CN108803050A - A kind of beam modulation element - Google Patents

A kind of beam modulation element Download PDF

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Publication number
CN108803050A
CN108803050A CN201810976725.2A CN201810976725A CN108803050A CN 108803050 A CN108803050 A CN 108803050A CN 201810976725 A CN201810976725 A CN 201810976725A CN 108803050 A CN108803050 A CN 108803050A
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CN
China
Prior art keywords
light
substrate
modulation element
diffusion
pattern
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Withdrawn
Application number
CN201810976725.2A
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Chinese (zh)
Inventor
王小明
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Shenzhen Fushi Technology Co Ltd
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Shenzhen Fushi Technology Co Ltd
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Publication of CN108803050A publication Critical patent/CN108803050A/en
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00—Scenes; Scene-specific elements
    • G06V20/60—Type of objects
    • G06V20/64—Three-dimensional objects
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor
    • G03B15/02—Illuminating scene
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2433—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring outlines by shadow casting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
    • F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
    • F21K9/20—Light sources comprising attachment means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/2006—Lamp housings characterised by the light source
    • G03B21/2013—Plural light sources
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/2518—Projection by scanning of the object
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V19/00—Fastening of light sources or lamp holders
    • F21V19/001—Fastening of light sources or lamp holders the light sources being semiconductors devices, e.g. LEDs
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V23/00—Arrangement of electric circuit elements in or on lighting devices
    • F21V23/04—Arrangement of electric circuit elements in or on lighting devices the elements being switches
    • F21V23/0442—Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors
    • F21V23/0471—Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors the sensor detecting the proximity, the presence or the movement of an object or a person
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/254—Projection of a pattern, viewing through a pattern, e.g. moiré
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/2006—Lamp housings characterised by the light source
    • G03B21/2033—LED or laser light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/206—Control of light source other than position or intensity
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/208—Homogenising, shaping of the illumination light
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/10—Image acquisition
    • G06V10/12—Details of acquisition arrangements; Constructional details thereof
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/16—Human faces, e.g. facial parts, sketches or expressions
    • G06V40/161—Detection; Localisation; Normalisation
    • G06V40/166—Detection; Localisation; Normalisation using acquisition arrangements
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/16—Human faces, e.g. facial parts, sketches or expressions
    • G06V40/174—Facial expression recognition
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00—Light-generating elements of semiconductor light sources
    • F21Y2115/30—Semiconductor lasers

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Multimedia (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Human Computer Interaction (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)

Abstract

This application provides a kind of beam modulation element, the first light beam and the second light beam for being sent out a light-source structure are respectively formed the flood beam of optical power detection and can project the pattern beam of predetermined pattern.The beam modulation element includes substrate and the diffusion part being formed on substrate and patterning portion.The diffusion part is correspondingly arranged in the traveling light path of the first light beam with the flood beam by the first beam spread at optical power detection.The patterning portion is correspondingly arranged in the traveling light path of the second light beam so that the light field of the second light beam is carried out rearrangement to form the pattern beam that can project predetermined pattern.

Description

A kind of beam modulation element
Technical field
The application belongs to optical technical field more particularly to a kind of beam modulation element.
Background technology
Existing three-dimensional (Three Dimensional, 3D) sensing module usually require to be respectively set floodlight transmitter and Light pattern transmitter realizes 3D sensings by two different light paths to coordinate.However, the floodlight transmitter being respectively set With light pattern transmitter, and it two different projecting light paths are respectively adopted not only can increase cost but also the larger also shadow of shared volume The Miniaturization Design using 3D sensing module devices is rung.
Invention content
Technical problems to be solved in this application are to provide a kind of beam modulation element, can using the same light path come It realizes floodlight and light pattern projection function, reach miniaturization and reduces the advantageous effect of cost.
The application embodiment provides a kind of beam modulation element, the first light beam for being sent out a light-source structure and Second light beam is respectively formed the flood beam of optical power detection and can project the pattern beam of predetermined pattern.The light beam Modulation element includes substrate and the diffusion part being formed on substrate and patterning portion.The diffusion part is correspondingly arranged at the first light beam Traveling light path in the flood beam by the first beam spread at optical power detection.The patterning portion is correspondingly arranged at In the traveling light path of two light beams predetermined pattern can be projected to be formed so that the light field of the second light beam is carried out rearrangement Pattern beam.
In some embodiments, the patterning portion is arranged in the centre position of beam modulation element.The diffusion part Around the periphery being arranged in patterning portion.
In some embodiments, the diffusion part is arranged in the centre position of beam modulation element.The patterning portion Around being arranged in the periphery of diffusion part.
In some embodiments, the diffusion part has light diffusion by being formed in corresponding position on substrate Optical grains are spread to realize the diffusion to the first light beam.The drafting department can by being formed in corresponding position on substrate The patterned optical lines of rearrangement light field realizes the rearrangement to the second light beam light field.
In some embodiments, the patterned optical lines is selected from diffraction optics lines, optical micro lens array, light Grid and combinations thereof.
In some embodiments, the diffusion part and patterning portion are formed in the different zones on the same substrate.
In some embodiments, the diffusion part and patterned features are not formed on different substrates.The formation There is the substrate in patterning portion to be defined as patterned substrate.The substrate for being formed with diffusion part is defined as diffusion substrate.The figure Case substrate and diffusion substrate are layered on top of each other together.The patterned substrate corresponds to the position that diffusion part is formed on diffusion substrate It sets place and keeps light transmission.Holding light transmission at the position in patterning portion is formed on the diffusion substrate corresponding pattern substrate.
In some embodiments, the predetermined pattern that the pattern beam projects be selected from irregular distribution spot pattern, The striped design of regular array and one kind and combinations thereof in the cross one another regular grid pattern of different directions.
In some embodiments, the surface of the substrate is formed with detection circuit.The detection line route conductive material It is made.The detection circuit be equipped with multiple test points, by any two of which test point is detected may know that this two Whether the substrate surface between a test point is complete.
In some embodiments, the conductive material can be selected from indium tin oxide or metal.
The beam modulation element that the application embodiment is provided by flood projection light path and pattern light projection path multiplexing, Not only occupied volume smaller is conducive to the appearance design of equipment, but also also further reduces the cost of device.
The additional aspect and advantage of the application embodiment will be set forth in part in the description, partly will be from following Become apparent in description, or recognize by the practice of the application embodiment.
Description of the drawings
Fig. 1 is the vertical view for the light-source structure that the application first embodiment provides.
Fig. 2 is the vertical view for the light-source structure that the application second embodiment provides.
Fig. 3 is the vertical view for the light-source structure that the application third embodiment provides.
Fig. 4 is that the light-source structure in Fig. 3 is tactic along the sectional view of IV-IV lines and the light-source structure and top The position relationship schematic diagram of first optical element.
Fig. 5 is the vertical view for the light-source structure that the 4th embodiment of the application provides.
Fig. 6 is the vertical view for the light-source structure that the 5th embodiment of the application provides.
Fig. 7 is the vertical view for the light-source structure that the application sixth embodiment provides.
Fig. 8 is sectional view of the light-source structure in Fig. 7 along VIII-VIII lines.
Fig. 9 is the vertical view for the light-source structure that the 7th embodiment of the application provides.
Figure 10 is the vertical view for the light-source structure that the 8th embodiment of the application provides.
Figure 11 is the structural schematic diagram for the optical projection module that the 9th embodiment of the application provides.
Figure 12 is the schematic diagram that the beam modulation component structure of optical projection module described in Figure 11 changes with light-source structure.
Figure 13 is the signal of the detection circuit on the transparent substrate of the beam modulation element of the optical projection module in Figure 11 Figure.
Figure 14 is the structural schematic diagram for the optical projection module that the tenth embodiment of the application provides.
Figure 15 is the structural schematic diagram for the optical projection module that the 11st embodiment of the application provides.
Specific implementation mode
Present patent application requires the applying date on July 30th, 2018, application No. is 201810854491.4, invention names A kind of referred to as domestic priority of the earlier application of " light-source structure, optical projection module, biological identification device and equipment ", the part All the elements of application are described herein by reference.
Presently filed embodiment is described below in detail, the example of the embodiment is shown in the accompanying drawings, wherein from beginning Same or similar element or element with the same or similar functions are indicated to same or similar label eventually.Below by ginseng The embodiment for examining attached drawing description is exemplary, and is only used for explaining the application, and should not be understood as the limitation to the application.? In the description of the present application, it is to be understood that term " first ", " second " are only used for describing, and should not be understood as instruction or dark Show relative importance or implicitly indicates the quantity of indicated technical characteristic or put in order.Define as a result, " first ", The technical characteristic of " second " can explicitly or implicitly include one or more technical characteristic.In retouching for the application In stating, the meaning of " plurality " is two or more, unless otherwise specifically defined.
In the description of the present application, it should be noted that unless otherwise specific regulation or limit, term " installation ", " phase Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integration connection；It can Can also be to be electrically connected or be in communication with each other to be mechanical connection；It can be directly connected, the indirect phase of intermediary can also be passed through Even, can be the interaction relationship between connection or two elements inside two elements.For the ordinary skill of this field For personnel, the concrete meaning of above-mentioned term in this application can be understood as the case may be.
Following disclosure provides many different embodiments or example is used for realizing the different structure of the application.In order to Simplify disclosure herein, hereafter only to the component of specific examples and being set for describing.Certainly, they are merely examples, and And purpose does not lie in limitation the application.In addition, the application can reuse reference number and/or reference word in different examples Mother, this reuse are to simplify and clearly state the application, itself do not indicate the various embodiments discussed And/or the particular kind of relationship between setting.In addition, various specific techniques and material that the application is provided in the following description are only To realize the example of technical scheme, but those of ordinary skill in the art should be aware that the technical solution of the application It can be realized by other techniques for not describing hereafter and/or other materials.
Further, described feature, structure can be incorporated in one or more embodiment party in any suitable manner In formula.In the following description, many details are provided so as to fully understand presently filed embodiment.However, this Field technology personnel will be appreciated that even if without one or more in the specific detail, or using other structures, group Member etc. can also put into practice the technical solution of the application.In other cases, it is not shown in detail or describes known features or operation To avoid the emphasis of fuzzy the application.
It should be understood that embodiments described herein and/or method are exemplary in itself, it is not construed as pair The limitation of technical scheme.Embodiment or method described herein are only that the application the relevant technologies thought is covered It is one or more in numerous technical solutions, therefore each step of described method and technology scheme can be according to being indicated Order executes, and can execute, may be performed simultaneously, or be omitted in some cases, above-mentioned change according to other order It is regarded as the range that the application technical solution claimed is covered.
As shown in Figure 1, the application first embodiment provides a kind of light-source structure 1, for emitting light beam to one tested It is sensed on object.The light beam can be the light beam with specific wavelength according to sensing principle and application scenarios.At this In embodiment, the light beam is used to sense the three-dimensional information of measured target object, can be infrared or near-infrared wavelength light beam, wave Ranging from 750 nanometers (Nanometer, nm) is grown to 1650nm.
The light-source structure 1 includes the first emission part 10 and the second emission part 12.First emission part 10 sends out first Light beam is used to form the flood beam of optical power detection.The flood beam is projected on measured target object tested for sensing The floodlight image of object.For example, the flood beam can be used for sensing whether the measured target object is face.Described second The second light beam that emission part 12 is sent out is used to form the pattern beam that predetermined pattern can be projected on measured target object.It is described Predetermined pattern can be used for the three-dimensional information for sensing the measured target object.
First emission part 10 is formed in the same substrate 14 with the second emission part 12 or is connected with each other to be integrated into Overall structure.The first light-emitting zone 122 in the middle part of semiconductor base 14 is defined on the semiconductor base 14 and is enclosed Around the second light-emitting zone 102 of first light-emitting zone 122 setting.
The integration mode of first emission part, 10 and second emission part 12 includes being directly connected to, be indirectly connected with or distinguishing shape At first-class in the same substrate 14.In the present embodiment, first light beam and the second light beam are the identical near-infrared of wavelength Light.
In the present embodiment, first emission part 10 includes multiple the first illuminators for emitting the first light beam 100.Second emission part 12 includes multiple the second illuminators 120 for emitting the second light beam.First illuminator 100 It is formed on the same semiconductor base 14 with the second illuminator 120.First illuminator 100 in semiconductor base 14 It is uniformly distributed according to preset same intervals in two light-emitting zones 102.Second illuminator 120 is in the semiconductor base 14 The first light-emitting zone 122 in irregular distribution.
First illuminator, 100 and second illuminator 120 can be semiconductor laser.Preferably, in this embodiment party In formula, first illuminator, 100 and second illuminator 120 is vertical cavity surface emitting laser (Vertical Cavity Surface Emitting Laser, VCSEL), it is made up of the techniques such as photoetching and etching on the semiconductor base 14.Institute It is that wavelength is identical infrared to state the flood beam that the first illuminator 100 is sent out and the pattern beam that the second illuminator 120 is sent out Or near infrared light, wave-length coverage are 750nm to 1650nm.
In the present embodiment, first light-emitting zone 122 positioned at 14 middle part of semiconductor base is rectangle.Described Two light-emitting zones 102 are correspondingly arranged at four edges of the first light-emitting zone 122.First illuminator 100 is in the second hair It uniformly arranges according to same intervals along two sides of 102 each corner of the second light-emitting zone four corners in light region 102 Multilayer, first light-emitting zone 122 be dotted line described in Fig. 1 surround envelope the first light-emitting zone 102 each be straight Four right angle frame bar-shaped zones at angle.Second illuminator 102 is irregularly arranged in the first light-emitting zone 122, is used for Launch the second light beam with irregular distribution pattern when lighting.
It is provided with and connect with external circuit for controlling in first light-emitting zone 122 on the semiconductor base 14 First pad 104 of light.It is provided with and connect with external circuit for controlling described on the semiconductor base 14 Second pad 124 of the light in two light-emitting zones 102.So being located at the first light-emitting zone 122 in present embodiment The second interior illuminator 120 and the first illuminator 100 in the second light-emitting zone 102 can pass through different control signals Independently work.
As shown in Fig. 2, the second embodiment of the application provides a kind of light-source structure 2, and in first embodiment Light-source structure 1 it is essentially identical, difference lies in first illuminators 200 to be evenly distributed according to preset same intervals In first light-emitting zone 222.The irregular distribution of second illuminator 220 is in the second light-emitting zone 202.
Shown in Fig. 3 and Fig. 4, the application third embodiment provides a kind of light-source structure 3, with first Light-source structure 1 in embodiment is essentially identical, is in first luminous zone difference lies in second light-emitting zone 302 The blocked areas that first light-emitting zone 322 1 encloses is surrounded outside domain 322.Second light-emitting zone, 302 and first luminous zone The size of minimum spacing D is it is ensured that the light beam and the second light-emitting zone 302 sent out from the first light-emitting zone 322 between domain 322 The light beam sent out is arranged above light-source structure 3 before tactic first optical element 31 between each other not in arrival It crosses.
Since manufacturing process is there are a degree of error, first illuminator 300 is sent out with the second illuminator 320 The dispersion angle of light beam can not accomplish it is just the same, but can be within the scope of preset dispersion angle.Because of first illuminator 300 It is bigger with the dispersion angle of 320 sent out light beam of the second illuminator, in light-source structure 3 and tactic first optics in top The spacing of element 31 is sent out to meet first light-emitting zone 322 with the second light-emitting zone 302 under the premise of remaining unchanged Go out light beam not cross, it is required that the distance between the first light-emitting zone 322 and the second light-emitting zone 302 D are bigger.Assuming that from first The maximum dispersion angle of 302 sent out light beam of light-emitting zone 322 and the second light-emitting zone is θ, the light-emitting surface of the light-source structure 3 It is H with the distance between tactic first optical element 31 is disposed there above, according to trigonometric function relationship, first Described first under the critical condition that 322 sent out light beam of light-emitting zone just intersects with 302 sent out light beam of the second light-emitting zone Minimum spacing D between light-emitting zone 322 and the second light-emitting zone 302 meets formulaSo the light beam in order to ensure being sent out from the first light-emitting zone 322 and The light beam that two light-emitting zones 302 are sent out reaches setting tactic first optical element 31 above light-source structure 3 It does not cross mutually before, the minimum spacing D between first light-emitting zone, 322 and second light-emitting zone 302 should meetWhen because meeting above-mentioned condition, sent out respectively from the first light-emitting zone 322 and second The light beam that light region 302 is sent out before reaching first optical element 31 being arranged light-source structure 3 above it is mutual not It crosses, beam direction is adjusted so need not again be arranged in the light emission side of the first light-emitting zone 322 or the second light-emitting zone 302 Other elements.
In the present embodiment, the irregular distribution of the second illuminator 320 is in the first luminous zone of semiconductor base 34 In domain 322.First illuminator 300 is equably arranged according to identical predetermined interval in the second light-emitting zone 302.
As shown in figure 5, the 4th embodiment of the application provides a kind of light-source structure 4, and in third embodiment Light-source structure 3 it is essentially identical, difference lies in first illuminators 400 to be evenly distributed according to preset same intervals In first light-emitting zone 422.The irregular distribution of second illuminator 420 is in the second light-emitting zone 402.
As shown in fig. 6, the 5th embodiment of the application provides a kind of light-source structure 5, and in first embodiment Light-source structure 1 is essentially identical, is that the semiconductor base 54 is formed with illuminator difference lies in second light-emitting zone 502 Surface on other regions other than the first light-emitting zone 522.First illuminator 500 is arranged in the second light-emitting zone In 502.Second illuminator 520 is arranged in first light-emitting zone 522.First illuminator 500 and second is sent out Body of light 520 is equably arranged all in accordance with preset same intervals.
In the present embodiment, the second light beam cooperation that the second illuminator 520 of first light-emitting zone 522 is sent out Be arranged the optical element above light-source structure 5 can be formed can be projected on measured target object irregular distribution hot spot figure Case, the striped design of regular array or the pattern beam along the cross one another regular grid pattern of different directions.
It is understood that in not shown other embodiment, it is arranged second in the first light-emitting zone 522 Illuminator 520 can not also regular distribution.
It is understood that in not shown other embodiment, first illuminator 500 can also be according to pre- If same intervals be evenly distributed in the first light-emitting zone 522.The irregular distribution of second illuminator 520 is in the second hair In light region 502.
Also referring to Fig. 7 and Fig. 8, the application sixth embodiment provides a kind of light-source structure 6, for emitting light beam It is sensed on to a measured target object.The light beam can be the light with specific wavelength according to sensing principle and application scenarios Beam.In the present embodiment, the light beam is used for recognition of face, can be that infrared or near-infrared wavelength light beam, wave-length coverage are 750 nanometers (Nanometer, nm) is to 1650nm.
The light-source structure 6 includes the first emission part 60 and the second emission part 62.First emission part 60 sends out first Light beam is used to form the flood beam of optical power detection.The flood beam is projected on measured target object for sensing quilt Survey the floodlight image of object.For example, the flood beam can be used for sensing whether the measured target object is face.Described Two emission parts 62 send out the second light beam and are used to form the pattern beam that can project predetermined pattern on measured target object.It is described Predetermined pattern can be used for the three-dimensional information for sensing the measured target object.In the present embodiment, first light beam and Two light beams are the identical near infrared light of wavelength.
First emission part 60 includes the first illuminator 600 and the light guide plate being formed on the first semiconductor base 601 602.The light guide plate 602 includes incidence surface 6020 and light-emitting surface 6022.In the present embodiment, the light guide plate 602 is substantially In rectangular shape, the incidence surface 6020 is perpendicular to light-emitting surface 6022.First illuminator 600 corresponds to light guide plate 602 Incidence surface 6020 is arranged, so that the first light beam that first illuminator 600 is sent out injects light guide plate from incidence surface 6020 In 602 flood beam is projected from light-emitting surface 6022 after evenly mixing.
Second emission part 62 is arranged in the centre position of 602 light-emitting surface 6022 of the light guide plate.Second transmitting Portion 62 includes the second illuminator of one or more 620 being formed on the second semiconductor base 621.In the present embodiment, institute It states multiple second illuminators 620 to be randomly distributed on the second semiconductor base 621, be used for and is arranged above light-source structure 6 Optical element cooperation the spot pattern irregularly arranged is projected on measured target object.It is understood that in other realities It applies in mode, the multiple second illuminator 620 can also evenly and at intervals arrange according to identical, can be used for and be arranged in light The optical element cooperation of 6 top of source structure projects the striped design of regular array on measured target object or along not Tongfang To cross one another regular grid pattern.
In the present embodiment, first illuminator, 600 and second illuminator 620 can be semiconductor laser, example Such as：VCSEL.Unlike, because first illuminator 600 is different from the position where the second illuminator 620, need shape respectively At on different the first semiconductor bases 601 and the second semiconductor base 621.The shape of first semiconductor base 601 It is corresponding with 6020 shape of incidence surface.
Also referring to Fig. 1 and Fig. 9, the 7th embodiment of the application provides a kind of light-source structure 7, implements with first Light-source structure 1 in mode is essentially identical, includes each second light-emitting zone 702 difference lies in first illumination region 70 Single first illuminator 700 being inside correspondingly arranged respectively, first illuminator 700 are the wide face type VCSEL of single hole, to replace the It is multiple according to evenly arranged first illuminator of preset same intervals in second light-emitting zone 102 described in one embodiment 100.The wide face type VCSEL of single hole is only there are one lightening hole, but the aperture that shines is larger, several times in making in first embodiment For one of the first illuminator 100 VCSEL.It is equal that the illumination effect of the wide face type VCSEL of single hole is equal to luminous intensity Even area source.The light-emitting surface shape of the wide face type VCSEL of single hole can be the shape of rule, such as rectangle；Or Irregular shape, such as the light-emitting surface shape of the wide face type VCSEL of the single hole is described second luminous in the present embodiment The right angle moulding shape in region 702.
Also referring to Fig. 1 and Figure 10, the 8th embodiment of the application provides a kind of light-source structure 8, real with first The light-source structure 1 applied in mode is essentially identical, includes being arranged in the first light-emitting zone difference lies in second emission part 82 Single second illuminator 820 in 822, second illuminator 820 are the wide face type VCSEL of single hole, to replace the first embodiment party The second illuminator 120 being randomly distributed in first light-emitting zone 122 described in formula.First emission part 80 includes each the Single first illuminator 800 being correspondingly arranged respectively in one light-emitting zone 802, first illuminator 800 are the wide face type of single hole VCSEL multiple is uniformly arranged with replace described in first embodiment in the second light-emitting zone 102 according to preset same intervals First illuminator 100 of cloth.The wide face type VCSEL of single hole is only there are one lightening hole, but the aperture that shines is larger, several times in the One of the first illuminator 100 and the second illuminator 120 VCSEL are used as in one embodiment.The wide face type of single hole The illumination effect of VCSEL is similar to the uniform area source of luminous intensity.The light-emitting surface shape of the wide face type VCSEL of single hole can be with For the shape of rule, such as rectangle；May be irregular shape, such as second light-emitting zone in the present embodiment 802 right angle moulding shape.
As shown in figure 11, the 9th embodiment of the application provides a kind of optical projection module 11, for projecting specific light It is sensed on beam to measured target object.The optical projection module 11 includes beam modulation element 110 and above-mentioned first to the Light-source structure 1 in eight embodiments.
The beam modulation element 110 is used to the different light beams that light-source structure 1 is sent out being respectively formed uniform intensity point The flood beam of cloth and the pattern beam that predetermined pattern can be projected.The beam modulation element 110 include diffusion part 111 and Patterning portion 112.First emission part 10 of 111 corresponding light source structure 1 of the diffusion part is arranged to be at the first light beam In light path.The first beam spread shape that the diffusion part 111 is used to send out first illuminator 100 of the first emission part 10 At the flood beam of optical power detection.Second emission part 12 of 112 corresponding light source structure 1 of the patterning portion is arranged so that its In light path in the second light beam.The patterning portion 112 is for sending out second illuminator 120 of the second emission part 12 The second light beam formation can be projected on measured target object the pattern beam of predetermined pattern for sense measured target object Three-dimensional information.
Corresponding to second illuminator 120 setting pattern beam is used to form to send out in the first light-emitting zone 122 The second light beam, first illuminator 100 is arranged in the second light-emitting zone 102 to send out be used to form flood light pattern the The case where one light beam, the patterning portion 112 are arranged in the centre position of beam modulation element 110 to shine first with setting The second illuminator 120 in region 122 corresponds to.The diffusion part 111 surround be arranged patterning portion 112 periphery with setting The first illuminator 100 in the second light-emitting zone 102 corresponds to.
As shown in figure 12, it is arranged corresponding to second illuminator 220 and is used for shape in the second light-emitting zone 202 to send out At the second light beam of pattern beam, first illuminator 200 setting sent out in the first light-emitting zone 222 be used to form it is general The case where first light beam of light pattern, the diffusion part 111 are arranged in the centre position of beam modulation element 110 to exist with setting The first illuminator 200 in first light-emitting zone 222 corresponds to.The patterning portion 112, which surrounds, to be arranged in the periphery of diffusion part 111 With corresponding with the second illuminator 220 being arranged in the second light-emitting zone 202.
The function of the patterning portion 112 and diffusion part 111 in the corresponding position of transparent substrate 113 by forming specifically Optical grains are realized.In the present embodiment, the patterning portion 112 of the beam modulation element 110 and diffusion part 111 are arranged On the same transparent substrate 113.That is, the centre position of the transparent substrate 113 is formed with the figure for rearrangement light field Case optical grains 1120 are used as the patterning portion 112, and the transparent substrate 113 is in the patterned optical lines 1120 Periphery position corresponding with 2 first light-emitting zone 222 of light-source structure has been formed with the diffusion optical grains 1100 of light diffusion As the diffusion part 111.The patterned optical lines 1120 includes but not limited to diffraction optics lines, optical microlens battle array Row, grating and combinations thereof.
The case where being randomly distributed corresponding to the second illuminator 120 for sending out the second light beam, the patterned optical lines Second beam replication of the 1120 light intensity irregular distributions for being sent out the second illuminator 120 of irregular distribution is multiple and pre- If expanded- angle within the scope of expansion to form the spot pattern for being incident upon irregular distribution on measured target object.
Corresponding to sending out the second illuminator 520 of the second light beam according to the evenly arranged situation of preset same intervals, institute Patterned optical lines 1120 is stated by the light field rearrangement of the optical power detection of second light beam, with formed can be in quilt Survey the pattern beam of projection irregular distribution spot pattern on object.
Corresponding to sending out the second illuminator 520 of the second light beam according to the evenly arranged situation of preset same intervals, institute Stating patterned optical lines 1120 can also respectively send out described along the second illuminator 520 that the same preset direction arranges Light beam is fused to the pattern beam with regular array candy strip.
Corresponding to sending out the second illuminator 520 of the second light beam according to the evenly arranged situation of preset same intervals, institute Stating patterned optical lines 1120 can also be by 520 institute of the second illuminator arranged along cross one another two preset directions The light sent out is fused the pattern beam to be formed and can project regular grid pattern.
Corresponding to send out the second light beam the second illuminator 820 be uniformly light-emitting area source the case where, the patterning The light field rearrangement of the optical power detection of second light beam can also can be tested by optical grains 1120 with being formed The pattern beam of projection irregular distribution spot pattern on object.
As shown in figure 13, detection circuit 134 can also be formed on the surface of the transparent substrate 113.The detection circuit 134 can be made of an electrically conducting material, such as：Indium tin oxide (Indium Tin Oxide, ITO) film or metal etc..The inspection Slowdown monitoring circuit 134 is equipped with multiple test points 135, may know that at this 2 points by being detected to any two of which test point 135 Between 113 surface of transparent substrate passed through of circuit whether have to burst apart etc. and influence the flaw of optical element integrality.
As shown in figure 14, the tenth embodiment of the application provides a kind of optical projection module 15, with the 9th embodiment party Optical projection module 11 in formula is essentially identical, further includes light path director element 16 difference lies in the optical projection module 15.
The light path director element 16 is arranged between light-source structure 1 and beam modulation element 110, and with the light source knot At the corresponding position of light-emitting surface of first emission part 10 of structure 1.The light path director element 16 is used for the first emission part 10 The first light beam guiding of divergent shape outgoing is irradiated to the diffusion part 111 of the beam modulation element 110.The light path director element 16 setting be in order to avoid in the first emission part 10 of light-source structure 1 and the second emission part 12 apart from closer technical solution In, sent out from the first emission part 10 be used to form floodlight irradiation the first light beam of a part light can pass through beam modulation member The patterning portion 112 of part 110 projects away the pattern beam for forming luminous intensity irregular distribution, to influence flood beam Uniformity.The light path director element 16 includes but not limited to prism, lenticule and grating.The light path director element 16 is set Region is set to be consistent with the region where the first emission part 10 of light-source structure 1.
As shown in figure 15, the 11st embodiment of the application provides a kind of optical projection module 17, implements with the 9th Optical projection module 11 in mode is essentially identical, and difference lies in the diffusion part 171 of the beam modulation element 170 and patterns Change portion 172 is respectively formed on different transparent substrates.
The transparent substrate for being formed with patterning portion 172 is defined as patterned substrate 1721.The patterned substrate It is formed at position corresponding with the second emission part 12 of light-source structure 1 on 1721 and the light field of light beam is subjected to rearrangement Patterned optical lines 1720.In the present embodiment, it is arranged at 1 middle part of light-source structure corresponding to second emission part 12 Situation, the patterned optical lines 1720 are formed in the centre position of patterned substrate 1721.
The transparent substrate for being formed with diffusion part 171 is defined as diffusion substrate 1710.On the diffusion substrate 1710 with It is formed with the diffusion optical grains 1711 for playing light diffusion at the 10 corresponding position of the first emission part of light-source structure 1. Complete light transmission is kept in the region corresponding with patterned optical lines 1720 on patterned substrate 1721 of the diffusion substrate 1710, It is defined as transmission region 1712.In the present embodiment, correspond to first emission part 10 around the second emission part 12 to be arranged Light-source structure 1, the diffusion substrate 1710 the transmission region 1712 periphery it is right with 1 first emission part 10 of light-source structure The diffusion optical grains 1711 are formed at the position answered.
The patterned substrate 1721 and diffusion substrate 1710 can be stacked together, and can also be thrown along the optics The projecting light path of shadow module 17 is respectively and independently arranged at the different location in light path.It is understood that needing only assure that described Optical grains position is corresponded on diffusion substrate 1710 and patterned substrate 1721 to be mutually aligned, for diffusion substrate 1710 and pattern Change substrate 1721 not specially require along putting in order for the projecting light path.
Compared with existing sensing device further needs that the structure of floodlight transmitter and light pattern transmitter is respectively set, the application The sensing device further 18 provided and the transmitter for using the equipment 19 of the sensing device further 18 that will project flood beam and pattern beam It integrates, not only volume smaller is conducive to the appearance design of equipment, but also also further reduces the cost of device.
In the description of this specification, reference term " embodiment ", " certain embodiments ", " schematically implementation What the description of mode ", " example ", " specific example " or " some examples " etc. meant to describe in conjunction with the embodiment or example Particular features, structures, materials, or characteristics are contained at least one embodiment or example of the application.In this specification In, schematic expression of the above terms are not necessarily referring to identical embodiment or example.Moreover, the specific spy of description Sign, structure, material or feature can be combined in any suitable manner in any one or more embodiments or example.
The foregoing is merely the better embodiments of the application, all the application's not to limit the application All any modification, equivalent and improvement etc., should be included within the protection domain of the application made by within spirit and principle.

Claims (10)

1. a kind of beam modulation element, the first light beam and the second light beam for being sent out a light-source structure are respectively formed light intensity Equally distributed flood beam and the pattern beam that can project predetermined pattern, the beam modulation element includes substrate and shape At on substrate diffusion part and patterning portion, the diffusion part be correspondingly arranged in the traveling light path of the first light beam with by first Beam spread at optical power detection flood beam, the patterning portion be correspondingly arranged in the traveling light path of the second light beam with The light field of second light beam is subjected to rearrangement to form the pattern beam that can project predetermined pattern.
2. beam modulation element as described in claim 1, which is characterized in that the patterning portion is arranged in beam modulation element Centre position, the diffusion part is around being arranged in the periphery in patterning portion.
3. beam modulation element as described in claim 1, which is characterized in that the diffusion part is arranged in beam modulation element Centre position, the patterning portion, which surrounds, to be arranged in the periphery of diffusion part.
4. beam modulation element as described in claim 1, it is characterised in that：The diffusion part is corresponding by being formed on substrate The diffusion optical grains with light diffusion realize that the diffusion to the first light beam, the drafting department pass through shape at position At on substrate corresponding position can the patterned optical lines of rearrangement light field realize to the second light beam light field again Arrangement.
5. beam modulation element as claimed in claim 4, which is characterized in that the patterned optical lines is selected from diffraction optics One kind and combinations thereof in lines, optical micro lens array, grating.
6. the beam modulation element as described in any one of claim 1 to 5, which is characterized in that the diffusion part and pattern Change portion is formed in the different zones on the same substrate.
7. the beam modulation element as described in any one of claim 1 to 5, which is characterized in that the diffusion part and figure Case portion is respectively formed on different substrates, and the substrate for being formed with patterning portion is defined as patterned substrate, the shape At there is the substrate of diffusion part to be defined as diffusion substrate, the patterned substrate and diffusion substrate are layered on top of each other together, the figure Case substrate, which corresponds to, is formed with holding light transmission, the diffusion substrate corresponding pattern substrate at the position of diffusion part on diffusion substrate On be formed at the position in patterning portion holding light transmission.
8. the beam modulation element as described in any one of claim 1 to 5, which is characterized in that the pattern beam is thrown The predetermined pattern of injection is selected from irregular distribution spot pattern, the striped design of regular array and mutual along different directions One kind and combinations thereof in the regular grid pattern of intersection.
9. beam modulation element as described in claim 1, which is characterized in that the surface of the substrate is formed with detection circuit, The detection line road is made of an electrically conducting material, and the detection circuit is equipped with multiple test points, by being examined to any two of which Measuring point, which is detected, may know that whether the substrate surface between two test points is complete.
10. beam modulation element as claimed in claim 9, which is characterized in that the conductive material can be selected from indium tin oxide Or metal.
CN201810976725.2A 2018-07-30 2018-08-25 A kind of beam modulation element Withdrawn CN108803050A (en)

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CN201810976737.5A Withdrawn CN109211135A (en) 2018-07-30 2018-08-25 A kind of sensing device, method for sensing and equipment
CN201810976725.2A Withdrawn CN108803050A (en) 2018-07-30 2018-08-25 A kind of beam modulation element
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CN108919597B (en) 2024-02-13
CN109031872A (en) 2018-12-18
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CN109211135A (en) 2019-01-15
CN108954025A (en) 2018-12-07

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Application publication date: 20181113