CN108699183A - 组合物及新型化合物 - Google Patents

组合物及新型化合物 Download PDF

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Publication number
CN108699183A
CN108699183A CN201780006082.2A CN201780006082A CN108699183A CN 108699183 A CN108699183 A CN 108699183A CN 201780006082 A CN201780006082 A CN 201780006082A CN 108699183 A CN108699183 A CN 108699183A
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CN
China
Prior art keywords
carbon atom
group
atom number
alkyl
substituent group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201780006082.2A
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English (en)
Chinese (zh)
Inventor
松井依纯
木村正树
铃木智美
冈田光裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Original Assignee
Asahi Denka Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Denka Kogyo KK filed Critical Asahi Denka Kogyo KK
Publication of CN108699183A publication Critical patent/CN108699183A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/205—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring the aromatic ring being a non-condensed ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/12—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains three hetero rings
    • C07D493/20—Spiro-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F16/32—Monomers containing two or more unsaturated aliphatic radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN201780006082.2A 2016-03-31 2017-03-23 组合物及新型化合物 Pending CN108699183A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016073406 2016-03-31
JP2016-073406 2016-03-31
PCT/JP2017/011886 WO2017170183A1 (fr) 2016-03-31 2017-03-23 Composition et nouveau composé

Publications (1)

Publication Number Publication Date
CN108699183A true CN108699183A (zh) 2018-10-23

Family

ID=59965510

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780006082.2A Pending CN108699183A (zh) 2016-03-31 2017-03-23 组合物及新型化合物

Country Status (5)

Country Link
JP (1) JP6875376B2 (fr)
KR (1) KR102314688B1 (fr)
CN (1) CN108699183A (fr)
TW (1) TWI737705B (fr)
WO (1) WO2017170183A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115605527A (zh) * 2020-05-15 2023-01-13 株式会社大赛璐（Jp） 新型环氧树脂和环氧树脂组合物

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019216266A1 (fr) * 2018-05-08 2019-11-14 株式会社Adeka Composé, additif latent, composition, produit durci, procédé de production du produit durci et procédé de production de la composition
JP7436176B2 (ja) * 2018-10-25 2024-02-21 株式会社Adeka 組成物、ソルダーレジスト組成物、硬化物及び硬化物の製造方法
WO2023176725A1 (fr) * 2022-03-16 2023-09-21 本州化学工業株式会社 Composé d'éther allylique et son procédé de production, composition de résine durcissable, vernis, préimprégné, produit durci, agent de durcissement de résine d'éther de polyphénylène, et cristaux et leur procédé de production

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0352837A (ja) * 1989-07-20 1991-03-07 Adeka Argus Chem Co Ltd イソペンテニルオキシトラン化合物
JPH04100891A (ja) * 1990-08-20 1992-04-02 Asahi Denka Kogyo Kk ネマチック液晶組成物
EP0601974A1 (fr) * 1992-12-04 1994-06-15 OCG Microelectronic Materials Inc. Photoréserve positive avec des propriétés améliorés
US5902838A (en) * 1996-10-01 1999-05-11 Loctite Corporation Process for the assembly of glass devices subjected to high temperatures, compositions therefor and novel polymers for rheological control of such compositions
US20030082464A1 (en) * 2001-05-30 2003-05-01 Fuji Photo Film Co., Ltd. UV Absorbent and preparation method thereof, compositions and image forming method
JP2008164925A (ja) * 2006-12-28 2008-07-17 Hayashi Telempu Co Ltd 位相差フィルムおよびその製造方法
US20090018239A1 (en) * 2004-01-26 2009-01-15 Henkel Corporation Underfill adhesives
CN104603691A (zh) * 2012-09-10 2015-05-06 Jsr株式会社 抗蚀剂下层膜形成用组合物和图案形成方法

Family Cites Families (7)

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Publication number Priority date Publication date Assignee Title
JPH07103002B2 (ja) * 1987-01-19 1995-11-08 長谷川香料株式会社 ゴキブリ忌避剤
JPH04120550A (ja) * 1990-09-11 1992-04-21 Mita Ind Co Ltd 電子写真感光体
JP2011048382A (ja) 2010-10-01 2011-03-10 Kodak Japan Ltd 感光性組成物、感光性平版印刷版および平版印刷版の作成方法
CN104334684B (zh) 2012-07-31 2019-08-27 株式会社艾迪科 潜伏性添加剂以及含有该添加剂的组合物
JP6049521B2 (ja) 2013-03-29 2016-12-21 富士フイルム株式会社 感光性樹脂組成物、硬化膜、画像形成方法、固体撮像素子、カラーフィルタおよび紫外線吸収剤
JP2015108649A (ja) 2013-12-03 2015-06-11 凸版印刷株式会社 青色感光性組成物およびカラーフィルタ基板
JP2015132791A (ja) 2013-12-13 2015-07-23 株式会社Adeka 着色感光性組成物

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0352837A (ja) * 1989-07-20 1991-03-07 Adeka Argus Chem Co Ltd イソペンテニルオキシトラン化合物
JPH04100891A (ja) * 1990-08-20 1992-04-02 Asahi Denka Kogyo Kk ネマチック液晶組成物
EP0601974A1 (fr) * 1992-12-04 1994-06-15 OCG Microelectronic Materials Inc. Photoréserve positive avec des propriétés améliorés
US5902838A (en) * 1996-10-01 1999-05-11 Loctite Corporation Process for the assembly of glass devices subjected to high temperatures, compositions therefor and novel polymers for rheological control of such compositions
US20030082464A1 (en) * 2001-05-30 2003-05-01 Fuji Photo Film Co., Ltd. UV Absorbent and preparation method thereof, compositions and image forming method
US20090018239A1 (en) * 2004-01-26 2009-01-15 Henkel Corporation Underfill adhesives
JP2008164925A (ja) * 2006-12-28 2008-07-17 Hayashi Telempu Co Ltd 位相差フィルムおよびその製造方法
CN104603691A (zh) * 2012-09-10 2015-05-06 Jsr株式会社 抗蚀剂下层膜形成用组合物和图案形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115605527A (zh) * 2020-05-15 2023-01-13 株式会社大赛璐（Jp） 新型环氧树脂和环氧树脂组合物

Also Published As

Publication number Publication date
TWI737705B (zh) 2021-09-01
KR20180132600A (ko) 2018-12-12
JP6875376B2 (ja) 2021-05-26
WO2017170183A1 (fr) 2017-10-05
TW201806917A (zh) 2018-03-01
KR102314688B1 (ko) 2021-10-19
JPWO2017170183A1 (ja) 2019-02-07

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Application publication date: 20181023

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