CN108630601A - 半导体装置的制造方法 - Google Patents
半导体装置的制造方法 Download PDFInfo
- Publication number
- CN108630601A CN108630601A CN201710711624.8A CN201710711624A CN108630601A CN 108630601 A CN108630601 A CN 108630601A CN 201710711624 A CN201710711624 A CN 201710711624A CN 108630601 A CN108630601 A CN 108630601A
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- China
- Prior art keywords
- chip
- band
- modification
- manufacturing
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 71
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 230000004048 modification Effects 0.000 claims abstract description 60
- 238000012986 modification Methods 0.000 claims abstract description 60
- 238000005520 cutting process Methods 0.000 claims abstract description 47
- 238000005286 illumination Methods 0.000 claims 1
- VEMKTZHHVJILDY-UHFFFAOYSA-N resmethrin Chemical compound CC1(C)C(C=C(C)C)C1C(=O)OCC1=COC(CC=2C=CC=CC=2)=C1 VEMKTZHHVJILDY-UHFFFAOYSA-N 0.000 claims 1
- 208000037656 Respiratory Sounds Diseases 0.000 abstract description 15
- 230000002401 inhibitory effect Effects 0.000 abstract description 3
- 230000011218 segmentation Effects 0.000 description 16
- 238000003776 cleavage reaction Methods 0.000 description 15
- 230000007017 scission Effects 0.000 description 15
- 238000000034 method Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 239000004575 stone Substances 0.000 description 4
- 239000007767 bonding agent Substances 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 238000009751 slip forming Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
- H01L2223/5446—Located in scribe lines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/562—Protection against mechanical damage
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017058147A JP2018160623A (ja) | 2017-03-23 | 2017-03-23 | 半導体装置の製造方法 |
JP2017-058147 | 2017-03-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108630601A true CN108630601A (zh) | 2018-10-09 |
CN108630601B CN108630601B (zh) | 2021-12-07 |
Family
ID=63581210
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710711624.8A Active CN108630601B (zh) | 2017-03-23 | 2017-08-18 | 半导体装置的制造方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US10304737B2 (zh) |
JP (1) | JP2018160623A (zh) |
CN (1) | CN108630601B (zh) |
TW (1) | TWI675411B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111326948A (zh) * | 2018-12-15 | 2020-06-23 | 深圳市中光工业技术研究院 | 激光器芯片的制备方法 |
CN111381327A (zh) * | 2018-12-27 | 2020-07-07 | 富士通光器件株式会社 | 光学模块及其制造方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7081993B2 (ja) * | 2018-06-19 | 2022-06-07 | 株式会社ディスコ | 被加工物の加工方法 |
JP2020150224A (ja) * | 2019-03-15 | 2020-09-17 | キオクシア株式会社 | 半導体装置 |
US20230411169A1 (en) * | 2022-06-15 | 2023-12-21 | Western Digital Technologies, Inc. | Semiconductor wafer thinned by horizontal stealth lasing |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1703770A (zh) * | 2002-12-03 | 2005-11-30 | 浜松光子学株式会社 | 半导体基板的切断方法 |
CN1819159A (zh) * | 2005-01-21 | 2006-08-16 | 松下电器产业株式会社 | 半导体晶片及半导体器件的制造方法以及半导体器件 |
US20070111390A1 (en) * | 2005-11-16 | 2007-05-17 | Denso Corporation | Semiconductor device and method for processing wafer |
CN101297394A (zh) * | 2005-11-10 | 2008-10-29 | 株式会社瑞萨科技 | 半导体器件的制造方法以及半导体器件 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006140356A (ja) | 2004-11-12 | 2006-06-01 | Hamamatsu Photonics Kk | レーザ加工方法及びレーザ加工装置 |
JP4809632B2 (ja) * | 2005-06-01 | 2011-11-09 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP2009184002A (ja) | 2008-02-08 | 2009-08-20 | Disco Abrasive Syst Ltd | レーザ加工方法 |
JP2010003817A (ja) | 2008-06-19 | 2010-01-07 | Tokyo Seimitsu Co Ltd | レーザーダイシング方法及びレーザーダイシング装置 |
US8378458B2 (en) * | 2010-03-22 | 2013-02-19 | Advanced Micro Devices, Inc. | Semiconductor chip with a rounded corner |
JP2013135198A (ja) | 2011-12-27 | 2013-07-08 | Fujitsu Semiconductor Ltd | 半導体装置の製造方法 |
WO2014054451A1 (ja) | 2012-10-02 | 2014-04-10 | ピーエスフォー ルクスコ エスエイアールエル | 半導体装置及びその製造方法 |
US9040389B2 (en) | 2012-10-09 | 2015-05-26 | Infineon Technologies Ag | Singulation processes |
JP6101468B2 (ja) * | 2012-10-09 | 2017-03-22 | 株式会社ディスコ | ウェーハの加工方法 |
-
2017
- 2017-03-23 JP JP2017058147A patent/JP2018160623A/ja active Pending
- 2017-08-01 TW TW106125855A patent/TWI675411B/zh active
- 2017-08-18 CN CN201710711624.8A patent/CN108630601B/zh active Active
- 2017-09-14 US US15/704,748 patent/US10304737B2/en active Active
-
2019
- 2019-04-16 US US16/385,330 patent/US10777459B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1703770A (zh) * | 2002-12-03 | 2005-11-30 | 浜松光子学株式会社 | 半导体基板的切断方法 |
CN1819159A (zh) * | 2005-01-21 | 2006-08-16 | 松下电器产业株式会社 | 半导体晶片及半导体器件的制造方法以及半导体器件 |
CN101297394A (zh) * | 2005-11-10 | 2008-10-29 | 株式会社瑞萨科技 | 半导体器件的制造方法以及半导体器件 |
US20070111390A1 (en) * | 2005-11-16 | 2007-05-17 | Denso Corporation | Semiconductor device and method for processing wafer |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111326948A (zh) * | 2018-12-15 | 2020-06-23 | 深圳市中光工业技术研究院 | 激光器芯片的制备方法 |
CN111381327A (zh) * | 2018-12-27 | 2020-07-07 | 富士通光器件株式会社 | 光学模块及其制造方法 |
CN111381327B (zh) * | 2018-12-27 | 2022-02-01 | 富士通光器件株式会社 | 光学模块及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20180277436A1 (en) | 2018-09-27 |
CN108630601B (zh) | 2021-12-07 |
TWI675411B (zh) | 2019-10-21 |
JP2018160623A (ja) | 2018-10-11 |
US10304737B2 (en) | 2019-05-28 |
US20190244860A1 (en) | 2019-08-08 |
US10777459B2 (en) | 2020-09-15 |
TW201843720A (zh) | 2018-12-16 |
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Legal Events
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo Patentee after: Kaixia Co.,Ltd. Address before: Tokyo Patentee before: TOSHIBA MEMORY Corp. Address after: Tokyo Patentee after: TOSHIBA MEMORY Corp. Address before: Tokyo Patentee before: Pangea Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20220124 Address after: Tokyo Patentee after: Pangea Co.,Ltd. Address before: Tokyo Patentee before: TOSHIBA MEMORY Corp. |