CN105132881A - Film system designing method for optical thin film on optical lens with high caliber-curvature-radius ratio - Google Patents
Film system designing method for optical thin film on optical lens with high caliber-curvature-radius ratio Download PDFInfo
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- CN105132881A CN105132881A CN201510568233.6A CN201510568233A CN105132881A CN 105132881 A CN105132881 A CN 105132881A CN 201510568233 A CN201510568233 A CN 201510568233A CN 105132881 A CN105132881 A CN 105132881A
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Abstract
The invention discloses a film system designing method for an optical thin film on an optical lens with high caliber-curvature-radius ratio. For optimizing the performance of the optical system, the optical thin film with excellent spectral property consistency is required to be prepared on the optical lens with the high caliber-curvature-radius ratio, therefore, film system designing for the optical thin film is required to be optimized globally. According to the film system designing method provided by the invention, firstly, thickness distribution of the optical thin film on the optical lens with the high caliber-curvature-radius ratio is determined through experiments or theoretical analysis; and secondly, the film system designing for the optical thin film is optimized globally by adopting a numerical computation method according to the requirements of spectral properties and light incident angles in all positions of the optical lens with the high caliber-curvature-radius ratio. Compared with a traditional designing method for the optical thin film, the film system designing method provided by the invention gives consideration to the thin film thickness and light incident angles on the optical lens with the high caliber-curvature-radius ratio, and is particularly suitable for thin film designing for the optical thin films on various sizes of optical lenses with high caliber-curvature-radius ratios.
Description
Technical field
The present invention relates to optical thin film element design preparation field, especially a kind of for the system design of optical film method of heavy caliber radius-of-curvature than lens.
Background technology
Along with Optical System Design is day by day accurate, for meeting the performance index of optical system, use the lens of increasing heavy caliber radius-of-curvature ratio in optical system, and need to be coated with high performance anti-reflection film in heavy caliber radius-of-curvature than lens surface, and then improve the performance of optical system.Usual heavy caliber radius-of-curvature can cause two serious consequences than the surface residual reflection of lens: the first, and light energy losses, makes the brightness of picture reduce; The second, surface reflection is through multiple reflections or diffusion, and some becomes stray light, once stray light arrives as plane, the contrast of picture is reduced, thus the image quality of influential system.In a word, the heavy caliber radius-of-curvature not being coated with anti-reflection film is non-serviceable than lens in optical system.
Being for general on heavy caliber radius-of-curvature than technology optical thin film preparing by lens mainly can be divided into physical vapor deposition and chemical vapour deposition.And physical vapor deposition be one under vacuum, by evaporation or sputtered film material, and at the technological process (HanyH.Bauer of heavy caliber radius-of-curvature than lens surface formation of deposits optical thin film, " AdvancedbroadbandARcoatingsinthevisible – acomparativestudyofdifferentdepositiontechnologies; " SPIE, 2776 (1996): 138-143.).Optical thin film prepared by usual physical gas phase deposition technology is more poor than the thickness distribution homogeneity of lens surface in heavy caliber radius-of-curvature.In addition, in optical system application process Large diameter radius-of-curvature than lens surface polished yarn Incident angle distribution a wider range, and each position angle of incidence of light differs greatly.Anti-reflection film spectrum property (the D.Isfort that these factors all will seriously affect heavy caliber radius-of-curvature and are coated with than lens surface, D.Tonova, M.Sundermann, T.Koch, " Optimizationofthespectralperformanceofmultilayercoatings oncomplexopticsinplasmaassisteddepositionprocesses; " SPIE, 9131 (2014): 913109.).
Current, there is the problem of serious thickness non-uniformities than lens surface optical thin film for heavy caliber radius-of-curvature, baffle technology selectivity can be adopted to optimize thin-film material deposition distribution, realize heavy caliber radius-of-curvature than lens surface optical film thickness Nonuniformity Correction (Li Bincheng, Guo Chun, Kong Mingdong and Liu Cunding, Chinese invention patent " a kind of plate design method for controlling spherical optical elements film thickness distribution in coating equipment planetary system ", application number: 201210407852.3).But the method is only effective than lens to the heavy caliber radius-of-curvature that geometrical dimension is enough large, the lens less to geometrical dimension, baffle plate correction film thickness distribution heterogeneity can not realize substantially.On the other hand, for the problem that heavy caliber radius-of-curvature is larger than lens surface light angular region, conventional business software (as Optilayer, Macleod, FilmWizard and TFC etc.) can realize the high-performance anti-reflection film design under wide-angle condition.But all system design of optical film software does not all consider that heavy caliber radius-of-curvature is than the impact of lens surface coating thickness nonuniformities on anti-reflection film performance.Therefore, method more is reliably needed to realize the system design of optical film of heavy caliber radius-of-curvature than lens.
Summary of the invention
The technical problem to be solved in the present invention is: on the lens overcoming heavy caliber radius-of-curvature ratio optics film gauge uniformity difference and angle of incidence of light distribution range wide, to the difficulty that heavy caliber radius-of-curvature is brought than the system design of optical film of lens.Optical film thickness distribution by experiment or on the lens of theoretical analysis determination heavy caliber radius-of-curvature ratio; In conjunction with heavy caliber radius-of-curvature than each position angle of incidence of light and spectrum property requirement on lens, adopt numerical computation method global optimization system design of optical film, improve heavy caliber radius-of-curvature than lens spectrum property.
The technical scheme that the present invention solves the problems of the technologies described above employing is: a kind of for the system design of optical film method of heavy caliber radius-of-curvature than lens, the method comprises the steps:
Step (1), the configuration of foundation vacuum plating unit and heavy caliber radius-of-curvature are than the geometrical shape of lens, optical film thickness distributed model on the lens setting up heavy caliber radius-of-curvature ratio, the optical film thickness distribution of each plated film point on the lens of theoretical analysis determination heavy caliber radius-of-curvature ratio; Or measure the optical film thickness distribution of each plated film point on the lens determining heavy caliber radius-of-curvature ratio by experiment;
On the lens of described heavy caliber radius-of-curvature ratio, optical film thickness distributed model is:
In formula, vector r is evaporation or sputtering source-heavy caliber radius-of-curvature than the line of true origin in lens combination system and evaporation or sputtering source coordinate point (x, y, z) on the surface; Vector r
1for true origin and heavy caliber radius-of-curvature are than coordinate point (x on coating of lenses face
1, y
1, z
1) line; Evaporation or sputtering source and heavy caliber radius-of-curvature are respectively S (x, y, z)=0 and P (x than the surface function of lens
1, y
1, z
1)=0;
with
be respectively evaporation or sputtering source on the surface coordinate point (x, y, z) and heavy caliber radius-of-curvature than coordinate point (x on coating of lenses face
1, y
1, z
1) unit normal vector; W (r, r
1)=s (r
1-r) and u (r, r
1)=p (r-r
1) be respectively evaporation or sputtering source function and heavy caliber radius-of-curvature than lens function; A (x, y) is the bin function of evaporation or sputtering source surface function S (x, y, z)=0, is defined as:
f (x, y) is evaporation or sputtering source surface function S (x, y, z)=0 projection on the x-y plane; | r-r
1| for evaporation or sputtering source on the surface coordinate point (x, y, z) and heavy caliber radius-of-curvature than coordinate point (x on coating of lenses face
1, y
1, z
1) distance; J is evaporation or sputtering source characteristic parameters; B (r, r
1) for be evaporated or to sputter coating materials deposition angles correction function, be defined as:
The optical film thickness distribution that step (2), integrating step (1) are determined, according to each plated film point angle of incidence of light and spectrum property requirement on the lens of heavy caliber radius-of-curvature ratio, adopt numerical computation method global optimization system design of optical film.
Described heavy caliber radius-of-curvature can be convex surface or concave surface than the coated surface of lens.
Described evaporation or sputtering characteristic j can measure heavy caliber radius-of-curvature by experiment than optical film thickness distribution on lens, and are determined by the matching of optical film thickness distributed model, and its span is at 0 – 4.
The described numerical computation method for system design of optical film can be aciculiform algorithm, simulated annealing, Newton's algorithm, particle cluster algorithm, genetic algorithm or other Stochastic Optimization Algorithms.
The present invention compared with prior art tool has the following advantages:
1. the present invention is a kind of for the system design of optical film method of heavy caliber radius-of-curvature than lens, compared with Film Design method in the past, take into account simultaneously heavy caliber radius-of-curvature than lens upper film thickness and light angular distribution, global optimization Film Design, can significantly improve the spectrum property of heavy caliber radius-of-curvature than lens.
2. the present invention is a kind of for the system design of optical film method of heavy caliber radius-of-curvature than lens, only need the correct heavy caliber radius-of-curvature that obtains than lens upper film thickness distribution, and without correction thin film thickness distribution heterogeneity, this process performs easy, be easy to realize.
Accompanying drawing explanation
Fig. 1 is that heavy caliber radius-of-curvature is than lens polished yarn distribution schematic diagram.
Fig. 2 be clear aperture and radius-of-curvature be 50mm convex lens on optical film thickness and light angular distribution.
Fig. 3 is that the method adopting two kinds of traditional Film Design methods and the present invention to propose to optimize on convex lens that clear aperture and radius-of-curvature be 50mm multiple plated film point respectively at the average transmittances of 480nm-700nm wave band.
Fig. 4 is that the method adopting two kinds of traditional Film Design methods and the present invention to propose optimizes on convex lens that clear aperture and radius-of-curvature be 50mm that multiple plated film point is at the optical transmission spectra curve of 460nm-740nm wave band respectively, and wherein Fig. 4 (a) is rise 0mm plated film point; Fig. 4 (b) is rise 5mm plated film point; Fig. 4 (c) is rise 10mm plated film point; Fig. 4 (d) is rise 15mm plated film point; Fig. 4 (e) is rise 20mm plated film point; Fig. 4 (f) is rise 25mm plated film point.
Embodiment
The present invention is further illustrated below in conjunction with accompanying drawing and specific embodiment.
The present invention is optical film thickness distribution first by experiment or on the lens of theoretical analysis determination heavy caliber radius-of-curvature ratio.Secondly, and the spectrum property requirement more angular distribution than each position light on lens according to heavy caliber radius-of-curvature, adopts numerical computation method global optimization system design of optical film.And then on the lens solving heavy caliber radius-of-curvature ratio optics film gauge uniformity difference and angle of incidence of light distribution range wide, to the difficulty that heavy caliber radius-of-curvature is brought than the system design of optical film of lens.Below in conjunction with embodiment, the present invention is further described.
Be the convex lens of 50mm for clear aperature and radius-of-curvature, Fig. 1 is that heavy caliber radius-of-curvature is than lens polished yarn distribution schematic diagram.Usual physical vapor deposition is prepared the evaporation of optical film materials or is sputtered characteristic j span between 0-4, here when theoretical analysis determines this heavy caliber radius-of-curvature than convex lens upper film thickness distribution, evaporation or the sputtering characteristic j value of thin-film material are 2, and corresponding heavy caliber radius-of-curvature than convex lens upper film thickness distribution as shown in Figure 2.As shown in Figure 2, this convex lens upper film thickness parabolically distributes along lens rise, and optical film thickness homogeneity only has 84.6%.As shown in Figure 2, this convex lens polished yarn input angle linearly increases progressively distribution along lens rise to the angle of incidence of light of each plated film point corresponding, and the angle of incidence of light distribution range of whole convex lens coated surface is at 0-30 °.
To prepare the conventional lens of visible light wave range, this convex lens spectrum property requires that transmitance mean value is higher than 99.5% in 480nm-700nm wavelength band.Comparative studies three kinds of Film Design methods in the present embodiment, they respectively: method one, do not consider convex lens upper film thickness and light angular distribution, namely optimize the Film Design on convex lens summit; Method two, does not consider convex lens upper film thickness distribution, with 0-30 ° of light angular region polishing wax best performance for target design optical film system, and the Film Design method namely possessed in business software; Method three, take into account convex lens upper film thickness simultaneously and light angular distribution, optics film light spectrality energy on global optimization convex lens, that is to say the Film Design method that the present invention proposes.Based on the convex lens film system that three kinds of Film Design methods are optimized, calculate respectively and obtain different rise place on convex lens, the transmitance mean value on 480nm-700nm wave band, as shown in Figure 3.As shown in Figure 3, be less than the region of 15mm in rise, the spectrum property of three kinds of Film Design methods optimization all can meet Performance of Optical System demand; But when rise is in the coating film area of 15mm-25mm, the film system optical property designed by method one and method two sharply declines, and at meniscus edge place, transmitance mean value is less than 93.8% and 95% respectively, can not meet the performance requriements of optical system completely.Comparatively speaking, the transmitance mean value that the film designed by method three ties up on 480nm-700nm wave band is still greater than 99.7%.On the convex lens that the clear aperture of corresponding employing aforesaid three kinds of Film Design methods optimization and radius-of-curvature are 50mm at the optical transmission spectra curve of 460nm-740nm wave band as shown in Figure 4, wherein Fig. 4 (a) is rise 0mm plated film point, Fig. 4 (b) is rise 5mm plated film point, Fig. 4 (c) is rise 10mm plated film point, Fig. 4 (d) is rise 15mm plated film point, Fig. 4 (e) for rise 20mm plated film point and Fig. 4 (f) be rise 25mm plated film point.More above-mentioned three kinds of Film Design methods, confirm that the Film Design method working effect that the present invention proposes is best.When the Film Design method adopting the present invention to propose can make convex lens polishing wax performance region up to standard by 60% of routine, General Promotion to 100%.
Usually, for the physical vapor deposition such as ion beam sputtering, magnetron sputtering technique for vacuum coating, the thin-film material of evaporation or sputtering transmits in vacuum environment, formation of deposits thin-film process is the same with thermal evaporation technique for vacuum coating.Therefore, in the physical vapor deposition such as ion beam sputtering, magnetron sputtering technique for vacuum coating, use the method for the invention to complete heavy caliber radius-of-curvature belongs to this patent protection domain than system design of optical film on lens.In addition, heavy caliber radius-of-curvature according to Performance of Optical System needs, can be selected the optical thin film such as high-reflecting film, spectro-film, filter coating, polarizing coating be coated with except anti-reflection film, also belongs to the protection domain of this patent than lens.
In a word, the present invention taken into account simultaneously heavy caliber radius-of-curvature than lens upper film thickness and light angular distribution, system design of optical film on the lens being specially adapted to the heavy caliber radius-of-curvature ratio of various size.The present invention proposes for the novel method of heavy caliber radius-of-curvature than system design of optical film on lens, the method is implemented simple, and design effect is splendid.
Non-elaborated part of the present invention belongs to techniques well known.
Claims (4)
1., for the system design of optical film method of heavy caliber radius-of-curvature than lens, it is characterized in that: the method comprises the steps:
Step (1), the configuration of foundation vacuum plating unit and heavy caliber radius-of-curvature are than the geometrical shape of lens, optical film thickness distributed model on the lens setting up heavy caliber radius-of-curvature ratio, theoretical analysis determination heavy caliber radius-of-curvature distributes than the optical film thickness of each plated film point on lens; Or measure by experiment and determine that heavy caliber radius-of-curvature distributes than the optical film thickness of each plated film point on lens;
Described heavy caliber radius-of-curvature than optical film thickness distributed model on lens is:
In formula, vector r is evaporation or sputtering source-heavy caliber radius-of-curvature than the line of true origin in lens combination system and evaporation or sputtering source coordinate point (x, y, z) on the surface; Vector r
1for true origin and heavy caliber radius-of-curvature are than coordinate point (x on coating of lenses face
1, y
1, z
1) line; Evaporation or sputtering source and heavy caliber radius-of-curvature are respectively S (x, y, z)=0 He than the surface function of lens
with
be respectively evaporation or sputtering source on the surface coordinate point (x, y, z) and heavy caliber radius-of-curvature than coordinate point (x on coating of lenses face
1, y
1, z
1) unit normal vector; W (r, r
1)=s (r
1-r) and u (r, r
1)=p (r-r
1) be respectively evaporation or sputtering source function and heavy caliber radius-of-curvature than lens function; A (x, y) is the bin function of evaporation or sputtering source surface function S (x, y, z)=0, is defined as:
f (x, y) is evaporation or sputtering source surface function S (x, y, z)=0 projection on the x-y plane; | r-r
1| for evaporation or sputtering source on the surface coordinate point (x, y, z) and heavy caliber radius-of-curvature than coordinate point (x on coating of lenses face
1, y
1, z
1) distance; J is evaporation or sputtering source characteristic parameters; B (r, r
1) for be evaporated or to sputter coating materials deposition angles correction function, be defined as:
The optical film thickness distribution that step (2), integrating step (1) are determined, according to heavy caliber radius-of-curvature than each plated film point angle of incidence of light and spectrum property requirement on lens, adopt numerical computation method global optimization system design of optical film.
2. according to claim 1 a kind of for the system design of optical film method of heavy caliber radius-of-curvature than lens, it is characterized in that: described heavy caliber radius-of-curvature can be convex surface or concave surface than the coated surface of lens.
3. according to claim 1 a kind of for the system design of optical film method of heavy caliber radius-of-curvature than lens, it is characterized in that: described evaporation or sputtering characteristic j can measure heavy caliber radius-of-curvature by experiment than optical film thickness distribution on lens, and determined by the matching of optical film thickness distributed model, its span is at 0 – 4.
4. according to claim 1 a kind of for the system design of optical film method of heavy caliber radius-of-curvature than lens, it is characterized in that: the described numerical computation method for system design of optical film can be aciculiform algorithm, simulated annealing, Newton's algorithm, particle cluster algorithm, genetic algorithm or other Stochastic Optimization Algorithms.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106168712A (en) * | 2016-09-06 | 2016-11-30 | 山东理工大学 | A kind of Gaussian Beam Transformation is the population method for designing of flat top beam shaping lens |
| CN111274673A (en) * | 2020-01-07 | 2020-06-12 | 上海索辰信息科技有限公司 | Optical product model optimization method and system based on particle swarm optimization |
| CN111723528A (en) * | 2020-07-23 | 2020-09-29 | 长春理工大学 | High-dimensional multi-objective optimization design method for optical film |
| CN114779467A (en) * | 2022-04-27 | 2022-07-22 | 吉林大学 | Novel spectrometer membrane system combination selection method based on detector characteristics |
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| CN102776484A (en) * | 2012-06-27 | 2012-11-14 | 中国科学院光电技术研究所 | Design method of baffle for controlling distribution of film thickness of planar optical element in film coating planetary system |
| CN102953041A (en) * | 2012-10-24 | 2013-03-06 | 中国科学院光电技术研究所 | Baffle plate design method for controlling membrane thickness distribution of spherical optical element in coating machine planet system |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102776484A (en) * | 2012-06-27 | 2012-11-14 | 中国科学院光电技术研究所 | Design method of baffle for controlling distribution of film thickness of planar optical element in film coating planetary system |
| CN102953041A (en) * | 2012-10-24 | 2013-03-06 | 中国科学院光电技术研究所 | Baffle plate design method for controlling membrane thickness distribution of spherical optical element in coating machine planet system |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106168712A (en) * | 2016-09-06 | 2016-11-30 | 山东理工大学 | A kind of Gaussian Beam Transformation is the population method for designing of flat top beam shaping lens |
| CN106168712B (en) * | 2016-09-06 | 2020-12-22 | 山东理工大学 | Particle swarm design method for shaping lens for converting Gaussian beam into flat-topped beam |
| CN111274673A (en) * | 2020-01-07 | 2020-06-12 | 上海索辰信息科技有限公司 | Optical product model optimization method and system based on particle swarm optimization |
| CN111274673B (en) * | 2020-01-07 | 2021-02-23 | 上海索辰信息科技股份有限公司 | Optical product model optimization method and system based on particle swarm optimization |
| CN111723528A (en) * | 2020-07-23 | 2020-09-29 | 长春理工大学 | High-dimensional multi-objective optimization design method for optical film |
| CN111723528B (en) * | 2020-07-23 | 2021-02-02 | 长春理工大学 | High-dimensional multi-objective optimization design method for optical film |
| CN114779467A (en) * | 2022-04-27 | 2022-07-22 | 吉林大学 | Novel spectrometer membrane system combination selection method based on detector characteristics |
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