CN108886110B - 柔性显示装置及其制造方法 - Google Patents
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Abstract
本发明提供柔性显示装置及其制造方法。本发明的柔性显示装置的制造方法包括:在载体基板上涂敷聚酰亚胺类溶液来形成第一聚酰亚胺类层的步骤;在第一聚酰亚胺类层上形成氧化物薄膜晶体管阵列的步骤;在氧化物薄膜晶体管阵列上涂敷聚酰亚胺类溶液来形成第二聚酰亚胺类层的步骤;在第二聚酰亚胺类层上形成有机发光二极管的步骤;以及去除载体基板的步骤,在形成氧化物薄膜晶体管阵列的步骤中,以使上述氧化物薄膜晶体管阵列来位于上述第一聚酰亚胺类层与上述第二聚酰亚胺类层之间的方式形成上述氧化物薄膜晶体管阵列。
Description
技术领域
本发明涉及防止氧化物薄膜晶体管阵列被外部的应力受损来提高装置寿命及可靠性的柔性显示装置及其制造方法。
背景技术
通常,柔性显示装置为在可挠性基板形成显示部来附加柔韧性的装置,具有必要时可弯曲或折其形态来使用的很有用的优点。这种柔性显示装置作为可代替便携式计算机或电子报、智能卡、书、报纸、杂质等的印刷介质的新一代显示装置备受期待。
另一方面,柔性显示装置需在被弯曲时依旧维持显示性能,但是,根据弯曲程度引起显示性能的不良。
尤其,在柔性显示装置中,在柔性基板上形成电子器件(例如,薄膜晶体管结构物),在柔性显示装置大大的被弯曲的情况下,弯曲引起的应力向电子器件传递来产生裂纹(crack)或降低电子器件的特性。在过多地弯曲或反复弯曲柔性显示装置或者使柔性显示装置大面积化的情况下,上述问题可更加严重,最终降低柔性显示装置的寿命及可靠性。
发明内容
技术问题
本发明提供将构成柔性显示装置的氧化物薄膜晶体管阵列配置于中性面来防止弯曲或折等的应力引起的损伤并提高装置的寿命及可靠性的柔性显示装置及其制造方法。
解决问题的手段
根据实施例的柔性显示装置的制造方法包括:在载体基板上涂敷聚酰亚胺类溶液来形成第一聚酰亚胺类层的步骤;在上述第一聚酰亚胺类层上形成氧化物薄膜晶体管阵列的步骤;在上述氧化物薄膜晶体管阵列上涂敷聚酰亚胺类溶液来形成第二聚酰亚胺类层的步骤;在上述第二聚酰亚胺类层上形成有机发光二极管的步骤;以及去除上述载体基板的步骤,在形成上述氧化物薄膜晶体管阵列的步骤中,以使上述氧化物薄膜晶体管阵列位于上述第一聚酰亚胺类层与上述第二聚酰亚胺类层之间的方式形成上述氧化物薄膜晶体管阵列。
在形成上述第二聚酰亚胺类层的步骤中,可由包含与上述第一聚酰亚胺类层相同的组成成分的聚酰亚胺的聚酰亚胺类溶液形成上述第二聚酰亚胺类层。
上述柔性显示装置的制造方法还可包括向上述第一聚酰亚胺类层上喷射包括碳纳米管的油墨来形成缓冲层的步骤。
形成上述第二聚酰亚胺类层的步骤可包括贯通上述第二聚酰亚胺类层来形成用于使上述氧化物薄膜晶体管结构物与上述有机发光二极管电连接的通路接触部的步骤。
上述柔性显示装置的制造方法还可包括在上述有机发光二极管结构物上形成触摸传感器的步骤。
在形成上述第二聚酰亚胺类层的步骤中,能够以与上述第一聚酰亚胺类层的厚度相同的厚度形成上述第二聚酰亚胺类层。
在形成上述第一聚酰亚胺类层的步骤中,可在上述第二聚酰亚胺类层厚度的50%以下的范围内形成上述第一聚酰亚胺类层。
在形成上述第二聚酰亚胺类层的步骤中,可在上述第一聚酰亚胺类层厚度的50%以下的范围内形成上述第二聚酰亚胺类层。
在形成上述第一聚酰亚胺层的步骤及形成第二聚酰亚胺类层的步骤中,可分别以1μm至30μm的厚度形成上述第一聚酰亚胺层及上述第二聚酰亚胺类层。
在形成第二聚酰亚胺类层的步骤中,能够以1μm至10μm的厚度形成上述第二聚酰亚胺类层。
在形成上述薄膜晶体管阵列的步骤中,可使至少一个氧化物薄膜晶体管形成于上述第一聚酰亚胺类层上。
根据实施例的柔性显示装置包括:氧化物薄膜晶体管阵列,形成于由聚酰亚胺类物质形成的第一聚酰亚胺类层上;第二聚酰亚胺类层,由形成于上述氧化物薄膜晶体管结构物上的聚酰亚胺类物质形成;以及有机发光二极管,形成于上述第二聚酰亚胺类层上,上述薄膜晶体管阵列位于上述第一聚酰亚胺类层与上述第二聚酰亚胺类层之间。
构成上述第一聚酰亚胺类层及上述第二聚酰亚胺类层的上述聚酰亚胺类物质可由相同组成成分的聚酰亚胺物质形成。
上述柔性显示装置可形成于上述第一聚酰亚胺类层与上述氧化物薄膜晶体管结构物之间。
上述第二聚酰亚胺类层可包括贯通上述第二聚酰亚胺类层来用于使上述氧化物薄膜晶体管结构物与上述有机发光二极管电连接的通路接触部。
上述柔性显示装置还可包括形成于上述有机发光二极管结构物上的触摸传感器。上述第一聚酰亚胺类层及上述第二聚酰亚胺类层能够以相同的厚度形成。
上述第一聚酰亚胺类层可在上述第二聚酰亚胺类层的厚度的50%以下范围内形成。
上述第二聚酰亚胺类层可在上述第一聚酰亚胺类层的厚度的50%以下范围内形成。
发明的效果
根据本发明,在柔性显示装置中,使氧化物薄膜晶体管阵列位于2个柔性基板之间来使其位于中性面,可防止氧化物薄膜晶体管阵列被外部应力受损来提高装置寿命及可靠性。尤其,即使柔性显示装置反复弯曲,位于中性面的氧化物薄膜晶体管阵列并不受应力的影响。
附图说明
图1a及图1b为示出本发明实施例的柔性显示装置的图;
图2为示出本发明另一实施例的柔性显示装置的图;
图3a至图3k为示出本发明实施例的柔性显示装置的制造过程的图;
图4a及图4b为示出去除载体基板之后检测的比较例及实施例各自的柔性显示装置所包括的氧化物薄膜晶体管的电流电压特性的图;
图5a及图5b为示出对柔性显示装置进行弯曲试验(bending test)之后检测的比较例及实施例各自的柔性显示装置所包括的氧化物薄膜晶体管的电流电压特性及电场效果移动率的图;
图6a及图6b为示出对柔性显示装置进行弯曲试验之后检测的比较例的氧化物薄膜晶体管和实施例的氧化物薄膜晶体管的电特性的图;
图7为示出设置有触摸传感器的柔性显示装置的图。
具体实施方式
以下,参照附图及附图所记载的内容对本发明的实施例进行详细说明,单本发明并不受限于实施例或限定于此。
器件(elements)或层位于另一器件或层的“上(on)”或“上侧(on)”不仅包括另一器件或层上,还包括两者之间还介入其他器件或层的情况。相反,器件位于“直接上侧(directly on)”或“正上方”表示两者中间未介入其他器件或层。
如图所示,空间上相对的术语“下面(below)”、“下方(beneath)”、“下部(lower)”,“上面(above)”、“上部(upper)”等可为了容易记述一个器件或结构要素和另一器件或结构要素的相关关系而使用。应当理解的是,空间上相对的术语不仅包括在图中示出的方向,还包括使用时或进行工作时的器件的互不相同的方向。例如,在翻转图中示出的器件的情况下,以另一器件的“下面(below或beneath)”记述的器件可放置于其他器件的“上面(above)”。因此,例示性术语“下面”可包括上下两种方向。器件可朝向另一方向,在此情况下,空间上相对的术语可根据朝向解释。
在本说明书中使用的术语用于说明实施例,并不限定本发明。在本说明书中,除非特别提出,单数型的句子还包括复数型。在说明书中所使用的“包括(comprises)”和/或“包括……(comprising)”中,所提及的结构要素、步骤、动作和/或器件不排除一个以上的其他结构要素、步骤、动作和/或器件的存在或追加。
若没有另行定义,在本说明书中使用的所有术语(包括技术及科学术语)以本发明所属技术领域的普通技术人员共同所理解的含义使用。并且,除非另行定义,通过通常所使用的词典所定义的术语并不被理想或夸张解释。
另一方面,在对本发明进行说明的过程中,当判断为与相关的公知功能或结构有关的具体说明不必要地混淆本发明的要旨,将省略其详细说明。而且,在本说明书中所使用的术语(terminology)为为了适当地表达本发明的实施例而使用,这可根据使用人员、操作人员的意图或本发明所属领域的惯例等不同。因此,与本术语有关的定义需根据本说明书全文内容来定义。
图1a及图1b为示出本发明实施例的柔性显示装置的图。图1a及图1b所示的柔性显示装置100包括第一聚酰亚胺类层110、氧化物薄膜晶体管阵列120、第二聚酰亚胺类层130以及有机发光二极管140。
在柔性显示装置100中,第一聚酰亚胺类层110及第二聚酰亚胺类层130保护位于它们之间的氧化物薄膜晶体管阵列120。
第一聚酰亚胺类层110及第二聚酰亚胺类层130由聚酰亚胺类物质形成,可具有相同的物质组成成分。并且,第一聚酰亚胺类层110及第二聚酰亚胺类层130能够以相同的厚度形成,还能够以互不相同的厚度形成。
根据如上所述的结构,氧化物薄膜晶体管阵列120随着位于第一聚酰亚胺类层110与第二聚酰亚胺类层130之间而位于压缩应力及拉伸应力相同的中性面(Neutral Plane,NP)。
如图1b,若柔性显示装置100被弯曲,则拉伸应力对第一聚酰亚胺类层110起到作用,压缩应力对第二聚酰亚胺类层130起到作用,在中性面中,实质上并不产生拉伸和压缩,因此实质上不产生变形。因此,即使柔性显示装置100被弯曲,位于中性面的氧化物薄膜晶体管阵列120并不变形,从而可防止氧化物薄膜晶体管阵列120的电特性降低或受损。
图2为示出本发明另一实施例的柔性显示装置的图。图2所示的柔性显示装置200包括第一聚酰亚胺类层110、氧化物薄膜晶体管阵列120、第二聚酰亚胺类层130以及有机发光二极管140。
图2所示的柔性显示装置200可包括碳纳米管-石墨烯氧化物层210、第一聚酰亚胺类层220、缓冲层230、氧化物薄膜晶体管阵列240、第二聚酰亚胺类层220以及有机发光二极管260。
碳纳米管-石墨烯氧化物层(Carbon Nano Tube-Graphene Oxide,CNT-GO)210为具有透明性的支撑层。上述碳纳米管-石墨烯氧化物层210具有弯曲的性质,为适合于柔性显示装置200的结构。
第一聚酰亚胺类层220由聚酰亚胺类物质形成。
氧化物薄膜晶体管阵列240包括至少一个氧化物薄膜晶体管241及晶体管驱动阵列242。其中,至少一个氧化物薄膜晶体管241可具有单一栅电极结构或双栅电极结构。
第二聚酰亚胺类层250由具有与第一聚酰亚胺类层220的组成成分相同的聚酰亚胺类物质形成,具有与第一聚酰亚胺类层220相同的厚度。其中,第一聚酰亚胺类层220及第二聚酰亚胺类层250的厚度可在1μm至30μm范围内,优选地,可在1μm至10μm范围内。因此,第一聚酰亚胺类层220和第二聚酰亚胺类层250可具有相同的弹性率,中性面位于氧化物薄膜晶体管阵列240,上述氧化物薄膜晶体管阵列240位于第一聚酰亚胺类层220与第二聚酰亚胺类层250之间。
氧化物薄膜晶体管阵列240位于中性面,即使柔性显示装置200被弯曲,氧化物薄膜晶体管阵列240没有长度或体积等的变化,并不防止弯曲引起的应力。尤其,即使累积柔性显示装置200被弯曲的次数,氧化物薄膜晶体管阵列240并不变形,从而在氧化物薄膜晶体管阵列240产生裂纹而使寿命缩短或不降低电可靠性。
另一方面,第二聚酰亚胺类层250包括通路接触部251,上述通路接触部251可与包括于氧化物薄膜晶体管241的源/漏电极及栅电极接触。并且,上述通路接触部251可与包括于有机发光二极管260的像素电极261接触,上述有机发光二极管260形成于第二聚酰亚胺类层250的上部。即,通路接触部251使氧化物薄膜晶体管阵列240与有机发光二极管260电连接。其中,有机发光二极管260可在第二聚酰亚胺类层250的上侧形成一个以上。
有机发光二极管260包括:像素电极261;有机发光层262,形成于像素电极261的上侧;相向电极263,形成于有机发光层262的上侧;以及密封层264。其中,像素电极261与之前形成的通路接触部351接触来与氧化物薄膜晶体管241电连接。
其中,像素电极261可为正极(anode)且相向电极263可为负极(cathod),还可与此相反。若向像素电极261及相向电极263输入电压,则随着空穴和电子分别向有机发光层262的内部注入,在有机发光层262中发射光。
图3a至图3j为示出本发明实施例的柔性显示装置的制造过程的图。
图3a及图3b为示出在载体基板310上涂敷含有碳纳米管(Carbon Nano Tube,CNT)的石墨烯氧化物(Graphene Oxide)来形成碳纳米管-石墨烯氧化物层311的工序的立体图及剖视图。
载体基板310可由多孔性陶瓷物质形成。多孔性陶瓷物质在高温中稳定且具有强机械强度,从而可防止适用于柔性显示装置的制造过程中的温度及冲击引起的载体基板310的变形。
碳纳米管-石墨烯氧化物层311能够以将分散有碳纳米管的溶液自旋涂敷于载体基板310上之后在碳纳米管的上侧蒸镀石墨烯氧化物的方式形成。
图3c为示出在碳纳米管-石墨烯氧化物层311上涂敷作为塑料材质中的一种的聚酰亚胺类溶液来形成第一聚酰亚胺类层320的工序的图。其中,第一聚酰亚胺类层320能够以第一厚度形成。
图3d为示出在第一聚酰亚胺类层320的上侧形成缓冲层330的工序的图。缓冲层330能够以将包括碳纳米管的油墨喷射在第一聚酰亚胺类层320上的方式形成。
在本发明中,缓冲层320可防止如水分或氧的外部异物透射第一聚酰亚胺类层320来向所要形成于第一聚酰亚胺类层320的上侧的氧化物薄膜晶体管阵列340渗透的现象。
图3e为示出在第一聚酰亚胺类层320的上侧形成氧化物薄膜晶体管阵列340的工序的图。其中,氧化物薄膜晶体管阵列340可包括至少一个氧化物薄膜晶体管341及晶体管驱动阵列342。
其中,构成氧化物薄膜晶体管阵列340的至少一个氧化物薄膜晶体管341可具有单一栅电极结构或双栅电极结构。
并且,在氧化物薄膜晶体管341中,氧化物半导体层可包含非晶铟镓氧化锌(amorphous indium-gallium-zinc oxide,a-IGZO)、氧化锌(ZnO)、氧化铟锌锌(IZO)、氧化铟锡(ITO)、氧化锌锡(ZTO)、氧化锌镓(GZO)、氧化锌铟铪(HIZO)、氧化铟锡锌(ZITO)及铝锌锡氧化物(AZTO)中的一种。
图3f为示出在氧化物薄膜晶体管阵列340上涂敷聚酰亚胺类溶液来形成第二聚酰亚胺类层350的工序的图。构成第二聚酰亚胺类层350的聚酰亚胺类物质可为与第一聚酰亚胺类层320的组成成分相同的聚酰亚胺类物质。
并且,第二聚酰亚胺类层350能够以第二厚度形成。其中,第一聚酰亚胺类层320的第一厚度可以与第二聚酰亚胺类层350的第二厚度相同,也可互不相同。
在第一厚度与第二厚度具有互不相同的厚度的情况下,以一种层为基准,另一层的厚度可在50%以下的范围内。具体地,第一聚酰亚胺类层320能够在第二聚酰亚胺类层350的厚度的50%以下范围内形成或第二聚酰亚胺类层350能够在第一聚酰亚胺类层320的厚度的50%以下范围内形成。
其中,第一厚度或第二厚度的在1μm至30μm范围内,优选地,可在1μm至10μm范围内。图3g及图3h为示出在第二聚酰亚胺类层350形成至少一个通路接触部351的工序的图。首先,在第二聚酰亚胺类层350中,蚀刻所要形成通路接触部351的区域来形成通孔351a。在图中仅示出一个通孔351a,通孔351a用于露出包括于氧化物半导体晶体管340的源/漏电极、栅电极,在实际工序中,通孔351a可由多个形成。
之后,可向通孔351a填充金属物质来在第二聚酰亚胺类层350的内侧形成通路接触部351。其中,通路接触部351用于使氧化物半导体晶体管340与所要通过之后的工序形成的有机发光二极管360电连接的结构。
图3i为示出在第二聚酰亚胺类层360的上侧形成有机发光二极管360的工序的图。有机发光二极管360可包括至少一个有源矩阵有机发光二极管(AM有机发光二极管,ActiveMatrix Organic Light-Emitting Diode)或至少一个有机发光二极管(OLED,OrganicLight-Emitting Diode)。以下,以有机发光二极管360包括1个有源矩阵有机发光二极管的形态为例进行说明。
有机发光二极管360包括:像素电极361:有机发光层362,形成于像素电极361的上侧;相向电极363,形成于有机发光层362的上侧;以及密封层364。其中,像素电极361与之前形成的通路接触部351接触来与氧化物薄膜晶体管341电连接。因此,有机发光二极管360可根据氧化物薄膜晶体管341的控制被驱动来发射光。
图3j为示出从碳纳米管-石墨烯氧化物层311去除载体基板310的工序的图。载体基板310可利用额外的装置被物理去除。
可根据如上所述的工序顺序制造如图3k所示的柔性显示装置300.柔性显示装置300具有氧化物薄膜晶体管阵列340位于由相同物质形成的第一聚酰亚胺类层320与第二聚酰亚胺类层350之间的结构。此时,氧化物薄膜晶体管阵列340位于压缩应力及拉伸应力实质上相同的中性面。在中性面中并不产生变形,从而即使柔性显示装置300被弯曲也可防止压缩应力及拉伸应力引起的氧化物薄膜晶体管阵列340受损的现象。
以下,图4至图6为基于对包括于根据比较例的柔性显示装置的氧化物薄膜晶体管和包括于本发明实施例的柔性显示装置的氧化物薄膜晶体管的电特性进行检测的实验数据的曲线图。其中,根据比较例和实施例的柔性显示装置如下述内容。
比较例
一种具有在一个柔性基板上依次形成氧化物薄膜晶体管阵列及有机发光二极管的结构的柔性显示装置。
实施例
一种通过图3a至图3k所示的工序制造并具有在第一聚酰亚胺类层与第二聚酰亚胺类层之间形成氧化物薄膜晶体管且在第二聚酰亚胺类层上形成有机发光二极管的结构的柔性显示装置。其中,氧化物薄膜晶体管可在第一聚酰亚胺类层与第二聚酰亚胺类层之间位于压缩应力及拉伸应力相同的中性面。
图4a及图4b为示出在柔性显示装置中去除载体基板之后进行检测的包括于比较例及实施例各自的柔性显示装置的氧化物薄膜晶体管的电流-电压特性的图。
图4a利用了氧化物薄膜晶体管的下部结构不同的2个柔性显示装置。具体地,参照图4a,利用了具有在氧化物薄膜晶体管(TFTs)的下部依次层叠柔性基板PI(或第一聚酰亚胺类层PI1)、碳纳米管-石墨烯氧化物层、玻璃基板(Glass)的第一结构的柔性显示装置和在氧化物薄膜晶体管的下部依次层叠柔性基板PI(或第一聚酰亚胺类层PI1)、石墨烯氧化物(Graphene Oxide,GO)、碳纳米管的第二结构的柔性显示装置。
参照图4a,包括于比较例的氧化物薄膜晶体管在0V的栅极电压中示出约
-12的记录漏电流,在20V的栅极电压中示出约-6A的记录漏电流。
图4b也利用了氧化物薄膜晶体管的下部结构不同的2个柔性显示装置。具体地,参照图4b,利用了具有在氧化物薄膜晶体管的下部依次层叠柔性基板PI(或第一聚酰亚胺类层PI1)、碳纳米管-石墨烯氧化物层、玻璃基板和在氧化物薄膜晶体管的上部层叠另一柔性基板PI(或第二聚酰亚胺类层PI2)的第一结构的柔性显示装置。并且,利用了具有在氧化物薄膜晶体管的下部依次层叠柔性基板PI(或第一聚酰亚胺类层PI1)、碳纳米管-石墨烯氧化物层和在氧化物薄膜晶体管的上部层叠另一柔性基板PI(或第二聚酰亚胺类层PI2)的第二结构的柔性显示装置。
参照图4b,包括于实施例的多个氧化物薄膜晶体管在0V的栅极电压中示出约-14的记录漏电流,在20V的栅极电压中示出约-6A的记录漏电流,具有高于比较例的on-off比率。
另一方面,参照图4a,比较例的多个柔性显示装置相比于第一结构具有第二结构实具有高电流-电压特性。相反,在图4b中,实施例的柔性显示装置在第一结构和第二结构中没有大的电流-电压特性差异。这是因为氧化物薄膜晶体管位于第一聚酰亚胺类层与第二聚酰亚胺类层之间,氧化物薄膜晶体管不受其下部结构的影响。
图5a及图5b为示出对柔性显示装置进行弯曲试验之后检测的包括于比较例及实施例各自的柔性显示装置的氧化物薄膜晶体管的电流-电压特性及电场效果移动率的图。此时,当进行弯曲试验时,将弯曲半径(beding radius)设置为0.25mm,累积弯曲次数来检测了氧化物薄膜晶体管的电流-电压特性。
相比于包括于比较例的氧化物薄膜晶体管,包括于实施例的氧化物薄膜晶体管具有高的on-off比率。尤其,可以知道,弯曲次数越增加实施例的氧化物薄膜晶体管的电流-电压特性及电场效果移动率得到提高。
图6a及图6b为对柔性显示装置进行弯曲试验之后检测的包括于比较例及实施例各自的柔性显示装置的氧化物薄膜晶体管的电特性的图。此时,当进行弯曲试验时,将弯曲半径设置为0.25mm,累积弯曲次数来检测了氧化物薄膜晶体管的开启电压变化(ΔVON)、电场效果移动率(μFE)及亚阈值摆幅(Subthreshold Swing,SS)。
在包括于比较例的氧化物薄膜晶体管中,随着弯曲次数被累积,大大改变了开启电压变化、电场效果移动率及亚阈值摆幅,尤其,当弯曲5000次时,柔性显示装置受损。这是因为柔性显示装置反复弯曲的同时应力向氧化物薄膜晶体管长度来产生裂纹。
相反,在包括于实施例的氧化物薄膜晶体管中,即使弯曲次数被累积,开启电压变化、电场效果移动率及亚阈值摆幅没有大变化,尤其,即使被弯曲20000次,柔性显示装置也没有受损。这是因为,在实施例的柔性显示装置中,氧化物薄膜晶体管位于中性面来防止弯曲引起的变形。
图7为示出设置有触摸传感器的柔性显示装置的图。
图7所示的柔性显示装置700包括第一聚酰亚胺类层710、氧化物薄膜晶体管阵列720、第二聚酰亚胺类层730、有源矩阵有机发光二极管阵列740、密封层750以及触摸传感器760。即,柔性显示装置700可通过设置触摸传感器760来以触摸方式实现。
氧化物薄膜晶体管阵列720包括多个氧化物薄膜晶体管以及晶体管驱动电路。多个氧化物薄膜晶体管可执行作为像素器件的功能,可与晶体管驱动电路相连接。并且,晶体管驱动电路可包括栅极驱动部、数据驱动部以及计时控制部等的结构。
在图7中,氧化物薄膜晶体管阵列720位于中性面,从而可防止多个氧化物薄膜晶体管及晶体管驱动电路被外部应力受损的现象。因此,无需为了保护位于氧化物薄膜晶体管阵列720的外围部分的晶体管驱动电路而设置边框(装置700边缘),因此,可省略按照边框设置的工序并节减其费用。
如上所述,通过限定实施例和附图对多个实施例进行了说明,只要是本技术领域的普通技术人员可从上述记载进行多种修改及变更。例如,所说明的技术与所说明的方法不同的顺序执行和/或所说明的系统、结构、装置、电路等的结构要素以与所说明的方法不同的方式结合或组合,或者被其他结构要素或等同技术方案代替或取代,也可实现恰当的结果。
本研究得到了由通商源部[Ministry of Trade,Industry&Energy(MOTIE)]支援金的技新目(Technology Innovation Program)或略技目[Industrial StrategicTechnology Development Program(10080454,Development of High-resolutions OLEDMicro-Display and Controller SoC for AR/VR Device)]的支持。
因此,其他实例、其他实施例及与发明要求保护范围等同的技术也属于发明要求保护范围的范围。
Claims (19)
1.一种柔性显示装置的制造方法,其特征在于,包括:
在载体基板上涂敷聚酰亚胺类溶液来形成第一聚酰亚胺类层的步骤;
在上述第一聚酰亚胺类层上形成氧化物薄膜晶体管阵列的步骤;
在上述氧化物薄膜晶体管阵列上涂敷聚酰亚胺类溶液来形成第二聚酰亚胺类层的步骤;
在上述第二聚酰亚胺类层上形成有机发光二极管的步骤;以及
去除上述载体基板的步骤;
在形成上述氧化物薄膜晶体管阵列的步骤中,以使上述氧化物薄膜晶体管阵列位于上述第一聚酰亚胺类层与上述第二聚酰亚胺类层之间的方式形成上述氧化物薄膜晶体管阵列;
其中,上述第一聚酰亚胺类层和上述第二聚酰亚胺类层具有相同的弹性率,上述氧化物薄膜晶体管阵列在上述第一聚酰亚胺类层与上述第二聚酰亚胺类层之间位于压缩应力及拉伸应力相同的中性面。
2.根据权利要求1所述的柔性显示装置的制造方法,其特征在于,在形成上述第二聚酰亚胺类层的步骤中,由包含与上述第一聚酰亚胺类层相同的组成成分的聚酰亚胺的聚酰亚胺类溶液形成上述第二聚酰亚胺类层。
3.根据权利要求1所述的柔性显示装置的制造方法,其特征在于,还包括向上述第一聚酰亚胺类层上喷射包括碳纳米管的油墨来形成缓冲层的步骤。
4.根据权利要求1所述的柔性显示装置的制造方法,其特征在于,形成上述第二聚酰亚胺类层的步骤包括贯通上述第二聚酰亚胺类层来形成用于使上述氧化物薄膜晶体管阵列与上述有机发光二极管电连接的通路接触部的步骤。
5.根据权利要求1所述的柔性显示装置的制造方法,其特征在于,还包括在上述有机发光二极管上形成触摸传感器的步骤。
6.根据权利要求1所述的柔性显示装置的制造方法,其特征在于,在形成上述第二聚酰亚胺类层的步骤中,以与上述第一聚酰亚胺类层的厚度相同的厚度形成上述第二聚酰亚胺类层。
7.根据权利要求1所述的柔性显示装置的制造方法,其特征在于,在形成上述第一聚酰亚胺类层的步骤中,在上述第二聚酰亚胺类层的厚度的50%以下范围内形成上述第一聚酰亚胺类层。
8.根据权利要求1所述的柔性显示装置的制造方法,其特征在于,在形成上述第二聚酰亚胺类层的步骤中,在上述第一聚酰亚胺类层的厚度的50%以下范围内形成上述第二聚酰亚胺类层。
9.根据权利要求6至8中任一项所述的柔性显示装置的制造方法,其特征在于,在形成上述第一聚酰亚胺类层的步骤及形成第二聚酰亚胺类层的步骤中,分别以1μm至30μm的厚度形成上述第一聚酰亚胺层及上述第二聚酰亚胺类层。
10.根据权利要求9所述的柔性显示装置的制造方法,其特征在于,在形成上述第一聚酰亚胺类层的步骤及形成第二聚酰亚胺类层的步骤中,分别以1μm至10μm的厚度形成上述第一聚酰亚胺层及上述第二聚酰亚胺类层。
11.根据权利要求1所述的柔性显示装置的制造方法,其特征在于,在形成上述氧化物薄膜晶体管阵列的步骤中,使至少一个氧化物薄膜晶体管形成于上述第一聚酰亚胺类层上。
12.一种柔性显示装置,其特征在于,包括:
第一聚酰亚胺类层,由聚酰亚胺类物质形成;
氧化物薄膜晶体管阵列,形成于上述第一聚酰亚胺类层上;
第二聚酰亚胺类层,由聚酰亚胺类物质形成,并形成于上述氧化物薄膜晶体管阵列上;以及
有机发光二极管,形成于上述第二聚酰亚胺类层上;
其中,上述第一聚酰亚胺类层和上述第二聚酰亚胺类层具有相同的弹性率,上述氧化物薄膜晶体管阵列在上述第一聚酰亚胺类层与上述第二聚酰亚胺类层之间位于压缩应力及拉伸应力相同的中性面。
13.根据权利要求12所述的柔性显示装置,其特征在于,构成上述第一聚酰亚胺类层及上述第二聚酰亚胺类层的上述聚酰亚胺类物质由相同组成成分的聚酰亚胺物质形成。
14.根据权利要求12所述的柔性显示装置,其特征在于,还包括形成于上述第一聚酰亚胺类层与上述氧化物薄膜晶体管阵列之间的包括碳纳米管的缓冲层。
15.根据权利要求12所述的柔性显示装置,其特征在于,上述第二聚酰亚胺类层包括贯通上述第二聚酰亚胺类层来用于使上述氧化物薄膜晶体管阵列与上述有机发光二极管电连接的通路接触部。
16.根据权利要求12所述的柔性显示装置,其特征在于,还包括形成于上述有机发光二极管上的触摸传感器。
17.根据权利要求12所述的柔性显示装置,其特征在于,上述第一聚酰亚胺类层及上述第二聚酰亚胺类层以相同的厚度形成。
18.根据权利要求12所述的柔性显示装置,其特征在于,上述第一聚酰亚胺类层在上述第二聚酰亚胺类层的厚度的50%以下范围内形成。
19.根据权利要求12所述的柔性显示装置,其特征在于,上述第二聚酰亚胺类层在上述第一聚酰亚胺类层的厚度的50%以下范围内形成。
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CN105789252A (zh) * | 2015-01-09 | 2016-07-20 | 苹果公司 | 具有弯曲基板的有机发光二极管显示器 |
CN105118837A (zh) * | 2015-09-16 | 2015-12-02 | 京东方科技集团股份有限公司 | 一种柔性基底及其制备方法、显示装置 |
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CN108886110A (zh) | 2018-11-23 |
WO2017119609A1 (ko) | 2017-07-13 |
KR101727851B1 (ko) | 2017-04-17 |
US20180375042A1 (en) | 2018-12-27 |
US10305051B2 (en) | 2019-05-28 |
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