CN109913919B - Processing method and device for preparing micro-nano two-dimensional structure on surface of workpiece - Google Patents
Processing method and device for preparing micro-nano two-dimensional structure on surface of workpiece Download PDFInfo
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Abstract
The invention discloses a processing method and a device for preparing a micro-nano two-dimensional structure on the surface of a workpiece, and belongs to the field of special processing. The method adopts a method of coupling laser ablation and electrochemical deposition in the processing process, wherein a laser beam is focused on the surface of a workpiece substrate, and a micron-sized structure is processed on the surface of the workpiece substrate by controlling the area and the path of the laser ablation through a numerical control system; while laser ablation is performed, the anode of the tool is kept opposite to an ablation area, and nano structures are deposited on the micro structures in the area of the workpiece substrate. In order to restrain the electric field of the anode to the maximum extent in the top end area of the electrode, the anode of the tool penetrates into an insulating glass tube to realize side wall insulation. In addition, the heat-force effect of the laser raises the temperature of the solution in the irradiation area, and simultaneously generates a strong stirring effect, thereby accelerating the circulation flow updating of the deposition solution and promoting the rapid and efficient growth of the nano structure. The method is suitable for efficient processing and manufacturing of the micro-nano two-dimensional structure on the surface of the part.
Description
Technical Field
The invention relates to the field of surface processing in a special processing technology, in particular to a laser electrochemical composite processing method and a laser electrochemical composite processing device, which are suitable for processing and manufacturing a functional surface microstructure.
Background
In recent years, as a method capable of remarkably improving the interface performance, the surface texture becomes a research hotspot in the field of interface science at home and abroad, and the progress of the micro-machining technology makes it possible to optimize the interface performance by accurately controlling the shape and the scale of the texture. The wettability is one of the important characteristics of a solid surface, directly influences the characteristics of surface fluid such as flow and phase change, plays a great role in both nature and human life, and on the other hand, as a typical interface phenomenon, the wettability of the surface has a very important research value in the fundamental research of interface chemistry, physics, materials science, interface structure design and other interdisciplinary subjects. The microstructure of the surface of the material is one of the main factors determining the wettability of the solid surface, so the research of regulating the wettability of the surface of the material through surface micro-modeling is receiving attention at the present stage.
It is generally considered that a material surface having a water contact angle θ <5 ° is defined as a superhydrophilic surface, a material surface having a water contact angle θ <5 ° is hydrophilic, a material surface having a water contact angle θ <90 ° is hydrophobic, and a material surface having a water contact angle θ <150 ° is defined as a superhydrophobic surface. Researches show that the superhydrophobic/hydrophilic property of the material surface mainly depends on the surface free energy and roughness, and the effective preparation of the superhydrophobic/hydrophilic surface can be realized through the synergistic effect of the surface chemical composition and the surface microstructure.
At the present stage, the construction of a surface micro-nano structure becomes a common way for obtaining super-hydrophobic and super-hydrophilic surfaces by benefiting from the research on the surface with special wettability related to the lotus leaf effect. The method comprises the steps of firstly, constructing a micron-sized coarse structure on a metal substrate by using a solution as an electrolyte through an electrochemical etching method, then, continuously etching a nano-scale structure with a needle-ball-shaped structure on the surface of the existing micron-sized structure by using a hydrothermal method and using an aluminum trichloride hexahydrate solution and a triethanolamine solution with certain concentration as etching solutions, and then, carrying out low-energy treatment by using heptadecafluorosilane to finally obtain the super-hydrophobic surface with the micro-nano hierarchical structure; the patent with publication number CN108478858A proposes a preparation method of a nano-scale super-hydrophilic surface of a titanium implant, which comprises the steps of firstly carrying out sand blasting polishing treatment on the titanium implant by using sand grains, then carrying out acid etching polishing treatment, then placing the titanium implant into electrolyte for anodic oxidation treatment, and finally placing the titanium implant into a heat treatment device for heat treatment to obtain the titanium implant with the nano-scale morphology surface.
The traditional method for preparing the bionic structure surface by taking a nano material preparation method and a photoetching technology as cores can only obtain one nano or micron structure generally, and the bionic micro-nano structure surface with the micron and nano structures is difficult to prepare by one method or one process. Although the micro-nano composite structure can be constructed by the two-step method, a longer processing period is usually required, the preparation process is complex, the processing cost is high, and a room for improvement exists; in the aspect of application, the prepared super-hydrophobic/hydrophilic surface has certain limitations, the adhesion between the surface microstructure and the matrix is low, and the super-hydrophobic/hydrophilic microstructure on the surface of the matrix is easy to fall off, so that the stability of the super-hydrophobic/hydrophilic performance and the application potential thereof are influenced.
Disclosure of Invention
The invention aims to provide a processing method and a device for laser-assisted electrochemical composite micro-electro-deposition, which are simple, convenient and feasible, low in cost, good in mechanical property and strong in controllability and are suitable for quickly preparing a micro-nano two-dimensional structure surface on the surface of a workpiece, aiming at the defects of the prior processing technology.
The invention is realized by the following technical scheme:
a processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece utilizes laser beam ablation and electrochemical deposition to generate a micro-nano two-dimensional structure on the surface of the workpiece simultaneously, so as to obtain the super-hydrophobic/hydrophilic function of the surface of a part; laser beams emitted by the laser are irradiated on the surface of the workpiece substrate through the focusing of the light path transmission system and the convex lens, and a micron-sized structure is ablated on the surface of the workpiece substrate; meanwhile, the anode and the cathode of the direct current power supply are respectively connected with the anode of the tool and the workpiece substrate, the power supply is switched on, the anode of the tool is kept right opposite to the laser ablation area, and the nano-scale structure is deposited on the micron structure by adopting an electrochemical method.
Further, the method comprises the following steps:
drawing a motion path model and inputting the motion path model into a computer;
performing surface pretreatment on a workpiece substrate;
fixing a workpiece substrate in a working tank, connecting a tool anode to a positive electrode of a direct-current pulse power supply, clamping the tool anode above the workpiece substrate by a working arm, connecting the workpiece substrate with a negative electrode of the direct-current pulse power supply, adding a deposition solution to immerse the lower ends of the workpiece substrate and the tool anode in the deposition solution, and forming an electrochemical loop in the deposition solution by the workpiece substrate and the workpiece anode when the tool anode is electrified;
mounting the working groove on a motion platform, and adjusting the height of the x-y-z three-axis motion platform to focus laser on the surface of a workpiece substrate;
starting a micro pump to circularly change the liquid, and ensuring the uniform concentration of the solution in the working tank;
starting a direct current pulse power supply, carrying out electrochemical reduction reaction on charged metal ions in the deposition liquid on the surface of a workpiece substrate, and simultaneously starting a pulse laser, wherein a laser beam and an electrodeposition pulse current are synchronously irradiated on a deposition part to realize simultaneous processing of laser and electrodeposition;
and according to the set motion path, controlling the x-y-z three-axis motion platform by the motion controller to continuously process the workpiece substrate, thereby realizing synchronous and rapid processing of the micron-nanometer two-dimensional structure.
A processing device for preparing a micro-nano two-dimensional structure on the surface of a workpiece comprises a laser irradiation system, a processing system and a control system;
the laser irradiation system comprises a pulse laser, a reflector and a focusing lens; the laser is emitted by a pulse laser, the transmission direction is changed by a reflector, the laser is focused by a focusing lens, and the focused laser beam irradiates on a workpiece substrate;
the processing system comprises a direct current pulse power supply, a working tank, a workpiece substrate, a tool anode and an x-y-z three-axis motion platform; the working groove is arranged on the x-y-z three-axis motion platform; the positive pole of the direct current pulse power supply is connected with the tool anode, and the negative pole of the direct current pulse power supply is connected with the workpiece substrate; the lower ends of the workpiece substrate and the tool anode are immersed in the deposition solution, and the workpiece substrate and the workpiece anode form an electrochemical loop in the deposition solution; the tool anode is clamped by a working arm of the x-y-z three-axis motion platform;
the control system comprises a computer and a motion controller, wherein the computer controls the pulse laser, the direct current pulse power supply and the motion controller; the motion controller controls the x-y-z three-axis motion platform.
Furthermore, the side wall of the tool anode is insulated, and the tool anode is an insoluble metal wire.
Further, the tool anode is side wall insulated by an insulating glass tube.
Further, the tool anode is arranged 0.5-1.5 mm above the workpiece substrate.
Further, the processing device also comprises a working fluid circulating system, wherein the working fluid circulating system comprises a liquid storage tank, a micropump, a filter and a throttle valve; the micro pump, the filter and the throttle valve are connected in series in the loop, the liquid storage tank is connected with the input end of the micro pump, and the working tank is connected with the filter; one end of the throttle valve is connected with the working tank, and the other end of the throttle valve is connected with the liquid storage tank.
Further, the processing system also comprises an oscilloscope; and the direct current pulse power supply is connected with the oscilloscope.
Further, the pulse laser is a nanosecond pulse laser or a picosecond pulse laser.
Further, the liquid level of the deposition liquid is 2-10 mm higher than the workpiece substrate, and the temperature of the deposition liquid is 30-50 ℃; the voltage of the direct current pulse power supply can be adjusted to be 0-20V, the frequency is consistent with laser parameters, and the duty ratio is 0-80%.
The invention has the following beneficial effects:
1. the micro-nano structure is processed and generated at the same time, the operation flow is simple, and the processing efficiency is high;
2. in the electrodeposition process, the incident angle of laser can be changed by adjusting the included angle between the laser beam and the workpiece substrate, the direction of the microstructure and the distribution of the nanostructure are controlled, and further the direction orientation of hydrophilic/hydrophobic performance of the workpiece surface is changed, so that the directional movement and self-conveying of liquid drops are induced and regulated.
3. The heat-force effect of the laser can generate a strong stirring effect in the electrolyte, remarkably enhance the convective mass transfer of electrochemical reaction ions, accelerate the circulating flow updating of the deposition liquid, promote the rapid and efficient growth of the nano structure and effectively improve the processing efficiency.
4. The method is characterized in that a passive metal wire with the diameter less than 500 mu m is used as a tool anode, the metal wire is inserted into an insulating glass tube with the inner diameter matched with the size of the metal wire, the end is solidified in a heat treatment mode to conduct side wall insulation, only the front end is kept to conduct electricity, an anode electric field is limited in the top end area of an electrode, the action range of the electric field on a workpiece substrate is narrowed, only the central area of the electrode is kept to conduct electrodeposition, and the processing localization is enhanced.
5. In the electrodeposition process, hydrogen can be separated out from a deposition body, the laser thermal effect forms temperature gradient and pulsation impact at an electrode/solution interface to generate a localized strong stirring effect, hydrogen bubbles are easier to discharge, and the surface quality of a deposition layer is improved.
6. The laser is irradiated from the side surface to the area where the electrodeposition is generated, so that the problem that the processing fineness is influenced due to the shielding of the electrode when the laser is irradiated from the upper part to the lower part of the tool anode is avoided.
7. The laser ablation textured workpiece surface has the advantages of high precision, small heat influence, good controllability, small pollution and the like, and the method is simple, efficient and low in cost.
Drawings
FIG. 1 is a schematic view of a processing system for rapid preparation of superhydrophobic/hydrophilic surfaces by laser-assisted electrochemical deposition;
FIG. 2 is a schematic diagram of a directional micro-nano structure obtained after laser bias;
fig. 3 is a partially enlarged schematic view of fig. 2.
The reference numbers are as follows:
1. a computer; 2. a direct current pulse power supply; 3. an oscilloscope; 4. a motion controller; an x-y-z three-axis motion platform; 6. a liquid storage tank; 7. a filter; 8. a micro-pump; 9. a throttle valve; 10. C-axis; 11. a tool anode; 12. an insulating glass tube; 13. a workpiece substrate; 14. a mirror; 15. a focusing lens; 16. a working groove; a B axis; 18. a pulsed laser; 19. a laser beam; 20. electric field lines; 21. a nanostructure; 22. a microstructure.
Detailed Description
The invention will be further described with reference to the following figures and specific examples, but the scope of the invention is not limited thereto.
A processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece utilizes laser beam ablation and electrochemical deposition to generate a micro-nano two-dimensional structure on the surface of the workpiece simultaneously, so as to obtain the super-hydrophobic/hydrophilic function of the surface of a part; laser beams emitted by the laser are irradiated on the surface of the workpiece substrate 13 through the focusing of the light path transmission system and the convex lens, and a micron-sized structure is ablated on the surface of the workpiece substrate 13; meanwhile, the anode and the cathode of the direct current power supply are respectively connected with the tool anode 11 and the workpiece substrate 13, the power supply is switched on, the tool anode 11 is kept right opposite to the laser ablation area, and the nano-scale structure is deposited on the micron structure by adopting an electrochemical method.
A processing device for preparing a micro-nano two-dimensional structure on the surface of a workpiece comprises a laser irradiation system, a processing system and a control system; the laser irradiation system comprises a pulse laser 18, a reflector 14 and a focusing lens 15; laser is emitted by a pulse laser 18, the transmission direction is changed by a reflecting mirror 14, the laser is focused by a focusing lens 15, and a focused laser beam 19 is irradiated on a workpiece substrate 13; the machining system comprises a direct current pulse power supply 2, a working groove 16, a workpiece substrate 13, a tool anode 11 and an x-y-z three-axis motion platform 5; the working groove 16 is arranged on the x-y-z three-axis motion platform 5; the positive pole of the direct current pulse power supply 2 is connected with the tool anode 11, and the negative pole is connected with the workpiece substrate 13; the lower ends of the workpiece substrate 13 and the tool anode 11 are immersed in the deposition solution, and the workpiece substrate 13 and the workpiece anode 11 form an electrochemical loop in the deposition solution; the tool anode 11 is clamped by a working arm of the x-y-z three-axis motion platform 5;
the control system comprises a computer 1 and a motion controller 4, wherein the computer 1 controls a pulse laser 18, a direct current pulse power supply 2 and the motion controller 4; the motion controller 4 controls an x-y-z three-axis motion platform 5.
As shown in fig. 1, the computer 1 is connected to the pulse laser 18, the dc pulse power supply 2, and the motion controller 4, respectively. The computer 1 can control the laser parameters of the pulse laser 18 and the power parameters of the direct current pulse power supply 2, meanwhile, the computer 1 can run a path execution code, and the motion of the x-y-z three-axis motion platform 5 and the rotation motion of the C axis 10 and the B axis 17 are controlled by the motion controller 4. The working tank 16 is arranged on the x-y-z triaxial movement platform 5, the workpiece substrate 13 is fixed at the bottom of the working tank 16, the tool anode 11 is arranged above the workpiece substrate 13, the positive electrode of the direct current pulse power supply 2 is connected with the tool anode 11, the negative electrode of the direct current pulse power supply is connected with the workpiece substrate 13, the oscilloscope 3 is connected with the direct current pulse power supply 2, and current parameters are monitored in real time. The positive electrode of the direct current pulse power supply 2 → the tool anode 11 → the deposition solution → the workpiece substrate 13 → the negative electrode of the direct current pulse power supply 2 forms a circuit so that the electrochemical reaction can proceed. The laser beam is emitted by a pulse laser 18, the transmission direction of the laser beam is changed by a reflector 14, the laser beam passes through a focusing lens 15 and penetrates through a deposition solution to be focused on the surface of a workpiece substrate 13, and a motion controller 4 controls the motion path of an x-y-z three-axis motion platform 5 to realize deposition of different patterns. The sediment liquid is stored in a liquid storage tank 6, is supplied with power by a micro pump 8, is conveyed to a working tank 16 from the liquid storage tank 6 through a filter 7, and is returned to the liquid storage tank 6 through a throttling valve 9 for circulation. In the electrodeposition process, the incident angle of laser can be changed by adjusting the included angle between the laser beam 19 and the workpiece substrate 13, the direction of the microstructure and the distribution of the nanostructure are controlled, and the direction orientation of hydrophilic/hydrophobic performance of the workpiece surface is further changed, so that the directional movement and self-conveying of liquid drops are induced and regulated.
As shown in fig. 2, laser is irradiated from the side into a micro-area where electrodeposition occurs, texturing is performed on the workpiece substrate 13, a micron-sized surface structure is processed, the tool anode 11 is kept facing the laser ablation area, electrochemical current and laser are synchronized, a nano-structure 21 is deposited on the micron-sized structure 22 in the area of the workpiece substrate 13, and a micro-nano composite structure is prepared. Referring to fig. 3, it can be seen that electric field lines 20 are formed between the tool anode 11 and the workpiece substrate 13, the insoluble tool anode 11 penetrates into the insulating glass tube 12 to realize sidewall insulation, only the top end is conductive, the anode electric field is restricted in the electrode top end area to the maximum extent, and the localization of deposition is enhanced; the heat-force effect of the laser can generate a strong stirring effect in the electrolyte, remarkably enhance the convective mass transfer of electrochemical reaction ions, promote the efficient and rapid growth of the nano structure and realize the efficient processing and manufacturing of the micro-nano two-dimensional microtexture.
In the specific embodiment of the invention, a passive metal wire with the diameter less than 500 mu m is used as a tool anode, the metal wire is inserted into an insulating glass tube with the inner diameter matched with the size of the metal wire, the end is solidified in a heat treatment mode to insulate the side wall, only the front end is kept conductive, the anode electric field is limited in the top end area of the electrode, the action range of the electric field on the workpiece substrate is reduced, only the central area of the electrode is kept for electrodeposition, and the processing localization is enhanced.
The workpiece substrate 13 is made of conductive materials, the tool anode 11 and the workpiece substrate 13 can be vertically arranged, the tool anode 11 is over against a laser focusing area, so that the micro-structure 22 and the nano-structure 21 are simultaneously generated, the size and the density of the micro-structure 22 are determined by an ablation path and laser parameters, and the size and the density of the nano-structure 21 are determined by electrochemical parameters, laser beam energy density and the movement speed of the workpiece substrate 13; the tool anode 11 is an insoluble metal wire, the side wall of the tool anode is insulated by an insulating glass tube 12 with the inner diameter matched with the size of the tool anode, only the end part is left to be conductive, the end face of the metal wire is polished and polished, the tool anode is arranged at a position 0.5-1.5 mm above a workpiece substrate 13, and an electric field in an anode area is restrained at the top end of an electrode. The tool anode 11 is clamped by a working arm of the x-y-z three-axis motion platform 5, and three-dimensional space motion and rotation motion can be realized through the motion controller 4.
The laser beam 19 emitted by the pulse laser 18 forms a certain included angle with the workpiece substrate 13, and irradiates the surface of the workpiece substrate 13 from the side, so that the influence on processing caused by electrode shielding during laser irradiation is avoided, the angle between the laser beam 19 and the workpiece substrate 13 is adjustable, and the angle between the laser beam and the workpiece substrate is adjusted by adjusting the inclination angle of the x-y-z three-axis motion platform. The laser incidence direction influences the direction of the microstructures 22 and the distribution of the nanostructures 21, so that the surface hydrophilic/hydrophobic property has a certain directional orientation, and the directional orientation can be used for realizing the directional movement and self-conveying of liquid drops. The liquid level of the deposition liquid is 132-10 mm higher than that of the workpiece substrate, and the temperature of the deposition liquid is kept at 30-50 ℃. The voltage of the direct current pulse power supply 2 is adjustable within 0-20V, the frequency is consistent with laser parameters, and the duty ratio is 0-80%. The working pressure of the micro pump 8 is less than 2bar, the flow rate is less than 0.5L/min, and the disturbance of solution flow to the liquid level of the deposition solution is very small.
The specific implementation method of the invention is as follows:
s1: writing a control code by using software to ensure that a desired graph is obtained, and paying attention to the adoption of smaller motion acceleration when writing the code to prevent the solution from shaking to influence the processing effect;
s2: preparing corresponding deposition liquid, wherein the components and the concentration of the deposition liquid are reasonably selected according to the required material of the deposition layer, a small amount of additive is added to improve the performance and the deposition speed of the coating, and a small amount of brightener, leveling agent and the like capable of improving the surface quality of the deposition layer are added;
s3: the workpiece substrate 13 is subjected to surface pretreatment, and then fixed in a working tank 16 and connected to the negative electrode of the direct current pulse power supply 2. The tool anode 11 is connected with the positive pole of the direct current pulse power supply 2 and fixed at a position 0.5-1.5 mm above the workpiece substrate 13, and the side wall of the tool anode 11 is insulated, so that only the front end is conductive, the electric field action area of the workpiece substrate 13 is reduced, the stray deposition phenomenon is reduced or eliminated, and the locality of deposition is improved;
s4: adding a deposition solution to enable the liquid level to be 2-10 mm higher than the surface of the workpiece substrate 13, if the solution layer is too thin, water splash can be splashed by plasma generated by laser irradiation, and if the solution layer is too thick, energy loss is serious when laser passes through the solution, and the efficiency is low;
s5: the method comprises the following steps of placing a working tank 16 on an x-y-z three-axis motion platform 5, adjusting the x-y-z three-axis motion platform 5 to enable laser to be focused 0.2-1.5 mm above a workpiece substrate 13, forming pulse impact by utilizing a laser thermal effect, generating a strong flow field stirring effect, driving metal ions in a solution to move to a processing area, inhibiting concentration polarization, promoting efficient and rapid growth of a nano microstructure, and remarkably improving the electrodeposition reaction efficiency;
s6: starting the micro pump 8 to circularly change the liquid, and ensuring the concentration and the components of the solution in the working tank 16 to be uniform;
s7: the laser parameters and the direct current pulse power supply parameters are adjusted through the computer 1, the voltage of the direct current pulse power supply 2 is adjustable from 0V to 20V, the duty ratio is 0-80%, the frequency is consistent with the laser parameters, the oscilloscope 3 is connected with the direct current pulse power supply 2, the power supply parameters are monitored in real time, and the stability of the power supply in the machining process is ensured;
s8: and starting the pulse laser 18, the direct-current pulse power supply 2 and the motion controller 4, controlling the x-y-z three-axis motion platform 5 through the motion controller 4 according to the set motion path so as to control the area and the path of laser ablation, and continuously processing the workpiece substrate 13, thereby realizing the efficient synchronous manufacturing and processing of the micro-nano composite structure.
The present invention is not limited to the above-described embodiments, and any obvious improvements, substitutions or modifications can be made by those skilled in the art without departing from the spirit of the present invention.
Claims (10)
1. A processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece utilizes laser beam ablation and electrochemical deposition to generate a micro-nano two-dimensional structure on the surface of the workpiece simultaneously, so as to obtain the super-hydrophobic/hydrophilic function of the surface of a part; the method is characterized in that laser beams emitted by a laser are irradiated on the surface of a workpiece substrate (13) through the focusing of a light path transmission system and a convex lens, and a micron-sized structure is ablated on the surface of the workpiece substrate (13); meanwhile, the anode and the cathode of the direct current power supply are respectively connected with the tool anode (11) and the workpiece substrate (13), the power supply is switched on, the tool anode (11) is kept right opposite to the laser ablation area, and the nano-scale structure is deposited on the micron structure by adopting an electrochemical method.
2. The machining method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to claim 1, which is characterized by comprising the following steps:
drawing a motion path model and inputting the motion path model into a computer (1);
performing surface pretreatment on a workpiece substrate (13);
fixing a workpiece substrate (13) in a working tank (16), wherein a tool anode (11) is connected with the positive electrode of a direct-current pulse power supply (2) and is clamped and placed above the workpiece substrate (13) by a working arm, the workpiece substrate (13) is connected with the negative electrode of the direct-current pulse power supply (2), so that the lower ends of the workpiece substrate (13) and the tool anode (11) are immersed in a deposition solution, and when the workpiece substrate (13) and the workpiece anode (11) are electrified, an electrochemical loop is formed in the deposition solution;
the working groove (16) is arranged on the moving platform, and the height of the x-y-z three-axis moving platform (5) is adjusted to focus laser on the surface of the workpiece substrate (13);
starting the micro pump (8) to circularly change the liquid, and ensuring the uniform concentration of the solution in the working tank (16);
starting a direct current pulse power supply (2), carrying out electrochemical reduction reaction on charged metal ions in the deposition liquid on the surface of a workpiece substrate (13), starting a pulse laser (18), and synchronously irradiating a laser beam (19) and electrodeposition pulse current on a deposition part to realize simultaneous processing of laser and electrodeposition;
according to the set motion path, the x-y-z three-axis motion platform (5) is controlled by the motion controller (4) to continuously process the workpiece substrate (13), so that synchronous and rapid processing of the micron-nanometer two-dimensional structure is realized.
3. The processing device adopted by the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to claim 1 is characterized by comprising a laser irradiation system, a processing system and a control system;
the laser irradiation system comprises a pulse laser (18), a reflecting mirror (14) and a focusing lens (15); laser is emitted by a pulse laser (18), the transmission direction is changed by a reflector (14), the laser is focused by a focusing lens (15), and a focused laser beam (19) is irradiated on a workpiece substrate (13);
the machining system comprises a direct-current pulse power supply (2), a working groove (16), a workpiece substrate (13), a tool anode (11) and an x-y-z three-axis motion platform (5); the working groove (16) is arranged on the x-y-z three-axis motion platform (5); the positive electrode of the direct current pulse power supply (2) is connected with the tool anode (11), and the negative electrode of the direct current pulse power supply is connected with the workpiece substrate (13); the lower ends of the workpiece substrate (13) and the tool anode (11) are immersed in the deposition solution, and the workpiece substrate (13) and the workpiece anode (11) form an electrochemical loop in the deposition solution; the tool anode (11) is clamped by a working arm of the x-y-z three-axis motion platform (5);
the control system comprises a computer (1) and a motion controller (4), wherein the computer (1) controls a pulse laser (18), a direct current pulse power supply (2) and the motion controller (4); the motion controller (4) controls the x-y-z three-axis motion platform (5).
4. The processing device used in the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to claim 3 is characterized in that the side wall of the tool anode (11) is insulated, and the tool anode (11) is an insoluble metal wire.
5. The processing device for the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to claim 4 is characterized in that the side wall of the tool anode (11) is insulated by an insulating glass tube (12).
6. The processing device for the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to any one of claims 3 to 5, wherein the tool anode (11) is arranged 0.5-1.5 mm above the workpiece substrate (13).
7. The processing device for the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to claim 3 is characterized by further comprising a working liquid circulating system, wherein the working liquid circulating system comprises a liquid storage tank (6), a micro pump (8), a filter (7) and a throttle valve (9); the micro pump (8), the filter (7) and the throttle valve (9) are connected in series in a loop, the liquid storage tank (6) is connected with the input end of the micro pump (8), and the working tank (16) is connected with the filter (7); one end of the throttle valve (9) is connected with the working tank (16), and the other end of the throttle valve is connected with the liquid storage tank (6).
8. The processing device adopted by the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to the claim 3 is characterized in that the processing system further comprises an oscilloscope (3); the direct current pulse power supply (2) is connected with the oscilloscope (3).
9. The processing device for the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to the claim 3 is characterized in that the pulse laser (18) is a nanosecond pulse laser or a picosecond pulse laser.
10. The processing device used in the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to claim 3 is characterized in that the liquid level of the deposition liquid is 2-10 mm higher than the substrate (13) of the workpiece, and the temperature of the deposition liquid is 30-50 ℃; the voltage of the direct current pulse power supply (2) can be adjusted to 0-20V, the frequency is consistent with laser parameters, and the duty ratio is 0-80%.
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