CN107734878B - 一种pcb盲孔的化学镀填充方法及其化学镀溶液 - Google Patents
一种pcb盲孔的化学镀填充方法及其化学镀溶液 Download PDFInfo
- Publication number
- CN107734878B CN107734878B CN201710966417.7A CN201710966417A CN107734878B CN 107734878 B CN107734878 B CN 107734878B CN 201710966417 A CN201710966417 A CN 201710966417A CN 107734878 B CN107734878 B CN 107734878B
- Authority
- CN
- China
- Prior art keywords
- chemical plating
- silica gel
- blind holes
- blind hole
- fill method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000007747 plating Methods 0.000 title claims abstract description 39
- 239000000126 substance Substances 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000000741 silica gel Substances 0.000 claims abstract description 26
- 229910002027 silica gel Inorganic materials 0.000 claims abstract description 26
- 239000010410 layer Substances 0.000 claims abstract description 19
- 239000002245 particle Substances 0.000 claims abstract description 13
- 239000003054 catalyst Substances 0.000 claims abstract description 11
- 238000000608 laser ablation Methods 0.000 claims abstract description 10
- 239000011241 protective layer Substances 0.000 claims abstract description 6
- 239000000945 filler Substances 0.000 claims abstract description 3
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 3
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 239000003381 stabilizer Substances 0.000 claims description 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 3
- 229910000366 copper(II) sulfate Inorganic materials 0.000 claims description 3
- 239000012153 distilled water Substances 0.000 claims description 3
- 239000002105 nanoparticle Substances 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 230000003746 surface roughness Effects 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 238000002679 ablation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- -1 nanogold Chemical compound 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004643 material aging Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/422—Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1893—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710966417.7A CN107734878B (zh) | 2017-10-17 | 2017-10-17 | 一种pcb盲孔的化学镀填充方法及其化学镀溶液 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710966417.7A CN107734878B (zh) | 2017-10-17 | 2017-10-17 | 一种pcb盲孔的化学镀填充方法及其化学镀溶液 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107734878A CN107734878A (zh) | 2018-02-23 |
CN107734878B true CN107734878B (zh) | 2018-09-21 |
Family
ID=61211305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710966417.7A Active CN107734878B (zh) | 2017-10-17 | 2017-10-17 | 一种pcb盲孔的化学镀填充方法及其化学镀溶液 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107734878B (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5460921A (en) * | 1993-09-08 | 1995-10-24 | International Business Machines Corporation | High density pattern template: materials and processes for the application of conductive pastes |
TW201121374A (en) * | 2009-12-10 | 2011-06-16 | Unimicron Technology Corp | Embedded wiring board and method for fabricating the same |
CN102224770A (zh) * | 2008-12-02 | 2011-10-19 | 松下电工株式会社 | 电路基板的制造方法以及由该制造方法获得的电路基板 |
CN104838731A (zh) * | 2012-12-14 | 2015-08-12 | 上村工业株式会社 | 印刷电路板的制造方法及利用该制造方法制造出的印刷电路板 |
-
2017
- 2017-10-17 CN CN201710966417.7A patent/CN107734878B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5460921A (en) * | 1993-09-08 | 1995-10-24 | International Business Machines Corporation | High density pattern template: materials and processes for the application of conductive pastes |
CN102224770A (zh) * | 2008-12-02 | 2011-10-19 | 松下电工株式会社 | 电路基板的制造方法以及由该制造方法获得的电路基板 |
TW201121374A (en) * | 2009-12-10 | 2011-06-16 | Unimicron Technology Corp | Embedded wiring board and method for fabricating the same |
CN104838731A (zh) * | 2012-12-14 | 2015-08-12 | 上村工业株式会社 | 印刷电路板的制造方法及利用该制造方法制造出的印刷电路板 |
Also Published As
Publication number | Publication date |
---|---|
CN107734878A (zh) | 2018-02-23 |
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PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Electroless plating filling method for PCB blind hole and electroless plating solution thereof Effective date of registration: 20210827 Granted publication date: 20180921 Pledgee: Jiangsu Nantong Rural Commercial Bank Co.,Ltd. TongZhou sub branch Pledgor: NANTONG CIRCUIT ELECTRONIC Co.,Ltd. Registration number: Y2021980008496 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20220929 Granted publication date: 20180921 Pledgee: Jiangsu Nantong Rural Commercial Bank Co.,Ltd. TongZhou sub branch Pledgor: NANTONG CIRCUIT ELECTRONIC CO.,LTD. Registration number: Y2021980008496 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A Method of Electroless Plating Filling PCB Blind Hole and Its Electroless Plating Solution Effective date of registration: 20220930 Granted publication date: 20180921 Pledgee: Jiangsu Nantong Rural Commercial Bank Co.,Ltd. TongZhou sub branch Pledgor: NANTONG CIRCUIT ELECTRONIC CO.,LTD. Registration number: Y2022980017222 |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20230627 Granted publication date: 20180921 Pledgee: Jiangsu Nantong Rural Commercial Bank Co.,Ltd. TongZhou sub branch Pledgor: NANTONG CIRCUIT ELECTRONIC CO.,LTD. Registration number: Y2022980017222 |
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PC01 | Cancellation of the registration of the contract for pledge of patent right |