surface for contacting silicon rod 100.On-off switch is then associated with telescopic contact probe head And be connected with detection controller, for touching the tested surface of silicon rod 100 in telescopic contact probe head one i.e. to detection controller Corresponding make-and-break signal is sent, for detecting the tested surface that controller converses telescopic contact probe head and currently touched accordingly In test point relative to datum mark relative distance.

In a kind of alternative embodiment, the telescopic contact probe head in contact measurement structure more may include：Contact is visited Head, the probe base for setting contact probe, at least partly it is built in probe base and the bullet for shoring contact probe Property support member.Contact probe may be, for example, the club in cylinder, and the top of the club can be made at tipping and sphering Reason or additional salient point, in actual applications, contact probe can be made using the hard alloy of high rigidity, high abrasion Make.Probe base may be, for example, cylinder table, and the cylinder table is hollow structure, be available for accommodating the contact probe in club. After probe base is accommodating contact probe, the top of contact probe protrudes from probe base.In elastic supporting member for supporting optical member It is placed in probe base and for shoring contact probe, and, elastic supporting member for supporting optical member is also associated with on-off switch.Elastic supporting member for supporting optical member top Support contact probe is mainly reflected in the conduction of power, and herein, the conduction of power is at least embodied in two following aspects：First, connect What receipts contact probe was subject to by contact measured face compresses power and pressure conduction is supported by described in on-off switch, so that break-make is opened Close and compress power according to and produce corresponding make-and-break signal.2nd, restorable restoring force is provided to contact probe, received Contact probe is because of contact measured face and relative probe pedestal inside contracts, according to the effect of power and to connecing after elastic supporting member for supporting optical member stress Touch probe provides restorable restoring force so that contact probe according to the restoring force and relative probe pedestal towards outward transport Move to restore.In actual applications, elastic supporting member for supporting optical member can use such as compression spring, and the opposite end of compression spring can divide Dui Yingyu not contact probe and on-off switch.But, the knot of the building block of contact measurement structure and each building block Structure is not limited in aforementioned embodiments,

In other embodiments, contact measurement structure can still make other changes, such as：Contact probe may be, for example, In tetrahedral club, and, probe base also may be, for example, tetrahedral tubulose platform.Elastic supporting member for supporting optical member can also use pliability Shell fragment, the opposite end of pliability shell fragment can correspond respectively to contact probe and on-off switch.On-off switch is opened for high accuracy Close, there is higher sensitivity, even very trickle active force can perceive to obtain.In addition, the alternative embodiment its In his implementation, signal transmission device part or signal circuit are may also include between on-off switch and detection controller, in this way, Make-and-break signal caused by on-off switch can be transmitted by signal transmission device part or signal circuit to detection controller.

Contact measurement structure in the present embodiment in actual applications, when telescopic contact probe head touches silicon rod 100 Tested surface when, just relative probe pedestal inside contracts telescopic contact probe head under the stop of the tested surface of silicon rod 100, elasticity branch Support member receives compressing power and described supporting pressure conduction to on-off switch for contact probe by shoring contact probe, with Power is compressed according to and produce corresponding Continuity signal or cut-off signal for on-off switch, the Continuity signal or cut-off signal Transmit to detection controller by signal transmission device part or signal circuit, detection controller is according to the Continuity signal or disconnected ON signal can converse test point in the tested surface that contact probe is currently touched relative to datum mark it is relative away from From.

Detector shift mechanism in flatness detector is used to drive contact measurement structure 61 to shift.In the present embodiment In, detector shift mechanism may be, for example, three-dimensional displacement mechanism, and in specific implementation, the three-dimensional displacement mechanism may include：The One direction shift mechanism, second direction shift mechanism and third direction shift mechanism, for ease of description, by the first party To X-axis is denoted as, the second direction is denoted as Y-axis, the third direction is denoted as Z axis.Understood with reference to Fig. 1, second Direction Y-axis is consistent with the translation direction of translation mechanism in foregoing silicon rod handler, therefore, in a kind of optional embodiment In, second direction shift mechanism can coincide with foregoing translation mechanism, i.e. second direction shift mechanism is just by foregoing translation Mechanism is held a concurrent post, and the structure and its function mode of the translation mechanism can be found in preceding description, therefore for second direction moving machine Structure repeats no more.

It is described in detail emphatically below for first direction shift mechanism and third direction shift mechanism.

The first direction shift mechanism further includes：Sidesway base 243 and first direction shift unit, pass through first direction Shift unit can provide displacement of the sidesway base 243 in a first direction in (such as X-direction).First direction shift unit enters one Step includes：First direction rack rails, is laid on bottom installation structure in the first direction；First rotate gear, it is arranged at sidesway bottom It is meshed on seat 243 and with first direction rack rails；First motor, for driving the first rotate gear to be rotated such that side Moving base 243, rack rails is retreated along a first direction.Specifically, first direction rack rails may be, for example, at least one with certain length Individual rack, this at least one rack are installed on bottom installation structure.To cause sidesway base 243 more smoothly along first party To movement, at least two first rotate gears are can configure for each rack, at least two first rotate gears are arranged at intervals. First rotate gear can be connected by power transmission shaft and the first motor, the first motor be connected with detecting controller and Examined controller control.First motor may be, for example, servomotor.In actual applications, as it was previously stated, first direction Shift unit includes first direction rack rails, the first rotate gear and the first motor, and the first motor, which receives, carrys out Autonomous test The shift control instruction of controller, and instructed according to the shift control to drive the first rotate gear to be rotated such that sidesway bottom Requirement of the rack rails displacement up to meeting displacement numerical value along a first direction of seat 243, realizes the purpose precisely shifted.The displacement control Displacement numerical value or the parameter related to displacement numerical value are comprised at least in system instruction.

In addition, above-mentioned first direction shift unit is only one to illustrate, but the application is not intended to limit, for example, In one alternative embodiment, first direction shift unit may include：Leading screw and servomotor, leading screw have high accuracy, invertibity and Efficient feature, in this way, by the cooperation of servomotor and leading screw, improve the horizontal line in a first direction of sidesway base 243 The precision entered.In addition, first direction shift unit may also include first direction guide rail and the first sliding block, wherein, first direction Guide rail is laid on bottom installation structure in the first direction, the first sliding block be then arranged at sidesway base 243 and with first party guide Rail is engaged, and by the cooperation of first direction guide rail and the first sliding block, auxiliary sidesway base 243 shifts along a first direction.

In actual applications, the first motor receives shift control instruction (the displacement control for carrying out Autonomous test controller Comprised at least in system instruction displacement numerical value or to the related parameter of displacement numerical value) and drive the according to shift control instruction One rotate gear is rotated such that rack rails shifts sidesway base 243 along a first direction, is at least wrapped in the shift control instruction Include displacement numerical value or to the related parameter of displacement numerical value, meanwhile, as the first direction guide rail and the first sliding block of auxiliary equipment, the Guide rail slides one sliding block along a first direction, so as to realize that sidesway base 243 shifts along a first direction.

Ground is changed, in other embodiments, first direction shift unit may also include first direction guide rail and first and slide Seat, wherein, first direction guide rail is laid in sidesway base 243 in the first direction, and first slide is installed on bottom installation structure, By the cooperation of first direction guide rail and first slide, auxiliary sidesway base 243 shifts along a first direction.It is as it was previously stated, flat Whole degree detector is to be used to carry out surface smoothness detection to silicon rod, and therefore, under general scenario, flatness detector can be with other What process equipment was used cooperatively, this kind of process equipment can be that (such as cutting processing machine, flour milling add simple function process equipment Work machine or polishing machine) can also be multiple function combined-machining equipment, the simple function process equipment may be, for example, Such as cutting processing machine, flour milling processing machine or polishing machine, the combined-machining equipment may be, for example, flour milling polishing one Machine.

Because in one embodiment, second direction shift mechanism is held a concurrent post by foregoing translation mechanism, therefore, is With the cooperation of first direction translation mechanism, in the structure of the translation mechanism, conversion chassis 241 is set up in by translation mechanism Substantially it is exactly to change the sidesway bottom that chassis 241 is set up in first direction shift mechanism by translation mechanism on bottom installation structure On seat, illustrate herein.

The third direction shift mechanism can provide contact measurement structure 61 with respect to commutation carrier 23 and in third direction (such as Z-direction, below, for the displacement on third direction, can also be colloquially called displacement up and down herein) moves up Position.In one embodiment, contact measurement structure 61 is to be arranged at commutation carrier 23 by a detection structural mount 63 On.Detection structural mount 63 can use guide post structure, and contact measurement structure then uses and is socketed on guide post structure Movable block structure.Specifically, the guide post structure as detection structural mount 63 includes erectting setting and parallel two Individual lead, and contact measurement structure 61 is then provided with two perforations corresponding with two leads in the guide post structure Or two clips.

According to perforation, the contact measurement structure is sheathed on the lead and can realized and slided along the lead Move.According to clip, the contact measurement structure is clipped on the lead and can realized and slid along the lead, its In, the clip can be clipped on an at least half part for the lead.Therefore, to realize the edge of contact measurement structure 61 Detection structural mount 63 and shift up and down, third direction shift mechanism can further comprise：Leading screw and lifting motor, its In, leading screw is set to erect, and one end of leading screw is connected to contact measurement structure 61, and the other end of leading screw is then connected to lifting electricity Machine, lifting motor may be provided at the top of commutation carrier 23, but be not limited thereto, and lifting motor may also be arranged on commutation carrier 23 bottom.Leading screw has high accuracy, invertibity and efficient feature, in this way, needing to adjust contact measurement structure 61 Position when, by lifting motor driving leading screw rotation, drive contact measurement structure 61 to be tied along detection in screw mandrel rotary course Structure installed part 63 moves up and down, such as：Motor driving leading screw rotates forward, then drives the contact measurement structure of top 61 move upwards along detection structural mount 63；Motor drives leading screw counter-rotating, then drives contact measurement structure 61 move downward along detection structural mount 63.

In actual applications, lifting motor receive come Autonomous test controller sent comprise at least displacement numerical value or with The shift control instruction of the related parameter of displacement numerical value simultaneously instructs to drive leading screw rotation to be connect to drive according to the shift control Touch detects structure 61 and moved up and down along detection structural mount 63 up to the requirement for meeting to shift numerical value, realizes and precisely shifts Purpose.It should be noted that above-mentioned third direction shift mechanism is only a kind of example using the combination of leading screw and motor, and It is non-to be used to limit the application third direction shift mechanism, change ground, in other embodiments, the third direction shift mechanism Also cingulum shift mechanism can be used, in cingulum shift mechanism, it may include synchronous toothed belt, rotate gear and motor, its In, for synchronous toothed belt on the second mounting surface of commutation carrier 23, contact measurement structure 61 can pass through connector and synchronous gear Band connection, rotate gear are then meshed with synchronous toothed belt, and motor is then used to drive rotate gear to rotate to utilize synchronous gear Band drives contact measurement structure 61 to be moved up and down along detection structural mount 63.

Detection controller is connected with contact measurement structure and detector shift mechanism, for controlling detector shift mechanism Contact measurement structural shift and control contact measurement structure is driven sequentially to detect in silicon rod each test point on tested surface Relative distance.In one embodiment, detector shift mechanism may include first direction shift mechanism, second direction shifting machine Structure and third direction shift mechanism, therefore, detection controller and first direction shift mechanism, second direction shift mechanism, with And third direction shift mechanism, for first direction shift mechanism, second direction shift mechanism and third direction shifting machine Structure sends the instruction of corresponding shift control respectively, is reached with drive control contact measurement structure by three-dimensional displacement predetermined Test position simultaneously can be able to contact the test point in the tested surface of silicon rod 100 in the inspection positions.Contact measurement structure It may include：Telescopic contact probe head and on-off switch, wherein, on-off switch is connected with detection controller, and on-off switch is flexible Formula contact probe head when the tested surface of silicon rod 100 is touched to detection controller send make-and-break signal, detection controller according to The make-and-break signal converses test point in the tested surface that contact probe is currently touched relative to the relative of datum mark Distance.

In actual applications, the datum mark set can according to the architectural characteristic or detection mode of flatness detector and It is fixed, first direction shift mechanism, second direction shift mechanism, Yi Ji in the architectural characteristic such as detector shift mechanism The structure of three direction shift mechanisms.The relative distance for converting to obtain according to the datum mark is with datum mark and utilizes second party Translocation distance of the contact measurement structure along second direction is driven to shift mechanism) related.It is described along second direction Translocation distance is the initial position and contact measurement of contact measurement structure under second direction shift mechanism inactive state Structure touches the contact measurement knot under second direction shift mechanism halted state after the test point in side of silicon rod 100 The distance between contact position of structure.Certainly, easily processing mode is：Datum mark is directly disposed as second direction shifting machine The initial position of contact measurement structure under structure inactive state, in this way, the phase of test point in tested surface relative to datum mark Adjust the distance and drive translocation distance of the contact measurement structure along second direction as using second direction shift mechanism.

It should be noted that in one embodiment, flatness detector is located at the second mounting surface of commutation carrier 23, and preceding The silicon rod clamper stated is then located at the first mounting surface of commutation carrier 23, and herein, the first mounting surface and the second mounting surface can be according to realities Border apparatus structure and set.For example, the first mounting surface and the second mounting surface are two installations in commutation carrier 23 backwards to setting Face, further, the first mounting surface and the second mounting surface can differ 180 °, so that the silicon rod positioned at silicon rod handling position is held Microscope carrier 21 connects being aligned with the rotation plummer 531 in silicon rod conversion equipment 5 positioned at pretreating zone position, so, is carried when by commutation After tool 23 rotates 180 °, changeable the first original mounting surface is that the second mounting surface or the second original mounting surface are changeable For the first mounting surface, but not must so make excessive demands for the setting relation of the first mounting surface or the second mounting surface in practical application, First mounting surface and the second mounting surface also can for example differ 90 °, i.e. silicon rod plummer 21 and silicon rod positioned at silicon rod handling position Rotation plummer 531 in conversion equipment 5 positioned at pretreating zone position is in 90 ° of phase differences, even, the first mounting surface and the second peace Dress face can differ any position in OK range, as long as being loaded and unloaded between the first mounting surface and the second mounting surface or positioned at silicon rod Ensuring in the silicon rod plummer 21 and silicon rod conversion equipment 5 of position between the rotation plummer 531 of pretreating zone position will not If producing unnecessary interference.In addition, foregoing mentioned height testing instrument 7, can both be arranged on the first mounting surface or can To be arranged on the second mounting surface, the other parts for the carrier 23 that even commutates.

Especially, by the cooperation of flatness detector 7 and silicon rod clamper 25, can also correction operation be carried out to silicon rod 100. Understood in being described above, silicon rod 100 can be clamped using silicon rod clamper 25 and commutation motion is made by the carrier 23 that commutates again On the rotation plummer 531 for the silicon rod detent mechanism 53 that silicon rod 100 is transferred at pretreatment position afterwards.But thus and thus, may be used Following situation can occur：Rotate middle section of the plummer 531 not at silicon rod 100.In which case, by follow-up Silicon rod product after processing operation is likely to not meet specification of workpieces requirement.Therefore, following process work is being carried out to silicon rod Before industry, can also silicon rod 100 carry out correction operation, it is easily operated and be exactly ideally by silicon rod 100 in operation of rectifying a deviation Center with rotate plummer 531 center it is corresponding coincidence.

In actual applications, plane is carried out to the silicon rod 100 carried on rotation plummer 531 by flatness detector 7 to put down Whole degree detection, so as to obtain the integral position overview of silicon rod 100；The integral position overview of the silicon rod 100 of acquisition is held with rotation The position of microscope carrier 531 is compared, and then obtains inclined between the center of silicon rod 100 and the center for rotating plummer 531 Poor information；The carrier 23 that commutates rotates 180 ° and makees commutation motion, and corresponding to rotation by the silicon rod clamper 25 on commutation carrier 23 carries Silicon rod 100 on platform 531 simultaneously clamps silicon rod 100；Utilize the first direction shift mechanism in foregoing three-dimensional displacement mechanism and Two direction shift mechanism driving commutation carriers 23 are in a first direction and/or second party moves up, so as to drive silicon rod clamper 25 and the silicon rod 100 that is clamped by silicon rod clamper 25 rotate against plummer 531 and make position adjustment, be finally able to silicon rod 100 Center is corresponding with the center for rotating plummer 531 to be overlapped, and completes the correction operation for silicon rod 100.

First processing unit (plant) 3 adds located at the first processing position of silicon rod processing platform 11 for carrying out first to silicon rod 100 Work industry.Second processing unit (plant) 4 is located at the second processing position of silicon rod processing platform 11, for passing through the first processing unit (plant) 3 The first post-job silicon rod 100 of processing carry out the second processing operation.In the present embodiment, as it was previously stated, being determined by silicon rod Position mechanism 53 can be positioned silicon rod 100 to erect modes of emplacement, and therefore, the first processing unit (plant) 3 is to erectting the silicon rod placed 100 carry out the first processing operation and the second processing unit (plant) 4 uses to erectting the silicon rod 100 placed progress the second processing operation Be exactly vertical processing mode.

Specifically, also had for the silicon rod of different kenels, the first processing unit (plant) 3 and the second processing unit (plant) 4 Different change combination examples.Such as：If silicon rod 100 is silicon single crystal rod, the first processing unit (plant) 3 can be the circle of contact and corase grind device And the second processing unit (plant) 4 can be round as a ball and fine grinding device；If silicon rod 100 is polycrystalline silicon rod, the first processing unit (plant) 3 can be Roughly grind device and the second processing unit (plant) can be chamfering and fine grinding device.Especially, in one embodiment, in the pretreatment It can also be set up between position and the first processing position and between the second processing position and the pretreatment position anti- Door is protected, for the pretreatment position and the described first processing position and the second processing position to be isolated, so as to play The effect of silicon rod is protected, avoids silicon rod from being contaminated or damage.

Following elder generation is described in detail so that silicon rod 100 is silicon single crystal rod as an example.

In the case of silicon rod 100 is silicon single crystal rod, the first processing unit (plant) 3 is the circle of contact and corase grind device, and the second processing fills It is round as a ball and fine grinding device to put 4.

As the circle of contact and corase grind device 3 of the first processing unit (plant), on support 1 and positioned at the first of silicon rod processing platform Position is processed, for carrying out the circle of contact and corase grind operation to silicon single crystal rod.The circle of contact and corase grind device 3 have first receiving space, use In receive by silicon rod conversion equipment 5 conveying body 51 conveying come silicon single crystal rod.The circle of contact and corase grind device 3 mainly include First frame 31 and at least one pair of first grinding tool 33, at least one pair of first grinding tool 33 are arranged oppositely in the first frame 31, are used for The silicon single crystal rod being pointed on the silicon rod conversion equipment 5 at the first processing position carries out the circle of contact and corase grind operation.Further, Each first grinding tool 33 further includes the first main shaft 32 and the first emery wheel 34, wherein, the peace of the first main shaft 32 and the first frame 31 Dress face is provided with and slides laterally guide mechanism and longitudinal sliding motion guide mechanism, and the guide mechanism that slides laterally can use such as slide rail With the combination of sliding block etc., the longitudinal sliding motion guide mechanism can be used such as the combination of slide rail and sliding block.Using sliding laterally Guide mechanism, the first main shaft 32 or relative first frame 31 of the energy of the first emery wheel 34 can be made to make laterally motion of retreating.Utilize longitudinal direction Guide mechanism is slided, relative first frame 31 of the energy of the first main shaft 32 can be made longitudinally to move up and down.

In a practical application, at least one pair of first grinding tool 33 is arranged on a grinding tool base, the grinding tool base and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the first frame 31, at least one pair of first grinding tool 33 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool base, wherein, the grinding tool base is controlled by a lifting motor and indulged To sliding, each first grinding tool 33 of guide mechanism longitudinal sliding motion in the first frame 31, at least one pair of first grinding tool 33 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool base.First emery wheel 34 is arranged at the operation end of the first main shaft 32, The first frosted particle with the first granularity.Herein, silicon single crystal rod to be processed is the silicon cube that section is substantially in class rectangle, With four sides, formed with the connection faceted pebble in R angles between two neighboring side.Therefore, the circle of contact and corase grind device 3 in one To the first grinding tool 33 to be oppositely arranged, the first receiving space for accommodating silicon single crystal rod is left between the two, when silicon single crystal rod is defeated It is relative in the i.e. accessible silicon single crystal rod of the first emery wheel 34 after delivering between a pair of first emery wheels 34 in the first receiving space A pair of sides or a pair of connection faceted pebbles carry out corresponding processing operation.

In actual applications, silicon single crystal rod is transferred into silicon rod processing platform first with silicon rod conversion equipment 5 first adds Work area position, positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that a pair of connecting edges in silicon single crystal rod face Circle of contact processing operation should be carried out by connection faceted pebble of first grinding tool 33 to silicon single crystal rod in a pair of first grinding tools 33.The circle of contact Process operation can for example including：Positioning adjustment is carried out to silicon single crystal rod with silicon rod detent mechanism 53 to be engaged, according to the amount of feeding, rotation Turn the first emery wheel 34 in the first grinding tool 33 and drive the first grinding tool 33 to move up and down to implement to grind, to first pair of connection faceted pebble And its adjacent domain repeatedly slightly cut and second pair of connection faceted pebble and its adjacent domain repeatedly slightly cut so that each Connection between connection faceted pebble and adjacent side forms preliminary arc and connected.Silicon single crystal rod is entered by silicon rod detent mechanism 53 again Row positioning adjustment so that a pair of sides in silicon single crystal rod correspond to a pair of first grinding tools 33, by the first grinding tool 33 to monocrystalline silicon The side of rod carries out corase grind processing operation.

Roughly grinding operation may be, for example,：Positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that silicon single crystal rod The first offside face correspond to a pair of first grinding tools 33, by the first emery wheel 34 in a pair of first grinding tools 33 to silicon single crystal rod A pair of sides carry out corase grind processing operation；Then, positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that monocrystalline Second offside face of silicon rod corresponds to a pair of first grinding tools 33, by the first emery wheel 34 in a pair of first grinding tools 33 to silicon single crystal rod Second pair of side carry out corase grind processing operation.Wherein, any corase grind to side process operation can for example including：One is provided to enter To amount, the first emery wheel 34 in a pair of first grinding tools 33 is driven to move from top to bottom to grind a pair of sides of silicon single crystal rod；One First emery wheel 34 is ground to after silicon single crystal rod bottom and stays in lower limit afterwards through silicon single crystal rod, be further added by a feeding Amount, a pair of first emery wheels 34 of driving move to grind silicon single crystal rod from the bottom up；A pair of first emery wheels 34 are ground to silicon single crystal rod After top and through upper limit is stayed in after silicon single crystal rod, continue to increase an amount of feeding, a pair of first emery wheels 34 of driving from On down move and grind silicon single crystal rod；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, be repeated several times it Afterwards, you can a pair of sides of silicon single crystal rod are ground to default size.

As the round as a ball and fine grinding device of the second processing unit (plant), on support 1 and positioned at the second of silicon rod processing platform Position is processed, it is round as a ball and smart for being carried out to the silicon single crystal rod after the circle of contact and the corase grind circle of contact of device 3 and corase grind processing operation Mill processing operation.Round as a ball and fine grinding device 4 has the second receiving space, for receiving the conveying passed through in silicon rod conversion equipment 5 The silicon single crystal rod that the conveying of body 51 comes.Round as a ball and fine grinding device 4 mainly includes the second frame 41 and at least one pair of second grinding tool 43, At least one pair of second grinding tool 43 is arranged oppositely in the second frame 41, for the silicon rod converting means being pointed at the second processing position The silicon single crystal rod put on 5 carries out round as a ball and fine grinding operation.

Further, each second grinding tool 43 further includes the second main shaft 42 and the second emery wheel 44, wherein, the second main shaft 42 and second frame 41 mounting surface be provided with slide laterally guide mechanism and longitudinal sliding motion guide mechanism, described slide laterally is led Drawing mechanism can use such as the combination of slide rail and sliding block, and the longitudinal sliding motion guide mechanism can use such as slide rail and sliding block Combination etc..Using guide mechanism is slid laterally, the second main shaft 42 or relative second frame 41 of the energy of the second emery wheel 44 can be made to make transverse direction Ground motion of retreating, using longitudinal sliding motion guide mechanism, relative second frame 41 of the energy of the second main shaft 42 can be made to make longitudinally fortune up and down It is dynamic.

In a practical application, at least one pair of second grinding tool 43 is arranged on a grinding tool base, the grinding tool base and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the second frame 41, at least one pair of second grinding tool 43 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool base, wherein, the grinding tool base is controlled by a lifting motor and indulged To sliding, each second grinding tool 43 of guide mechanism longitudinal sliding motion in the second frame 41, at least one pair of second grinding tool 43 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool base.Second emery wheel 44 is arranged at the operation end of the second main shaft 42, The second frosted particle with the second granularity.Comparatively, the granularity of the second frosted particle in the second emery wheel 44 is small The granularity of the first frosted particle in the circle of contact and corase grind device 3 in first emery wheel 34.Therefore, in round as a ball and fine grinding device 4 A pair of second grinding tools 43 to be oppositely arranged, leave the second receiving space for accommodating silicon single crystal rod between the two, work as silicon single crystal rod After being transported between a pair of second emery wheels 44 in second receiving space, the i.e. accessible silicon single crystal rod of the second emery wheel 44 enters The corresponding processing operation of row.

In actual applications, silicon single crystal rod is transferred into silicon rod processing platform first with silicon rod conversion equipment 5 second adds Work area position, silicon single crystal rod is positioned by silicon rod detent mechanism 53 and rotates silicon single crystal rod, by the second grinding tool 43 to monocrystalline silicon The connection faceted pebble of rod carries out round as a ball processing operation.

It is described it is round as a ball processing operation can for example including：Silicon single crystal rod is positioned by silicon rod detent mechanism 53 so that the A pair of second emery wheels 44 in two grinding tools 43 are right against the side of silicon single crystal rod, and the spacing between a pair of second emery wheels 44 is will The diagonal pitch current less than silicon single crystal rod, the gap of the two spacing are the amount of feeding of this at least one pair of the second emery wheel 44； Silicon single crystal rod drives rotation in second receiving space by silicon rod detent mechanism 53, and a pair of second emery wheels 44 are by the rotation In silicon single crystal rod section a pair of chamferings corresponding to a pair of connection faceted pebbles be ground to arc-shaped, wherein, silicon single crystal rod is by the Rotating speed is slower during the contact grinding of two emery wheels 44, and silicon single crystal rod is connected after faceted pebble is ground by the second emery wheel 44 by the second emery wheel at it Rotating speed is very fast after 44, also, silicon single crystal rod continues to rotate and causes another pair connection faceted pebble contact corresponding to its another pair chamfering Second emery wheel 44 is simultaneously ground into arc-shaped by the second emery wheel 44；A pair of second emery wheels 44 continue downwards, such as abovementioned steps, to list Each connection faceted pebble of next section of crystalline silicon rod be ground it is round as a ball, until grind the round as a ball bottom to silicon single crystal rod, complete singly The single connection faceted pebble grinding of crystalline silicon rod is round as a ball；Continuing to increase by an amount of feeding, a pair of second emery wheels 44 of driving move from the bottom up, Each connection faceted pebble of silicon single crystal rod is ground by the second emery wheel 44；In this way, grinding, increases the amount of feeding, reversely grinding, increase feeding Amount, after being repeated several times, you can the connection faceted pebble of silicon single crystal rod is ground into default size and overall rounding, i.e. connecting edge Face and side rounding off.Positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 again so that one in silicon single crystal rod Offside face corresponds to a pair of second grinding tools 43, and fine grinding operation is carried out to the side of silicon single crystal rod by the second grinding tool 43.

Fine grinding operation may be, for example,：Positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that monocrystalline First offside face of silicon rod corresponds to a pair of second grinding tools 43, by the second emery wheel 44 in a pair of second grinding tools 43 to silicon single crystal rod First pair of side carry out fine grinding operation；Then, positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that Second offside face of silicon single crystal rod corresponds to a pair of second grinding tools 43, by the second emery wheel 44 in a pair of second grinding tools 43 to monocrystalline Second pair of side of silicon rod carries out fine grinding operation.Wherein, any fine grinding operation to side can for example including：There is provided One amount of feeding, the second emery wheel 44 in a pair of second grinding tools 43 is driven to move from top to bottom to grind an offside of silicon single crystal rod Face；A pair of second emery wheels 44 are ground to after silicon single crystal rod bottom and stay in lower limit afterwards through silicon single crystal rod, are further added by One amount of feeding, a pair of second emery wheels 44 of driving move to grind silicon single crystal rod from the bottom up；A pair of second emery wheels 44 are ground to list Upper limit is stayed in afterwards after at the top of crystalline silicon rod and through silicon single crystal rod, continues to increase by an amount of feeding, drives a pair of second sand Wheel 44 moves to grind silicon single crystal rod from top to bottom；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, repeatedly After for several times, you can a pair of sides of silicon single crystal rod are ground into default size.

As seen from the above description, in a kind of alternative embodiment, the round as a ball and fine grinding device 4 as the second processing unit (plant) is right The grinding step that the round as a ball and fine grinding operation that silicon single crystal rod is carried out is ground using faceted pebble grinding trailing flank is first connected, but It is not limited thereto, in other change embodiments, round as a ball and fine grinding that round as a ball and fine grinding device 4 is carried out to silicon single crystal rod Operation connects the grinding step that faceted pebble is ground after can also using the grinding of first side, should have identical technique effect.

It is described in detail again so that silicon rod 100 is polycrystalline silicon rod as an example below.

In the case of silicon rod 100 is polycrystalline silicon rod, the first processing unit (plant) 3 is corase grind device, and the second processing unit (plant) 4 is Angle and fine grinding device.

As the corase grind device 3 of the first processing unit (plant), on support 1 and positioned at the first processing district of silicon rod processing platform Position, for carrying out corase grind operation to polycrystalline silicon rod.Corase grind device 3 has first receiving space, is changed for receiving by silicon rod The polycrystalline silicon rod that the conveying conveying of body 51 in device 5 comes.Roughly grind device 3 mainly include the first frame 31 and at least one pair of the One grinding tool 33, at least one pair of first grinding tool 33 is arranged oppositely in the first frame 31, for being pointed at the first processing position Polycrystalline silicon rod on silicon rod conversion equipment 5 carries out corase grind operation.Further, each first grinding tool 33 further includes the first master The emery wheel 34 of axle 32 and first, wherein, the mounting surface of the first main shaft 32 and the first frame 31, which is provided with, to be slid laterally guide mechanism and indulges To guide mechanism is slided, the guide mechanism that slides laterally can be used such as the combination of slide rail and sliding block, the longitudinal sliding motion Guide mechanism can be used such as the combination of slide rail and sliding block.Using guide mechanism is slid laterally, the first main shaft 32 or the can be made Relative first frame 31 of the energy of one emery wheel 34 makees laterally motion of retreating, using longitudinal sliding motion guide mechanism, can make the first main shaft 32 Relative first frame 31 of energy longitudinally moves up and down.

In a practical application, at least one pair of first grinding tool 33 is arranged on a grinding tool base, the grinding tool base and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the first frame 31, at least one pair of first grinding tool 33 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool base, wherein, the grinding tool base is controlled by a lifting motor and indulged To sliding, each first grinding tool 33 of guide mechanism longitudinal sliding motion in the first frame 31, at least one pair of first grinding tool 33 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool base.First emery wheel 34 is arranged at the operation end of the first main shaft 32, The first frosted particle with the first granularity.Herein, polycrystalline silicon rod to be processed is the silicon cube of rectangular in cross-section, has four Individual side and four corner angle.Therefore, a pair of first grinding tools 33 in device 3 are roughly ground to be oppositely arranged, are left between the two for accommodating The first receiving space of polycrystalline silicon rod, when polycrystalline silicon rod be transported to a pair of first emery wheels 34 in the first receiving space it Between after, the first emery wheel 34 is that a pair of sides relative in accessible polycrystalline silicon rod or a pair of corner angle carry out corresponding corase grind processing and made Industry.

In actual applications, polycrystalline silicon rod is transferred into silicon rod processing platform first with silicon rod conversion equipment 5 first adds Work area position, positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that a pair of sides in polycrystalline silicon rod correspond to A pair of first grinding tools 33, corase grind processing processing operation is carried out to the side of polycrystalline silicon rod by the first grinding tool 33.

Corase grind processes operation：Positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that polycrystalline First offside face of silicon rod corresponds to a pair of first grinding tools 33, by the first emery wheel 34 in a pair of first grinding tools 33 to polycrystalline silicon rod First pair of side carry out corase grind processing operation；Then, positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that Second offside face of polycrystalline silicon rod corresponds to a pair of first grinding tools 33, by the first emery wheel 34 in a pair of first grinding tools 33 to polycrystalline Second pair of side of silicon rod carries out corase grind processing operation, wherein, any corase grind to side process operation can for example including：There is provided One amount of feeding, the first emery wheel 34 in a pair of first grinding tools 33 is driven to move from top to bottom to grind an offside of polycrystalline silicon rod Face；A pair of first emery wheels 34 are ground to after polycrystalline silicon rod bottom and stay in lower limit afterwards through polycrystalline silicon rod, are further added by One amount of feeding, a pair of first emery wheels 34 of driving move to grind polycrystalline silicon rod from the bottom up；A pair of first emery wheels 34 are ground to more Upper limit is stayed in afterwards after at the top of crystalline silicon rod and through polycrystalline silicon rod, continues to increase by an amount of feeding, drives a pair of first sand Wheel 34 moves to grind polycrystalline silicon rod from top to bottom；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, repeatedly After for several times, you can a pair of sides of polycrystalline silicon rod are ground into default size.

As the chamfering and fine grinding device of the second processing unit (plant), on support 1 and positioned at the second of silicon rod processing platform Position is processed, for carrying out chamfering and fine grinding work to the polycrystalline silicon rod after the corase grind corase grind processing processing operation of device 3 Industry.Chamfering and fine grinding device 4 have the second receiving space, for receiving the conveying body 51 passed through in silicon rod conversion equipment 5 defeated The polycrystalline silicon rod sent.Chamfering and fine grinding device 4 mainly include the second frame 41 and at least one pair of second grinding tool 43, at least one pair of Second grinding tool 43 is arranged oppositely in the second frame 41, for being pointed on the silicon rod conversion equipment 5 at the second processing position Polycrystalline silicon rod carries out chamfering and fine grinding operation.

Further, each second grinding tool 43 further includes the second main shaft 42 and the second emery wheel 44, wherein, the second main shaft 42 and second frame 41 mounting surface be provided with slide laterally guide mechanism and longitudinal sliding motion guide mechanism, described slide laterally is led Drawing mechanism can use such as the combination of slide rail and sliding block, and the longitudinal sliding motion guide mechanism can use such as slide rail and sliding block Combination etc..Using guide mechanism is slid laterally, the second main shaft 42 or relative second frame 41 of the energy of the second emery wheel 44 can be made to make transverse direction Ground motion of retreating, using longitudinal sliding motion guide mechanism, relative second frame 41 of the energy of the second main shaft 42 can be made to make longitudinally fortune up and down It is dynamic.

In a practical application, at least one pair of second grinding tool 43 is arranged on a grinding tool base, the grinding tool base and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the second frame 41, at least one pair of second grinding tool 43 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool base, wherein, the grinding tool base is controlled by a lifting motor and indulged To sliding, each second grinding tool 43 of guide mechanism longitudinal sliding motion in the second frame 41, at least one pair of second grinding tool 43 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool base.Second emery wheel 44 is arranged at the operation end of the second main shaft 42, The second frosted particle with the second granularity, comparatively, the granularity of the second frosted particle in the second emery wheel 44 is small In the granularity for roughly grinding the first frosted particle in device 3 in first emery wheel 34.Therefore, a pair in chamfering and fine grinding device 4 Second grinding tool 43 leaves the second receiving space for accommodating polycrystalline silicon rod, when polycrystalline silicon rod is conveyed between the two to be oppositely arranged After between a pair of second emery wheels 44 into second receiving space, the i.e. accessible polycrystalline silicon rod of the second emery wheel 44 carries out corresponding Chamfer machining operation.

In actual applications, polycrystalline silicon rod is transferred into silicon rod processing platform first with silicon rod conversion equipment 5 second adds Work area position, the corner angle correspondence that polycrystalline silicon rod causes polycrystalline silicon rod is positioned by silicon rod detent mechanism 53 and rotated to polycrystalline silicon rod The second emery wheel 44 in a pair of second grinding tools 43, chamfer machining operation is carried out to polycrystalline silicon rod by the second grinding tool 43.

Chamfer machining operation can for example including：In chamfering, rotated to an angle first with silicon rod detent mechanism 53 so that Obtain the second emery wheel 44 that first pair of corner angle of polycrystalline silicon rod correspond in a pair of second grinding tools 43；A pair of second emery wheels 44 drop to Grinding position, now, the spacing between a pair of second emery wheels 44 are to be less than current diagonal of first pair of corner angle in polycrystalline silicon rod Spacing, the gap of the two spacing are the amount of feeding of this pair of second emery wheel 44, and a pair of second emery wheels 44 are moved down to silicon First pair of corner angle in rod 100 are ground to form fillet surface；A pair of second emery wheels 44 continue downwards, such as abovementioned steps, Next section of first pair of corner angle of silicon rod 100 are ground, until being ground to the bottom of silicon rod 100, complete silicon rod 100 Single corner angle are ground；Continue to increase by an amount of feeding, the second grinding tool 43 of driving is moved from the bottom up, and silicon rod is ground by the second emery wheel 44 100 first pair of corner angle；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, after being repeated several times, you can will First pair of corner angle of silicon rod 100 are ground to default size to form first pair of fillet surface.Chamfering is carried out to second pair of corner angle again And fine grinding：In chamfering, rotated to an angle first with silicon rod detent mechanism 53 so as to obtain second pair of corner angle pair of polycrystalline silicon rod Should be in the second emery wheel 44 in a pair of second grinding tools 43；A pair of second emery wheels 44 drop to grinding position, now, a pair of second sand Spacing between wheel 44 is to be less than the diagonal pitch that second pair of corner angle is current in silicon rod 100, and the gap of the two spacing is The amount of feeding of this pair of second emery wheel 44, a pair of second emery wheels 44 move down to be ground to second pair of corner angle in silicon rod 100 Cut to form fillet surface；A pair of second emery wheels 44 continue downwards, such as abovementioned steps, to next section the second couple of silicon rod 100 Corner angle are ground, until being ground to the bottom of silicon rod 100, complete the single corner angle grinding of silicon rod 100；Continue the feeding of increase by one Amount, the second grinding tool 43 of driving are moved from the bottom up, and second pair of corner angle of silicon rod 100 are ground by the second emery wheel 44；In this way, grinding, Increase the amount of feeding, reversely grinding, increase the amount of feeding, after being repeated several times, you can be ground to second pair of corner angle of silicon rod 100 pre- If size to form second pair of fillet surface.

Then, recycle silicon rod detent mechanism 53 to be positioned to polycrystalline silicon rod and rotate polycrystalline silicon rod and cause polycrystalline silicon rod The second emery wheel 44 for corresponding in a pair second grinding tools 43 of side, fine grinding work is carried out to polycrystalline silicon rod by the second grinding tool 43 Industry.Fine grinding operation can for example including：Positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that polycrystalline silicon rod The first offside face correspond to a pair of second grinding tools 43, by the second emery wheel 44 in a pair of second grinding tools 43 to polycrystalline silicon rod A pair of sides carry out fine grinding operation；Then, positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that polycrystalline Second offside face of silicon rod corresponds to a pair of second grinding tools 43, by the second emery wheel 44 in a pair of second grinding tools 43 to polycrystalline silicon rod Second pair of side carry out fine grinding operation, wherein, any fine grinding operation to side can for example including：One is provided to enter To amount, the second emery wheel 44 in a pair of second grinding tools 43 is driven to move from top to bottom to grind a pair of sides of polycrystalline silicon rod；One Second emery wheel 44 is ground to after polycrystalline silicon rod bottom and stays in lower limit afterwards through polycrystalline silicon rod, be further added by a feeding Amount, a pair of second emery wheels 44 of driving move to grind polycrystalline silicon rod from the bottom up；A pair of second emery wheels 44 are ground to polycrystalline silicon rod After top and through upper limit is stayed in after polycrystalline silicon rod, continue to increase an amount of feeding, a pair of second emery wheels 44 of driving from On down move and grind polycrystalline silicon rod；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, be repeated several times it Afterwards, you can a pair of sides of polycrystalline silicon rod are ground to default size.

It should be noted that above are only exemplary illustration, the protection domain of the application is not intended to limit, for example, in pin To being to first carry out in the processing job description of the chamfering as the second processing unit (plant) and the chamfering of fine grinding device and fine grinding device The chamfer machining operation of polycrystalline silicon rod performs the fine grinding operation of polycrystalline silicon rod again, but is not limited thereto, in other realities Apply in mode, it is also feasible to first carry out and perform the chamfer machining operation of polycrystalline silicon rod after the fine grinding operation of polycrystalline silicon rod again , the protection domain of the application should be belonged to.

Subsequently, silicon rod 100 is after the processing operation of the first processing unit (plant) 3 and the second processing unit (plant) 4, then by silicon rod converting means Put 5 by silicon rod from second processing position change to pretreatment position, and again by silicon rod handler will be processed after silicon rod from The pretreatment position unloading of silicon rod processing platform.Certainly, before silicon rod 100 is unloaded, if it is necessary, in pretreatment position, still Planar smoothness detection can be carried out to the silicon rod 100 after processed operation by flatness detector.Using flatness detector, On the one hand, it can examine whether silicon rod meets production after each processing operation by being detected to the planar smoothness of silicon rod 100 Product requirement, to determine the effect of each processing operation；On the other hand, by being detected to the planar smoothness of silicon rod 100, also can between The wear condition of processing component in each processing unit (plant) is obtained to obtain, in favor of being calibrated or being corrected in real time, or even maintenance or more Change.

It need to supplement, in the application silicon rod Multi-position processing machine, may also include silicon rod burnishing device.The silicon rod is thrown Electro-optical device can be located on support, for being polished processing operation to silicon rod.

For silicon rod burnishing device, typically, processing operation of the silicon rod through the first processing unit (plant) and the second processing unit (plant) Afterwards, the surface of silicon rod can still have the out-of-flatnesses such as a little depression, projections, therefore add, it is necessary to carry out corresponding polishing to silicon rod Work industry, to improve the surface of silicon rod, obtains the effect of high flat degree and smooth finish surface.Silicon rod burnishing device mainly includes polishing Frame and at least one pair of polishing unit, at least one pair of polishing unit are arranged oppositely in polishing frame, added for being pointed to polishing The silicon rod on silicon rod conversion equipment at the position of work area is polished processing operation.

Further, each polishing unit further includes buff spindle and polishing hairbrush, wherein, buff spindle and polishing The mounting surface of frame is provided with and slides laterally guide mechanism and longitudinal sliding motion guide mechanism, and the guide mechanism that slides laterally can use Such as combination of slide rail and sliding block etc., the longitudinal sliding motion guide mechanism can be used such as the combination of slide rail and sliding block.Utilize Slide laterally guide mechanism, can make buff spindle or polishing hairbrush can relative polishing frame make laterally motion of retreating, using vertical To guide mechanism is slided, buff spindle can be made relative to polish frame and longitudinally moved up and down.Polishing hairbrush is arranged at polishing The operation end of main shaft, in a kind of alternative embodiment, the polishing hairbrush may be, for example, annular brush, and energy is controlled and rotates.

In the case of silicon rod is silicon single crystal rod, being polished processing operation to silicon single crystal rod by silicon rod burnishing device can enter One step includes：Silicon single crystal rod is transferred to the polishing position of silicon rod processing platform first with silicon rod conversion equipment, by silicon rod Detent mechanism is positioned to silicon single crystal rod and rotates silicon single crystal rod, drives the polishing hairbrush rotation at least one pair of polishing unit Turn, and be polished by connection faceted pebble of the polishing hairbrush to silicon single crystal rod, wherein, the polishing hairbrush at least one pair of polishing unit Between spacing be to be less than the spacing between two diagonal connection faceted pebbles；Then, by silicon rod detent mechanism to monocrystalline silicon Rod carries out positioning adjustment so that the first offside face of silicon single crystal rod corresponds to a pair of polishing units, by a pair of polishing units Polishing hairbrush is polished to first pair of side of silicon single crystal rod；Then, silicon single crystal rod is positioned by silicon rod detent mechanism Adjustment so that the second offside face of silicon single crystal rod corresponds to a pair of polishing units, by the polishing hairbrush pair in a pair of polishing units Second pair of side of silicon single crystal rod is polished.

Wherein, when the connection faceted pebble to silicon single crystal rod is polished：Silicon single crystal rod is being rotating all the time, polishes hairbrush All the time it is rotating, a pair of polishing hairbrush continue downwards, to be polished next section of each connection faceted pebble of silicon single crystal rod, until The bottom of silicon single crystal rod is polished to, completes silicon single crystal rod single connecting edge mirror polish；A pair of polishing hairbrush are driven again from the bottom up Motion, continued to polish each connection faceted pebble of silicon single crystal rod by polishing hairbrush；In this way, after being repeated several times, you can by monocrystalline silicon Each connecting edge mirror polish of rod to high flat degree and smooth finish surface effect；When being polished in the side to silicon single crystal rod, Any polishing to side can for example including：Silicon single crystal rod is motionless by the positioning of silicon rod detent mechanism, there is provided an amount of feeding, driving Polishing hairbrush in a pair of polishing units moves to polish a pair of sides of silicon single crystal rod from top to bottom；A pair of polishing hairbrush polishings A pair of polishing hairbrush are driven to move from the bottom up to polish monocrystalline again afterwards after to silicon single crystal rod bottom and through silicon single crystal rod Silicon rod；In this way, after being repeated several times, you can each side of silicon single crystal rod is polished into the effect of high flat degree and smooth finish surface Fruit.

In addition, as seen from the above description, in a kind of alternative embodiment, throwing that silicon rod burnishing device is carried out to silicon single crystal rod Light processes process of the operation using mirror polish on rear side of first connecting edge mirror polish, but is not limited thereto, real in other changes Apply in example, the polishing operation that silicon rod burnishing device is carried out to silicon single crystal rod connects faceted pebble throwing after can also using the polishing of first side The process of light, there should be identical technique effect.

In the case of silicon rod is polycrystalline silicon rod, being polished processing operation to polycrystalline silicon rod by silicon rod burnishing device can enter One step includes：Polycrystalline silicon rod is transferred to the polishing position of silicon rod processing platform first with silicon rod conversion equipment, by silicon rod Detent mechanism carries out positioning adjustment to polycrystalline silicon rod so that and the first offside face of polycrystalline silicon rod corresponds to a pair of polishing units, by Polishing hairbrush in a pair of polishing units is polished to first pair of side of polycrystalline silicon rod；Then, by silicon rod detent mechanism pair Polycrystalline silicon rod carries out positioning adjustment so that the second offside face of polycrystalline silicon rod corresponds to a pair of polishing units, single by a pair of polishings Polishing hairbrush in member is polished to second pair of side of polycrystalline silicon rod.Wherein, any polishing to side can for example including： Polycrystalline silicon rod is motionless by the positioning of silicon rod detent mechanism, there is provided an amount of feeding, drive polishing hairbrush in a pair of polishing units from On down motion come polishing polycrystalline silicon rod a pair of sides；A pair of polishing hairbrush are polished to after polycrystalline silicon rod bottom and passed through more Drive a pair of polishing hairbrush to move from the bottom up again after crystalline silicon rod and carry out polishing polycrystalline silicon rod；In this way, after being repeated several times, you can Each side of polycrystalline silicon rod is polished to the effect of high flat degree and smooth finish surface.

Further, in an alternative embodiment, except being polished processing operation to each side of polycrystalline silicon rod Outside, can also processing operation be polished to each fillet surface of polycrystalline silicon rod.When being polished processing operation to fillet surface, Positioning adjustment first is carried out to polycrystalline silicon rod by silicon rod detent mechanism so that first pair of fillet surface of polycrystalline silicon rod corresponds to a pair of throwings Light unit, first pair of side of polycrystalline silicon rod is polished by the polishing hairbrush in a pair of polishing units；Then, determined by silicon rod Position mechanism carries out positioning adjustment to polycrystalline silicon rod so that the second offside face of polycrystalline silicon rod corresponds to a pair of polishing units, by one Polishing hairbrush in polishing unit is polished to second pair of side of polycrystalline silicon rod.The specific work being polished to diagonal plane Industry process can be found in the foregoing process description being polished to side, will not be repeated here.

Further, in the application silicon rod Multi-position processing machine, in an alternative embodiment, silicon rod cleaning dress may also include Put.The silicon rod cleaning device can be located on support, for carrying out and cleaning to silicon rod.For silicon rod cleaning device, one As, silicon rod is through the first processing unit (plant) and the second processing unit (plant), or the first processing unit (plant), the second processing unit (plant) and the 3rd processing unit (plant) Processing operation after, in operation process it is caused cutting chip can be attached to silicon rod surface, therefore, if necessary, it is necessary to silicon rod Carry out necessary cleaning.Usually, the silicon rod cleaning device includes cleanninfg brushes and coordinated with the cleanninfg brushes clear Washing lotion flusher, in cleaning, cleaning fluid is sprayed against silicon rod by the cleaning fluid flusher, meanwhile, driven by motor Cleanninfg brushes act on silicon rod, complete washing and cleaning operation.In actual applications, the cleaning fluid may be, for example, pure water, the cleaning Brush may be, for example, rotary brush-head.

In particular, if silicon rod Multi-position processing machine is additionally arranged corresponding processing apparatus for work, then silicon rod The quantity and its position relationship of function position on processing platform and the silicon rod detent mechanism on conveying body are both needed to make accordingly Adjustment.It is assumed that silicon rod Multi-position processing machine be additionally arranged one processing apparatus for work (such as：Silicon rod burnishing device), silicon rod processing Also can accordingly be set up on platform One function position (such as：Polishing position) and conveying body also accordingly increase a silicon rod Detent mechanism.Further, it is preferable to ground, this four silicon rod detent mechanism angles set between any two are also and four functions The angular distribution of position between any two is consistent.In this way, when some silicon rod detent mechanism corresponds to some function position, Other three silicon rod detent mechanisms are also corresponding with other three function positions respectively.So, in continuous productive process, Ren Yishi Carve, when it is corresponding with function position that a silicon rod and silicon rod detent mechanism are located on each silicon rod detent mechanism, Then these silicon rods, which are located at corresponding a certain function position, performs corresponding processing operation.In a kind of alternative embodiment, Four function positions on the silicon rod processing platform are between any two in 90 ° of distributions, therefore, correspondingly, be disc or Four silicon rod detent mechanisms on the conveying body of annular are between any two also in 90 ° of distributions.

The application silicon rod Multi-position processing machine, has gathered multiple processing unit (plant)s, can be by silicon rod using silicon rod handler Quickly, it is steady and loaded and unloaded with no damage, using silicon rod conversion equipment can by silicon rod between each processing unit (plant) in order and The multiple procedures for realizing silicon rod processing are seamlessly shifted and are automated, multiple processing unit (plant)s can be simultaneously to corresponding silicon Rod carries out corresponding processing operation, improves production efficiency and the quality of Product processing operation.

Referring to Fig. 7, being shown as the application silicon rod Multi-position processing machine performs silicon rod processing operation in one embodiment Schematic flow sheet.Comprise the following steps as shown in fig. 7, the application silicon rod Multi-position processing machine performs silicon rod processing operation：

Step S101 is the pre-treatment step of the first silicon rod：Silicon rod handler is made to be loaded into the first silicon rod to be processed The pretreatment position of silicon rod processing platform, and the first silicon rod being pointed at the pretreatment position is pre-processed.Pass through step Rapid S101, loading and the pretreatment of the first silicon rod can be completed.

Step S103 is the pre-treatment step that the first silicon rod carries out the first processing operation and the second silicon rod：Make silicon rod converting means Put and rotate the first predetermined angle so that the first silicon rod for completing pretreatment is changed to the first processing position by pre-processing position；Make One processing unit (plant) carries out the first processing operation to the first silicon rod on the first processing position, in this stage, makes silicon rod handler Second silicon rod to be processed is loaded into pretreatment position and pre-processed.By step S103, to conversion to the first processing First silicon rod of position carries out the first processing operation, meanwhile, complete loading and the pretreatment of the second silicon rod.

Step S105 is that the first silicon rod carries out the pre- of the second processing operation, the first processing of the second silicon rod and the 3rd silicon rod Processing step：Silicon rod conversion equipment is made to rotate the second predetermined angle so that the first silicon rod for completing the first processing operation to be added by first Change to the second processing position and change the second silicon rod for completing pretreatment to the first processing by pre-processing position in work area position Position；Make the second processing unit (plant) carry out the second processing operation to the first silicon rod on the second processing position, in this stage, make first Processing unit (plant) carries out the first processing operation to the second silicon rod on the first processing position and makes silicon rod handler will be to be processed The 3rd silicon rod be loaded into pretreatment and position and pre-processed.By step S105, to changing to the of the second processing position One silicon rod carries out the second processing operation, and the first processing operation is carried out to the second silicon rod changed to the first processing position, meanwhile, it is complete Loading and pretreatment into the 3rd silicon rod.

From the foregoing, it will be observed that (can refer to the first silicon rod) for silicon rod processes operation, silicon rod can in order and seamless connection Loading, the first processing operation and the second processing operation are performed, multiple manufacturing procedures can be complete in a Multi-position processing machine Into, improve conscientiously silicon rod processing operation globality and production efficiency, it is ensured that the quality of Product processing operation.It is in addition, more Individual silicon rod can perform corresponding processing operation on different processing positions simultaneously, each independent and mutually noiseless, form stream The processing operation of waterline, greatly improve the efficiency of silicon rod processing operation.

In fact, operation is processed in another reality referring to Fig. 8, being shown as the application silicon rod Multi-position processing machine and performing silicon rod Apply the schematic flow sheet in mode.In fig. 8, except included in earlier figures 7 the step of in addition to may also include：

Step S107 is that the first silicon rod carries out discharging, the second processing operation of the second silicon rod, the first processing of the 3rd silicon rod Job step：Silicon rod conversion equipment is made to rotate the 3rd predetermined angle so that the first silicon rod for completing the second processing operation to be added by second Change to pretreatment position and change the second silicon rod for completing the first processing operation to the by the first processing position in work area position Two process positions and change the 3rd silicon rod for completing pretreatment to the first processing position by pre-processing position；Make silicon rod handling dress Put and the first silicon rod pre-processed on position is unloaded and the 4th silicon rod to be processed is loaded into pretreatment position and right The 4th silicon rod at the pretreatment position is pre-processed, and in this stage, makes the second processing unit (plant) to the second processing district The second silicon rod on position carries out the second processing operation and makes the first processing unit (plant) enter the 3rd silicon rod on the first processing position Row first processes operation.By step S107, given after the first silicon rod for completing the second processing operation is changed to pretreatment position With unloading, the second processing operation is carried out to the second silicon rod changed to the second processing position, to changing to the first processing position 3rd silicon rod carries out the first processing operation, meanwhile, loading and the pretreatment of the 4th silicon rod are completed, each processing position is in good order Ground performs corresponding processing operation.

In actual applications, specifically, for the silicon rod of different kenels, silicon rod is entered by the first processing unit (plant) Row first, which processes operation and also has different changes to silicon rod progress the second processing operation by the second processing unit (plant), combines example.Example Such as：If silicon rod 100 is silicon single crystal rod, the first processing unit (plant) 3 can be the circle of contact and corase grind device and the second processing unit (plant) 4 can be with It is round as a ball and fine grinding device；If silicon rod 100 is polycrystalline silicon rod, the first processing unit (plant) 3 can be corase grind device and second processes Device can be chamfering and fine grinding device.

Below in conjunction with foregoing Fig. 7, to utilizing silicon rod Multi-position processing machine in aforementioned embodiments to silicon single crystal rod and more The different processing operations of crystalline silicon rod are described in detail.

By taking silicon single crystal rod as an example：

In step S101, it is pointed to the first silicon rod at the pretreatment position and is pre-processed, including：Make flatness Detector carries out planar smoothness detection to the first silicon rod.

In step s 103, make the first processing unit (plant) carry out the first processing to the first silicon rod on the first processing position to make Industry, including：Make the circle of contact and roughly grind device and the circle of contact and corase grind processing operation are carried out to the first silicon rod on the first processing position.The circle of contact And corase grind processing operation further comprises：First with the circle of contact and corase grind device to the company in the first silicon rod on the first processing position Connect faceted pebble and carry out circle of contact processing operation so that the connection between each connection faceted pebble and adjacent side forms preliminary arc and connected Connect；Corase grind processing processing operation is carried out to the side in the first silicon rod using the circle of contact and corase grind device afterwards.

In step S105, make the second processing unit (plant) carry out the second processing to the first silicon rod on the second processing position and make Industry, including：Round as a ball and fine grinding device is made to carry out round as a ball and fine grinding operation to the first silicon rod on the second processing position.It is round as a ball And fine grinding operation further comprises：Round as a ball processing operation is carried out to the first silicon rod first with round as a ball and fine grinding device, to the Connection faceted pebble in one silicon rod is ground so that connection faceted pebble and side rounding off in the first silicon rod；Afterwards using round as a ball And fine grinding device carries out fine grinding operation to the side of the first silicon rod.

By taking polycrystalline silicon rod as an example：

In step S101, it is pointed to the first silicon rod at the pretreatment position and is pre-processed, including：Make flatness Detector carries out planar smoothness detection to the first silicon rod.

In step s 103, make the first processing unit (plant) carry out the first processing to the first silicon rod on the first processing position to make Industry, including：Order corase grind device carries out corase grind processing operation to the first silicon rod on the first processing position.

In step S105, make the second processing unit (plant) carry out the second processing to the first silicon rod on the second processing position and make Industry, including：Chamfering and fine grinding device is made to carry out chamfering and fine grinding operation to the first silicon rod on the second processing position.Chamfering And fine grinding operation further comprises：Round as a ball processing operation is carried out to the first silicon rod first with chamfering and fine grinding device, to the Corner angle in one silicon rod are ground to form fillet surface；Essence is carried out to the side of the first silicon rod using chamfering and fine grinding device afterwards Mill processing operation.

From the foregoing, it will be observed that when performing silicon rod processing operation using the application silicon rod Multi-position processing machine, filled using silicon rod Handler can be quick, steady by silicon rod and loaded and unloaded with no damage, can be by silicon rod in each processing using silicon rod conversion equipment Between device in order and seamlessly shifted and automate realize silicon rod processing multiple procedures, multiple processing unit (plant)s can Corresponding processing operation is carried out to corresponding silicon rod simultaneously, improves production efficiency and the quality of Product processing operation.

Below in conjunction with Fig. 9 to Figure 24, silicon rod multistation is performed in some instances to the application silicon rod Multi-position processing machine Processing operation is described in detail.In the following example, following setting is first made：Silicon rod is chosen as silicon single crystal rod and is alternatively polysilicon Rod, wherein：Silicon single crystal rod to be processed is the silicon cube that section is substantially in class rectangle, has four sides, two neighboring side Between formed with the connection faceted pebble in R angles；Polycrystalline silicon rod to be processed be rectangular in cross-section silicon cube, have four sides and Four corner angle.Used silicon rod Multi-position processing machine includes silicon rod processing platform, silicon rod handler, the first processing dress Put, the second processing unit (plant) and silicon rod conversion equipment, certainly, silicon rod Multi-position processing machine may also include height testing instrument, smooth Spend detector etc..In addition, silicon rod processing platform is provided with pretreatment position, the first processing position and the second processing position, in advance Processing position, the first processing position and the second processing position process the process of operation according to silicon rod and order is set, right therewith Ying Di, silicon rod conversion equipment also are provided with three silicon rod detent mechanisms, wherein, pretreatment position, the first processing position and second Position is processed between any two in 120 ° of distributions, and therefore, three silicon rod detent mechanisms are between any two also in 120 ° of distributions.Herein, Assuming that the trend according to the order of pretreatment position, the first processing position and the second processing position is forward direction, with the forward direction The trend of opposite order is reverse.

Step 1, the first silicon rod to be processed is positioned on the Workpiece carrier platform of silicon rod handler.In the present embodiment In, the first silicon rod 101 is to erect to be positioned on silicon rod plummer 21, and the first silicon rod 101 is positioned in silicon rod handling position The operation of silicon rod plummer 21 can also be implemented using manual work using corresponding tool, the tool may be, for example, silicon Rod transfer tool.In addition, if necessary, the first silicon rod on silicon rod plummer 21 can be adjusted by rotating silicon rod plummer 21 101 angle, the angle may be, for example, 45 ° of placements, i.e. two diagonal of the first silicon rod 101 correspond respectively to sidesway side To (X direction of principal axis) and translation direction (Y direction).The state of silicon rod Multi-position processing machine can specifically join after implementation aforesaid operations See that Fig. 9, Fig. 9 are shown as silicon rod and are straightened the view being positioned on silicon rod plummer.

Step 2, the first silicon rod to be processed is loaded into the pretreatment position of silicon rod processing platform.In the present embodiment, It is by silicon rod handler 2 by the pretreatment position that the first silicon rod 101 to be processed is loaded into silicon rod processing platform 11 What silicon rod clamper 25 was implemented.Specifically, first, it is ensured that the silicon rod clamper 25 in silicon rod handler 2 corresponds to silicon rod loading place Position, for example, can be by driving commutation carrier 23 to make commutation motion so that the silicon rod clamper 25 of commutation carrier 23, which is changed to silicon rod, to be filled Unload position；Then, the jig arm 254 in silicon rod holder 253 is driven to make decentralization action to be transferred to clamping state simultaneously by releasing orientation It is able to clamp the first silicon rod 101, the state for implementing silicon rod Multi-position processing machine after aforesaid operations for details, reference can be made to Figure 10, Figure 10 It is shown as the view that silicon rod is clamped by silicon rod clamper；Then, the first silicon rod 101 is departed from and loads and unloads position in silicon rod.Should Depart from operation, in a kind of alternative embodiment, the retaining clip conjunction state of silicon rod holder 253, the silicon in position is loaded and unloaded using silicon rod Rod plummer 21 makees descending motion so that the first silicon rod 101 departs from silicon rod plummer 21；In another alternative embodiment, The first silicon rod 101 is driven by driving the ascending motion (silicon rod holder 253 is movable design) of silicon rod holder 253 Depart from silicon rod plummer 21；Then, driving commutation carrier 23 makees commutation motion (such as rotating 180 °) so that commutation carrier 23 On silicon rod clamper 25 by silicon rod handling position change to pretreatment position；Then, the first silicon rod 101 is positioned in pre- place On the rotation plummer 531 for managing the first silicon rod detent mechanism 53 at position, and by the rotation pressure of the first silicon rod detent mechanism 53 Tight device 533 makees descending motion by lifting drive and realizes positioning to compress the first silicon rod 101, implements silicon after aforesaid operations The state of rod Multi-position processing machine for details, reference can be made to Figure 11, and Figure 11 is shown as silicon rod and is positioned over pretreatment position by commutation carrier View.

It should be noted that in a kind of alternative embodiment, can also profit before the first silicon rod is clamped using silicon rod clamper 25 The height of the first silicon rod 101 is detected with height testing instrument 7, so, the silicon rod holder 253 in silicon rod clamper 25 can be according to height The testing result of detector 7 is subsequently being moved up or being moved down to adjust the folder between multiple silicon rod holders 253 Hold spacing, the state for implementing silicon rod Multi-position processing machine after aforesaid operations for details, reference can be made to Figure 12, and Figure 12 is shown as height detection The view of instrument detection silicon rod height on handling plummer.

Step 3, planar smoothness detection is carried out to the first silicon rod at pretreatment position.Silicon rod is more after implementing aforesaid operations The state of station processing machine for details, reference can be made to Figure 13 and Figure 14, be shown as the shape of flatness detector detection silicon rod planar smoothness State schematic diagram.

In the present embodiment, it is by smooth to carry out planar smoothness detection to the first silicon rod 101 at pretreatment position Spend what detector was implemented.Specifically, driving commutation carrier 23 makees commutation motion (such as rotating 180 °) so that on commutation carrier 23 Flatness detector changed by silicon rod handling position to pretreatment position, wherein, silicon rod clamper 25 and flatness detector point It is not configured in commutation carrier 23 backwards to the first mounting surface and the second mounting surface set, in this stage, if necessary, passes through driving The rotary compacting device 533 of first silicon rod detent mechanism 53 rotates to adjust the angle of the first silicon rod 101, such as drives First silicon rod 101 rotates 45 ° so that the first silicon rod 101 corresponds respectively to sidesway direction (X-direction) by original two diagonal It is adjusted to two adjacent sides with translation direction (Y direction) and corresponds respectively to sidesway direction and translation direction, i.e. wherein A side be right against commutation carrier 23 on flatness detector；Then, using flatness detector to the first silicon rod 101 four sides carry out planar smoothness detection, and the planar smoothness detection of any of which side further includes：Controlled by detection Device control detector shift mechanism processed drives contacting gauge 61 to shift and control contacting gauge 61 sequentially to detect first Each test point in silicon rod 101 on current side to be measured.

Specifically, on the one hand, for the detection of each test point in any one tested surface, include：Controlled by detection Device control detector shift mechanism (including first direction shift mechanism, second direction shift mechanism and third direction shifting machine Structure) contacting gauge is driven in plane of motion internal shift to cause contacting gauge to correspond to current detection point to be measured； Drive contacting gauge to face by detection controller control detector shift mechanism (mainly second direction shift mechanism) to treat The current detection point movement of survey is until touch silicon rod, and now, detection controller can receive to be transmitted across from contacting gauge Come Continuity signal (or cut-off signal) and according to the Continuity signal (or cut-off signal) suspend detection controller control detection The operation of instrument shift mechanism, and by benchmark information and detector shift mechanism (mainly second direction shift mechanism) the Displacement on two directions extrapolates the test point in the tested surface that contacting gauge is currently touched relative to base Relative distance on schedule；Contacting gauge is driven to deviate from current inspection to be measured by detection controller control detector shift mechanism Measuring point movement completes the detection of a test point to reset.

On the other hand, for the detection of multiple test points on tested surface, certainly will need to carry out position between test point Switching, therefore, in completion after the detection of a test point, treats to reset contacting gauge by detector shift mechanism It is displaced to the position of next test point by detector shift mechanism again afterwards, wherein, belong to the more of side to be measured Individual test point can use the dot matrix way arrangement of rule.It should be noted that putting down when a side for completing the first silicon rod 101 After whole degree detection, it is also necessary to switch to next side and carry out flatness detection.The switching of side can be by shifting the first silicon Rod 101 is realized, for example, in workpiece filling structure, can pass through the rotary compacting device for driving the first silicon rod detent mechanism 53 533 rotate to adjust the angle of the first silicon rod 101 (such as driving the first silicon rod 101 to rotate 90 °) and switch to neighbouring Next side.

Extraly, in step 3, except being carried out using flatness detector 7 to the first silicon rod 101 at pretreatment position Outside planar smoothness detection, first silicon rod 101 can also be carried out by the cooperation of flatness detector 7 and silicon rod clamper 25 Correction operation.

In the present embodiment, mainly it is by the center of the first silicon rod 101 and rotation usually in the correction operation The center of vicarious microscope carrier 531 is corresponding to be overlapped.The concrete operations of the correction operation may include：By flatness detector 7 to rotation The first silicon rod 101 carried on plummer 531 carries out planar smoothness detection, so as to obtain the integral position of the first silicon rod 101 Overview；The integral position overview of first silicon rod 101 of acquisition is compared with rotating the position of plummer 531, and then Obtain the deviation information between the center of the first silicon rod 101 and the center of rotation plummer 531；The carrier 23 that commutates rotates 180 ° of works Commutation motion, the first silicon rod 101 corresponded to by the silicon rod clamper 25 on commutation carrier 23 on rotation plummer 531 simultaneously clamp First silicon rod 101；Utilize the first direction shift mechanism and/or second direction detected in controller control detector shift mechanism Shift mechanism driving commutation carrier 23 in a first direction and/or second party moves up, so as to drive silicon rod clamper 25 and by The first silicon rod 101 that silicon rod clamper 25 clamps rotates against plummer 531 and makees position adjustment, is finally able to the first silicon rod 101 Center with rotate plummer 531 center it is corresponding overlap, complete be directed to the first silicon rod 101 correction operation.

In addition, for the silicon rod of different kenels, difference in detail is deposited in the correction operation.

By taking silicon single crystal rod as an example, Figure 15 is referred to, is shown as carrying out silicon single crystal rod the schematic diagram of correction operation.Such as Figure 15 Shown, silicon single crystal rod to be processed is substantially in the silicon cube of class rectangle for section, has four sides, between two neighboring side Formed with the connection faceted pebble in R angles.Therefore, the correction operation for silicon single crystal rod may particularly include：By flatness detector pair Four sides of the silicon single crystal rod carried on rotation plummer carry out planar smoothness detection, so as to obtain by four side institute structures Into silicon single crystal rod side center O1；By flatness detector to four connections of the silicon single crystal rod carried on rotation plummer Faceted pebble carries out planar smoothness detection, so as to obtain the center for the silicon single crystal rod connection faceted pebble being made up of four connection faceted pebbles O2；The size of the silicon single crystal rod finished product after silicon single crystal rod is processed through multistation is calculated；According to the chi of silicon single crystal rod finished product Very little, silicon single crystal rod side center O1, silicon single crystal rod connection faceted pebble center O2, extrapolate the center O3 of silicon single crystal rod finished product； The center O3 of the silicon single crystal rod finished product of acquisition is compared with rotating the center O of plummer, and then both deviation letters Breath；The carrier that commutates makees commutation motion, the silicon single crystal rod and folder corresponded to by the silicon rod clamper on commutation carrier on rotation plummer Silicon single crystal rod is handled, utilizes the first direction shift mechanism and/or second party detected in controller control detector shift mechanism Commutation carrier is driven to shift mechanism in a first direction and/or second party moves up, so as to drive silicon rod clamper and by silicon The silicon single crystal rod of rod clamp clamping rotates against plummer and makees position adjustment, be finally able to by the center O3 of silicon single crystal rod finished product with Rotate the corresponding correction operations for overlapping, completing to be directed to silicon single crystal rod of center O of plummer.

By taking polycrystalline silicon rod as an example, Figure 16 is referred to, is shown as carrying out polycrystalline silicon rod the schematic diagram of correction operation.Such as Figure 16 Shown, polycrystalline silicon rod to be processed is the silicon cube of rectangular in cross-section, has four sides and four corner angle.Therefore, for more The correction operation of crystalline silicon rod may particularly include：By flatness detector to four sides of the polycrystalline silicon rod carried on rotation plummer Face carries out planar smoothness detection, so as to obtain the center O1 for the polycrystalline silicon rod being made up of four sides；By the polycrystalline of acquisition The center O1 of silicon rod is compared with rotating the center O of plummer, and then both deviation informations；Commutation carrier commutates Motion, the polycrystalline silicon rod corresponded to by the silicon rod clamper on commutation carrier on rotation plummer simultaneously clamp polycrystalline silicon rod, utilized Detect the first direction shift mechanism in controller control detector shift mechanism and/or the driving commutation of second direction shift mechanism Carrier is in a first direction and/or second party moves up, so as to the polysilicon for driving silicon rod clamper and being clamped by silicon rod clamper Rod rotates against plummer and makees position adjustment, is finally able to the center O1 of polycrystalline silicon rod is corresponding with the center O for rotating plummer Overlap, complete the correction operation for polycrystalline silicon rod.

Step 4, the first silicon rod for completing planar smoothness detection is changed to the by pre-processing position by pre-processing position One processing position simultaneously carries out the first processing operation to the first silicon rod on the first processing position, in this stage, by be processed the Two silicon rods are loaded into pretreatment position and pre-processed.The state of silicon rod Multi-position processing machine specifically may be used after implementation aforesaid operations Referring to Figure 17, the view for the first processing operation being carried out to the first silicon rod and the second silicon rod is loaded is shown as.

In the present embodiment, the first silicon rod for completing planar smoothness detection is turned by pre-processing position by pre-processing position It is to implement to complete by making silicon rod conversion equipment rotate the first predetermined angle to shift to the first processing position, as it was previously stated, pre- place Position, the first processing position and the second processing position are managed between any two in 120 ° of distributions, three silicon rod detent mechanisms 53 are two-by-two Between also in 120 ° distribution, therefore, make silicon rod conversion equipment 5 rotate the first predetermined angle be actually make silicon rod conversion equipment 5 rotate forward 120 °, and the first silicon rod detent mechanism 53 and its first silicon rod 101 of positioning being initially positioned on pretreatment position are just On conversion to the first processing position.

Carrying out the first processing operation to the first silicon rod 101 on the first processing position is implemented by the first processing unit (plant) 3 's.In the case of the first silicon rod 101 is silicon single crystal rod, the first processing unit (plant) 3 is the circle of contact and corase grind device.By the circle of contact and corase grind Device, which carries out the circle of contact and corase grind processing operation to silicon single crystal rod, to be generally comprised：The circle of contact processes operation and corase grind processing operation.

Circle of contact processing operation further comprises：First silicon rod 101 is transferred into the first processing first with silicon rod conversion equipment 5 Position, positioning adjustment is carried out to the first silicon rod 101 by the first silicon rod detent mechanism 53；Initially, in silicon rod conversion equipment 5 by When one silicon rod 101 transfers to the first processing position, the side of the first silicon rod 101 corresponds to the circle of contact and roughly grinds a pair in device First grinding tool 33, therefore, first silicon rod 101 is carried out positioning adjustment by the first silicon rod detent mechanism 53 can be for example including driving the One silicon rod 101 positive (or reverse) rotates 45 ° so that first pair of connecting edge face in the first silicon rod 101 corresponds to the circle of contact and thick A pair of first grinding tools 33 in mill apparatus, make 33 relative first frame 31 of the first grinding tool make traverse feed according to the amount of feeding, rotate The first emery wheel 34 and the first grinding tool 33 of driving in first grinding tool 33 move up and down to connect to the first Dui in the first silicon rod 101 Faceted pebble slightly cut for the first time；Drive the first silicon rod 101 to rotate forward 5 ° by the first silicon rod detent mechanism 53, rotate the first grinding tool The first emery wheel 34 and the first grinding tool 33 of driving in 33 move up and down to be carried out with connecting faceted pebble to the first couple in the first silicon rod 101 Slightly cut for the second time；The first silicon rod 101 is driven to rotate forward 80 ° by the first silicon rod detent mechanism 53 so that in the first silicon rod 101 Second pair of connecting edge face correspond to the circle of contact and roughly grind device in a pair of first grinding tools 33, rotate the first grinding tool 33 in first Emery wheel 34 simultaneously drives the first grinding tool 33 to move up and down with thick for the first time to the second couple connection faceted pebble progress in the first silicon rod 101 Cut；Drive the first silicon rod 101 to rotate forward 5 ° by the first silicon rod detent mechanism 53, rotate the first emery wheel 34 in the first grinding tool 33 And drive the first grinding tool 33 to move up and down and slightly cut for the second time with connecting faceted pebble to the second couple in the first silicon rod 101；By One silicon rod detent mechanism 53 drives the first silicon rod 101 to rotate forward 5 °, rotates the first emery wheel 34 in the first grinding tool 33 and drives First grinding tool 33, which moves up and down, to connect the second couple in the first silicon rod 101 faceted pebble slightly cut for the third time；By the first silicon rod Detent mechanism 53 drives the first silicon rod 101 to rotate forward 80 °, rotates the first emery wheel 34 in the first grinding tool 33 and drives the first mill Tool 33, which moves up and down, to connect the first couple in the first silicon rod 101 faceted pebble slightly cut for the third time.As the first silicon rod 101 The state that silicon single crystal rod implements above-mentioned circle of contact processing operation for details, reference can be made to Figure 18, and Figure 18 is shown as silicon single crystal rod and processed in the circle of contact State change schematic diagram in operation.

It should be strongly noted that in foregoing circle of contact processing operation, the first silicon rod is driven by the first silicon rod detent mechanism 53 101 rotate respective angles, such as：First silicon rod detent mechanism 53 drives the first silicon rod 101 to rotate forward 5 °, not to be unique Implementation, in other alternative embodiments, be suitable for adjustment angle, for example, 3 ° to 7 °, including 3 °, 4 °, 5 °, 6 °, 7 ° or Other angles, correspondingly, situation that the first silicon rod 101 rotates forward 80 ° then adaptability is driven by the first silicon rod detent mechanism 53 Adjustment angle.Following table one is referred to, table one is shown as the sample situation of rotational angle each numerical value in the range of 3 ° to 7 °.

Table one

Above-mentioned circle of contact processing operation process is only the embodiment in circle of contact processing operation, but is not limited thereto, such as： First silicon rod 101 is transferred into the first processing position first with silicon rod conversion equipment 5, is driven by the first silicon rod detent mechanism 53 One silicon rod 101 rotates forward 40 ° so that first pair of connecting edge face in the first silicon rod 101 corresponds in the circle of contact and corase grind device A pair of first grinding tools 33, rotate the first grinding tool 33 in the first emery wheel 34 and drive the first grinding tool 33 move up and down with to first The first couple in silicon rod 101 connects faceted pebble and slightly cut for the first time；First silicon rod 101 is being driven just by the first silicon rod detent mechanism 53 To rotating 5 °, rotate the first emery wheel 34 in the first grinding tool 33 and drive the first grinding tool 33 to move up and down with to the first silicon rod 101 In the first couple connect faceted pebble slightly cut for the second time；The first silicon rod 101 is driven to rotate forward by the first silicon rod detent mechanism 53 5 °, rotate the first emery wheel 34 in the first grinding tool 33 and drive the first grinding tool 33 to move up and down with to the in the first silicon rod 101 A pair of connection faceted pebbles carry out third time and slightly cut；The first silicon rod 101 is driven to rotate forward 80 ° by the first silicon rod detent mechanism 53, rotation Turn the first emery wheel 34 in the first grinding tool 33 and drive the first grinding tool 33 to move up and down with to second pair of company in the first silicon rod 101 Faceted pebble is connect slightly cut for the first time；The first silicon rod 101 is driven to rotate forward 5 ° by the first silicon rod detent mechanism 53, the mill of rotation first The first emery wheel 34 and the first grinding tool 33 of driving in tool 33 move up and down to enter to connect faceted pebble to the second couple in the first silicon rod 101 Row is slightly cut for the second time；Drive the first silicon rod 101 to rotate forward 5 ° by the first silicon rod detent mechanism 53, rotate in the first grinding tool 33 The first emery wheel 34 and drive the first grinding tool 33 move up and down with the first silicon rod 101 the second couple connect faceted pebble carry out the 3rd It is secondary slightly to cut.

Corase grind processing operation further comprises：First silicon rod 101 is transferred into the first processing first with silicon rod conversion equipment 5 Position, positioning adjustment is carried out to the first silicon rod 101 by the first silicon rod detent mechanism 53 so that the first couple in the first silicon rod 101 A pair of first grinding tools 33 that side corresponds in the circle of contact and corase grind device, 33 relative first frame 31 of the first grinding tool is made according to feeding Amount makees traverse feed, rotates the first emery wheel 34 in the first grinding tool 33 and drives the first grinding tool 33 to move up and down with to the first silicon rod Roughly grind first pair of side in 101；The first silicon rod 101 positive (or reverse) is driven to rotate by the first silicon rod detent mechanism 53 90 ° so that a pair of first grinding tools 33 that the second offside face in the first silicon rod 101 corresponds in the circle of contact and corase grind device, rotation The first emery wheel 34 and the first grinding tool 33 of driving in first grinding tool 33 move up and down with to second pair of side in the first silicon rod 101 Roughly ground.The state that silicon single crystal rod as the first silicon rod 101 implements above-mentioned corase grind processing operation for details, reference can be made to Figure 19, scheme 19 are shown as the state change schematic diagram that silicon single crystal rod is processed in operation in corase grind.

In the case of the first silicon rod 101 is polycrystalline silicon rod, the first processing unit (plant) 3 is corase grind device.By corase grind device pair Polycrystalline silicon rod, which carries out corase grind processing operation, to be generally comprised：First silicon rod 101 is transferred to first first with silicon rod conversion equipment 5 Position is processed, positioning adjustment is carried out to the first silicon rod 101 by the first silicon rod detent mechanism 53 so that the in the first silicon rod 101 A pair of first grinding tools 33 that a pair of sides correspond in corase grind device 3,33 relative first frame 31 of the first grinding tool is made according to feeding Amount makees traverse feed, rotates the first emery wheel 34 in the first grinding tool 33 and drives the first grinding tool 33 to move up and down with to the first silicon rod Roughly grind first pair of side in 101；The first silicon rod 101 positive (or reverse) is driven to turn by the first silicon rod detent mechanism 53 Dynamic 90 ° so that a pair of first grinding tools 33 that the second offside face in the first silicon rod 101 corresponds in corase grind device 3, rotation the The first emery wheel 34 and the first grinding tool 33 of driving in one grinding tool 33 move up and down to enter to second pair of side in the first silicon rod 101 Row corase grind.The state that polycrystalline silicon rod as the first silicon rod 101 implements above-mentioned corase grind processing operation for details, reference can be made to Figure 20, Figure 20 It is shown as the state change schematic diagram that polycrystalline silicon rod is processed in operation in corase grind.

In step 4, the implementation process for the second silicon rod to be processed being loaded into pretreatment position and being pre-processed can With reference to the description in abovementioned steps 2 and step 3, will not be repeated here.

Step 5, by complete first processing operation the first silicon rod by first processing position change to second processing position with And the second silicon rod for completing pretreatment is changed to the first processing position by pre-processing position；To first on the second processing position Silicon rod carry out second processing operation, in this stage, make to first processing position on the second silicon rod carry out first processing operation with And the 3rd silicon rod to be processed is loaded into pretreatment position and pre-processed.Silicon rod multistation is processed after implementing aforesaid operations The state of machine for details, reference can be made to Figure 21, and Figure 21 shows the silicon rod Multi-position processing machine of the application while three silicon rods are processed The view of operation.

In the present embodiment, the first silicon rod 101 for completing the first processing operation is changed to second by the first processing position It is by making silicon to process position and change the second silicon rod 102 for completing pretreatment to the first processing position by pretreatment position Rod conversion equipment 5 rotates the second predetermined angle and implements what is completed, as it was previously stated, pretreatment position, the first processing position, Yi Ji Two processing positions also in 120 ° of distributions, therefore, make silicon between any two in 120 ° of distributions, three silicon rod detent mechanisms 53 between any two It is actually to make silicon rod conversion equipment 5 rotate forward 120 ° that rod conversion equipment 5, which rotates the second predetermined angle, is initially positioned at first Process the first silicon rod 101 of the first silicon rod detent mechanism 53 on position and its positioning just on conversion to the second processing position and The the second silicon rod detent mechanism 53 and its second silicon rod 102 of positioning being initially positioned on pretreatment position are just changed to the first processing On position.

Carrying out the second processing operation to the first silicon rod 101 on the second processing position is implemented by the second processing unit (plant) 4 's.In the case of the first silicon rod 101 is silicon single crystal rod, the second processing unit (plant) 4 is round as a ball and fine grinding device.By round as a ball and fine grinding Device carries out round as a ball and fine grinding operation to silicon single crystal rod to be generally comprised：Round as a ball processing operation and fine grinding operation.Rolling Circle processing operation further comprises：The first silicon rod 101 as silicon single crystal rod is transferred into silicon rod by the use of silicon rod conversion equipment 5 to add Second processing position of work platform, is positioned to the first silicon rod 101 by the first silicon rod detent mechanism 53 and rotates the first silicon rod 101, make 43 relative second frame 41 of the second grinding tool make traverse feed according to the amount of feeding, rotate the second emery wheel in the second grinding tool 43 44 and drive the second grinding tool 43 move up and down be ground with each connection faceted pebble to the first silicon rod 101 it is round as a ball so that first The connection faceted pebble of silicon rod 101 is ground to default size and overall rounding, i.e. connection faceted pebble and side rounding off.As The state that the silicon single crystal rod of one silicon rod 101 implements above-mentioned round as a ball processing operation for details, reference can be made to Figure 22, and Figure 22 is shown as monocrystalline silicon View of the rod in round as a ball processing operation.

Fine grinding operation further comprises：Positioning adjustment is carried out to the first silicon rod 101 by the first silicon rod detent mechanism 53, So that a pair of second grinding tools 43 that the first offside face in the first silicon rod 101 corresponds in round as a ball and fine grinding device 4, make the second mill 43 relative second frames 41 of tool make traverse feed according to the amount of feeding, rotate the second emery wheel 44 in the second grinding tool 43 and drive the Two grinding tools 43 move up and down to be refined to first pair of side in the first silicon rod 101；By the band of the first silicon rod detent mechanism 53 Dynamic first silicon rod 101 positive (or reverse) rotates 90 ° so that the second offside face in the first silicon rod 101 corresponds to round as a ball and smart A pair of second grinding tools 43 in mill apparatus 4, rotate the second emery wheel 44 in the second grinding tool 43 and drive the second grinding tool to be transported about 43 Move to be refined to second pair of side in the first silicon rod 101.Silicon single crystal rod as the first silicon rod 101 implements above-mentioned fine grinding The state of processing operation for details, reference can be made to Figure 23, and Figure 23 is shown as view of the silicon single crystal rod in fine grinding operation.

In the case of the first silicon rod 101 is polycrystalline silicon rod, the second processing unit (plant) 4 is chamfering and fine grinding device.By chamfering And fine grinding device carries out chamfering and fine grinding operation to polycrystalline silicon rod and can generally comprised：Chamfer machining operation and fine grinding are made Industry.

Chamfer machining operation further comprises：101 turns of the first silicon rod of polycrystalline silicon rod will be used as by the use of silicon rod conversion equipment 5 The second processing position of silicon rod processing platform is delivered to, positioning adjustment is carried out to the first silicon rod 101 by the first silicon rod detent mechanism 53, Such as the first silicon rod 101 is driven to rotate 45 ° so that first pair of corner angle in the first silicon rod 101 correspond to chamfering and fine grinding device In a pair of second grinding tools 43, make relative second frame 41 of the second grinding tool 43 make traverse feed, the mill of rotation second according to the amount of feeding The second emery wheel 44 and the second grinding tool 43 of driving in tool 43 are moved up and down and ground with first pair of corner angle to the first silicon rod 101 Cut so that first pair of corner angle of the first silicon rod 101 form fillet surface through grinding；First is driven by the first silicon rod detent mechanism 53 Silicon rod 101 positive (or reverse) rotates 90 ° so that second pair of corner angle in the first silicon rod 101 correspond to chamfering and fine grinding device A pair of second grinding tools 43 in 4, rotate the second emery wheel 44 in the second grinding tool 43 and drive the second grinding tool 43 to move up and down with right Second pair of corner angle of the first silicon rod 101 are ground so that second pair of corner angle of the first silicon rod 101 form chamfering through grinding Face.The state that polycrystalline silicon rod as the first silicon rod 101 implements above-mentioned chamfer machining operation for details, reference can be made to Figure 24, and Figure 24 is shown For view of the polycrystalline silicon rod in chamfer machining operation.

Fine grinding operation further comprises：By the first silicon rod detent mechanism 53 to the polysilicon as the first silicon rod 101 Rod carries out positioning adjustment, such as drives the first silicon rod 101 to rotate 45 ° so that the first offside face in the first silicon rod 101 corresponds to A pair of second grinding tools 43 in chamfering and fine grinding device, 43 relative second frame 41 of the second grinding tool is made to make laterally to enter according to the amount of feeding Give, rotate the second emery wheel 44 in the second grinding tool 43 and drive the second grinding tool 43 to move up and down with first to the first silicon rod 101 Side is refined；The first silicon rod 101 positive (or reverse) is driven to rotate 90 ° by the first silicon rod detent mechanism 53 so that the A pair of second grinding tools 43 that the second offside face in one silicon rod 101 corresponds in chamfering and fine grinding device 4, rotate the second grinding tool 43 In the second emery wheel 44 and drive the second grinding tool 43 to move up and down and refined with second pair of side to the first silicon rod 101.Make State for the above-mentioned fine grinding operation of polycrystalline silicon rod implementation of the first silicon rod 101 for details, reference can be made to Figure 25, and Figure 25 is shown as more View of the crystalline silicon rod in fine grinding operation.

In steps of 5, by the second silicon rod for completing planar smoothness detection by pre-processing position by pre-processing position conversion The implementation process that the first processing operation is carried out to the first processing position and to the second silicon rod 102 on the first processing position can refer to The description of abovementioned steps 4, and the implementation that the 3rd silicon rod to be processed is loaded into pretreatment position and pre-processed can refer to The description of abovementioned steps 2 and step 3, will not be repeated here.

Step 6, by complete second processing operation the first silicon rod by second processing position change to pretreatment position and The second silicon rod for completing the first processing operation is changed to the second processing position by the first processing position and pretreatment will be completed 3rd silicon rod is changed to the first processing position by pre-processing position；The first silicon rod pre-processed on position is unloaded and incited somebody to action The 4th silicon rod that 4th silicon rod to be processed is loaded into pretreatment position and is pointed at the pretreatment position is pre-processed, In this stage, the second processing operation is carried out to the second silicon rod on the second processing position and to the 3rd on the first processing position Silicon rod carries out the first processing operation.The state of silicon rod Multi-position processing machine for details, reference can be made to Figure 26, Figure 26 after implementation aforesaid operations It is shown as completing the view of the silicon rod discharging of processing operation.

In the present embodiment, the first silicon rod 101 for completing the second processing operation is changed to pre- by the second processing position Reason position and the second silicon rod for completing the first processing operation is changed to the second processing position and will be complete by the first processing position Into pretreatment the 3rd silicon rod by pre-process position change to first processing position be by making silicon rod conversion equipment 5 rotate the 3rd Predetermined angle implements what is completed, as it was previously stated, pretreatment position, the first processing position and the second processing position are between any two In 120 ° of distributions, three silicon rod detent mechanisms 53 also in 120 ° of distributions, therefore, make silicon rod conversion equipment 5 rotate the between any two Three predetermined angles are actually to make 240 ° of 5 backwards rotation of silicon rod conversion equipment or make silicon rod conversion equipment 5 rotate forward 120 ° It can be achieved, the first silicon rod detent mechanism 53 and its first silicon rod 101 of positioning being initially positioned on the second processing position just turn The the second silicon rod detent mechanism 53 and its second silicon rod of positioning shift on pretreatment position, being initially positioned on the first processing position 102 process on position and are initially positioned at the 3rd silicon rod detent mechanism 53 on pretreatment position with regard to conversion to second and its determine 3rd silicon rod 103 of position is just on conversion to the first processing position.

Especially, for the rotary setting of silicon rod conversion equipment 5 on silicon rod processing platform, for by silicon rod in pretreating zone Changed between position, the first processing position and the second processing position, it is necessary to be described in detail.

Figure 27 is referred to, is shown as the state signal that the application silicon rod Multi-position processing machine is processed in operation for three stations Figure.As shown in figure 27, in this embodiment, the pretreatment position on the silicon rod processing platform, first processing position and Second processing position is sequentially set, wherein, pre-process and silicon rod handler is correspondingly provided with position, the first processing position is correspondingly set Have the first processing unit (plant), the second processing position is correspondingly provided with the second processing unit (plant), and, pretreatment position, the first processing position, with And second processing position between any two in 120 ° of distributions, correspondingly, for three on circular or annular conveying body Silicon rod detent mechanism is between any two also in 120 ° of distributions.

It is assumed herein that the trend according to the order of pretreatment position, the first processing position and the second processing position is Forward direction, the trend of the order opposite with the forward direction is reverse.Correspondingly, performing the process of silicon rod multistation processing can substantially wrap Include：Under initial conditions, make silicon rod handler 2 that first silicon rod 101 to be processed is loaded into the pre- place of silicon rod processing platform Position is managed, and the first silicon rod 101 being pointed at the pretreatment position is pre-processed；Make silicon rod conversion equipment 5 is positive to turn Dynamic 120 °, so that the first silicon rod 101 for completing pretreatment is changed to the first processing position by pre-processing position, make the first processing fill Put the first silicon rod 101 on 3 pair of first processing position and carry out the first processing operation, in this stage, make silicon rod handler 2 to treat Second silicon rod 102 of processing is loaded into pretreatment position and pre-processed；Silicon rod conversion equipment 5 is made to rotate forward 120 ° to incite somebody to action The first silicon rod 101 for completing the first processing operation is changed to the second processing position by the first processing position and will complete to pre-process The second silicon rod 102 by pre-process position change to first processing position, make the second processing unit (plant) 4 to second processing position on First silicon rod 101 carries out the second processing operation, in this stage, makes the first processing unit (plant) 3 to the second silicon on the first processing position Rod 102 carries out the first processing operation and makes silicon rod handler 5 that the 3rd silicon rod 103 to be processed is loaded into pretreating zone Position is simultaneously pre-processed；Silicon rod conversion equipment 5 is made to rotate forward 120 ° or 240 ° of backwards rotation so that the second processing operation will be completed The first silicon rod 101 by second processing position change to pretreatment position and will complete first processing operation the second silicon rod 102 are changed to the second processing position by the first processing position and will complete the 3rd silicon rod 103 of pretreatment by pre-processing position Conversion is unloaded the first silicon rod 101 pre-processed on position to the first processing position.

It will not be changed in view of cables such as the power line laid in the silicon rod Multi-position processing machine or signal wires because of silicon rod The excessive rotation of device and drive the excessively winding of those cables in turn result in those cables around disconnected.In a specific embodiment, originally The technical scheme that application provides considers to limit the maximum anglec of rotation of the silicon rod conversion equipment, that is, is making silicon rod change During device is changed the first silicon rod 101 to pretreatment position by the second processing position, following two situations can be included：

The first situation is that the rotation angle range of silicon rod conversion equipment 5 is ± 240 °, in particular to makes silicon rod converting means Put 5 and original position is returned to after 120 ° and 240 ° of backwards rotation once by rotating forward twice, the second processing operation will be completed The first silicon rod 101 by second processing position change to pretreatment position.The beneficial effect that this kind of situation is brought also includes, and can be The internal structure design of whole silicon rod Multi-position processing machine provides more flexible design space, such as, it may be considered that the Two processing districts to set between pretreating zone other components without regard to hinder silicon rod conversion equipment rotation situation.

Second of situation is that the rotation angle range of the silicon rod conversion equipment is ± 360 °, silicon rod conversion equipment 5 is existed The first silicon rod 101 of the second processing operation will be completed after 360 ° by rotating a circle is changed to pretreatment position by the second processing position, Then, the cable that another mistake is wound during being rotated forward to 360 ° of releases that rotate a circle.

In a word, above two rotating manner may achieve essentially identical effect, but the setting of silicon rod conversion equipment still and with This is limited, as long as the silicon rod that can allow to carry out processing operation can be smooth, steady and expeditiously completes every processing operation, then The conversion regime (such as rotation direction and rotational angle etc.) of silicon rod conversion equipment can make other changes.

Certainly, the risk that is excessively wound discounting for above-mentioned cable is set in the second processing district between pretreating zone The problem of putting other components, the silicon rod conversion equipment can also continue using this unidirectional unlimited rotary mode.

Due to perform silicon rod handling, planar smoothness detection, first processing operation, second processing operation it is foregoing It is described, does not will not be repeated here.

Herein, think separately to remark additionally, in other alternative embodiments, if silicon rod Multi-position processing machine is additionally arranged Corresponding processing apparatus for work, then the function position on silicon rod processing platform and the silicon rod detent mechanism on conveying body Quantity and its position relationship are both needed to be adjusted accordingly, and subsequently, silicon rod to be processed is being carried out using silicon rod Multi-position processing machine During multistation is processed, a predetermined angle is rotated using silicon rod conversion equipment to realize that silicon rod is changed in function position Also corresponding adjustment is had.It is assumed that silicon rod Multi-position processing machine is additionally arranged the 3rd processing unit (plant), then, on silicon rod processing platform Also one the 3rd processing position can be set up and silicon rod conversion equipment also can increase a silicon rod detent mechanism on conveying body.

In specific embodiment, the 3rd processing unit (plant) such as silicon rod burnishing device.The silicon rod burnishing device can On support, for being polished processing operation to silicon rod, its specific implementation can refer to foregoing for silicon rod polishing dress The description put.

In a kind of alternative embodiment, pretreatment position on the silicon rod processing platform, the first processing position, second plus Work area position and the 3rd processing position are sequentially set, wherein, pre-process and silicon rod handler is correspondingly provided with position, first adds Work area position is correspondingly provided with the first processing unit (plant), and the second processing position is correspondingly provided with the second processing unit (plant), and the 3rd processing position is corresponding Provided with the 3rd processing unit (plant), and, pretreatment position, the first processing position, the second processing position and the 3rd processing position are two-by-two It is distributed between adjacent in 90 °, correspondingly, for four silicon rod detent mechanisms on circular or annular conveying body two-by-two Also in 90 ° of distributions between adjacent.

Figure 28 is referred to, is shown as the state signal that the application silicon rod Multi-position processing machine is processed in operation for four stations Figure.As shown in figure 28, performing the process of silicon rod multistation processing can generally comprise：Under initial conditions, silicon rod handler is made First silicon rod 101 to be processed is loaded into the pretreatment position of silicon rod processing platform by 2, and is pointed at the pretreatment position The first silicon rod 101 pre-processed；Silicon rod conversion equipment 5 is made to rotate forward 90 ° so that the first silicon rod 101 of pretreatment will be completed Changed by pre-processing position to the first processing position, make the first processing unit (plant) 3 enter the first the first silicon rod 101 processed on position Row first processes operation, in this stage, makes silicon rod handler 2 that second silicon rod 102 to be processed is loaded into pretreatment position And pre-processed；Silicon rod conversion equipment 5 is made to rotate forward 90 ° with the first silicon rod 101 by the first processing operation is completed by the Change to the second processing position and change the second silicon rod 102 for completing pretreatment to the by pre-processing position in one processing position One processing position, the second processing unit (plant) 4 is made to carry out the second processing operation to the first silicon rod 101 on the second processing position, herein In the stage, make the first processing unit (plant) 3 carry out the first processing operation to the second silicon rod 102 on the first processing position and make silicon rod fill 3rd silicon rod 103 to be processed is loaded into pretreatment position and pre-processed by handler 5；Make silicon rod conversion equipment 5 positive Rotate 90 ° with by complete second processing operation the first silicon rod 101 by second processing position change to the 3rd processing position and The second silicon rod 102 for completing the first processing operation is changed to the second processing position by the first processing position and will complete to pre-process The 3rd silicon rod 103 by pre-process position change to first processing position, make the 3rd processing unit (plant) 8 to the 3rd processing position on The first silicon rod 101 carry out the 3rd processing operation, in this stage, make the second processing unit (plant) 4 to second processing position on second Silicon rod 102 carries out the second processing operation and makes the first processing unit (plant) 3 carry out the to the 3rd silicon rod 103 on the first processing position One processes operation and makes silicon rod handler 5 that the 4th silicon rod 104 to be processed is loaded into pretreatment position and pre-processed； Make silicon rod conversion equipment 5 rotate forward 90 ° or 270 ° of backwards rotation with will complete the first silicon rod 101 of the 3rd processing operation by The second silicon rod 102 of the second processing operation is changed to pretreatment position and will completed by the second processing position in 3rd processing position Change to the 3rd processing position, will complete the first processing operation the 3rd silicon rod 103 changed by the first processing position to second plus Work area position and by complete pretreatment the 4th silicon rod 104 by pre-process position change to first processing position, position will be pre-processed On the first silicon rod 101 unloaded.

It will not be changed in view of cables such as the power line laid in the silicon rod Multi-position processing machine or signal wires because of silicon rod The excessive rotation of device and drive the excessively winding of those cables in turn result in those cables around disconnected.In a specific embodiment, originally The technical scheme that application provides considers to limit the maximum anglec of rotation of the silicon rod conversion equipment, that is, is making silicon rod change During device is changed the first silicon rod 101 to pretreatment position by the 3rd processing position, following two situations can be included：

The first situation is that the rotation angle range of silicon rod conversion equipment 5 is ± 270 °, in particular to makes silicon rod converting means Put 5 and original position is returned to after 90 ° and 270 ° of backwards rotation once by rotating forward three times, the 3rd processing operation will be completed The first silicon rod 101 by the 3rd processing position change to pretreatment position.The beneficial effect that this kind of situation is brought also includes, and can be The internal structure design of whole silicon rod Multi-position processing machine provides more flexible design space, such as, it may be considered that the Three processing districts to set between pretreating zone other components without regard to hinder silicon rod conversion equipment rotation situation.

Second of situation is that the rotation angle range of the silicon rod conversion equipment is ± 360 °, silicon rod conversion equipment 5 is existed The first silicon rod 101 of the 3rd processing operation will be completed after 360 ° by rotating a circle is changed to pretreatment position by the 3rd processing position, Then, the cable that another mistake is wound during being rotated forward to 360 ° of releases that rotate a circle.

In a word, above two rotating manner may achieve essentially identical effect, but the setting of silicon rod conversion equipment still and with This is limited, as long as the silicon rod that can allow to carry out processing operation can be smooth, steady and expeditiously completes every processing operation, then The conversion regime (such as rotation direction and rotational angle etc.) of silicon rod conversion equipment can make other changes.

Pass through above-mentioned each step, it can be seen that Each performs its own functions for the processing unit (plant) on each processing stations, each processing dress Between putting in order and seamlessly shifted and automate realize silicon rod processing multiple procedures, formed pipelining, Improve production efficiency and the quality of Product processing operation.

The principle and its effect of above-described embodiment only illustrative the application, not for limitation the application.It is any ripe Know the personage of this technology all can without prejudice to spirit herein and under the scope of, modifications and changes are carried out to above-described embodiment.Cause This, those of ordinary skill in the art is complete without departing from spirit disclosed herein and institute under technological thought such as Into all equivalent modifications or change, should be covered by claims hereof.

Claims (17)

1. A kind of 1. silicon rod Multi-position processing machine, it is characterised in that including：

   Support, there is silicon rod processing platform；

   Silicon rod handler, located at the pretreatment position of the silicon rod processing platform, for silicon rod to be processed to be loaded to institute State silicon rod processing platform pretreatment position and will be processed after silicon rod from the pretreatment position of the silicon rod processing platform Unloading；

   First processing unit (plant), first located at the silicon rod processing platform processes position, adds for carrying out first to the silicon rod Work industry；

   Second processing unit (plant), second located at the silicon rod processing platform processes position, for being filled by the described first processing The the first post-job silicon rod of processing put carries out the second processing operation；And

   Silicon rod conversion equipment, rotary setting on the silicon rod processing platform, for by the silicon rod the pretreatment position, Changed between first processing position and the second processing position.
2. 2. silicon rod Multi-position processing machine according to claim 1, it is characterised in that the silicon rod handler includes：

   Silicon rod loads and unloads position, provided with the silicon rod plummer that placement is erect for carrying the silicon rod；

   Commutate carrier, for making commutation motion；And

   Silicon rod clamper, located at the first mounting surface of the commutation carrier；

   Wherein, by driving the commutation carrier to make commutation motion so that the silicon rod clamper of the commutation carrier is in the silicon rod Changed between handling position and the pretreatment position to transfer the silicon rod.
3. 3. silicon rod Multi-position processing machine according to claim 2, it is characterised in that the silicon rod clamper includes：

   Fixture installed part, on the commutation carrier；And

   At least two silicon rod holders, set along the fixture installed part spacing；Each described silicon rod holder includes：

   Jig arm mounting seat, on the fixture installed part；

   At least two jig arm, it is movably arranged in the jig arm mounting seat；And

   Jig arm drive mechanism, for driving at least two jig arm to make opening and closing movement.
4. 4. silicon rod Multi-position processing machine according to claim 3, it is characterised in that at least two silicon rods holder At least one silicon rod holder be provided with guiding driving mechanism, for driving it along fixture installed part motion, with regulation The spacing of at least two silicon rods holder.
5. 5. silicon rod Multi-position processing machine according to claim 4, it is characterised in that the silicon rod handler also includes： Height testing instrument, on the commutation carrier, for detecting the height of the silicon rod.
6. 6. silicon rod Multi-position processing machine according to claim 2, it is characterised in that also including flatness detector, be located at Second mounting surface of the commutation carrier, for carrying out planar smoothness detection to the silicon rod.
7. 7. silicon rod Multi-position processing machine according to claim 6, it is characterised in that the flatness detector includes：

   Contact measurement structure；

   Detector shift mechanism；And

   Controller is detected, is connected with the contact measurement structure and the detector shift mechanism, for controlling the detection Instrument shift mechanism drives the contact measurement structural shift and the control contact measurement structure sequentially to detect the silicon In rod on tested surface each test point relative distance.
8. 8. silicon rod Multi-position processing machine according to claim 1, it is characterised in that the silicon rod conversion equipment includes：

   The conveying body of disc or annular；

   Silicon rod detent mechanism, on the conveying body, for being positioned to the silicon rod；And

   Drive mechanism is changed, is turned for driving the conveying body to rotate with the silicon rod for driving the silicon rod detent mechanism to be positioned Change place.
9. 9. silicon rod Multi-position processing machine according to claim 8, it is characterised in that the silicon rod detent mechanism includes：

   Plummer is rotated, on the conveying body of the disc or annular, for carrying the silicon rod；

   Rotary compacting device, the top of the rotation plummer is relatively arranged on, for compressing the silicon rod；

   Lifting drive, for driving the rotary compacting device vertically to make elevating movement；And

   Rotating driving device, for driving the rotary compacting device and driving the rotary compacting device to rotate.
10. 10. silicon rod Multi-position processing machine according to claim 1, it is characterised in that first processing unit (plant) includes：

    First frame；And

    At least one pair of first grinding tool, it is arranged oppositely in first frame, for the silicon rod being pointed at the first processing position Silicon rod on conversion equipment carries out the first processing operation.
11. 11. silicon rod Multi-position processing machine according to claim 10, it is characterised in that first grinding tool includes：

    First main shaft；And

    At least one first emery wheel, it is arranged at the operation end of first main shaft；First emery wheel has the first of the first granularity Frosted particle.
12. 12. silicon rod Multi-position processing machine according to claim 1, it is characterised in that second processing unit (plant) includes：

    Second frame；And

    At least one pair of second grinding tool, it is arranged oppositely in second frame, for the silicon rod being pointed at the second processing position Silicon rod on conversion equipment carries out the second processing operation.
13. 13. silicon rod Multi-position processing machine according to claim 12, it is characterised in that second grinding tool includes：

    Second main shaft；And

    At least one second emery wheel, it is arranged at the operation end of second main shaft；Second emery wheel has the second of the second granularity Frosted particle.
14. 14. silicon rod Multi-position processing machine according to claim 1, it is characterised in that also including protective door, for that will locate in advance Reason position is isolated with the described first processing position and the second processing position.
15. 15. silicon rod Multi-position processing machine according to claim 1, it is characterised in that pre- on the silicon rod processing platform Position, the first processing position and the second processing position are handled between any two in 120 ° of distributions, the rotation of the silicon rod conversion equipment Gyration scope is ± 240 °.
16. 16. silicon rod Multi-position processing machine according to claim 1, it is characterised in that also including the 3rd processing unit (plant), be located at 3rd processing position of the silicon rod processing platform；Pretreatment position on the silicon rod processing platform, the first processing position, the In 90 ° of distributions, the rotation angle range of the silicon rod conversion equipment between two processing positions and the 3rd processing district are adjacent two-by-two For ± 270 °.
17. 17. according to the silicon rod Multi-position processing machine described in claim 1,15 or 16, it is characterised in that：

    The rotation angle range of the silicon rod conversion equipment is ± 360 °；Or

    The silicon rod conversion equipment uses unidirectional unlimited rotary mode.