CN107787123B - 一种印制线路板图形转移加工的工艺方法 - Google Patents
一种印制线路板图形转移加工的工艺方法 Download PDFInfo
- Publication number
- CN107787123B CN107787123B CN201711003224.8A CN201711003224A CN107787123B CN 107787123 B CN107787123 B CN 107787123B CN 201711003224 A CN201711003224 A CN 201711003224A CN 107787123 B CN107787123 B CN 107787123B
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- Prior art keywords
- organic coating
- circuit board
- coating film
- laser
- organic
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- 239000011248 coating agent Substances 0.000 claims abstract description 142
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 24
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 11
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- 229910052802 copper Inorganic materials 0.000 claims abstract description 11
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims abstract description 8
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- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 8
- 239000000839 emulsion Substances 0.000 claims description 7
- 239000012766 organic filler Substances 0.000 claims description 6
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
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- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 claims description 3
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- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
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- 229920000877 Melamine resin Polymers 0.000 description 4
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- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 4
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- 229940114081 cinnamate Drugs 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 4
- 239000000113 methacrylic resin Substances 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 239000005011 phenolic resin Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
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- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 4
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- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
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- 239000004698 Polyethylene Substances 0.000 description 2
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- 238000010521 absorption reaction Methods 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
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- JQXYBDVZAUEPDL-UHFFFAOYSA-N 2-methylidene-5-phenylpent-4-enoic acid Chemical compound OC(=O)C(=C)CC=CC1=CC=CC=C1 JQXYBDVZAUEPDL-UHFFFAOYSA-N 0.000 description 1
- VALXVSHDOMUUIC-UHFFFAOYSA-N 2-methylprop-2-enoic acid;phosphoric acid Chemical compound OP(O)(O)=O.CC(=C)C(O)=O VALXVSHDOMUUIC-UHFFFAOYSA-N 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
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- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
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- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- CLANNGNFKWVXHA-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid;styrene Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C.C=CC1=CC=CC=C1 CLANNGNFKWVXHA-UHFFFAOYSA-N 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
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- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
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- 239000011850 water-based material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711003224.8A CN107787123B (zh) | 2017-10-24 | 2017-10-24 | 一种印制线路板图形转移加工的工艺方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711003224.8A CN107787123B (zh) | 2017-10-24 | 2017-10-24 | 一种印制线路板图形转移加工的工艺方法 |
Publications (2)
Publication Number | Publication Date |
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CN107787123A CN107787123A (zh) | 2018-03-09 |
CN107787123B true CN107787123B (zh) | 2020-07-24 |
Family
ID=61435277
Family Applications (1)
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---|---|---|---|
CN201711003224.8A Active CN107787123B (zh) | 2017-10-24 | 2017-10-24 | 一种印制线路板图形转移加工的工艺方法 |
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CN (1) | CN107787123B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109152227A (zh) * | 2018-06-30 | 2019-01-04 | 谢润鹏 | 一种激光成像制作线路板方法 |
CN109003904A (zh) * | 2018-07-13 | 2018-12-14 | 无锡天杨电子有限公司 | 一种轨道交通芯片用陶瓷覆铜板表面图形的制备方法 |
CN112940328A (zh) * | 2021-04-20 | 2021-06-11 | 番禺南沙殷田化工有限公司 | 一种激光烧蚀黑色膜及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101017325A (zh) * | 2007-02-06 | 2007-08-15 | 上海中大科技发展有限公司 | 液态感光抗蚀油墨 |
CN101508860A (zh) * | 2009-03-06 | 2009-08-19 | 华南农业大学 | 铜材线路板蚀刻油墨及其制备方法与应用 |
CN106658976A (zh) * | 2017-03-06 | 2017-05-10 | 四会富士电子科技有限公司 | 一种线路板的图形转移制作方法 |
-
2017
- 2017-10-24 CN CN201711003224.8A patent/CN107787123B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101017325A (zh) * | 2007-02-06 | 2007-08-15 | 上海中大科技发展有限公司 | 液态感光抗蚀油墨 |
CN101508860A (zh) * | 2009-03-06 | 2009-08-19 | 华南农业大学 | 铜材线路板蚀刻油墨及其制备方法与应用 |
CN106658976A (zh) * | 2017-03-06 | 2017-05-10 | 四会富士电子科技有限公司 | 一种线路板的图形转移制作方法 |
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Effective date of registration: 20220309 Address after: 417009 north of Qunle street and west of Nanbei 3rd road, Loudi economic and Technological Development Zone, Hunan Province Patentee after: Hunan Wujiang high tech materials Co.,Ltd. Address before: 523000 room 306, floor 3, building 7, taiku cultural and Creative Industry Park, No. 165, Taixin Road, Wanjiang street, Dongguan City, Guangdong Province Patentee before: DONGGUAN HONGMO ELECTRONIC MATERIAL CO.,LTD. |
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Address after: 417000 north side of Qunle street and west side of Nanbei Third Road, economic and Technological Development Zone, Loudi City, Hunan Province Patentee after: Hunan Chuyuan New Materials Co.,Ltd. Address before: 417009 north of Qunle street and west of Nanbei 3rd road, Loudi economic and Technological Development Zone, Hunan Province Patentee before: Hunan Wujiang high tech materials Co.,Ltd. |
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