CN105842857A - Film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m - Google Patents
Film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m Download PDFInfo
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- G—PHYSICS
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
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- G—PHYSICS
- G02—OPTICS
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
- G02B27/1013—Beam splitting or combining systems for splitting or combining different wavelengths for colour or multispectral image sensors, e.g. splitting an image into monochromatic image components on respective sensors
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Abstract
The present invention provides a film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m. The film system structure comprises a ZnS substrate and a color separation film system, and the color separation film system is made of three film materials; the number of the film layers is 51, wherein the first layer and the 51th layer are oxidation zirconium film layer, the even layers from the second layer to the 50th layer are ytterbium fluoride film layers and the odd layers from the second layer to the 50th layer are zinc sulfide film layers. The transmittance is smaller than 2% with the waveband from 0.5 to 0.8 [Mu]m; the transmittance is smaller than 1% with the laser waveband of 1.064 [Mu]m; and the transmittance is larger than 95% with the medium wave infrared band from 3.7 to 4.8 [Mu]m. The film system structure is small in the number of layers, small in thickness, low in plating difficulty, good in technology repeatability, high in obtained film firmness and good in spectral property, is able to satisfy the use requirement of multi-waveband co-window optoelectronic system and the work requirement in the condition of the inclination with 45 degrees, and stand against the environment tests such as high and low temperature storage, temperature impact and the like, the adhesion test and the moderate friction test.
Description
Technical field
The invention belongs to optical film technology field, be specially a kind of ZnS substrate anti-0.5～0.8 μm visible ray and 1.064
μm laser the film structure of saturating 3.7～4.8 μm medium-wave infrared dichroic coatings, for airborne, carrier-borne, vehicular photoelectric platform multiband
Altogether in the optical system of light path.
Background technology
Current electro-optical system platform constantly, maneuverability, multifunctional unit little towards volume, the direction of round-the-clock use are sent out
Exhibition, multiband altogether window technique application in electro-optical system platform is more and more extensive, has target acquistion/follow the tracks of and monitor merit
Can modernization optical sensor system all by multiple sensor combinations in single component, these sensors include visible image capturing
Machine and medium-wave infrared thermal imaging system, FLIR (FLIR) and range finder using laser.These systems combined all are passed through one and are led to
Observe with aperture window, thus realize the miniaturization of electro-optical system platform, multifunctional unit, the purpose of round-the-clock use.Adopt
In optical system with multiband light road technique altogether, color separation filter is the Primary Component directly determining whole system performance.
ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser, saturating 3.7～4.8 dichroic coating masters of μm medium-wave infrared
Apply in the electro-optical system of multiband light path altogether.The most anti-visible and laser, saturating medium-wave infrared dichroic coating film layer is the thickest,
General all at 60 to 80 layers, and when film layer to work under 45 ° of tilt condition, and can only come to increase the method for dieletric reflection heap
Solving zone of reflections width problem, cause the film system number of plies more, thickness is bigger, causes manufacture difficulty the highest.Due to thicknesses of layers
Greatly, thus film layer to be coated with the time the longest, film thickness monitoring precision and technology stability are required higher；Film forming layer can be made simultaneously
Cumulative stress, controls error accumulation, and film layer absorption loss water is accumulated, film layer structure defect scattering loss accumulation etc., makes the film of deposition
Layer spectrum property is poor, and firmness is low, and easily occur chapping even demoulding.
0.5～0.8 μm visible ray anti-for ZnS substrate and 1.064 μm laser, saturating 3.7～4.8 μm medium-wave infrared dichroic coatings
Film structure, currently without find pertinent literature report.It is investigated new, close document has, and pays elegant China and waits the 5th phase in 2009
The paper of entitled " visible-infrared multiwave optical thin film at the bottom of zinc sulfide-based " delivered by " infrared and laser engineering " periodical, should
Paper discloses author and utilizes ZnS and YbF3The multilayer film that bi-material is constituted, it is achieved that 0.4 μm～visible and 8 μm of 0.7 μm
～12 the infrared band of μm high thoroughly, the laser of 1.064 μm and 1.54 μm is high anti-.In paper, film system is due to the difference of light splitting wave band,
Film structure is relatively easy, and the number of plies is few, and it is low that film layer is coated with difficulty.
Feng Jun has just waited and has delivered entitled " anti-visible, mid-infrared, thoroughly at the 4th phase in 2004 " optical precision engineering " periodical
The development of 10.6 μm superlaser dichroic mirrors " paper, the article disclose author and utilize ZnSe and YbF3Bi-material is constituted
Multilayer film, and obtain the preferable sample of spectrum property, basically reach ideal indicator.In paper, film system light splitting wave band is different,
Zinc selenide material is used to be designed, bigger in the absorption loss of visible light wave range.
Summary of the invention
Solve the technical problem that
For solving the problem that prior art exists, the present invention propose a kind of ZnS substrate anti-0.5～0.8 μm visible ray and
1.064 μm laser the film structure of saturating 3.7～4.8 μm medium-wave infrared dichroic coatings, in the case of 45 ° of oblique incidences, it is achieved
0.5～0.8 μm visible ray and the reflection of 1.064 μm laser height, 3.7～4.8 μm medium-wave infrared wave bands are highly transmissive.In 0.5～0.8 μm
Wave band, transmitance is less than 2%；At 1.064 μm laser wavelengths, transmitance is less than 1%；Saturating at 3.7～4.8 μm medium-wave infrared wave bands
Rate of penetrating is more than 95%.This film structure has that the number of plies is few, thickness is little, it is relatively low to be coated with difficulty, the feature of good process repeatability,
The film layer firmness obtained is high, and spectrum property is excellent, it is possible to meets the use requirement of multiband window electro-optical system altogether, meets
Job requirement under 45 ° of tilt condition, and be able to take high and low temperature storage, the environmental test such as temperature shock, adhesion test and in
Degree friction test.
Technical scheme
The technical scheme is that
Described a kind of ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser saturating 3.7～4.8 μm medium-wave infrareds
The film structure of dichroic coating, it is characterised in that: include ZnS substrate and color separation membrane system；Described color separation membrane system is by three kinds of thin film
Film stacking prepared by material adds composition；Film number layer by layer amounts to 51 layers, and wherein the 1st layer and the 51st layer is zirconium oxide film layer, and the 2nd layer is arrived
Even level in 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level；Each thicknesses of layers is:
Beneficial effect
Present invention employs hardness and intensity is of a relatively high, Stress match is preferable, visible to the absorption of medium-wave infrared wave band
Relatively low ZnS, YbF3Two kinds of thin-film material combinations constitute assembly of thin films, and use ZrO2Transition zone technology and protective layer skill
Art, solves the film pull-up caused due to stress in thin film accumulation and falls or chap, improve the intensity of film layer, firmness.At base
Use non-extreme value layer to realize mating of refractive index between the end with film layer, film layer and air, be effectively compressed passband ripple, significantly
Improve the transmitance of passband, reduce the gross thickness of film layer simultaneously, reduce film layer process for plating difficulty, relatively improve film
The control accuracy of layer thickness.At 0.5～0.8 mu m waveband, transmitance is less than 2%；At 1.064 μm laser wavelengths, transmitance is less than
1%；In 3.7～4.8 μm medium-wave infrared wavelength region rates more than 95%.And it is attached to be able to take 3.4.1.1 in " GJB 2485-95 "
The storage test of adhesion tests, 3.4.1.3 moderate friction test, 3.4.2.1 high/low temperature, " GJB 150.5A-2009 " temperature shock
Environmental test.
Accompanying drawing explanation
Fig. 1 be ZnS substrate anti-0.5～0.8 μm visible ray of the present invention and 1.064 μm laser, saturating 3.7～4.8 μm medium wave red
The film structure schematic diagram of outer dichroic coating.
Fig. 2 is the transmittance graph of the embodiment of the present invention 1.
Fig. 3 is the transmittance graph of the embodiment of the present invention 2.
Fig. 4 is the transmittance graph of the embodiment of the present invention 3.
Fig. 5 is the transmittance graph of the embodiment of the present invention 4.
Fig. 6 is the transmittance graph of the embodiment of the present invention 5.
Detailed description of the invention
ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser saturating 3.7～4.8 μm medium-wave infrared dichroic coatings
Film structure includes ZnS substrate and color separation membrane system.The film stacking that described color separation membrane system is prepared by three kinds of thin-film materials adds structure
Become.Wherein, the first film layer is that zirconium oxide is coated on the surface of described ZnS substrate；Second film layer is fluorination ytterbium, is coated on described
On first film layer；Third membrane layer is zinc sulfide, is coated on described second film layer；4th film layer is fluorination ytterbium, and is coated on institute
State in third membrane layer；..., ZnS-film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st film layer is oxidation
Zirconium, is coated on described 50th film layer.The i.e. film of color separation membrane system number layer by layer amounts to 51 layers, and the 1st layer and the 51st layer is oxidation
Zirconium film layer, the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level.
The thickness of described first to the 51st film layer is shown in Table one.
The thickness of each tunic of table one
This film structure is mainly used in the electro-optical system of multiband light path altogether, can be by the visible ray in main optical path with sharp
Light separates with medium-wave infrared light, and the color separation filter being coated with this film layer is the crucial device directly determining whole system performance
Part.May be implemented in 0.5～0.8 mu m waveband, transmitance is less than 2%；At 1.064 μm laser wavelengths, transmitance is less than 1%；3.7
～4.8 μm medium-wave infrared wavelength region rate more than 95%.And it is able to take the environmental tests such as high/low temperature storage, temperature shock, logical
Cross adhesive force and moderate friction test.
Below in conjunction with specific embodiment the present invention described:
Embodiment 1: transparent substrate uses multispectral ZnS, and the film stacking that color separation membrane system is prepared by three kinds of thin-film materials adds
Constitute.Wherein, the first film layer is zirconium oxide, is coated on the surface of described ZnS substrate；Second film layer is fluorination ytterbium, is coated on
On described first film layer；Third membrane layer is zinc sulfide, is coated on described second film layer；4th film layer is fluorination ytterbium, and is coated with
In described third membrane layer；The like, ZnS-film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st film layer
For zirconium oxide, it is coated on described 50th film layer.The i.e. film of color separation membrane system number layer by layer amounts to 51 layers, the 1st layer and the 51st layer
For zirconium oxide film layer, the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level.Described first
Thickness to the 51st film layer is shown in Table two.
The thickness of each tunic of table two embodiment 1
Obtaining this film layer 0.5～0.8 mu m waveband after tested, mean transmissivity is 1.674%；At 1.064 μm laser wavelengths,
Transmitance is 0.771%；It is 95.747% in 3.7～4.8 μm medium-wave infrared wave band average transmittance, sees Fig. 2.
Embodiment 2: transparent substrate uses multispectral ZnS, and the film stacking that color separation membrane system is prepared by three kinds of thin-film materials adds
Constitute.Wherein, the first film layer is that zirconium oxide is coated with, on the surface of described ZnS substrate；Second film layer is fluorination ytterbium, is coated on
On described first film layer；Third membrane layer is zinc sulfide, is coated on described second film layer；4th film layer is fluorination ytterbium, and is coated with
In described third membrane layer；The like, ZnS-film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st film layer
For zirconium oxide, it is coated on described 50th film layer.The i.e. film of color separation membrane system number layer by layer amounts to 51 layers, the 1st layer and the 51st layer
For zirconium oxide film layer, the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level.Described first
Thickness to the 51st film layer is shown in Table three.
The thickness of each tunic of table three embodiment 2
Obtaining this film layer 0.5～0.8 mu m waveband after tested, mean transmissivity is 1.612%；At 1.064 μm laser wavelengths,
Transmitance is 0.766%；It is 95.734% in 3.7～4.8 μm medium-wave infrared wave band average transmittance, sees Fig. 3.
Embodiment 3: transparent substrate uses multispectral ZnS, the film layer that color separation membrane system is prepared by three kinds of thin-film materials is alternately
Superposition is constituted.Wherein, the first film layer is zirconium oxide, is coated on the surface of described ZnS substrate；Second film layer is fluorination ytterbium, plating
System is on described first film layer；Third membrane layer is zinc sulfide, is coated on described second film layer；4th film layer is fluorination ytterbium, and
It is coated in described third membrane layer；The like, ZnS-film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st
Film layer is zirconium oxide, is coated on described 50th film layer.The i.e. film of color separation membrane system number layer by layer amounts to 51 layers, the 1st layer and the
51 layers is zirconium oxide film layer, and the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level.Described
The thickness of the first to the 51st film layer is shown in Table four.
The thickness of each tunic of table four embodiment 3
Obtaining this film layer 0.5～0.8 mu m waveband after tested, mean transmissivity is 1.606%；At 1.064 μm laser wavelengths,
Transmitance is 0.743%；It is 95.757% in 3.7～4.8 μm medium-wave infrared wave band average transmittance, sees Fig. 4.
Embodiment 4: transparent substrate uses multispectral ZnS, the film layer that color separation membrane system is prepared by three kinds of thin-film materials is alternately
Superposition is constituted.Wherein, the first film layer is zirconium oxide, is coated on the surface of described ZnS substrate；Second film layer is fluorination ytterbium, plating
System is on described first film layer；Third membrane layer is zinc sulfide, is coated on described second film layer；4th film layer is fluorination ytterbium, and
It is coated in described third membrane layer；The like, ZnS-film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st
Film layer is zirconium oxide, is coated on described 50th film layer.The i.e. film of color separation membrane system number layer by layer amounts to 51 layers, the 1st layer and the
51 layers is zirconium oxide film layer, and the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level.Described
The thickness of the first to the 51st film layer is shown in Table five.
The thickness of each tunic of table five embodiment 4
Obtaining this film layer 0.5～0.8 mu m waveband after tested, mean transmissivity is 1.692%；At 1.064 μm laser wavelengths,
Transmitance is 0.945%；It is 95.763% (seeing Fig. 5) in 3.7～4.8 μm medium-wave infrared wave band average transmittance.
Embodiment 5: transparent substrate uses multispectral ZnS, the film layer that color separation membrane system is prepared by three kinds of thin-film materials is alternately
Superposition is constituted.Wherein, the first film layer is zirconium oxide, is coated on the surface of described ZnS substrate；Second film layer is fluorination ytterbium, plating
System is on described first film layer；Third membrane layer is zinc sulfide, is coated on described second film layer；4th film layer is fluorination ytterbium, and
It is coated in described third membrane layer；The like, ZnS-film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st
Film layer is zirconium oxide, is coated on described 50th film layer.The i.e. film of color separation membrane system number layer by layer amounts to 51 layers, the 1st layer and the
51 layers is zirconium oxide film layer, and the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level.Described
The thickness of the first to the 51st film layer is shown in Table six.
The thickness of each tunic of table six embodiment 5
Obtaining this film layer 0.5～0.8 mu m waveband after tested, mean transmissivity is 1.622%；At 1.064 μm laser wavelengths,
Transmitance is 0.627%；It is 95.693% (seeing Fig. 6) in 3.7～4.8 μm medium-wave infrared wave band average transmittance.
Claims (6)
1. a ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser saturating 3.7～4.8 μm medium-wave infrared dichroic coatings
Film structure, it is characterised in that: include ZnS substrate and color separation membrane system；Described color separation membrane system is by three kinds of thin-film material systems
Standby film stacking adds composition；Film number layer by layer amounts to 51 layers, and wherein the 1st layer and the 51st layer is zirconium oxide film layer, the 2nd layer to the 50th layer
In even level be ZnS-film layer for fluorination ytterbium film layer, odd-level；Each thicknesses of layers is:
A kind of ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser saturating 3.7～4.8
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that: include ZnS substrate and color separation membrane system；Described color separation membrane system
The film stacking prepared by three kinds of thin-film materials adds and constitutes；Film number layer by layer amounts to 51 layers, and wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level；Each thicknesses of layers is:
A kind of ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser saturating 3.7～4.8
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that: include ZnS substrate and color separation membrane system；Described color separation membrane system
The film stacking prepared by three kinds of thin-film materials adds and constitutes；Film number layer by layer amounts to 51 layers, and wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level；Each thicknesses of layers is:
A kind of ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser saturating 3.7～4.8
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that: include ZnS substrate and color separation membrane system；Described color separation membrane system
The film stacking prepared by three kinds of thin-film materials adds and constitutes；Film number layer by layer amounts to 51 layers, and wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level；Each thicknesses of layers is:
A kind of ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser saturating 3.7～4.8
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that: include ZnS substrate and color separation membrane system；Described color separation membrane system
The film stacking prepared by three kinds of thin-film materials adds and constitutes；Film number layer by layer amounts to 51 layers, and wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level；Each thicknesses of layers is:
A kind of ZnS substrate anti-0.5～0.8 μm visible ray and 1.064 μm laser saturating 3.7～4.8
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that: include ZnS substrate and color separation membrane system；Described color separation membrane system
The film stacking prepared by three kinds of thin-film materials adds and constitutes；Film number layer by layer amounts to 51 layers, and wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is ZnS-film layer for fluorination ytterbium film layer, odd-level；Each thicknesses of layers is:
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| CN107132603A (en) * | 2017-05-27 | 2017-09-05 | 中国科学院上海技术物理研究所 | It is a kind of from ultraviolet to the low polarization sensitivity color separation film of the wide spectrum of short-wave infrared |
| CN107290814A (en) * | 2017-08-15 | 2017-10-24 | 天津津航技术物理研究所 | A kind of visible ray, laser and middle-infrared band all dielectric film recombination dichroic elements and design method |
| CN107300782A (en) * | 2017-08-15 | 2017-10-27 | 天津津航技术物理研究所 | A kind of visible ray near-infrared middle-infrared band lasing safety window and design method |
| CN107300783A (en) * | 2017-08-15 | 2017-10-27 | 天津津航技术物理研究所 | A kind of visible ray, laser and middle-infrared band recombination dichroic elements and design method |
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| CN112578481A (en) * | 2020-12-11 | 2021-03-30 | 中材人工晶体研究院有限公司 | Large-angle medium-long wave infrared anti-reflection protective film and preparation method thereof |
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