CN102953041A - Baffle plate design method for controlling membrane thickness distribution of spherical optical element in coating machine planet system - Google Patents
Baffle plate design method for controlling membrane thickness distribution of spherical optical element in coating machine planet system Download PDFInfo
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- CN102953041A CN102953041A CN2012104078523A CN201210407852A CN102953041A CN 102953041 A CN102953041 A CN 102953041A CN 2012104078523 A CN2012104078523 A CN 2012104078523A CN 201210407852 A CN201210407852 A CN 201210407852A CN 102953041 A CN102953041 A CN 102953041A
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Abstract
The invention discloses a baffle plate design method for controlling membrane thickness distribution of a spherical optical element in a coating machine planet system. In a vacuum coating process, a membrane material is transmitted in a vacuum environment in an evaporation or sputtering mode, and a membrane of which thickness distribution is not uniform is formed on the surface of the spherical optical element. Membrane thickness distribution models capable of actually reflecting thickness distributions of membranes deposited on the spherical optical element in the vacuum coating machine planet system when a baffle plate is not used and when the baffle plate is used for correction are respectively established. According to the membrane thickness distribution model when the baffle plate is not used, evaporating or sputtering characteristics of the membrane material are determined in the vacuum coating process; and then based on the characteristics, the membrane thickness distribution model when the baffle plate is used for correction is used to theoretically simulate the membrane thickness distribution on the spherical optical element in the vacuum coating machine planet system. The baffle plate design is optimized through a computer until the membrane thickness distribution on the spherical optical element in the vacuum coating machine planet system, which is corrected by the baffle plate, reaches the design demand, and thus the optimal baffle plate design is obtained. Compared with the traditional baffle plate design method, the baffle plate design method provided by the invention has the advantage that the baffle plate design is optimized by using the computer, so that the accurate control of the membrane thickness distribution on the spherical optical element can be realized.
Description
Technical field
The present invention relates to the optical thin film element preparation field, especially a kind of baffle design method for coating equipment planetary system control spherical optical elements film thickness distribution.
Background technology
Optical System Design is day by day accurate, for satisfying the performance index of optical system, has used spherical optical elements in the part optical system, and has had the optical thin film of particular design to improve the performance of spherical optical elements at spherical optical elements plated surface fixture.Current technology for prepare optical thin film in spherical optical elements mainly can be divided into physical vapor deposition (PVD) and chemical vapor deposition (CVD).And physical vapor deposition is a kind of under vacuum condition, by evaporation or sputtered film material, and in the film forming technological process of spherical optical elements surface deposition.Control in the situation that do not take film thickness to distribute, the film thickness that coating materials is deposited on the formation of spherical optical elements surface generally has non-uniform Distribution.This film thickness heterogeneous distributes and causes spherical optical elements can't satisfy the Performance of Optical System demand.Therefore, for preparing high performance spherical optical thin film element, the film thickness that must strictly control on the spherical optical elements distributes.
Film thickness distributed model when not using baffle plate on traditional optical element is based on the Knudsen rule, mainly consider the impact that the configuration of evaporation or sputtering source characteristic and vacuum plating unit distributes on film thickness, used the geometric relationship calculating optical element upper film thickness distribution between evaporation or sputtering source and optical element.Until 1999, the people such as Villa propose the film thickness distributed model when not using baffle plate on the coordinate form portrayal optical element, in conjunction with vector calculus, so that the film thickness distribution theory calculates (F.Villa more directly perceived, easy, and O.Pompa, " Emission pattern of a real vapor sources in high vacuum:an overview, " Appl.Opt.38,695-703 (1999)).But above-mentioned model is not all considered the impact that evaporation or the deposition angles of sputtered film material on optical element surface distribute on the optical element film thickness.
At present, the baffle plate correction film thickness technology (J.B.Oliver that optical element upper film thickness distribution mainly adopts the position to fix or move in the control vacuum plating unit planetary system, P.Kupinski, A.L.Rigatti, A.W.Schmid, J.C.Lambropoulos, S.Papernov, and A.Kozlov, " Large-aperture plasma-assisted deposition of inertial confinement fusion laser coatings; " Appl.Opt.50, C19-C26 (2011)).Although single shaft gyro rotational system (F.L.Wang, R.Crocker, and R.Faber, " Large-area Uniformity in Evaporation Coating through a New Form of Substrate Motion; " OSA, and be applicable to the double-drive planetary rotational system (M.Gross of ion beam sputtering deposition technique (2010)), S.Dligatctch, and A.Chtanov, " optimization of coating uniformity in an ion beam sputtering system using a modified planetary rotation method; " Appl.Opt.50, C316-C320 (2011)) in the situation that do not use the baffle plate correction all may realize the control that distributes of film thickness on the large size planar optical elements, but the control that distributes does not also have relevant report for the film thickness on the spherical optical elements.
With regard to the vacuum plating unit planetary system, because planet revolution/rotation can flexible, the Randomness of position of arbitrfary point is very high on the spherical optical elements coated surface, so that on the spherical optical elements coated surface on arbitrfary point and evaporation or the sputtering source surface projected footprint of line on the baffle plate holding plane of arbitrfary point very complicated, and then cause baffle design to be difficult to analytic solution.Traditional baffle design method that is used for vacuum plating unit planetary system control optical element upper film thickness distribution mainly is to rely on the plated film experience repeatedly to revise baffle design by a large amount of technological experiments to satisfy specific film thickness distribution, the process of this design baffle plate is very long, generally needs at least for several times even tens times experiment.
Summary of the invention
Technology of the present invention is dealt with problems: overcome the film thickness distributed model that has now when not using baffle plate and the deficiency of controlling the baffle design method of spherical optical elements upper film film thickness distribution in the vacuum plating unit planetary system, set up respectively the film thickness distributed model that deposits in the vacuum plating unit planetary system that can truly reflect when not using baffle plate and using the baffle plate correction on the spherical optical elements, and a kind of baffle plate Optimum design method by computator for vacuum plating unit planetary system control spherical optical elements upper film thickness distribution is provided, realize the accurate control of spherical optical elements upper film thickness distribution.
The principle of the technology of the present invention solution: baffle controls film thickness distribution technique is a kind ofly to utilize baffle plate optionally to block in the vacuum plating process to be evaporated or the thin-film material of sputter, so that spherical optical elements upper film thickness has equally distributed method in the vacuum plating unit planetary system.In the vacuum plating process, be evaporated or the thin-film material of sputter transmits in vacuum environment, and form the film of thickness non-uniform Distribution at the spherical optical elements coated surface.Set up respectively and can truly reflect when not using baffle plate and deposit to film thickness distributed model on the spherical optical elements when using the baffle plate correction in the vacuum plating unit planetary system.Film thickness distributed model when not using baffle plate is determined evaporation or the sputter characteristic j of thin-film material in the vacuum plating process, uses on this basis the film thickness distribution d'(r on the spherical optical elements in the film thickness distributed model theoretical modeling vacuum plating unit planetary system when having the baffle plate correction
1).By the computer optimization baffle design until in the vacuum plating unit planetary system after the baffle plate correction spherical optical elements upper film thickness distribution reach design requirement, obtain optimum baffle design.
Described film thickness distributed model when having the baffle plate correction is:
In the formula, vector r is the line of coordinate point (x, y, z) on true origin and evaporation or the sputtering source surface in evaporation or the sputtering source-spherical optical elements-baffle combination system; Vector r
1Be coordinate point (x on true origin and the spherical optical elements coated surface
1, y
1, z
1) line; The surface function of evaporation or sputtering source and spherical optical elements is respectively S (x, y, z)=0 and P (x
1, y
1, z
1)=0;
With
Be respectively on evaporation or the sputtering source surface coordinate point (x on coordinate point (x, y, z) and the spherical optical elements coated surface
1, y
1, z
1) unit normal vector; W (r, r
1)=s (r
1-r) and u (r, r
1)=p (r-r
1) (w (r, r1) and u (r, r1) are two functions of definition, and the angle between two vectors is explained in the employing vector calculus to be respectively evaporation or sputtering source function and spherical optical elements function; W (r, r1)/| r-r
1| and u (r, r1)/| r-r
1| coordinate point (x on coordinate point (x, y, z) and the spherical optical elements coated surface on representative evaporation or the sputtering source surface respectively
1, y
1, z
1) line and the angle between evaporation or sputtering source unit normal vector and spherical optical elements unit normal vector; A (x, y) is the bin function of evaporation or sputtering source surface function S (x, y, z)=0, is defined as:
F (x, y) is evaporation or the projection of sputtering source surface function S (x, y, z)=0 on the x-y plane; | r-r
1| be coordinate point (x on coordinate point (x, y, z) and the spherical optical elements coated surface on evaporation or the sputtering source surface
1, y
1, z
1) distance; J is evaporation or sputtering source characteristic parameters; B (r, r
1) for being evaporated or sputter coating materials deposition angles correction function, be defined as:
M (r, r
1) for baffle plate blocks function, be defined as: coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface on evaporation or the sputtering source surface
1, y
1, z
1) line on the baffle plate holding plane projected footprint and during the intersection of locus of baffle plate, baffle plate blocks function M (r, r
1) get 0; When both were non-intersect, baffle plate blocked function M (r, r
1) get 1.
The method of the evaporation of thin-film material or sputter characteristic j is in described definite vacuum plating process: when not using baffle plate, measure by experiment in the vacuum plating unit planetary system non-uniform film thickness distribution on the spherical optical elements, and real thin-film material evaporation or sputter characteristic j are determined in the film thickness distribution theory model-fitting when not using baffle plate;
Described film thickness theoretical model when not using baffle plate is:
The coated surface of described spherical optical elements can be convex surface or concave surface.
Described computer optimization baffle design mainly adopts simulated annealing, Monte Carlo algorithm, genetic algorithm or other the realizations such as Stochastic Optimization Algorithms.
The present invention compared with prior art has following advantage:
(1) original film thickness distributed model when not using baffle plate is improved.In the film thickness distributed model when not using baffle plate, consider the impact that the thin-film material deposition angle distributes on film thickness, more met the residing physics reality of spherical optical elements in the vacuum plating unit planetary system so that the film thickness of theoretical modeling distributes.
(2) baffle plate optimization design efficient is high.Owing to fully taking into account evaporation or sputtering source and spherical optical elements system configuration, obtain thin-film material evaporation or sputter characteristic in the vacuum plating process, and employing computer aided optimum method, film thickness distributed model when there is the baffle plate correction in foundation is so that baffle plate optimization design efficient significantly improves.
Description of drawings
Fig. 1 is the schematic diagram that is equipped with thermal evaporation sources-optical element-baffle combination system in the thermal evaporation vacuum plating unit of planetary system;
Fig. 2 is for using baffle plate front and back, the film thickness distribution plan of surveying and simulating on the spherical optical elements in the vacuum plating unit planetary system;
The baffle arrangement schematic diagram that Fig. 3 designs for computer optimization.
Embodiment
Be illustrated in figure 1 as the schematic diagram of thermal evaporation sources-optical element in the thermal evaporation vacuum plating unit that is equipped with planetary system-baffle combination system.In the thermal evaporation vacuum plating process, the thin-film material that is evaporated transmits in vacuum environment, and on the coated surface of spherical optical elements the formation of deposits film.In order to make spherical optical thin film element satisfy the performance requirement of optical system, need spherical optical elements upper film thickness distribution in the control vacuum plating unit planetary system.The most frequently used way is to use the baffle controls film thickness to distribute.The coated surface of described spherical optical elements can be convex surface or concave surface.The concrete baffle plate computer optimization design process that is used for vacuum plating unit planetary system control spherical optical elements upper film thickness distribution is:
Film thickness in film thickness distribution theory modeling vacuum plating unit planetary system when there is the baffle plate correction in utilization on the spherical optical elements distributes, use the computer optimization baffle design until in the vacuum plating unit planetary system after the baffle plate correction spherical optical elements upper film thickness distribution reach design requirement, obtain optimum baffle design.
The expression formula of described film thickness distributed model when having the baffle plate correction is equation (1), given vacuum plating unit configuration and spherical optical elements size, evaporation source function w (r, r
1), spherical optical elements function u (r, r
1), evaporation source surface function A (x, y), projection F (x, y), deposition angles correction function B (r, the r of evaporation source surface function on the x-y plane
1) and optical element film coated upper coordinate point (x
1, y
1, z
1) with evaporation source on the distance of coordinate point (x, y, z) | r-r
1| be known parameter.By equation (1) as can be known, spherical optical elements upper film thickness distribution d'(r in the vacuum plating unit planetary system when having the baffle plate correction for theoretical modeling
1), need also to determine that thin-film material evaporation characteristic j and baffle plate block function M (r, r
1).
Concrete thin-film material evaporation characteristic j deterministic process is: the film thickness distribution theory model when not using baffle plate as can be known, after given vacuum plating unit configuration and the optical element dimension, except thin-film material evaporation characteristic j, other parameter is known parameters in the film thickness distribution theory model.When not using the baffle plate correction, measure by experiment in the vacuum plating unit planetary system non-uniform film thickness distribution d on the spherical optical elements
Mea(r
1), and the film thickness distribution d of the simulation of the film thickness theoretical model when not using baffle plate
Cal(r
1) match determines thin-film material evaporation characteristic j.The expression formula of described film thickness distribution theory model when not using baffle plate is equation (3).Adopt spherical optical elements upper film thickness distribution when not using the baffle plate correction in the embodiment of the invention, determine the thin-film material evaporation characteristic.When not using baffle plate, clear aperture is that 172mm, radius-of-curvature are the normalization method film thickness distribution d that surveys on the spherical optical elements convex surface of 140mm in the vacuum plating unit planetary system as shown in Figure 2
Mea(r
1) and the normalization method film thickness distribution d of Theoretical Calculation
Cal(r
1) coincide, thin-film material thermal evaporation characteristic j=1.76 ± 0.02 is determined in match.
Concrete baffle plate blocks function M (r, r
1) determine: block function M (r, r by baffle plate
1) definition as can be known, baffle plate blocks function M (r, r
1) be a logic discriminant function, and for given vacuum plating unit configuration and spherical optical elements size, the design baffle plate directly is reflected in baffle plate to the impact of spherical optical elements upper film thickness distribution in the vacuum plating unit planetary system and blocks function M (r, r
1) on the value.Although in the vacuum plating unit planetary system on the spherical optical elements arbitrarily motion of point have very high Randomness of position, coordinate point (x on the spherical optical elements coated surface
1, y
1, z
1) and evaporation source on the projected footprint of line on the baffle plate holding plane of coordinate point (x, y, z) very complicated, be difficult to provide baffle plate and block function M (r, r
1) analytic solution.But, still can use computer to finish baffle plate and block function M (r, r
1) value judge, and then realize the calculating of equation (1), obtain spherical optical elements upper film thickness distribution d'(r in the baffle plate correction final vacuum coating equipment planetary system
1) theoretical modeling.Described computer optimization baffle design is mainly by simulated annealing, Monte Carlo algorithm, genetic algorithm or other the realizations such as Stochastic Optimization Algorithms.
As shown in Figure 2, after using the baffle plate correction, the normalization method film thickness distribution d of actual measurement
Mea(r
1) and the normalization method film thickness distribution d of Theoretical Calculation
Cal(r
1) meet.Use that clear aperture is higher than 98.4% as the film gauge uniformity of surveying on 172mm, the spherical optical elements convex surface of radius-of-curvature as 140mm in the revised vacuum plating unit planetary system of baffle plate, can satisfy well the film thickness distributed needs of optical system.The baffle shapes of spherical optical elements upper film thickness distribution as shown in Figure 3 in the corresponding computer optimization design control vacuum plating unit planetary system.
In addition, for the physical vapor deposition technique for vacuum coating such as ion beam sputtering, magnetron sputtering, the thin-film material of evaporation or sputter transmits in vacuum environment, the formation of deposits thin-film process is the same with the thermal evaporation technique for vacuum coating.Therefore, in the physical vapor deposition technique for vacuum coating such as ion beam sputtering, magnetron sputtering, use the method for the invention to finish the protection domain that corresponding baffle plate optimization design also belongs to this patent.
In a word, the present invention improves the film thickness distributed model that has now when not using baffle plate, namely introduces the deposition angles correction function and portrays more realistically spherical optical elements upper film thickness distribution in the vacuum plating unit planetary system; Repeatedly optimize baffle design by a large amount of experiments and realize that the control of spherical optical elements upper film thickness distribution is compared in the vacuum plating unit planetary system with existing, proposed to be applicable to the baffle plate Optimum design method by computator of control spherical optical elements upper film thickness distribution in the vacuum plating unit planetary system.The present invention uses the computer optimization baffle design can realize the accurate control of spherical optical elements upper film thickness distribution.
The non-elaborated part of the present invention belongs to techniques well known.
Claims (3)
1. one kind is used for the baffle design method that the coating equipment planetary system is controlled the spherical optical elements film thickness distribution, it is characterized in that:
(1) in the vacuum plating process, coating materials transmits in vacuum environment with evaporation or sputter mode, and forms film in spherical optical elements, and described spherical optical elements forms from the teeth outwards film thickness heterogeneous and distributes because of the deposition of thin-film material;
Film thickness in film thickness distribution theory modeling vacuum plating unit planetary system when (2) there is the baffle plate correction in utilization on the spherical optical elements distributes, use the computer optimization baffle design until in the vacuum plating unit planetary system after the baffle plate correction spherical optical elements upper film thickness distribution reach design requirement, obtain optimum baffle design;
Described film thickness distribution theory model when having the baffle plate correction is:
In the formula, vector r is the line of coordinate point (x, y, z) on true origin and evaporation or the sputtering source surface in evaporation or the sputtering source-spherical optical elements-baffle combination system; Vector r
1Be coordinate point (x on true origin and the spherical optical elements coated surface
1, y
1, z
1) line; The surface function of evaporation or sputtering source and spherical optical elements is respectively S (x, y, z)=0 and P (x
1, y
1, z
1)=0;
With
Be respectively on evaporation or the sputtering source surface coordinate point (x on coordinate point (x, y, z) and the spherical optical elements coated surface
1, y
1, z
1) unit normal vector; W (r, r
1)=s (r
1-r) and u (r, r
1)=p (r-r
1) (w (r, r1) and u (r, r1) are two functions of definition, and the angle between two vectors is explained in the employing vector calculus to be respectively evaporation or sputtering source function and spherical optical elements function; W (r, r1)/| r-r
1| and u (r, r1)/| r-r
1| coordinate point (x on coordinate point (x, y, z) and the spherical optical elements coated surface on representative evaporation or the sputtering source surface respectively
1, y
1, z
1) line and the angle between evaporation or sputtering source unit normal vector and spherical optical elements unit normal vector; A (x, y) is the bin function of evaporation or sputtering source surface function S (x, y, z)=0, is defined as:
F (x, y) is evaporation or the projection of sputtering source surface function S (x, y, z)=0 on the x-y plane; | r-r
1| be coordinate point (x on coordinate point (x, y, z) and the spherical optical elements coated surface on evaporation or the sputtering source surface
1, y
1, z
1) distance; J is evaporation or sputtering source characteristic parameters; B (r, r
1) for being evaporated or sputter coating materials deposition angles correction function, be defined as:
M (r, r
1) for baffle plate blocks function, be defined as: coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface on evaporation or the sputtering source surface
1, y
1, z
1) line on the baffle plate holding plane projected footprint and during the intersection of locus of baffle plate, baffle plate blocks function M (r, rX) gets 0; When both were non-intersect, baffle plate blocked function M (r, r
1) get 1;
(3) evaporation of thin-film material or sputter characteristic j determine in the following way in the vacuum plating process: when not using baffle plate, measure by experiment in the vacuum plating unit planetary system non-uniform film thickness distribution on the spherical optical elements, and evaporation or the sputter characteristic of thin-film material are determined in the film thickness distribution theory model-fitting when not using baffle plate;
Described film thickness distribution theory model when not using baffle plate is:
2. a kind of baffle design method for coating equipment planetary system control spherical optical elements film thickness distribution according to claim 1, it is characterized in that: the coated surface of described spherical optical elements is convex surface or concave surface.
3. a kind of baffle design method for coating equipment planetary system control spherical optical elements film thickness distribution according to claim 1 is characterized in that: described computer optimization baffle design employing simulated annealing, Monte Carlo algorithm or genetic algorithm realization.
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Cited By (7)
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| CN103726019A (en) * | 2013-12-13 | 2014-04-16 | 中国科学院上海光学精密机械研究所 | Design method for baffle capable of improving coating film uniformity of spherical optical element |
| CN104726842A (en) * | 2015-04-21 | 2015-06-24 | 中国科学院光电技术研究所 | Method for controlling distributions of film material deposition corners in film plating machine |
| CN105132881A (en) * | 2015-09-08 | 2015-12-09 | 中国科学院光电技术研究所 | Film system designing method for optical thin film on optical lens with high caliber-curvature-radius ratio |
| CN105334557A (en) * | 2015-11-10 | 2016-02-17 | 东莞鑫泰玻璃科技有限公司 | High-reflection sun light reflection mirror and manufacturing method thereof |
| CN111349885A (en) * | 2020-03-25 | 2020-06-30 | 中国工程物理研究院激光聚变研究中心 | Shielding plate determining method, film coating method and device |
| CN111826629A (en) * | 2020-08-25 | 2020-10-27 | 中国科学院光电技术研究所 | Baffle design method for controlling film thickness distribution of ellipsoidal optical element |
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| CN103726019A (en) * | 2013-12-13 | 2014-04-16 | 中国科学院上海光学精密机械研究所 | Design method for baffle capable of improving coating film uniformity of spherical optical element |
| CN103726019B (en) * | 2013-12-13 | 2015-10-28 | 中国科学院上海光学精密机械研究所 | Improve the method for design of the baffle plate of spherical optics element plated film homogeneity |
| CN104726842A (en) * | 2015-04-21 | 2015-06-24 | 中国科学院光电技术研究所 | Method for controlling distributions of film material deposition corners in film plating machine |
| CN105132881A (en) * | 2015-09-08 | 2015-12-09 | 中国科学院光电技术研究所 | Film system designing method for optical thin film on optical lens with high caliber-curvature-radius ratio |
| CN105334557A (en) * | 2015-11-10 | 2016-02-17 | 东莞鑫泰玻璃科技有限公司 | High-reflection sun light reflection mirror and manufacturing method thereof |
| CN111349885A (en) * | 2020-03-25 | 2020-06-30 | 中国工程物理研究院激光聚变研究中心 | Shielding plate determining method, film coating method and device |
| CN111826629A (en) * | 2020-08-25 | 2020-10-27 | 中国科学院光电技术研究所 | Baffle design method for controlling film thickness distribution of ellipsoidal optical element |
| CN117230416A (en) * | 2023-07-12 | 2023-12-15 | 中国科学院上海光学精密机械研究所 | Baffle design method for correcting film thickness distribution of magnetron sputtering element coating film |
| CN117230416B (en) * | 2023-07-12 | 2024-03-01 | 中国科学院上海光学精密机械研究所 | Baffle design method for correcting film thickness distribution of magnetron sputtering element coating film |
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