CN102953041B - Baffle plate design method for controlling membrane thickness distribution of spherical optical element in coating machine planet system - Google Patents
Baffle plate design method for controlling membrane thickness distribution of spherical optical element in coating machine planet system Download PDFInfo
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- CN102953041B CN102953041B CN201210407852.3A CN201210407852A CN102953041B CN 102953041 B CN102953041 B CN 102953041B CN 201210407852 A CN201210407852 A CN 201210407852A CN 102953041 B CN102953041 B CN 102953041B
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Abstract
The invention discloses a baffle plate design method for controlling membrane thickness distribution of a spherical optical element in a coating machine planet system. In a vacuum coating process, a membrane material is transmitted in a vacuum environment in an evaporation or sputtering mode, and a membrane of which thickness distribution is not uniform is formed on the surface of the spherical optical element. Membrane thickness distribution models capable of actually reflecting thickness distributions of membranes deposited on the spherical optical element in the vacuum coating machine planet system when a baffle plate is not used and when the baffle plate is used for correction are respectively established. According to the membrane thickness distribution model when the baffle plate is not used, evaporating or sputtering characteristics of the membrane material are determined in the vacuum coating process; and then based on the characteristics, the membrane thickness distribution model when the baffle plate is used for correction is used to theoretically simulate the membrane thickness distribution on the spherical optical element in the vacuum coating machine planet system. The baffle plate design is optimized through a computer until the membrane thickness distribution on the spherical optical element in the vacuum coating machine planet system, which is corrected by the baffle plate, reaches the design demand, and thus the optimal baffle plate design is obtained. Compared with the traditional baffle plate design method, the baffle plate design method provided by the invention has the advantage that the baffle plate design is optimized by using the computer, so that the accurate control of the membrane thickness distribution on the spherical optical element can be realized.
Description
Technical field
The present invention relates to optical thin film element preparation field, especially a kind of baffle design method of controlling spherical optical elements film thickness distribution for coating equipment planetary system.
Background technology
Optical System Design is day by day accurate, for meeting the performance index of optical system, in part optical system, has used spherical optical elements, and has had the optical thin film of particular design to improve the performance of spherical optical elements at spherical optical elements plated surface fixture.Currently mainly can be divided into physical vapor deposition (PVD) and chemical vapour deposition (CVD) for prepare the technology of optical thin film in spherical optical elements.And physical vapor deposition is a kind of under vacuum condition, by evaporation or sputtered film material, and in the film forming technological process of spherical optical elements surface deposition.In the situation that not taking film thickness to distribute control, the film thickness that coating materials is deposited on the formation of spherical optical elements surface generally has non-uniform Distribution.This film thickness heterogeneous distributes and causes spherical optical elements cannot meet Performance of Optical System demand.Therefore,, for preparing high performance spherical optical thin film element, the film thickness that must strictly control in spherical optical elements distributes.
Film thickness distributed model while not using baffle plate on traditional optical element is based on Knudsen rule, mainly consider the impact that evaporation or sputtering source characteristic and vacuum plating unit configuration distribute on film thickness, used the geometric relationship calculating optical element upper film thickness distribution between evaporation or sputtering source and optical element.Until 1999, the people such as Villa proposes to portray the film thickness distributed model while not using baffle plate on optical element by coordinate form, in conjunction with vector calculus, make film thickness distribution theory calculate more directly perceived, easy (F.Villa, and O.Pompa, " Emission pattern of a real vapor sources in high vacuum:an overview, " Appl.Opt.38,695-703 (1999)).But above-mentioned model is not all considered the impact that evaporation or the deposition angles of sputtered film material on optical element surface distribute on optical element film thickness.
At present, control the baffle plate correction film thickness technology (J.B.Oliver that in vacuum plating unit planetary system, optical element upper film thickness distribution mainly adopts position to fix or move, P.Kupinski, A.L.Rigatti, A.W.Schmid, J.C.Lambropoulos, S.Papernov, and A.Kozlov, " Large-aperture plasma-assisted deposition of inertial confinement fusion laser coatings; " Appl.Opt.50, C19-C26 (2011)).Although single shaft gyro rotational system (F.L.Wang, R.Crocker, and R.Faber, " Large-area Uniformity in Evaporation Coating through a New Form of Substrate Motion, " OSA, ) and be applicable to the double-drive planetary rotational system (M.Gross of ion beam sputtering deposition technique (2010), S.Dligatctch, and A.Chtanov, " optimization of coating uniformity in an ion beam sputtering system using a modified planetary rotation method, " Appl.Opt.50, C316-C320 (2011)) in the situation that not using baffle plate correction, all may realize film thickness on large size planar optical elements and distribute and control, but distribute to control for the film thickness in spherical optical elements and also there is no relevant report.
With regard to vacuum plating unit planetary system, because planet revolution/rotation can flexible, on spherical optical elements coated surface, the Randomness of position of arbitrfary point is very high, make on spherical optical elements coated surface on arbitrfary point and evaporation or sputtering source surface the projected footprint of the line of arbitrfary point on baffle plate holding plane very complicated, and then cause baffle design to be difficult to analytic solution.Traditional baffle design method of controlling optical element upper film thickness distribution for vacuum plating unit planetary system is mainly to rely on plated film experience repeatedly to revise baffle design by a large amount of technological experiments to meet specific film thickness and distribute, the process of this design baffle plate is very long, generally at least needs the even experiment of tens times for several times.
Summary of the invention
Technology of the present invention is dealt with problems: overcome existing film thickness distributed model while not using baffle plate and control the deficiency of the baffle design method of spherical optical elements upper film film thickness distribution in vacuum plating unit planetary system, set up respectively in the vacuum plating unit planetary system that can truly reflect when not using baffle plate and using baffle plate correction and deposited to the film thickness distributed model in spherical optical elements, and provide a kind of baffle plate Optimum design method by computator of controlling spherical optical elements upper film thickness distribution for vacuum plating unit planetary system, realize the accurate control of spherical optical elements upper film thickness distribution.
The principle of the technology of the present invention solution: baffle controls film thickness distribution technique is a kind ofly to utilize baffle plate optionally to block in vacuum plating process to be evaporated or the thin-film material of sputter, makes spherical optical elements upper film thickness in vacuum plating unit planetary system have equally distributed method.In vacuum plating process, evaporated or the thin-film material of sputter transmits in vacuum environment, and on spherical optical elements coated surface, formed the film of thickness non-uniform Distribution.Do not set up respectively when can truly reflecting while using baffle plate and using baffle plate correction and deposited to the film thickness distributed model in spherical optical elements in vacuum plating unit planetary system.Film thickness distributed model when not using baffle plate is determined evaporation or the sputter characteristic j of thin-film material in vacuum plating process, uses on this basis the film thickness distribution d'(r in spherical optical elements in the film thickness distributed model theoretical modeling vacuum plating unit planetary system while there is baffle plate correction
1).By computer optimization baffle design until in vacuum plating unit planetary system after baffle plate correction spherical optical elements upper film thickness distribution reach design requirement, obtain optimum baffle design.
Described film thickness distributed model while there is baffle plate correction is:
In formula, vector r is the line of coordinate point (x, y, z) on true origin and evaporation or sputtering source surface in evaporation or sputtering source-spherical optical elements-baffle combination system; Vector r1 is coordinate point (x on true origin and spherical optical elements coated surface
1, y
1, z
1) line; The surface function of evaporation or sputtering source and spherical optical elements is respectively S (x, y, z)=0 and P (x
1, y
1, z
1)=0; S=▽ S/| ▽ S| and p=▽ P/| ▽ P| are respectively on evaporation or sputtering source surface coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface
1, y
1, z
1) unit normal vector; W (r, r
1)=s (r
1-r) and u (r, r
1)=p (r-r
1) be respectively and evaporate or sputtering source function and spherical optical elements function, w (r, r
1) and u (r, r
1) be two functions of definition, adopt vector calculus to explain the angle between two vectors; W (r, r
1)/| r-r
1| and u (r, r
1)/| r-r
1| coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface on representative evaporation or sputtering source surface respectively
1, y
1, z
1) line and evaporation or sputtering source unit normal vector and spherical optical elements unit normal vector between angle; A (x, y) is the bin function of evaporation or sputtering source surface function S (x, y, z)=0, is defined as:
f (x, y) is evaporation or the projection of sputtering source surface function S (x, y, z)=0 in x-y plane; | r-r
1| be coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface on evaporation or sputtering source surface
1, y
1, z
1) distance; J is evaporation or sputtering source characteristic parameters; B (r, r
1) for to be evaporated or sputter coating materials deposition angles correction function, be defined as:
M (r, r
1) for baffle plate blocks function, be defined as: as coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface on evaporation or sputtering source surface
1, y
1, z
1) the projected footprint of line on baffle plate holding plane and when the intersection of locus of baffle plate, baffle plate blocks function M (r, r
1) get 0; In the time that both are non-intersect, baffle plate blocks function M (r, r
1) get 1.
In described definite vacuum plating process, the evaporation of thin-film material or the method for sputter characteristic j are: in the time not using baffle plate, measure by experiment in vacuum plating unit planetary system non-uniform film thickness distribution in spherical optical elements, and real thin-film material evaporation or sputter characteristic j are determined in film thickness distribution theory model-fitting when not using baffle plate;
Described film thickness theoretical model while not using baffle plate is:
The coated surface of described spherical optical elements can be convex surface or concave surface.
Described computer optimization baffle design mainly adopts the realizations such as simulated annealing, Monte Carlo algorithm, genetic algorithm or other Stochastic Optimization Algorithms.
The present invention compared with prior art tool has the following advantages:
(1) original film thickness distributed model while not using baffle plate is improved.In film thickness distributed model in the time not using baffle plate, consider the impact that thin-film material deposition angle distributes on film thickness, made the film thickness distribution of theoretical modeling more meet the residing physics reality of spherical optical elements in vacuum plating unit planetary system.
(2) baffle plate optimization design efficiency is high.Owing to fully taking into account evaporation or sputtering source and spherical optical elements system configuration, obtain thin-film material evaporation or sputter characteristic in vacuum plating process, and adopt computer aided optimum method, film thickness distributed model when foundation exists baffle plate correction, significantly improves baffle plate optimization design efficiency.
Brief description of the drawings
Fig. 1 is the schematic diagram that is equipped with thermal evaporation sources-optical element-baffle combination system in the thermal evaporation vacuum plating unit of planetary system;
Fig. 2 is for using baffle plate front and back, the film thickness distribution plan of surveying and simulating in spherical optical elements in vacuum plating unit planetary system;
The baffle arrangement schematic diagram that Fig. 3 designs for computer optimization.
Embodiment
Be illustrated in figure 1 the schematic diagram of thermal evaporation sources-optical element-baffle combination system in the thermal evaporation vacuum plating unit that is equipped with planetary system.In thermal evaporation vacuum plating process, the thin-film material being evaporated transmits in vacuum environment, and on the coated surface of spherical optical elements formation of deposits film.In order to make spherical optical thin film element meet the performance requirement of optical system, need to control spherical optical elements upper film thickness distribution in vacuum plating unit planetary system.The most frequently used way is to use baffle controls film thickness to distribute.The coated surface of described spherical optical elements can be convex surface or concave surface.The concrete baffle plate computer optimization design process of controlling spherical optical elements upper film thickness distribution for vacuum plating unit planetary system is:
Film thickness in film thickness distribution theory modeling vacuum plating unit planetary system when utilization exists baffle plate correction in spherical optical elements distributes, use computer optimization baffle design until in vacuum plating unit planetary system after baffle plate correction spherical optical elements upper film thickness distribution reach design requirement, obtain optimum baffle design.
The expression formula of described film thickness distributed model while there is baffle plate correction is equation (1), given vacuum plating unit configuration and spherical optical elements size, evaporation source function w (r, r
1), spherical optical elements function u (r, r
1), evaporation source surface function A (x, y), projection F (x, y), deposition angles correction function B (r, the r of evaporation source surface function in x-y plane
1) and optical element film coated upper coordinate point (x
1, y
1, z
1) with evaporation source on the distance of coordinate point (x, y, z) | r-r
1| be known parameter.From equation (1), spherical optical elements upper film thickness distribution d'(r in vacuum plating unit planetary system while there is baffle plate correction for theoretical modeling
1), also need to determine that thin-film material evaporation characteristic j and baffle plate block function M (r, r
1).
Concrete thin-film material evaporation characteristic j deterministic process is: the film thickness distribution theory model when not using baffle plate, after given vacuum plating unit configuration and optical element dimension, in film thickness distribution theory model, except thin-film material evaporation characteristic j, other parameter is known parameters.In the time not using baffle plate correction, measure by experiment in vacuum plating unit planetary system non-uniform film thickness distribution d in spherical optical elements
mea(r
1), and the film thickness distribution d of film thickness theoretical model simulation when not using baffle plate
cal(r
1) matching determines thin-film material evaporation characteristic j.The expression formula of described film thickness distribution theory model while not using baffle plate is equation (3).In the embodiment of the present invention, adopt spherical optical elements upper film thickness distribution while not using baffle plate correction, determine thin-film material evaporation characteristic.As shown in Figure 2 in the time not using baffle plate, in vacuum plating unit planetary system, clear aperture is the normalization method film thickness distribution d surveying on 172mm, the radius-of-curvature spherical optical elements convex surface that is 140mm
mea(r
1) and the normalization method film thickness distribution d of Theoretical Calculation
cal(r
1) coincide, thin-film material thermal evaporation characteristic j=1.76 ± 0.02 is determined in matching.
Concrete baffle plate blocks function M (r, r
1) determine: block function M (r, r by baffle plate
1) definition known, baffle plate blocks function M (r, r
1) be a logic discriminant function, and for given vacuum plating unit configuration and spherical optical elements size, design baffle plate is directly reflected in baffle plate to the impact of spherical optical elements upper film thickness distribution in vacuum plating unit planetary system and blocks function M (r, r
1) in value.Although in spherical optical elements, the motion of arbitrfary point has very high Randomness of position in vacuum plating unit planetary system, coordinate point (x on spherical optical elements coated surface
1, y
1, z
1) and evaporation source on the line of coordinate point (x, y, the z) projected footprint on baffle plate holding plane very complicated, be difficult to provide baffle plate and block function M (r, r
1) analytic solution.But, still can use computer to complete baffle plate and block function M (r, r
1) value judge, and then realize the calculating of equation (1), obtain spherical optical elements upper film thickness distribution d'(r in baffle plate correction final vacuum coating equipment planetary system
1) theoretical modeling.Described computer optimization baffle design is mainly by realizations such as simulated annealing, Monte Carlo algorithm, genetic algorithm or other Stochastic Optimization Algorithms.
As shown in Figure 2, using after baffle plate correction the normalization method film thickness distribution d of actual measurement
mea(r
1) and the normalization method film thickness distribution d of Theoretical Calculation
cal(r
1) meet.Use clear aperture in baffle plate revised vacuum plating unit planetary system for the film gauge uniformity of surveying on 172mm, the radius-of-curvature spherical optical elements convex surface that is 140mm is higher than 98.4%, can meet well the film thickness distributed needs of optical system.In corresponding computer optimization design control vacuum plating unit planetary system, the baffle shapes of spherical optical elements upper film thickness distribution as shown in Figure 3.
In addition, for the physical vapor deposition such as ion beam sputtering, magnetron sputtering technique for vacuum coating, the thin-film material of evaporation or sputter transmits in vacuum environment, formation of deposits thin-film process is the same with thermal evaporation technique for vacuum coating.Therefore,, in the physical vapor deposition such as ion beam sputtering, magnetron sputtering technique for vacuum coating, use the method for the invention to complete corresponding baffle plate optimization design and also belong to the protection domain of this patent.
In a word, the present invention improves existing film thickness distributed model while not using baffle plate, introduces deposition angles correction function and portrays more realistically spherical optical elements upper film thickness distribution in vacuum plating unit planetary system; Repeatedly optimize baffle design by a large amount of experiments and realize in vacuum plating unit planetary system compared with the control of spherical optical elements upper film thickness distribution with existing, proposed to be applicable to control in vacuum plating unit planetary system the baffle plate Optimum design method by computator of spherical optical elements upper film thickness distribution.The present invention uses computer optimization baffle design can realize the accurate control of spherical optical elements upper film thickness distribution.
Non-elaborated part of the present invention belongs to techniques well known.
Claims (3)
1. a baffle design method of controlling spherical optical elements film thickness distribution for coating equipment planetary system, is characterized in that:
(1) in vacuum plating process, coating materials transmits in vacuum environment with evaporation or sputter mode, and forms film in spherical optical elements, and described spherical optical elements, because of the deposition of thin-film material, forms from the teeth outwards film thickness heterogeneous and distributes;
(2) use the film thickness in spherical optical elements in the film thickness distribution theory modeling vacuum plating unit planetary system while there is baffle plate correction to distribute, use computer optimization baffle design until in vacuum plating unit planetary system after baffle plate correction spherical optical elements upper film thickness distribution reach design requirement, obtain optimum baffle design;
Described film thickness distribution theory model while there is baffle plate correction is:
In formula, vector r is the line of coordinate point (x, y, z) on true origin and evaporation or sputtering source surface in evaporation or sputtering source-spherical optical elements-baffle combination system; Vector r
1for coordinate point (x on true origin and spherical optical elements coated surface
1, y
1, z
1) line; The surface function of evaporation or sputtering source and spherical optical elements is respectively S (x, y, z)=0 and P (x
1, y
1, z
1)=0; S=▽ S/| ▽ S| and p=▽ P/| ▽ P| are respectively on evaporation or sputtering source surface coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface
1, y
1, z
1) unit normal vector; W (r, r
1)=s (r
1-r) and u (r, r
1)=p (r-r
1) be respectively and evaporate or sputtering source function and spherical optical elements function, w (r, r
1) and u (r, r
1) be two functions of definition, adopt vector calculus to explain the angle between two vectors; W (r, r
1)/| r-r
1| and u (r, r
1)/| r-r
1| coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface on representative evaporation or sputtering source surface respectively
1, y
1, z
1) line and evaporation or sputtering source unit normal vector and spherical optical elements unit normal vector between angle; A (x, y) is the bin function of evaporation or sputtering source surface function S (x, y, z)=0, is defined as:
f (x, y) is evaporation or the projection of sputtering source surface function S (x, y, z)=0 in x-y plane; | r-r
1| be coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface on evaporation or sputtering source surface
1, y
1, z
1) distance; J is evaporation or sputtering source characteristic parameters; B (r, r
1) for to be evaporated or sputter coating materials deposition angles correction function, be defined as:
M (r, r
1) for baffle plate blocks function, be defined as: as coordinate point (x on coordinate point (x, y, z) and spherical optical elements coated surface on evaporation or sputtering source surface
1, y
1, z
1) the projected footprint of line on baffle plate holding plane and when the intersection of locus of baffle plate, baffle plate blocks function M (r, r
1) get 0; In the time that both are non-intersect, baffle plate blocks function M (r, r
1) get 1;
(3) in vacuum plating process, the evaporation of thin-film material or sputter characteristic j determine in the following way: in the time not using baffle plate, measure by experiment in vacuum plating unit planetary system non-uniform film thickness distribution in spherical optical elements, and evaporation or the sputter characteristic of thin-film material are determined in film thickness distribution theory model-fitting when not using baffle plate;
Described film thickness distribution theory model while not using baffle plate is:
2. a kind of baffle design method of controlling spherical optical elements film thickness distribution for coating equipment planetary system according to claim 1, is characterized in that: the coated surface of described spherical optical elements is convex surface or concave surface.
3. a kind of baffle design method of controlling spherical optical elements film thickness distribution for coating equipment planetary system according to claim 1, is characterized in that: described computer optimization baffle design adopts simulated annealing, Monte Carlo algorithm or genetic algorithm to realize.
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| CN111349885B (en) * | 2020-03-25 | 2022-06-28 | 中国工程物理研究院激光聚变研究中心 | Shielding plate determination method, film coating method and device |
| CN111826629A (en) * | 2020-08-25 | 2020-10-27 | 中国科学院光电技术研究所 | Baffle design method for controlling film thickness distribution of ellipsoidal optical element |
| CN117230416B (en) * | 2023-07-12 | 2024-03-01 | 中国科学院上海光学精密机械研究所 | Baffle design method for correcting film thickness distribution of magnetron sputtering element coating film |
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