CN108193167B - The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes - Google Patents
The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes Download PDFInfo
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- CN108193167B CN108193167B CN201711302671.3A CN201711302671A CN108193167B CN 108193167 B CN108193167 B CN 108193167B CN 201711302671 A CN201711302671 A CN 201711302671A CN 108193167 B CN108193167 B CN 108193167B
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- radius
- shutter
- plated film
- circular arc
- circle
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- Physics & Mathematics (AREA)
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- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
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Abstract
The present invention relates to a kind of planet coating clamp shutter that plated film thicknesses of layers arbitrarily changes and production method, shutter includes the opening on disc shutter and shutter；One side of the opening shape is one section of circular arc on round edge, another side is the radius originated by the center of circle, and Article 3 side is the gradient ramp from the center of circle to circular arc；The diameter of the disc shutter matches with the diameter for the optical element for needing plated film；The gradient ramp from from the center of circle to circular arc matches with the coating film thickness for the optical element for needing plated film.Present invention application planetary fixture filming equipment any thickness changes the preparation of film layer, has the advantages that film thickness precision is high, amendment is easy, application value with higher.
Description
Technical field
The invention belongs to optical thin film manufacturing technology fields, are related to a kind of planet plated film that plated film thicknesses of layers arbitrarily changes
Fixture shutter and production method.
Background technique
For the display brightness for improving product, the different location requirement of holographical wave guide balzed grating, surface prepares the film of different-thickness
Layer realizes piece surface Varying-thickness film layer by design shutter and its correct installation method for product actual requirement
Preparation.
Summary of the invention
Technical problems to be solved
In order to avoid the shortcomings of the prior art, the present invention proposes a kind of planet that plated film thicknesses of layers arbitrarily changes plating
Film fixture shutter and production method realize the difference of optical element surface different location thicknesses of layers, glitter for holographical wave guide
Grating provides the preparation of Varying-thickness film layer.
Technical solution
A kind of planet coating clamp shutter that plated film thicknesses of layers arbitrarily changes, it is characterised in that: hidden including disc
Opening on baffle and shutter；One side of the opening shape is one section of circular arc on round edge, another side is by justifying
The radius of heart starting, Article 3 side are the gradient ramp from the center of circle to circular arc；The diameter of the disc shutter with need to plate
The diameter of the optical element of film matches；The plated film of the gradient ramp from from the center of circle to circular arc and the optical element for needing plated film
Thickness matches.
The gradient ramp from from the center of circle to circular arc matches with the coating film thickness for the optical element for needing plated film and is: with song
Line initial position is zero angle, and it is maximum radius place that the most thick corresponding angle of film layer, which is θ I,；The most thin corresponding angle of film layer
Degree is θ II, radius X.
A method of making the planet coating clamp shutter that the plated film thicknesses of layers arbitrarily changes, it is characterised in that
Steps are as follows:
Step 1: being tested, obtained along half using thicknesses of layers of the ellipsometer test to the optical element for being required plated film
The thicknesses of layers of diameter each point；
Step 2: with the most thin corresponding angle of film layer for θ II, the position that radius is X is the starting point of curve, is risen with edge
Initial point rotational angle theta I, the most thick place of thicknesses of layers are the terminating point that radius maximum is curve, are segmented true according to the thickness of measurement
Determine the edge of curve；
Step 3: it is cut into the gradient ramp from the center of circle to circular arc according to the edge of curve, is the radius of X starting by radius,
By the circular arc on the disc side of the radius to gradient ramp.
Beneficial effect
A kind of planet coating clamp shutter that plated film thicknesses of layers arbitrarily changes proposed by the present invention and production method hide
Baffle includes the opening on disc shutter and shutter；One side of the opening shape is a Duan Yuan on round edge
Arc, another side are the radius originated by the center of circle, and Article 3 side is the gradient ramp from the center of circle to circular arc；The disc is blocked
The diameter of plate matches with the diameter for the optical element for needing plated film；The gradient ramp from from the center of circle to circular arc and need plated film
The coating film thickness of optical element match.When use: the shutter is fixed on filming equipment planet by lattice framing and supporting plate and presss from both sides
Tool disk in the following, revolve with coating clamp frame, on planetary fixture disk by plated film part, while revolution with coating clamp from
Turn, according to the difference of the relative position of shutter trajectory shape and plated film part, realizes the thicknesses of layers of part different location
Variation.Present invention application planetary fixture filming equipment any thickness changes the preparation of film layer, and there is film thickness precision height, amendment to be easy
The advantages of, application value with higher.
Detailed description of the invention
Fig. 1: the thickness requirement figure of the radially different position of the film layer of embodiment 1
Fig. 2: the shutter designed according to the thickness requirement of the radially different position of the film layer of embodiment 1
Fig. 3: 1 sample of embodiment is tested using ellipsometer test, test point distribution map
Fig. 4: 1 film thickness of embodiment and location point relational graph
Fig. 5: the thickness requirement figure of the radially different position of the film layer of embodiment 2
Fig. 6: the shutter designed according to the thickness requirement of the radially different position of the film layer of embodiment 2
Specific embodiment
Now in conjunction with embodiment, attached drawing, the invention will be further described:
Embodiment shutter includes the opening on disc shutter and shutter；One side of the opening shape is
One section of circular arc on round edge, another side are the radius originated by the center of circle, and Article 3 side is the gradient ramp from the center of circle to circular arc；
The diameter of the disc shutter matches with the diameter for the optical element for needing plated film；The gradual change from from the center of circle to circular arc
Curve matches with the coating film thickness for the optical element for needing plated film.
The gradient ramp from from the center of circle to circular arc matches with the coating film thickness for the optical element for needing plated film and is: with song
Line initial position is zero angle, and it is maximum radius place that the most thick corresponding angle of film layer, which is θ I,；The most thin corresponding angle of film layer
Degree is θ II, radius X.
Embodiment 1: the thickness requirement figure of the radially different position of film layer according to figure 1 makes shutter
Step 1: being tested, obtained along half using thicknesses of layers of the ellipsometer test to the optical element for being required plated film
The thicknesses of layers of diameter each point, such as Fig. 2；
Step 2: with the most thin corresponding angle of film layer for θ II, the position that radius is X is the starting point of curve, is risen with edge
Initial point rotational angle theta I, the most thick place of thicknesses of layers are the terminating point that radius maximum is curve, are segmented true according to the thickness of measurement
The edge for determining curve, as Fig. 2 and 1 each position point data of table are fitted；
Step 3: it is cut into the gradient ramp from the center of circle to circular arc according to the edge of curve, is the radius of X starting by radius,
By the circular arc on the disc side of the radius to gradient ramp.
The fitting of 1 each position point data of table
Embodiment 2: the thickness requirement figure of the radially different position of film layer makes shutter according to figure 5
Step 1: being tested, obtained along half using thicknesses of layers of the ellipsometer test to the optical element for being required plated film
The thicknesses of layers of diameter each point；
Step 2: with the most thin corresponding angle of film layer for θ II, the position that radius is X is the starting point of curve, is risen with edge
Initial point rotational angle theta I, the most thick place of thicknesses of layers are the terminating point that radius maximum is curve, are segmented true according to the thickness of measurement
Determine the edge of curve, such as Fig. 6；
Step 3: it is cut into the gradient ramp from the center of circle to circular arc according to the edge of curve, is the radius of X starting by radius,
By the circular arc on the disc side of the radius to gradient ramp.
The principle of the shutter is: when unobstructed plate, optical element surface thickness of the clamping on coating clamp is identical, plating
Film fixture it is every rotation 1 week be 360, both it is every rotate 1 ° of institute's film plating layer with a thickness of 1 week 1/360, for piece surface different parts
The difference of thicknesses of layers, calculates the ratio of maxima and minima, and design shutter carries out the screening of respective angles to different parts
Gear, to realize the variation of the thicknesses of layers of part different location.
When use: the shutter is fixed on filming equipment planetary fixture disk in the following, with coating clamp by lattice framing and supporting plate
Frame revolves together, on planetary fixture disk by plated film part, rotation while revolution with coating clamp, according to shutter track shape
The difference of the relative position of shape and plated film part realizes the variation of the thicknesses of layers of part different location.
Claims (2)
1. a kind of planet coating clamp shutter that plated film thicknesses of layers arbitrarily changes, it is characterised in that: blocked including disc
Opening on plate and shutter；One side of the opening shape is one section of circular arc on round edge, another side is by the center of circle
The radius of starting, Article 3 side are the gradient ramp from the center of circle to circular arc；The diameter of the disc shutter and need plated film
The diameter of optical element match；The plating film thickness of the gradient ramp from from the center of circle to circular arc and the optical element for needing plated film
Degree matches；
The gradient ramp from from the center of circle to circular arc matches with the coating film thickness for the optical element for needing plated film and is: being risen with curve
Beginning position is zero angle, and it is maximum radius place that the most thick corresponding angle of film layer, which is θ I,；The most thin corresponding angle of film layer is
θ II, radius X.
2. a kind of method for making the planet coating clamp shutter that plated film thicknesses of layers described in claim 1 arbitrarily changes,
It is characterized in that steps are as follows:
Step 1: being tested, obtained each along radius using thicknesses of layers of the ellipsometer test to the optical element for being required plated film
The thicknesses of layers of point；
Step 2: with the most thin corresponding angle of film layer for θ II, the position that radius is X is the starting point of curve, along starting point
Rotational angle theta I, the most thick place of thicknesses of layers are the terminating point that radius maximum is curve, and segmentation determines bent according to the thickness of measurement
The edge of line；
Step 3: being cut into the gradient ramp from the center of circle to circular arc according to the edge of curve, be the radius of X starting by radius, by this
Radius to the disc side of gradient ramp circular arc.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201711302671.3A CN108193167B (en) | 2017-12-11 | 2017-12-11 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201711302671.3A CN108193167B (en) | 2017-12-11 | 2017-12-11 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
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| CN108193167A CN108193167A (en) | 2018-06-22 |
| CN108193167B true CN108193167B (en) | 2019-10-25 |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109161861B (en) * | 2018-10-23 | 2020-05-15 | 宁波工程学院 | System for plating non-uniform multilayer film |
| CN112063972B (en) * | 2020-09-08 | 2022-07-15 | 宁波江丰电子材料股份有限公司 | Splicing coating method of semiconductor component |
| CN114774849B (en) * | 2022-03-17 | 2023-12-08 | 西安超纳精密光学有限公司 | Small-caliber large-curvature local ion sputtering coating system and method capable of accurately controlling curvature |
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| CN1459513A (en) * | 2002-05-17 | 2003-12-03 | 精碟科技股份有限公司 | Covering plate in film plating apparatus |
| CN1718844A (en) * | 2005-07-12 | 2006-01-11 | 中国科学院上海光学精密机械研究所 | Correction method for thickness uniformity of electron beam evaporation coating film |
| CN1891850A (en) * | 2005-07-04 | 2007-01-10 | 精工爱普生株式会社 | Vacuum evaporation apparatus and method of producing electro-optical device |
| CN101122640A (en) * | 2007-09-21 | 2008-02-13 | 中国科学院上海光学精密机械研究所 | Coating device and coating method for gradient reflectivity mirror |
| CN105112853A (en) * | 2015-09-08 | 2015-12-02 | 中国科学院光电技术研究所 | Vacuum coating machine system equipped with perforated baffle plate |
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2017
- 2017-12-11 CN CN201711302671.3A patent/CN108193167B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1459513A (en) * | 2002-05-17 | 2003-12-03 | 精碟科技股份有限公司 | Covering plate in film plating apparatus |
| CN1891850A (en) * | 2005-07-04 | 2007-01-10 | 精工爱普生株式会社 | Vacuum evaporation apparatus and method of producing electro-optical device |
| CN1718844A (en) * | 2005-07-12 | 2006-01-11 | 中国科学院上海光学精密机械研究所 | Correction method for thickness uniformity of electron beam evaporation coating film |
| CN101122640A (en) * | 2007-09-21 | 2008-02-13 | 中国科学院上海光学精密机械研究所 | Coating device and coating method for gradient reflectivity mirror |
| CN105112853A (en) * | 2015-09-08 | 2015-12-02 | 中国科学院光电技术研究所 | Vacuum coating machine system equipped with perforated baffle plate |
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| CN108193167A (en) | 2018-06-22 |
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Effective date of registration: 20200602 Address after: 471000 No. 696, Wangcheng Avenue, Luolong District, Luoyang City, Henan Province Patentee after: AVIC Luoyang Photoelectric Technology Co., Ltd Address before: 471099 Luoyang City, Henan Province West triumph Road, No. 25 Patentee before: LUOYANG INSTITUTE OF ELECTRO-OPTICAL EQUIPMENT OF AVIC |
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