CN107479190B - A kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements and design method - Google Patents
A kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements and design method Download PDFInfo
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- 230000006798 recombination Effects 0.000 title claims abstract description 28
- 238000005215 recombination Methods 0.000 title claims abstract description 28
- 238000013461 design Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 22
- 230000003287 optical effect Effects 0.000 claims abstract description 23
- 239000000463 material Substances 0.000 claims abstract description 15
- 230000005540 biological transmission Effects 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 11
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000005457 optimization Methods 0.000 claims description 10
- 239000012528 membrane Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 abstract description 52
- 239000010409 thin film Substances 0.000 abstract description 9
- 238000005516 engineering process Methods 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000012788 optical film Substances 0.000 abstract description 2
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 229910004366 ThF4 Inorganic materials 0.000 description 1
- 229910009520 YbF3 Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000003331 infrared imaging Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
Abstract
The invention belongs to optical film technology fields, more particularly to the thin film technique of optical spectroscopic, and in particular to a kind of all dielectric film recombination dichroic elements and design method of (0.4~0.7 μm) of visible light wave range reflection and (7~10 μm) of long wave infrared region transmissions.It is different from traditional dielectric-metal-dielectric coating series structure, recombination dichroic elements proposed by the present invention, it is designed in ZnS or ZnSe substrate using all dielectric thin-film material, it is divided in the way of visible reflectance infrared transmission, the visible light spectroscopical effeciency that is averaged reaches 80% or more, and the LONG WAVE INFRARED spectroscopical effeciency that is averaged reaches 96% or more.
Description
Technical field
The invention belongs to optical film technology fields, more particularly to the thin film technique of optical spectroscopic, and in particular to a kind of
The all dielectric film recombination dichroic elements and set that (0.4~0.7 μm) of visible light wave range reflection is transmitted with (7~10 μm) of long wave infrared region
Meter method.
Background technique
In modern national defense and national economy field, photodetection and imaging be Modern Optics Technology important application direction it
One.In order to make full use of the EM reflecting characteristics of target to obtain the enough information of target, multispectral complex imaging and detection skill
Art is important one of development trend, which can detect the information of multiple spectral coverages simultaneously, and color separation film can be incident beam
It is directed respectively into different-waveband image-forming module.Multi-mode composite target seeker militarily use at present or development, is mainly adopted
With the compound mode of bimodulus, including ultraviolet/infrared, visible light/infrared, laser/infrared, microwave/infrared and millimeter wave/infrared,
Millimeter wave/infrared imaging etc..No matter in which kind of Compound Guidance Technology, recombination dichroic elements are the core elements in entire imaging system.
Currently, being mainly both at home and abroad that the method for using metal inducement to transmit is come in fact to the method for visible light and infrared spectroscopy
It is existing, it is optimized using medium~metal~medium multilayer film, realizes visible light wave range transmission and infrared band reflection.
1994, Beijing Institute of Technology Fu Gongmin et al. complete 0.4~0.7 μm of visual field height thoroughly, 2~14 μm of height of mid and far infrared it is anti-
Spectroscopical optimal design gives the optimal design result of metallic film；2009, Xi'an Applied Research Laboratory Liu Yongqiang et al.
That succeeds in developing there is 0.45~1.1 μm to penetrate, the wide spectrum color separation film of 8~12 μm of high reflections of mid and far infrared, and spectrum is average saturating
Rate is crossed greater than 80%, average reflectance is greater than 91%.
Based on medium~metal~dielectric coating series structure color separation filter, the simple short preparation period of film layer structure, but pole
Thin metal layer is very sensitive to entire spectrum property, and under practical preparation condition, measurement, the membrane system for solving silverskin optical constant are excellent
Changing design and processes integration is that spectro-film is successfully crucial.
It is also another kind side using all dielectric film in addition to above-mentioned medium~metal~dielectric coating series structure spectro-film
Case.2009, Thomas Rahmolow of Rugate Technologies company, the U.S. et al. was designed and is prepared for for more
Wave band reflects the optical filter of thermal infrared imager, is directed to designing and preparing for ultra wide wave band color separation filter, has used two kinds
Thin-film material is designed.2010, Zhang Yueguang et al. developed 1.0~2.3 μm and 8.0~12.0 μm of LONG WAVE INFRARED of short-wave infrared
Color separation film, using zinc selenide as substrate, using Ge, ZnSe and YbF3Design is optimized as thin-film material, using electron beam
Evaporation technique is prepared for dichroic coating, and reflectivity and transmissivity has all reached 93% or more.RonaldA et al. has developed visible light
The element for reflecting LONG WAVE INFRARED transmission, uses ZnS, ThF4And MgF2Thin-film material carries out multilager design and preparation, realizes
The reflectivity of 0.6~0.9 mu m waveband range reaches 80% or more, and the transmitance of 8~12 mu m waveband ranges reaches 90%.To sum up institute
It states, the emphasis of color separation film is to strive the system of the overall thickness for reducing film and reduction film on the basis of guaranteeing dichroism
Standby difficulty, while the face deformation of stress bring is reduced,
Based on above-mentioned Research foundation, the present invention proposes a kind of recombination dichroic elements of visible reflectance, LONG WAVE INFRARED transmission, point
Light mode is different from traditional medium~metal~medium spectro-film, avoids the problems such as very thin metallic film preparation process is poor,
The two-side film membrane used simultaneously has the characteristics that Stress match, can effectively reduce the deformation of substrate surface.Recombination dichroic elements can be realized
Visible reflectance reaches 80% or more, and the transmitance of LONG WAVE INFRARED reaches 95% or more.
Summary of the invention
(1) technical problems to be solved
The present invention proposes a kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements and design method, with solve how
In the case where visible light and infrared light are total to optical path, it will be seen that light (0.4~0.7 μm) and (7~10 μm) of LONG WAVE INFRARED light splitting, and
And the technical issues of improving spectroscopical effeciency as far as possible.
(2) technical solution
In order to solve the above-mentioned technical problem, the present invention proposes a kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements
Design method, which includes the following steps:
Selected reference wavelength λ0It is 0.55 μm, unit optical thickness is λ0/4；Select substrate Sub for ZnS or ZnSe；It is very high
Refraction materials A is Ge, and high-index material H is ZnS, and low-index material L is YF3；
Substrate is parallel plate structure, has opposite first surface and second surface；
The optical multilayer of visible reflectance and LONG WAVE INFRARED transmission, initial film structure are designed in first surface are as follows:
Sub|6A6H 17A5L 1A2H 0.8A2H 0.8A 1L 0.9H 1L 0.9H|Air
The film structure of first surface is set in λ0± 0.15 μm of wavelength band internal reflection rate be maximum value, 7~10 μm
The transmissivity of wave band is maximum value；The film structure of first surface is optimized, the film structure after optimization are as follows:
Sub|x1Ax2H x3Ax4Lx5Ax6H x7Ax8H x9Ax10Lx11H x12Lx13H|Air
Wherein, x1~x13The optical thickness coefficient of respectively every layer film；
In the antireflection film of second surface design LONG WAVE INFRARED transmission, initial film structure are as follows:
Sub|5.9A 1.1L25.6A6.1H 4.2L5.5H|Air
The film structure of second surface is set in 7~10 μm of transmitance as maximum value, to the film structure of second surface
It optimizes, the film structure after optimization are as follows:
Sub|y1Ay2Ly3Ay4H y5Ly6H|Air
Wherein, y1~y6The optical thickness coefficient of respectively every layer film；
The structure of final medium-wave infrared and LONG WAVE INFRARED recombination dichroic elements are as follows:
Air|x13H x12Lx11H x10Lx9Ax8H x7Ax6H x5Ax4Lx3Ax2H x1A|Sub|y1Ay2Ly3Ay4H y5Ly6H|
Air
The operating angle of recombination dichroic elements is 45 °.
Further, the film structure after first surface optimization are as follows:
Sub|6.2909A5.8140H 17.2803A4.7935L 1.0191A 1.9700H0.8362A2.0723H
0.8011A 1.0051L0.8961H 1.0646L 0.8865H|Air。
Further, the film structure after second surface optimization are as follows:
Sub|5.8815A 1.1000L 26.3327A6.0937H 4.2000L 5.1938H|Air。
In addition, the present invention also proposes that a kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements, the recombination dichroic elements are adopted
It is obtained with the design method of any of the above-described.
(3) beneficial effect
Visible light proposed by the present invention and LONG WAVE INFRARED all dielectric film recombination dichroic elements and design method, with traditional Jie
Matter-metal-dielectric film structure is different, is designed in ZnS or ZnSe substrate using all dielectric thin-film material, anti-according to visible light
The mode for penetrating infrared transmission is divided, it is seen that the light spectroscopical effeciency that is averaged reaches 80% or more, and LONG WAVE INFRARED is averaged spectroscopical effeciency
Reach 96% or more.
Detailed description of the invention
Fig. 1 is recombination dichroic elements of embodiment of the present invention structural schematic diagram；
Fig. 2 is the optical constant of ZnS of embodiment of the present invention substrate；
Fig. 3 is the optical constant of Ge of embodiment of the present invention film；
Fig. 4 is the optical constant of ZnS of embodiment of the present invention film；
Fig. 5 is YF of the embodiment of the present invention3The optical constant of film；
Fig. 6 is the spectral reflectivity curve of first surface of the embodiment of the present invention；
Fig. 7 is the spectral transmittance curve of second surface of the embodiment of the present invention；
Fig. 8 is the visible light wave range spectroscopical effeciency curve of recombination dichroic elements of the embodiment of the present invention；
Fig. 9 is the long wave band spectroscopical effeciency curve of recombination dichroic elements of the embodiment of the present invention.
Specific embodiment
To keep the purpose of the present invention, content and advantage clearer, with reference to the accompanying drawings and examples, to tool of the invention
Body embodiment is described in further detail.
The thought that the present embodiment is reflected based on visible light wave range, LONG WAVE INFRARED penetrates proposes that a kind of visible light and long wave are red
Outer all dielectric film recombination dichroic elements and design method.Optical multilayer is used on parallel flat material, operating angle is 45 °,
The light splitting of visible light wave range (0.4~0.7 μm) and long wave infrared region (7~10 μm) may be implemented.First of parallel flat
Surface A designs the optical multilayer of visible reflectance and LONG WAVE INFRARED transmission, and what second surface B design LONG WAVE INFRARED transmitted subtracts
Reflective film.The structure of the recombination dichroic elements is as shown in Figure 1.
The design method of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements that the present embodiment proposes, including walk as follows
It is rapid:
Selected reference wavelength λ0It is 0.55 μm, unit optical thickness is λ0/4.Select substrate Sub for ZnS, the light of ZnS substrate
It is as shown in Figure 2 to learn constant.Very high-index material A is Ge, and optical constant is as shown in Figure 3；High-index material H is ZnS, optics
Constant is as shown in Figure 4；Low-index material L is YF3, optical constant is as shown in Figure 5.
The optical multilayer of visible reflectance and LONG WAVE INFRARED transmission, initial film structure are designed on first surface A
Are as follows:
Sub|6A6H 17A5L 1A2H 0.8A2H 0.8A 1L 0.9H 1L 0.9H|Air
The film structure of first surface A is set in 0.4~0.7 μm of wavelength band internal reflection rate as maximum value, 7~10 μm
The transmissivity of wave band is maximum value；The film structure of first surface is optimized, the film structure after optimization are as follows:
Sub|6.2909A5.8140H 17.2803A4.7935L 1.0191A 1.9700H0.8362A2.0723H
0.8011A 1.0051L0.8961H 1.0646L 0.8865H|Air。
For the thin film physics of first surface A with a thickness of 2.086 μm, surface spectrum reflectivity is as shown in Figure 6.
The antireflection film of LONG WAVE INFRARED transmission, initial film structure are designed on second surface B are as follows:
Sub|5.9A 1.1L25.6A6.1H 4.2L5.5H|Air
The film structure of second surface is set in 7~10 μm of transmitance as maximum value, to the film structure of second surface
It optimizes, the film structure after optimization are as follows:
Sub|5.8815A 1.1000L26.3327A6.0937H 4.2000L 5.1938H|Air。
For the thin film physics of second surface B with a thickness of 2.207 μm, spectral transmittance is as shown in Figure 7.
The operating angle of recombination dichroic elements is 45 °.Visible light wave range (0.4~0.7 μm) is separated in a manner of reflection, light splitting effect
Rate is as shown in figure 8, average separative efficiency reaches 80% or more；Long wave infrared region (7~10 μm) separates in transmission mode, point
Light efficiency is as shown in figure 9, the mean transmissivity of 7~10 mu m wavebands is 96% or more.
The film thickness of the recombination dichroic elements of the present embodiment, first surface and second surface is suitable, between 2~2.3 μm,
Surface deformation caused by stress can be efficiently controlled.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, without departing from the technical principles of the invention, several improvement and deformations can also be made, these improvement and deformations
Also it should be regarded as protection scope of the present invention.
Claims (4)
1. the design method of a kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements, which is characterized in that the design side
Method includes the following steps:
Selected reference wavelength λ0It is 0.55 μm, unit optical thickness is λ0/4；Select substrate Sub for ZnS or ZnSe；Very high refraction
Rate materials A is Ge, and high-index material H is ZnS, and low-index material L is YF3；
The substrate is parallel plate structure, has opposite first surface and second surface；
The optical multilayer of visible reflectance and LONG WAVE INFRARED transmission, initial film structure are designed in the first surface are as follows:
Sub|6A 6H 17A 5L 1A 2H 0.8A 2H 0.8A 1L 0.9H 1L 0.9H|Air
The film structure of the first surface is set in λ0± 0.15 μm of wavelength band internal reflection rate is maximum value, 7~10 μm of waves
The transmissivity of section is maximum value；The film structure of the first surface is optimized, the film structure after optimization are as follows:
Sub|x1A x2H x3A x4L x5A x6H x7A x8H x9A x10L x11H x12L x13H|Air
Wherein, x1~x13The optical thickness coefficient of respectively every layer film；
In the antireflection film of second surface design LONG WAVE INFRARED transmission, initial film structure are as follows:
Sub|5.9A 1.1L 25.6A 6.1H 4.2L 5.5H|Air
The film structure of the second surface is set in 7~10 μm of transmitance as maximum value, to the membrane system of the second surface
Structure optimizes, the film structure after optimization are as follows:
Sub|y1A y2L y3A y4H y5L y6H|Air
Wherein, y1~y6The optical thickness coefficient of respectively every layer film；
The structure of final medium-wave infrared and LONG WAVE INFRARED recombination dichroic elements are as follows:
Air|x13H x12L x11H x10L x9A x8H x7A x6H x5A x4L x3A x2H x1A|Sub|y1A y2L y3A y4H
y5L y6H|Air
The operating angle of the recombination dichroic elements is 45 °.
2. design method as described in claim 1, which is characterized in that the film structure after the first surface optimization are as follows:
Sub|6.2909A 5.8140H 17.2803A 4.7935L 1.0191A 1.9700H 0.8362A 2.0723H
0.8011A 1.0051L 0.8961H 1.0646L 0.8865H|Air。
3. design method as described in claim 1, which is characterized in that the film structure after the second surface optimization are as follows:
Sub|5.8815A 1.1000L 26.3327A 6.0937H 4.2000L 5.1938H|Air。
4. a kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements, which is characterized in that the recombination dichroic elements are using above-mentioned
Design method described in any one claim obtains.
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| CN110989183B (en) * | 2019-12-30 | 2021-08-03 | 长春理工大学 | Spectroscope for marine multi-dimensional imaging system, preparation method and design method thereof |
| CN112068311A (en) * | 2020-09-08 | 2020-12-11 | 西安应用光学研究所 | Infrared, laser and millimeter wave common-caliber three-mode seeker optical system |
| CN112285063B (en) * | 2020-09-24 | 2023-06-09 | 天津津航技术物理研究所 | Characterization method of ultra-thin metal film infrared optical constant |
| CN113960709A (en) * | 2021-11-19 | 2022-01-21 | 天津津航技术物理研究所 | Large-caliber wide-angle spectrum optical filter and preparation method thereof |
| CN117092726B (en) * | 2023-08-30 | 2024-02-13 | 有研国晶辉新材料有限公司 | Optical element and preparation method thereof |
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| CN1097254A (en) * | 1992-10-16 | 1995-01-11 | 陶氏化学公司 | All-polymeric cold mirror |
| CN105842857A (en) * | 2016-04-28 | 2016-08-10 | 西安应用光学研究所 | Film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m |
| CN106291792A (en) * | 2016-11-04 | 2017-01-04 | 天津津航技术物理研究所 | A kind of infrared color separation film and preparation method thereof |
| CN106324738A (en) * | 2016-11-04 | 2017-01-11 | 天津津航技术物理研究所 | Long-wave infrared filter and method for preparing same |
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| JP5741283B2 (en) * | 2010-12-10 | 2015-07-01 | 旭硝子株式会社 | Infrared light transmission filter and imaging apparatus using the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1097254A (en) * | 1992-10-16 | 1995-01-11 | 陶氏化学公司 | All-polymeric cold mirror |
| CN105842857A (en) * | 2016-04-28 | 2016-08-10 | 西安应用光学研究所 | Film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m |
| CN106291792A (en) * | 2016-11-04 | 2017-01-04 | 天津津航技术物理研究所 | A kind of infrared color separation film and preparation method thereof |
| CN106324738A (en) * | 2016-11-04 | 2017-01-11 | 天津津航技术物理研究所 | Long-wave infrared filter and method for preparing same |
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