CN108441836B - 一种中高温太阳能选择性吸收涂层及其制备方法 - Google Patents
一种中高温太阳能选择性吸收涂层及其制备方法 Download PDFInfo
- Publication number
- CN108441836B CN108441836B CN201810571132.8A CN201810571132A CN108441836B CN 108441836 B CN108441836 B CN 108441836B CN 201810571132 A CN201810571132 A CN 201810571132A CN 108441836 B CN108441836 B CN 108441836B
- Authority
- CN
- China
- Prior art keywords
- film
- target
- thickness
- sputtering
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 32
- 238000000576 coating method Methods 0.000 title claims abstract description 32
- 238000010521 absorption reaction Methods 0.000 title claims abstract description 24
- 238000002360 preparation method Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 29
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 18
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 9
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 6
- 238000007747 plating Methods 0.000 claims abstract description 3
- 238000004544 sputter deposition Methods 0.000 claims description 48
- 238000000151 deposition Methods 0.000 claims description 28
- 230000008021 deposition Effects 0.000 claims description 28
- 239000007789 gas Substances 0.000 claims description 26
- 239000013077 target material Substances 0.000 claims description 24
- 239000012495 reaction gas Substances 0.000 claims description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 238000001228 spectrum Methods 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 239000012528 membrane Substances 0.000 abstract 1
- 239000011888 foil Substances 0.000 description 10
- 239000011889 copper foil Substances 0.000 description 9
- 230000001276 controlling effect Effects 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000000861 blow drying Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 229910005855 NiOx Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- DOTMOQHOJINYBL-UHFFFAOYSA-N molecular nitrogen;molecular oxygen Chemical compound N#N.O=O DOTMOQHOJINYBL-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
本发明涉及一种中高温太阳能选择性吸收涂层及其制备方法,包括现有金属基底,其特征在于:在金属基底上,从下到上还分别有三层:红外反射层、吸收层和减反射层;所述的红外反射层为Al、Au、Ag或Ni任一种金属的涂层,吸收层自下而上依次包括TiN膜和TiCrN膜,减反射层自下而上依次包括Cr2O3膜、AlN膜和Al2O3膜;采用磁控溅射法进行镀膜。本发明的有益效果:1.本发明制得的涂层,具有吸收效率高、发射率低、热稳定性好的特点;2.太阳光谱吸收率α与发射率ε(T)之比高,适合200℃以上的中高温应用;3.制作工艺简便。
Description
技术领域
本发明属太阳能光热转换利用技术领域,涉及一种中高温太阳能选择性吸收涂层及其制备方法。
背景技术
太阳能选择性吸收涂层是在可见-近红外波段(300-2500nm)具有高吸收率,在红外波段(2500-20000nm)具有低发射率的功能薄膜,是用于太阳能集热器,提高光热转换效率的关键。随着太阳能热利用需求和技术的不断发展,太阳能集热器的应用范围从低温应用(≤200℃)向中温应用(200℃-400℃) 和高温应用(≥400℃)发展,以不断满足海水淡化、太阳能发电等中高温应用领域的使用要求。对于太阳能集热器使用的太阳能选择性吸收涂层也要求具备高温热稳定性,适应中高温环境的服役条件。
目前市场上出现的选择性吸收涂层中吸收层材料主要有AlN-Al(NiOx、 TiN)、Al(Mo、W、Ni、Co)-Al2O3、Al2O3-Mo-Al2O3、NiCrNxOy,TiNxOy等,其中NiCrNxOy、TiNxOy使用较多。中国专利公开号CN1584445A中采用成分渐变NiCrNxOy,太阳光谱吸收率最高为92%,辐射率最低为10%,α/ε最大9.2;中国专利公开号CN101240944A、CN201196495Y中,通过精确调控氮氧比,获得吸收率96%,辐射率4%的基于多层梯度TiNxOy吸收的选择性涂层,α/ε(80℃)最大24,主要适合200℃以下的低温应用。在中高温条件下,由于其红外发射率随温度上升明显升高,导致集热器热损失明显上升,热效率显著下降。
发明内容
本发明的目的是为了解决现有中高温太阳能选择性涂热效率低的问题,提供一种中高温太阳能选择性吸收涂层及其制备方法。
为了实现上述目的,本发明采用的技术方案如下:
一种中高温太阳能选择性吸收涂层,包括现有金属基底,其特征在于:在金属基底上,从下到上还分别有三层:红外反射层、吸收层和减反射层;
所述的红外反射层为Al、Au、Ag或Ni任一种金属的涂层,厚度为30-50nm;
所述的吸收层自下而上依次包括TiN膜和TiCrN膜,TiN膜的厚度为80-100nm,TiCrN膜的厚度为50-80nm;
所述减反射层自下而上依次包括Cr2O3膜、AlN膜和Al2O3膜,Cr2O3膜的厚度为30-50nm,AlN膜的厚度为50-70nm,Al2O3膜的厚度为20-60nm。
其中,在300-2500nm范围内,Cr2O3膜的折射率为2.29-2.61,AlN膜折射率为2.00-2.25,Al2O3膜的折射率为1.58-1.79。
一种中高温太阳能选择性吸收涂层制备方法,采用磁控溅射法为镀膜方法,其特征在于包括以下步骤:
a.选择厚度为0.15-10mm的玻璃、铝、铜或不锈钢;
b.选用靶材为铝靶、金靶、银靶或镍靶,工作气体为惰性气体氩气(Ar)制备红外反射层,控制本底真空≤9×10-4 Pa;工作压强:5-8×10-1 Pa;溅射功率:80-100W;溅射工艺气体Ar流量:20-40sccm;沉积厚度:30-50nm,即可得涂覆有红外反射层的基片;
c.磁控溅射设备中选用靶材:Ti靶(4N);控制本底真空≤8×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:80-120W;溅射工艺气体Ar流量:20-40sccm;反应气体N2流量:6-10sccm;沉积厚度:80-100nm,即可得涂覆有吸收层TiN薄膜的基片;
d.磁控溅射设备中选用靶材:TiCr合金靶(4N,Ti:Cr(at%)=4:1);控制本底真空≤9×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:60-120W;溅射工艺气体Ar流量: 20-50sccm;反应气体N2流量:8-12sccm;沉积厚度:50-80nm,即可得涂覆有吸收层TiCrN薄膜的基片;
e.磁控溅射设备中选用靶材:Cr靶(4N);控制本底真空≤9×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:60-80W;溅射工艺气体Ar流量:20-40sccm;反应气体O2流量:6-10sccm;沉积厚度:30-50nm,即可得涂覆有减反射层Cr2O3薄膜的基片;
f.磁控溅射设备中选用靶材:Al靶(4N);控制本底真空≤9×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:60-100W;溅射工艺气体Ar流量:20-40sccm;反应气体N2流量:6-12sccm;沉积厚度:50-70nm,即可得涂覆有减反射层AlN薄膜的基片;
h.磁控溅射设备中选用靶材:Al靶(4N);控制本底真空≤9×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:60-80W;溅射工艺气体Ar流量:20-40sccm;反应气体O2流量:4-8sccm;沉积厚度:20-60nm,可得涂覆有沉积Al2O3薄膜的基片即为一种中高温太阳能选择性吸收涂层。
TiN膜和TiCrN膜在中高温环境中热稳定性良好,TiN膜和TiCrN膜作为吸收层,两种薄膜的热膨胀系数相近,使其在中高温环境中界面应力小,提高了涂层的附着力和中高温环境中性能的稳定性;
减反射层采用Cr2O3膜、AlN膜和Al2O3膜依次叠加组成,薄膜的折射率依次递减,具有更加优异的减反效果;
中高温太阳能选择性吸收涂层具有优异的光谱选择性。吸收-反射过渡区陡峭,选择性吸收涂层的中高温(200℃-400℃)发射率ε<4%,吸收率α>92%,α/ε高于现有商业产品,适用于低倍聚焦的中高温太阳能集热器。
本发明的有益效果:1.本发明制得的涂层,具有吸收效率高、发射率低、热稳定性好的特点;2.太阳光谱吸收率α与发射率ε(T)之比高,适合200℃以上的中高温应用;3.制作工艺简便。
附图说明
图1是一种中高温太阳能选择性吸收涂层的结构示意图;
图2是一种中高温太阳能选择性吸收涂层的制备流程示意图。
具体实施例
结合图1,一种中高温太阳能选择性吸收涂层,包括金属基底,在金属基底上,从下到上还分别有三层:红外反射层、吸收层和减反射层;红外反射层为Al、Au、Ag或Ni任一种金属的涂层,厚度为30-50nm;吸收层自下而上依次包括TiN膜和TiCrN膜,TiN膜的厚度为80-100nm,TiCrN膜的厚度为50-80nm;减反射层自下而上依次包括Cr2O3膜、AlN膜和Al2O3膜,Cr2O3膜的厚度为30-50nm,AlN膜的厚度为50-70nm,Al2O3膜的厚度为20-60nm。其中,在300-2500nm范围内,Cr2O3膜的折射率为2.29-2.61,AlN膜折射率为2.00-2.25,Al2O3膜的折射率为1.58-1.79。
结合图2,一种中高温太阳能选择性吸收涂层及其制备方法,具体实施步骤如下:
实施例1
(1)选用厚度为0.3mm的铜箔片;
(2)金属基片表面的清洗:把铜箔片放入超声波清洗机内,先用丙酮超声20min,再用酒精超声20min,最后用去离子水超声20min,用高压N2吹干;
(3)取出铜箔片,放入磁控溅射设备中沉积红外反射层Al薄膜,制备工艺参数如下:
靶材:Al靶(4N);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:80W;溅射工艺气体Ar流量:30sccm;沉积厚度:30nm,得涂覆有红外反射层Al薄膜的铜箔片;
(4)磁控溅射设备中沉积吸收层TiN薄膜,制备工艺参数如下:
靶材:Ti靶(4N);本底真空≤8×10-4 Pa;工作压强:4.5×10-1 Pa;溅射功率:100W;溅射工艺气体Ar流量:30sccm;反应气体N2流量:8sccm;沉积厚度:100nm,得涂覆有吸收层TiN薄膜的铜箔片;
(5)磁控溅射设备中沉积吸收层TiCrN薄膜,制备工艺参数如下:
靶材:TiCr合金靶(4N,Ti:Cr(at%)=4:1);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:100W;溅射工艺气体Ar流量: 30sccm;反应气体N2流量:10sccm;沉积厚度:60nm,得涂覆有吸收层TiCrN薄膜的铜箔片;
(6)磁控溅射设备中沉积减反射层Cr2O3薄膜,制备工艺参数如下:
靶材:Cr靶(4N);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:75W;溅射工艺气体Ar流量:30sccm;反应气体O2流量:8sccm;沉积厚度:40nm,得涂覆有减反射层Cr2O3薄膜的铜箔片;
(7)磁控溅射设备中沉积减反射层AlN薄膜,制备工艺参数如下:
靶材:Al靶(4N);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;
溅射功率:80W;溅射工艺气体Ar流量: 30sccm;反应气体N2流量:10sccm;
沉积厚度:60nm,得涂覆有减反射层AlN薄膜的铜箔片;
(8)磁控溅射设备中沉积Al2O3薄膜,制备工艺参数如下:
靶材:Al靶(4N);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:70W;溅射工艺气体Ar流量:30sccm;反应气体O2流量:6sccm;沉积厚度:50nm,得涂覆有沉积Al2O3薄膜的铜箔片即为一种中高温太阳能选择性吸收涂层。
实施例2
(1)选用厚度为0.2mm的铝箔片;
(2)金属基片表面的清洗:把铝箔片放入超声波清洗机内,先用丙酮超声20min,再用酒精超声20min,最后用去离子水超声20min,用高压N2吹干;
(3)取出铝箔片,放入磁控溅射设备中沉积红外反射层Ag薄膜,制备工艺参数如下:
靶材:Ag靶(4N);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:80W;溅射工艺气体Ar流量:30sccm;沉积厚度:25nm,得涂覆有红外反射层Ag薄膜的铝箔片;
(4)磁控溅射设备中沉积吸收层TiN薄膜,制备工艺参数如下:
靶材:Ti靶(4N);本底真空≤8×10-4 Pa;工作压强:4.5×10-1 Pa;溅射功率:900W;溅射工艺气体Ar流量:30sccm;反应气体N2流量:8sccm;沉积厚度:110nm,得涂覆有吸收层TiN薄膜的铝箔片;
(5)磁控溅射设备中沉积吸收层TiCrN薄膜,制备工艺参数如下:
靶材:TiCr合金靶(4N,Ti:Cr(at%)=3:2);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:110W;溅射工艺气体Ar流量:30sccm;反应气体N2流量:12sccm;沉积厚度:70nm,得涂覆有吸收层TiCrN薄膜的铝箔片;
(6)磁控溅射设备中沉积减反射层Cr2O3薄膜,制备工艺参数如下:
靶材:Cr靶(4N);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:80W;溅射工艺气体Ar流量:30sccm;反应气体O2流量:8sccm;沉积厚度:45nm,得涂覆有减反射层Cr2O3薄膜的铝箔片;
(7)磁控溅射设备中沉积减反射层AlN薄膜,制备工艺参数如下:
靶材:Al靶(4N);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:100W;溅射工艺气体Ar流量:30sccm;反应气体N2流量:9sccm;沉积厚度:50nm,得涂覆有减反射层AlN薄膜的铝箔片;
(8)磁控溅射设备中沉积Al2O3薄膜,制备工艺参数如下:
靶材:Al靶(4N);本底真空≤9×10-4 Pa;工作压强:5×10-1 Pa;溅射功率:80W;溅射工艺气体Ar流量:30sccm;反应气体O2流量:7sccm;沉积厚度:60nm,得涂覆有沉积Al2O3薄膜的铝箔片即为一种中高温太阳能选择性吸收涂层。
Claims (3)
1.一种中高温太阳能选择性吸收涂层,包括现有金属基底,其特征在于:在金属基底上,从下到上还分别有三层:红外反射层、吸收层和减反射层;
所述的红外反射层为Al、Au、Ag或Ni任一种金属的涂层,厚度为30-50nm;
所述的吸收层自下而上依次包括TiN膜和TiCrN膜,TiN膜的厚度为80-100nm,TiCrN膜的厚度为50-80nm;
所述减反射层自下而上依次包括Cr2O3膜、AlN膜和Al2O3膜,Cr2O3膜的厚度为30-50nm,AlN膜的厚度为50-70nm,Al2O3膜的厚度为20-60nm。
2.根据权利要求1所述减反射层,其特征在于:在300-2500nm范围内,Cr2O3膜的折射率为2.29-2.61,AlN膜折射率为2.00-2.25,Al2O3膜的折射率为1.58-1.79。
3.一种中高温太阳能选择性吸收涂层制备方法,采用磁控溅射法为镀膜方法,其特征在于包括以下步骤:
a.选择厚度为0.15-10mm的玻璃、铝、铜或不锈钢;
b.选用靶材为铝靶、金靶、银靶或镍靶,工作气体为惰性气体氩气(Ar)制备红外反射层,控制本底真空≤9×10-4 Pa;工作压强:5-8×10-1 Pa;溅射功率:80-100W;溅射工艺气体Ar流量:20-40sccm;沉积厚度:30-50nm,即可得涂覆有红外反射层的基片;
c.磁控溅射设备中选用靶材:Ti靶(4N);控制本底真空≤8×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:80-120W;溅射工艺气体Ar流量:20-40sccm;反应气体N2流量:6-10sccm;沉积厚度:80-100nm,即可得涂覆有吸收层TiN薄膜的基片;
d.磁控溅射设备中选用靶材:TiCr合金靶(4N,Ti:Cr(at%)=4:1);控制本底真空≤9×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:60-120W;溅射工艺气体Ar流量: 20-50sccm;反应气体N2流量:8-12sccm;沉积厚度:50-80nm,即可得涂覆有吸收层TiCrN薄膜的基片;
e.磁控溅射设备中选用靶材:Cr靶(4N);控制本底真空≤9×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:60-80W;溅射工艺气体Ar流量:20-40sccm;反应气体O2流量:6-10sccm;沉积厚度:30-50nm,即可得涂覆有减反层Cr2O3薄膜的基片;
f.磁控溅射设备中选用靶材:Al靶(4N);控制本底真空≤9×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:60-100W;溅射工艺气体Ar流量:20-40sccm;反应气体N2流量:6-12sccm;沉积厚度:50-70nm,即可得涂覆有减反层AlN薄膜的基片;
h.磁控溅射设备中选用靶材:Al靶(4N);控制本底真空≤9×10-4 Pa;工作压强:4-6×10-1 Pa;溅射功率:60-80W;溅射工艺气体Ar流量:20-40sccm;反应气体O2流量:4-8sccm;沉积厚度:20-60nm,可得涂覆有沉积Al2O3薄膜的基片即为一种中高温太阳能选择性吸收涂层。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810571132.8A CN108441836B (zh) | 2018-06-05 | 2018-06-05 | 一种中高温太阳能选择性吸收涂层及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810571132.8A CN108441836B (zh) | 2018-06-05 | 2018-06-05 | 一种中高温太阳能选择性吸收涂层及其制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108441836A CN108441836A (zh) | 2018-08-24 |
CN108441836B true CN108441836B (zh) | 2024-01-23 |
Family
ID=63206044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810571132.8A Active CN108441836B (zh) | 2018-06-05 | 2018-06-05 | 一种中高温太阳能选择性吸收涂层及其制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108441836B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109768284A (zh) * | 2019-03-11 | 2019-05-17 | 江南大学 | 一种锂硫电池用独立功能性夹层及其制备方法 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU1537000A (en) * | 1998-11-30 | 2000-06-19 | Carl Zeiss Vision Australia Holdings Ltd | Coated lens exhibiting substantially balanced reflectance |
CN102031499A (zh) * | 2011-01-14 | 2011-04-27 | 西南石油大学 | 钢基材表面铬-钛-碳-氮-氧系多元复合陶瓷膜及其制备方法 |
CN102277555A (zh) * | 2011-08-23 | 2011-12-14 | 北京天瑞星真空技术开发有限公司 | 一种具有TiN和AlN的双陶瓷结构高温太阳能选择性吸收涂层及其制备方法 |
EP2628818A1 (de) * | 2012-02-14 | 2013-08-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gegenstand mit reflexionsmindernder Beschichtung und Verfahren zu dessen Herstellung |
CN105091377A (zh) * | 2015-09-01 | 2015-11-25 | 中国建筑材料科学研究总院 | 一种太阳能选择性吸收涂层及其制备方法 |
CN105177497A (zh) * | 2014-06-12 | 2015-12-23 | 佛山圣哥拉太阳能科技有限公司 | 一种干涉型太阳能选择性吸热涂层 |
CN105568238A (zh) * | 2015-12-30 | 2016-05-11 | 中国建材国际工程集团有限公司 | 具有太阳能选择性吸收薄膜膜系的制备方法 |
CN208328096U (zh) * | 2018-06-05 | 2019-01-04 | 中建材蚌埠玻璃工业设计研究院有限公司 | 一种中高温太阳能选择性吸收涂层 |
-
2018
- 2018-06-05 CN CN201810571132.8A patent/CN108441836B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU1537000A (en) * | 1998-11-30 | 2000-06-19 | Carl Zeiss Vision Australia Holdings Ltd | Coated lens exhibiting substantially balanced reflectance |
CN102031499A (zh) * | 2011-01-14 | 2011-04-27 | 西南石油大学 | 钢基材表面铬-钛-碳-氮-氧系多元复合陶瓷膜及其制备方法 |
CN102277555A (zh) * | 2011-08-23 | 2011-12-14 | 北京天瑞星真空技术开发有限公司 | 一种具有TiN和AlN的双陶瓷结构高温太阳能选择性吸收涂层及其制备方法 |
EP2628818A1 (de) * | 2012-02-14 | 2013-08-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gegenstand mit reflexionsmindernder Beschichtung und Verfahren zu dessen Herstellung |
CN105177497A (zh) * | 2014-06-12 | 2015-12-23 | 佛山圣哥拉太阳能科技有限公司 | 一种干涉型太阳能选择性吸热涂层 |
CN105091377A (zh) * | 2015-09-01 | 2015-11-25 | 中国建筑材料科学研究总院 | 一种太阳能选择性吸收涂层及其制备方法 |
CN105568238A (zh) * | 2015-12-30 | 2016-05-11 | 中国建材国际工程集团有限公司 | 具有太阳能选择性吸收薄膜膜系的制备方法 |
CN208328096U (zh) * | 2018-06-05 | 2019-01-04 | 中建材蚌埠玻璃工业设计研究院有限公司 | 一种中高温太阳能选择性吸收涂层 |
Non-Patent Citations (1)
Title |
---|
太阳能光谱选择性吸收涂层研究进展;于红超;赵鑫;耿庆芬;高祥虎;刘刚;;化工新型材料;第40卷(第2期);第7-9,106页 * |
Also Published As
Publication number | Publication date |
---|---|
CN108441836A (zh) | 2018-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101737983B (zh) | 一种太阳光谱选择性吸收涂层的制备方法 | |
CN102102918B (zh) | 一种Cr系高温太阳能选择性吸收涂层及其制备方法 | |
CN201218622Y (zh) | 一种太阳能选择性吸收涂层 | |
CN106288462B (zh) | 一种太阳能选择性吸收涂层及其制备方法 | |
CN106884145B (zh) | 一种太阳光谱选择性吸收涂层及其制备方法 | |
CN107314559B (zh) | 光热转换涂层及其制备方法 | |
CN107270564B (zh) | 一种太阳光热吸收涂层 | |
CN100532997C (zh) | 一种太阳能选择性吸收涂层及其制备方法 | |
CN102734956A (zh) | 一种太阳能中高温选择性吸热涂层 | |
CN103029374A (zh) | 一种中高温太阳能光热选择性吸收涂层 | |
CN109457219B (zh) | 一种中低温太阳光谱选择性吸收涂层及其制备方法 | |
CN103105011B (zh) | 适于中高温热利用的太阳能选择性吸收膜系及其制备方法 | |
CN108441836B (zh) | 一种中高温太阳能选择性吸收涂层及其制备方法 | |
CN108468033B (zh) | 一种耐高温太阳能选择性吸收涂层及其制备方法 | |
CN201463375U (zh) | 一种太阳能集热管 | |
CN105605814B (zh) | 一种太阳光谱选择性吸收涂层及其制备方法 | |
CN105546857B (zh) | 一种太阳能选择性吸收膜系及其制备方法 | |
CN109338297A (zh) | 一种二硼化铪-二硼化锆基高温太阳能吸收涂层及其制备方法 | |
CN208328096U (zh) | 一种中高温太阳能选择性吸收涂层 | |
CN105568238B (zh) | 具有太阳能选择性吸收薄膜膜系的制备方法 | |
CN102305484A (zh) | 具有陷光结构的太阳能集热管 | |
CN106468483A (zh) | 一种新型叠堆结构光热转换涂层 | |
CN209484869U (zh) | 双过渡层复合吸收型太阳光谱选择性吸收涂层 | |
CN110895058A (zh) | 一种新型高温太阳能选择性吸收涂层 | |
CN106403329A (zh) | 高温太阳能选择性吸收涂层及其制备方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 233010 Tushan Road 1047, Yuhui District, Bengbu City, Anhui Province Applicant after: China Building Materials Glass New Materials Research Institute Group Co.,Ltd. Address before: 233010 Tushan Road 1047, Yuhui District, Bengbu City, Anhui Province Applicant before: CHINA BUILDING MATERIALS BENGBU GLASS INDUSTRY DESIGN & RESEARCH INSTITUTE Co.,Ltd. |
|
GR01 | Patent grant | ||
GR01 | Patent grant |