CN108470645B - 一种柔性微型超级电容器及其制作方法 - Google Patents
一种柔性微型超级电容器及其制作方法 Download PDFInfo
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- CN108470645B CN108470645B CN201810309231.9A CN201810309231A CN108470645B CN 108470645 B CN108470645 B CN 108470645B CN 201810309231 A CN201810309231 A CN 201810309231A CN 108470645 B CN108470645 B CN 108470645B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 239000003990 capacitor Substances 0.000 title claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000007772 electrode material Substances 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 23
- 238000000151 deposition Methods 0.000 claims abstract description 20
- 238000007738 vacuum evaporation Methods 0.000 claims abstract description 10
- 230000008021 deposition Effects 0.000 claims abstract description 9
- 239000007784 solid electrolyte Substances 0.000 claims abstract description 8
- 238000001704 evaporation Methods 0.000 claims abstract description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical group O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 12
- 238000005406 washing Methods 0.000 claims description 11
- UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(2+);cobalt(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 claims description 9
- 239000008367 deionised water Substances 0.000 claims description 8
- 229910021641 deionized water Inorganic materials 0.000 claims description 8
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000003792 electrolyte Substances 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 6
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 6
- 238000004806 packaging method and process Methods 0.000 claims description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 238000005520 cutting process Methods 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 229920002799 BoPET Polymers 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 claims description 3
- 238000004549 pulsed laser deposition Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 4
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 230000008020 evaporation Effects 0.000 claims 2
- 239000004408 titanium dioxide Substances 0.000 claims 2
- 239000007832 Na2SO4 Substances 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical group [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 claims 1
- 239000002356 single layer Substances 0.000 claims 1
- 229910052938 sodium sulfate Inorganic materials 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 9
- 238000002360 preparation method Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000011149 active material Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
- H01G11/86—Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/66—Current collectors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/13—Energy storage using capacitors
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
- Physical Vapour Deposition (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810309231.9A CN108470645B (zh) | 2018-04-09 | 2018-04-09 | 一种柔性微型超级电容器及其制作方法 |
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CN201810309231.9A CN108470645B (zh) | 2018-04-09 | 2018-04-09 | 一种柔性微型超级电容器及其制作方法 |
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CN108470645A CN108470645A (zh) | 2018-08-31 |
CN108470645B true CN108470645B (zh) | 2020-04-28 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN112713010A (zh) * | 2020-12-21 | 2021-04-27 | 浙江理工大学 | 激光打印牺牲图案制备柔性平面微型储能器件的方法及柔性平面微型储能器件 |
CN113066671B (zh) * | 2021-03-02 | 2023-07-28 | 浙江工业大学 | 一种热电柔性超级电容器及其制备方法 |
CN113044887B (zh) * | 2021-03-31 | 2022-10-14 | 辽宁大学 | 一种四氧化三钴多孔微球及其制备方法和在光辅助超级电容器中的应用 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5432151A (en) * | 1993-07-12 | 1995-07-11 | Regents Of The University Of California | Process for ion-assisted laser deposition of biaxially textured layer on substrate |
CN101035924A (zh) * | 2004-06-09 | 2007-09-12 | 美国Imra公司 | 使用超快脉冲激光沉积制造电化学装置的方法 |
CN104813425A (zh) * | 2012-10-17 | 2015-07-29 | 新加坡科技设计大学 | 高比电容和高功率密度印刷柔性微型超级电容器 |
CN105895853A (zh) * | 2016-04-20 | 2016-08-24 | 清华大学深圳研究生院 | 一种储能器件及其制备方法 |
CN106158411A (zh) * | 2016-08-17 | 2016-11-23 | 武汉理工大学 | 一种高性能对称式金属氧化物基微型超级电容器及其制备方法 |
-
2018
- 2018-04-09 CN CN201810309231.9A patent/CN108470645B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5432151A (en) * | 1993-07-12 | 1995-07-11 | Regents Of The University Of California | Process for ion-assisted laser deposition of biaxially textured layer on substrate |
CN101035924A (zh) * | 2004-06-09 | 2007-09-12 | 美国Imra公司 | 使用超快脉冲激光沉积制造电化学装置的方法 |
CN104813425A (zh) * | 2012-10-17 | 2015-07-29 | 新加坡科技设计大学 | 高比电容和高功率密度印刷柔性微型超级电容器 |
CN105895853A (zh) * | 2016-04-20 | 2016-08-24 | 清华大学深圳研究生院 | 一种储能器件及其制备方法 |
CN106158411A (zh) * | 2016-08-17 | 2016-11-23 | 武汉理工大学 | 一种高性能对称式金属氧化物基微型超级电容器及其制备方法 |
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Inventor after: Yang Shuhua Inventor after: Sun Jing Inventor after: Cao Bingqiang Inventor before: Sun Jing Inventor before: Yang Shuhua Inventor before: Cao Bingqiang |
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Effective date of registration: 20230116 Address after: Floor 17, Building A3-5, Hanyu Jingu, High-tech Zone, Jinan, Shandong Province, 250000 Patentee after: Shandong Political and Industrial Big Data Technology Research Institute Address before: 250022 No. 336, South Xin Zhuang West Road, Shizhong District, Ji'nan, Shandong Patentee before: University of Jinan |
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