CN108193167A - The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes - Google Patents
The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes Download PDFInfo
- Publication number
- CN108193167A CN108193167A CN201711302671.3A CN201711302671A CN108193167A CN 108193167 A CN108193167 A CN 108193167A CN 201711302671 A CN201711302671 A CN 201711302671A CN 108193167 A CN108193167 A CN 108193167A
- Authority
- CN
- China
- Prior art keywords
- shutter
- plated film
- radius
- circular arc
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Polarising Elements (AREA)
- Diaphragms For Cameras (AREA)
Abstract
The planet coating clamp shutter and production method arbitrarily changed the present invention relates to a kind of plated film thicknesses of layers, shutter include the opening on disc shutter and shutter；One side of the opening shape is one section of circular arc on round edge, another side is the radius originated by the center of circle, and Article 3 side is the gradient ramp from the center of circle to circular arc；The diameter of optical element of the diameter of the disc shutter with needing plated film matches；The coating film thickness of optical element of the gradient ramp from from the center of circle to circular arc with needing plated film matches.The present invention has the advantages that film thickness precision is high, it is easy to correct, has higher application value using the preparation of planetary fixture filming equipment any thickness variation film layer.
Description
Technical field
The invention belongs to optical thin film manufacturing technology fields, are related to the planet plated film that a kind of plated film thicknesses of layers arbitrarily changes
Fixture shutter and production method.
Background technology
To improve the display brightness of product, the different location requirement of holographical wave guide balzed grating, surface prepares the film of different-thickness
Layer, for product actual requirement, by designing shutter and its correct installation method, realizes piece surface Varying-thickness film layer
Preparation.
Invention content
Technical problems to be solved
In order to avoid the shortcomings of the prior art, the present invention proposes the planet plating that a kind of plated film thicknesses of layers arbitrarily changes
Film fixture shutter and production method realize the difference of optical element surface different location thicknesses of layers, glitter for holographical wave guide
Grating provides Varying-thickness film layer and prepares.
Technical solution
The planet coating clamp shutter that a kind of plated film thicknesses of layers arbitrarily changes, it is characterised in that：It is hidden including disc
Opening on baffle and shutter；One side of the opening shape is one section of circular arc on round edge, another side is by justifying
The radius of heart starting, Article 3 side are the gradient ramp from the center of circle to circular arc；The diameter of the disc shutter is plated with needing
The diameter of the optical element of film matches；The plated film of optical element of the gradient ramp from from the center of circle to circular arc with needing plated film
Thickness matches.
The coating film thickness of optical element of the gradient ramp from from the center of circle to circular arc with needing plated film matches and is：With song
Line initial position is zero angle, and the most thick corresponding angle of film layer is θ I, is maximum radius part；The most thin corresponding angle of film layer
It spends for θ II, radius X.
A kind of method of planet coating clamp shutter for making the plated film thicknesses of layers and arbitrarily changing, it is characterised in that
Step is as follows：
Step 1：The thicknesses of layers for being required the optical element of plated film is tested using ellipsometer test, is obtained along half
The thicknesses of layers of diameter each point；
Step 2：Using the most thin corresponding angle of film layer as θ II, the position that radius is X is the starting point of curve, is risen with edge
Initial point rotational angle theta I, the most thick part of thicknesses of layers are the terminating point that radius maximum is curve, are segmented true according to the thickness of measurement
Determine the edge of curve；
Step 3：Edge according to curve is cut into the gradient ramp from the center of circle to circular arc, is the radius that X is originated by radius,
By the circular arc on the disc side of the radius to gradient ramp.
Advantageous effect
The planet coating clamp shutter and production method that a kind of plated film thicknesses of layers proposed by the present invention arbitrarily changes hide
Baffle includes the opening on disc shutter and shutter；One side of the opening shape is one section of circle on round edge
Arc, another side are the radius originated by the center of circle, and Article 3 side is the gradient ramp from the center of circle to circular arc；The disc is blocked
The diameter of optical element of the diameter of plate with needing plated film matches；The gradient ramp from from the center of circle to circular arc is with needing plated film
The coating film thickness of optical element match.During use：The shutter is fixed on filming equipment planet by lattice framing and supporting plate and presss from both sides
Tool disk in the following, revolve round the sun with coating clamp frame, on planetary fixture disk by plated film part, while revolution with coating clamp from
Turn, according to shutter trajectory shape and the difference of the relative position of plated film part, realize the thicknesses of layers of part different location
Variation.The present invention applies the preparation of planetary fixture filming equipment any thickness variation film layer, has film thickness precision height, corrects easily
The advantages of, there is higher application value.
Description of the drawings
Fig. 1：The thickness requirement figure of the radially different position of film layer of embodiment 1
Fig. 2：The shutter that thickness requirement according to the radially different position of the film layer of embodiment 1 designs
Fig. 3：1 sample of embodiment is tested using ellipsometer test, test point distribution map
Fig. 4：1 film thickness of embodiment and location point relational graph
Fig. 5：The thickness requirement figure of the radially different position of film layer of embodiment 2
Fig. 6：The shutter that thickness requirement according to the radially different position of the film layer of embodiment 2 designs
Specific embodiment
In conjunction with embodiment, attached drawing, the invention will be further described：
Embodiment shutter includes the opening on disc shutter and shutter；One side of the opening shape is
One section of circular arc on round edge, another side are the radius originated by the center of circle, and Article 3 side is the gradient ramp from the center of circle to circular arc；
The diameter of optical element of the diameter of the disc shutter with needing plated film matches；The gradual change from from the center of circle to circular arc
The coating film thickness of optical element of the curve with needing plated film matches.
The coating film thickness of optical element of the gradient ramp from from the center of circle to circular arc with needing plated film matches and is：With song
Line initial position is zero angle, and the most thick corresponding angle of film layer is θ I, is maximum radius part；The most thin corresponding angle of film layer
It spends for θ II, radius X.
Embodiment 1：The thickness requirement figure of the radially different position of film layer according to figure 1 makes shutter
Step 1：The thicknesses of layers for being required the optical element of plated film is tested using ellipsometer test, is obtained along half
The thicknesses of layers of diameter each point, such as Fig. 2；
Step 2：Using the most thin corresponding angle of film layer as θ II, the position that radius is X is the starting point of curve, is risen with edge
Initial point rotational angle theta I, the most thick part of thicknesses of layers are the terminating point that radius maximum is curve, are segmented true according to the thickness of measurement
The edge of curve is determined, as Fig. 2 and 1 each position point data of table are fitted；
Step 3：Edge according to curve is cut into the gradient ramp from the center of circle to circular arc, is the radius that X is originated by radius,
By the circular arc on the disc side of the radius to gradient ramp.
1 each position point data of table is fitted
Embodiment 2：The thickness requirement figure of the radially different position of film layer makes shutter according to figure 5
Step 1：The thicknesses of layers for being required the optical element of plated film is tested using ellipsometer test, is obtained along half
The thicknesses of layers of diameter each point；
Step 2：Using the most thin corresponding angle of film layer as θ II, the position that radius is X is the starting point of curve, is risen with edge
Initial point rotational angle theta I, the most thick part of thicknesses of layers are the terminating point that radius maximum is curve, are segmented true according to the thickness of measurement
Determine the edge of curve, such as Fig. 6；
Step 3：Edge according to curve is cut into the gradient ramp from the center of circle to circular arc, is the radius that X is originated by radius,
By the circular arc on the disc side of the radius to gradient ramp.
The principle of the shutter is：During unobstructed plate, optical element surface thickness of the clamping on coating clamp is identical, plating
Film fixture often rotates 1 week as 360, both often rotate that 1 ° of institute's plated film layer thickness is 1 week 1/360, for piece surface different parts
The difference of thicknesses of layers, calculates the ratio of maxima and minima, and design shutter carries out different parts the screening of respective angles
Gear, so as to fulfill the variation of the thicknesses of layers of part different location.
During use：The shutter is fixed on filming equipment planetary fixture disk in the following, with coating clamp by lattice framing and supporting plate
Frame revolves round the sun together, on planetary fixture disk by plated film part, rotation while revolution with coating clamp, according to shutter track shape
The difference of the relative position of shape and plated film part realizes the variation of the thicknesses of layers of part different location.
Claims (3)
1. a kind of planet coating clamp shutter that plated film thicknesses of layers arbitrarily changes, it is characterised in that：It is blocked including disc
Opening on plate and shutter；One side of the opening shape is one section of circular arc on round edge, another side is by the center of circle
The radius of starting, Article 3 side are the gradient ramp from the center of circle to circular arc；The diameter of the disc shutter is with needing plated film
The diameter of optical element match；The plating film thickness of optical element of the gradient ramp from from the center of circle to circular arc with needing plated film
Degree matches.
2. the planet coating clamp shutter that plated film thicknesses of layers arbitrarily changes according to claim 1, it is characterised in that：Institute
The coating film thickness for stating optical element of the gradient ramp from the center of circle to circular arc with needing plated film matches and is：With curve initial position
For zero angle, the most thick corresponding angle of film layer is θ I, is maximum radius part；The most thin corresponding angle of film layer is θ II, partly
Diameter is X.
3. a kind of method of planet coating clamp shutter for making plated film thicknesses of layers described in claim 1 and arbitrarily changing,
It is characterized in that step is as follows：
Step 1：The thicknesses of layers for being required the optical element of plated film is tested using ellipsometer test, is obtained each along radius
The thicknesses of layers of point；
Step 2：Using the most thin corresponding angle of film layer as θ II, the position that radius is X is the starting point of curve, with along starting point
Rotational angle theta I, the most thick part of thicknesses of layers are the terminating point that radius maximum is curve, are segmented and determine song according to the thickness of measurement
The edge of line；
Step 3：Edge according to curve is cut into the gradient ramp from the center of circle to circular arc, by the radius that radius is X startings, by this
Radius to the disc side of gradient ramp circular arc.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711302671.3A CN108193167B (en) | 2017-12-11 | 2017-12-11 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711302671.3A CN108193167B (en) | 2017-12-11 | 2017-12-11 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108193167A true CN108193167A (en) | 2018-06-22 |
| CN108193167B CN108193167B (en) | 2019-10-25 |
Family
ID=62573783
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711302671.3A Active CN108193167B (en) | 2017-12-11 | 2017-12-11 | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108193167B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109161861A (en) * | 2018-10-23 | 2019-01-08 | 宁波工程学院 | A kind of system for being coated with non-homogeneous plural layers |
| CN112063972A (en) * | 2020-09-08 | 2020-12-11 | 宁波江丰电子材料股份有限公司 | Splicing coating method of semiconductor component |
| CN114774849A (en) * | 2022-03-17 | 2022-07-22 | 西安超纳精密光学有限公司 | Small-caliber large-curvature local ion sputtering coating system and method capable of accurately controlling curvature |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1459513A (en) * | 2002-05-17 | 2003-12-03 | 精碟科技股份有限公司 | Covering plate in film plating apparatus |
| CN1718844A (en) * | 2005-07-12 | 2006-01-11 | 中国科学院上海光学精密机械研究所 | The modification method of evenness of film thickness of electron beam evaporation film coating |
| CN1891850A (en) * | 2005-07-04 | 2007-01-10 | 精工爱普生株式会社 | Vacuum evaporation apparatus and method of producing electro-optical device |
| CN101122640A (en) * | 2007-09-21 | 2008-02-13 | 中国科学院上海光学精密机械研究所 | Variable reflectivity mirror filming device and its filming method |
| CN105112853A (en) * | 2015-09-08 | 2015-12-02 | 中国科学院光电技术研究所 | Vacuum coating machine system equipped with perforated baffle |
-
2017
- 2017-12-11 CN CN201711302671.3A patent/CN108193167B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1459513A (en) * | 2002-05-17 | 2003-12-03 | 精碟科技股份有限公司 | Covering plate in film plating apparatus |
| CN1891850A (en) * | 2005-07-04 | 2007-01-10 | 精工爱普生株式会社 | Vacuum evaporation apparatus and method of producing electro-optical device |
| CN1718844A (en) * | 2005-07-12 | 2006-01-11 | 中国科学院上海光学精密机械研究所 | The modification method of evenness of film thickness of electron beam evaporation film coating |
| CN101122640A (en) * | 2007-09-21 | 2008-02-13 | 中国科学院上海光学精密机械研究所 | Variable reflectivity mirror filming device and its filming method |
| CN105112853A (en) * | 2015-09-08 | 2015-12-02 | 中国科学院光电技术研究所 | Vacuum coating machine system equipped with perforated baffle |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109161861A (en) * | 2018-10-23 | 2019-01-08 | 宁波工程学院 | A kind of system for being coated with non-homogeneous plural layers |
| CN112063972A (en) * | 2020-09-08 | 2020-12-11 | 宁波江丰电子材料股份有限公司 | Splicing coating method of semiconductor component |
| CN112063972B (en) * | 2020-09-08 | 2022-07-15 | 宁波江丰电子材料股份有限公司 | Splicing coating method of semiconductor component |
| CN114774849A (en) * | 2022-03-17 | 2022-07-22 | 西安超纳精密光学有限公司 | Small-caliber large-curvature local ion sputtering coating system and method capable of accurately controlling curvature |
| CN114774849B (en) * | 2022-03-17 | 2023-12-08 | 西安超纳精密光学有限公司 | Small-caliber large-curvature local ion sputtering coating system and method capable of accurately controlling curvature |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108193167B (en) | 2019-10-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108193167B (en) | The planet coating clamp shutter and production method that plated film thicknesses of layers arbitrarily changes | |
| CN102732844B (en) | Method for designing coating uniformity correction mask for spherical optical elements on planetary rotating jigs of vacuum coating machines | |
| CN109652780B (en) | Control method for improving coating uniformity of special-shaped part | |
| CN105607173B (en) | Round radial gradual neutral-density filter and preparation method thereof and device | |
| TWI720991B (en) | Apparatus, device and process for coating of articles | |
| CN104233212B (en) | Mounting method capable of realizing direct optical control on film thickness on planetary rotation coating machine | |
| CN107932308B (en) | A kind of grinding and polishing processing method with stepless shift function | |
| CN106987820B (en) | A kind of film coating jig and filming equipment | |
| CN1718844A (en) | The modification method of evenness of film thickness of electron beam evaporation film coating | |
| CN205501418U (en) | Can dismantle rotation type revolving rack | |
| US10363537B2 (en) | Deposition tool for combinatorial thin film material libraries | |
| WO2023124251A1 (en) | Planetary disc structure and evaporative deposition apparatus | |
| US20140050814A1 (en) | Embossing assembly and methods of preparation | |
| CN104264110A (en) | Mask device for preparing two-dimensional composite material chip and preparation method of chip | |
| CN105002470B (en) | A kind of film plating process and mask clamp | |
| Ferdaus et al. | Design and fabrication of a simple cost effective spin coater for deposition of thin film | |
| CN111394700A (en) | Evaporation coating manufacturing device and method | |
| EP2190591A1 (en) | Method and apparatus for low cost high rate deposition tooling | |
| Yang et al. | Uniform films deposited on convex surfaces by magnetron sputtering with a small target | |
| CN205352794U (en) | Device is changed to mask | |
| Seo et al. | Completely filling anodic aluminum oxide with maghemite nanoparticles by dip coating and their magnetic properties | |
| CN212051636U (en) | Coating device capable of realizing high-precision control of surface shape of optical element | |
| US9279704B2 (en) | Optical encoder light shielding plate, producing method therof, and optical encoder provided therewith | |
| CN208562510U (en) | A kind of vacuum coating fixture | |
| CN109188683A (en) | The module system uniformity modification method and device of large aperture light combination mirror |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200602 Address after: 471000 No. 696, Wangcheng Avenue, Luolong District, Luoyang City, Henan Province Patentee after: AVIC Luoyang Photoelectric Technology Co., Ltd Address before: 471099 Luoyang City, Henan Province West triumph Road, No. 25 Patentee before: LUOYANG INSTITUTE OF ELECTRO-OPTICAL EQUIPMENT OF AVIC |
|
| TR01 | Transfer of patent right |