CN107615169B - 物体保持装置、曝光装置、平板显示器的制造方法及器件制造方法 - Google Patents

物体保持装置、曝光装置、平板显示器的制造方法及器件制造方法 Download PDF

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CN107615169B
CN107615169B CN201680030014.5A CN201680030014A CN107615169B CN 107615169 B CN107615169 B CN 107615169B CN 201680030014 A CN201680030014 A CN 201680030014A CN 107615169 B CN107615169 B CN 107615169B
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substrate
holding
flow path
substrate holder
holding device
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CN107615169A (zh
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青木保夫
吉田亮平
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Nikon Corp
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Nikon Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201680030014.5A 2015-05-28 2016-05-27 物体保持装置、曝光装置、平板显示器的制造方法及器件制造方法 Active CN107615169B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015-108843 2015-05-28
JP2015108843 2015-05-28
PCT/JP2016/065774 WO2016190423A1 (ja) 2015-05-28 2016-05-27 物体保持装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Publications (2)

Publication Number Publication Date
CN107615169A CN107615169A (zh) 2018-01-19
CN107615169B true CN107615169B (zh) 2021-02-23

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CN201680030014.5A Active CN107615169B (zh) 2015-05-28 2016-05-27 物体保持装置、曝光装置、平板显示器的制造方法及器件制造方法

Country Status (6)

Country Link
JP (2) JP6791132B2 (ko)
KR (1) KR102625921B1 (ko)
CN (1) CN107615169B (ko)
HK (1) HK1246869A1 (ko)
TW (1) TWI731860B (ko)
WO (1) WO2016190423A1 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6781965B2 (ja) * 2017-03-31 2020-11-11 株式会社ニコン 物体保持装置、処理装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP7023620B2 (ja) * 2017-05-30 2022-02-22 株式会社オーク製作所 露光装置及び基板載置方法
JP7105482B2 (ja) * 2018-04-03 2022-07-25 株式会社ブイ・テクノロジー 石定盤の温度調整装置およびそれを備えた検査装置
CN109384062B (zh) * 2018-09-19 2020-02-18 武汉华星光电技术有限公司 一种曝光机及其传送基板的方法
KR20200085533A (ko) * 2019-01-07 2020-07-15 삼성전자주식회사 디스플레이 장치 및 디스플레이 장치 제조 방법
CN112936021B (zh) * 2021-01-20 2022-11-18 大连理工大学 一种薄壁大口径非球面碳纤维复材高性能零件磨削装备

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101643150A (zh) * 2008-08-05 2010-02-10 奥林巴斯株式会社 基板浮起装置
JP2011225355A (ja) * 2010-04-22 2011-11-10 Sumitomo Heavy Ind Ltd エア浮上ユニット、ステージ装置、検査システム、露光システム及び塗布システム
CN102483579A (zh) * 2009-08-20 2012-05-30 株式会社尼康 物体移动装置、物体处理装置、曝光装置、物体检查装置及元件制造方法
JP2014118221A (ja) * 2012-12-13 2014-06-30 Toray Eng Co Ltd 基板浮上装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09278181A (ja) * 1996-04-11 1997-10-28 Canon Inc ワーク搬送装置及び搬送方法
JP2004273702A (ja) 2003-03-07 2004-09-30 Nikon Corp 搬送装置及び搬送方法、露光装置
JP4033841B2 (ja) * 2004-02-12 2008-01-16 東京エレクトロン株式会社 浮上式基板搬送処理方法及びその装置
CN101866113B (zh) * 2004-10-26 2013-04-24 株式会社尼康 衬底处理方法、曝光装置及器件制造方法
JP2009135169A (ja) * 2007-11-29 2009-06-18 Tokyo Electron Ltd 基板処理システムおよび基板処理方法
KR101187006B1 (ko) * 2012-04-24 2012-09-28 이재성 대면적 패널용 반송플레이트
KR101773494B1 (ko) * 2013-02-26 2017-08-31 가부시키가이샤 아이에이치아이 반송 장치
JP2014218342A (ja) * 2013-05-09 2014-11-20 オイレス工業株式会社 支持用エアプレートおよびその気体流抵抗器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101643150A (zh) * 2008-08-05 2010-02-10 奥林巴斯株式会社 基板浮起装置
CN102483579A (zh) * 2009-08-20 2012-05-30 株式会社尼康 物体移动装置、物体处理装置、曝光装置、物体检查装置及元件制造方法
JP2011225355A (ja) * 2010-04-22 2011-11-10 Sumitomo Heavy Ind Ltd エア浮上ユニット、ステージ装置、検査システム、露光システム及び塗布システム
JP2014118221A (ja) * 2012-12-13 2014-06-30 Toray Eng Co Ltd 基板浮上装置

Also Published As

Publication number Publication date
JP6791132B2 (ja) 2020-11-25
KR20180013996A (ko) 2018-02-07
WO2016190423A1 (ja) 2016-12-01
JP2021039362A (ja) 2021-03-11
HK1246869A1 (zh) 2018-09-14
CN107615169A (zh) 2018-01-19
TWI731860B (zh) 2021-07-01
JPWO2016190423A1 (ja) 2018-03-15
TW201703189A (zh) 2017-01-16
KR102625921B1 (ko) 2024-01-16

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