CN108227408B - 曝光装置及曝光方法 - Google Patents

曝光装置及曝光方法 Download PDF

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Publication number
CN108227408B
CN108227408B CN201711449976.7A CN201711449976A CN108227408B CN 108227408 B CN108227408 B CN 108227408B CN 201711449976 A CN201711449976 A CN 201711449976A CN 108227408 B CN108227408 B CN 108227408B
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China
Prior art keywords
mask
cylindrical
substrate
region
dimension
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CN201711449976.7A
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English (en)
Chinese (zh)
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CN108227408A (zh
Inventor
加藤正纪
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CN201711449976.7A 2013-04-30 2014-03-26 曝光装置及曝光方法 Active CN108227408B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013095647 2013-04-30
JP2013-095647 2013-04-30
CN201480037519.5A CN105359040B (zh) 2013-04-30 2014-03-26 基板处理装置以及器件制造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201480037519.5A Division CN105359040B (zh) 2013-04-30 2014-03-26 基板处理装置以及器件制造方法

Publications (2)

Publication Number Publication Date
CN108227408A CN108227408A (zh) 2018-06-29
CN108227408B true CN108227408B (zh) 2020-02-14

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Family Applications (4)

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CN201710546158.2A Active CN107255910B (zh) 2013-04-30 2014-03-26 圆筒光罩
CN201711449976.7A Active CN108227408B (zh) 2013-04-30 2014-03-26 曝光装置及曝光方法
CN201480037519.5A Active CN105359040B (zh) 2013-04-30 2014-03-26 基板处理装置以及器件制造方法
CN201710546115.4A Active CN107390480B (zh) 2013-04-30 2014-03-26 圆筒光罩

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CN201710546158.2A Active CN107255910B (zh) 2013-04-30 2014-03-26 圆筒光罩

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN201480037519.5A Active CN105359040B (zh) 2013-04-30 2014-03-26 基板处理装置以及器件制造方法
CN201710546115.4A Active CN107390480B (zh) 2013-04-30 2014-03-26 圆筒光罩

Country Status (6)

Country Link
JP (5) JP6269660B2 (ja)
KR (5) KR102096961B1 (ja)
CN (4) CN107255910B (ja)
HK (3) HK1215308A1 (ja)
TW (5) TWI717946B (ja)
WO (1) WO2014178244A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102096961B1 (ko) * 2013-04-30 2020-04-03 가부시키가이샤 니콘 표시 패널 제조 방법
TWI782698B (zh) * 2016-03-30 2022-11-01 日商尼康股份有限公司 圖案描繪裝置、圖案描繪方法、以及元件製造方法
WO2017199658A1 (ja) * 2016-05-19 2017-11-23 株式会社ニコン 基板支持装置、露光装置、および、パターニング装置
WO2021153097A1 (ja) * 2020-01-31 2021-08-05 日本精工株式会社 回転角度センサ、電動パワーステアリング装置及び回転角度センサの製造方法

Citations (1)

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JP2012248864A (ja) * 2012-07-19 2012-12-13 Nikon Corp 露光装置、露光方法、及びデバイス製造方法。

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JPS6019037U (ja) * 1983-07-18 1985-02-08 株式会社リコー 露光装置
JPH01128069A (ja) * 1987-11-12 1989-05-19 Dainippon Screen Mfg Co Ltd スリット走査露光式複写カメラの試写像露光装置
JPH01175730A (ja) * 1987-12-29 1989-07-12 Matsushita Electric Ind Co Ltd 露光装置
US5640227A (en) 1993-12-06 1997-06-17 Nikon Corporation Exposure apparatus and exposure method for minimizing defocusing of the transferred pattern
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
JP2000035677A (ja) * 1998-07-17 2000-02-02 Adtec Engineeng:Kk 露光装置
US6411362B2 (en) * 1999-01-04 2002-06-25 International Business Machines Corporation Rotational mask scanning exposure method and apparatus
CN100396945C (zh) * 2002-02-28 2008-06-25 富士通株式会社 动压轴承的制造方法、动压轴承及动压轴承制造装置
JP2007227438A (ja) * 2006-02-21 2007-09-06 Nikon Corp 露光装置及び方法並びに光露光用マスク
JP4984631B2 (ja) * 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
TWI457723B (zh) * 2006-09-08 2014-10-21 尼康股份有限公司 A mask, an exposure device, and an element manufacturing method
JP2009026933A (ja) * 2007-07-19 2009-02-05 Konica Minolta Holdings Inc 電磁波遮蔽フィルムの製造方法及び電磁波遮蔽フィルム
JP2009237305A (ja) * 2008-03-27 2009-10-15 Mitsubishi Paper Mills Ltd マスクパターンフィルムの巻き付け機構及び露光装置
JP2011221536A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
KR20130041785A (ko) * 2010-04-13 2013-04-25 가부시키가이샤 니콘 노광 장치, 기판 처리 장치 및 디바이스 제조 방법
JP2012252076A (ja) * 2011-06-01 2012-12-20 Nikon Corp 露光装置
WO2013035489A1 (ja) * 2011-09-06 2013-03-14 株式会社ニコン 基板処理装置
CN103477286A (zh) * 2011-09-07 2013-12-25 株式会社尼康 基板处理装置
JP5842925B2 (ja) * 2011-11-04 2016-01-13 株式会社ニコン 基板処理装置、及び基板処理方法
TWI641915B (zh) * 2012-01-12 2018-11-21 尼康股份有限公司 基板處理裝置、基板處理方法、及圓筒狀光罩
KR101405251B1 (ko) * 2012-09-10 2014-06-17 경북대학교 산학협력단 노광 장치 및 이를 사용한 기판 처리 장치
KR102096961B1 (ko) * 2013-04-30 2020-04-03 가부시키가이샤 니콘 표시 패널 제조 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012248864A (ja) * 2012-07-19 2012-12-13 Nikon Corp 露光装置、露光方法、及びデバイス製造方法。
JP5594328B2 (ja) * 2012-07-19 2014-09-24 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法。

Also Published As

Publication number Publication date
HK1246405B (zh) 2020-05-15
KR20190104256A (ko) 2019-09-06
KR102096961B1 (ko) 2020-04-03
JP6662473B2 (ja) 2020-03-11
KR102019620B1 (ko) 2019-09-06
TW201908880A (zh) 2019-03-01
TW201809909A (zh) 2018-03-16
JP6269660B2 (ja) 2018-01-31
JP2019074769A (ja) 2019-05-16
TWI610143B (zh) 2018-01-01
TWI677767B (zh) 2019-11-21
TWI681263B (zh) 2020-01-01
JP2018081320A (ja) 2018-05-24
CN107255910A (zh) 2017-10-17
KR20160003181A (ko) 2016-01-08
CN108227408A (zh) 2018-06-29
TWI646407B (zh) 2019-01-01
JP6638835B2 (ja) 2020-01-29
KR20180128521A (ko) 2018-12-03
HK1245419B (zh) 2019-11-29
KR20200019782A (ko) 2020-02-24
CN107390480B (zh) 2019-08-13
TW201907244A (zh) 2019-02-16
KR20180128520A (ko) 2018-12-03
JP6816814B2 (ja) 2021-01-20
JP6485535B2 (ja) 2019-03-20
HK1215308A1 (zh) 2016-08-19
TW202014807A (zh) 2020-04-16
KR101924255B1 (ko) 2018-11-30
CN107390480A (zh) 2017-11-24
KR102079793B1 (ko) 2020-02-21
JP2019070840A (ja) 2019-05-09
TW201445262A (zh) 2014-12-01
JPWO2014178244A1 (ja) 2017-02-23
CN105359040B (zh) 2018-01-19
CN105359040A (zh) 2016-02-24
WO2014178244A1 (ja) 2014-11-06
KR101979562B1 (ko) 2019-05-16
JP2020064317A (ja) 2020-04-23
TWI717946B (zh) 2021-02-01
CN107255910B (zh) 2019-04-02

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