CN108344662A - 显影液的二氧化碳浓度显示装置及显影液管理装置 - Google Patents
显影液的二氧化碳浓度显示装置及显影液管理装置 Download PDFInfo
- Publication number
- CN108344662A CN108344662A CN201711232810.XA CN201711232810A CN108344662A CN 108344662 A CN108344662 A CN 108344662A CN 201711232810 A CN201711232810 A CN 201711232810A CN 108344662 A CN108344662 A CN 108344662A
- Authority
- CN
- China
- Prior art keywords
- developer solution
- carbon dioxide
- absorbing carbon
- dioxide concentration
- value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 524
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 261
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 261
- 230000007246 mechanism Effects 0.000 claims abstract description 113
- 238000007726 management method Methods 0.000 claims description 112
- 239000007788 liquid Substances 0.000 claims description 73
- 238000005259 measurement Methods 0.000 claims description 41
- 238000011161 development Methods 0.000 claims description 38
- 210000000056 organ Anatomy 0.000 claims description 36
- 238000010521 absorption reaction Methods 0.000 claims description 22
- 238000004364 calculation method Methods 0.000 claims description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 21
- 229910052799 carbon Inorganic materials 0.000 claims description 21
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 14
- 238000013500 data storage Methods 0.000 claims description 13
- 239000004408 titanium dioxide Substances 0.000 claims description 7
- 230000005540 biological transmission Effects 0.000 claims description 6
- 239000003513 alkali Substances 0.000 abstract description 44
- 239000000203 mixture Substances 0.000 abstract description 40
- 239000004615 ingredient Substances 0.000 abstract description 7
- 239000000243 solution Substances 0.000 description 426
- 229960004424 carbon dioxide Drugs 0.000 description 195
- 239000007789 gas Substances 0.000 description 50
- 229920002120 photoresistant polymer Polymers 0.000 description 49
- 238000000034 method Methods 0.000 description 31
- 239000003795 chemical substances by application Substances 0.000 description 28
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 28
- 239000000523 sample Substances 0.000 description 25
- 239000000470 constituent Substances 0.000 description 21
- 230000006870 function Effects 0.000 description 19
- 238000005070 sampling Methods 0.000 description 19
- 230000008859 change Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 241000790917 Dioxys <bee> Species 0.000 description 10
- 230000003534 oscillatory effect Effects 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000013589 supplement Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000002835 absorbance Methods 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000004448 titration Methods 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000001739 density measurement Methods 0.000 description 3
- 230000005251 gamma ray Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000012086 standard solution Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000003556 assay Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910002090 carbon oxide Inorganic materials 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010808 liquid waste Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- GCNLQHANGFOQKY-UHFFFAOYSA-N [C+4].[O-2].[O-2].[Ti+4] Chemical compound [C+4].[O-2].[O-2].[Ti+4] GCNLQHANGFOQKY-UHFFFAOYSA-N 0.000 description 1
- 238000002479 acid--base titration Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 230000019771 cognition Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 230000028016 temperature homeostasis Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
- G01N9/36—Analysing materials by measuring the density or specific gravity, e.g. determining quantity of moisture
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
- G01N33/004—CO or CO2
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017009833A JP6763608B2 (ja) | 2017-01-23 | 2017-01-23 | 現像液の二酸化炭素濃度表示装置、及び現像液管理装置 |
| JP2017-009833 | 2017-01-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108344662A true CN108344662A (zh) | 2018-07-31 |
Family
ID=62962105
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711232810.XA Pending CN108344662A (zh) | 2017-01-23 | 2017-11-29 | 显影液的二氧化碳浓度显示装置及显影液管理装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6763608B2 (ko) |
| KR (1) | KR20180087121A (ko) |
| CN (1) | CN108344662A (ko) |
| TW (1) | TW201827808A (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018120897A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液の濃度監視装置、及び現像液管理装置 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02293629A (ja) * | 1989-05-09 | 1990-12-04 | Nec Corp | 半導体ウェット処理装置用液面計 |
| CN1312490A (zh) * | 2000-01-31 | 2001-09-12 | 富士胶片株式会社 | 自动显影装置及补充显影补充液的方法 |
| JP2005070351A (ja) * | 2003-08-22 | 2005-03-17 | Nagase & Co Ltd | 現像液供給方法及び装置 |
| TW200720860A (en) * | 2005-11-21 | 2007-06-01 | Mitsubishi Chem Eng Corp | Method for producing surfactant-containing alkali developer solution and producing device |
| JP2014007251A (ja) * | 2012-06-22 | 2014-01-16 | Tokyo Electron Ltd | 基板処理装置のデータ取得方法及びセンサ用基板 |
| CN105278566A (zh) * | 2014-07-17 | 2016-01-27 | 株式会社平间理化研究所 | 蚀刻液管理装置、溶解金属浓度测定装置及测定方法 |
| CN106371297A (zh) * | 2015-07-22 | 2017-02-01 | 株式会社平间理化研究所 | 显影液成分浓度测定装置及方法、显影液管理装置及方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2561578B2 (ja) | 1991-08-07 | 1996-12-11 | 株式会社平間理化研究所 | 現像液管理装置 |
| JPH08220772A (ja) * | 1995-02-20 | 1996-08-30 | Konica Corp | 感光材料の処理液補充方法 |
| JPH08262739A (ja) * | 1995-03-24 | 1996-10-11 | Sumitomo Chem Co Ltd | 現像液調合装置及び現像液の調合方法 |
| JP2003131398A (ja) * | 2001-08-16 | 2003-05-09 | Hirama Rika Kenkyusho:Kk | アルカリ系加工液、加工液調整方法及び装置、並びに、加工液供給方法及び装置 |
| US7078162B2 (en) * | 2003-10-08 | 2006-07-18 | Eastman Kodak Company | Developer regenerators |
| WO2008065755A1 (fr) | 2006-11-30 | 2008-06-05 | Mitsubishi Chemical Engineering Corporation | Procédé de régulation d'une concentration de solution de développement, appareil de préparation de la solution de développement et solution de développement |
| JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
| JP5099150B2 (ja) * | 2010-02-26 | 2012-12-12 | 株式会社デンソー | 排気浄化装置の異常診断装置 |
| KR101395019B1 (ko) * | 2013-05-06 | 2014-05-14 | (주)세미로드 | 현상액의 농도 측정 및 조절 장치 |
| KR101748515B1 (ko) * | 2013-05-09 | 2017-06-16 | 가부시키가이샤 히다치 하이테크놀로지즈 | 중첩 계측 장치, 중첩 계측 방법 및 중첩 계측 시스템 |
-
2017
- 2017-01-23 JP JP2017009833A patent/JP6763608B2/ja not_active Expired - Fee Related
- 2017-11-29 CN CN201711232810.XA patent/CN108344662A/zh active Pending
- 2017-11-29 KR KR1020170161406A patent/KR20180087121A/ko active IP Right Grant
- 2017-11-30 TW TW106141772A patent/TW201827808A/zh unknown
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02293629A (ja) * | 1989-05-09 | 1990-12-04 | Nec Corp | 半導体ウェット処理装置用液面計 |
| CN1312490A (zh) * | 2000-01-31 | 2001-09-12 | 富士胶片株式会社 | 自动显影装置及补充显影补充液的方法 |
| JP2005070351A (ja) * | 2003-08-22 | 2005-03-17 | Nagase & Co Ltd | 現像液供給方法及び装置 |
| TW200720860A (en) * | 2005-11-21 | 2007-06-01 | Mitsubishi Chem Eng Corp | Method for producing surfactant-containing alkali developer solution and producing device |
| JP2014007251A (ja) * | 2012-06-22 | 2014-01-16 | Tokyo Electron Ltd | 基板処理装置のデータ取得方法及びセンサ用基板 |
| CN105278566A (zh) * | 2014-07-17 | 2016-01-27 | 株式会社平间理化研究所 | 蚀刻液管理装置、溶解金属浓度测定装置及测定方法 |
| CN106371297A (zh) * | 2015-07-22 | 2017-02-01 | 株式会社平间理化研究所 | 显影液成分浓度测定装置及方法、显影液管理装置及方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20180087121A (ko) | 2018-08-01 |
| TW201827808A (zh) | 2018-08-01 |
| JP2018120896A (ja) | 2018-08-02 |
| JP6763608B2 (ja) | 2020-09-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180731 |