CN1087730A - 防复制膜或防复制层 - Google Patents
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Abstract
一种防复制膜或层包括一层有许多完全或部分
不透明区的透明材料,这些区相隔配置而其平面围绕
对该膜或层表面相同预定位置排列,因此从预定视角
观测该防复制膜表面时,该膜基本为透明的。所述区
至少包含部分经辐照会转换成不透明或反射的光敏
材料,还可在透明塑料中设置其内放置该光敏材料的
凹部或槽。
Description
本发明涉及一种防复制膜或层,该膜或层由大部分或完全不透明区的透明材料膜或层构成,所述不透明区安排成彼此相隔一定距离,而且它们的平面以相对该膜或层的表面大致相同的一予定位置排列,致使当以一予定视角看该防复制膜之表面时,该膜基本为透明的。US-A3887742描述了如上所述的这种防复制膜。这种用于使防复制文件成为可能的膜使得在复制器以垂直视角方向复制时,能有效地隐蔽图象信息和/或一般文献或文本的字母,同时使以与文件平面不同予定视角看文件时便可看到其上图象信息和/或字母。
实际上,这种防复制膜是一种包含非透明粒子,或具有以任何形式开有槽口或具有锯齿形截面的平面的透明塑料膜,其中相对文件或膜平面的第一倾斜或垂直面不是黑的,就是从相对于膜或文件平面的垂直视角反射光,而以不同视角看时,其他斜面是透明的,故信息或字符均是清楚可见的。这种开槽或锯齿形表面是难以制作的,因为首先必需模压或敲平这些平面,然后必需给斜面配置黑色或反射材料,这就必须对这些操作的精度提出甚高要求,以致透明表面不能再经受损害,即,又要部分配置黑色和反射材料。在另一实施例中,复盖至少一部分背景的黑墨水设置在具有锯齿形截面的膜表面上两个接续锯齿之间的凹部。这里,不再描述该具体生产过程。
AU-A-610614文献揭示了一种用于书写或印刷事业的防复制媒质,该媒质包含光敏墨水系统,该系统被暴露在光复制器下时,使文本字迹模糊,或作出与原件明显不同的复制件,因此,不是使原件变得无价值,就是可清楚地看出原件被复印过。
本发明的一个目的是提供一种防复制膜或防复制层,该膜或该层制作较简单和更经济,同时防止了复制或至少使复制过程复杂化。
现我们已找到了达到这一目的的一种用于文件的防复制膜或层,该膜或层包括具有大部分或完全不透明区的透明材料膜或层,这些不透明区相隔一定距离排列着,并将其平面配置在相对于该膜或层的表面的大致相同的一予定位置的周围,因此,从一予定视角观看该膜或层表面时,该防复制膜基本上是透明的,其中不透明区部分或全部由一种用光化学法可转换成不透明或反射材料的材料构成。
这就显着简化了这种膜的制作,而且还有可依据具体所需用途变更生产方法的优点。
我们已发现,该目的是借助这样一种防复制膜或层进一步在实际应用中达到的,即该膜或层包括具有大部分或完全不透明区的透明材料膜或层,这些不透明区相隔一定距离配置,而且它们的平面相对于该膜或层表面在大致相同的予定位置排到,致使在这些不透明区是由共挤压透明和不透明塑料形成情况下,从一予定视角观测该膜或层的表面时,该防复制膜基本上是透明的。
这样,在一步工序中即可产生该防复制膜或防复制层。
我们已发现,可更有利地达到本发明目的一种防复制膜或层包括具有大量部分或完全不透明区的透明材料膜或层,这些区域相隔一定距离,且它们的平面相对该膜或层的表面的大致相同的予定位置排列,因此,若这些不透明区包含带有凹痕或沟槽的透明材料经挤压后插入所述凹痕或沟槽的不透明或反射带材,则从予定视角观测该防复制膜的表面时,该膜基本上是透明的。
这形成了这种防复制膜的一个更为有利的实施例。
在一个有利实施例中,所述不透明区是包含曝光和显影的光敏材料的倾斜层。
所述透明材料,例如,包括部分曝光然后显影的一厚感光乳剂。
在此情况下,该倾斜层基本上是以连续贯穿该膜或层的厚度的形式存在。
所述透明材料也可包括一种塑料,该塑料包含至少一种光敏物质,其曝光可在倾斜于该材料表面的平面上定位和完成。
在另一实施例中,可在至少一个表面上设置该膜或层,该表面带有大量的大致平行和大致等距的凹痕或沟槽,而一或多种光敏物质被引入该沟槽。
该凹痕或沟槽可配置成直角或倾斜于该膜或层表面。
实际上,以下情况也可能是有益的;在该膜或层的上表面上形成不透明或反射区,作为第一不透光或反射层,而在该膜或层的下表面上配置相对于第一不透光层呈水平交错的第二不透光层。
现参照以下示意性附图描述本发明的诸实施例:
图1A表示具有不透光斜层的防复制膜,
图1B表示一种表面具有锯齿形横截面的防复制膜,
图2A表示一种具有矩形槽和其内有未经曝光的光敏材料的防复制膜,
图2B表示一种具有按图2A但呈斜方形沟槽的防复制膜,
图3A表示带有已曝光,不透光的光敏材料的图2A矩形槽,
图4A表示根据图3A的一种双侧槽实施例,
图4B表示一种按图3B的双侧槽实施例。
为达本发明目的起见,通过光化学可转换材料是任一种由于辐照(光子,粒子)结果改变其物理性能的光敏材料,在本发明中该物理性能的改变是从透明到不透光状态。
图1A表示的一种防复制膜F或防复制层包括透明塑性材料,该材料中设置有若干平行等距的斜层ss,该层ss是连续地贯穿防复制膜F的整个厚度d的。
所述塑性材料最好包含对特定波长的入射光起反应而使已感光的区域不透光的光敏物质。
光的作用可借助掩模来定域,以使斜层或阵列或矩阵的予定区域可确保有限的入射光。这类阵列可为光电二极管或可能产生大量光源的衍射光栅装置。然而,也可利用局部受控的激光束或多个激光束。为了能形成斜层ss,辐照应以大约30°至73°左右特别是从约45°至大约60°的予定角度r斜向入射。在角度r下,或沿由箭头VI所指的观测方向上,文件D的信息I是通过透明层TS可见的。然而,沿箭头VV方向,信息I被隐芷而不可见。
因此,必须选择层ss的阻光度以使任何情况下,可通过商用复制器记录的信息至少是不清楚而人不能由此复制件辨认其内容。
图1B示出具有拥有锯齿形横截面的表面os的防复制膜F1或防复制层。该锯齿形的一个侧壁,例如配置成角度r,而另一侧大致为垂直的。呈三角形的凹陷处E本身装有含光敏材料的塑料PH,如上所述,由于分域入射光的结果,例如,各第二号凹陷E2为不透光(PHE)而每个第一号凹陷E1大致保持透明。斜面Q可用光学法如此形成,使得在以直角辐照的情况下发生全反射,或者它们可由反射层QS构成。这同样导致对应于方向VI的倾斜观测方向和大致垂直的隐蔽方向VV(图1)。
膜或层材料F1应为透明塑料,该材料或制成自支持膜或制成这种类型的层(F1)或被配置一基片膜或基片层G。
表面os的凹陷可被模压或可在生产过程中例如通过挤压或通过(例如)切割之类的机械方法加工而成。
图2A示出另一防复制膜或防复制层F2的实施例,该膜具有大致为矩形横截面的长度方向的槽NU而槽内填充有如图1B所说明的光敏材料PH。该塑料基材再次为透明的,而槽NU是用已述的方法产生。材料PH经均匀曝光(箭头LU)变成如图3A中的阴影部分所表示的不透光暗部(PHE)。在槽NU的这种配置情况下,只有部分信息PI可在复制器中通过以直角VV曝光而被复制,而另外的信息PP只有在某一角度下(本例约63°)可见。
因此,这里可获得的只是部分隐蔽。
图2B示出了在这方面更为有利的防复制膜或防复制层F3的另一种实施例。
此处的斜方形槽RU或是先制成槽NU(图2A)然后再经受沿方向SR的剪应力而成,或是通过挤压,切割等方法形成这一形状。填入的光敏材料PH是同一种并用(例如)刮涂法导入。在经由辐照源LU均匀曝光后,便能得到如图3B所示的具有以角度范围为r(见上述)的不透光斜层ss的最终防复制膜F3或防复制层。在图2和3的实例中沟槽NU和RU分别向上通过约为F2和F3的宽度d之半。这些沟槽也可更深。仅仅当采用基片膜或基片层G(此处未示),而层F2或F3被固定或涂覆到该层G时,才可将沟槽NU和RU的深度T加工成大致相当于总厚度d。
图4A表示与F2相比,在两侧都配置有矩形槽的膜或层F4。在其上表面的槽NU1和下表面的槽NU2被配置成彼此错开排列。如上所述,该不透光槽的内容物(PHE)是利用光化学材料PH及对其均匀曝光而产生。
信息I在VV方向上再次被完全隐蔽。
在VI和VII方向上,各有部分信息是可见的,信息的这种完全可见性随着槽NU1和NU2的深度T的减小而提高,而与各槽NU1和NU2的宽度bb无关。
图4B表示对应于图4A的膜或层实施例F5,与F3相比,该膜或层F5的两侧和斜层ss1和ss2组成F5,而层ss1可如上所述产生。斜层ss1和ss2沿水平方向彼此错开排列。
信息I在垂直观测方向VV上被隐蔽而沿斜向VI则至少部分可见。
图1B、2A和B、3A和B以及4A和B中的沟槽或凹陷的实施例也可用不透光或反射的带状插入物K来替代光敏槽或凹陷的内容物。
所述插入物可在,例如,凹陷或沟槽材料被挤压成型后直接插入凹陷或槽内。
甚至可通过共挤压透明塑料和不透光塑料OK(图1)而更简单直接地形成不透光或反射的带状凹陷或槽的内容物。
一种防复制膜或层包括透明材料的膜或层,该透明材料具有很多完全或部分非透明区,这些区域相距一定距离排列而其平面相对于该膜或层的大致相同的予定位置排列,因此,从予定视角观测防复制膜的表面时,该表面基本是透明的。
所述区域包含至少部分光敏材料由于辐照作用而转换成非透明或反射材料,在该透明塑料中设置其内装有光敏材料的凹陷或槽,也是可能的。
Claims (10)
1、一种防复制膜或层(F、F1-F5),包括具有大量部分或完全不透明区域的一透明材料膜或层,这些区域相距一定距离地排列而它们的平面相对于该膜或层表面的大致相同予定位置排列,以致从一予定视角(Ⅵ、Ⅶ)观测防复制膜(F、F1-F5)的表面时,该膜基本上是透明的,其中所述区域(SS、E2、SS1、SS2)部分或完全地包含一种用光化学法转换成非透明或反射材料的材料(PH)。
2、一种防复制膜或层(F、F1-F5),包括具有大量部分或完全不透明区域的一种透明材料膜或层,这些区域相隔一定距离排列,而其平面相对于该膜或层表面的大致相同的予定位置排列,以致从一予定视角观测防复制膜(F、F1-F5)的表面时,该膜基本上是透明的,其中该膜或层是由共同挤压成的透明和不透明塑料制成。
3、一种防复制膜或层(F、F1-F5),包括具有大量部分或完全不透明区域的一种透明材料膜或层,这些区域相隔一定距离排列,而其平面相对于该膜或层表面的大致予定位置排列,以致从一予定视角观测防复制膜(F、F1-F5)的表面时,该膜基本上是透明的,其中区域(SS、E2、SS1、SS2)包括不透明或反射带材,该带材在带有凹陷或沟槽(E、NU、RU、NU1、NU2)的透明材料经挤压以后,插入所述凹陷或沟槽内。
4、如权利要求1所述的防复制膜,其特征在于:所述不透明区域是包含经曝光和显影的光敏材料(PH)的斜层(SS、SS1、SS2)。
5、如权利要求1和4所述的防复制膜,其特征在于所述斜层(SS、SS1、SS2)是连续通过该膜(F)或层的厚度(d)的。
6、如权利要求1和4或5所述的防复制膜,特征在于所述透明材料包括至少一种光敏物质(PH)而且曝光被定域并在倾斜于材料表面的平面完成。
7、如权利要求1所述的防复制膜,其特征在于所述膜或层(F1-F5)是设置在至少一个带有大量大致平行大致等距的凹陷或槽(E、NU、RU、NU1、NU2)的表面上,而所述槽内盛装有一或更多种光敏物质(PH)。
8、如权利要求7所述的防复制膜,特征在于所述凹陷或槽(E,NU、RU、NU1、NU2)被设置成与所述膜表面或层表面成直角。
9、如权利要求7所述的防复制膜,其特征在于所述凹陷或槽(E、RU、SS1、SS2)是倾斜于所述膜表面或层表面而设置的。
10、如权利要求1或2或3所述的防复制膜,其特征在于所述不透明或反射区域是在膜或层(F4或F5)的上表面形成第一不透明或反射层(NU1、SS1)和在膜或层(F4或F5)的下表面相对于第一不透明层在水平方向上错开地设置成的第二不透明层(NU2、SS2)。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4236563A DE4236563A1 (de) | 1992-10-29 | 1992-10-29 | Anti-Kopier-Film oder -Schicht |
DEP4236563.5 | 1992-10-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1087730A true CN1087730A (zh) | 1994-06-08 |
CN1044349C CN1044349C (zh) | 1999-07-28 |
Family
ID=6471670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN93119717A Expired - Fee Related CN1044349C (zh) | 1992-10-29 | 1993-10-29 | 防复制膜 |
Country Status (14)
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---|---|
US (1) | US5795643A (zh) |
EP (1) | EP0670786B1 (zh) |
JP (1) | JP3386076B2 (zh) |
KR (1) | KR100268157B1 (zh) |
CN (1) | CN1044349C (zh) |
AT (1) | ATE149121T1 (zh) |
BR (1) | BR9307341A (zh) |
DE (2) | DE4236563A1 (zh) |
DK (1) | DK0670786T3 (zh) |
ES (1) | ES2098789T3 (zh) |
GR (1) | GR3023340T3 (zh) |
RU (1) | RU2101187C1 (zh) |
WO (1) | WO1994009990A1 (zh) |
ZA (1) | ZA938043B (zh) |
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DE4320219A1 (de) * | 1993-06-18 | 1994-12-22 | Basf Magnetics Gmbh | Antikopierfilm |
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DE69632863T2 (de) * | 1995-08-01 | 2004-11-18 | Boris Iliich Belousov | Banddatenträger, verfahren und vorrichtung zum herstellen desselben |
WO1999008161A1 (de) * | 1997-08-12 | 1999-02-18 | Emtec Matgnetics Gmbh | Anti-kopierfilm für dokumente gegen kopieren derselben in einer kopiereinrichtung mit definiertem öffnungswinkel |
DE19749789A1 (de) * | 1997-11-11 | 1999-05-12 | Bundesdruckerei Gmbh | Sicherheitsmerkmal für ein Wert- oder Sicherheitsdokument mit fraktalem Lamellensystem |
DE19932240B4 (de) * | 1999-07-10 | 2005-09-01 | Bundesdruckerei Gmbh | Optisch variabel darstellbare/versteckbare Sicherheitselemente für Wert- und Sicherheitsdokumente |
ES2174673B1 (es) * | 1999-07-12 | 2003-08-01 | Vijay Atawane | Sistema de seguridad para evitar el fotocopiado de documentos. |
US6692030B1 (en) * | 2000-07-21 | 2004-02-17 | Verify First Technologies, Inc. | Security document with nano-pattern |
US6398370B1 (en) | 2000-11-15 | 2002-06-04 | 3M Innovative Properties Company | Light control device |
US7694887B2 (en) | 2001-12-24 | 2010-04-13 | L-1 Secure Credentialing, Inc. | Optically variable personalized indicia for identification documents |
US7728048B2 (en) | 2002-12-20 | 2010-06-01 | L-1 Secure Credentialing, Inc. | Increasing thermal conductivity of host polymer used with laser engraving methods and compositions |
CA2470547C (en) | 2001-12-24 | 2008-05-20 | Digimarc Id Systems, Llc | Laser etched security features for identification documents and methods of making same |
WO2003056507A1 (en) | 2001-12-24 | 2003-07-10 | Digimarc Id Systems, Llc | Systems, compositions, and methods for full color laser engraving of id documents |
WO2003056500A1 (en) | 2001-12-24 | 2003-07-10 | Digimarc Id Systems, Llc | Covert variable information on id documents and methods of making same |
WO2003088144A2 (en) | 2002-04-09 | 2003-10-23 | Digimarc Id Systems, Llc | Image processing techniques for printing identification cards and documents |
US7824029B2 (en) | 2002-05-10 | 2010-11-02 | L-1 Secure Credentialing, Inc. | Identification card printer-assembler for over the counter card issuing |
WO2004049242A2 (en) | 2002-11-26 | 2004-06-10 | Digimarc Id Systems | Systems and methods for managing and detecting fraud in image databases used with identification documents |
US7763179B2 (en) | 2003-03-21 | 2010-07-27 | Digimarc Corporation | Color laser engraving and digital watermarking |
DE602004030434D1 (de) | 2003-04-16 | 2011-01-20 | L 1 Secure Credentialing Inc | Dreidimensionale datenspeicherung |
US7625613B2 (en) * | 2003-10-15 | 2009-12-01 | Verify First Technologies, Inc. | Copy-resistant security paper |
US7467873B2 (en) * | 2005-10-14 | 2008-12-23 | 3M Innovative Properties Company | Privacy film |
US7326504B2 (en) * | 2005-10-14 | 2008-02-05 | 3M Innovative Properties Company | Imaged anti-copy film |
ATE452764T1 (de) * | 2006-08-11 | 2010-01-15 | Nat Bank Of Belgium | Verstecktes bild |
ATE500069T1 (de) * | 2008-01-31 | 2011-03-15 | Nat Bank Of Belgium | Farbumschaltung |
US20100264163A1 (en) * | 2008-11-13 | 2010-10-21 | Tevs Nikolai R | Product Dispensing Apparatus And Method |
BR112012024369A2 (pt) | 2010-03-25 | 2016-05-24 | 3M Innovative Properties Co | matriz de extrusão e método de fabricação de uma camada composta |
KR20130018778A (ko) * | 2010-03-25 | 2013-02-25 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 복합 층 |
BR112012025122A2 (pt) * | 2010-03-25 | 2016-06-21 | 3M Innovative Properties Co | camada compósita |
GB201117523D0 (en) | 2011-10-11 | 2011-11-23 | Rue De Int Ltd | Security devices and methods of manufacture thereof |
EP2888116B1 (de) * | 2012-08-23 | 2016-09-21 | Covestro Deutschland AG | Sicherheits- und/oder wertdokument enthaltend ein visuell schaltbares fenster mit einem hologramm |
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-
1992
- 1992-10-29 DE DE4236563A patent/DE4236563A1/de not_active Withdrawn
-
1993
- 1993-10-16 RU RU95121657A patent/RU2101187C1/ru not_active IP Right Cessation
- 1993-10-16 WO PCT/EP1993/002860 patent/WO1994009990A1/de active IP Right Grant
- 1993-10-16 US US08/381,907 patent/US5795643A/en not_active Expired - Fee Related
- 1993-10-16 BR BR9307341A patent/BR9307341A/pt not_active IP Right Cessation
- 1993-10-16 DE DE59305549T patent/DE59305549D1/de not_active Expired - Fee Related
- 1993-10-16 AT AT93923480T patent/ATE149121T1/de not_active IP Right Cessation
- 1993-10-16 KR KR1019950701656A patent/KR100268157B1/ko not_active IP Right Cessation
- 1993-10-16 JP JP51062894A patent/JP3386076B2/ja not_active Expired - Fee Related
- 1993-10-16 EP EP93923480A patent/EP0670786B1/de not_active Expired - Lifetime
- 1993-10-16 ES ES93923480T patent/ES2098789T3/es not_active Expired - Lifetime
- 1993-10-16 DK DK93923480.3T patent/DK0670786T3/da active
- 1993-10-28 ZA ZA938043A patent/ZA938043B/xx unknown
- 1993-10-29 CN CN93119717A patent/CN1044349C/zh not_active Expired - Fee Related
-
1997
- 1997-05-05 GR GR970400997T patent/GR3023340T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
DE59305549D1 (de) | 1997-04-03 |
DE4236563A1 (de) | 1994-05-05 |
EP0670786A1 (de) | 1995-09-13 |
DK0670786T3 (da) | 1997-05-05 |
WO1994009990A1 (de) | 1994-05-11 |
BR9307341A (pt) | 1999-06-01 |
ATE149121T1 (de) | 1997-03-15 |
KR100268157B1 (ko) | 2000-10-16 |
RU2101187C1 (ru) | 1998-01-10 |
RU95121657A (ru) | 1996-12-27 |
CN1044349C (zh) | 1999-07-28 |
JP3386076B2 (ja) | 2003-03-10 |
JPH08505821A (ja) | 1996-06-25 |
GR3023340T3 (en) | 1997-08-29 |
ZA938043B (en) | 1995-04-28 |
EP0670786B1 (de) | 1997-02-26 |
ES2098789T3 (es) | 1997-05-01 |
US5795643A (en) | 1998-08-18 |
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