TW200720860A - Method for producing surfactant-containing alkali developer solution and producing device - Google Patents
Method for producing surfactant-containing alkali developer solution and producing deviceInfo
- Publication number
- TW200720860A TW200720860A TW095136747A TW95136747A TW200720860A TW 200720860 A TW200720860 A TW 200720860A TW 095136747 A TW095136747 A TW 095136747A TW 95136747 A TW95136747 A TW 95136747A TW 200720860 A TW200720860 A TW 200720860A
- Authority
- TW
- Taiwan
- Prior art keywords
- surfactant
- concentration
- alkali developer
- developer solution
- producing
- Prior art date
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
To provide a producing device for a surfactant-containing alkali developer solution that can efficiently produce on-site a surfactant-containing alkali developer solution having higher quality. The method for producing a surfactant-containing alkali developer solution includes steps of adding a surfactant to pure water to prepare a surfactant mixture liquid, and further adding an alkali developer source liquid thereto. The addition of the surfactant is carried out in an initial preparation step (A) of preparing a surfactant mixture liquid having a concentration of the surfactant lower than a target concentration, a concentration measuring step (B) of measuring the concentration of the surfactant in the surfactant mixture liquid, a concentration controlling step (C) of calculating a shortfall of the surfactant and supplying the surfactant by 85 to 99% of the shortfall to the surfactant mixture liquid, and repeating the steps (B) and (C) until the measured concentration reaches a threshold value of the target concentration. The concentration of the surfactant is measured by use of an inline concentration measuring device utilizing a bubble pressure tensiometer.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005335883A JP4792937B2 (en) | 2005-11-21 | 2005-11-21 | Method for producing surfactant-containing alkaline developer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200720860A true TW200720860A (en) | 2007-06-01 |
Family
ID=38203186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095136747A TW200720860A (en) | 2005-11-21 | 2006-10-03 | Method for producing surfactant-containing alkali developer solution and producing device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4792937B2 (en) |
| TW (1) | TW200720860A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108344662A (en) * | 2017-01-23 | 2018-07-31 | 株式会社平间理化研究所 | The gas concentration lwevel display device and developer solution managing device of developer solution |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0871389A (en) * | 1994-09-07 | 1996-03-19 | Tokyo Ohka Kogyo Co Ltd | Preparation of developing solution |
| JP3741811B2 (en) * | 1996-12-25 | 2006-02-01 | 三菱化学エンジニアリング株式会社 | Method and apparatus for diluting alkaline developer stock solution |
| JP2000131213A (en) * | 1998-10-28 | 2000-05-12 | Mitsubishi Chemicals Corp | Surface tension measuring device |
| DE10209466B4 (en) * | 2002-03-05 | 2004-03-11 | Sita Messtechnik Gmbh | Device for the continuous monitoring and control of process solution |
-
2005
- 2005-11-21 JP JP2005335883A patent/JP4792937B2/en active Active
-
2006
- 2006-10-03 TW TW095136747A patent/TW200720860A/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108344662A (en) * | 2017-01-23 | 2018-07-31 | 株式会社平间理化研究所 | The gas concentration lwevel display device and developer solution managing device of developer solution |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4792937B2 (en) | 2011-10-12 |
| JP2007140270A (en) | 2007-06-07 |
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