CN104726842A - Method for controlling distributions of film material deposition corners in film plating machine - Google Patents
Method for controlling distributions of film material deposition corners in film plating machine Download PDFInfo
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- CN104726842A CN104726842A CN201510189587.XA CN201510189587A CN104726842A CN 104726842 A CN104726842 A CN 104726842A CN 201510189587 A CN201510189587 A CN 201510189587A CN 104726842 A CN104726842 A CN 104726842A
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Abstract
The invention discloses a method for controlling distributions of film material deposition corners in a film plating machine. In a vacuum film plating process, film materials are conveyed in a vacuum environment in an evaporation or sputtering mode and are deposited on an optical element to form thin films. In order to optimize distributions of the thin films, the optical element rotates in the film plating machine. By rotation of the optical element, the distribution range of the film material deposition corners at optional positions of the optical element can be wide, and distributions of the film material deposition corners at different positions are different obviously. A poriferous baffle is placed between an evaporation or sputtering source and the optical element, and the film materials are deposited on the optical element through the poriferous baffle in the vacuum film plating process. Shapes of holes are optimized so as to control distributions of the film material deposition corners on the optical element, the film material deposition corners and the distribution range thereof are reduced, and the performance of the thin films is improved. Compared with the traditional vacuum film plating method, the method has the advantages that the thin films with low absorption and scattering loss and high environment stability can be manufactured. The method is particularly suitable for manufacturing vacuum ultraviolet/deep ultraviolet thin films.
Description
Technical field
The present invention relates to optical thin film element preparation field, especially a kind of method for controlling the distribution of coating materials deposition angles in coating equipment.
Background technology
Optical System Design is day by day accurate, for meeting the performance index of optical system, uses plane or curved optical device in a large number in optical system, and be coated with at optical element surface there is particular design film to put forward the performance of optical element.The current technology for preparing film on optical element mainly can be divided into physical vapor deposition (PVD) and chemical vapour deposition (CVD).And physical vapor deposition be one under vacuum, by evaporation or sputtered film material, and in the technological process of optical element surface formation of deposits film.For the distribution of optimizing optical element upper film, optical element rotates in vacuum plating unit.This rotary motion makes any plated film point place coating materials deposition angles on optical element surface all have wider distribution range, and on different positions, the distribution of coating materials deposition angles exists significant difference.Coating materials deposition angles is the angle between the surface normal of coating materials saltation point on evaporation or the transmission direction of sputtering coating materials in vacuum environment and optical element film coated.For microelectronics Optical Coatings for Photolithography, the spheric optical element wherein used is in vacuum plating process, and on spherical optics element, the coating materials deposition angles scope of plated film point covers 0-80 °.For under any given vacuum plating unit configuration condition, after selected technique for vacuum coating parameter, affecting one of principal element of optical element film coated upper film consistency of performance is coating materials deposition angles.
Thermal evaporation is a kind of by evaporating or distillation mode, coating materials is deposited to the physical gas phase deposition technology on optical element, is widely used in the film preparation of vacuum ultraviolet (VUV), deep ultraviolet, visible and infrared band.Compared to other physical gas phase deposition technology, as plasma ion assisted deposition technology, ion beam assisted deposition, magnetron sputtered deposition technology and ion beam sputter depositing technology, thermal evaporation is the first-selected deposition technique (J.E.Rudisill of vacuum ultraviolet (VUV)/deep ultraviolet film that preparation absorption loss is little, resisting laser damage ability is strong, " Design/deposition process tradeoffs for high performance optical coatings in theDUV spectral region; " SPIE, 5273 (2004): 30-40.).Thermal evaporation deposition is generally less than ten electron-volts to the coating materials energy on optical element, the film performance prepared thus depends critically upon coating materials deposition angles (C.Zaczek, A.Pazidis and H.Feldermann, " High-performance optical coating for VUV lithography application; " in OpticalInterference Coatings Topic meeting 2007-OSA Technical Digest Series (Optical Society ofAmerica, 2007), paper FA1.).Prepare magnesium fluoride film for thermal evaporation, study optical property and the microtexture of the magnesium fluoride film prepared under 0 °, 30 °, 40 °, 50 °, 60 ° and 70 ° of deposition angles respectively, result shows that magnesium fluoride film is column, polycrystalline structure growth.Along with coating materials deposition angles increases, the loss of magnesium fluoride film Intrinsic Gettering and scatter loss enlarge markedly; The specific refractory power of film, gather density and grain-size decline; Membrane structure is loose, surfaceness is large, easy planar water and hydrocarbon pollution, have a strong impact on the environmental stability (C.Guo of film, M.D.Kong, et al., " Microstructure-related propertiesof magnesium fluoride films at 193nm by oblique-angle deposition, " Optics Express, 21 (2013): 960-967.).Therefore, for preparing high performance film, need to optimize coating materials deposition angles distribution on optical element in vacuum plating process.
At present, by increasing evaporation or the vertical range between sputtering source and optical element, the coating materials deposition angles distribution of control both optical element surface plated film point can be carried out.But the program brings huge challenge to the manufacture of vacuum plating unit and technique for vacuum coating cost.For the convex spherical optical elements of clear aperture 300mm, radius-of-curvature 300mm, for making the deposition angles of optical element film coated upper any position coating materials be less than 45 °, evaporation or the vertical range between sputtering source and optical element at least should be greater than 2800mm.Configuration vacuum film coating chamber volume like this is excessive, obtains high vacuum coating Environmental costs high, and coating materials consumption is large in addition, and vacuum plating unit is difficult in maintenance.Therefore, more simple and feasible method is needed to realize in vacuum plating process coating materials deposition angles distribution optimization on optical element.
Summary of the invention
The technical problem to be solved in the present invention is: to overcome in existing vacuum plating process plated film point coating materials deposition angles distribution range on optical element surface wide, the problems such as different positions place coating materials deposition angles distributional difference is excessive, by evaporating or placing perforated baffle between sputtering source and optical element, optimize hole shape, realize controlling coating materials deposition angles distribution range on optical element, reduce coating materials deposition angles and distribution range thereof, improve film performance.
The technical scheme that the present invention solves the problems of the technologies described above employing is: a kind of method for controlling the distribution of coating materials deposition angles in coating equipment, and the method step is as follows:
In step (1), vacuum plating process, coating materials with evaporation or sputtering mode transmit in vacuum environment, and on optical element formation of deposits film; For optimizing film distribution, optical element rotates in coating equipment; Rotary motion makes coating materials deposition angles in any position on optical element all have wider distribution range, and on different positions, the distribution of coating materials deposition angles exists significant difference; Described coating materials deposition angles is the angle between the surface normal of coating materials saltation point on line vector on optical element between coating materials saltation point and evaporation or sputtering source and optical element;
Step (2), by evaporation or place perforated baffle between sputtering source and optical element, in vacuum plating process, coating materials deposits on optical element through perforated baffle; Optimize hole shape, realize coating materials deposition angles distributed controll on optical element, reduce coating materials deposition angles and distribution range thereof, improve film performance.
Wherein, the coated surface of described optical element can be plane or curved surface.
Wherein, described optical element rotary motion can be single-shaft-rotation or planetary rotation, and optical element can tilt or horizontal positioned relative to evaporation or sputtering source.
Wherein, described film can be metallic film or dielectric film.
Wherein, on described baffle plate, hole shape depends on vacuum plating unit configuration, optical element shape and the angular distribution scope of target deposition.
The principle of the technology of the present invention solution:
It is that a kind of baffle plate hole shape that utilizes in vacuum plating process optionally blocks the thin-film material being evaporated or sputter that perforated baffle controls coating materials deposition angles distribution technique, makes the method that in vacuum plating unit rotational system, on optical element, coating materials deposition angles distribution acquisition is optimized.In vacuum plating process, coating materials with evaporation or sputtering mode transmit in vacuum environment, and on optical element formation of deposits film.For optimizing film distribution, optical element rotates in coating equipment.Rotary motion makes coating materials deposition angles in any position on optical element all have wider distribution range, and on different positions, the distribution of coating materials deposition angles exists notable difference.By evaporating or placing perforated baffle between sputtering source and optical element, in vacuum plating process, coating materials is depositing on optical element through baffle plate perforate.Optimize hole shape, realize coating materials deposition angles distributed controll on optical element, reduce coating materials deposition angles and distribution range thereof, improve film performance.
The present invention compared with prior art tool has the following advantages:
1. perforated baffle controls coating materials deposition angles location mode, and compared with vacuum plating unit in the past, at the perforated baffle evaporated or between sputtering source and optical element, installation site is fixing, baffle plate mechanical stability is high, easy and simple to handle, technique for vacuum coating favorable repeatability.
2. perforated baffle controls coating materials deposition angles location mode, evaporate with increase or sputtering source compared with the method for optical element spacing, the present invention is more outstanding to coating materials deposition angles distribution optimization effect on optical element in vacuum plating process.
Accompanying drawing explanation
Fig. 1 is the vacuum plating unit system schematic being equipped with perforated baffle.
Fig. 2 is the hole shape schematic diagram for optimizing coating materials deposition angles distribution in spherical optical elements.
Fig. 3 uses before and after perforated baffle, different positions place, spherical optical elements surface coating materials deposition angles probability distribution graph in vacuum plating process.In figure, (a) is distance spherical optical elements summit 0mm; B () is distance spherical optical elements summit 50mm; C () is distance spherical optical elements summit 100mm; D () is distance spherical optical elements summit 150mm.
Embodiment
The present invention is further illustrated below in conjunction with accompanying drawing and specific embodiment.
Accompanying drawing 1 is for being equipped with the vacuum plating unit system schematic of perforated baffle.The present invention is based on perforated baffle and control coating materials deposition angles distribution technique, by evaporating or placing perforated baffle between sputtering source and optical element, baffle plate hole shape is utilized optionally to block the thin-film material being evaporated or sputter in vacuum plating process, make coating materials deposition angles distribution acquisition optimization on optical element in vacuum plating unit rotational system, reduce coating materials deposition angles and distribution range thereof, improve film performance.Below in conjunction with embodiment, the present invention is further described.
For the convex spherical optical elements of clear aperature 300mm, radius-of-curvature 300mm, convex spherical optical elements is fixed in vacuum plating unit planetary rotation system without inclination, the vertical range of optical element and evaporation or sputtering source is 700mm, evaporation or sputtering source are placed on vacuum plating motor spindle (300mm, 0mm, 0mm) position, and perforated baffle is installed in vertical range 100mm position directly over evaporation or sputtering source, baffle plate hole shape is as shown in Figure 2.Analyze respectively and use perforated baffle to control before and after coating materials deposition angles, apart from coating materials deposition angles probability distribution on the plated film point of convex spherical optical elements summit 0mm, 50mm, 100mm and 150mm, calculation result as shown in Figure 3.As shown in Figure 3, when not using perforated baffle, in convex spherical optical elements, the coating materials deposition angles of any plated film point all has wider distribution range; And along with plated film point and convex spherical optical elements vertex distance increase, the coating materials deposition angles distribution range of plated film point is widened, and maximum coating materials deposition angles also sharply increases.After using perforated baffle, in convex spherical optical elements, the coating materials deposition angles distribution of all plated film points is all obviously optimized, and maximum coating materials deposition angles is well controlled simultaneously.
In addition, for the physical vapor deposition such as ion beam sputtering, magnetron sputtering technique for vacuum coating, the thin-film material of evaporation or sputtering transmits in vacuum environment, formation of deposits thin-film process is the same with thermal evaporation technique for vacuum coating.Therefore, in the physical vapor deposition such as ion beam sputtering, magnetron sputtering technique for vacuum coating, use the method for the invention to complete coating materials deposition angles distribution optimization on optical element and also belong to protection scope of the present invention.
In a word, the present invention improves vacuum plating unit configuration, perforated baffle is positioned over evaporation or between sputtering source and optical element, by optimizing hole shape, realize effectively controlling coating materials deposition angles distribution on optical element in vacuum plating process, reduce coating materials deposition angles and distribution range thereof on optical element, improve film performance.The present invention uses coating materials deposition angles distribution on perforated baffle control both optical element, and easy and simple to handle, reliability is high.Non-elaborated part of the present invention belongs to techniques well known.
Claims (5)
1., for controlling a method for coating materials deposition angles distribution in coating equipment, it is characterized in that: the method step is as follows:
In step (1), vacuum plating process, coating materials with evaporation or sputtering mode transmit in vacuum environment, and on optical element formation of deposits film; For optimizing film distribution, optical element rotates in coating equipment; Rotary motion makes coating materials deposition angles in any position on optical element all have wider distribution range, and on different positions, the distribution of coating materials deposition angles exists significant difference;
Described coating materials deposition angles is the angle between the surface normal of coating materials saltation point on line vector on optical element between coating materials saltation point and evaporation or sputtering source and optical element;
Step (2), by evaporation or place perforated baffle between sputtering source and optical element, in vacuum plating process, coating materials deposits on optical element through perforated baffle; Optimize hole shape, realize coating materials deposition angles distributed controll on optical element, reduce coating materials deposition angles and distribution range thereof, improve film performance.
2. a kind of method for controlling the distribution of coating materials deposition angles in coating equipment according to claim 1, is characterized in that: the coated surface of described optical element can be plane or curved surface.
3. a kind of method for controlling the distribution of coating materials deposition angles in coating equipment according to claim 1, it is characterized in that: described optical element rotary motion can be single-shaft-rotation or planetary rotation, optical element can tilt or horizontal positioned relative to evaporation or sputtering source.
4. a kind of method for controlling the distribution of coating materials deposition angles in coating equipment according to claim 1, is characterized in that: described film can be metallic film or dielectric film.
5. a kind of method for controlling the distribution of coating materials deposition angles in coating equipment according to claim 1, is characterized in that: on described baffle plate, hole shape depends on vacuum plating unit configuration, optical element shape and the angular distribution scope of target deposition.
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| CN201510189587.XA CN104726842A (en) | 2015-04-21 | 2015-04-21 | Method for controlling distributions of film material deposition corners in film plating machine |
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| CN201510189587.XA CN104726842A (en) | 2015-04-21 | 2015-04-21 | Method for controlling distributions of film material deposition corners in film plating machine |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105112853A (en) * | 2015-09-08 | 2015-12-02 | 中国科学院光电技术研究所 | Vacuum coating machine system equipped with perforated baffle |
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| US20050146683A1 (en) * | 2001-09-17 | 2005-07-07 | Carl Zeiss Smt Ag | Optical component and coating system for coating substrates for optical components |
| CN1752275A (en) * | 2005-10-21 | 2006-03-29 | 中国科学院上海光学精密机械研究所 | The preparation method of wide spectrum dimmer reflecting film |
| CN102776484A (en) * | 2012-06-27 | 2012-11-14 | 中国科学院光电技术研究所 | Design method of baffle for controlling distribution of film thickness of planar optical element in film coating planetary system |
| CN102787301A (en) * | 2012-07-23 | 2012-11-21 | 中国科学院光电技术研究所 | Design method for baffle plate used for controlling film thickness distribution on conical optical element in film plating planetary system |
| CN102953041A (en) * | 2012-10-24 | 2013-03-06 | 中国科学院光电技术研究所 | Baffle plate design method for controlling membrane thickness distribution of spherical optical element in coating machine planet system |
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2015
- 2015-04-21 CN CN201510189587.XA patent/CN104726842A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050146683A1 (en) * | 2001-09-17 | 2005-07-07 | Carl Zeiss Smt Ag | Optical component and coating system for coating substrates for optical components |
| CN1752275A (en) * | 2005-10-21 | 2006-03-29 | 中国科学院上海光学精密机械研究所 | The preparation method of wide spectrum dimmer reflecting film |
| CN102776484A (en) * | 2012-06-27 | 2012-11-14 | 中国科学院光电技术研究所 | Design method of baffle for controlling distribution of film thickness of planar optical element in film coating planetary system |
| CN102787301A (en) * | 2012-07-23 | 2012-11-21 | 中国科学院光电技术研究所 | Design method for baffle plate used for controlling film thickness distribution on conical optical element in film plating planetary system |
| CN102953041A (en) * | 2012-10-24 | 2013-03-06 | 中国科学院光电技术研究所 | Baffle plate design method for controlling membrane thickness distribution of spherical optical element in coating machine planet system |
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| CN105112853A (en) * | 2015-09-08 | 2015-12-02 | 中国科学院光电技术研究所 | Vacuum coating machine system equipped with perforated baffle |
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