CN107723761A - A kind of device and method of the fine electro-deposition of laser-impact piezoelectric ceramics localization - Google Patents
A kind of device and method of the fine electro-deposition of laser-impact piezoelectric ceramics localization Download PDFInfo
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- CN107723761A CN107723761A CN201710736251.XA CN201710736251A CN107723761A CN 107723761 A CN107723761 A CN 107723761A CN 201710736251 A CN201710736251 A CN 201710736251A CN 107723761 A CN107723761 A CN 107723761A
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
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Abstract
The invention discloses a kind of device and method of the fine electro-deposition of laser-impact piezoelectric ceramics localization, it is related to laser manufacturing field, the device includes Work-piece processing system, laser irradiation system, working solution circulating system and control system；This method produces plasma bubbles by laser breakdown solution and impacts piezoelectric ceramics surface, and so as to cause piezoelectric ceramics to produce accumulation at deformation, the fine electro-deposition of localization is carried out using the piezo-electric effect of piezoelectric ceramics.Because the energy density at laser spot is high, laser breakdown solution produces plasma bubbles, piezoelectric ceramics produces elastic deformation by laser-produced plasma bubble impact to be caused to polarize, after piezoelectric ceramics is deformed, can be in surface aggregation negative electrical charge, deformation region can produce negative electrical charge aggregation and potential step-down, and the adsorbed reduction of the metal cation in solution is to realize the fine deposition of high locality.Present invention is mainly used for the manufacture of micro-nano part.
Description
Technical field
The present invention relates to localization micro processing field in special processing technology, refers in particular to a kind of laser-impact piezoelectric ceramics localization
The method and apparatus of fine electro-deposition, suitable for the processing and manufacture of minute metallic part.
Background technology
Fine electro-deposition techniques are the increases material manufacturing technologies based on negative electrode deposition principle, and process is with metal ion in the moon
The form that reduction reaction occurs for pole surface is carried out.In electrochemical fabrication process, the transfer of material is carried out with ion yardstick, gold
Belong to ion size it is even more small at 1/10th nanometers, therefore electrochemical fabrication technique cause it field of micro-manufacture, with
There is very big development potentiality as field of nanofabrication.Although electrical-chemistry method has advantage in principle, it another
One feature locality is poor, and the problem of bringing must be accounted for.
Piezoelectric ceramics is a kind of ceramic material that can change mechanical energy and electric energy mutually.When piezoelectric ceramics is by outer
When power effect produces deformation, deformation position will produce electric polarization, assemble certain negative electrical charge.This piezo-electric effect can be utilized
Reduction reaction occurs for the metal cation adsorbed in electric depositing solution, realizes increasing material manufacturing.
A lot of in the research of non-conductor matrix surface induction-chemical deposition metal using laser both at home and abroad, Chinese patent " swashs
Photoinduction liquid deposition makes the process of electrically conductive lines ", Patent No. CN1377220A is proposed：By asphalt mixtures modified by epoxy resin
The non-conductive matrix such as fat, polyimide, ceramics, P-type silicon, which are put into, fills soluble metallic salt：Mantoquita, nickel salt, gold salt etc. it is water-soluble
In the liquid bath of liquid, with CO2Laser, scanning is irradiated from its front, can be sunk in the nonconductive matrix plate surface such as epoxy resin
Product goes out the nucleus of crystal with catalytic activity, then substrate is put into alkaline electroless plating copper liquid and carries out chemical plating, obtains and uniformly causes
Close copper conductive pattern.Chinese patent " a kind of method of preparing titanium dioxide nanocrystal films by liquid-phase pulse laser induction ", specially
Profit number proposes for CN101712450A：Substrate base is immersed in TiCl4In solution, pulse laser induced synthesizing nanocrystalline is utilized
Titanium dioxide, 24~72 hours are stood afterwards, the titanium deoxid film of function admirable can be prepared at lower cost.
Laser induced chemical deposition has its certain superiority, but often operating process is complicated, and process is various.Piezoelectricity is made pottery
Porcelain using its special piezo-electric effect, coordinates laser-impact, can easily and effectively realize that localization is fine heavy as deposition substrate
Product.
The content of the invention
The purpose of the present invention is to propose to a kind of device of the fine electro-deposition of laser-impact piezoelectric ceramics localization, there is provided a set of complete
Whole processing platform, the deposition of complex figure is realized, can also deposit various metals such as copper, nickel etc..
It is another object of the present invention to propose a kind of method of the fine electro-deposition of laser-impact piezoelectric ceramics localization, by piezoelectricity
Ceramics are placed in electric depositing solution, and the plasma of HTHP, Cathode plasma explosion are produced using pulse laser breakdown solution
Producing shock wave makes piezoelectric ceramics surface produce elastic deformation, and piezoelectric ceramics will assemble certain negative electrical charge in deformation position, inhales
Metal cation in attached solution.Because the pulse power provides voltage so that solution is with producing potential at piezoelectric ceramics deformation
Reduction reaction will occur in this place for difference, metal cation.Laser used is pulse laser, " impact-deformation-deposition-extensive
Answer-impact again ", so move in circles, complex figure is deposited by the motion of three-dimensional platform, realize the mesh of fine localization deposition
's.
A kind of device of the fine electro-deposition of laser-impact piezoelectric ceramics localization, including Work-piece processing system, laser irradiation system
System, working solution circulating system and control system：
The Work-piece processing system includes the axle workbench of x-y-z tri-, direct current pulse power source, oscillograph, work nest, piezoelectricity pottery
Porcelain substrate and anode instrument；The oscillograph is connected with direct current pulse power source；The anode instrument and direct current pulse power source positive pole
It is connected, the direct current pulse power source negative pole ground connection, piezoelectric ceramic substrate and the anode instrument is placed in work nest, and anode
Instrument is placed in the top of piezoelectric ceramic substrate, and hole is offered on anode instrument；The work nest is placed in the axle workbench of x-y-z tri-
On；
The laser irradiation system includes pulse laser, speculum and condenser lens；What the pulse laser was sent
The hole through being opened up on anode instrument is irradiated to piezoelectricity after condenser lens focuses on after speculum reflection of the laser beam by 45 ° of settings
On ceramic substrate；
The working solution circulating system includes reservoir, micropump, filter and overflow valve；The micropump input termination
Reservoir, output end connect work nest by pipeline, and the filter is connected with overflow valve, and the input of filter passes through pipeline
Communicated with work nest；
The control system includes computer and motion control card；The computer control pulse laser, DC pulse
Power supply and motion control card, the axle workbench of motion control card control x-y-z tri-.
Further, the piezoelectric ceramic substrate polarised direction is vertical direction, and has high piezoelectric constant and curie point
Temperature, conductive electrode metal is removed after polarization.
Further, the anode instrument is the indissoluble inert metal plate for being drilled with through hole, and upper and lower surface does insulation processing,
Through-hole wall is conductive, through-hole diameter 1~5mm, coaxial with laser emission path.
A kind of method of the fine electro-deposition of laser-impact piezoelectric ceramics localization, is comprised the following steps that：
Step 1) programmed according to graphics processing, and be input in computer control software；
Step 2) piezoelectric ceramic substrate is fixed in work nest, anode instrument connects direct current pulse power source positive pole and is placed in
In work nest, direct current pulse power source negative pole ground connection；
Step 3) work nest is placed on the axle workbench of x-y-z tri-, the axle height of table of x-y-z tri- is adjusted, gathers laser
Jiao is above piezoelectric ceramic substrate；
Step 4) deposition liquid is added, piezoelectric ceramic substrate and anode instrument is totally immersed into deposition liquid；
Step 5) micropump progress circulating picture-changing liquid is opened, ensure the even concentration of solution in work nest；
Step 6) unbalanced pulse laser, while worked according to compiled code by the axles of motion control card control x-y-z tri-
Platform is moved to deposit required shape.
Further, the deposition liquid liquid level is higher than 2~5mm of piezoelectric ceramic substrate, and deposition liquid temperature degree is maintained at 40~50
℃。
Further, the pulse laser laser spot should focus on 0.2~1mm above piezoelectric ceramic substrate, pulse
The laser power density that laser is sent is slightly larger than deposition liquid breakdown threshold, frequency 10Hz~0.4MHz.
Further, the voltage that the direct current pulse power source provides is adjustable for 0~10V, and dutycycle is 0~80%, frequency
It is consistent with laser parameter.
Further, the micropump operating pressure is less than 2bar, and flow velocity is less than 0.5L/min, and solution flowing is for deposition
Liquid liquid surface fluctuation is minimum.
The present invention technical advantage and have the beneficial effect that：
1. plasma thermodynamic activity impact piezoelectric ceramics, utilizes the deformation of piezoelectric ceramics caused by pulse laser breakdown solution
Produce piezo-electric effect adsorbing metal ions and reduction reaction occurs, realize the fine deposition of localization of metal parts, efficiently solve micro-
The problem of thin deposition technique locality difference；
2. relative to other induced with laser metallic crystal chemical depositions, the complexity such as prior surface roughening, sensitization are eliminated
Technological process, it is simple to operate.The locality of deposition is relevant with laser parameter and focal position, and technological parameter controllability is strong.
3. deposition liquid used can continue to recycle, deposited using laser aiming metal superfine, whole process green
It is pollution-free, and cost is relatively low.
Brief description of the drawings
Fig. 1 is the system diagram of the fine electro-deposition of laser-impact piezoelectric ceramics localization；
Fig. 2 is the process principle figure of the fine electro-deposition of laser-impact piezoelectric ceramics localization.
Reference is as follows：
1. the pulse laser of 5. speculum of computer 2. direct current pulse power source, 3. oscillograph, 4. motion control card 6.
7. the reservoir of 12. filter of condenser lens 8. piezoelectric ceramic substrate, 9. anode instrument, 10. work nest, 11. micropump 13.
14. the plasma stock wave 19. of 17. plasma bubbles of overflow valve 15.x-y-z tri- axle workbench, 16. electric field lines 18.
Metal cation.
Embodiment
Below in conjunction with the accompanying drawings and specific embodiment the present invention is further illustrated, but protection scope of the present invention is simultaneously
Not limited to this.
With reference to accompanying drawing 1, computer 1 is connected with laser 6, direct current pulse power source 2, motion control card 4, and computer 1 is controllable
The laser parameter and the power parameter of direct current pulse power source 2 of pulse laser 6 processed, can also be transferred to motion control card by compiled code
4.Oscillograph 3 is connected with direct current pulse power source 2, real-time monitoring current parameter；Work nest 10 is placed in the axle workbench 15 of x-y-z tri-
On, piezoelectric ceramic substrate 8 and anode instrument 9 are all placed in work nest 10；Laser beam is launched from laser 6, is reflected through speculum 5
Change transmission direction, then be scanned across by condenser lens 7 through hole of anode instrument 9 and focus on the top of piezoelectric ceramics 8.Motion control
Fabrication 4 controls the movement locus of the axle workbench 15 of x-y-z tri- to realize the deposition of different graphic；Deposition liquid is stored in reservoir 13
In, provide power by micropump 11 and be transported to liquid is deposited from reservoir 13 in work nest 10, deposition liquid passes through the He of filter 12 again
Overflow valve 14, which is back in reservoir 13, realizes circulation.
With reference to shown in accompanying drawing 2, Laser Focusing is ionized meeting above piezoelectric ceramic substrate 8, when optical breakdown occurs for solution
The plasma bubbles 17 of HTHP are produced, plasma, which outwards expands, produces plasma stock wave 18, the impact wave pressure
Up to tens to hundreds of MPas, shock wave is enough to be impacted piezoelectric ceramic substrate 8 power when reaching 8 surface of piezoelectric ceramic substrate
Region produces deformation.After piezoelectric ceramic substrate 8 produces deformation, crystal inside changes, and negative electrical charge is gathered in deformation region, inhales
Attached GOLD FROM PLATING SOLUTION category cation 19.Because negative electrical charge is assembled at this, potential is relatively low, and solution potential is higher, so metal ion is easy
In reduction reaction occurs here.The upper and lower surface of anode instrument 9 has all done insulation processing, and only through-hole wall is conductive, formation
Electric field is more concentrated, and is beneficial to the locality of enhanced deposition.After shock wave disappears, piezoelectric ceramic substrate 8 recovers original form,
When next pulse laser emission, piezoelectric ceramic substrate 8 deforms once more, and metal ion deposits again；It is reciprocal with this, so as to
Deposit required metal level.
Specific implementation method of the present invention is as follows：
Step 1) piezoelectric ceramic substrate 8 is fixed in work nest 10；
Step 2) software programming control routine is utilized, to ensure to obtain desired figure, use is should be noted that when writing code
Less acceleration of motion, prevent solution wobble effects processing effect；
Step 3) configuration electrochemical deposition liquid.The sort of plating solution of electro-deposition is selected, solution is configured with pure distilled water, and
Addition can significantly improve coating performance and the additive of deposition velocity on a small quantity, including can promote the anode activation agent of anode activation,
To improve the current density that anode starts passivation, can normally be dissolved so as to ensure anode to be in the state of activation；It is heavy to improve
The brightener of laminated material quality, leveling agent etc.；And for improving the alkali metal or alkaline-earth metal salt of electroforming solution electric conductivity；
Step 4) work nest 10 is placed on the axle workbench 15 of x-y-z tri-, by adjusting z on the axle workbench 15 of x-y-z tri-
Axle height so that laser spot is located at 0.2~1mm of the top of piezoelectric ceramic substrate 8, if focal point is apart from piezoelectric ceramic substrate 8
Too near, piezoelectric ceramic substrate 8 is easily etched, and temperature exceedes the Curie-point temperature of piezoelectric ceramic substrate, piezoelectric ceramic substrate 8
It can fail, if the distance is too far, it is difficult to piezoelectric ceramic substrate 8 is produced local deformation, it is impossible to ensure locality；
Step 5) anode instrument 9 connect into the positive pole of direct current pulse power source 2, the top of piezoelectric ceramic substrate 8 is fixed on, makes laser
Just can be passed through from the through hole of anode instrument 9, because the upper and lower surface of anode instrument 9 is all led by insulation processing, only through-hole wall
Electricity, electric field are concentrated, and are beneficial to the locality for improving deposition；
Step 6) deposition liquid is added, deposition liquid liquid level is higher than 2~5mm of piezoelectric ceramic substrate 8, if liquid level is too low,
Solution is easily splashed, and impulsive force is difficult to be transported on piezoelectric ceramic substrate 8, if liquid level is too high, a large amount of laser energies are being transmitted across
Absorbed in journey by solution, it is less efficient；Pass through computer regulated laser parameter and the parameter of direct current pulse power source 2, voltage swing 0
~10V is adjustable, and dutycycle is that 0~80% frequency is consistent with laser parameter, and oscillograph 3 is connected with direct current pulse power source 2, in real time prison
Survey power parameter, it is ensured that the stability of power supply in process；Compiled code is input to the control software of motion control card 4；
Micropump 13 is opened, starts the cycle over deposition liquid；Using computer 1 simultaneously unbalanced pulse laser 6, direct current pulse power source 2 with
And motion control card 4, the setting in motion of tri- axle workbench of x-y-z 15, figure needed for deposition.
The embodiment is preferred embodiment of the invention, but the present invention is not limited to above-mentioned embodiment, not
Away from the present invention substantive content in the case of, those skilled in the art can make it is any it is conspicuously improved, replace
Or modification belongs to protection scope of the present invention.
Claims (8)
1. a kind of device of the fine electro-deposition of laser-impact piezoelectric ceramics localization, it is characterised in that including Work-piece processing system, swash
Light irradiation system, working solution circulating system and control system：
The Work-piece processing system includes the axle workbench (15) of x-y-z tri-, direct current pulse power source (2), oscillograph (3), work nest
(10), piezoelectric ceramic substrate (8) and anode instrument (9)；The oscillograph (3) is connected with direct current pulse power source (2)；The anode
Instrument (9) is connected with direct current pulse power source (2) positive pole, direct current pulse power source (2) the negative pole ground connection, the piezoelectric ceramic substrate
(8) it is placed in anode instrument (9) in work nest (10), and anode instrument (9) is placed in the top of piezoelectric ceramic substrate (8), sun
Pole instrument offers hole on (9)；The work nest (10) is placed on the axle workbench (15) of x-y-z tri-；
The laser irradiation system includes pulse laser (6), speculum (5) and condenser lens (7)；The pulse laser
(6) through on anode instrument (9) after condenser lens (7) focusing after speculum (5) reflection of the laser beam sent by 45 ° of settings
The hole opened up is irradiated on piezoelectric ceramic substrate (8)；
The working solution circulating system includes reservoir (13), micropump (11), filter (12) and overflow valve (14)；It is described micro-
Type pump (11) input termination reservoir (13), output end connect work nest (10), the filter (12) and overflow valve by pipeline
(14) connect, and the input of filter (12) is communicated by pipeline with work nest (10)；
The control system includes computer (1) and motion control card (4)；Computer (1) the control pulse laser (6),
Direct current pulse power source (2) and motion control card (4), the motion control card (4) control the axle workbench (15) of x-y-z tri-.
A kind of 2. device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 1, it is characterised in that
Piezoelectric ceramic substrate (8) polarised direction is vertical direction, and has high piezoelectric constant and Curie-point temperature, is removed after polarization
Conductive electrode metal.
A kind of 3. device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 1, it is characterised in that
The anode instrument (9) is the indissoluble inert metal plate for being drilled with through hole, and upper and lower surface does insulation processing, and through-hole wall is conductive,
Through-hole diameter 1~5mm, it is coaxial with laser emission path.
4. a kind of method of fine electro-deposition of laser-impact piezoelectric ceramics localization according to any one of claims 1 to 3, its
It is characterised by, comprises the following steps that：
Step 1) programmed according to graphics processing, and be input in computer control software；
Step 2) piezoelectric ceramic substrate (8) is fixed in work nest (10), anode instrument (9) is connecing direct current pulse power source (2) just
Pole is placed in work nest (10), direct current pulse power source (2) negative pole ground connection；
Step 3) work nest put into (10) on the axle workbench (15) of x-y-z tri-, regulation x-y-z tri- axle workbench (15) height,
Make Laser Focusing above piezoelectric ceramic substrate (8)；
Step 4) deposition liquid is added, piezoelectric ceramic substrate (8) and anode instrument (9) is totally immersed into deposition liquid；
Step 5) micropump (11) progress circulating picture-changing liquid is opened, ensure the even concentration of solution in work nest (10)；
Step 6) unbalanced pulse laser (6), while worked according to compiled code by the axles of motion control card control x-y-z tri-
Platform (15) is moved to deposit required shape.
A kind of 5. method of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 4, it is characterised in that
The deposition liquid liquid level is higher than the 2~5mm of piezoelectric ceramic substrate (8), and deposition liquid temperature degree is maintained at 40~50 DEG C.
A kind of 6. method of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 4, it is characterised in that
Pulse laser (6) laser spot should focus on 0.2~1mm above piezoelectric ceramic substrate (8), pulse laser (8) hair
The laser power density gone out is slightly larger than deposition liquid breakdown threshold, frequency 10Hz~0.4MHz.
A kind of 7. method of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 4, it is characterised in that
The voltage that the direct current pulse power source (2) provides is adjustable for 0~10V, and dutycycle is 0~80%, and frequency is consistent with laser parameter.
A kind of 8. method of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 4, it is characterised in that
Micropump (11) operating pressure is less than 2bar, and flow velocity is less than 0.5L/min, and solution flowing is for deposition liquid liquid surface fluctuation pole
It is small.
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| CN109735883A (en) * | 2019-02-20 | 2019-05-10 | 江苏大学 | A kind of device and method of the fine electro-deposition of laser assisted flexibility trailing type tool-electrode |
| WO2020177066A1 (en) * | 2019-03-03 | 2020-09-10 | 吉林大学 | Array composite electric field metal electrochemical micro-nano scale additive manufacturing device and method |
| CN112126955A (en) * | 2020-08-18 | 2020-12-25 | 江苏大学 | Laser electrochemical composite deposition method and device for rifling type hollow rotating electrode |
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