CN109186494A - A kind of method for sensing - Google Patents

A kind of method for sensing Download PDF

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Publication number
CN109186494A
CN109186494A CN201810976720.XA CN201810976720A CN109186494A CN 109186494 A CN109186494 A CN 109186494A CN 201810976720 A CN201810976720 A CN 201810976720A CN 109186494 A CN109186494 A CN 109186494A
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CN
China
Prior art keywords
light
light beam
target object
sensing
measured target
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810976720.XA
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Chinese (zh)
Inventor
王小明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Fushi Technology Co Ltd
Original Assignee
Shenzhen Fushi Technology Co Ltd
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Publication date
Application filed by Shenzhen Fushi Technology Co Ltd filed Critical Shenzhen Fushi Technology Co Ltd
Publication of CN109186494A publication Critical patent/CN109186494A/en
Pending legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
    • F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
    • F21K9/20—Light sources comprising attachment means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2433—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring outlines by shadow casting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor
    • G03B15/02—Illuminating scene
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/2006—Lamp housings characterised by the light source
    • G03B21/2013—Plural light sources
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00—Scenes; Scene-specific elements
    • G06V20/60—Type of objects
    • G06V20/64—Three-dimensional objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/2518—Projection by scanning of the object
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V19/00—Fastening of light sources or lamp holders
    • F21V19/001—Fastening of light sources or lamp holders the light sources being semiconductors devices, e.g. LEDs
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V23/00—Arrangement of electric circuit elements in or on lighting devices
    • F21V23/04—Arrangement of electric circuit elements in or on lighting devices the elements being switches
    • F21V23/0442—Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors
    • F21V23/0471—Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors the sensor detecting the proximity, the presence or the movement of an object or a person
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/254—Projection of a pattern, viewing through a pattern, e.g. moiré
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/2006—Lamp housings characterised by the light source
    • G03B21/2033—LED or laser light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/206—Control of light source other than position or intensity
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/208—Homogenising, shaping of the illumination light
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/10—Image acquisition
    • G06V10/12—Details of acquisition arrangements; Constructional details thereof
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/16—Human faces, e.g. facial parts, sketches or expressions
    • G06V40/161—Detection; Localisation; Normalisation
    • G06V40/166—Detection; Localisation; Normalisation using acquisition arrangements
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/16—Human faces, e.g. facial parts, sketches or expressions
    • G06V40/174—Facial expression recognition
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00—Light-generating elements of semiconductor light sources
    • F21Y2115/30—Semiconductor lasers

Abstract

This application provides a kind of method for sensing, it is used to sense the three-dimensional information of a measured target object.The method for sensing includes the following steps: the first light beam for issuing optical power detection；First light beam is diffused into flood beam around to project on measured target object；Obtain floodlight image of the measured target object under flood beam irradiation；Issue the second light beam of optical power detection or irregular distribution；The light field of second light beam is subjected to rearrangement to project predetermined pattern on measured target object；Obtain the patterning light image of the predetermined pattern projected on the measured target object；And floodlight image acquired in analysis senses the three-dimensional information of the measured target object with patterning light image.

Description

A kind of method for sensing
Technical field
The application belongs to optical technical field more particularly to a kind of method for sensing.
Background technique
Existing three-dimensional (Three Dimensional, 3D) sensing mould group usually require to be respectively set floodlight transmitter and Light pattern transmitter realizes 3D sensing to cooperate.However, the respectively arranged floodlight transmitter and light pattern transmitter, not only It will increase cost, and the larger Miniaturization Design also affected using 3D sensing module device of shared volume.
Summary of the invention
Technical problems to be solved in this application are to provide a kind of method for sensing, can be with highly integrated floodlight and light pattern Projection function reaches miniaturization and reduces the beneficial effect of cost.
The application also provides a kind of method for sensing, is used to sense the three-dimensional information of a measured target object, the sensing side Method includes the following steps: the first light beam for issuing optical power detection；First light beam is diffused into flood beam around It projects on measured target object；Obtain floodlight image of the measured target object under flood beam irradiation；Issue optical power detection Or the second light beam of irregular distribution；The light field of second light beam is subjected to rearrangement to project on measured target object Predetermined pattern；Obtain the patterning light image of the predetermined pattern projected on the measured target object；And it is general acquired in analysis Light image senses the three-dimensional information of the measured target object with patterning light image.
In some embodiments, the light beam is infrared or near infrared light, and wave-length coverage is 750nm to 1650nm.
In some embodiments, second light beam is to be sent out by multiple according to the evenly arranged illuminator of same intervals The light field of the light field of optical power detection out, the second homogenizer distribution can be formed by rearrangement and can be projected It is randomly distributed the pattern beam of spot pattern；Or second light beam is to be shone by multiple according to same intervals are evenly arranged The light field for the optical power detection that body is issued, the light that the illuminator along the arrangement of the same preset direction is issued are fused Form the pattern beam that can project regular array candy strip；Or second light beam is equal according to same intervals by multiple The light field for the optical power detection that the illuminator of even arrangement is issued, the hair along the arrangement of cross one another two preset directions The light that body of light is issued is fused the pattern beam to be formed and can project regular grid pattern.
In some embodiments, second light beam be the light intensity that is issued by the illuminator of multiple irregular distributions not The light field of regular distribution.Second light beam is replicated multiple and is unfolded within the scope of preset expanded- angle and being formed can throw Project the pattern beam of irregular distribution spot pattern.
In some embodiments, first light beam and the second light beam are respectively by being formed on the same semiconductor base The first illuminator and the second illuminator issue.First light beam and the second light beam can be issued by separately control.
It in some embodiments, further include step before issuing the second light beam of optical power detection or irregular distribution It is rapid: to analyze the floodlight image of acquired measured target object to judge whether the measured target object is interested sensing pair As continuing to issue second light beam if measured target object is interested sensing object, if measured target object is not that sense is emerging The sensing object of interest then terminates to sense.
In some embodiments, first light beam is identical as the wavelength of the second light beam.
In some embodiments, first light beam is centrally located, and second light beam surrounds first light The periphery of beam symmetrically issues.
In some embodiments, second light beam is centrally located, and first light beam surrounds second light The periphery of beam symmetrically issues.
The transmitter for projecting flood beam and pattern beam is integrated in by method for sensing provided by the application embodiment Together, the not only smaller design for being conducive to equipment of volume, but also also further reduce the cost of device.
The additional aspect and advantage of the application embodiment will be set forth in part in the description, partially will be from following Become obvious in description, or is recognized by the practice of the application embodiment.
Detailed description of the invention
Fig. 1 is the top view for the light-source structure that the application first embodiment provides.
Fig. 2 is the top view for the light-source structure that the application second embodiment provides.
Fig. 3 is the top view for the light-source structure that the application third embodiment provides.
Fig. 4 is that the light-source structure in Fig. 3 is tactic along the cross-sectional view of IV-IV line and the light-source structure and top The positional diagram of first optical element.
Fig. 5 is the top view for the light-source structure that the 4th embodiment of the application provides.
Fig. 6 is the top view for the light-source structure that the 5th embodiment of the application provides.
Fig. 7 is the top view for the light-source structure that the application sixth embodiment provides.
Fig. 8 is cross-sectional view of the light-source structure in Fig. 7 along VIII-VIII line.
Fig. 9 is the top view for the light-source structure that the 7th embodiment of the application provides.
Figure 10 is the top view for the light-source structure that the 8th embodiment of the application provides.
Figure 11 is the structural schematic diagram for the optical projection mould group that the 9th embodiment of the application provides.
Figure 12 is the schematic diagram that the beam modulation component structure of the group of optical projection mould described in Figure 11 changes with light-source structure.
Figure 13 is the signal of the detection route on the transparent substrate of the beam modulation element of the optical projection mould group in Figure 11 Figure.
Figure 14 is the structural schematic diagram for the optical projection mould group that the tenth embodiment of the application provides.
Figure 15 is the structural schematic diagram for the optical projection mould group that the 11st embodiment of the application provides.
Figure 16 is the structural schematic diagram for the sensing device that the 12nd embodiment of the application provides.
Figure 17 is the functional block diagram of sensing device described in Figure 16.
Figure 18 is a kind of step flow chart of method for sensing provided by the present application.
Specific embodiment
Present patent application requires the applying date on July 30th, 2018, application No. is 201810854491.4, invention names A kind of referred to as domestic priority of the earlier application of " light-source structure, optical projection mould group, biological identification device and equipment ", the part All the elements of application are described herein by reference.
Presently filed embodiment is described below in detail, the example of the embodiment is shown in the accompanying drawings, wherein from beginning Same or similar element or element with the same or similar functions are indicated to same or similar label eventually.Below by ginseng The embodiment for examining attached drawing description is exemplary, and is only used for explaining the application, and should not be understood as the limitation to the application.? In the description of the present application, it is to be understood that term " first ", " second " are only used for describing, and should not be understood as instruction or dark Show relative importance or implicitly indicates the quantity of indicated technical characteristic or put in order.Define as a result, " first ", The technical characteristic of " second " can explicitly or implicitly include one or more technical characteristic.In retouching for the application In stating, the meaning of " plurality " is two or more, unless otherwise specifically defined.
In the description of the present application, it should be noted that unless otherwise specific regulation or limit, term " installation ", " phase Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integration connection；It can To be mechanical connection, it is also possible to be electrically connected or is in communication with each other；It can be directly connected, the indirect phase of intermediary can also be passed through Even, the connection inside two elements or the interaction relationship between two elements be can be.For the ordinary skill of this field For personnel, the concrete meaning of above-mentioned term in this application can be understood as the case may be.
Following disclosure provides many different embodiments or example is used to realize the different structure of the application.In order to Simplify disclosure herein, hereafter only to the component of specific examples and being set for describing.Certainly, they are merely examples, and And purpose does not lie in limitation the application.In addition, the application can reuse reference number and/or reference word in different examples Mother, this reuse are itself not indicate the various embodiments discussed to simplify and clearly state the application And/or the particular kind of relationship between setting.In addition, the application in the following description provided by various specific techniques and material only For the example for realizing technical scheme, but those of ordinary skill in the art should be aware that the technical solution of the application It can be realized by other techniques for not describing hereafter and/or other materials.
Further, described feature, structure can be incorporated in one or more embodiment party in any suitable manner In formula.In the following description, many details are provided so as to fully understand presently filed embodiment.However, this Field technical staff will be appreciated that even if without one or more in the specific detail, or using other structures, group Member etc. can also practice the technical solution of the application.In other cases, it is not shown in detail or describes known features or operation To avoid the emphasis of fuzzy the application.
It should be understood that embodiments described herein and/or method are exemplary in itself, it is not construed as pair The limitation of technical scheme.Embodiment or method described herein are only that the application the relevant technologies thought is covered One of numerous technical solutions are a variety of, therefore each step of described method and technology scheme can be according to being indicated Order executes, and can execute, may be performed simultaneously, or be omitted in some cases, above-mentioned change according to other order It is regarded as the range that the application technical solution claimed is covered.
As shown in Figure 1, the application first embodiment provides a kind of light-source structure 1, for emitting light beam to one tested It is sensed on object.The light beam can be the light beam with specific wavelength according to sensing principle and application scenarios.At this In embodiment, the light beam is used to sense the three-dimensional information of measured target object, can be infrared or near-infrared wavelength light beam, wave Long range is 750 nanometers (Nanometer, nm) to 1650nm.
The light-source structure 1 includes the first emission part 10 and the second emission part 12.First emission part 10 issues first Light beam is used to form the flood beam of optical power detection.The flood beam is projected on measured target object tested for sensing The floodlight image of object.For example, the flood beam can be used for sensing whether the measured target object is face.Described second The second light beam that emission part 12 issues is used to form the pattern beam that predetermined pattern can be projected on measured target object.It is described Predetermined pattern can be used for the three-dimensional information for sensing the measured target object.
First emission part 10 is formed in the same substrate 14 with the second emission part 12 or is connected with each other to be integrated into Overall structure.The first light emitting region 122 in the middle part of semiconductor base 14 is defined on the semiconductor base 14 and is enclosed Around the second light emitting region 102 of first light emitting region 122 setting.
The integration mode of first emission part 10 and the second emission part 12 includes being directly connected to, be indirectly connected with or distinguishing shape At on the same substrate 14 etc..In the present embodiment, first light beam and the second light beam are the identical near-infrared of wavelength Light.
In the present embodiment, first emission part 10 includes multiple for emitting the first illuminator of the first light beam 100.Second emission part 12 includes multiple for emitting the second illuminator 120 of the second light beam.First illuminator 100 It is formed on the same semiconductor base 14 with the second illuminator 120.First illuminator 100 in semiconductor base 14 It is uniformly distributed in two light emitting regions 102 according to preset same intervals.Second illuminator 120 is in the semiconductor base 14 The first light emitting region 122 in irregular distribution.
First illuminator 100 and the second illuminator 120 can be semiconductor laser.Preferably, in this embodiment party In formula, first illuminator 100 and the second illuminator 120 are vertical cavity surface emitting laser (Vertical Cavity Surface Emitting Laser, VCSEL), it is made up on the semiconductor base 14 of the techniques such as photoetching and etching.Institute The pattern beam that the flood beam and the second illuminator 120 for stating the sending of the first illuminator 100 issue is that wavelength is identical infrared Or near infrared light, wave-length coverage are 750nm to 1650nm.
In the present embodiment, first light emitting region 122 positioned at 14 middle part of semiconductor base is rectangle.Described Two light emitting regions 102 are correspondingly arranged at four edges of the first light emitting region 122.First illuminator 100 is in the second hair It uniformly arranges along two sides of each corner in the second light emitting region 102 according to same intervals four corners in light region 102 Multilayer, first light emitting region 122 be dotted line described in Fig. 1 surround envelope the first light emitting region 102 each be straight Four right angle frame bar-shaped zones at angle.Second illuminator 102 is randomly distributed in the first light emitting region 122, is used for Launch the second light beam with irregular distribution pattern when lighting.
It is provided on the semiconductor base 14 and connect with external circuit for controlling in first light emitting region 122 First pad 104 of light.It is provided with and connect with external circuit for controlling described on the semiconductor base 14 Second pad 124 of the light in two light emitting regions 102.So being located at the first light emitting region 122 in present embodiment The second interior illuminator 120 and the first illuminator 100 in the second light emitting region 102 can pass through different control signals Independently work.
As shown in Fig. 2, the second embodiment of the application provides a kind of light-source structure 2, in first embodiment Light-source structure 1 it is essentially identical, difference be that first illuminator 200 is evenly distributed according to preset same intervals In first light emitting region 222.The irregular distribution of second illuminator 220 is in the second light emitting region 202.
Also referring to shown in Fig. 3 and Fig. 4, the application third embodiment provides a kind of light-source structure 3, with first Light-source structure 1 in embodiment is essentially identical, and difference is that second light emitting region 302 is in first luminous zone The blocked areas that first light emitting region 322 1 is enclosed is surrounded outside domain 322.Second light emitting region 302 and the first luminous zone The size of minimum spacing D is it is ensured that the light beam sent out from the first light emitting region 322 and the second light emitting region 302 between domain 322 The light beam sent out is arranged above light-source structure 3 before tactic first optical element 31 between each other not in arrival It crosses.
Since manufacturing process is there are a degree of error, first illuminator 300 is issued with the second illuminator 320 The dispersion angle of light beam can not accomplish it is just the same, but can be within the scope of preset dispersion angle.Because of first illuminator 300 It is bigger with the dispersion angle of the issued light beam of the second illuminator 320, in light-source structure 3 and tactic first optics in top The spacing of element 31 is sent out under the premise of remaining unchanged in order to meet first light emitting region 322 with the second light emitting region 302 Light beam does not cross out, it is required that the distance between the first light emitting region 322 and the second light emitting region 302 D are bigger.Assuming that from first The maximum dispersion angle of the issued light beam in light emitting region 322 and the second light emitting region 302 is θ, the light-emitting surface of the light-source structure 3 It is H with the distance between tactic first optical element 31 is disposed there above, according to trigonometric function relationship, first Described first under the critical condition that the issued light beam in light emitting region 322 just intersects with the issued light beam in the second light emitting region 302 Minimum spacing D between light emitting region 322 and the second light emitting region 302 meets formulaSo the light beam in order to ensure being sent out from the first light emitting region 322 and The light beam that two light emitting regions 302 are sent out reaches setting tactic first optical element 31 above light-source structure 3 It does not cross mutually before, the minimum spacing D between first light emitting region 322 and the second light emitting region 302 should meetWhen because meeting above-mentioned condition, respectively from the first light emitting region 322 and the second hair The light beam that light region 302 issues before reaching first optical element 31 being arranged in light-source structure 3 above it is mutual not It crosses, adjusts beam direction so not needing to be arranged again in the light emission side of the first light emitting region 322 or the second light emitting region 302 Other elements.
In the present embodiment, the irregular distribution of the second illuminator 320 is in the first luminous zone of semiconductor base 34 In domain 322.First illuminator 300 is equably arranged in the second light emitting region 302 according to identical preset interval.
As shown in figure 5, the 4th embodiment of the application provides a kind of light-source structure 4, in third embodiment Light-source structure 3 it is essentially identical, difference be that first illuminator 400 is evenly distributed according to preset same intervals In first light emitting region 422.The irregular distribution of second illuminator 420 is in the second light emitting region 402.
As shown in fig. 6, the 5th embodiment of the application provides a kind of light-source structure 5, in first embodiment Light-source structure 1 is essentially identical, and difference is that second light emitting region 502 is that the semiconductor base 54 is formed with illuminator Surface on other regions other than the first light emitting region 522.First illuminator 500 is arranged in the second light emitting region In 502.Second illuminator 520 is arranged in first light emitting region 522.First illuminator 500 and the second hair Body of light 520 is equably arranged all in accordance with preset same intervals.
In the present embodiment, the second light beam cooperation that the second illuminator 520 of first light emitting region 522 is issued The optical element that 5 top of light-source structure is arranged in can be formed can project irregular distribution hot spot figure on measured target object Case, the striped design of regular array or the pattern beam along the cross one another regular grid pattern of different directions.
It is understood that being arranged in second in the first light emitting region 522 in other embodiments out not shown Illuminator 520 can also be randomly distributed.
It is understood that first illuminator 500 can also be according to pre- in other embodiments out not shown If same intervals be evenly distributed in the first light emitting region 522.The irregular distribution of second illuminator 520 is in the second hair In light region 502.
Referring to Figure 7 together and Fig. 8, the application sixth embodiment provides a kind of light-source structure 6, for emitting light beam It is sensed on to a measured target object.The light beam can be the light with specific wavelength according to sensing principle and application scenarios Beam.In the present embodiment, the light beam is used for recognition of face, can be for infrared or near-infrared wavelength light beam, wave-length coverage 750 nanometers (Nanometer, nm) to 1650nm.
The light-source structure 6 includes the first emission part 60 and the second emission part 62.First emission part 60 issues first Light beam is used to form the flood beam of optical power detection.The flood beam is projected on measured target object for sensing quilt Survey the floodlight image of object.For example, the flood beam can be used for sensing whether the measured target object is face.Described Two emission parts 62 issue the second light beam and are used to form the pattern beam that can project predetermined pattern on measured target object.It is described Predetermined pattern can be used for the three-dimensional information for sensing the measured target object.In the present embodiment, first light beam and Two light beams are the identical near infrared light of wavelength.
First emission part 60 includes the first illuminator 600 and the light guide plate being formed on the first semiconductor base 601 602.The light guide plate 602 includes incidence surface 6020 and light-emitting surface 6022.In the present embodiment, the light guide plate 602 is substantially In rectangular shape, the incidence surface 6020 is perpendicular to light-emitting surface 6022.The corresponding light guide plate 602 of first illuminator 600 Incidence surface 6020 is arranged, so that the first light beam that first illuminator 600 is issued injects light guide plate from incidence surface 6020 Flood beam is projected from light-emitting surface 6022 after evenly mixing in 602.
The middle position of 602 light-emitting surface 6022 of light guide plate is arranged in second emission part 62.Second transmitting Portion 62 includes the second illuminator of one or more 620 being formed on the second semiconductor base 621.In the present embodiment, institute It states multiple second illuminators 620 to be randomly distributed on the second semiconductor base 621, be used for and is arranged above light-source structure 6 Optical element cooperation irregular distribution spot pattern is projected on measured target object.It is understood that in other implementations In mode, the multiple second illuminator 620 can also equably arrange according to preset same intervals, can be used for existing with setting The optical element cooperation of 6 top of light-source structure projects the striped design of regular array or along difference on measured target object The cross one another regular grid pattern in direction.
In the present embodiment, first illuminator 600 and the second illuminator 620 can be semiconductor laser, example Such as: VCSEL.Unlike, because first illuminator 600 is different from the position where the second illuminator 620, need shape respectively At on different the first semiconductor bases 601 and the second semiconductor base 621.The shape of first semiconductor base 601 It is corresponding with 6020 shape of incidence surface.
Also referring to Fig. 1 and Fig. 9, the 7th embodiment of the application provides a kind of light-source structure 7, implements with first Light-source structure 1 in mode is essentially identical, and difference is that first illumination region 70 includes each second light emitting region 702 Inside respectively correspond single first illuminator 700 of setting, first illuminator 700 is the wide face type VCSEL of single hole, to replace the It is multiple according to evenly arranged first illuminator of preset same intervals in second light emitting region 102 described in one embodiment 100.Described wide only one lightening hole of face type VCSEL of single hole, but the aperture that shines is larger, several times in making in first embodiment For one of VCSEL of the first illuminator 100.It is equal that the illumination effect of the wide face type VCSEL of single hole is equal to luminous intensity Even area source.The light-emitting surface shape of the wide face type VCSEL of single hole can be the shape of rule, such as rectangle；Or Irregular shape, such as the light-emitting surface shape of the wide face type VCSEL of the single hole is described second luminous in the present embodiment The right angle moulding shape in region 702.
Also referring to Fig. 1 and Figure 10, the 8th embodiment of the application provides a kind of light-source structure 8, real with first The light-source structure 1 applied in mode is essentially identical, and difference is that second emission part 82 includes being arranged in the first light emitting region Single second illuminator 820 in 822, second illuminator 820 are the wide face type VCSEL of single hole, to replace the first embodiment party The second illuminator 120 being randomly distributed in first light emitting region 122 described in formula.First emission part 80 includes each the Single first illuminator 800 of setting is respectively corresponded in one light emitting region 802, first illuminator 800 is the wide face type of single hole VCSEL multiple is uniformly arranged with replace described in first embodiment in the second light emitting region 102 according to preset same intervals First illuminator 100 of cloth.Described wide only one lightening hole of face type VCSEL of single hole, but the aperture that shines is larger, several times in the One of VCSEL in one embodiment as the first illuminator 100 and the second illuminator 120.The wide face type of single hole The illumination effect of VCSEL is similar to the uniform area source of luminous intensity.The light-emitting surface shape of the wide face type VCSEL of single hole can be with For the shape of rule, such as rectangle；It may be irregular shape, such as second light emitting region in the present embodiment 802 right angle moulding shape.
As shown in figure 11, the 9th embodiment of the application provides a kind of optical projection mould group 11, for projecting specific light It is sensed on beam to measured target object.The optical projection mould group 11 includes beam modulation element 110 and above-mentioned first to the Light-source structure 1 in eight embodiments.
The beam modulation element 110 includes diffusion part 111 and patterning portion 112.The 111 corresponding light source knot of diffusion part First emission part 10 of structure 1 is arranged, the first beam spread for issuing first illuminator 100 of the first emission part 10 Form the flood beam of optical power detection.Second emission part 12 of the 112 corresponding light source structure 1 of patterning portion is arranged, and uses It can be projected on measured target object in the second light beam formation for issuing second illuminator 120 of the second emission part 12 The pattern beam of predetermined pattern is with the three-dimensional information for sensing measured target object.
It is arranged in the first light emitting region 122 corresponding to second illuminator 120 to issue and be used to form pattern beam The second light beam situation, first illuminator 100 is arranged in the second light emitting region 102 to issue and be used to form floodlight figure The case where first light beam of case, the patterning portion 112 be arranged in the middle position of beam modulation element 110 with setting the The second illuminator 120 in one light emitting region 122 is corresponding.The diffusion part 111 surround be arranged in patterning portion 112 periphery with It is corresponding with the first illuminator 100 being arranged in the second light emitting region 102.
As shown in figure 12, correspond to second illuminator 220 to be arranged in the second light emitting region 202 to issue and be used for shape At the situation of the second light beam of pattern beam, first illuminator 100 is arranged in the first light emitting region 122 to issue and be used for Formed flood light pattern the first light beam the case where, the diffusion part 111 be arranged in the middle position of beam modulation element 110 with The first illuminator 120 being arranged in the first light emitting region 122 is corresponding.The patterning portion 112 is around setting in diffusion part 111 Periphery with corresponding with the second illuminator 120 being arranged in the second light emitting region 102.
The function of the patterning portion 112 and diffusion part 111 in the corresponding position of transparent substrate 113 by forming specifically Optical grains are realized.In the present embodiment, the patterning portion 112 of the beam modulation element 110 and diffusion part 111 are arranged On the same transparent substrate 113.That is, the middle position of the transparent substrate 113 is formed with the figure for rearrangement light field Case optical grains 1120 are used as the patterning portion 112, and the transparent substrate 113 is in the patterned optical lines 1120 Periphery position corresponding with 1 first light emitting region 102 of light-source structure has been formed with the diffusion optical grains 1100 of light diffusion As the diffusion part 111.The patterned optical lines 1120 includes but is not limited to diffraction optics lines, optical microlens battle array Column, grating and combinations thereof.
As shown in figure 13, detection route 134 can also be formed on the surface of the transparent substrate 113.The detection route It can be made of an electrically conducting material, which is provided with multiple test points 135.It can by being detected to any two of them test point 135 Knowing whether 113 surface of transparent substrate that route between the two o'clock passes through has to burst apart etc. influences the flaw of optical element integrality.
As shown in figure 14, the tenth embodiment of the application provides a kind of optical projection mould group 15, with the 9th embodiment party Optical projection mould group 11 in formula is essentially identical, and difference is that the optical projection mould group 15 further includes optical path director element 16.
The optical path director element 16 is arranged between light-source structure 1 and beam modulation element 110, and with the light source knot At the corresponding position of light-emitting surface of first emission part 10 of structure 1.The optical path director element 16 is used for the first emission part 10 The first light beam guidance of divergent shape outgoing is irradiated to the diffusion part 111 of the beam modulation element 110.The optical path director element 16 setting is the technical solution in order to avoid being closer in the first emission part 10 of light-source structure 1 and the second emission part 12 In, issued from the first emission part 10 be used to form floodlight irradiation the first light beam of a part light can by beam modulation member The patterning portion 112 of part 110 projects away the pattern beam for forming luminous intensity irregular distribution, to influence flood beam Uniformity.The optical path director element 16 includes but is not limited to prism, lenticule and grating.The optical path director element 16 is set Region is set to be consistent with the region where the first emission part 10 of light-source structure 1.
As shown in figure 15, the 11st embodiment of the application provides a kind of optical projection mould group 17, implements with the 9th Optical projection mould group 11 in mode is essentially identical, and difference is the diffusion part 171 and pattern of the beam modulation element 170 Change portion 172 is respectively formed on different transparent substrates.
The transparent substrate for being formed with patterning portion 172 is defined as patterned substrate 1721.The patterned substrate It is formed at position corresponding with the second emission part 12 of light-source structure 1 on 1721 and the light field of light beam is subjected to rearrangement Patterned optical lines 1720.In the present embodiment, 1 middle part of light-source structure is set corresponding to second emission part 12 Situation, the patterned optical lines 1720 are formed in the middle position of patterned substrate 1721.
The transparent substrate for being formed with diffusion part 171 is defined as diffusion substrate 1710.On the diffusion substrate 1710 with The diffusion optical grains 1711 for playing light diffusion are formed at the corresponding position of the first emission part 10 of light-source structure 1. The diffusion substrate 1710 region corresponding with patterned optical lines 1720 on patterned substrate 1721 keeps light transmission, the figure The region corresponding with optical grains 1711 are spread on diffusion substrate 1710 of case substrate 1721 keeps light transmission, is defined as transmission region 1712.In the present embodiment, the light-source structure 1 of the second emission part 12 setting, institute are surrounded corresponding to first emission part 10 Diffusion substrate 1710 is stated to be formed at the periphery position corresponding with 1 first emission part 10 of light-source structure of the transmission region 1712 There are the diffusion optical grains 1711.
The patterned substrate 1721 and diffusion substrate 1710 can be stacked together, and can also be thrown along the optics The projecting light path of shadow mould group 17 is respectively and independently arranged at the different location in optical path.It is understood that needing only assure that described It corresponds to optical grains position on diffusion substrate 1710 and patterned substrate 1721 to be mutually aligned, for diffusion substrate 1710 and pattern Change substrate 1721 not specially require along putting in order for the projecting light path.
As shown in FIG. 16 and 17, the 12nd embodiment of the application provides a kind of sensing device 18, is used to sense The spatial information of measured target object.The spatial information includes, but are not limited to the depth information on measured target object surface, is tested Object location information in space, the dimension information etc. of measured target object other three-dimensional letters relevant to measured target object Breath.The spatial information of the measured target object sensed can be used for identifying measured target object or construct the three-dimensional of measured target object Model.
The sensing device 18 include the optical projection mould group 11 as provided by above-mentioned 9th to the 11st embodiment and Sense mould group 180.The optical projection mould group 11 is for projecting particular beam to measured target object.The sensing mould group 180 Including camera lens 181, imaging sensor 182 and image analysis processor 183.Described image sensor 182 is sensed by camera lens 181 The image that the particular beam is formed on measured target object.Described image analysis processor 183 analyzes sensed projection Image on measured target object obtains the three-dimensional information of measured target object.
In the present embodiment, the sensing device 18 is to sense the three-dimensional information on measured target object surface and identify accordingly The 3D face authentification device of measured target object identity.
The particular beam includes the flood beam of even intensity and can project default figure on measured target object The pattern beam of case.The sensing mould group 180 according to the image that the flood beam sensed is formed on measured target object come Identify whether close measured target object is face.The sensing mould group 180 is according to the pattern beam sensed tested The change in shape of the predetermined pattern projected on object is to analyze the three-dimensional information on measured target object surface and accordingly to quilt It surveys object and carries out face recognition.
Also referring to Figure 11, Figure 12, Figure 14 to Figure 18, the application, which also provides, a kind of to be provided using above embodiment Sensing device 18 sense measured target object three-dimensional information method for sensing.The method for sensing includes the following steps:
Step S01 issues the first light beam of optical power detection.First light beam is sent out by the first of the first emission part 10 The diffusion part 111 of body of light 100 towards beam modulation element 110 issues.
It may include multiple according to evenly arranged first illuminator 100 of same intervals in each first emission part 10. The multiple first illuminator 100 be multiple array VCSEL luminescence units, issue respectively evenly spaced multiple beamlets with Form the first light beam of optical power detection.
Each first emission part 10 can also be the wide face type VCSEL of a single hole.Each described wide face type of single hole VCSEL is the single lightening hole with wider bore diameter, the first light beam of the capable of emitting optical power detection similar to area source.
Entire first emission part 10 can also be single area source, issue the of complete uniform intensity alone One light beam.
First light beam is uniformly diffused into flood beam around and is irradiated on measured target object by step S02.
First light beam is diffused via the diffusion part 111 of beam modulation element 110.Because being used to form flood beam First light beam need to be integrated in the same light-source structure 1 with the second light beam of projection specific pattern, it is described to issue the The position of first illuminator 100 of one light beam can not cover the entire light-emitting surface of light-source structure 1, need by the diffusion part 111 spread the first light beam uniformly around to form the flood beam for covering entire crevice projection angle range.The diffusion part 111 It is realized by the way that diffusion optical grains 1100 corresponding with first emission part 10 are arranged on transparent substrate 113 to the first light The diffusion function of beam.
Step S03 obtains floodlight image of the measured target object under flood beam irradiation.The measured target object Floodlight image cooperates relevant camera lens 181 to obtain via the imaging sensor 182 of sensing mould group 180.Described image sensor 182 be the photoelectric sensor to the photaesthesia in the wave-length coverage of first light beam.In the present embodiment, described image passes Sensor 182 is infrared or near-infrared image sensor.
Step S04 analyzes acquired floodlight image and judges whether the measured target object is interested sensing object.
Floodlight floodlight image of the image analysis processor 183 of the sensing mould group 180 to acquired measured target object It is analyzed to seize the characteristic of measured target object, and the characteristic of obtained measured target object and preset sense is emerging The common feature data of the sensing object of interest are compared to judge whether the measured target object is interested sensing object.
The sensing mould group 180 calculates the characteristic of the measured target object and the general character spy of interested sensing object Levy the degree of agreement of data.Judge that the measured target object is if calculating the degree of agreement come and being more than preset identical threshold value Interested sensing object, can continue the sensing of next step.If calculating the degree of agreement come and being lower than preset identical threshold value Judge that the measured target object is not interested sensing object, sensing operation can be terminated.
Step S05 issues the second light beam of optical power detection or irregular distribution.Second light beam is by being arranged in Second illuminator 120 of two emission parts 12 is issued towards the patterning portion 112 of beam modulation element 110.
First light beam and the second light beam are required to not by the interference of visible light and should reduce to the greatest extent to measured target Object impacts.In the present embodiment, first light beam and the second light beam are infrared or near infrared light, and wave-length coverage is 750nm to 1650nm.
Second emission part 12 may include the second illuminator 120 of multiple irregular distributions.Each second illuminator 120 be a VCSEL luminescence unit.Second illuminator 120 of the multiple irregular distribution, which issues, has irregular distribution light Second light beam of spot pattern is to the patterning portion 112 of the beam modulation element 110.
Second emission part 12 can also include multiple according to evenly arranged second illuminator 120 of same intervals.Institute Stating multiple second illuminators 120 is multiple array VCSEL luminescence units, issues evenly spaced multiple beamlets respectively with group At the second light beam of optical power detection.
Each described wide face type VCSEL of single hole is the single lightening hole with wider bore diameter, capable of emitting to be similar to face light Second light beam of source sending optical power detection.
It is preset to project on measured target object to be carried out rearrangement by step S06 for the light field of second light beam Pattern.
The patterning portion 112 is corresponding with second emission part 12 on the transparent substrate 113 of beam modulation element 110 Position, realized by forming patterned optical lines 1120 on the transparent substrate 113 to the light field of the second light beam into The function of row rearrangement.The patterned optical lines 1120 includes but is not limited to diffraction optics lines, optical microlens battle array Column, grating etc..
Include the case where the second illuminator 120 of multiple irregular distributions, the pattern for second emission part 12 Change portion 112 will have the second beam replication of irregular distribution spot pattern multiple and be unfolded within the scope of preset expanded- angle And form the more patterns of irregular distribution number of spots being incident upon on measured target object.
It include multiple feelings according to evenly arranged second illuminator 120 of same intervals for second emission part 12 Condition, the patterning portion 112 can be in tested mesh by the light field rearrangement formation of the optical power detection of second light beam Mark the pattern beam of projection irregular distribution spot pattern on object.
It include multiple feelings according to evenly arranged second illuminator 120 of same intervals for second emission part 12 Condition, the light that the patterning portion 112 can also issue respectively second illuminator 120 along the arrangement of the same preset direction Beam is fused to the pattern beam with regular array candy strip.
The case where being a single hole wide face type VCSEL for second emission part 82, the patterning portion 112 will be described The light field rearrangement formation of the optical power detection of second light beam can project irregular distribution pattern on measured target object Pattern beam.
Step S07 obtains the patterning light image of the predetermined pattern projected on the measured target object.The tested mesh The patterning light image for marking object cooperates relevant camera lens 181 to obtain via the imaging sensor 182 of sensing mould group 180.It is described Imaging sensor 182 is the photoelectric sensor to the photaesthesia in the wave-length coverage of second light beam.In the present embodiment, Described image sensor 182 is infrared or near-infrared image sensor.
Step S08 analyzes acquired floodlight image and patterning light image to sense the three-dimensional of the measured target object Information.
The patterned beam is incident upon measured target by the image analysis processor 183 of the sensing mould group 180 respectively The patterning reference picture that the patterning light image formed on object is formed in the plane with projection is mutually compared.
Described image analysis processor 183 by the patterning light image that is formed on analysis measured target object be formed in it is flat Deviation situation of the patterning reference picture on respective corresponding position on face calculates measured target object in the corresponding position Three-dimensional information.
The floodlight image can be used for the analysis of 183 pairs of assisted image analysis processor patterning images, such as: the figure As analysis processor 183 can adjust calculating three-dimensional information according to the characteristic of the measured target object obtained from floodlight image Algorithm or to extracted depth information be filtered with remove obviously do not meet floodlight image characteristic noise.
Step S09, according to being patterned on the measured target object sensed in light image institute coverage area at each position Depth information build up the threedimensional model of measured target object.
Compared with existing sensing device needs to be respectively set the structure of floodlight transmitter and light pattern transmitter, the application Provided sensing device 18 integrates the transmitter for projecting flood beam and pattern beam, and not only volume is smaller advantageous In the design of equipment, and also further reduce the cost of device.
In the description of this specification, reference term " embodiment ", " certain embodiments ", " schematically implementation What the description of mode ", " example ", " specific example " or " some examples " etc. meant to describe in conjunction with the embodiment or example Particular features, structures, materials, or characteristics are contained at least one embodiment or example of the application.In this specification In, schematic expression of the above terms are not necessarily referring to identical embodiment or example.Moreover, the specific spy of description Sign, structure, material or feature can be combined in any suitable manner in any one or more embodiments or example.
The foregoing is merely the better embodiments of the application, all the application's not to limit the application Made any modifications, equivalent replacements, and improvements etc., should be included within the scope of protection of this application within spirit and principle.

Claims (10)

1. a kind of method for sensing, is used to sense the three-dimensional information of a measured target object, the method for sensing includes the following steps:
Issue the first light beam of optical power detection；
First light beam is diffused into flood beam around to project on measured target object；
Obtain floodlight image of the measured target object under flood beam irradiation；
Issue the second light beam of optical power detection or irregular distribution；
The light field of second light beam is subjected to rearrangement to project predetermined pattern on measured target object；
Obtain the patterning light image of the predetermined pattern projected on the measured target object；And
The acquired floodlight image of analysis senses the three-dimensional information of the measured target object with patterning light image.
2. method for sensing as described in claim 1, it is characterised in that: first light beam and the second light beam are infrared or close red Outer light, wave-length coverage are 750nm to 1650nm.
3. method for sensing as described in claim 1, it is characterised in that: second light beam is equal according to same intervals by multiple The light field of the light field for the optical power detection that the illuminator of even arrangement is issued, the second homogenizer distribution can be arranged again Cloth can project the pattern beam of irregular distribution spot pattern to be formed；Or
Second light beam is by the light of multiple optical power detections issued according to the evenly arranged illuminator of same intervals , the light that the illuminator along the arrangement of the same preset direction is issued, which is fused to be formed, can project regular array striped The pattern beam of pattern；Or
Second light beam is by the light of multiple optical power detections issued according to the evenly arranged illuminator of same intervals , the light that the illuminator along the arrangement of cross one another two preset directions is issued, which is fused to be formed, can project rule The pattern beam of lattice.
4. method for sensing as described in claim 1, it is characterised in that: second light beam is by the hair of multiple irregular distributions The light field of light intensity that body of light is issued irregular distribution, second light beam are replicated multiple and in preset expanded- angle range It is interior expansion and formed can project irregular distribution spot pattern pattern beam.
5. method for sensing as described in claim 1, it is characterised in that: first light beam and the second light beam are respectively by being formed in The first illuminator and the second illuminator on the same semiconductor base issue, and first light beam and the second light beam can be distinguished Independently control sending.
6. method for sensing as described in claim 1, it is characterised in that: issuing the of optical power detection or irregular distribution It is further comprised the steps of: before two light beams
The floodlight image of the acquired measured target object of analysis is to judge whether the measured target object is interested sensing pair As continuing to issue second light beam if measured target object is interested sensing object, if measured target object is not that sense is emerging The sensing object of interest then terminates to sense.
7. method for sensing as described in claim 1, it is characterised in that: first light beam is identical as the wavelength of the second light beam.
8. method for sensing as described in claim 1, it is characterised in that: first light beam is issued by an area source, and described Semiconductor laser on light-emitting surface of two light beams by the area source is arranged in issues.
9. method for sensing as described in claim 1, it is characterised in that: first light beam is centrally located, and described second Light beam is symmetrically issued around the periphery of first light beam.
10. method for sensing as described in claim 1, it is characterised in that: second light beam is centrally located, and described first Light beam is symmetrically issued around the periphery of second light beam.
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