CN107723761B - A kind of device and method of the fine electro-deposition of laser-impact piezoelectric ceramics localization - Google Patents
A kind of device and method of the fine electro-deposition of laser-impact piezoelectric ceramics localization Download PDFInfo
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- CN107723761B CN107723761B CN201710736251.XA CN201710736251A CN107723761B CN 107723761 B CN107723761 B CN 107723761B CN 201710736251 A CN201710736251 A CN 201710736251A CN 107723761 B CN107723761 B CN 107723761B
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
Abstract
The invention discloses a kind of device and methods of fine electro-deposition of laser-impact piezoelectric ceramics localization, are related to laser manufacturing field, which includes Work-piece processing system, laser irradiation system, working solution circulating system and control system；This method generates plasma bubbles by laser breakdown solution and impacts piezoelectric ceramics surface, and accumulation is generated at deformation so as to cause piezoelectric ceramics, carries out the fine electro-deposition of localization using the piezoelectric effect of piezoelectric ceramics.Since the energy density at laser spot is high, laser breakdown solution generates plasma bubbles, piezoelectric ceramics, which generates elastic deformation by laser-produced plasma bubble impact, to be caused to polarize, after piezoelectric ceramics is deformed, it can be in surface aggregation negative electrical charge, deformation region can generate negative electrical charge aggregation and potential is lower, and the metal cation in solution is adsorbed reduction to realize the fine deposition of high locality.Present invention is mainly used for the manufactures of micro-nano part.
Description
Technical field
The present invention relates to localization micro processing fields in special processing technology, refer in particular to a kind of laser-impact piezoelectric ceramics localization
The method and apparatus of fine electro-deposition, processing and manufacture suitable for minute metallic part.
Background technique
Fine electro-deposition techniques are based on the increases material manufacturing technology of cathode deposition principle, and process is with metal ion in yin
The form that reduction reaction occurs for pole surface carries out.In electrochemical fabrication process, the transfer of material is with the progress of ion scale, gold
Belong to ion size it is even more small at 1/10th nanometers, therefore electrochemical fabrication technique make it field of micro-manufacture, with
There is very big development potentiality as field of nanofabrication.Although electrical-chemistry method has advantage in principle, it another
The problem of one feature locality is poor, brings must be accounted for.
Piezoelectric ceramics is a kind of ceramic material that can convert mutually mechanical energy and electric energy.When piezoelectric ceramics is by outer
When power effect generates deformation, deformation position will generate electric polarization, assemble certain negative electrical charge.It can use this piezoelectric effect
Reduction reaction occurs for the metal cation adsorbed in electric depositing solution, realizes increasing material manufacturing.
A lot of in the research of non-conductor matrix surface induction-chemical deposition metal using laser both at home and abroad, Chinese patent " swashs
The process of photoinduction liquid deposition production electrically conductive lines ", Patent No. CN1377220A is proposed: by asphalt mixtures modified by epoxy resin
The non-conductive matrix such as rouge, polyimides, ceramics, P-type silicon, which are put into, fills soluble metallic salt: mantoquita, nickel salt, gold salt etc. it is water-soluble
In the liquid bath of liquid, with CO2Laser is irradiated scanning from its front, can be heavy in the nonconductive matrixs plate surface such as epoxy resin
Product provides the nucleus of crystal of catalytic activity, then substrate is put into alkaline electroless plating copper liquid and carries out chemical plating, obtains and uniformly causes
Close copper conductive pattern.Chinese patent " a kind of method of preparing titanium dioxide nanocrystal films by liquid-phase pulse laser induction ", specially
Benefit number proposes for CN101712450A: substrate base is immersed in TiCl4In solution, pulse laser induced synthesizing nanocrystalline is utilized
Titanium dioxide stands 24~72 hours later, can prepare the titanium deoxid film of function admirable at lower cost.
The superiority that laser induced chemical deposition has its certain, but often operating process is complicated, and process is various.Piezoelectricity is made pottery
Porcelain using its special piezoelectric effect, cooperates laser-impact as deposition substrate, can be convenient that effectively realize localization fine heavy
Product.
Summary of the invention
The purpose of the present invention is to propose to a kind of devices of fine electro-deposition of laser-impact piezoelectric ceramics localization, provide a set of complete
Whole processing platform realizes the deposition of complex figure, can also deposit various metals such as copper, nickel etc..
It is another object of the present invention to propose a kind of method of fine electro-deposition of laser-impact piezoelectric ceramics localization, by piezoelectricity
Ceramics are placed in electric depositing solution, and the plasma of high temperature and pressure, Cathode plasma explosion are generated using pulse laser breakdown solution
Generating shock wave makes piezoelectric ceramics surface generate flexible deformation, and piezoelectric ceramics will assemble certain negative electrical charge in deformation position, inhales
Metal cation in attached solution.Since the pulse power provides voltage, so that generating potential at solution and piezoelectric ceramics deformation
Reduction reaction will occur at this for difference, metal cation.Laser used is pulse laser, and " impact-deformation-deposition-is extensive
Answer-impact again ", it loops back and forth like this, complex figure is deposited by the movement of three-dimensional platform, realize the mesh of fine localization deposition
's.
A kind of device of the fine electro-deposition of laser-impact piezoelectric ceramics localization, including Work-piece processing system, laser irradiation system
System, working solution circulating system and control system:
The Work-piece processing system includes tri- axis workbench of x-y-z, direct current pulse power source, oscillograph, work nest, piezoelectricity pottery
Porcelain substrate and anode tool；The oscillograph is connected with direct current pulse power source；The anode tool and direct current pulse power source anode
It is connected, the direct current pulse power source cathode ground connection, the piezoelectric ceramic substrate and anode tool are placed in work nest, and anode
Tool is placed in the top of piezoelectric ceramic substrate, offers hole on anode tool；The work nest is placed in tri- axis workbench of x-y-z
On；
The laser irradiation system includes pulse laser, reflecting mirror and condenser lens；What the pulse laser issued
Hole of the laser beam after the 45 ° of reflecting mirror being arranged reflections after condenser lens focuses through opening up on anode tool is irradiated to piezoelectricity
On ceramic substrate；
The working solution circulating system includes reservoir, micropump, filter and overflow valve；The micropump input termination
Reservoir, output end connect work nest by pipeline, and the filter is connected with overflow valve, and the input terminal of filter passes through pipeline
It is communicated with work nest；
The control system includes computer and motion control card；The computer controls pulse laser, DC pulse
Power supply and motion control card, the tri- axis workbench of motion control card control x-y-z.
Further, the piezoelectric ceramic substrate polarization direction is vertical direction, and has high piezoelectric constant and curie point
Temperature removes conductive electrode metal after polarization.
Further, the anode tool is the indissoluble inert metal plate for being drilled with through-hole, and upper and lower surface does insulation processing,
Through-hole wall is conductive, through-hole diameter 1~5mm, coaxial with laser emission path.
A kind of method of the fine electro-deposition of laser-impact piezoelectric ceramics localization, the specific steps are as follows:
Step 1) it is programmed according to graphics processing, and be input in computer control software；
Step 2) piezoelectric ceramic substrate is fixed in work nest, anode tool connects direct current pulse power source anode and is placed in
In work nest, direct current pulse power source cathode ground connection；
Step 3) work nest is placed on tri- axis workbench of x-y-z, tri- axis height of table of x-y-z is adjusted, keeps laser poly-
Coke is above piezoelectric ceramic substrate；
Step 4) deposition liquid is added, it is totally immersed into piezoelectric ceramic substrate and anode tool in deposition liquid；
Step 5) micropump progress circulating picture-changing liquid is opened, guarantee the even concentration of solution in work nest；
Step 6) unbalanced pulse laser, while being worked according to compiled code by tri- axis of motion control card control x-y-z
Platform is moved to deposit required shape.
Further, the deposition liquid liquid level is higher than 2~5mm of piezoelectric ceramic substrate, and deposition liquid temperature is maintained at 40~50
℃。
Further, the pulse laser laser spot should focus on 0.2~1mm above piezoelectric ceramic substrate, pulse
The laser power density that laser issues is slightly larger than deposition liquid breakdown threshold, frequency 10Hz~0.4MHz.
Further, the voltage that the direct current pulse power source provides is that 0~10V is adjustable, and duty ratio is 0~80%, frequency
It is consistent with laser parameter.
Further, the micropump operating pressure is less than 2bar, and flow velocity is less than 0.5L/min, and solution flowing is for deposition
Liquid liquid surface fluctuation is minimum.
It technical advantage of the invention and has the beneficial effect that:
1. pulse laser, which punctures the plasma thermodynamic activity that solution generates, impacts piezoelectric ceramics, the deformation of piezoelectric ceramics is utilized
It generates piezoelectric effect adsorbing metal ions and reduction reaction occurs, realize the fine deposition of the localization of metal parts, efficiently solve micro-
The problem of thin deposition technique locality difference；
2. eliminating the complexity such as prior surface roughening, sensitization relative to other induced with laser metallic crystal chemical depositions
Process flow, it is easy to operate.The locality of deposition is related with laser parameter and focal position, and technological parameter controllability is strong.
3. deposition liquid used can continue to recycle, deposited using laser aiming metal superfine, whole process green
It is pollution-free, and cost is relatively low.
Detailed description of the invention
Fig. 1 is the system diagram of the fine electro-deposition of laser-impact piezoelectric ceramics localization；
Fig. 2 is the process principle figure of the fine electro-deposition of laser-impact piezoelectric ceramics localization.
Appended drawing reference is as follows:
1. 5. reflecting mirror of computer 2. direct current pulse power source, 3. oscillograph, 4. motion control card, 6. pulse laser
7. 12. filter of condenser lens 8. piezoelectric ceramic substrate, 9. anode tool, 10. work nest, 11. micropump, 13. reservoir
14. 17. plasma bubbles of overflow valve 15.x-y-z tri- axis workbench, 16. electric field line, 18. plasma stock wave 19.
Metal cation.
Specific embodiment
Present invention will be further explained with reference to the attached drawings and specific examples, but protection scope of the present invention is simultaneously
It is without being limited thereto.
In conjunction with attached drawing 1, computer 1 is connected with laser 6, direct current pulse power source 2, motion control card 4, and computer 1 is controllable
2 power parameter of laser parameter and direct current pulse power source of pulse laser 6 processed, can also be transferred to motion control card for compiled code
4.Oscillograph 3 is connected with direct current pulse power source 2, real-time monitoring current parameters；Work nest 10 is placed in tri- axis workbench 15 of x-y-z
On, piezoelectric ceramic substrate 8 and anode tool 9 are all placed in work nest 10；Laser beam emits from laser 6, reflects through reflecting mirror 5
Change transmission direction, is focused on above piezoelectric ceramics 8 using the focusing of condenser lens 7 across the through-hole of anode tool 9.Movement control
The motion profile that fabrication 4 controls tri- axis workbench 15 of x-y-z has realized the deposition of different graphic；Deposition liquid is stored in reservoir 13
In, liquid will be deposited by the offer of micropump 11 power and be transported in work nest 10 from reservoir 13, deposition liquid is again through 12 He of filter
Overflow valve 14, which flows back into, realizes circulation in reservoir 13.
In conjunction with shown in attached drawing 2, laser focuses on 8 top of piezoelectric ceramic substrate, is ionized meeting when optical breakdown occurs for solution
The plasma bubbles 17 of high temperature and pressure are generated, plasma expands outward generates plasma stock wave 18, the impact wave pressure
Up to tens to several hundred megapascal, shock wave is enough to impact piezoelectric ceramic substrate 8 power when reaching 8 surface of piezoelectric ceramic substrate
Region generates deformation.After piezoelectric ceramic substrate 8 generates deformation, crystal inside changes, and negative electrical charge is gathered in deformation region, inhales
Attached GOLD FROM PLATING SOLUTION belongs to cation 19.Since negative electrical charge is assembled at this, potential is lower, and solution potential is higher, so metal ion is easy
In reduction reaction occurs here.9 upper and lower surface of anode tool has all done insulation processing, and only through-hole wall is conductive, formation
Electric field is more concentrated, and the locality of enhanced deposition is beneficial to.After shock wave disappears, piezoelectric ceramic substrate 8 restores original form,
When next pulse laser emission, piezoelectric ceramic substrate 8 deforms once more, and metal ion deposits again；It is reciprocal with this, thus
Deposit required metal layer.
Specific implementation method of the present invention is as follows:
Step 1) piezoelectric ceramic substrate 8 is fixed in work nest 10；
Step 2) software programming control routine is utilized, to guarantee to obtain desired figure, it should be noted that use when writing code
Lesser acceleration of motion prevents solution wobble effects processing effect；
Step 3) configuration electrochemical deposition liquid.The sort of plating solution for selecting electro-deposition configures solution with pure distilled water, and
The additive of coating performance and deposition velocity can be significantly improved on a small quantity by being added, the anode activation agent including that can promote anode activation,
To improve the current density that anode starts passivation, to guarantee that anode is in the state of activation and can normally dissolve；It is heavy to improve
Brightener, leveling agent of laminated material quality etc.；And the alkali or alkaline earth metal salt class for improving electroforming solution electric conductivity；
Step 4) work nest 10 is placed on tri- axis workbench 15 of x-y-z, by adjusting z on tri- axis workbench 15 of x-y-z
Axis height, so that laser spot is located at 8 0.2~1mm of top of piezoelectric ceramic substrate, if focal point is apart from piezoelectric ceramic substrate 8
Too close, piezoelectric ceramic substrate 8 is easy to be etched, and temperature is more than the Curie-point temperature of piezoelectric ceramic substrate, piezoelectric ceramic substrate 8
It can fail, if the distance is too far, it is difficult to so that piezoelectric ceramic substrate 8 is generated local deformation, it cannot be guaranteed that locality；
Step 5) anode tool 9 connect into the anode of direct current pulse power source 2, it is fixed on 8 top of piezoelectric ceramic substrate, makes laser
Just it can be passed through from 9 through-hole of anode tool, since 9 upper and lower surface of anode tool is all by insulation processing, only through-hole wall is led
Electricity, electric field are concentrated, and are beneficial to improve the locality of deposition；
Step 6) deposition liquid is added, make to deposit 2~5mm that liquid liquid level is higher than piezoelectric ceramic substrate 8, if liquid level is too low,
Solution easily splashes, and impact force is difficult to be transported on piezoelectric ceramic substrate 8, if liquid level is too high, a large amount of laser energies are being transmitted across
It is absorbed in journey by solution, efficiency is lower；Pass through 2 parameter of computer regulated laser parameter and direct current pulse power source, voltage swing 0
~10V is adjustable, and duty ratio is that 0~80% frequency is consistent with laser parameter, and oscillograph 3 is connected with direct current pulse power source 2, supervises in real time
Survey power parameter, it is ensured that the stability of power supply in process；Compiled code is input to the control software of motion control card 4；
Micropump 13 is opened, deposition liquid is started the cycle over；Using computer 1 simultaneously unbalanced pulse laser 6, direct current pulse power source 2 with
And motion control card 4, tri- axis workbench of x-y-z, 15 setting in motion, figure needed for depositing.
The embodiment is a preferred embodiment of the present invention, but present invention is not limited to the embodiments described above, not
In the case where substantive content of the invention, any conspicuous improvement that those skilled in the art can make, replacement
Or modification all belongs to the scope of protection of the present invention.
Claims (8)
1. a kind of device of the fine electro-deposition of laser-impact piezoelectric ceramics localization, which is characterized in that including Work-piece processing system, swash
Light irradiation system, working solution circulating system and control system:
The Work-piece processing system includes tri- axis workbench (15) of x-y-z, direct current pulse power source (2), oscillograph (3), work nest
(10), piezoelectric ceramic substrate (8) and anode tool (9)；The oscillograph (3) is connected with direct current pulse power source (2)；The anode
Tool (9) is connected with direct current pulse power source (2) anode, direct current pulse power source (2) the cathode ground connection, the piezoelectric ceramic substrate
(8) it is placed in work nest (10) with anode tool (9), and anode tool (9) is placed in the top of piezoelectric ceramic substrate (8), sun
Pole tool offers hole on (9)；The work nest (10) is placed on tri- axis workbench (15) of x-y-z；
The laser irradiation system includes pulse laser (6), reflecting mirror (5) and condenser lens (7)；The pulse laser
(6) through on anode tool (9) after condenser lens (7) focus after the reflecting mirror (5) that the laser beam issued is arranged by 45 ° reflects
The hole opened up is irradiated on piezoelectric ceramic substrate (8)；
The working solution circulating system includes reservoir (13), micropump (11), filter (12) and overflow valve (14)；It is described micro-
Type pumps (11) input termination reservoir (13), and output end is connect work nest (10) by pipeline, the filter (12) and overflow valve
(14) it connects, and the input terminal of filter (12) is communicated by pipeline with work nest (10)；
The control system includes computer (1) and motion control card (4)；Computer (1) control pulse laser (6),
Direct current pulse power source (2) and motion control card (4), the motion control card (4) control tri- axis workbench (15) of x-y-z.
2. a kind of device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 1, which is characterized in that
Piezoelectric ceramic substrate (8) polarization direction is vertical direction, and has high piezoelectric constant and Curie-point temperature, is removed after polarization
Conductive electrode metal.
3. a kind of device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 1, which is characterized in that
The anode tool (9) is the indissoluble inert metal plate for being drilled with through-hole, and upper and lower surface does insulation processing, and through-hole wall is conductive,
Through-hole diameter 1~5mm, it is coaxial with laser emission path.
4. a kind of device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to any one of claims 1 to 3
Method, which is characterized in that specific step is as follows:
Step 1) it is programmed according to graphics processing, and be input in computer control software；
Step 2) piezoelectric ceramic substrate (8) is fixed in work nest (10), anode tool (9) is connecing direct current pulse power source (2) just
Pole is placed in work nest (10), direct current pulse power source (2) cathode ground connection；
Step 3) work nest set into (10) on tri- axis workbench (15) of x-y-z, tri- axis workbench (15) of x-y-z height is adjusted,
Focus on laser above piezoelectric ceramic substrate (8)；
Step 4) deposition liquid is added, it is totally immersed into piezoelectric ceramic substrate (8) and anode tool (9) in deposition liquid；
Step 5) micropump (11) progress circulating picture-changing liquid is opened, guarantee the even concentration of solution in work nest (10)；
Step 6) unbalanced pulse laser (6), while being worked according to compiled code by tri- axis of motion control card control x-y-z
Platform (15) is moved to deposit required shape.
5. a kind of method of the device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 4, special
Sign is that the deposition liquid liquid level is higher than (8) 2~5mm of piezoelectric ceramic substrate, and deposition liquid temperature is maintained at 40~50 DEG C.
6. a kind of method of the device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 4, special
Sign is that pulse laser (6) laser spot should focus on 0.2~1mm above piezoelectric ceramic substrate (8), pulse laser
The laser power density that device (6) issues is slightly larger than deposition liquid breakdown threshold, frequency 10Hz~0.4MHz.
7. a kind of method of the device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 4, special
Sign is that the voltage that the direct current pulse power source (2) provides is that 0~10V is adjustable, and duty ratio is 0~80%, and frequency and laser are joined
Number is consistent.
8. a kind of method of the device of fine electro-deposition of laser-impact piezoelectric ceramics localization according to claim 4, special
Sign is that micropump (11) operating pressure is less than 2bar, and flow velocity is less than 0.5L/min, and solution flowing is for depositing liquid liquid level
It disturbs minimum.
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| CN114351233A (en) * | 2021-12-08 | 2022-04-15 | 江苏大学 | Method and device for realizing localized electrodeposition by locally activating anode by using laser |
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