CN104849861B - A kind of method for preparing optical thin film - Google Patents
A kind of method for preparing optical thin film Download PDFInfo
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- CN104849861B CN104849861B CN201510292686.0A CN201510292686A CN104849861B CN 104849861 B CN104849861 B CN 104849861B CN 201510292686 A CN201510292686 A CN 201510292686A CN 104849861 B CN104849861 B CN 104849861B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
Abstract
The invention discloses a kind of method for preparing high-performance optical film, first, needed according to optical thin film performance, design initial membrane system, and optical thin film is prepared using physical gas phase deposition technology；Optical thin film performance is characterized using spectrophotometer or ellipsometer；Optical thin-film structure model is set up, coating materials characteristic parameter and optical thin film Properties Correlation is realized；Inverting is carried out to optical thin film actual measurement performance data, coating materials characteristic parameter is determined by multi-parameter fitting, while obtaining physical gas phase deposition technology prepares the systematic error and delay error correction factor that coating materials physical thickness is controlled during optical thin film；According to the coating materials characteristic parameter obtained, according to optical thin film performance requirement, re-optimization system design of optical film controls error correction with reference to coating materials physical thickness, high-performance optical film is prepared using physical gas phase deposition technology.The present invention can optimize optical thin film design comprehensively, improve coating materials physical thickness control accuracy, it is adaptable to various high-performance optical film preparations.
Description
Technical field
The present invention relates to a kind of method for preparing optical thin film, refer in particular to while determining coating materials characteristic parameter and physical thickness control
Error correction factor processed, the method for preparing various high-performance optical films.
Background technology
High-performance optical film can significantly increase the performance of optical system so that the design and preparation of optical thin film turn into
One big focus of contemporary scientific technical research.The realization of high-performance optical film has benefited from system design of optical film and prepares work
Skill is lifted.Along with the fast development of computer technology, system design of optical film method is increasingly perfect, and Film Design efficiency
It is very fast to improve.But system design of optical film be unable to do without the determination of coating materials characteristic parameter, includes physical thickness, the refractive index of coating materials
And extinction coefficient.It is currently used in and determines that the method for coating materials characteristic parameter is broadly divided into photometry and Ellipsometric.Using above-mentioned
Two methods determine that the research of coating materials characteristic parameter is carried out around monofilm mostly, only can determine that a kind of characteristic parameter of coating materials
(Guo Chun, Li Bincheng " determine MgF with simulated annealing method2Film refractive index and thickness, " optical precision engineering 21,858-863
(2013).).However, high performance optical thin film typically at least needs two kinds or two or more coating materials Combination Designs is formed.
Determine the implementing method of various coating materials characteristic parameters one by one in the past, operating efficiency is extremely low, it is clear that can not meet high effective optical film
Film Design demand.
The further investigation of vacuum coating technology, has promoted the development in an all-round way of various physical gas phase deposition technologies so that Gao Xing
The preparation of energy optical thin film is possibly realized.The success or not of high-performance optical film preparation then depends on film during vacuum coating
Expect the accuracy of thickness control.The higher method of general coating materials thickness control accuracy is light-operated method (A.V.Tikhonravov and
M.K.Trubetskov, " Elimination of cumulative effect of thickness errors in
monochromatic monitoring of optical coating production:theory”,Applied
Optics,46(11):2084-2090(2007).).But, in addition to simple high-reflecting film is designed, to meet optical system
It can need, use irregular film design optical thin film, this, which means that, has more thickness in system design of optical film more
Thin layer is spent, now light-operated method is not suitable for monitoring thin layer coating materials thickness, and light-operated method has control deviation accumulation, has a strong impact on light
Learn the performance of film.By contrast, it is traditional by monitoring with coating materials physical thickness about the control method measured, such as quartz crystal oscillator
Method, time control act and work are walked around several monitoring methods etc., are still and are prepared the most frequently used process of high-performance optical film.Using
When these methods control coating materials physical thickness, there is systematic error and delay error in control signal.Literature search is found, in the past true
Empty coating process only have modified systematic error when controlling coating materials physical thickness, and rarely have and delay error is corrected.Delay
The amendment of error is vital to high-performance optical film preparation.In a word, to prepare high-performance optical film, in the urgent need to
Solve the above problems, rapidly and accurately obtain coating materials characteristic parameter, the systematic error of comprehensive correction film material reason thickness control and
Delay error.
The content of the invention
The technical problem to be solved in the present invention is：The deficiencies in the prior art are overcome to be used to prepare high-performance optical there is provided one kind
The method for learning film, coating materials characteristic parameter can be obtained exactly, be accurately determined coating materials physical thickness control error correction factor,
Optimization optical thin film design, improves coating materials physical thickness control accuracy comprehensively.
The present invention solve the technical scheme that uses of above-mentioned technical problem for：A kind of side for being used to prepare high-performance optical film
The step of method, this method, is as follows：
Step (1), need according to optical thin film performance, design initial membrane system, and prepare using physical gas phase deposition technology
Optical thin film；
Step (2), using spectrophotometer or ellipsometer optical thin film performance is characterized；
Step (3), optical thin-film structure model is set up, realize coating materials characteristic parameter and optical thin film Properties Correlation；
Step (4), to optical thin film actual measurement performance data carry out inverting, by multi-parameter fitting determine coating materials feature join
Number, while obtaining the systematic error and delay error correction factor of various coating materials physical thickness controls；
When physical gas phase deposition technology prepares optical thin film, the actual physics thickness of random layer coating materials in optical thin film membrane system
With expecting to meet following relation between physical thickness：
d1=Δ0d0+Δ1 (1)
In formula：d1And d0It is respectively coating materials actual physics thickness and expects physical thickness；Δ0And Δ1It is coating materials physics respectively
The Systematic Error Correction factor and delay error correction factor of thickness.
Step (5), the coating materials characteristic parameter according to acquisition, according to optical thin film performance requirement, re-optimization optical thin film
Film Design, controls error correction with reference to coating materials physical thickness, high-performance optical film is prepared using physical gas phase deposition technology.
Optical thin film in the step (1) can be anti-reflection film, high-reflecting film, spectro-film, filter coating and polarizing coating.
Initial membrane system in the step (1) can be monofilm or multilayer film；Described physical gas phase deposition technology
The coating materials for preparing optical thin film selection can be one or more kinds of.
Physical gas phase deposition technology in the step (1) sinks including hot boat evaporation, electron beam evaporation, plasmaassisted
Product, ion beam assisted depositing, ion beam sputter depositing, magnetron sputtering deposition and ald.
Optical thin film performance refers to the mould and width of transmitance, reflectivity and/or reeflectance ratio in the step (2)
Angle, described use spectrophotometer or ellipsometer is characterized to optical thin film performance, refers respectively to spectrophotometer
Measurement to film transmission rate and/or reflectivity, ellipsometer is characterized to the mould and argument of film reflector coefficient ratio.
Coating materials characteristic parameter includes physical thickness, refractive index and extinction coefficient in the step (3).
The method that physical gas phase deposition technology prepares control coating materials physical thickness during optical thin film in the step (4)
There are quartz crystal oscillator method, time monitoring method and revolution control methods.
The present invention has the following advantages that compared with prior art：
(1) present invention, can be efficiently by measured data inverting according to the optical thin film performance characterization prepared to initial designs
Ground determines the characteristic parameter of various coating materials.
(2) present invention has taken into full account that physical gas phase deposition technology prepares coating materials physical thickness control during optical thin film
Systematic error and delay error, coating materials physical thickness control can actually be significantly increased by meeting the physics of optical thin film preparation technology
Precision processed.Conventional method is concerned only with systematic features, and the delay error of thin film physicses thickness is not considered.Side proposed by the present invention
Method realizes that systematic error control accuracy is higher than 99.9%, and delay error control reaches 0.1nm precision, is particularly suitable for use in various optics
Film preparation.
Brief description of the drawings
Fig. 1 is used for the schematic flow sheet for the method for preparing high-performance optical film for the present invention；
Broadband anti-reflection film transmittance graphs of the Fig. 2 for actual measurement deposition on a quartz substrate, wherein, dotted line and solid data point
Actual measurement Optical transmission spectrum before and after the delay error of coating materials physical thickness control Dai Biao not considered；
Fig. 3 is the transmittance graph of two kinds of non-optical glass substrates, coating single side and double-sided coating, wherein, (a) N-SF1 glass
Glass；(b) N-SSK8 glass.
Embodiment
Below in conjunction with the accompanying drawings and specific embodiment further illustrates the present invention.
Fig. 1 is used for the schematic flow sheet for the method for preparing high-performance optical film for the present invention.Specific implementation step is as follows：
First, needed according to optical thin film performance, design initial membrane system, and optical thin film is prepared using physical gas phase deposition technology；Again
Optical thin film performance is characterized using spectrophotometer or ellipsometer.Wherein spectrophotometer is to optical thin film transmission rate
And/or reflectivity is measured, ellipsometer is tested the mould and argument of the reeflectance ratio of optical thin film；Then, set up
Optical thin-film structure model, realizes coating materials characteristic parameter and optical thin film Properties Correlation, and coating materials characteristic parameter includes physics here
Thickness, refractive index and extinction coefficient；Then inverting is carried out to optical thin film actual measurement performance data, film is determined by multi-parameter fitting
Characteristic parameter is expected, while obtaining the system mistake that physical gas phase deposition technology prepares coating materials physical thickness control during optical thin film
Difference and delay error correction factor；The final coating materials characteristic parameter according to acquisition, according to optical thin film performance requirement, re-optimization
System design of optical film, error correction is controlled with reference to coating materials physical thickness, and high-performance is prepared using physical gas phase deposition technology
Optical thin film.
High-performance optical film refers to that the spectrum property of optical thin film meets film practical application needs as far as possible, specifically
Film measured spectra data when prepared by optical thin film are embodied in as far as possible with Theoretical Design result to be consistent.Due to vacuum coating process
There is systematic error and delay error in plastics thickness control, cause the optical thin film performance and Theoretical Design of preparation to there is deviation,
How precise calibration plastics thickness control error is the focus for preparing high-performance optical film.
Below by embodiment, the present invention will be further described：
Using quartz glass as substrate, using method proposed by the present invention, it is prepared for using physical gas phase deposition technology
480nm-720nm one side broadband anti-reflection film.After prepared by film sample, one side anti-reflection film is in 450nm-800nm wavelength bands
Transmissivity uses the type spectrophotometer measurements of Lambda 1050 that PE companies of the U.S. produce, and measured spectra data are as shown in Figure 2.
Wherein, when optical thin film only considers coating materials physical thickness systematic error and do not have corrective delay error in preparing, the broadband of preparation increases
The measured spectra data of permeable membrane are as shown in phantom in Figure 2, it is clear that optical thin film prepared by the program is through rate curve in 500nm-
550nm wave band existing defects, one side broadband anti-reflection film is about 95.8% in the mean transmissivity of 480nm-720nm wave bands；Work as light
When learning the systematic error that the control of coating materials physical thickness is taken into full account in film preparation and delay error, the broadband anti-reflection film of preparation
As illustrated in solid line in figure 2, actual measurement one side broadband anti-reflection film is high in the mean transmissivity of 480nm-720nm wave bands for measured spectra data
In 96.4%.Experimental result is fully confirmed, using method proposed by the present invention, and the physics prepared according to optical thin film is actual, entirely
The systematic error and delay error of face calbrating film material reason thickness control, the broadband anti-reflection film spectrum property thus prepared more preferably,
0.6% is improved in the mean transmissivity of 480nm-720nm wave bands, is coincide very much with the calculated results.
Quartz glass is the most frequently used low-refraction substrate, with reference to conventional high index of refraction N-SF1 glass and medium refractive
Preparing optical thin film performance in rate N-SSK8 substrate of glass, the present invention will be further described.Fig. 3 (a) is shown, high index of refraction
The non-plated film of N-SF1 substrate of glass, and the one side and two-sided width for using method proposed by the present invention to prepare 600nm-900nm wave bands
With the actual measurement transmittance curve after anti-reflection film.Average transmission of the broad-band transparence-increased N-SF1 glass of one side in 600nm-900nm wave bands
Rate is 93.1%, and two-sided broad-band transparence-increased N-SF1 glass is up to 99.6% in the mean transmissivity of the wave band；Shown in Fig. 3 (b)
For, the non-plated film of medium refractive index N-SSK8 substrate of glass, and 600nm-900nm wave bands are prepared using method proposed by the present invention
One side and two-sided broadband anti-reflection film after actual measurement transmittance curve.The broad-band transparence-increased N-SSK8 glass of one side is in 600nm-
The mean transmissivity of 900nm wave bands is 94.2%, and two-sided broad-band transparence-increased N-SSK8 glass is excellent in the mean transmissivity of this wave band
In 99.7%.Above-described embodiment absolutely proves the inventive method to preparing the feasible of high-performance anti-reflection film in various substrate of glass
Property, the general knowledge prepared based on optical thin film, method proposed by the present invention is to conventional high-reflecting film, spectro-film, filter coating and polarization
The preparation of film equally has universality.
In a word, the present invention proposes a kind of method for preparing high-performance optical film, is joined by obtaining coating materials feature exactly
Number and coating materials physical thickness control error correction factor, optimize optical thin film design comprehensively, improve coating materials physical thickness control essence
Degree, realizes various high-performance optical film preparations.Non-elaborated part of the present invention belongs to techniques well known.
Claims (5)
1. a kind of method for preparing optical thin film, it is characterised in that as follows the step of this method：
Step (1), need according to optical thin film performance, design initial membrane system, and optics is prepared using physical gas phase deposition technology
Film；
Step (2), using spectrophotometer or ellipsometer optical thin film performance is characterized；
Step (3), optical thin-film structure model is set up, realize coating materials characteristic parameter and optical thin film Properties Correlation；
Step (4), to optical thin film actual measurement performance data carry out inverting, coating materials characteristic parameter is determined by multi-parameter fitting, together
When obtain the systematic error and delay error correction factor of the control of various coating materials physical thickness；
When physical gas phase deposition technology prepares optical thin film, the actual physics thickness of random layer coating materials and phase in optical thin film membrane system
Following relation is met between prestige physical thickness：
d1=△0d0+△1 (1)
In formula：d1And d0It is respectively coating materials actual physics thickness and expects physical thickness；△0And △1It is coating materials physical thickness respectively
The Systematic Error Correction factor and delay error correction factor；
Step (5), the coating materials characteristic parameter according to acquisition, according to optical thin film performance requirement, re-optimization optical thin film membrane system
Design, controls error correction with reference to coating materials physical thickness, high-performance optical film is prepared using physical gas phase deposition technology.
2. a kind of method for preparing optical thin film according to claim 1, it is characterised in that：In the step (1)
Initial membrane system be monofilm or multilayer film；The coating materials that described physical gas phase deposition technology prepares optical thin film selection is one
Plant or a variety of.
3. a kind of method for preparing optical thin film according to claim 1, it is characterised in that：In the step (2)
Optical thin film performance refers to the mould and argument of transmitance, reflectivity and/or reeflectance ratio, described use spectrophotometer
Or ellipsometer is characterized to optical thin film performance, spectrophotometer is referred respectively to film transmission rate and/or reflectivity
Measurement, ellipsometer characterizes to the mould and argument of film reflector coefficient ratio.
4. a kind of method for preparing optical thin film according to claim 1, it is characterised in that：In the step (3)
Coating materials characteristic parameter includes physical thickness, refractive index and extinction coefficient.
5. a kind of method for preparing optical thin film according to claim 1, it is characterised in that：In the step (4)
Physical gas phase deposition technology controls the method for coating materials physical thickness to have quartz crystal oscillator method, time monitoring during preparing optical thin film
Method and revolution control methods.
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| CN106199952B (en) * | 2016-07-05 | 2019-01-08 | 中国建筑材料科学研究总院 | A kind of Film Design and preparation method for reducing viewing angle variation and generating color difference |
| CN106154544B (en) * | 2016-08-31 | 2019-01-08 | 中国建筑材料科学研究总院 | Membrane system multi-angle spectral response analysis method and its application |
| CN107893216B (en) * | 2017-09-30 | 2020-04-28 | 同济大学 | Method for correcting deposition error of broadband antireflection film prepared by quartz monitoring method |
| CN114815130B (en) * | 2022-03-11 | 2023-12-01 | 中国科学院上海光学精密机械研究所 | Surface shape control method of optical film element based on ion beam |
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| US7247345B2 (en) * | 2002-03-25 | 2007-07-24 | Ulvac, Inc. | Optical film thickness controlling method and apparatus, dielectric multilayer film and manufacturing apparatus thereof |
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