CN105112853A - Vacuum coating machine system equipped with perforated baffle plate - Google Patents
Vacuum coating machine system equipped with perforated baffle plate Download PDFInfo
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- CN105112853A CN105112853A CN201510564712.0A CN201510564712A CN105112853A CN 105112853 A CN105112853 A CN 105112853A CN 201510564712 A CN201510564712 A CN 201510564712A CN 105112853 A CN105112853 A CN 105112853A
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- optical element
- film
- baffle
- coating materials
- vacuum plating
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- 238000001771 vacuum deposition Methods 0.000 title abstract description 12
- 230000003287 optical effect Effects 0.000 claims abstract description 103
- 239000000463 material Substances 0.000 claims abstract description 69
- 239000011248 coating agent Substances 0.000 claims abstract description 63
- 238000000576 coating method Methods 0.000 claims abstract description 63
- 238000000151 deposition Methods 0.000 claims abstract description 63
- 230000008021 deposition Effects 0.000 claims abstract description 60
- 238000009826 distribution Methods 0.000 claims abstract description 49
- 238000000034 method Methods 0.000 claims abstract description 31
- 238000001704 evaporation Methods 0.000 claims abstract description 22
- 238000004544 sputter deposition Methods 0.000 claims abstract description 22
- 230000008020 evaporation Effects 0.000 claims abstract description 16
- 238000007747 plating Methods 0.000 claims description 37
- 239000010408 film Substances 0.000 description 59
- 238000005516 engineering process Methods 0.000 description 9
- 239000010409 thin film Substances 0.000 description 7
- 238000002207 thermal evaporation Methods 0.000 description 5
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 4
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 4
- 238000005457 optimization Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000009504 vacuum film coating Methods 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000005247 gettering Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000007735 ion beam assisted deposition Methods 0.000 description 1
- 238000000869 ion-assisted deposition Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a vacuum coating machine system with an opening baffle plate, wherein in the vacuum coating process, in order to optimize the distribution of a film, an optical element rotates in the coating machine, so that the deposition angle of the film at any position on the optical element has a wider distribution range, the distribution ranges of the deposition angles of the film at different positions are obviously different, and the distribution uniformity of the thickness of the film is poorer. The invention arranges an opening baffle between the evaporation or sputtering source and the optical element, and the coating material passes through the opening baffle to be deposited on the optical element in the vacuum coating process. By optimizing the shape of the opening of the baffle, the distribution control of the deposition angle of the film material on the optical element is realized, the deposition angle and the distribution range of the film material are reduced, the thickness non-uniformity of the film on the optical element is corrected, and the performance of the film is improved. Compared with the traditional vacuum coating, the invention adopts the design of the perforated baffle plate to simultaneously optimize the deposition angle and the thickness uniformity of the film material on the optical element.
Description
Technical field
The present invention relates to optical thin film element preparation field, especially a kind of vacuum plating unit system being equipped with perforated baffle.
Background technology
Optical System Design is day by day accurate, for meeting the performance index of optical system, uses increasing optical elements of large caliber in optical system, and be coated with at optical element surface there is particular design film to improve the performance of optical element.The current technology for preparing film on optical element mainly can be divided into physical vapor deposition (PVD) and chemical vapour deposition (CVD).And physical gas phase deposition technology be one under vacuum, by evaporation or sputtered film material, and in the technological process of optical element surface formation of deposits film.For the distribution of optimizing optical element upper film, optical element rotates in vacuum plating unit.This rotary motion makes any plated film point place coating materials deposition angles on optical element surface all have wider distribution range, and on different positions, the distribution of coating materials deposition angles exists significant difference, and optical element upper film thickness distribution exists larger heterogeneity simultaneously.For under any given vacuum plating unit configuration condition, after selected technique for vacuum coating parameter, the principal element affecting optical element film coated upper film consistency of performance is coating materials deposition angles and film thickness distribution.
Thermal evaporation is a kind of by evaporating or distillation mode, coating materials is deposited to the physical gas phase deposition technology on optical element, is widely used in the film preparation of vacuum ultraviolet (VUV), deep ultraviolet, visible and infrared band.Compared to other physical gas phase deposition technology, as plasma ion assisted deposition technology, ion beam assisted deposition, magnetron sputtered deposition technology and ion beam sputter depositing technology, thermal evaporation is the first-selected deposition technique (J.E.Rudisill of vacuum ultraviolet (VUV)/deep ultraviolet film that preparation absorption loss is little, resisting laser damage ability is strong, " Design/depositionprocesstradeoffsforhighperformanceoptic alcoatingsintheDUVspectralregion; " SPIE, 5273 (2004): 30-40.).Thermal evaporation deposition is generally less than ten electron-volts to the coating materials energy on optical element, the film performance prepared thus depends critically upon coating materials deposition angles (C.Zaczek, A.PazidisandH.Feldermann, " High-performanceopticalcoatingforVUVlithographyapplicati on; " inOpticalInterferenceCoatingsTopicmeeting2007-OSATechnic alDigestSeries (OpticalSocietyofAmerica, 2007), paperFA1.).Prepare magnesium fluoride film for thermal evaporation, study optical property and the microtexture of the magnesium fluoride film prepared under 0 °, 30 °, 40 °, 50 °, 60 ° and 70 ° of deposition angles respectively, result shows that magnesium fluoride film is column, polycrystalline structure growth.Along with coating materials deposition angles increases, the loss of magnesium fluoride film Intrinsic Gettering and scatter loss enlarge markedly; The specific refractory power of film, gather density and grain-size decline; Membrane structure is loose, surfaceness is large, easy planar water and hydrocarbon pollution, have a strong impact on the environmental stability (C.Guo of film, M.D.Kong, etal., " Microstructure-relatedpropertiesofmagnesiumfluoridefilms at193nmbyoblique-angledeposition, " OpticsExpress, 21 (2013): 960-967.).Therefore, for preparing high performance film, need to optimize coating materials deposition angles distribution on optical element in vacuum plating process.In addition, in vacuum plating process, optical element rotates in vacuum chamber, and this rotary motion makes deposit film on optical element have good symmetry distribution, but the poor (Guo Chun of film thickness distributing homogeneity, Kong Mingdong, Liu Cunding and Li Bincheng, " planar row star system modifying mask corrects film uniformity ", Acta Optica, 2013,33 (2): 0231002).For preparing high-performance optical thin-film component, also need correcting optical element upper film thickness non-uniformities.
Usually, by increasing evaporation or the vertical range between sputtering source and optical element, coating materials deposition angles and the thickness distribution of control both optical element surface plated film point simultaneously can be carried out.But the program brings huge challenge to the manufacture of vacuum plating unit and technique for vacuum coating cost, as excessive in vacuum film coating chamber volume, high for obtaining high vacuum coating Environmental costs, and the consumption of film coating materials is large, vacuum plating unit working service difficulty.Although the modifying mask of conventional design can optimizing optical element upper film thickness evenness, can not effectively control coating materials deposition angles.Therefore, for preparing high performance optical thin film element, need more simple and feasible method to realize coating materials deposition angles and thickness distribution optimization on optical element in vacuum plating process simultaneously.
Summary of the invention
The technical problem to be solved in the present invention is: to overcome in existing vacuum plating process plated film point coating materials deposition angles distribution range on optical element surface wide, different positions place coating materials deposition angles distributional difference is excessive, and the problem such as film thickness distributing homogeneity is poor, provide a kind of vacuum plating unit system being equipped with perforated baffle, by evaporating or placing perforated baffle between sputtering source and optical element, optimize hole shape, realize controlling coating materials deposition angles distribution range on optical element, reduce coating materials deposition angles and distribution range thereof, optimize film gauge uniformity, improve film performance.
The technical scheme that the present invention solves the problems of the technologies described above employing is: a kind of vacuum plating unit system being equipped with perforated baffle, and this system comprises optical element, coating materials steam, baffle of porous baffle and evaporation or sputtering source, by evaporating or placing baffle of porous baffle between sputtering source and optical element, in vacuum plating process, coating materials steam deposits on optical element through baffle of porous baffle, optimize the hole shape of baffle of porous baffle, realize coating materials deposition angles distributed controll on optical element, reduce coating materials deposition angles and distribution range thereof, and correcting optical element upper film thickness non-uniformities, improve film performance, wherein, described coating materials deposition angles is the angle between the surface normal of coating materials saltation point on line vector on optical element between coating materials saltation point and evaporation or sputtering source and optical element.
Described optical element rotary motion can be single-shaft-rotation or planetary rotation, and optical element can tilt or horizontal positioned relative to evaporation or sputtering source.
Described optical element film coated can be plane and/or curved surface.
Described film can be metallic film or dielectric film.
On described baffle plate, hole shape depends on vacuum plating unit configuration, optical element dimension, the angular distribution scope of target deposition and thickness evenness index.
Principle of the present invention is:
Perforated baffle controls coating materials deposition angles and film thickness distribution technique is that a kind of baffle plate hole shape that utilizes in vacuum plating process optionally blocks the thin-film material being evaporated or sputter, and makes the method that in vacuum plating unit rotational system, on optical element, coating materials deposition angles and thickness distribution acquisition are optimized.In vacuum plating process, coating materials with evaporation or sputtering mode transmit in vacuum environment, and on optical element formation of deposits film.For optimizing film distribution, optical element rotates in coating equipment.Rotary motion makes coating materials deposition angles in any position on optical element all have wider distribution range, and on different positions, the distribution of coating materials deposition angles exists notable difference, and optical element upper film thickness distribution homogeneity is poor simultaneously.By evaporating or placing perforated baffle between sputtering source and optical element, in vacuum plating process, coating materials is depositing on optical element through perforated baffle.Optimize hole shape, realize coating materials deposition angles distributed controll on optical element, reduce coating materials deposition angles and distribution range thereof, and correcting optical element upper film thickness non-uniformities, improve film performance.
The present invention compared with prior art tool has the following advantages:
1. the present invention is equipped with the vacuum plating unit system of perforated baffle, it utilizes coating materials deposition angles and thickness distribution method on perforated baffle control both optical element, compared with vacuum plating unit in the past, at the perforated baffle evaporated or between sputtering source and optical element, installation site is fixing, baffle plate mechanical stability is high, easy and simple to handle, technique for vacuum coating favorable repeatability.
2. the present invention is equipped with the vacuum plating unit system of perforated baffle, it utilizes coating materials deposition angles and thickness distribution method on perforated baffle control both optical element, with increase evaporate or sputtering source compared with the method for optical element spacing, the present invention to coating materials deposition angles on optical element in vacuum plating process and film thickness distribution optimization effect more outstanding.
Accompanying drawing explanation
Fig. 1 is a kind of vacuum plating unit system schematic being equipped with perforated baffle of the present invention, and wherein, 1 is optical element, and 2 is coating materials steam, and 3 is baffle of porous baffle, and 4 is evaporation or sputtering source.
Fig. 2 is the hole shape schematic diagram for optimizing planar optical elements upper film deposition angles and thickness distribution.
Fig. 3 uses before and after perforated baffle, planar optical elements upper film thickness radial distribution figure.
Fig. 4 uses before and after perforated baffle, maximum coating materials deposition angles distribution plan on planar optical elements each saltation point radial.
Fig. 5 uses before and after perforated baffle, different positions place, planar optical elements surface coating materials deposition angles probability distribution graph, wherein, and Fig. 5 (a) distance planar optical elements center 0mm; Fig. 5 (b) distance distance planar optical elements center 66mm; Fig. 5 (c) distance planar optical elements center 133mm; Fig. 5 (d) distance planar optical elements center 200mm.
Embodiment
Fig. 1 is the vacuum plating unit system schematic being equipped with perforated baffle.The present invention is based on perforated baffle and control coating materials deposition angles and film thickness distribution technique, by evaporating or placing baffle of porous baffle 3 between sputtering source 4 and optical element 1, the thin-film material (i.e. coating materials steam 2) utilizing baffle of porous baffle hole shape optionally to block in vacuum plating process to be evaporated or sputter, make coating materials steam 2 deposition angles distribution acquisition optimization on optical element 1 in vacuum plating unit rotational system, reduce coating materials deposition angles and distribution range thereof, optimize film thickness distributing homogeneity simultaneously, improve film performance.
Below in conjunction with embodiment, the present invention is further described.
For the planar optical elements of clear aperature 400mm, planar optical elements is fixed in vacuum plating unit planetary rotation system without inclination, the vertical range of planar optical elements and evaporation or sputtering source is 700mm, evaporation or sputtering source are placed on vacuum plating motor spindle (300mm, 0mm, 0mm) position, and perforated baffle is installed in vertical range 120mm position directly over evaporation or sputtering source, baffle plate hole shape is as shown in Figure 2.Analyze and use perforated baffle to control before and after coating materials deposition angles and thickness distribution, the radial upper film thickness of planar optical elements and coating materials maximum deposition angular distribution, result is respectively as shown in Figure 3 and Figure 4.As shown in Figure 3, use the perforated baffle of the present invention's design that the planar optical elements upper film thickness evenness of clear aperature 400mm can be made to bring up to 99.6% by initial 92.6%; As shown in Figure 4, use the perforated baffle of the present invention's design that the maximum coating materials deposition angles of each plated film point on the planar optical elements of clear aperature 400mm can be made all to reduce.
Planar optical elements rotary motion in vacuum film coating chamber makes each plated film point place coating materials deposition angles on planar optical elements have wider distribution range, and each plated film point coating materials deposition angles distribution range exists significant difference.Fig. 5 provides and uses perforated baffle to control before and after coating materials deposition angles and thickness distribution, coating materials deposition angles probability distribution on the plated film point of distance planar optical elements center 0mm, 66mm, 133mm and 200mm.Wherein, Fig. 5 (a) distance planar optical elements center 0mm; Fig. 5 (b) distance distance planar optical elements center 66mm; Fig. 5 (c) distance planar optical elements center 133mm; Fig. 5 (d) distance planar optical elements center 200mm.As seen from the figure, use perforated baffle that the coating materials deposition angles of all plated film points on planar optical elements can be made to distribute and all obviously optimized, maximum coating materials deposition angles is well controlled simultaneously.
In addition, for the physical vapor deposition such as ion beam sputtering, magnetron sputtering technique for vacuum coating, the thin-film material of evaporation or sputtering transmits in vacuum environment, formation of deposits thin-film process is the same with thermal evaporation technique for vacuum coating.Therefore, in the physical vapor deposition such as ion beam sputtering, magnetron sputtering technique for vacuum coating, use the method for the invention to complete coating materials deposition angles distribution optimization on optical element and also belong to the protection domain of this patent.
In a word, the present invention improves vacuum plating unit configuration, perforated baffle is positioned over evaporation or between sputtering source and planar optical elements, by optimizing hole shape, realize the effective control to coating materials deposition angles on vacuum plating process midplane optical element and film thickness distribution, reduce coating materials deposition angles and distribution range thereof on planar optical elements, and optimize film gauge uniformity, improve film performance.The present invention uses coating materials deposition angles and film thickness distribution on perforated baffle control plane optical element, and easy and simple to handle, reliability is high.
Non-elaborated part of the present invention belongs to techniques well known.
Claims (5)
1. be equipped with a vacuum plating unit system for perforated baffle, it is characterized in that: this system comprises optical element (1), coating materials steam (2), baffle of porous baffle (3) and evaporation or sputtering source (4), by evaporating or placing baffle of porous baffle (3) between sputtering source (4) and optical element (1), in vacuum plating process, coating materials steam (2) deposits on optical element (1) through baffle of porous baffle (3), optimize the hole shape of baffle of porous baffle (3), realize the upper coating materials deposition angles distributed controll of optical element (1), reduce coating materials deposition angles and distribution range thereof, and correcting optical element upper film thickness non-uniformities, improve film performance, wherein, described coating materials deposition angles is that the upper coating materials saltation point of optical element (1) goes up the angle between the surface normal of coating materials saltation point with the line vector between evaporation or sputtering source (4) and optical element (1).
2. a kind of vacuum plating unit system being equipped with perforated baffle according to claim 1, it is characterized in that: described optical element rotary motion can be single-shaft-rotation or planetary rotation, optical element can tilt or horizontal positioned relative to evaporation or sputtering source.
3. a kind of vacuum plating unit system being equipped with perforated baffle according to claim 1, is characterized in that: described optical element film coated can be plane and/or curved surface.
4. a kind of vacuum plating unit system being equipped with perforated baffle according to claim 1, is characterized in that: described film can be metallic film or dielectric film.
5. a kind of vacuum plating unit system being equipped with perforated baffle according to claim 1, is characterized in that: on described baffle plate, hole shape depends on vacuum plating unit configuration, optical element dimension, the angular distribution scope of target deposition and thickness evenness index.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510564712.0A CN105112853A (en) | 2015-09-08 | 2015-09-08 | Vacuum coating machine system equipped with perforated baffle plate |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510564712.0A CN105112853A (en) | 2015-09-08 | 2015-09-08 | Vacuum coating machine system equipped with perforated baffle plate |
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| CN105112853A true CN105112853A (en) | 2015-12-02 |
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| CN201510564712.0A Pending CN105112853A (en) | 2015-09-08 | 2015-09-08 | Vacuum coating machine system equipped with perforated baffle plate |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106987817A (en) * | 2017-04-17 | 2017-07-28 | 同济大学 | A kind of method for improving line style magnetic controlled sputtering target rifle in spill cylinder base coated film quality |
| CN108193167A (en) * | 2017-12-11 | 2018-06-22 | 中国航空工业集团公司洛阳电光设备研究所 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH06181175A (en) * | 1992-12-14 | 1994-06-28 | Fuji Electric Co Ltd | Multielement simultaneous deposition system |
| US20050146683A1 (en) * | 2001-09-17 | 2005-07-07 | Carl Zeiss Smt Ag | Optical component and coating system for coating substrates for optical components |
| CN201024209Y (en) * | 2007-03-30 | 2008-02-20 | 江苏北方湖光光电有限公司 | Vacuum coating box |
| CN201321488Y (en) * | 2008-12-17 | 2009-10-07 | 中国科学院上海光学精密机械研究所 | Vacuum coating machine baffle plate with adjustable deposition rate |
| CN104726842A (en) * | 2015-04-21 | 2015-06-24 | 中国科学院光电技术研究所 | Method for controlling deposition angle distribution of film material in film coating machine |
-
2015
- 2015-09-08 CN CN201510564712.0A patent/CN105112853A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06181175A (en) * | 1992-12-14 | 1994-06-28 | Fuji Electric Co Ltd | Multielement simultaneous deposition system |
| US20050146683A1 (en) * | 2001-09-17 | 2005-07-07 | Carl Zeiss Smt Ag | Optical component and coating system for coating substrates for optical components |
| CN201024209Y (en) * | 2007-03-30 | 2008-02-20 | 江苏北方湖光光电有限公司 | Vacuum coating box |
| CN201321488Y (en) * | 2008-12-17 | 2009-10-07 | 中国科学院上海光学精密机械研究所 | Vacuum coating machine baffle plate with adjustable deposition rate |
| CN104726842A (en) * | 2015-04-21 | 2015-06-24 | 中国科学院光电技术研究所 | Method for controlling deposition angle distribution of film material in film coating machine |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106987817A (en) * | 2017-04-17 | 2017-07-28 | 同济大学 | A kind of method for improving line style magnetic controlled sputtering target rifle in spill cylinder base coated film quality |
| CN106987817B (en) * | 2017-04-17 | 2019-03-29 | 同济大学 | A method of line style magnetic controlled sputtering target rifle is improved in spill cylinder base coated film quality |
| CN108193167A (en) * | 2017-12-11 | 2018-06-22 | 中国航空工业集团公司洛阳电光设备研究所 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
| CN108193167B (en) * | 2017-12-11 | 2019-10-25 | 中国航空工业集团公司洛阳电光设备研究所 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
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Application publication date: 20151202 |