CN105112853A - Vacuum coating machine system equipped with perforated baffle plate - Google Patents
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- 238000001771 vacuum deposition Methods 0.000 title abstract description 41
- 230000003287 optical effect Effects 0.000 claims abstract description 105
- 238000000151 deposition Methods 0.000 claims abstract description 64
- 230000008021 deposition Effects 0.000 claims abstract description 64
- 239000000463 material Substances 0.000 claims abstract description 57
- 238000009826 distribution Methods 0.000 claims abstract description 56
- 238000000034 method Methods 0.000 claims abstract description 30
- 238000001704 evaporation Methods 0.000 claims abstract description 21
- 238000004544 sputter deposition Methods 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 19
- 238000000576 coating method Methods 0.000 claims abstract description 19
- 230000008020 evaporation Effects 0.000 claims abstract description 19
- 238000007747 plating Methods 0.000 claims 7
- 239000010408 film Substances 0.000 abstract description 105
- 239000010409 thin film Substances 0.000 abstract description 16
- 238000005516 engineering process Methods 0.000 description 11
- 238000005240 physical vapour deposition Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000002207 thermal evaporation Methods 0.000 description 5
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 4
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000001659 ion-beam spectroscopy Methods 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000012938 design process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000007735 ion beam assisted deposition Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Abstract
本发明公开一种配备有开孔挡板的真空镀膜机系统，真空镀膜过程中，为优化薄膜分布，光学元件在镀膜机内做旋转运动，使得光学元件上任意位置处膜料沉积角均具有较宽的分布范围，而且不同位置上膜料沉积角分布范围存在明显差异，同时薄膜厚度分布均匀性较差。本发明在蒸发或溅射源与光学元件间放置开孔挡板，真空镀膜过程中，膜料穿过开孔挡板沉积到光学元件上。通过优化挡板的开孔形状，实现对光学元件上膜料沉积角分布控制，降低膜料沉积角及其分布范围，并且校正光学元件上薄膜厚度非均匀性，提高薄膜性能。与传统的真空镀膜相比，本发明采用开孔挡板设计能同时优化光学元件上薄膜膜料沉积角和厚度均匀性。
The invention discloses a vacuum coating machine system equipped with a perforated baffle. During the vacuum coating process, in order to optimize the film distribution, the optical element rotates in the coating machine, so that the deposition angle of the film material at any position on the optical element has a Wide distribution range, and there are obvious differences in the distribution range of film material deposition angle at different positions, and the uniformity of film thickness distribution is poor. In the invention, an aperture baffle is placed between the evaporation or sputtering source and the optical element, and the film material passes through the aperture baffle and is deposited on the optical element during the vacuum coating process. By optimizing the opening shape of the baffle, the control of the deposition angle distribution of the film material on the optical element is realized, the deposition angle and distribution range of the film material are reduced, and the non-uniformity of the film thickness on the optical element is corrected to improve the film performance. Compared with the traditional vacuum coating, the invention adopts the design of the opening baffle to simultaneously optimize the deposition angle and thickness uniformity of the thin film material on the optical element.
Description
技术领域technical field
本发明涉及光学薄膜元件制备领域，尤其是一种配备有开孔挡板的真空镀膜机系统。The invention relates to the field of preparation of optical thin film elements, in particular to a vacuum coating machine system equipped with a perforated baffle.
背景技术Background technique
光学系统设计日益精密，为满足光学系统的性能指标，光学系统中使用越来越多的大口径光学元件，并在光学元件表面镀制具有特殊设计的薄膜来提高光学元件的性能。当前用于在光学元件上制备薄膜的技术主要可分为物理气相沉积(PVD)和化学气相沉积(CVD)。而物理气相沉积技术是一种在真空条件下，通过蒸发或溅射薄膜材料，并在光学元件表面沉积形成薄膜的工艺过程。为优化光学元件上薄膜分布，光学元件在真空镀膜机内做旋转运动。该旋转运动使得光学元件表面上任意镀膜点处膜料沉积角均具有较宽的分布范围，并且不同位置上膜料沉积角分布存在显著差异，同时光学元件上薄膜厚度分布存在较大的非均匀性。对于任意给定的真空镀膜机配置条件下，选定真空镀膜工艺参数后，影响光学元件镀膜面上薄膜性能一致性的主要因素是膜料沉积角和薄膜厚度分布。The design of the optical system is becoming more and more sophisticated. In order to meet the performance index of the optical system, more and more large-aperture optical components are used in the optical system, and a specially designed film is coated on the surface of the optical component to improve the performance of the optical component. The techniques currently used to prepare thin films on optical components can be mainly divided into physical vapor deposition (PVD) and chemical vapor deposition (CVD). The physical vapor deposition technology is a process in which a thin film is deposited on the surface of an optical element by evaporating or sputtering a thin film material under vacuum conditions. In order to optimize the film distribution on the optical components, the optical components are rotated in the vacuum coating machine. The rotating motion makes the film deposition angle at any coating point on the surface of the optical element have a wide distribution range, and there are significant differences in the distribution of the film deposition angle at different positions, and at the same time, the film thickness distribution on the optical element is relatively non-uniform sex. For any given configuration of the vacuum coating machine, after the vacuum coating process parameters are selected, the main factors affecting the consistency of the film performance on the coating surface of the optical element are the deposition angle of the film material and the film thickness distribution.
热蒸发是一种通过蒸发或者升华方式，将膜料沉积到光学元件上的物理气相沉积技术，被广泛应用于真空紫外、深紫外、可见和红外波段的薄膜制备。相比于其它物理气相沉积技术，如等离子体辅助沉积技术、离子束辅助沉积技术、磁控溅射沉积技术和离子束溅射沉积技术，热蒸发是制备吸收损耗小、抗激光损伤能力强的真空紫外/深紫外薄膜首选沉积技术(J.E.Rudisill,“Design/depositionprocesstradeoffsforhighperformanceopticalcoatingsintheDUVspectralregion,”SPIE,5273(2004):30-40.)。热蒸发沉积到光学元件上的膜料能量一般小于十个电子伏特，由此制备的薄膜性能严重依赖于膜料沉积角(C.Zaczek,A.PazidisandH.Feldermann,“High-performanceopticalcoatingforVUVlithographyapplication,”inOpticalInterferenceCoatingsTopicmeeting2007-OSATechnicalDigestSeries(OpticalSocietyofAmerica,2007),paperFA1.)。以热蒸发制备氟化镁薄膜为例，分别研究0°、30°、40°、50°、60°和70°沉积角下制备的氟化镁薄膜的光学性能和微观结构，结果表明氟化镁薄膜为柱状、多晶结构生长。随着膜料沉积角增加，氟化镁薄膜本征吸收损耗和散射损耗显著增大；薄膜的折射率、聚集密度和晶粒尺寸下降；薄膜结构疏松、表面粗糙度大，易吸附水和碳氢根污染，严重影响薄膜的环境稳定性(C.Guo,M.D.Kong,etal.,"Microstructure-relatedpropertiesofmagnesiumfluoridefilmsat193nmbyoblique-angledeposition，"OpticsExpress,21(2013):960-967.)。因此，为制备高性能的薄膜，需要优化真空镀膜过程中光学元件上膜料沉积角分布。此外，真空镀膜过程中，光学元件在真空室内做旋转运动，该旋转运动使得光学元件上沉积薄膜具有较好的对称性分布，但薄膜厚度分布均匀性较差(郭春,孔明东,柳存定和李斌成,“平面行星系统修正挡板校正膜厚均匀性”,光学学报,2013,33(2):0231002)。为制备高性能光学薄膜元件，还需要校正光学元件上薄膜厚度非均匀性。Thermal evaporation is a physical vapor deposition technology that deposits film materials on optical components by evaporation or sublimation. It is widely used in the preparation of thin films in vacuum ultraviolet, deep ultraviolet, visible and infrared bands. Compared with other physical vapor deposition technologies, such as plasma-assisted deposition technology, ion beam-assisted deposition technology, magnetron sputtering deposition technology and ion beam sputtering deposition technology, thermal evaporation is the best choice for the preparation of small absorption loss and strong resistance to laser damage. The vacuum ultraviolet/deep ultraviolet thin film is the preferred deposition technology (J.E.Rudisill, "Design/deposition process offs for high performance optical coating in the DUV spectral region," SPIE, 5273(2004):30-40.). The energy of the film material deposited on the optical element by thermal evaporation is generally less than ten electron volts, and the performance of the film thus prepared depends heavily on the deposition angle of the film material (C.Zaczek, A.PazidisandH.Feldermann, "High-performanceopticalcoatingforVUVlithographyapplication," inOpticalInterferenceCoatingsTopicmeeting2007- OSA Technical Digest Series (Optical Society of America, 2007), paper FA1.). Taking the preparation of magnesium fluoride film by thermal evaporation as an example, the optical properties and microstructure of the magnesium fluoride film prepared under the deposition angles of 0°, 30°, 40°, 50°, 60° and 70° were studied respectively. Magnesium thin films grow in a columnar, polycrystalline structure. As the deposition angle of the film material increases, the intrinsic absorption loss and scattering loss of the magnesium fluoride film increase significantly; the refractive index, aggregation density and grain size of the film decrease; the film structure is loose, the surface roughness is large, and it is easy to absorb water and carbon. Hydrogen root pollution seriously affects the environmental stability of the film (C. Guo, M.D. Kong, et al., "Microstructure-related properties of magnesium fluoride films at 193 nm by oblique-angle deposition," Optics Express, 21(2013): 960-967.). Therefore, in order to prepare high-performance thin films, it is necessary to optimize the angular distribution of film deposition on optical elements during the vacuum coating process. In addition, during the vacuum coating process, the optical element rotates in the vacuum chamber, which makes the deposited film on the optical element have a better symmetrical distribution, but the uniformity of the film thickness distribution is poor (Guo Chun, Kong Mingdong, Liu Cunding and Li Bincheng, "Film thickness uniformity corrected by correcting baffles in planar planetary systems", Acta Optics Sinica, 2013, 33(2): 0231002). In order to prepare high-performance optical thin-film components, it is also necessary to correct the non-uniformity of film thickness on the optical components.
通常，可以通过增加蒸发或溅射源与光学元件间的垂直距离，来同时控制光学元件表面镀膜点的膜料沉积角和厚度分布。但该方案对真空镀膜机的制造和真空镀膜工艺成本带来巨大的挑战，如真空镀膜室体积过大，为获得高真空镀膜环境成本高，且薄膜膜料消耗大，真空镀膜机使用维护困难。常规设计的修正挡板尽管可以优化光学元件上薄膜厚度均匀性，但不能有效地控制膜料沉积角。因此，为制备高性能的光学薄膜元件，需要更加简便可行的方法来同时实现真空镀膜过程中光学元件上膜料沉积角和厚度分布优化。Usually, by increasing the vertical distance between the evaporation or sputtering source and the optical element, the film deposition angle and thickness distribution of the coating point on the surface of the optical element can be controlled at the same time. However, this solution brings huge challenges to the manufacture of the vacuum coating machine and the cost of the vacuum coating process. For example, the volume of the vacuum coating chamber is too large, the cost of obtaining a high vacuum coating environment is high, and the consumption of film materials is large, and the use and maintenance of the vacuum coating machine is difficult. . Although conventionally designed correction baffles can optimize the uniformity of film thickness on optical components, they cannot effectively control the film deposition angle. Therefore, in order to prepare high-performance optical thin film components, a more convenient and feasible method is needed to simultaneously realize the optimization of the film deposition angle and thickness distribution on the optical components during the vacuum coating process.
发明内容Contents of the invention
本发明要解决的技术问题为：克服现有真空镀膜过程中光学元件表面上镀膜点膜料沉积角分布范围过宽，不同位置处膜料沉积角分布差异过大，以及薄膜厚度分布均匀性较差等问题，提供了一种配备有开孔挡板的真空镀膜机系统，通过在蒸发或溅射源与光学元件间放置开孔挡板，优化开孔形状，实现对光学元件上膜料沉积角分布范围控制，降低膜料沉积角及其分布范围，优化薄膜厚度均匀性，提高薄膜性能。The technical problem to be solved by the present invention is: to overcome the excessively wide distribution range of the deposition angle of the film material on the surface of the optical element in the existing vacuum coating process, the excessive difference in the distribution of the film material deposition angle at different positions, and the relatively uniformity of the film thickness distribution. In order to solve the poor problems, a vacuum coating machine system equipped with an aperture baffle is provided. By placing an aperture baffle between the evaporation or sputtering source and the optical element, the shape of the aperture is optimized to realize the deposition of the film material on the optical element. Angle distribution range control, reduce the film material deposition angle and its distribution range, optimize the uniformity of film thickness, and improve film performance.
本发明解决上述技术问题采用的技术方案为：一种配备有开孔挡板的真空镀膜机系统，该系统包括光学元件，膜料蒸汽，带孔挡板和蒸发或溅射源；通过在蒸发或溅射源与光学元件间放置带孔挡板，真空镀膜过程中，膜料蒸汽穿过带孔挡板沉积到光学元件上，优化带孔挡板的开孔形状，实现对光学元件上膜料沉积角分布控制，降低膜料沉积角及其分布范围，并且校正光学元件上薄膜厚度非均匀性，提高薄膜性能，其中，所述的膜料沉积角是光学元件上膜料沉积点与蒸发或溅射源间的连线矢量与光学元件上膜料沉积点的表面法向量之间的夹角。The technical solution adopted by the present invention to solve the above-mentioned technical problems is: a vacuum coating machine system equipped with a perforated baffle, which includes optical elements, film material vapor, a perforated baffle and an evaporation or sputtering source; Or place a perforated baffle between the sputtering source and the optical element. During the vacuum coating process, the film material vapor passes through the perforated baffle and deposits on the optical element, optimizing the opening shape of the perforated baffle to realize the coating on the optical element. Material deposition angle distribution control, reduce the film material deposition angle and its distribution range, and correct the non-uniformity of the film thickness on the optical element, improve the performance of the film, wherein, the film material deposition angle is the difference between the film material deposition point and the evaporation point on the optical element Or the angle between the line vector between the sputtering sources and the surface normal vector of the film deposition point on the optical element.
所述的光学元件旋转运动可以是单轴旋转或者行星旋转，光学元件相对于蒸发或溅射源可以倾斜或水平放置。The rotational movement of the optical element can be single-axis rotation or planetary rotation, and the optical element can be placed obliquely or horizontally relative to the evaporation or sputtering source.
所述的光学元件镀膜面可以是平面和/或曲面。The coating surface of the optical element may be a plane and/or a curved surface.
所述的薄膜可以是金属薄膜或者介质薄膜。The thin film may be a metal thin film or a dielectric thin film.
所述的挡板上开孔形状取决于真空镀膜机配置、光学元件尺寸、目标沉积角分布范围和厚度均匀性指标。The shape of the hole on the baffle depends on the configuration of the vacuum coating machine, the size of the optical element, the distribution range of the target deposition angle and the index of thickness uniformity.
本发明的原理在于：Principle of the present invention is:
开孔挡板控制膜料沉积角和薄膜厚度分布技术是一种在真空镀膜过程中利用挡板开孔形状选择性地遮挡被蒸发或溅射的薄膜材料，使得真空镀膜机旋转系统中光学元件上膜料沉积角和厚度分布获得优化的方法。在真空镀膜过程中，膜料以蒸发或溅射方式在真空环境中传输，并在光学元件上沉积形成薄膜。为优化薄膜分布，光学元件在镀膜机内做旋转运动。旋转运动使得光学元件上任意位置处膜料沉积角均具有较宽的分布范围，并且不同位置上膜料沉积角分布存在明显差异，同时光学元件上薄膜厚度分布均匀性较差。通过在蒸发或溅射源与光学元件间放置开孔挡板，真空镀膜过程中，膜料穿过开孔挡板沉积到光学元件上。优化开孔形状，实现对光学元件上膜料沉积角分布控制，降低膜料沉积角及其分布范围，并且校正光学元件上薄膜厚度非均匀性，提高薄膜性能。The opening baffle to control the film material deposition angle and film thickness distribution technology is a technology that uses the shape of the baffle opening to selectively block the evaporated or sputtered film material during the vacuum coating process, so that the optical elements in the vacuum coating machine rotation system A method for optimizing the deposition angle and thickness distribution of the upper film material. In the vacuum coating process, the film material is transported in a vacuum environment by evaporation or sputtering, and deposited on the optical element to form a thin film. In order to optimize the film distribution, the optical components are rotated in the coater. The rotational movement makes the film deposition angle at any position on the optical element have a wide distribution range, and there are obvious differences in the distribution of the film deposition angle at different positions, and the uniformity of the film thickness distribution on the optical element is poor. By placing an aperture baffle between the evaporation or sputtering source and the optical element, the film material is deposited onto the optical element through the aperture baffle during the vacuum coating process. Optimize the shape of the opening to realize the control of the distribution of the deposition angle of the film material on the optical element, reduce the deposition angle and distribution range of the film material, and correct the non-uniformity of the film thickness on the optical element to improve the performance of the film.
本发明与现有技术相比具有如下优点：Compared with the prior art, the present invention has the following advantages:
1.本发明配备有开孔挡板的真空镀膜机系统，其利用开孔挡板控制光学元件上膜料沉积角和厚度分布方法，与以往的真空镀膜机相比，在蒸发或溅射源与光学元件间安装位置固定的开孔挡板，挡板机械稳定性高，操作简便，真空镀膜工艺可重复性好。1. The present invention is equipped with the vacuum coater system of perforated baffle, which utilizes perforated baffle to control the film material deposition angle and thickness distribution method on the optical element. The opening baffle with a fixed position between the optical element and the baffle has high mechanical stability, easy operation, and good repeatability of the vacuum coating process.
2.本发明配备有开孔挡板的真空镀膜机系统，其利用开孔挡板控制光学元件上膜料沉积角和厚度分布方法，与增加蒸发或溅射源与光学元件间距的方法相比，本发明对真空镀膜过程中光学元件上膜料沉积角和薄膜厚度分布优化效果更加突出。2. The present invention is equipped with the vacuum coating machine system of the perforated baffle, which uses the perforated baffle to control the deposition angle and thickness distribution method of the film material on the optical element, compared with the method of increasing the distance between the evaporation or sputtering source and the optical element , the present invention has a more prominent effect on optimizing the film material deposition angle and film thickness distribution on the optical element during the vacuum coating process.
附图说明Description of drawings
图1为本发明一种配备有开孔挡板的真空镀膜机系统示意图，其中，1为光学元件，2为膜料蒸汽，3为带孔挡板，4为蒸发或溅射源。1 is a schematic diagram of a vacuum coating machine system equipped with perforated baffles according to the present invention, wherein 1 is an optical element, 2 is film material vapor, 3 is a perforated baffle, and 4 is an evaporation or sputtering source.
图2为用于优化平面光学元件上薄膜沉积角和厚度分布的开孔形状示意图。Fig. 2 is a schematic diagram of the opening shape used to optimize the film deposition angle and thickness distribution on the planar optical element.
图3为使用开孔挡板前后，平面光学元件上薄膜厚度径向分布图。Fig. 3 is a radial distribution diagram of film thickness on a planar optical element before and after using a perforated baffle.
图4为使用开孔挡板前后，平面光学元件径向各个沉积点上最大膜料沉积角分布图。Fig. 4 is a distribution diagram of the maximum film material deposition angle at each deposition point in the radial direction of the planar optical element before and after using the perforated baffle.
图5为使用开孔挡板前后，平面光学元件表面不同位置处膜料沉积角概率分布图，其中，图5(a)距离平面光学元件中心0mm；图5(b)距离距离平面光学元件中心66mm；图5(c)距离平面光学元件中心133mm；图5(d)距离平面光学元件中心200mm。Figure 5 is a probability distribution diagram of the film material deposition angle at different positions on the surface of the planar optical element before and after using the perforated baffle, wherein, Fig. 5(a) is 0mm away from the center of the planar optical element; Fig. 5(b) is 0 mm away from the center of the planar optical element 66mm; Figure 5(c) is 133mm away from the center of the planar optical element; Figure 5(d) is 200mm away from the center of the planar optical element.
具体实施方式Detailed ways
图1为配备有开孔挡板的真空镀膜机系统示意图。本发明基于开孔挡板控制膜料沉积角和薄膜厚度分布技术，通过在蒸发或溅射源4与光学元件1间放置带孔挡板3，真空镀膜过程中利用带孔挡板开孔形状选择性地遮挡被蒸发或溅射的薄膜材料(即膜料蒸汽2)，使得真空镀膜机旋转系统中光学元件1上膜料蒸汽2沉积角分布获得优化，降低膜料沉积角及其分布范围，同时优化薄膜厚度分布均匀性，提高薄膜性能。FIG. 1 is a schematic diagram of a vacuum coating machine system equipped with a perforated baffle. The invention is based on the technique of controlling the deposition angle of the film material and the distribution of the film thickness based on the perforated baffle. By placing the perforated baffle 3 between the evaporation or sputtering source 4 and the optical element 1, the hole shape of the perforated baffle is used in the vacuum coating process. Selectively shield the evaporated or sputtered film material (film material vapor 2), so that the deposition angle distribution of the film material vapor 2 on the optical element 1 in the vacuum coating machine rotary system is optimized, reducing the film material deposition angle and its distribution range , while optimizing the uniformity of film thickness distribution and improving film performance.
下面结合实施例对本发明进一步说明。Below in conjunction with embodiment the present invention is further described.
以通光孔径400mm的平面光学元件为例，将平面光学元件无倾斜固定到真空镀膜机行星旋转系统上，平面光学元件与蒸发或溅射源的垂直距离为700mm，蒸发或溅射源放置在真空镀膜机底部(300mm，0mm，0mm)位置处，并在蒸发或溅射源正上方垂直距离120mm位置处安装开孔挡板，挡板开孔形状如图2所示。分析了使用开孔挡板控制膜料沉积角和厚度分布前后，平面光学元件径向上薄膜厚度和膜料最大沉积角分布，结果分别如图3和图4所示。由图3可知，使用本发明设计的开孔挡板能使通光孔径400mm的平面光学元件上薄膜厚度均匀性由最初的92.6％提高到99.6％；由图4可知，使用本发明设计的开孔挡板能使通光孔径400mm的平面光学元件上各个镀膜点的最大膜料沉积角都降低。Taking the planar optical element with a clear aperture of 400mm as an example, the planar optical element is fixed on the planetary rotation system of the vacuum coating machine without tilt. The vertical distance between the planar optical element and the evaporation or sputtering source is 700mm, and the evaporation or sputtering source is placed on the At the bottom of the vacuum coating machine (300mm, 0mm, 0mm), and a vertical distance of 120mm directly above the evaporation or sputtering source, the opening baffle is installed. The shape of the opening of the baffle is shown in Figure 2. The film thickness and the maximum deposition angle distribution of the film material in the radial direction of the planar optical element were analyzed before and after the opening baffle was used to control the film deposition angle and thickness distribution. The results are shown in Figure 3 and Figure 4, respectively. As can be seen from Fig. 3, the uniformity of the film thickness on the planar optical element with a clear aperture of 400 mm can be increased to 99.6% from the initial 92.6% by using the opening baffle designed by the present invention; The hole baffle can reduce the maximum film material deposition angle of each coating point on the planar optical element with a clear aperture of 400mm.
平面光学元件在真空镀膜室内旋转运动使得平面光学元件上各个镀膜点处膜料沉积角具有较宽的分布范围，且各个镀膜点膜料沉积角分布范围存在显著差异。图5给出使用开孔挡板控制膜料沉积角和厚度分布前后，距离平面光学元件中心0mm、66mm、133mm和200mm的镀膜点上膜料沉积角概率分布。其中，图5(a)距离平面光学元件中心0mm；图5(b)距离距离平面光学元件中心66mm；图5(c)距离平面光学元件中心133mm；图5(d)距离平面光学元件中心200mm。由图可知，使用开孔挡板能使平面光学元件上所有镀膜点的膜料沉积角分布均得到明显优化，同时最大膜料沉积角得到很好地控制。The rotating movement of the planar optical element in the vacuum coating chamber makes the deposition angle of the film material at each coating point on the planar optical element have a wide distribution range, and there are significant differences in the distribution range of the deposition angle of the film material at each coating point. Figure 5 shows the probability distribution of film material deposition angles at the coating points 0mm, 66mm, 133mm and 200mm away from the center of the planar optical element before and after using the opening baffle to control the film material deposition angle and thickness distribution. Among them, Figure 5(a) is 0mm away from the center of the planar optical element; Figure 5(b) is 66mm away from the center of the planar optical element; Figure 5(c) is 133mm away from the center of the planar optical element; Figure 5(d) is 200mm away from the center of the planar optical element . It can be seen from the figure that the use of the perforated baffle can significantly optimize the distribution of film deposition angles at all coating points on the planar optical element, and at the same time the maximum film deposition angle can be well controlled.
另外，对于离子束溅射、磁控溅射等物理气相沉积真空镀膜工艺而言，蒸发或溅射的薄膜材料在真空环境中传输、沉积形成薄膜过程和热蒸发真空镀膜工艺一样。因此，在离子束溅射、磁控溅射等物理气相沉积真空镀膜工艺中，使用本发明所述方法完成光学元件上膜料沉积角分布优化也同属于本专利的保护范围。In addition, for ion beam sputtering, magnetron sputtering and other physical vapor deposition vacuum coating processes, the transport and deposition of evaporated or sputtered thin film materials in a vacuum environment are the same as the thermal evaporation vacuum coating process. Therefore, in the vacuum coating process of physical vapor deposition such as ion beam sputtering and magnetron sputtering, using the method of the present invention to complete the optimization of the deposition angle distribution of the film material on the optical element also belongs to the protection scope of this patent.
总之，本发明改进真空镀膜机配置，将开孔挡板放置于蒸发或溅射源与平面光学元件之间，通过优化开孔形状，实现对真空镀膜过程中平面光学元件上膜料沉积角和薄膜厚度分布的有效控制，降低平面光学元件上膜料沉积角及其分布范围，并且优化薄膜厚度均匀性，提高薄膜性能。本发明使用开孔挡板控制平面光学元件上膜料沉积角和薄膜厚度分布，操作简便，可靠性高。In a word, the present invention improves the configuration of the vacuum coating machine, places the opening baffle between the evaporation or sputtering source and the planar optical element, and optimizes the shape of the opening to realize the adjustment of the film deposition angle and the thickness of the film on the planar optical element during the vacuum coating process. Effective control of film thickness distribution reduces the deposition angle and distribution range of film material on planar optical elements, optimizes film thickness uniformity, and improves film performance. The invention uses a perforated baffle to control the film deposition angle and film thickness distribution on the planar optical element, and has simple and convenient operation and high reliability.
本发明未详细阐述部分属于本领域公知技术。Parts not described in detail in the present invention belong to the well-known technology in the art.
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| CN106987817A (en) * | 2017-04-17 | 2017-07-28 | 同济大学 | A kind of method for improving line style magnetic controlled sputtering target rifle in spill cylinder base coated film quality |
| CN108193167A (en) * | 2017-12-11 | 2018-06-22 | 中国航空工业集团公司洛阳电光设备研究所 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
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