CN108847574A - 一种脊波导电极开窗的方法 - Google Patents
一种脊波导电极开窗的方法 Download PDFInfo
- Publication number
- CN108847574A CN108847574A CN201810670126.8A CN201810670126A CN108847574A CN 108847574 A CN108847574 A CN 108847574A CN 201810670126 A CN201810670126 A CN 201810670126A CN 108847574 A CN108847574 A CN 108847574A
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- photoresist
- ridge waveguide
- waveguide structure
- ridge
- layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810670126.8A CN108847574B (zh) | 2018-06-26 | 2018-06-26 | 一种脊波导电极开窗的方法 |
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CN201810670126.8A CN108847574B (zh) | 2018-06-26 | 2018-06-26 | 一种脊波导电极开窗的方法 |
Publications (2)
Publication Number | Publication Date |
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CN108847574A true CN108847574A (zh) | 2018-11-20 |
CN108847574B CN108847574B (zh) | 2020-06-26 |
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Family Applications (1)
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CN201810670126.8A Active CN108847574B (zh) | 2018-06-26 | 2018-06-26 | 一种脊波导电极开窗的方法 |
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CN (1) | CN108847574B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112038218A (zh) * | 2020-09-04 | 2020-12-04 | 武汉敏芯半导体股份有限公司 | 基于双胶层结构的脊型波导dfb激光器的制备工艺 |
US20210184431A1 (en) * | 2019-12-16 | 2021-06-17 | Kyoto University | Surface-emitting laser device and method for manufacturing surface-emitting laser device |
CN114336275A (zh) * | 2022-03-15 | 2022-04-12 | 度亘激光技术(苏州)有限公司 | 电极接触窗口的制作方法及半导体器件的制备方法 |
Citations (7)
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US5474954A (en) * | 1994-03-30 | 1995-12-12 | Samsung Electronics Co., Ltd. | Method of manufacturing semiconductor laser diode using self alignment |
JP2003115632A (ja) * | 2001-10-04 | 2003-04-18 | Nec Corp | 光半導体素子の製造方法 |
US20090219966A1 (en) * | 2008-03-03 | 2009-09-03 | Tan Wei-Sin | Laser diode with improved heat dissipation |
CN101682170A (zh) * | 2007-05-31 | 2010-03-24 | 康宁股份有限公司 | 使用背面紫外线曝光制造激光二极管金属触点结构的方法 |
CN101877456A (zh) * | 2009-03-30 | 2010-11-03 | 三菱电机株式会社 | 半导体发光元件的制造方法及半导体发光元件 |
CN101950924A (zh) * | 2006-10-16 | 2011-01-19 | 三菱电机株式会社 | 半导体光学元件的制造方法 |
CN107257082A (zh) * | 2017-07-05 | 2017-10-17 | 青岛海信宽带多媒体技术有限公司 | 一种脊波导激光器电极接触窗口的制作方法 |
-
2018
- 2018-06-26 CN CN201810670126.8A patent/CN108847574B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5474954A (en) * | 1994-03-30 | 1995-12-12 | Samsung Electronics Co., Ltd. | Method of manufacturing semiconductor laser diode using self alignment |
JP2003115632A (ja) * | 2001-10-04 | 2003-04-18 | Nec Corp | 光半導体素子の製造方法 |
CN101950924A (zh) * | 2006-10-16 | 2011-01-19 | 三菱电机株式会社 | 半导体光学元件的制造方法 |
CN101682170A (zh) * | 2007-05-31 | 2010-03-24 | 康宁股份有限公司 | 使用背面紫外线曝光制造激光二极管金属触点结构的方法 |
US20090219966A1 (en) * | 2008-03-03 | 2009-09-03 | Tan Wei-Sin | Laser diode with improved heat dissipation |
CN101877456A (zh) * | 2009-03-30 | 2010-11-03 | 三菱电机株式会社 | 半导体发光元件的制造方法及半导体发光元件 |
CN107257082A (zh) * | 2017-07-05 | 2017-10-17 | 青岛海信宽带多媒体技术有限公司 | 一种脊波导激光器电极接触窗口的制作方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20210184431A1 (en) * | 2019-12-16 | 2021-06-17 | Kyoto University | Surface-emitting laser device and method for manufacturing surface-emitting laser device |
US11670910B2 (en) * | 2019-12-16 | 2023-06-06 | Kyoto University | Surface-emitting laser device and method for manufacturing surface-emitting laser device |
CN112038218A (zh) * | 2020-09-04 | 2020-12-04 | 武汉敏芯半导体股份有限公司 | 基于双胶层结构的脊型波导dfb激光器的制备工艺 |
CN114336275A (zh) * | 2022-03-15 | 2022-04-12 | 度亘激光技术(苏州)有限公司 | 电极接触窗口的制作方法及半导体器件的制备方法 |
CN114336275B (zh) * | 2022-03-15 | 2023-02-21 | 度亘激光技术(苏州)有限公司 | 电极接触窗口的制作方法及半导体器件的制备方法 |
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Inventor after: Qu Di Inventor after: Bai Guoren Inventor after: Chen Mo Inventor after: Jin Chunyan Inventor after: Song Xueying Inventor before: Qu Di Inventor before: Bai Guoren Inventor before: Chen Mo Inventor before: Jin Chunyan Inventor before: Song Xueying |
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CP01 | Change in the name or title of a patent holder |
Address after: 300467 Days Tianjin Binhai New Area Eco-city Zhongtian Avenue 1620 Eco-Science and Technology Park Enlightenment Building, 12th Floor 101 Patentee after: Tianjin HuaHuixin Science and Technology Group Co.,Ltd. Address before: 300467 Days Tianjin Binhai New Area Eco-city Zhongtian Avenue 1620 Eco-Science and Technology Park Enlightenment Building, 12th Floor 101 Patentee before: HUAHUI CORE TECHNOLOGY (TIANJIN) Co.,Ltd. |
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Effective date of registration: 20200706 Address after: 300467 Days Tianjin Binhai New Area Eco-city Zhongtian Avenue 1620 Eco-Science and Technology Park Enlightenment Building, 12th Floor 101 Co-patentee after: Huahui Kerui (Tianjin) Technology Co.,Ltd. Patentee after: Tianjin HuaHuixin Science and Technology Group Co.,Ltd. Address before: 300467 Days Tianjin Binhai New Area Eco-city Zhongtian Avenue 1620 Eco-Science and Technology Park Enlightenment Building, 12th Floor 101 Patentee before: Tianjin HuaHuixin Science and Technology Group Co.,Ltd. |
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