CN206967274U

CN206967274U - Silicon rod handler and silicon rod Multi-position processing machine

Info

Publication number: CN206967274U
Application number: CN201720562612.9U
Authority: CN
Inventors: 卢建伟; 李鑫
Original assignee: Shanghai Nissin Machine Tool Co Ltd
Current assignee: TIANTONG RIJIN PRECISION TECHNOLOGY Co.,Ltd.
Priority date: 2017-05-19
Filing date: 2017-05-19
Publication date: 2018-02-06
Anticipated expiration: 2027-05-19

Abstract

A kind of silicon rod handler of disclosure and silicon rod Multi-position processing machine, wherein, silicon rod handler includes：Silicon rod loads and unloads position, provided with the silicon rod plummer that placement is erect for carrying silicon rod；Commutate carrier, for making commutation motion；Silicon rod clamper, located at the first mounting surface of the commutation carrier；Wherein, by driving the commutation carrier to make commutation motion so that the silicon rod clamper of the commutation carrier loads and unloads between position and silicon rod function position conversion to transfer the silicon rod in the silicon rod, and it is quick, convenient and stably transport that silicon rod can be achieved.

Description

Silicon rod handler and silicon rod Multi-position processing machine

Technical field

The application is related to silicon work pieces process technical field, is processed more particularly to silicon rod handler and silicon rod multistation Machine.

Background technology

At present, as the attention and opening that society utilizes to green regenerative energy sources, photovoltaic solar power field are more next More paid attention to and developed.In field of photovoltaic power generation, common crystal silicon solar energy battery be on high quality silicon chip made of, This silicon chip is formed after the silicon ingot for lifting or casting by multi-thread saw cut and following process.

The Making programme of existing silicon chip, by taking single crystal silicon product as an example, usually, flow chart substantially may include：First make Long silicon rod originally is carried out blocking operation to form the short silicon rod of multistage with silicon rod shear；After the completion of blocking, silicon rod is used again Excavation machine forms silicon single crystal rod after carrying out evolution operation to the short silicon rod after blocking；Chamfering, rolling are carried out to each silicon single crystal rod again The processing operation such as mill so that the surface shaping of silicon single crystal rod reaches corresponding flatness and size tolerance requirements；Subsequently reuse Slicer carries out section operation to silicon single crystal rod, then obtains monocrystalline silicon piece.And by taking polysilicon product as an example, usually, substantially Flow chart may include：Evolution processing is first carried out to first grade silicon ingot (large scale silicon ingot) using silicon ingot excavation machine to form secondary silicon Ingot (small size silicon ingot)；After evolution, reuse silicon ingot shear and secondary grade silicon ingot is carried out blocking processing to form polysilicon Rod；The processing operation such as chamfering, barreling is carried out to each polycrystalline silicon rod again so that the surface shaping of polycrystalline silicon rod reaches corresponding flat Whole degree and size tolerance requirements；Subsequently reuse slicer carries out section operation to polycrystalline silicon rod, then obtains polysilicon chip.

But, generally, in the related art, the operation needed for each procedures is independent arrangement, and operation is set Back-up is dispersed in the different producing regions of different production units or workshop or workshop, performs the work of different procedures The conversion of part needs to carry out carrying allotment, and so, process is numerous and diverse, and efficiency is low, needs more manpowers or transloading equipment, safe hidden Suffer from greatly, in addition, the flowing link between the implement of each process is more, workpiece damage is improved during workpiece transfer Risk, is also easy to produce unqualified caused by nonproductive factors, reduces caused by qualification rate and the existing processing mode of product Unreasonable loss, it is the major improvement problem that each company faces.

Utility model content

In view of disadvantages of existing correlation technique above, the purpose of the application be to disclose a kind of silicon rod handler and Silicon rod Multi-position processing machine, for solving the problems such as existing workpiece transport efficacy present in existing correlation technique is low.

To achieve the above object and other purposes, a kind of silicon rod handler of disclosure, including：Silicon rod loading place Position, provided with the silicon rod plummer that placement is erect for carrying silicon rod；Commutate carrier, for making commutation motion；Silicon rod clamper, it is located at First mounting surface of the commutation carrier；Wherein, by driving the commutation carrier to make commutation motion so that the commutation carrier Silicon rod clamper load and unload between position and silicon rod function position conversion in the silicon rod to transfer the silicon rod.

Silicon rod handler disclosed in the present application, there is provided there is commutation carrier, and silicon rod clamper is set on commutation carrier, profit Silicon rod is clamped with silicon rod clamper, making commutation motion by the carrier that commutates may be such that silicon rod clamper is turned between different positions Change, so that the silicon rod that silicon rod clamper clamps be transferred in different positions, in this way, can realize that silicon rod is quick, convenient and stably Transhipment.

In some embodiments, the silicon rod clamper includes：Fixture installed part, on the commutation carrier；At least Two silicon rod holders, set along the fixture installed part spacing.

In some embodiments, the silicon rod holder includes：Jig arm mounting seat, on the fixture installed part； At least two jig arm, it is movably arranged in the jig arm mounting seat；Jig arm drive mechanism, for driving at least two jig arm to make Opening and closing movement.

In some embodiments, the jig arm drive mechanism includes：Folding gear, in the jig arm；Gear drives Moving part, there is the groove engaged with the folding gear in the jig arm；Driving source, the gear drive is connected to, for driving The dynamic gear drive motion.

In some embodiments, the gear drive is rack, and the opposite sides of the rack is respectively equipped with and institute State the first groove of the folding gear engagement at least two first jig arm；The driving source is for driving the rack to move Cylinder or motor.

In some embodiments, at least one silicon rod holder at least two silicon rods holder, which is provided with, is oriented to Drive mechanism, for driving it along the fixture installed part motion, to adjust at least two silicon rod holder Spacing.

In some embodiments, the silicon rod handler also includes height testing instrument, on the commutation carrier, For detecting the height of the silicon rod.

In some embodiments, the silicon rod handler also includes flatness detector, located at the commutation carrier The second mounting surface, for the silicon rod carry out planar smoothness detection.

In some embodiments, the flatness detector includes：Contact measurement structure；Detector shift mechanism； Controller is detected, is connected with the contact measurement structure and the detector shift mechanism, for controlling the detector to move Position mechanism drives the contact measurement structural shift and the control contact measurement structure sequentially to detect in the silicon rod The relative distance of each test point on tested surface.

The application separately discloses a kind of silicon rod Multi-position processing machine, including foregoing silicon rod handler.

Brief description of the drawings

Fig. 1 is shown as stereochemical structure signal of the silicon rod Multi-position processing machine under a certain visual angle in the application embodiment Figure.

Fig. 2 is shown as the top view of silicon rod Multi-position processing machine in the application embodiment.

Fig. 3 is shown as the side view of silicon rod Multi-position processing machine in the application embodiment.

Fig. 4 is shown as the structural representation of silicon rod holder in one embodiment in the application silicon rod Multi-position processing machine Figure.

Fig. 5 is shown as structural representation of the silicon rod holder in another embodiment in the application silicon rod Multi-position processing machine Figure.

Fig. 6 is shown as the rearview of silicon rod clamper in the application silicon rod Multi-position processing machine.

Fig. 7 is shown as silicon rod and is straightened the view being positioned on silicon rod plummer.

Fig. 8 is shown as the view that silicon rod is clamped by silicon rod clamper.

Fig. 9 is shown as the view that silicon rod is positioned over pretreatment position by commutation carrier.

Figure 10 is shown as the view of height testing instrument detection silicon rod height on handling plummer.

Figure 11 and Figure 12 is shown as the view of flatness detector detection silicon rod planar smoothness.

Figure 13 is shown as carrying out silicon single crystal rod the schematic diagram of correction operation.

Figure 14 is shown as carrying out polycrystalline silicon rod the schematic diagram of correction operation.

Figure 15 is shown as the view for the first processing operation being carried out to the first silicon rod and the second silicon rod is loaded.

Figure 16 shows the silicon rod Multi-position processing machine of the application while three silicon rods is processed with the state signal of operation Figure.

Figure 17 is shown as completing the view of the silicon rod discharging of processing operation.

Embodiment

Illustrate presently filed embodiment below by way of specific instantiation, those skilled in the art can be by this specification Disclosed content understands other advantages and effect of the application easily.The application can also pass through specific realities different in addition The mode of applying is embodied or practiced, the various details in this specification can also be based on different viewpoints with application, without departing from Various modifications or alterations are carried out under spirit herein.

It should be noted that structure, ratio, size depicted in this specification institute accompanying drawings etc., only coordinating Content disclosed in bright book, so that those skilled in the art understands and reads, it is not limited to the enforceable limit of the application Fixed condition, therefore do not have technical essential meaning, the modification of any structure, the change of proportionate relationship or the adjustment of size, not Influence under the effect of the application can be generated and the purpose that can reach, all should still fall and be obtained in techniques disclosed in this application content In the range of covering.It is meanwhile cited such as " on ", " under ", "left", "right", " centre " and " one " etc. in this specification Term, understanding for narration is merely convenient to, and is not used to limit the enforceable scope of the application, the change of its relativeness or tune It is whole, in the case where changing technology contents without essence, when being also considered as the enforceable category of the application.

Fig. 1 to Fig. 3 is referred to, is shown as the structural representation of the application silicon rod Multi-position processing machine in one embodiment Figure, wherein, Fig. 1 be the application embodiment in dimensional structure diagram of the silicon rod Multi-position processing machine under a certain visual angle, Fig. 2 For the top view of silicon rod Multi-position processing machine in the application embodiment, Fig. 3 is that silicon rod multistation adds in the application embodiment The side view of work machine.In one embodiment, the application silicon rod Multi-position processing machine is to be used to be processed operation to silicon rod, Here, the silicon rod is class rectangle silicon rod, and it can be silicon single crystal rod or polycrystalline silicon rod, should belong to the guarantor of the application Protect scope.

By taking silicon single crystal rod as an example, the formation process of silicon single crystal rod may include：First using silicon rod shear to long silicon originally Rod carries out blocking operation to form the short silicon rod of multistage；After the completion of blocking, and the short silicon rod after blocking is entered using squaring silicon bar machine Row evolution operation Formation cross-section is in the silicon single crystal rod of class rectangle.Wherein, long silicon rod originally is cut using silicon rod shear Disconnected operation with formed the specific implementation of the short silicon rod of multistage refer to for example, CN105856445A, CN105946127A, with And the patent publication us such as CN105196433A, shape after evolution operation is carried out to the short silicon rod after blocking using squaring silicon bar machine Into section the patent publication us such as CN105818285A are then referred in the embodiment of the silicon single crystal rod of class rectangle.It is but single The formation process of crystalline silicon rod simultaneously loses and is limited to aforementioned techniques, and in optional example, the formation process of silicon single crystal rod may also include：First Long silicon single crystal rod of the evolution operation with Formation cross-section in class rectangle is carried out to long silicon rod originally using total silicon rod excavation machine；Evolution After the completion of, and the long silicon single crystal rod after evolution is carried out blocking operation using silicon rod shear and forms short crystalline silicon rod.Wherein, it is above-mentioned It is middle using total silicon rod excavation machine to originally long silicon rod carry out evolution operation with formed be in class rectangle long silicon single crystal rod it is specific Implementation refers to the patent publication us such as example, CN106003443A.

And by taking polycrystalline silicon rod as an example, the formation process of polycrystalline silicon rod may include：First using silicon ingot excavation machine to first grade silicon ingot Or silicon cube (large scale silicon ingot) carries out evolution processing to form time grade silicon ingot (small size silicon ingot)；After evolution, reuse Silicon ingot shear carries out blocking processing to form polycrystalline silicon rod to secondary grade silicon ingot.Wherein, using silicon ingot excavation machine to first grade silicon ingot (large scale silicon ingot) carries out evolution processing and referred to form the specific implementation of time grade silicon ingot (small size silicon ingot) The patent publication us such as CN102172997A, CN105216128A, CN105690582A, using silicon ingot shear to secondary grade silicon ingot Block processing and refer to the patents such as example, CN105196434A to form the specific implementation of polycrystalline silicon rod and disclose text Offer.

Either silicon single crystal rod also or polycrystalline silicon rod, must all carry out corresponding following process operation, these it is follow-up plus Work industry may be, for example, grinding, chamfering, barreling or round as a ball etc., and these following process operations can pass through silicon described herein Rod Multi-position processing machine is implemented.

With reference to Fig. 1 to Fig. 3, the application silicon rod Multi-position processing machine includes：Support 1, silicon rod handler 2, first are processed Device 3, the second processing unit (plant) 4 and silicon rod conversion equipment 5.

The application silicon rod Multi-position processing machine is described in detail below.

Main element of the support 1 as the application silicon rod Multi-position processing machine, there is silicon rod processing platform, wherein, it is described Silicon rod processing platform can process the specific job content of operation according to silicon rod and be divided into multiple function positions.Specifically, at this In embodiment, the silicon rod processing platform comprises at least pretreatment position, the first processing position and the second processing position.

Silicon rod conversion equipment 5 is located at the centered region of the silicon rod processing platform, for will be loaded by silicon rod handler 2 Pretreatment position of the silicon rod 100 to come up on the silicon rod processing platform, the first processing position and the second processing position it Between change.In one embodiment, the rotary setting of silicon rod conversion equipment 5 is on the silicon rod processing platform, silicon rod conversion equipment 5 Including：The conveying body 51 of disc or annular；Silicon rod detent mechanism 53 is on conveying body 51, for being carried out to silicon rod Positioning；Conversion drive mechanism is used to drive conveying body 51 to rotate the silicon rod translation bit to drive silicon rod detent mechanism 53 to be positioned Put.

As it was previously stated, silicon rod processing platform in one embodiment include pretreatment position, first processing position, with And the second processing position, to be adapted with these function positions, conveying the quantity of the silicon rod detent mechanism 53 on body 51 can set Three are set to, each silicon rod detent mechanism 53 can position a silicon rod.Further, 53 liang of these three silicon rod detent mechanisms Set angle is also that the angular distribution with three function positions between any two is consistent between two.In this way, work as some silicon When rod detent mechanism 53 corresponds to some function position, inevitably, other two silicon rod detent mechanisms 53 and respectively with its His two function positions are corresponding.So, in continuous productive process, any instant, when fixed on each silicon rod detent mechanism 53 There is a silicon rod position and when silicon rod detent mechanism 53 is corresponding with function position, then these silicon rods be located in corresponding to a certain work( Corresponding processing operation can be performed at position, such as：Silicon rod positioned at pretreatment position can carry out pre-treatment job, positioned at the The silicon rod of one processing position can carry out the first processing operation, and the silicon rod positioned at the second processing position can carry out the second processing operation. In a kind of alternative embodiment, pretreatment position, the first processing position and the second processing district on the silicon rod processing platform Position is between any two three silicon rods on the conveying body 51 of disc or annular correspondingly therefore in 120 ° of distributions Detent mechanism 53 is between any two also in 120 ° of distributions.Certainly, the quantity of silicon rod detent mechanism 53 can be become according to the actual requirements Change and not so limited, for example, the function position that the quantity of silicon rod detent mechanism 53 can be set according to silicon rod processing platform Depending on quantity.

In one embodiment, silicon rod detent mechanism 53 more may include：Rotate plummer 531, rotation jack unit 533, Lifting drive (not indicated in figure) and rotating driving device (not indicated in figure).

Rotation plummer 531 is used to carry silicon rod 100 and silicon rod 100 is placed to erect, i.e. the bottom of silicon rod 100 Be seated on rotation plummer 531, especially, rotation plummer 531 can also be designed as can spinning motion, such as rotate plummer 531 have rotating shaft to realize spinning motion relative to conveying body 51, in this way, working as the rotation support of plummer 531 silicon rod 100 Afterwards, rotating plummer 531 and silicon rod 100 thereon can together rotate.Further, rotate plummer 531 in be used for The contact surface of silicon rod contact has damping, and the certain frictional force of silicon rod can be driven to provide.Rotate plummer 531 and silicon rod 100 Adaptation, in an alternative embodiment, rotation plummer 531 can be the circular carrying being adapted with the sectional dimension of silicon rod 100 Platform.

Rotation jack unit 533 is relatively arranged on the top of rotation plummer 531, for top pressure in the top of silicon rod 100 To compress silicon rod 100.Rotation jack unit 533 can further comprise the bearing 532 of activity setting and be arranged at the bottom of bearing 532 The top pressure movable block 534 in portion.Bearing 532 is movably set on a central mounting bracket 13, and the central mounting bracket 13 is positioned at defeated Send the middle section of body 51 and followed by conveying body 51 and rotate together.In specific implementation, central mounting bracket 13 can be at least Including the six roots of sensation mounting post 131 being vertically arranged, it is divided into three groups in a manner of every group two, wherein, two mounting posts in every group 131, which are used for activity, sets a bearing 532, each bearing 532 by a lifting drive drive and along mounting post 131 and Make elevating movement.In an alternative embodiment, mounting post 131 is the relatively smooth cylindrical structure in surface, if necessary, can installed The surface of post 131 coats lubricating oil, in favor of the smoothness of the elevating movement of bearing 532.Extraly, can be arranged with mounting post 131 Protective sleeve, to be protected mounting post 131, dust, debris etc. is avoided to pollute.Top pressure movable block 534 is suitable with silicon rod 100 Match somebody with somebody, in an alternative embodiment, top pressure movable block 534 can be the patty briquetting being adapted with the sectional dimension of silicon rod 100. Further, rotate top pressure movable block 534 axle in jack unit 533 turn to be connected to bearing 532 and can relative seat 532 and It can rotate.

Understand in the preamble, rotation plummer 531 is designed to spinning motion and rotates the top pressure work in jack unit 533 The axle of motion block 534 turns to be connected to bearing 532, therefore, rotates plummer 531 or the linkage of top pressure movable block 534 and is driven in a rotation Dynamic device.In one case, when rotation plummer 531 is in linkage with a rotating driving device, by the conduct of rotation plummer 531 Active rotation part and top pressure movable block 534 is then used as driven rotation part；In another scenario, when top pressure movable block 534 When being in linkage with a rotating driving device, rotated by top pressure movable block 534 as active rotation part plummer 531 be then used as from Turn dynamic component.

In actual applications, rotation jack unit 533 can cooperate with the rotation plummer 531 under it, specifically, when By silicon rod 100 is vertical be positioned on rotation plummer 531 after, bearing 532 is driven along mounting post 131 by lifting drive Make descending motion until the top pressure movable block 534 on bearing 532 presses on the top of silicon rod 100.Subsequently, needing to rotate silicon rod When 100, drive the rotation plummer 531 of linkage or top pressure movable block 534 to rotate by rotating driving device, carried using rotation Platform 531, silicon rod 100 and the mutual frictional force of top pressure movable block 534, take advantage of a situation and drive silicon rod 100 also to rotate in the lump, real The adjustment of the scope of operation or operating area in existing silicon rod 100, so as to the scope of operation after being adjusted in silicon rod 100 or operating area It is processed operation.The velocity of rotation and rotational angle of silicon rod 100 can be controlled by rotating driving device.In specific implementation side In formula, lifting drive may be, for example, cylinder or lifting motor, and rotating driving device may be, for example, then electric rotating machine.

The conveying body 51 of disc or annular is controllable by changing the driving of drive mechanism and rotating, and passes through disc Or the conveying body 51 of annular rotation and realize conveying body 51 on silicon rod detent mechanism 53 and by silicon rod detent mechanism 53 silicon rods 100 positioned are changed between different function positions.In one embodiment, the conversion drive mechanism Further comprise：Conversion tooth band, located at disc or the week side of boss of the conveying body 51 of annular；Motor and connection driving electricity Machine and motor-driven linkage structure driven, on the silicon rod processing platform of support 1, the linkage structure include with it is described The rotate gear that conversion tooth band is meshed.In this way, the rotate gear drives disc or circle under motor driving The conveying body 51 of annular is rotated to drive silicon rod detent mechanism 53 and silicon rod 100 thereon to change to the completion of other function positions Conveying, the motor can be servomotor.

Silicon rod handler 2 is located at the pretreatment position of the silicon rod processing platform, for silicon rod to be processed to be loaded To the pretreatment position of silicon rod processing platform and will be processed after silicon rod unloaded from the pretreatment position of silicon rod processing platform. Further, silicon rod handler 2 be used to load silicon rod to be processed to the pretreatment position of silicon rod processing platform and Silicon rod after will be processed is referred specifically to for silicon rod to be processed to be filled from the unloading of the pretreatment position of silicon rod processing platform Be loaded onto conveying body 51 in it is corresponding with the pretreatment position of silicon rod processing platform rotation plummer 531 on and will be processed Silicon rod afterwards is unloaded from conveying body 51 on rotation plummer 531 corresponding with the pretreatment position of silicon rod processing platform Carry.

In one embodiment, silicon rod handler 2 further includes：Silicon rod loads and unloads position, and commutate carrier 23, and silicon rod folder Tool 25.

Silicon rod handling position, which is provided with, to be used to carry the silicon rod plummer 21 that silicon rod 100 is vertically placed；Commutation carrier 23 is used for Make commutation motion；First mounting surface of the silicon rod clamper 25 located at commutation carrier 23.By driving commutation carrier 23 to make commutation motion, Changed so that the silicon rod clamper 25 of commutation carrier 23 loads and unloads in the silicon rod between position and the pretreatment position to transfer silicon Rod 100.

Silicon rod handler is arranged on a bottom installation structure, and the bottom installation structure is convexly equipped in support 1.Pacify bottom As silicon rod handling position, silicon rod plummer 21, silicon rod plummer 21 then are provided with silicon rod handling position for the side of assembling structure For carrying silicon rod 100.In a preferred embodiment, for ease of the clamping of silicon rod clamper 25, if carrying can be caused Silicon rod 100 can adjustment position be to adapt to silicon rod clamper 25 in good time, and therefore, silicon rod plummer 21 is swiveling design, and silicon rod is held Microscope carrier 21 is provided with rotary shaft and motor, and silicon rod plummer 21 is rotated to adjust under the control of motor around rotary shaft The angle of silicon rod 100 on whole silicon rod plummer 21.In addition, in an alternative embodiment, silicon rod plummer 21 can more be adopted Designed with lift, i.e. can make expanding-contracting action after the rotary shaft of the lower section of silicon rod plummer 21 is controlled to drive silicon rod plummer 21 make elevating movement, so as to adjust the height of the silicon rod on silicon rod plummer 21.

Commutation carrier 23 is arranged on bottom installation structure and can the work commutation motion of opposing floor portion mounting structure.Implement one In mode, commutation carrier 23 is to realize commutation motion by a changement.So that commutation carrier 23 realizes commutation motion Changement may include rotary shaft and reversing motor, commutation carrier 23 is tied by bottom installation of the rotary shaft axis connection in it under Structure.When implementing divertical motion, then start reversing motor, driving rotary shaft is rotated to drive commutation carrier 23 to rotate to realize Commutation motion.Foregoing driving rotary shaft rotation may be designed as one-directional rotation and be also designed to Double-directional rotary, and the one-directional rotation can For example, rotate clockwise or rotate counterclockwise, the Double-directional rotary may be, for example, then to rotate clockwise and rotate counterclockwise.Separately Outside, the angle for driving rotary shaft to rotate can be set according to actual configuration of silicon rod handler etc., wherein, the silicon rod handling dress The actual configuration put may be, for example, that the angle for driving rotary shaft to rotate can load and unload between position and pretreatment position according to silicon rod Structure of position relationship or the carrier 23 that commutates etc..The middle position of commutation base 231 and rotation axis connection in commutation carrier 23, Usually, the shape of commutation base 231 can use the structure of disk, but be not limited thereto, and it can also use square plate or ellipse Disk.

In addition, in the case of necessity, due to Design of Mechanical Structure, silicon rod handling position and pretreatment position it Between position relationship can not meet to commutate carrier 23 can be lucky by commutating the silicon rod clamper 25 moved on commutation carrier 23 Corresponding to silicon rod loading place and pretreatment position, now, silicon rod handler may also include translation mechanism, for driving commutation to carry Have 23 opposing floor portion mounting structures to make towards/away from the translational motion for pre-processing position.In one embodiment, silicon rod handling dress Put and be separately provided with a conversion chassis 241 between commutation carrier 23 and bottom installation structure, wherein, commutation carrier 23 passes through rotation Axle axis connection is set up on bottom installation structure in conversion chassis 241, conversion chassis 241 by translation mechanism.

In a kind of achievable mode, the translation mechanism further comprises：Rack rails is translated, is laid in along translation direction On bottom installation structure；Rotate gear is translated, is arranged on conversion chassis 241 and is meshed with translation rack rails；Driven in translation electricity Machine (is not illustrated), for driving shiftable gear to be rotated such that conversion chassis 241 and commutation carrier 23 thereon along flat Rack rails is moved to be retreated relative to bottom installation structure.

In actual applications, translation rack rails may be, for example, at least one rack with certain length, this at least one tooth Bar is mountable on bottom installation structure.To change chassis 241 and commutation carrier 23 thereon more smoothly along translation Direction is moved, and can configure at least two shiftable gears for each rack, at least two shiftable gears are arranged at intervals.Translate tooth Wheel can be connected by power transmission shaft and pan drive motor.Pan drive motor may be, for example, servomotor.

In actual applications, as it was previously stated, the translation mechanism includes translation rack rails, shiftable gear and driven in translation electricity Machine, shiftable gear is driven to be rotated such that conversion chassis 241 and commutation carrier 23 thereon along flat by pan drive motor Rack rails movement is moved, realizes the purpose precisely moved.Above-mentioned translation mechanism is only one to illustrate, but is not intended to limit this Shen Please, ground is changed, in other alternative embodiments, the translation mechanism may include：Leading screw and servomotor, leading screw have high-precision Degree, invertibity and efficient feature, in this way, by the cooperation of servomotor and leading screw, improve conversion chassis 241 and thereon Commutate the horizontal precision advanced in a transverse direction of carrier 23, i.e. so that conversion chassis 241 and commutation carrier 23 thereon exist The distance for being translated towards horizontal traveling is more accurate.

Further, in the present embodiment, for cause change chassis 241 and thereon the opposing floor portion of commutation carrier 23 installation Structure moves along translation direction can be more steady and more smooth, and the translation mechanism may also include translating rails and translation slide, Wherein, translating rails are laid in the bottom on conversion chassis 241 along translation direction, and translation slide is installed on bottom installation structure, By the cooperation of translating rails and translation slide, auxiliary conversion chassis 241 and commutation carrier 23 thereon move along translation direction It is dynamic.In actual applications, shiftable gear is driven to be rotated such that conversion chassis 241 and commutation thereon by pan drive motor Carrier 23 moves along translation rack rails, meanwhile, translating rails and translation slide, translating rails as auxiliary equipment are slided in translation Slid in seat, so as to realize that conversion chassis 241 and commutation carrier 23 thereon are moved along translation direction.Ground is changed, at it In his embodiment, the translation mechanism may also include translating rails and translator slider, wherein, translating rails are laid along translation direction In on bottom installation structure, translation slide is installed on the bottom on conversion chassis 241, passes through the cooperation of translating rails and translator slider It may be such that translator slider slides along translating rails, so as to aid in changing chassis 241 and commutation carrier 23 thereon along translation Move in direction.

Silicon rod clamper 25 is used to clamp silicon rod.In one embodiment, silicon rod clamper 25 includes：The He of fixture installed part 251 At least two silicon rod holders 253.Fixture installed part 251 is on commutation carrier 23.At least two silicon rod holders 253 are edges The setting of the spacing of fixture installed part 251.In one embodiment, the Workpiece carrier platform at foregoing silicon rod handling position can carry silicon Rod, which is erect, to be placed, and therefore, at least two silicon rod holders 253 are arranged at intervals to be vertical, i.e. at least two silicon rod holders 253 To be setting up and down.

In specific implementation, each silicon rod holder 253 further includes：Jig arm mounting seat 252 and at least two is pressed from both sides Arm 254, wherein, jig arm mounting seat 252 is provided on fixture installed part 251, and at least two jig arm 254 are to be movably arranged at jig arm peace Fill on seat 252.In view of as silicon rod to be processed either silicon single crystal rod or polycrystalline silicon rod, the section of silicon rod is polygon Shape, in the related art, the section of silicon rod is in class rectangle more, therefore, in one embodiment, silicon rod holder 253 it is overall and Say that for square workpiece fixture, the jig arm 254 of composition silicon rod holder 253 be two of symmetric design, single jig arm 254 is designed as With single clamped flat face (referring to Fig. 4) or knuckle clamping face (referring to Fig. 5), the knuckle clamping face is by continuous two Clamped flat face forms, and has a knuckle between two clamped flat faces.Certainly, may be used also on the clamped flat face in jig arm 254 Additional cushion pad, for avoiding causing the damage to silicon rod surface during silicon rod is clamped, play protection silicon rod Good result.Extraly, the effect for the regulation that centers can more be had concurrently using silicon rod holder 253.

Under general scenario, the jig arm 254 in silicon rod holder 253 is under clamping state, folder that two jig arm 254 are formed The center for holding space is coincided with the center of silicon rod plummer 21.Therefore, with the silicon rod with the jig arm 254 shown in Fig. 5 Exemplified by holder 253, when erectting the silicon rod 100 of placement on using the de-clamping silicon rod plummer 21 of silicon rod holder 253, silicon rod Jig arm 254 in holder 253 is shunk, and silicon rod 100 is resisted against by the knuckle clamping face in jig arm 254, wherein, the knuckle folder Hold two in face clamped flat faces and correspond respectively to two sides adjacent in silicon rod 100.Simultaneously clamping silicon is shunk in jig arm 254 During rod 100, silicon rod 100 is promoted and moved towards the middle section of grasping part by two jig arm 254 of both sides, directly Clamped to silicon rod 100 by two jig arm 254 in silicon rod holder 253, now, the center of silicon rod 100 can be located at silicon rod The center of the grasping part of holder 253.Especially, to enable at least two jig arm 254 in silicon rod holder 253 suitable Freely and the silicon rod of different type difference dimensions is held fixedly, silicon rod holder 253 also includes jig arm drive mechanism, uses Make opening and closing movement in driving at least two jig arm 254.

Referring to Fig. 6, it is schematically shown as the rearview of silicon rod clamper 25.In specific implementation, as shown in fig. 6, jig arm drives Mechanism further comprises：Folding gear 255, gear drive 256 and driving source 257.

Folding gear 255 is disposed in corresponding jig arm 254.Gear drive 256 has and the folding in jig arm 254 The groove that gear 255 engages.Driving source is connected to gear drive 256, is moved for driving gear drives part 256.In one kind In implementation, gear drive 256 is rack, the rack 256 in the centre of two jig arm 254, rack respectively for In being respectively equipped with two lateral surfaces of the jig arm 254 of both sides corresponding tooth is engaged with the folding gear 255 in two jig arm 254 Line, driving source 257 may be, for example, motor or or cylinder.

So, according to above-mentioned implementation, in actual applications, when 254 clamping of jig arm need to be realized, by as driving source Motor or cylinder driving moved up as the rack 256 of gear drive, opening for both sides engagement is driven by rack 256 Close gear 255 and make outward turning action, folding gear 255 drives jig arm 254 (folding gear 255 and jig arm 254 during revolving outside Can be connected by rotating shaft) make decentralization action to be transferred to clamping state by releasing orientation；Conversely, when that need to realize that jig arm 254 is unclamped, Moved down by motor (or cylinder) driving as driving source as the rack 256 of gear drive, by rack 256 The folding gear 255 of both sides engagement is driven to make pronation, folding gear 255 drives (the folding tooth of jig arm 254 during revolving inside Wheel 255 can be connected with jig arm 254 by rotating shaft) action is raised up to be transferred to releasing orientation by clamping state.Certainly, above are only One embodiment, the working condition of silicon rod holder 253 is not intended to limit, in fact, " upward ", " outward turning " in foregoing, " under Put ", " downward ", " inward turning ", " raising up " and " release " and " clamping " state change can be according to the structure and fortune of jig arm 254 Make mode, jig arm drive mechanism construction and have other changes.

Just as it is known by a person skilled in the art that silicon single crystal rod or polycrystalline silicon rod are directed to, due to long silicon rod originally or just The specification of grade silicon ingot (large scale silicon ingot) is different, and long silicon rod originally is carried out blocking operation or carries out evolution to first grade silicon ingot Operation and operation difference is blocked, certainly will caused between silicon single crystal rod and polycrystalline silicon rod, between silicon single crystal rod individual and polysilicon Size difference between rod individual is totally different, in view of silicon rod clamper 25 is for being pressed from both sides to erectting the silicon rod 100 under laying state Hold, therefore, for silicon rod clamper 25, the influence of aforementioned dimensions difference mainly just shows the length difference opposite sex of silicon rod to silicon Whether the silicon rod holder 253 in rod clamp 25 can correspond to the secret worry for being clamped to silicon rod.Even exempt above-mentioned silicon rod to reduce Holder 253 may can not be clamped to the risk of silicon rod.

In one implementation, silicon rod clamper 25 uses fixed silicon rod holder, i.e. the first of commutation carrier 23 Silicon rod holder 253 as much as possible is fixedly installed on mounting surface in a manner of vertical, and, it is adjacent in these silicon rod holders 253 The spacing of two silicon rod holders 253 is small as much as possible, in this way, can cover all kinds specification length using these silicon rod holders 253 The silicon rod of degree.For example, if the length of silicon rod is longer, clamping is participated in using silicon rod holder 253 more on commutation carrier 23； If the length of silicon rod is shorter, clamping is participated in using silicon rod holder 253 less on commutation carrier 23.

And in other implementations, silicon rod clamper 25 uses movable silicon rod holder, i.e. the of commutation carrier 23 Activity sets silicon rod holder 253 in a manner of vertical on one mounting surface, due to, silicon rod holder 253 is movable design, because This, the quantity of silicon rod holder 253 can be greatly decreased, and generally two or three can meet.In this way, utilize these activities Formula silicon rod holder 253 can cover all kinds scale lengths silicon rod.For example, if the length of silicon rod is longer, silicon rod clamping is moved Part 253, extend the clamping spacing of two silicon rod holders 253；If the length of silicon rod is shorter, silicon rod holder 253 is moved, Shorten the clamping spacing of two silicon rod holders 253.In implementation of the silicon rod clamper 25 using movable silicon rod holder, It is smooth smoothly up and down with adjustment position for ease of movable silicon rod holder, pacify using the fixture in silicon rod clamper 25 The guide effect of boot activity formula silicon rod holder 253 is played in piece installing 251, in a kind of achievable mode, fixture installed part 251 can use guide post structure, and jig arm mounting seat 252 is then using the movable block structure for being socketed on guide post structure.Specifically, make Include erectting setting and two parallel leads for the guide post structure of fixture installed part 251, as jig arm mounting seat Two perforations corresponding with two leads in the guide post structure or two are then provided with the 252 movable block structure Clip.According to perforation, the movable block is sheathed on the lead and can realized and slid along the lead.According to folder Button, the movable block are clipped on the lead and can realized and slid along the lead, wherein, in actual applications, institute An at least half part for the lead can be clipped on by stating clip.

For the silicon rod clamper 25 of movable silicon rod holder 253, different change case is also had.Clamped with two silicon rods Exemplified by part 253, in a kind of alternative embodiment, a silicon rod holder 253 in two silicon rod holders 253 is movable It is then fixed design to design another silicon rod holder 253, in actual applications, is set by the way that movement is movable so That silicon rod holder 253 of meter adjusts the clamping spacing between the silicon rod holder 253 of fixed design.Can from above To know, silicon rod 100 is placed to erect, therefore, no matter the scale lengths of silicon rod, always the bottom of silicon rod 100 can be relatively easy to determine , it is thus preferable to, that silicon rod holder 253 above in two silicon rod holders 253 can be designed as activity Formula, so, it need to only adjust the position of the silicon rod holder 253 of top.It is described to realize the movement of silicon rod holder 253 The silicon rod holder 253 of movable design can be provided with guiding driving mechanism.Movable design can be driven using guiding driving mechanism Silicon rod holder 253 moved up and down along fixture installed part 251.

In one implementation, guiding driving mechanism can for example including：Guiding leading screw 258 and guide motor 259, its In, guiding leading screw 258 is set to erect, and one end of guiding leading screw 258 is connected to jig arm mounting seat 252, guiding leading screw 258 it is another One end is then connected to guide motor 259, and guide motor 259 may be provided at the top of commutation carrier 23, but be not limited thereto, and lead The bottom of commutation carrier 23 is may also be arranged on to motor 259.Guiding leading screw 258 has high accuracy, invertibity and efficient spy Point, in this way, at the position for needing the silicon rod holder 253 above adjustment, guiding leading screw 258 is driven to revolve by guide motor 259 Turn, drive silicon rod holder 253 to be moved up and down along fixture installed part 251 in the rotary course of guiding leading screw 258, such as：It is oriented to Motor 259 drive guiding leading screw 258 rotate forward, then drive top silicon rod holder 253 along fixture installed part 251 to Upper motion is with the silicon rod holder 253 away from lower section；Guide motor 259 drives the counter-rotating of guiding leading screw 258, then drives top Silicon rod holder 253 along fixture installed part 251 move downward with close to lower section silicon rod holder 253.Adjust two silicon Clamping spacing between rod holder 253, so as to effectively be clamped to the silicon rod 100 of different size length.

In another alternative embodiment, two silicon rod holders 253 are movable design, so, in practical application In, mutual clamping spacing can be adjusted by the movement of two silicon rod holders 253 of movable design.Due to silicon rod Holder 253 is movable design, then, at least one silicon rod holder 253 in two silicon rod holders 253, which need to be set, leads To drive mechanism, for driving two silicon rod holders 253 to be moved along fixture installed part 251.

Relative to a kind of this preceding alternative embodiment, in this alternative embodiment, since two silicon rods in silicon rod clamper 25 Holder 253 is movable, then will be existed on some silicon rod holder 253 in two silicon rod holders 253 Guiding driving mechanism is set still to be respectively provided with the situation of guiding driving mechanism on two silicon rod holders 253.Now with two The silicon rod holder 253 of top is provided with exemplified by guiding driving mechanism in silicon rod holder 253, in this case, one, two It is to be flexibly connected between jig arm mounting seat 252 and fixture installed part 251 in individual silicon rod holder 253, i.e. any one silicon rod presss from both sides In gripping member 253 jig arm mounting seat 252 and jig arm 254 thereon along fixture installed part 251 and it is up and down, in addition, setting Guiding driving mechanism includes guiding leading screw 258 and guide motor, wherein, one end of guiding leading screw 258 is connected to the silicon rod of top In jig arm mounting seat 252 in holder 253, the other end of guiding leading screw 258 is then connected to guide motor 259, guide motor 259 may be provided at the top of commutation carrier 23, in this way, at the position for needing the silicon rod holder 253 above adjustment, by being oriented to Motor 259 drives guiding leading screw 258 to rotate, and drives silicon rod holder 253 to be installed along fixture in the rotary course of guiding leading screw 258 Part 251 moves up and down, such as：Guide motor 259 drives guiding leading screw 258 to rotate forward, then drives the silicon rod holder of top 253 move with the silicon rod holder 253 away from lower section upwards along fixture installed part 251；Guide motor 259 drives guiding leading screw 258 counter-rotatings, then the silicon rod holder 253 of top is driven to be moved downward along fixture installed part 251 with close to the silicon of lower section Rod holder 253.The silicon rod holder 253 moves up and down along fixture installed part 251 and then adjusts two silicon rod holders Clamping spacing between 253, so as to effectively be clamped to the silicon rod 100 of different size length.

In fact, in the case of two silicon rod holders 253 are movable design, using guiding driving mechanism not only The clamping spacing between two silicon rod holders 253 be can adjust effectively to be clamped it to the silicon rod 100 of different size length Outside, the purpose of lifting can be also realized to the silicon rod 100 of clamping, after two silicon rod holders 253 effectively clamp silicon rod, is led to Overdrive silicon rod holder 253 motion and lift silicon rod 100.Specifically, still it is provided with and is led with the silicon rod holder 253 of top To exemplified by drive mechanism, first, the silicon rod holder 253 of top is by guiding driving mechanism along fixture installed part about 251 Move and have adjusted the clamping spacing between lower section silicon rod holder 253；Then, using in each silicon rod holder 253 Jig arm drive mechanism drive corresponding two jig arm to make clamping action with smooth and be held fixedly silicon rod；Then, top Silicon rod holder 253 driven by guiding driving mechanism moved upwards along fixture installed part 251 again, now, due to rubbing Power effect is wiped, the silicon rod 100 and the silicon rod holder 253 of lower section clamped moves upwards therewith in the lump, wherein, the silicon clamped Rod 100 upwards motion utilize be top silicon rod holder 253 and silicon rod 100 between frictional force effect, silicon rod holder What 253 upward motions then utilized is the frictional force effect between silicon rod 100 and the silicon rod holder 253 of lower section.The silicon rod of top Holder 253 drives silicon rod 100 under the driving of guiding driving mechanism and the silicon rod holder 253 of lower section to move downward also be phase Same process, will not be repeated here.

It should be noted that in other change case, the silicon rod holder of lower section e.g. in two silicon rod holders 253 Guiding driving mechanism, structure, set-up mode and the driving working method of guiding driving mechanism and foregoing top are set on 253 Silicon rod holder 253 guiding driving mechanism it is similar, such as by lower section silicon rod holder 253 in guiding driving mechanism Moved up and down under driving along fixture installed part 251 and adjust the clamping spacing between top silicon rod holder 253, Yi Jiyou The silicon rod holder 253 of lower section drives silicon rod 100 and the silicon rod holder 253 of top together under the driving of guiding driving mechanism Along modes such as the up and down motions of fixture installed part 251.For example two silicon rod holders 253 are provided with guiding driving mechanism again, Then the set-up mode of guiding driving mechanism and the motion mode of driving working method and two silicon rod holders 253 are from needless to say Speech, will not be repeated here.

Grown being moved up and down for movable silicon rod holder 253 along fixture installed part 251 with adapting to different size In the situation that the silicon rod of degree is clamped, except silicon rod holder 253 is using movable structure design, silicon rod holder 253 It need to set outside guiding driving mechanism etc., certainly will also need to know the scale lengths for the silicon rod for being currently needed for clamping.In view of this, Silicon rod handler in the application may also include height testing instrument 7, be put for detecting the setting that silicon rod plummer 21 is carried The height for the silicon rod put, so as to subsequently moved up as movable silicon rod holder 253 along silicon rod clamper installed part 251 Or move down and the foundation of displacement.

Silicon rod clamper 25 in using silicon rod handler 2 is loaded silicon rod to be processed to silicon by silicon rod handling position The pretreatment position of rod processing platform 11 is for follow-up processing operation, in one embodiment, such as the He of the first processing unit (plant) 3 Second processing unit (plant) 4 carries out the first processing operation and the second processing operation to silicon rod 100 respectively, in following process operation at least Include corresponding silicon rod surface Shape correction.Therefore, before follow-up processing operation is carried out to silicon rod, certainly will need to know The current flatness situation of silicon rod 100.In view of this, the application silicon rod Multi-position processing machine may also include flatness detector, At least it is used to carry out planar smoothness detection to silicon rod 100 to be processed.In one embodiment, flatness detector is located at and changed To the second mounting surface of carrier 23, specifically include：Contact measurement structure, detector shift mechanism and detection controller.

Contact measurement structure in flatness detector is used to implement tested surface by contacting the tested surface of silicon rod Flatness detection.In general, contact measurement structure is examined by contacting the tested surface of silicon rod to implement the flatness of tested surface Survey specifically refers to：Each test point that the tested surface of silicon rod is sequentially contacted by contact measurement structure is corresponding each to detect to obtain The relative distance value of test point, judge the flatness of the tested surface according to these relative distance values.

In the present embodiment, judge that the flatness of the tested surface is then logical according to the relative distance value of each test point Cross the difference in these relative distance values that will be measured between maxima and minima to judge, if the difference is less than marking Quasi- value is fallen into critical field, then shows that the flatness of the tested surface meets specification.In specific implementation, contact measurement Structure 61 more may include：Telescopic contact probe head and on-off switch.

Telescopic contact probe head is used for the tested surface for contacting silicon rod 100.On-off switch is then associated with telescopic contact probe head And be connected with detection controller, for touching the tested surface of silicon rod 100 in telescopic contact probe head one i.e. to detection controller Corresponding make-and-break signal is sent, for detecting the tested surface that controller converses telescopic contact probe head and currently touched accordingly In test point relative to datum mark relative distance.

In a kind of alternative embodiment, the telescopic contact probe head in contact measurement structure more may include：Contact is visited Head, the probe base for setting contact probe, at least partly it is built in probe base and the bullet for shoring contact probe Property support member.Contact probe may be, for example, the club in cylinder, and the top of the club can be made at tipping and sphering Reason or additional salient point, in actual applications, contact probe can be made using the hard alloy of high rigidity, high abrasion Make.Probe base may be, for example, cylinder table, and the cylinder table is hollow structure, be available for accommodating the contact probe in club. After probe base is accommodating contact probe, the top of contact probe protrudes from probe base.In elastic supporting member for supporting optical member It is placed in probe base and for shoring contact probe, and, elastic supporting member for supporting optical member is also associated with on-off switch.Elastic supporting member for supporting optical member top Support contact probe is mainly reflected in the conduction of power, and herein, the conduction of power is at least embodied in two following aspects：First, connect What receipts contact probe was subject to by contact measured face compresses power and pressure conduction is supported by described in on-off switch, so that break-make is opened Close and compress power according to and produce corresponding make-and-break signal.2nd, restorable restoring force is provided to contact probe, received Contact probe is because of contact measured face and relative probe pedestal inside contracts, according to the effect of power and to connecing after elastic supporting member for supporting optical member stress Touch probe provides restorable restoring force so that contact probe according to the restoring force and relative probe pedestal towards outward transport Move to restore.In actual applications, elastic supporting member for supporting optical member can use such as compression spring, and the opposite end of compression spring can divide Dui Yingyu not contact probe and on-off switch.But, the knot of the building block of contact measurement structure and each building block Structure is not limited in aforementioned embodiments,

In other embodiments, contact measurement structure can still make other changes, such as：Contact probe may be, for example, In tetrahedral club, and, probe base also may be, for example, tetrahedral tubulose platform.Elastic supporting member for supporting optical member can also use pliability Shell fragment, the opposite end of pliability shell fragment can correspond respectively to contact probe and on-off switch.On-off switch is opened for high accuracy Close, there is higher sensitivity, even very trickle active force can perceive to obtain.In addition, the alternative embodiment its In his implementation, signal transmission device part or signal circuit are may also include between on-off switch and detection controller, in this way, Make-and-break signal caused by on-off switch can be transmitted by signal transmission device part or signal circuit to detection controller.

Contact measurement structure in the present embodiment in actual applications, when telescopic contact probe head touches silicon rod 100 Tested surface when, just relative probe pedestal inside contracts telescopic contact probe head under the stop of the tested surface of silicon rod 100, elasticity branch Support member receives compressing power and described supporting pressure conduction to on-off switch for contact probe by shoring contact probe, with Power is compressed according to and produce corresponding Continuity signal or cut-off signal for on-off switch, the Continuity signal or cut-off signal Transmit to detection controller by signal transmission device part or signal circuit, detection controller is according to the Continuity signal or disconnected ON signal can converse test point in the tested surface that contact probe is currently touched relative to datum mark it is relative away from From.

Detector shift mechanism in flatness detector is used to drive contact measurement structure 61 to shift.In the present embodiment In, detector shift mechanism may be, for example, three-dimensional displacement mechanism, and in specific implementation, the three-dimensional displacement mechanism may include：The One direction shift mechanism, second direction shift mechanism and third direction shift mechanism, for ease of description, by the first party To X-axis is denoted as, the second direction is denoted as Y-axis, the third direction is denoted as Z axis.Understood with reference to Fig. 1, second Direction Y-axis is consistent with the translation direction of translation mechanism in foregoing silicon rod handler, therefore, in a kind of optional embodiment In, second direction shift mechanism can coincide with foregoing translation mechanism, i.e. second direction shift mechanism is just by foregoing translation Mechanism is held a concurrent post, and the structure and its function mode of the translation mechanism can be found in preceding description, therefore for second direction moving machine Structure repeats no more.

It is described in detail emphatically below for first direction shift mechanism and third direction shift mechanism.

The first direction shift mechanism further includes：Sidesway base 243 and first direction shift unit, pass through first direction Shift unit can provide displacement of the sidesway base 243 in a first direction in (such as X-direction).First direction shift unit enters one Step includes：First direction rack rails, is laid on bottom installation structure in the first direction；First rotate gear, it is arranged at sidesway bottom It is meshed on seat 243 and with first direction rack rails；First motor, for driving the first rotate gear to be rotated such that side Moving base 243, rack rails is retreated along a first direction.Specifically, first direction rack rails may be, for example, at least one with certain length Individual rack, this at least one rack are installed on bottom installation structure.To cause sidesway base 243 more smoothly along first party To movement, at least two first rotate gears are can configure for each rack, at least two first rotate gears are arranged at intervals. First rotate gear can be connected by power transmission shaft and the first motor, the first motor be connected with detecting controller and Examined controller control.First motor may be, for example, servomotor.In actual applications, as it was previously stated, first direction Shift unit includes first direction rack rails, the first rotate gear and the first motor, and the first motor, which receives, carrys out Autonomous test The shift control instruction of controller, and instructed according to the shift control to drive the first rotate gear to be rotated such that sidesway bottom Requirement of the rack rails displacement up to meeting displacement numerical value along a first direction of seat 243, realizes the purpose precisely shifted.The displacement control Displacement numerical value or the parameter related to displacement numerical value are comprised at least in system instruction.

In addition, above-mentioned first direction shift unit is only one to illustrate, but the application is not intended to limit, for example, In one alternative embodiment, first direction shift unit may include：Leading screw and servomotor, leading screw have high accuracy, invertibity and Efficient feature, in this way, by the cooperation of servomotor and leading screw, improve the horizontal line in a first direction of sidesway base 243 The precision entered.In addition, first direction shift unit may also include first direction guide rail and the first sliding block, wherein, first direction Guide rail is laid on bottom installation structure in the first direction, the first sliding block be then arranged at sidesway base 243 and with first party guide Rail is engaged, and by the cooperation of first direction guide rail and the first sliding block, auxiliary sidesway base 243 shifts along a first direction.

In actual applications, the first motor receives shift control instruction (the displacement control for carrying out Autonomous test controller Comprised at least in system instruction displacement numerical value or to the related parameter of displacement numerical value) and drive the according to shift control instruction One rotate gear is rotated such that rack rails shifts sidesway base 243 along a first direction, is at least wrapped in the shift control instruction Include displacement numerical value or to the related parameter of displacement numerical value, meanwhile, as the first direction guide rail and the first sliding block of auxiliary equipment, the Guide rail slides one sliding block along a first direction, so as to realize that sidesway base 243 shifts along a first direction.

Ground is changed, in other embodiments, first direction shift unit may also include first direction guide rail and first and slide Seat, wherein, first direction guide rail is laid in sidesway base 243 in the first direction, and first slide is installed on bottom installation structure, By the cooperation of first direction guide rail and first slide, auxiliary sidesway base 243 shifts along a first direction.It is as it was previously stated, flat Whole degree detector is to be used to carry out surface smoothness detection to silicon rod, and therefore, under general scenario, flatness detector can be with other What process equipment was used cooperatively, this kind of process equipment can be that (such as cutting processing machine, flour milling add simple function process equipment Work machine or polishing machine) can also be multiple function combined-machining equipment, the simple function process equipment may be, for example, Such as cutting processing machine, flour milling processing machine or polishing machine, the combined-machining equipment may be, for example, flour milling polishing one Machine.

Because in one embodiment, second direction shift mechanism is held a concurrent post by foregoing translation mechanism, therefore, is With the cooperation of first direction translation mechanism, in the structure of the translation mechanism, conversion chassis 241 is set up in by translation mechanism Substantially it is exactly to change the sidesway bottom that chassis 241 is set up in first direction shift mechanism by translation mechanism on bottom installation structure On seat, illustrate herein.

The third direction shift mechanism can provide contact measurement structure 61 with respect to commutation carrier 23 and in third direction (such as Z-direction, below, for the displacement on third direction, can also be colloquially called displacement up and down herein) moves up Position.In one embodiment, contact measurement structure 61 is to be arranged at commutation carrier 23 by a detection structural mount 63 On.Detection structural mount 63 can use guide post structure, and contact measurement structure then uses and is socketed on guide post structure Movable block structure.Specifically, the guide post structure as detection structural mount 63 includes erectting setting and parallel two Individual lead, and contact measurement structure 61 is then provided with two perforations corresponding with two leads in the guide post structure Or two clips.

According to perforation, the contact measurement structure is sheathed on the lead and can realized and slided along the lead Move.According to clip, the contact measurement structure is clipped on the lead and can realized and slid along the lead, its In, the clip can be clipped on an at least half part for the lead.Therefore, to realize the edge of contact measurement structure 61 Detection structural mount 63 and shift up and down, third direction shift mechanism can further comprise：Leading screw and lifting motor, its In, leading screw is set to erect, and one end of leading screw is connected to contact measurement structure 61, and the other end of leading screw is then connected to lifting electricity Machine, lifting motor may be provided at the top of commutation carrier 23, but be not limited thereto, and lifting motor may also be arranged on commutation carrier 23 bottom.Leading screw has high accuracy, invertibity and efficient feature, in this way, needing to adjust contact measurement structure 61 Position when, by lifting motor driving leading screw rotation, drive contact measurement structure 61 to be tied along detection in screw mandrel rotary course Structure installed part 63 moves up and down, such as：Motor driving leading screw rotates forward, then drives the contact measurement structure of top 61 move upwards along detection structural mount 63；Motor drives leading screw counter-rotating, then drives contact measurement structure 61 move downward along detection structural mount 63.

In actual applications, lifting motor receive come Autonomous test controller sent comprise at least displacement numerical value or with The shift control instruction of the related parameter of displacement numerical value simultaneously instructs to drive leading screw rotation to be connect to drive according to the shift control Touch detects structure 61 and moved up and down along detection structural mount 63 up to the requirement for meeting to shift numerical value, realizes and precisely shifts Purpose.It should be noted that above-mentioned third direction shift mechanism is only a kind of example using the combination of leading screw and motor, and It is non-to be used to limit the application third direction shift mechanism, change ground, in other embodiments, the third direction shift mechanism Also cingulum shift mechanism can be used, in cingulum shift mechanism, it may include synchronous toothed belt, rotate gear and motor, its In, for synchronous toothed belt on the second mounting surface of commutation carrier 23, contact measurement structure 61 can pass through connector and synchronous gear Band connection, rotate gear are then meshed with synchronous toothed belt, and motor is then used to drive rotate gear to rotate to utilize synchronous gear Band drives contact measurement structure 61 to be moved up and down along detection structural mount 63.

Detection controller is connected with contact measurement structure and detector shift mechanism, for controlling detector shift mechanism Contact measurement structural shift and control contact measurement structure is driven sequentially to detect in silicon rod each test point on tested surface Relative distance.In one embodiment, detector shift mechanism may include first direction shift mechanism, second direction shifting machine Structure and third direction shift mechanism, therefore, detection controller and first direction shift mechanism, second direction shift mechanism, with And third direction shift mechanism, for first direction shift mechanism, second direction shift mechanism and third direction shifting machine Structure sends the instruction of corresponding shift control respectively, is reached with drive control contact measurement structure by three-dimensional displacement predetermined Test position simultaneously can be able to contact the test point in the tested surface of silicon rod 100 in the inspection positions.Contact measurement structure It may include：Telescopic contact probe head and on-off switch, wherein, on-off switch is connected with detection controller, and on-off switch is flexible Formula contact probe head when the tested surface of silicon rod 100 is touched to detection controller send make-and-break signal, detection controller according to The make-and-break signal converses test point in the tested surface that contact probe is currently touched relative to the relative of datum mark Distance.

In actual applications, the datum mark set can according to the architectural characteristic or detection mode of flatness detector and It is fixed, first direction shift mechanism, second direction shift mechanism, Yi Ji in the architectural characteristic such as detector shift mechanism The structure of three direction shift mechanisms.The relative distance for converting to obtain according to the datum mark is with datum mark and utilizes second party Translocation distance of the contact measurement structure along second direction is driven to shift mechanism) related.It is described along second direction Translocation distance is the initial position and contact measurement of contact measurement structure under second direction shift mechanism inactive state Structure touches the contact measurement knot under second direction shift mechanism halted state after the test point in side of silicon rod 100 The distance between contact position of structure.Certainly, easily processing mode is：Datum mark is directly disposed as second direction shifting machine The initial position of contact measurement structure under structure inactive state, in this way, the phase of test point in tested surface relative to datum mark Adjust the distance and drive translocation distance of the contact measurement structure along second direction as using second direction shift mechanism.

It should be noted that in one embodiment, flatness detector is located at the second mounting surface of commutation carrier 23, and preceding The silicon rod clamper stated is then located at the first mounting surface of commutation carrier 23, and herein, the first mounting surface and the second mounting surface can be according to realities Border apparatus structure and set.For example, the first mounting surface and the second mounting surface are two installations in commutation carrier 23 backwards to setting Face, further, the first mounting surface and the second mounting surface can differ 180 °, so that the silicon rod positioned at silicon rod handling position is held Microscope carrier 21 connects being aligned with the rotation plummer 531 in silicon rod conversion equipment 5 positioned at pretreating zone position, so, is carried when by commutation After tool 23 rotates 180 °, changeable the first original mounting surface is that the second mounting surface or the second original mounting surface are changeable For the first mounting surface.But, in actual applications, not being for the setting relation of the first mounting surface or the second mounting surface must be so Overcritical, the first mounting surface and the second mounting surface also can for example differ 90 °, i.e. the silicon rod plummer 21 positioned at silicon rod handling position With in silicon rod conversion equipment 5 be located at pretreating zone position rotation plummer 531 be in 90 ° of phase differences, even, the first mounting surface with Second mounting surface can differ any position in OK range, as long as between the first mounting surface and the second mounting surface or positioned at silicon In the silicon rod plummer 21 and silicon rod conversion equipment 5 of rod handling position between the rotation plummer 531 of pretreating zone position really If guarantor will not produce unnecessary interference.In addition, foregoing mentioned height testing instrument 7, can both be arranged at the first mounting surface On can also be arranged on the second mounting surface, even commutate carrier 23 other parts.

Especially, by the cooperation of flatness detector 7 and silicon rod clamper 25, can also correction operation be carried out to silicon rod 100. Understood in being described above, silicon rod 100 can be clamped using silicon rod clamper 25 and commutation motion is made by the carrier 23 that commutates again On the rotation plummer 531 for the silicon rod detent mechanism 53 that silicon rod 100 is transferred at pretreatment position afterwards.But thus and thus, may be used Following situation can occur：Rotate middle section of the plummer 531 not at silicon rod 100.In which case, by follow-up Silicon rod product after processing operation is likely to not meet specification of workpieces requirement.Therefore, following process work is being carried out to silicon rod Before industry, can also silicon rod 100 carry out correction operation, it is easily operated and be exactly ideally by silicon rod in operation of rectifying a deviation 100 center is corresponding with the center for rotating plummer 531 to be overlapped.

In actual applications, plane is carried out to the silicon rod 100 carried on rotation plummer 531 by flatness detector 7 to put down Whole degree detection, so as to obtain the integral position overview of silicon rod 100；The integral position overview of the silicon rod 100 of acquisition is held with rotation The position of microscope carrier 531 is compared, and then obtains inclined between the center of silicon rod 100 and the center for rotating plummer 531 Poor information；The carrier 23 that commutates rotates 180 ° and makees commutation motion, and corresponding to rotation by the silicon rod clamper 25 on commutation carrier 23 carries Silicon rod 100 on platform 531 simultaneously clamps silicon rod 100；Utilize the first direction shift mechanism in foregoing three-dimensional displacement mechanism and Two direction shift mechanism driving commutation carriers 23 are in a first direction and/or second party moves up, so as to drive silicon rod clamper 25 and the silicon rod 100 that is clamped by silicon rod clamper 25 rotate against plummer 531 and make position adjustment, be finally able to silicon rod 100 Center is corresponding with the center for rotating plummer 531 to be overlapped, and completes the correction operation for silicon rod 100.

First processing unit (plant) 3 adds located at the first processing position of silicon rod processing platform 11 for carrying out first to silicon rod 100 Work industry.Second processing unit (plant) 4 is located at the second processing position of silicon rod processing platform 11, for passing through the first processing unit (plant) 3 The first post-job silicon rod 100 of processing carry out the second processing operation.In the present embodiment, as it was previously stated, being determined by silicon rod Position mechanism 53 can be positioned silicon rod 100 to erect modes of emplacement, and therefore, the first processing unit (plant) 3 is to erectting the silicon rod placed 100 carry out the first processing operation and the second processing unit (plant) 4 carries out what the second processing operation used to erectting the silicon rod 100 placed It is exactly vertical processing mode.

Specifically, also had for the silicon rod of different kenels, the first processing unit (plant) 3 and the second processing unit (plant) 4 Different change combination examples.Such as：If silicon rod 100 is silicon single crystal rod, the first processing unit (plant) 3 can be the circle of contact and corase grind device And the second processing unit (plant) 4 can be round as a ball and fine grinding device；If silicon rod 100 is polycrystalline silicon rod, the first processing unit (plant) 3 can be Roughly grind device and the second processing unit (plant) can be chamfering and fine grinding device.Especially, in one embodiment, in the pretreatment It can also be set up between position and the first processing position and between the second processing position and the pretreatment position anti- Door is protected, for the pretreatment position and the described first processing position and the second processing position to be isolated, so as to play The effect of silicon rod is protected, avoids silicon rod from being contaminated or damage.

Following elder generation is described in detail so that silicon rod 100 is silicon single crystal rod as an example.

In the case of silicon rod 100 is silicon single crystal rod, the first processing unit (plant) 3 is the circle of contact and corase grind device, and the second processing fills It is round as a ball and fine grinding device to put 4.

As the circle of contact and corase grind device 3 of the first processing unit (plant), on support 1 and positioned at the first of silicon rod processing platform Position is processed, for carrying out the circle of contact and corase grind operation to silicon single crystal rod.The circle of contact and corase grind device 3 have first receiving space, use In receive by silicon rod conversion equipment 5 conveying body 51 conveying come silicon single crystal rod.The circle of contact and corase grind device 3 mainly include First frame 31 and at least one pair of first grinding tool 33, at least one pair of first grinding tool 33 are arranged oppositely in the first frame 31, are used for The silicon single crystal rod being pointed on the silicon rod conversion equipment 5 at the first processing position carries out the circle of contact and corase grind operation.Further, Each first grinding tool 33 further includes the first main shaft 32 and the first emery wheel 34, wherein, the peace of the first main shaft 32 and the first frame 31 Dress face is provided with and slides laterally guide mechanism and longitudinal sliding motion guide mechanism, and the guide mechanism that slides laterally can use such as slide rail With the combination of sliding block etc., the longitudinal sliding motion guide mechanism can be used such as the combination of slide rail and sliding block.Using sliding laterally Guide mechanism, the first main shaft 32 or relative first frame 31 of the energy of the first emery wheel 34 can be made to make laterally motion of retreating.Utilize longitudinal direction Guide mechanism is slided, relative first frame 31 of the energy of the first main shaft 32 can be made longitudinally to move up and down.

In a practical application, at least one pair of first grinding tool 33 is arranged on a grinding tool base, the grinding tool base and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the first frame 31, at least one pair of first grinding tool 33 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool base, wherein, the grinding tool base is controlled by a lifting motor and indulged To sliding, each first grinding tool 33 of guide mechanism longitudinal sliding motion in the first frame 31, at least one pair of first grinding tool 33 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool base.First emery wheel 34 is arranged at the operation end of the first main shaft 32, The first frosted particle with the first granularity.Herein, silicon single crystal rod to be processed is the silicon cube that section is substantially in class rectangle, With four sides, formed with the connection faceted pebble in R angles between two neighboring side.Therefore, the circle of contact and corase grind device 3 in one To the first grinding tool 33 to be oppositely arranged, the first receiving space for accommodating silicon single crystal rod is left between the two, when silicon single crystal rod is defeated After delivering between a pair of first emery wheels in the first receiving space, the first emery wheel is relative one in accessible silicon single crystal rod Corresponding processing operation is carried out to side or a pair of connection faceted pebbles.

In actual applications, silicon single crystal rod is transferred into silicon rod processing platform first with silicon rod conversion equipment 5 first adds Work area position, positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that a pair of connecting edges in silicon single crystal rod face Circle of contact processing operation should be carried out by connection faceted pebble of first grinding tool 33 to silicon single crystal rod in a pair of first grinding tools 33.The circle of contact Process operation can for example including：Positioning adjustment is carried out to silicon single crystal rod with silicon rod detent mechanism 53 to be engaged, according to the amount of feeding, rotation Turn the first emery wheel 34 in the first grinding tool 33 and drive the first grinding tool 33 to move up and down to implement to grind, to first pair of connecting edge Face and its adjacent domain repeatedly slightly cut and second pair of connection faceted pebble and its adjacent domain repeatedly slightly cut so that each Connection between individual connection faceted pebble and adjacent side forms preliminary arc and connected.

Positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 again so that a pair of sides in silicon single crystal rod are corresponding In a pair of first grinding tools 33, corase grind processing operation is carried out to the side of silicon single crystal rod by the first grinding tool 33.The corase grind operation can For example,：Positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that the first offside face of silicon single crystal rod corresponds to A pair of first grinding tools 33, corase grind is carried out to first pair of side of silicon single crystal rod by the first emery wheel 34 in a pair of first grinding tools 33 and is added Work industry；Then, positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that the second offside of silicon single crystal rod faces Second pair of side of silicon single crystal rod should be carried out by the first emery wheel 34 in a pair of first grinding tools 33 thick in a pair of first grinding tools 33 Mill processing operation.Wherein, any corase grind to side process operation can for example including：One amount of feeding is provided, driven a pair first The first emery wheel 34 in grinding tool 33 moves to grind a pair of sides of silicon single crystal rod from top to bottom；A pair of first emery wheels 34 are ground to Lower limit is stayed in afterwards after silicon single crystal rod bottom and through silicon single crystal rod, an amount of feeding is further added by, drives a pair of first sand Wheel 34 moves to grind silicon single crystal rod from the bottom up；A pair of first emery wheels 34 are ground at the top of silicon single crystal rod afterwards and pass through monocrystalline Upper limit is stayed in after silicon rod, continues to increase by an amount of feeding, a pair of first emery wheels 34 of driving move to grind list from top to bottom Crystalline silicon rod；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, after being repeated several times, you can by silicon single crystal rod A pair of sides are ground to default size.

As the round as a ball and fine grinding device 4 of the second processing unit (plant), on support 1 and positioned at the second of silicon rod processing platform Position is processed, it is round as a ball and smart for being carried out to the silicon single crystal rod after the circle of contact and the corase grind circle of contact of device 3 and corase grind processing operation Mill processing operation.Round as a ball and fine grinding device 4 has the second receiving space, for receiving the conveying passed through in silicon rod conversion equipment 5 The silicon single crystal rod that the conveying of body 51 comes.Round as a ball and fine grinding device 4 mainly includes the second frame 41 and at least one pair of second grinding tool 43, at least one pair of second grinding tool 43 is arranged oppositely in the second frame 41, is turned for being pointed to the silicon rod at the second processing position Silicon single crystal rod on changing device 5 carries out round as a ball and fine grinding operation.

Further, each second grinding tool 43 further includes the second main shaft 42 and the second emery wheel 44, wherein, the second main shaft 42 and second frame 41 mounting surface be provided with slide laterally guide mechanism and longitudinal sliding motion guide mechanism, it is described to slide laterally guiding Mechanism can be used such as the combination of slide rail and sliding block, and the longitudinal sliding motion guide mechanism can use the group of such as slide rail and sliding block Close etc..Using guide mechanism is slid laterally, the second main shaft 42 or relative second frame 41 of the energy of the second emery wheel 44 can be made to make laterally Motion of retreating, using longitudinal sliding motion guide mechanism, relative second frame 41 of the energy of the second main shaft 42 can be made longitudinally to move up and down.

In a practical application, at least one pair of second grinding tool 43 is arranged on a grinding tool base, the grinding tool base and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the second frame 41, at least one pair of second grinding tool 43 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool base, wherein, the grinding tool base is controlled by a lifting motor and indulged To sliding, each second grinding tool 43 of guide mechanism longitudinal sliding motion in the second frame 41, at least one pair of second grinding tool 43 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool base.Second emery wheel 44 is arranged at the operation end of the second main shaft 42, The second frosted particle with the second granularity.Comparatively, the granularity of the second frosted particle in the second emery wheel 44 is small The granularity of the first frosted particle in the circle of contact and corase grind device 3 in first emery wheel 34.Therefore, in round as a ball and fine grinding device 4 A pair of second grinding tools 43 to be oppositely arranged, leave the second receiving space for accommodating silicon single crystal rod between the two, work as silicon single crystal rod After being transported between a pair of second emery wheels 44 in second receiving space, the i.e. accessible silicon single crystal rod of the second emery wheel 44 enters The corresponding processing operation of row.

In actual applications, silicon single crystal rod is transferred into silicon rod processing platform first with silicon rod conversion equipment 5 second adds Work area position, silicon single crystal rod is positioned by silicon rod detent mechanism 53 and rotates silicon single crystal rod, by the second grinding tool 43 to monocrystalline silicon The connection faceted pebble of rod carries out round as a ball processing operation.

It is described it is round as a ball processing operation can for example including：Silicon single crystal rod is positioned by silicon rod detent mechanism 53 so that the A pair of second emery wheels 44 in two grinding tools 43 are right against the side of silicon single crystal rod, and the spacing between a pair of second emery wheels 44 is small In the current diagonal pitch of silicon single crystal rod, the gap of the two spacing is the amount of feeding of this at least one pair of the second emery wheel 44；It is single Crystalline silicon rod drives rotation in second receiving space by silicon rod detent mechanism 53, and a pair of second emery wheels 44 are by the rotation Silicon single crystal rod section a pair of chamferings corresponding to a pair of connection faceted pebbles be ground to arc-shaped, wherein, silicon single crystal rod is by second Rotating speed is slower during the contact grinding of emery wheel 44, and silicon single crystal rod is after after its connection faceted pebble is ground by the second emery wheel 44 by the second emery wheel Rotating speed is very fast, also, silicon single crystal rod continues to rotate and causes another pair connection faceted pebble contact second corresponding to its another pair chamfering Emery wheel 44 is simultaneously ground into arc-shaped by the second emery wheel 44；A pair of second emery wheels 44 continue downwards, such as abovementioned steps, to monocrystalline silicon Each connection faceted pebble of next section of rod be ground it is round as a ball, until grind the round as a ball bottom to silicon single crystal rod, completion monocrystalline silicon The single connection faceted pebble grinding of rod is round as a ball；Continue to increase by an amount of feeding, a pair of second emery wheels 44 of driving move from the bottom up, by the Two emery wheels 44 grind each connection faceted pebble of silicon single crystal rod；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, After being repeated several times, you can the connection faceted pebble of silicon single crystal rod is ground into default size and overall rounding, i.e. connection faceted pebble with Side rounding off.Positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 again so that the offside in silicon single crystal rod Face corresponds to a pair of second grinding tools 43, and fine grinding operation is carried out to the side of silicon single crystal rod by the second grinding tool 43.

Fine grinding operation may be, for example,：Positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that monocrystalline First offside face of silicon rod corresponds to a pair of second grinding tools 43, by the second emery wheel 44 in a pair of second grinding tools 43 to silicon single crystal rod First pair of side carry out fine grinding operation；Then, positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism 53 so that Second offside face of silicon single crystal rod corresponds to a pair of second grinding tools 43, by the second emery wheel 44 in a pair of second grinding tools 43 to monocrystalline Second pair of side of silicon rod carries out fine grinding operation.Wherein, any fine grinding operation to side can for example including：There is provided One amount of feeding, the second emery wheel 44 in a pair of second grinding tools 43 is driven to move from top to bottom to grind an offside of silicon single crystal rod Face；A pair of second emery wheels 44 are ground to after silicon single crystal rod bottom and stay in lower limit afterwards through silicon single crystal rod, are further added by One amount of feeding, a pair of second emery wheels 44 of driving move to grind silicon single crystal rod from the bottom up；A pair of second emery wheels 44 are ground to list Upper limit is stayed in afterwards after at the top of crystalline silicon rod and through silicon single crystal rod, continues to increase by an amount of feeding, drives a pair of second sand Wheel 44 moves to grind silicon single crystal rod from top to bottom；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, repeatedly After for several times, you can a pair of sides of silicon single crystal rod are ground into default size.

As seen from the above description, in a kind of alternative embodiment, the round as a ball and fine grinding device 4 as the second processing unit (plant) is right The grinding step that the round as a ball and fine grinding operation that silicon single crystal rod is carried out is ground using faceted pebble grinding trailing flank is first connected, but It is not limited thereto, in other change embodiments, round as a ball and fine grinding that round as a ball and fine grinding device 4 is carried out to silicon single crystal rod Operation connects the grinding step that faceted pebble is ground after can also using the grinding of first side, should have identical technique effect.

It is described in detail again so that silicon rod 100 is polycrystalline silicon rod as an example below.

In the case of silicon rod 100 is polycrystalline silicon rod, the first processing unit (plant) 3 is corase grind device, and the second processing unit (plant) 4 is Angle and fine grinding device.

As the corase grind device 3 of the first processing unit (plant), on support 1 and positioned at the first processing district of silicon rod processing platform Position, for carrying out corase grind operation to polycrystalline silicon rod.Corase grind device 3 has first receiving space, is changed for receiving by silicon rod The polycrystalline silicon rod that the conveying conveying of body 51 in device 5 comes.Roughly grind device 3 mainly include the first frame 31 and at least one pair of the One grinding tool 33, at least one pair of first grinding tool 33 is arranged oppositely in the first frame 31, for being pointed at the first processing position Polycrystalline silicon rod on silicon rod conversion equipment 5 carries out corase grind operation.Further, each first grinding tool 33 further includes the first master The emery wheel 34 of axle 32 and first, wherein, the mounting surface of the first main shaft 32 and the first frame 31, which is provided with, to be slid laterally guide mechanism and indulges To guide mechanism is slided, the guide mechanism that slides laterally can be used such as the combination of slide rail and sliding block, the longitudinal sliding motion Guide mechanism can be used such as the combination of slide rail and sliding block.Using guide mechanism is slid laterally, the first main shaft 32 or the can be made Relative first frame 31 of the energy of one emery wheel 34 makees laterally motion of retreating, using longitudinal sliding motion guide mechanism, can make the first main shaft 32 Relative first frame 31 of energy longitudinally moves up and down.

In a practical application, at least one pair of first grinding tool 33 is arranged on a grinding tool base, the grinding tool base and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the first frame 31, at least one pair of first grinding tool 33 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool base, wherein, the grinding tool base is controlled by a lifting motor and indulged To sliding, each first grinding tool 33 of guide mechanism longitudinal sliding motion in the first frame 31, at least one pair of first grinding tool 33 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool base.First emery wheel 34 is arranged at the operation end of the first main shaft 32, The first frosted particle with the first granularity.Herein, polycrystalline silicon rod to be processed is the silicon cube of rectangular in cross-section, has four Individual side and four corner angle.Therefore, a pair of first grinding tools 33 in device 3 are roughly ground to be oppositely arranged, are left between the two for accommodating The first receiving space of polycrystalline silicon rod, when polycrystalline silicon rod be transported to a pair of first emery wheels 34 in the first receiving space it Between after, the first emery wheel 34 is that a pair of sides relative in accessible polycrystalline silicon rod or a pair of corner angle carry out corresponding corase grind processing and made Industry.

In actual applications, polycrystalline silicon rod is transferred into silicon rod processing platform first with silicon rod conversion equipment 5 first adds Work area position, positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that a pair of sides in polycrystalline silicon rod correspond to A pair of first grinding tools 33, corase grind processing processing operation is carried out to the side of polycrystalline silicon rod by the first grinding tool 33.

Corase grind processes operation：Positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that polycrystalline First offside face of silicon rod corresponds to a pair of first grinding tools 33, by the first emery wheel 34 in a pair of first grinding tools 33 to polycrystalline silicon rod First pair of side carry out corase grind processing operation；Then, positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that Second offside face of polycrystalline silicon rod corresponds to a pair of first grinding tools 33, by the first emery wheel 34 in a pair of first grinding tools 33 to polycrystalline Second pair of side of silicon rod carries out corase grind processing operation, wherein, any corase grind to side process operation can for example including：There is provided One amount of feeding, the first emery wheel 34 in a pair of first grinding tools 33 is driven to move from top to bottom to grind an offside of polycrystalline silicon rod Face；A pair of first emery wheels 34 are ground to after polycrystalline silicon rod bottom and stay in lower limit afterwards through polycrystalline silicon rod, are further added by One amount of feeding, a pair of first emery wheels 34 of driving move to grind polycrystalline silicon rod from the bottom up；A pair of first emery wheels 34 are ground to more Upper limit is stayed in afterwards after at the top of crystalline silicon rod and through polycrystalline silicon rod, continues to increase by an amount of feeding, drives a pair of first sand Wheel 34 moves to grind polycrystalline silicon rod from top to bottom；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, repeatedly After for several times, you can a pair of sides of polycrystalline silicon rod are ground into default size.

As the chamfering and fine grinding device of the second processing unit (plant), on support 1 and positioned at the second of silicon rod processing platform Position is processed, for carrying out chamfering and fine grinding work to the polycrystalline silicon rod after the corase grind corase grind processing processing operation of device 3 Industry.Chamfering and fine grinding device 4 have the second receiving space, for receiving the conveying body 51 passed through in silicon rod conversion equipment 5 defeated The polycrystalline silicon rod sent.Chamfering and fine grinding device 4 mainly include the second frame 41 and at least one pair of second grinding tool 43, at least one pair of Second grinding tool 43 is arranged oppositely in the second frame 41, for being pointed on the silicon rod conversion equipment 5 at the second processing position Polycrystalline silicon rod carries out chamfering and fine grinding operation.

In a practical application, at least one pair of second grinding tool 43 is arranged on a grinding tool base, the grinding tool base and lead to Cross longitudinal sliding motion guide mechanism and can longitudinal sliding motion be connected to the second frame 41, at least one pair of second grinding tool 43 is by sliding laterally Guide mechanism and can slide laterally and be connected to the grinding tool base, wherein, the grinding tool base is controlled by a lifting motor and indulged To sliding, each second grinding tool 43 of guide mechanism longitudinal sliding motion in the second frame 41, at least one pair of second grinding tool 43 is independent It is controlled by an advance and retreat motor and slides laterally in the grinding tool base.Second emery wheel 44 is arranged at the operation end of the second main shaft 42, The second frosted particle with the second granularity, comparatively, the granularity of the second frosted particle in the second emery wheel 44 is small In the granularity for roughly grinding the first frosted particle in device 3 in first emery wheel 34.Therefore, a pair in chamfering and fine grinding device 4 Second grinding tool 43 leaves the second receiving space for accommodating polycrystalline silicon rod, when polycrystalline silicon rod is conveyed between the two to be oppositely arranged After between a pair of second emery wheels 44 into second receiving space, the i.e. accessible polycrystalline silicon rod of the second emery wheel 44 carries out corresponding Chamfer machining operation.

In actual applications, polycrystalline silicon rod is transferred into silicon rod processing platform first with silicon rod conversion equipment 5 second adds Work area position, the corner angle correspondence that polycrystalline silicon rod causes polycrystalline silicon rod is positioned by silicon rod detent mechanism 53 and rotated to polycrystalline silicon rod The second emery wheel 44 in a pair of second grinding tools 43, chamfer machining operation is carried out to polycrystalline silicon rod by the second grinding tool 43.

Chamfer machining operation can for example including：In chamfering, rotated to an angle first with silicon rod detent mechanism 53 so that Obtain the second emery wheel 44 that first pair of corner angle of polycrystalline silicon rod correspond in a pair of second grinding tools 43；A pair of second emery wheels 44 drop to Grinding position, now, the spacing between a pair of second emery wheels 44 are to be less than current diagonal of first pair of corner angle in polycrystalline silicon rod Spacing, the gap of the two spacing are the amount of feeding of this pair of second emery wheel 44, and a pair of second emery wheels 44 are moved down to silicon First pair of corner angle in rod 100 are ground to form fillet surface；A pair of second emery wheels 44 continue downwards, such as abovementioned steps, Next section of first pair of corner angle of silicon rod 100 are ground, until being ground to the bottom of silicon rod 100, complete silicon rod 100 Single corner angle are ground；Continue to increase by an amount of feeding, the second grinding tool 43 of driving is moved from the bottom up, and silicon rod is ground by the second emery wheel 44 100 first pair of corner angle；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, after being repeated several times, you can will First pair of corner angle of silicon rod 100 are ground to default size to form first pair of fillet surface.Chamfering is carried out to second pair of corner angle again And fine grinding：In chamfering, rotated to an angle first with silicon rod detent mechanism 53 so as to obtain second pair of corner angle pair of polycrystalline silicon rod Should be in the second emery wheel 44 in a pair of second grinding tools 43；A pair of second emery wheels 44 drop to grinding position, now, a pair of second sand Spacing between wheel 44 is to be less than the diagonal pitch that second pair of corner angle is current in silicon rod 100, and the gap of the two spacing is The amount of feeding of this pair of second emery wheel 44, a pair of second emery wheels 44 move down to be ground to second pair of corner angle in silicon rod 100 Cut to form fillet surface；A pair of second emery wheels 44 continue downwards, such as abovementioned steps, to next section the second couple of silicon rod 100 Corner angle are ground, until being ground to the bottom of silicon rod 100, complete the single corner angle grinding of silicon rod 100；Continue the feeding of increase by one Amount, the second grinding tool 43 of driving are moved from the bottom up, and second pair of corner angle of silicon rod 100 are ground by the second emery wheel 44；In this way, grinding, Increase the amount of feeding, reversely grinding, increase the amount of feeding, after being repeated several times, you can be ground to second pair of corner angle of silicon rod 100 pre- If size to form second pair of fillet surface.

Then, recycle silicon rod detent mechanism 53 to be positioned to polycrystalline silicon rod and rotate polycrystalline silicon rod and cause polycrystalline silicon rod The second emery wheel 44 for corresponding in a pair second grinding tools 43 of side, fine grinding work is carried out to polycrystalline silicon rod by the second grinding tool 43 Industry.Fine grinding operation can for example including：Positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that polycrystalline silicon rod The first offside face correspond to a pair of second grinding tools 43, by the second emery wheel 44 in a pair of second grinding tools 43 to polycrystalline silicon rod A pair of sides carry out fine grinding operation；Then, positioning adjustment is carried out to polycrystalline silicon rod by silicon rod detent mechanism 53 so that polycrystalline Second offside face of silicon rod corresponds to a pair of second grinding tools 43, by the second emery wheel 44 in a pair of second grinding tools 43 to polycrystalline silicon rod Second pair of side carry out fine grinding operation, wherein, any fine grinding operation to side can for example including：One is provided to enter To amount, the second emery wheel 44 in a pair of second grinding tools 43 is driven to move from top to bottom to grind a pair of sides of polycrystalline silicon rod；One Second emery wheel 44 is ground to after polycrystalline silicon rod bottom and stays in lower limit afterwards through polycrystalline silicon rod, be further added by a feeding Amount, a pair of second emery wheels 44 of driving move to grind polycrystalline silicon rod from the bottom up；A pair of second emery wheels 44 are ground to polycrystalline silicon rod After top and through upper limit is stayed in after polycrystalline silicon rod, continue to increase an amount of feeding, a pair of second emery wheels 44 of driving from On down move and grind polycrystalline silicon rod；In this way, grinding, increases the amount of feeding, reversely grinding, increases the amount of feeding, be repeated several times it Afterwards, you can a pair of sides of polycrystalline silicon rod are ground to default size.

It should be noted that above are only exemplary illustration, the protection domain of the application is not intended to limit, for example, in pin To being to first carry out in the processing job description of the chamfering as the second processing unit (plant) and the chamfering of fine grinding device and fine grinding device The chamfer machining operation of polycrystalline silicon rod performs the fine grinding operation of polycrystalline silicon rod again, but is not limited thereto, in other realities Apply in mode, it is also feasible to first carry out and perform the chamfer machining operation of polycrystalline silicon rod after the fine grinding operation of polycrystalline silicon rod again , the protection domain of the application should be belonged to.

Subsequently, silicon rod 100 is after the processing operation of the first processing unit (plant) 3 and the second processing unit (plant) 4, then by silicon rod converting means Put 5 by silicon rod from second processing position change to pretreatment position, and again by silicon rod handler will be processed after silicon rod from The pretreatment position unloading of silicon rod processing platform.Certainly, before silicon rod 100 is unloaded, if it is necessary, in pretreatment position, still Planar smoothness detection can be carried out to the silicon rod 100 after processed operation by flatness detector.Using flatness detector, On the one hand, it can examine whether silicon rod meets production after each processing operation by being detected to the planar smoothness of silicon rod 100 Product requirement, to determine the effect of each processing operation；On the other hand, by being detected to the planar smoothness of silicon rod 100, also can between The wear condition of processing component in each processing unit (plant) is obtained to obtain, in favor of being calibrated or being corrected in real time, or even maintenance or more Change.

The application silicon rod Multi-position processing machine, has gathered multiple processing unit (plant)s, can be by silicon rod using silicon rod handler Quickly, it is steady and loaded and unloaded with no damage, using silicon rod conversion equipment can by silicon rod between each processing unit (plant) in order and The multiple procedures for realizing silicon rod processing are seamlessly shifted and are automated, multiple processing unit (plant)s can be simultaneously to corresponding silicon Rod carries out corresponding processing operation, improves production efficiency and the quality of Product processing operation.

Below in conjunction with Fig. 7 to Figure 16, silicon rod multistation is performed in some instances to the application silicon rod Multi-position processing machine Processing operation is described in detail.In the following example, following setting is first made：Silicon rod is chosen as silicon single crystal rod and is alternatively polysilicon Rod, wherein：Silicon single crystal rod to be processed is the silicon cube that section is substantially in class rectangle, has four sides, two neighboring side Between formed with the connection faceted pebble in R angles；Polycrystalline silicon rod to be processed be rectangular in cross-section silicon cube, have four sides and Four corner angle.Used silicon rod Multi-position processing machine includes silicon rod processing platform, silicon rod handler, the first processing dress Put, the second processing unit (plant) and silicon rod conversion equipment, wherein, silicon rod handler includes：Silicon rod load and unload position, provided with for Carry silicon rod and erect the silicon rod plummer placed；Commutate carrier, for making commutation motion；Silicon rod clamper, carried located at the commutation First mounting surface of tool；Height testing instrument, on the commutation carrier, for detecting the height of the silicon rod；Flatness is examined Instrument is surveyed, located at the second mounting surface of the commutation carrier, for carrying out planar smoothness detection to the silicon rod.In addition, silicon rod Processing platform is provided with pretreatment position, the first processing position and the second processing position, pretreatment position, the first processing district Position and the second processing position process the process of operation according to silicon rod and order is set, correspondingly, silicon rod conversion equipment Provided with three silicon rod detent mechanisms, wherein, pretreatment position, the first processing position and the second processing position are between any two 120 ° of distributions, therefore, three silicon rod detent mechanisms are between any two also in 120 ° of distributions.It is assumed herein that according to pretreatment position, The trend of the order of first processing position and the second processing position is forward direction, and the trend of the order opposite with the forward direction is Inversely.

Step 1, the first silicon rod to be processed is positioned on the Workpiece carrier platform of silicon rod handler.In the present embodiment In, the first silicon rod 101 is to erect to be positioned on silicon rod plummer 21, and the first silicon rod 101 is positioned in silicon rod handling position The operation of silicon rod plummer 21 can also be implemented using manual work using corresponding tool, the tool may be, for example, silicon Rod transfer tool.In addition, if necessary, the first silicon rod on silicon rod plummer 21 can be adjusted by rotating silicon rod plummer 21 101 angle, the angle may be, for example, 45 ° of placements, i.e. two diagonal of the first silicon rod 101 correspond respectively to sidesway side To (X-direction) and translation direction (Y direction).The state of silicon rod Multi-position processing machine for details, reference can be made to after implementation aforesaid operations Fig. 7, Fig. 7 are shown as silicon rod and are straightened the view being positioned on silicon rod plummer.

Step 2, the first silicon rod to be processed is loaded into the pretreatment position of silicon rod processing platform.In the present embodiment, It is by silicon rod handler 2 by the pretreatment position that the first silicon rod 101 to be processed is loaded into silicon rod processing platform 11 What silicon rod clamper 25 was implemented.Specifically, first, it is ensured that the silicon rod clamper 25 in silicon rod handler 2 corresponds to silicon rod loading place Position, for example, can be by driving commutation carrier 23 to make commutation motion so that the silicon rod clamper 25 of commutation carrier 23, which is changed to silicon rod, to be filled Unload position；Then, the jig arm 254 in silicon rod holder 253 is driven to make decentralization action to be transferred to clamping state simultaneously by releasing orientation It is able to clamp the first silicon rod 101, the state for implementing silicon rod Multi-position processing machine after aforesaid operations for details, reference can be made to Fig. 8, and Fig. 8 shows It is shown as the view that silicon rod is clamped by silicon rod clamper；Then, the first silicon rod 101 is departed from and loads and unloads position in silicon rod.This is de- From operation, in a kind of alternative embodiment, the retaining clip conjunction state of silicon rod holder 253, the silicon rod in position is loaded and unloaded using silicon rod Plummer 21 makees descending motion so that the first silicon rod 101 departs from silicon rod plummer 21；In another alternative embodiment, lead to Overdrive silicon rod holder 253 ascending motion (silicon rod holder 253 is movable design) with drive the first silicon rod 101 depart from In silicon rod plummer 21；Then, driving commutation carrier 23 makees commutation motion (such as rotating 180 °) so that on commutation carrier 23 Silicon rod clamper 25 by silicon rod handling position change to pretreatment position；Then, the first silicon rod 101 is positioned in pretreatment On the rotation plummer 531 of the first silicon rod detent mechanism 53 at position, and by the rotation top pressure of the first silicon rod detent mechanism 53 Device 533 makees descending motion by lifting drive and realizes positioning to compress the first silicon rod 101, implements silicon rod after aforesaid operations The state of Multi-position processing machine for details, reference can be made to Fig. 9, and Fig. 9 is shown as the state that silicon rod is positioned over pretreatment position by commutation carrier Schematic diagram.

It should be noted that in a kind of alternative embodiment, can also profit before the first silicon rod is clamped using silicon rod clamper 25 The height of the first silicon rod 101 is detected with height testing instrument 7, so, the silicon rod holder 253 in silicon rod clamper 25 can be according to height The testing result of detector 7 is subsequently being moved up or being moved down to adjust the folder between multiple silicon rod holders 253 Hold spacing, the state for implementing silicon rod Multi-position processing machine after aforesaid operations for details, reference can be made to Figure 10, and Figure 10 is shown as height detection The view of instrument detection silicon rod height on handling plummer.

Step 3, planar smoothness detection is carried out to the first silicon rod at pretreatment position.Silicon rod is more after implementing aforesaid operations The state of station processing machine for details, reference can be made to Figure 11 and Figure 12, be shown as the shape of flatness detector detection silicon rod planar smoothness State schematic diagram.

In the present embodiment, it is by smooth to carry out planar smoothness detection to the first silicon rod 101 at pretreatment position Spend what detector was implemented.Specifically, driving commutation carrier 23 makees commutation motion (such as rotating 180 °) so that on commutation carrier 23 Flatness detector changed by silicon rod handling position to pretreatment position, wherein, silicon rod clamper 25 and flatness detector point It is not configured in commutation carrier 23 backwards to the first mounting surface and the second mounting surface set, in this stage, if necessary, passes through driving The rotation jack unit 533 of first silicon rod detent mechanism 53 rotates to adjust the angle of the first silicon rod 101, such as drives First silicon rod 101 rotates 45 ° so that the first silicon rod 101 corresponds respectively to sidesway direction (X-direction) by original two diagonal It is adjusted to two adjacent sides with translation direction (Y direction) and corresponds respectively to sidesway direction and translation direction, i.e. wherein A side be right against commutation carrier 23 on flatness detector；Then, using flatness detector to the first silicon rod 101 Four sides carry out planar smoothness detection, any of which side planar smoothness detection further includes：Controlled by detection Device control detector shift mechanism drives contacting gauge 61 to shift and control contacting gauge 61 sequentially to detect the first silicon Each test point in rod 101 on current side to be measured.

Specifically, on the one hand, for the detection of each test point in any one tested surface, include：Controlled by detection Device control detector shift mechanism (including first direction shift mechanism, second direction shift mechanism and third direction shifting machine Structure) contacting gauge is driven in plane of motion internal shift to cause contacting gauge to correspond to current detection point to be measured； Drive contacting gauge to face by detection controller control detector shift mechanism (mainly second direction shift mechanism) to treat The current detection point movement of survey is until touch silicon rod, and now, detection controller can receive to be transmitted across from contacting gauge Come Continuity signal (or cut-off signal) and according to the Continuity signal (or cut-off signal) suspend detection controller control detection The operation of instrument shift mechanism, and by benchmark information and detector shift mechanism (mainly second direction shift mechanism) the Displacement on two directions extrapolates the test point in the tested surface that contacting gauge is currently touched relative to base Relative distance on schedule；Contacting gauge is driven to deviate from current inspection to be measured by detection controller control detector shift mechanism Measuring point movement completes the detection of a test point to reset.

On the other hand, for the detection of multiple test points on tested surface, certainly will need to carry out position between test point Switching, therefore, in completion after the detection of a test point, treats to reset contacting gauge by detector shift mechanism It is displaced to the position of next test point by detector shift mechanism again afterwards, wherein, belong to the more of side to be measured Individual test point can use the dot matrix way arrangement of rule.It should be noted that putting down when a side for completing the first silicon rod 101 After whole degree detection, it is also necessary to switch to next side and carry out flatness detection.The switching of side can be by shifting the first silicon Rod 101 is realized, for example, in workpiece filling structure, can pass through the rotation jack unit for driving the first silicon rod detent mechanism 53 533 rotate to adjust the angle of the first silicon rod 101 (such as driving the first silicon rod 101 to rotate 90 °) and switch to neighbouring Next side.

Extraly, in step 3, except being carried out using flatness detector 7 to the first silicon rod 101 at pretreatment position Outside planar smoothness detection, first silicon rod 101 can also be carried out by the cooperation of flatness detector 7 and silicon rod clamper 25 Correction operation.In the present embodiment, mainly it is by the center of the first silicon rod 101 and rotation usually in the correction operation The center of vicarious microscope carrier 531 is corresponding to be overlapped.The concrete operations of the correction operation may include：By flatness detector 7 to rotation The first silicon rod 101 carried on plummer 531 carries out planar smoothness detection, so as to obtain the integral position of the first silicon rod 101 Overview；The integral position overview of first silicon rod 101 of acquisition is compared with rotating the position of plummer 531, and then Obtain the deviation information between the center of the first silicon rod 101 and the center of rotation plummer 531；The carrier 23 that commutates rotates 180 ° of works Commutation motion, the first silicon rod 101 corresponded to by the silicon rod clamper 25 on commutation carrier 23 on rotation plummer 531 simultaneously clamp First silicon rod 101；Utilize the first direction shift mechanism and/or second direction detected in controller control detector shift mechanism Shift mechanism driving commutation carrier 23 in a first direction and/or second party moves up, so as to drive silicon rod clamper 25 and by The first silicon rod 101 that silicon rod clamper 25 clamps rotates against plummer 531 and makees position adjustment, is finally able to the first silicon rod 101 Center with rotate plummer 531 center it is corresponding overlap, complete be directed to the first silicon rod 101 correction operation.

In addition, for the silicon rod of different kenels, difference in detail is deposited in the correction operation.

By taking silicon single crystal rod as an example, Figure 13 is referred to, is shown as carrying out silicon single crystal rod the schematic diagram of correction operation.Such as Figure 13 Shown, silicon single crystal rod to be processed is substantially in the silicon cube of class rectangle for section, has four sides, between two neighboring side Formed with the connection faceted pebble in R angles.Therefore, the correction operation for silicon single crystal rod may particularly include：By flatness detector pair Four sides of the silicon single crystal rod carried on rotation plummer carry out planar smoothness detection, so as to obtain by four side institute structures Into silicon single crystal rod side center O₁；By flatness detector to four connections of the silicon single crystal rod carried on rotation plummer Faceted pebble carries out planar smoothness detection, so as to obtain the center for the silicon single crystal rod connection faceted pebble being made up of four connection faceted pebbles O₂；The size of the silicon single crystal rod finished product after silicon single crystal rod is processed through multistation is calculated；According to the chi of silicon single crystal rod finished product Very little, silicon single crystal rod side center O₁, silicon single crystal rod connection faceted pebble center O₂, extrapolate the center O of silicon single crystal rod finished product₃；Will The center O of the silicon single crystal rod finished product of acquisition₃Center O with rotating plummer is compared, and then both deviation informations； The carrier that commutates makees commutation motion, and the silicon single crystal rod corresponded to by the silicon rod clamper on commutation carrier on rotation plummer simultaneously clamps Silicon single crystal rod, moved using the first direction shift mechanism and/or second direction that detect in controller control detector shift mechanism Position mechanism driving commutation carrier is in a first direction and/or second party moves up, so as to drive silicon rod clamper and be pressed from both sides by silicon rod The silicon single crystal rod of tool clamping rotates against plummer and makees position adjustment, is finally able to the center O of silicon single crystal rod finished product₃With rotation The center O of plummer is corresponding to be overlapped, and completes the correction operation for silicon single crystal rod.

By taking polycrystalline silicon rod as an example, Figure 14 is referred to, is shown as carrying out polycrystalline silicon rod the schematic diagram of correction operation.Such as Figure 14 Shown, polycrystalline silicon rod to be processed is the silicon cube of rectangular in cross-section, has four sides and four corner angle.Therefore, for more The correction operation of crystalline silicon rod may particularly include：By flatness detector to four sides of the polycrystalline silicon rod carried on rotation plummer Face carries out planar smoothness detection, so as to obtain the center O for the polycrystalline silicon rod being made up of four sides₁；By the polycrystalline of acquisition The center O of silicon rod₁Center O with rotating plummer is compared, and then both deviation informations；Commutation carrier commutates Motion, the polycrystalline silicon rod corresponded to by the silicon rod clamper on commutation carrier on rotation plummer simultaneously clamp polycrystalline silicon rod, utilized Detect the first direction shift mechanism in controller control detector shift mechanism and/or the driving commutation of second direction shift mechanism Carrier is in a first direction and/or second party moves up, so as to the polysilicon for driving silicon rod clamper and being clamped by silicon rod clamper Rod rotates against plummer and makees position adjustment, is finally able to the center O of polycrystalline silicon rod₁It is corresponding with the center O for rotating plummer Overlap, complete the correction operation for polycrystalline silicon rod.

Step 4, the first silicon rod for completing planar smoothness detection is changed to the by pre-processing position by pre-processing position One processing position simultaneously carries out the first processing operation to the first silicon rod on the first processing position, in this stage, by be processed the Two silicon rods are loaded into pretreatment position and pre-processed.The state of silicon rod Multi-position processing machine specifically may be used after implementation aforesaid operations Referring to Figure 15, the view for the first processing operation being carried out to the first silicon rod and the second silicon rod is loaded is shown as.

In the present embodiment, the first silicon rod for completing planar smoothness detection is turned by pre-processing position by pre-processing position It is to implement to complete by making silicon rod conversion equipment rotate the first predetermined angle to shift to the first processing position, as it was previously stated, pre- place Manage position, first processing position and second processing position between any two in 120 ° distribution, three silicon rod detent mechanisms two-by-two it Between also in 120 ° distribution, therefore, make silicon rod conversion equipment 5 rotate the first predetermined angle be actually make silicon rod conversion equipment 5 120 ° are rotated forward, the first silicon rod detent mechanism 53 and its first silicon rod 101 of positioning being initially positioned on pretreatment position With regard in conversion to the first processing position.

Carrying out the first processing operation to the first silicon rod 101 on the first processing position is implemented by the first processing unit (plant) 3 's.In the case of the first silicon rod 101 is silicon single crystal rod, the first processing unit (plant) 3 is the circle of contact and corase grind device.By the circle of contact and corase grind Device, which carries out the circle of contact and corase grind processing operation to silicon single crystal rod, to be generally comprised：The circle of contact processes operation and corase grind processing operation.

Circle of contact processing operation may include：Positioning adjustment is carried out to the first silicon rod 101 with the first silicon rod detent mechanism 53 to match Close, according to the amount of feeding, rotate the first emery wheel 34 in the first grinding tool 33 and drive the first grinding tool 33 to move up and down to implement to grind, The first couple in first silicon rod 101 is connected faceted pebble and its adjacent domain repeatedly slightly cut and to second pair of connection faceted pebble and Its adjacent domain repeatedly slightly cut so that the connection between each connection faceted pebble and adjacent side forms preliminary arc and connected Connect.

Corase grind processing operation may include：Positioning adjustment is carried out to the first silicon rod 101 by the first silicon rod detent mechanism 53 so that First offside face of the first silicon rod 101 corresponds to a pair of first grinding tools 33, right by the first emery wheel 34 in a pair of first grinding tools 33 First pair of side of the first silicon rod 101 carries out corase grind processing operation；Then, by the first silicon rod detent mechanism 53 to the first silicon rod 101 carry out positioning adjustment so that the second offside face of the first silicon rod 101 corresponds to a pair of first grinding tools 33, by a pair first mills The first emery wheel 34 in tool 33 carries out corase grind processing operation to second pair of side of the first silicon rod 101.

In the case of the first silicon rod 101 is polycrystalline silicon rod, the first processing unit (plant) 3 is corase grind device.By corase grind device pair Polycrystalline silicon rod, which carries out corase grind processing operation, to be generally comprised：First silicon rod 101 is transferred to first first with silicon rod conversion equipment 5 Position is processed, positioning adjustment is carried out to the first silicon rod 101 by the first silicon rod detent mechanism 53 so that the in the first silicon rod 101 A pair of first grinding tools 33 that a pair of sides correspond in corase grind device 3,33 relative first frame 31 of the first grinding tool is made according to feeding Amount makees traverse feed, rotates the first emery wheel 34 in the first grinding tool 33 and drives the first grinding tool 33 to move up and down with to the first silicon rod Roughly grind first pair of side in 101；Positioning adjustment is carried out to polycrystalline silicon rod by the first silicon rod detent mechanism 53 so that the A pair of first grinding tools 33 that the second offside face in one silicon rod 101 corresponds in corase grind device 3, rotate in the first grinding tool 33 First emery wheel 34 simultaneously drives the first grinding tool 33 to move up and down to be roughly ground to second pair of side in the first silicon rod 101.

In step 4, the implementation process for the second silicon rod to be processed being loaded into pretreatment position and being pre-processed can With reference to the description in abovementioned steps 2 and step 3, will not be repeated here.

Step 5, by complete first processing operation the first silicon rod by first processing position change to second processing position with And the second silicon rod for completing pretreatment is changed to the first processing position by pre-processing position；To first on the second processing position Silicon rod carry out second processing operation, in this stage, make to first processing position on the second silicon rod carry out first processing operation with And the 3rd silicon rod to be processed is loaded into pretreatment position and pre-processed.Silicon rod multistation is processed after implementing aforesaid operations The state of machine for details, reference can be made to Figure 16, and Figure 16 shows the silicon rod Multi-position processing machine of the application while three silicon rods are processed The view of operation.

In the present embodiment, the first silicon rod for completing the first processing operation is changed to the second processing by the first processing position Position and by complete pretreatment the second silicon rod by pre-process position change to first processing position be by making silicon rod change Device rotates the second predetermined angle and implements what is completed, as it was previously stated, pretreatment position, the first processing position and the second processing Position also in 120 ° of distributions, therefore, makes silicon rod converting means between any two in 120 ° of distributions, three silicon rod detent mechanisms between any two It is actually to make silicon rod conversion equipment 5 rotate forward 120 ° to put 5 the second predetermined angles of rotation, is initially positioned at the first processing position On first silicon rod detent mechanism 53 and its positioning the first silicon rod 101 just on conversion to the second processing position and original position Just changed to the first processing position in the first silicon rod 101 of first silicon rod detent mechanism 53 on pretreatment position and its positioning It is upper.

Carrying out the second processing operation to the first silicon rod 101 on the second processing position is implemented by the second processing unit (plant) 4 's.In the case of the first silicon rod 101 is silicon single crystal rod, the second processing unit (plant) 4 is round as a ball and fine grinding device.By round as a ball and fine grinding Device carries out round as a ball and fine grinding operation to silicon single crystal rod to be generally comprised：Round as a ball processing operation and fine grinding operation.Rolling Circle processing operation further comprises：First silicon rod 101 is transferred into silicon rod processing platform using silicon rod conversion equipment 5 second adds Work area position, first silicon rod 101 is positioned by the first silicon rod detent mechanism 53 and rotates the first silicon rod 101, makes the second grinding tool 43 relative second frames 41 make traverse feed according to the amount of feeding, rotate the second emery wheel 44 in the second grinding tool 43 and drive the second mill The up and down motion of tool 43 is ground round as a ball with each connection faceted pebble to the first silicon rod 101 so that the connection of the first silicon rod 101 Faceted pebble is ground to default size and overall rounding, i.e. connection faceted pebble and side rounding off.

Fine grinding operation further comprises：Positioning adjustment is carried out to the first silicon rod 101 by the first silicon rod detent mechanism 53, So that a pair of second grinding tools 43 that the first offside face in the first silicon rod 101 corresponds in round as a ball and fine grinding device 4, make the second mill 43 relative second frames 41 of tool make traverse feed according to the amount of feeding, rotate the second emery wheel 44 in the second grinding tool 43 and drive the Two grinding tools 43 move up and down to be refined to first pair of side in the first silicon rod 101；Is driven by silicon rod detent mechanism 53 One silicon rod 101 positive (or reverse) rotates 90 ° so that the second offside face in the first silicon rod 101 corresponds to round as a ball and fine grinding dress Put a pair of second grinding tools 43 in 4, rotate the second emery wheel 44 in the second grinding tool 43 and drive the second grinding tool 43 to move up and down with Second pair of side in first silicon rod 101 is refined.

In the case of the first silicon rod 101 is polycrystalline silicon rod, the second processing unit (plant) 4 is chamfering and fine grinding device.By chamfering And fine grinding device carries out chamfering and fine grinding operation to polycrystalline silicon rod and can generally comprised：Chamfer machining operation and fine grinding are made Industry.Chamfer machining operation further comprises：First silicon rod 101 is transferred to the of silicon rod processing platform using silicon rod conversion equipment Two processing positions, carry out positioning adjustment, such as drive the first silicon rod 101 by the first silicon rod detent mechanism 53 to the first silicon rod 101 Rotate 45 ° so that a pair of second grinding tools 43 that first pair of corner angle in the first silicon rod 101 correspond in chamfering and fine grinding device, Make relative second frame 41 of the second grinding tool 43 make traverse feed according to the amount of feeding, rotate the second emery wheel 44 in the second grinding tool 43 simultaneously Drive the second grinding tool 43 to move up and down and be ground with first pair of corner angle to the first silicon rod 101 so that the of the first silicon rod 101 A pair of corner angle form fillet surface through grinding；The first silicon rod 101 positive (or reverse) is driven to rotate by silicon rod detent mechanism 53 90 ° so that a pair of second grinding tools 43 that second pair of corner angle in the first silicon rod 101 correspond in chamfering and fine grinding device 4, rotation The second emery wheel 44 and the second grinding tool 43 of driving in second grinding tool 43 move up and down to enter with second pair of corner angle to the first silicon rod 101 Row grinding so that second pair of corner angle of the first silicon rod 101 form fillet surface through grinding.

Fine grinding operation further comprises：Positioning adjustment is carried out to silicon single crystal rod by silicon rod detent mechanism, such as by One silicon rod detent mechanism 53 drives the first silicon rod 101 to rotate 45 ° so that the first offside face in the first silicon rod 101 corresponds to fall A pair of second grinding tools 43 in angle and fine grinding device, 43 relative second frame 41 of the second grinding tool is made to make laterally to enter according to the amount of feeding Give, rotate the second emery wheel 44 in the second grinding tool 43 and drive the second grinding tool 43 to move up and down with first to the first silicon rod 101 Side is refined；The first silicon rod 101 positive (or reverse) is driven to rotate 90 ° by silicon rod detent mechanism 53 so that the first silicon A pair of second grinding tools 43 that the second offside face in rod 101 corresponds in chamfering and fine grinding device 4, rotate in the second grinding tool 43 The second emery wheel 44 and drive the second grinding tool 43 to move up and down and refined with second pair of side to the first silicon rod 101.

In steps of 5, by the second silicon rod for completing planar smoothness detection by pre-processing position by pre-processing position conversion The implementation process that the first processing operation is carried out to the first processing position and to the second silicon rod 102 on the first processing position can refer to The description of abovementioned steps 4, and the implementation that the 3rd silicon rod to be processed is loaded into pretreatment position and pre-processed can refer to The description of abovementioned steps 2 and step 3, will not be repeated here.

Step 6, by complete second processing operation the first silicon rod by second processing position change to pretreatment position and The second silicon rod for completing the first processing operation is changed to the second processing position by the first processing position and pretreatment will be completed 3rd silicon rod is changed to the first processing position by pre-processing position；The first silicon rod pre-processed on position is unloaded and incited somebody to action The 4th silicon rod that 4th silicon rod to be processed is loaded into pretreatment position and is pointed at the pretreatment position is pre-processed, In this stage, the second processing operation is carried out to the second silicon rod on the second processing position and to the 3rd on the first processing position Silicon rod carries out the first processing operation.The state of silicon rod Multi-position processing machine for details, reference can be made to Figure 17, Figure 17 after implementation aforesaid operations It is shown as completing the view of the silicon rod discharging of processing operation.

In the present embodiment, the first silicon rod for completing the second processing operation is changed to pretreating zone by the second processing position Position and the second silicon rod of the first processing operation will be completed changed to the second processing position and will be completed pre- by the first processing position 3rd silicon rod of processing by pre-processing position and changing to the first processing position is preset by making silicon rod conversion equipment rotate the 3rd Angle implements what is completed, as it was previously stated, pretreatment position, the first processing position and the second processing position are between any two 120 ° of distributions, three silicon rod detent mechanisms 53 also in 120 ° of distributions, therefore, make silicon rod conversion equipment 5 rotate the 3rd between any two Predetermined angle is actually to make 240 ° of 5 backwards rotation of silicon rod conversion equipment or make silicon rod conversion equipment 5 rotate forward 120 ° i.e. It can be achieved.Due to perform silicon rod handling, planar smoothness detection, first processing operation, second processing operation it is foregoing It is described, does not will not be repeated here.

Pass through above-mentioned each step, it can be seen that Each performs its own functions for the processing unit (plant) on each processing stations, each processing dress Between putting in order and seamlessly shifted and automate realize silicon rod processing multiple procedures, formed pipelining, Improve production efficiency and the quality of Product processing operation.

The principle and its effect of above-described embodiment only illustrative the application, not for limitation the application.It is any ripe Know the personage of this technology all can without prejudice to spirit herein and under the scope of, modifications and changes are carried out to above-described embodiment.Cause This, those of ordinary skill in the art is complete without departing from spirit disclosed herein and institute under technological thought such as Into all equivalent modifications or change, should be covered by claims hereof.

Claims

A kind of 1. silicon rod handler, it is characterised in that including：

Silicon rod loads and unloads position, provided with the silicon rod plummer that placement is erect for carrying silicon rod；

Commutate carrier, for making commutation motion；And

Silicon rod clamper, located at the first mounting surface of the commutation carrier；

Wherein, by driving the commutation carrier to make commutation motion so that the silicon rod clamper of the commutation carrier is in the silicon rod Changed between handling position and silicon rod function position to transfer the silicon rod.
2. silicon rod handler according to claim 1, it is characterised in that the silicon rod clamper includes：

Fixture installed part, on the commutation carrier；And

At least two silicon rod holders, set along the fixture installed part spacing.
3. silicon rod handler according to claim 2, it is characterised in that the silicon rod holder includes：

Jig arm mounting seat, on the fixture installed part；

At least two jig arm, it is movably arranged in the jig arm mounting seat；And

Jig arm drive mechanism, for driving at least two jig arm to make opening and closing movement.
4. silicon rod handler according to claim 3, it is characterised in that the jig arm drive mechanism includes：

Folding gear, in the jig arm；

Gear drive, there is the groove engaged with the folding gear in the jig arm；And

Driving source, the gear drive is connected to, for driving the gear drive to move.
5. silicon rod handler according to claim 4, it is characterised in that the gear drive is rack, the tooth The opposite sides of bar is respectively equipped with the first groove engaged with the folding gear at least two first jig arm；The driving Source is the cylinder or motor for driving the rack motion.
6. silicon rod handler according to claim 2, it is characterised in that at least two silicon rods holder extremely A few silicon rod holder is provided with guiding driving mechanism, for driving it along the fixture installed part motion, with described in regulation The spacing of at least two silicon rods holder.
7. silicon rod handler according to claim 1, it is characterised in that also including height testing instrument, changed located at described To on carrier, for detecting the height of the silicon rod.
8. silicon rod handler according to claim 1, it is characterised in that also including flatness detector, located at described Second mounting surface of commutation carrier, for carrying out planar smoothness detection to the silicon rod.
9. silicon rod handler according to claim 8, it is characterised in that the flatness detector includes：

Contact measurement structure；

Detector shift mechanism；And

Controller is detected, is connected with the contact measurement structure and the detector shift mechanism, for controlling the detection Instrument shift mechanism drives the contact measurement structural shift and the control contact measurement structure sequentially to detect the silicon In rod on tested surface each test point relative distance.
10. a kind of silicon rod Multi-position processing machine, it is characterised in that including the silicon rod dress according to claim any one of 1-9 Handler.