CN107300783B - A kind of visible light, laser and middle infrared band recombination dichroic elements and design method - Google Patents
A kind of visible light, laser and middle infrared band recombination dichroic elements and design method Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000013461 design Methods 0.000 title abstract description 13
- 230000006798 recombination Effects 0.000 title abstract 2
- 238000005215 recombination Methods 0.000 title abstract 2
- 230000003287 optical effect Effects 0.000 claims abstract description 113
- 238000000926 separation method Methods 0.000 claims abstract description 29
- 230000005540 biological transmission Effects 0.000 claims abstract description 19
- 239000010409 thin film Substances 0.000 claims abstract description 6
- 239000010408 film Substances 0.000 claims description 68
- 239000000758 substrate Substances 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 24
- 238000002834 transmittance Methods 0.000 claims description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
- 239000005350 fused silica glass Substances 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 229910052681 coesite Inorganic materials 0.000 claims description 4
- 229910052906 cristobalite Inorganic materials 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 229910052682 stishovite Inorganic materials 0.000 claims description 4
- 229910052905 tridymite Inorganic materials 0.000 claims description 4
- 238000002310 reflectometry Methods 0.000 claims description 3
- 238000005457 optimization Methods 0.000 claims description 2
- 239000012788 optical film Substances 0.000 abstract description 2
- 230000008033 biological extinction Effects 0.000 abstract 2
- 230000003595 spectral effect Effects 0.000 description 24
- 238000001228 spectrum Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000010365 information processing Effects 0.000 description 2
- 238000003331 infrared imaging Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
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- G—PHYSICS
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
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- G—PHYSICS
- G02—OPTICS
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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Abstract
The invention belongs to optical film technology fields, and in particular to a kind of visible light wave range (0.6~0.9 μm) and (1.06 μm) of laser wavelength reflections, (3.0~5.0 μm) of the middle infrared band recombination dichroic elements and design method transmitted.The present invention uses two pieces of operating angles for 45 ° of parallel flat optical element, pass through the reasonable selection to flat optical element two sides optical thin film, successively according to infrared band transmission, visible reflectance and swashs light transmissive method and carry out color separation, the average mark backscatter extinction logarithmic ratio of middle infrared band reaches 96% or more, visible light average mark backscatter extinction logarithmic ratio reaches 98% or more, and the light splitting coefficient of 1.06 mu m wavebands reaches 98% or more.
Description
Technical Field
The invention belongs to the technical field of optical films, particularly relates to a light splitting film technology of three wave bands, and particularly relates to a color splitting element with reflection of a visible light wave band (0.6-0.9 mu m) and a laser wave band (1.06 mu m) and transmission of a middle infrared wave band (3.0-5.0 mu m) and a design method.
Background
The modern photoelectric tracking aiming pod has the integrated functions of capturing, tracking and aiming, is one of key large-scale photoelectric equipment of modern air force, generally adopts methods of infrared imaging, television tracking, laser ranging/indicating and the like, and is an important system component of an airplane in air battle. The photoelectric pod integrates the functions of infrared imaging, television tracking and laser ranging, and an optical system of the photoelectric pod basically adopts a common-caliber light combining and splitting system. At present, the advanced pod in foreign countries adopts a scheme that three lights such as a television, a laser and an infrared share a front-end optical system, and then information processing is carried out on each light path. Therefore, the light splitting element is one of the core elements of the subsequent spectral band imaging and information processing in the photoelectric pod optical system.
At present, the spectral separation of the broad spectrum can only adopt the optical thin film technology, and the interference principle of the optical thin film is utilized to realize the modulation of the light energy so as to separate the spectrum. Since the visible light band to the medium-wave infrared covers a wide spectral range, the optical multilayer film can be used after the light transmittance of the substrate is considered in the spectral separation. The light splitting in the visible light wave band and the infrared wave band generally adopts the modes of visible light wave band transmission and infrared wave band reflection, and the mode adopts the mode of designing a medium-metal-medium film on the surface of a visible light transparent substrate, and utilizes the reflection characteristic and the induced transmission characteristic of metal. The research institute of the North China photoelectric technology successfully develops the wide spectral band color separation sheet with high transmittance of 0.4-1.1 mu m and high reflectance of middle and far infrared of 3-25 mu m, and the research institute of the optical application of the Western' an successfully develops the wide spectral band color separation filter with transmission of 0.45-1.6 mu m and reflection of 8-12 mu m. The light splitting mode is mainly suitable for the wide spectral band, but the defects are that the spectrum transition is slow, the spectrum resources in the transition region cannot be fully utilized, and when the spectrum of the transmission region is wide, the metal film layer is thin and is not easy to prepare. The light splitting method adopting the all-dielectric film has no advantage for separating a wider spectrum, but is easy to prepare and good in stability, and can solve the light splitting problem of a television, laser and infrared three-light common-path system.
In order to realize the separation of visible light wave band, laser wave band and medium wave infrared wave band, the invention provides a color separation element of visible light wave band, laser wave band and medium wave infrared wave band and a design method thereof.
Disclosure of Invention
Technical problem to be solved
The invention provides a visible light, laser and mid-infrared band color separation element and a design method thereof, which aim to solve the technical problems that under the condition of common optical path transmission of visible light, laser and mid-infrared band, a visible light band (0.6-0.9 mu m), a laser band (1.06 mu m) and a mid-infrared band (3.0-5.0 mu m) are separated into three optical paths, and the light separation efficiency of each spectral band is improved as much as possible.
(II) technical scheme
In order to solve the above technical problem, the present invention provides a visible light, laser and mid-infrared band dichroic element, which comprises two parallel flat optical elements with a working angle of 45 °, wherein a first surface of a first flat optical element is opposite to a first surface of a second flat optical element; visible light wave band is 0.6-0.9 μm, laser wave band is 1.06 μm, and intermediate infrared wave band is 3.0-5.0 μm;
the first flat optical element uses a silicon substrate, and an optical multilayer color separation film with visible light waveband and laser waveband reflection and intermediate infrared waveband transmission is arranged on the first surface of the silicon substrate; a second surface of the silicon substrate, which is opposite to the first surface, is provided with a middle infrared band antireflection optical multilayer film;
the second flat plate optical element uses a fused quartz or glass substrate, and an optical multilayer color separation film with visible light waveband reflection and laser waveband transmission is arranged on the first surface of the fused quartz or glass substrate; an antireflection optical multilayer film having a laser light wavelength band on a second surface of the fused silica or glass substrate opposite to the first surface; wherein,
the first flat optical element has the following specific structure:
Air|x25Hx24Lx23H……x4Lx3H x2Lx1H|Sub|y1H’y2L’y3H’y4L’
y5M|Air
the substrate Sub is a silicon substrate, and H and L are high-refractive-index and low-refractive-index materials of the first surface respectively; h 'and L' are respectively high refractive index and low refractive index materials of the second surface, M is a medium refractive index material, and the unit optical thickness is lambda0/4，λ0Is a reference wavelength; x is the number of1～x25The optical thickness coefficient of each layer of film of the first surface is respectively; y is1～y5Respectively, the optical thickness coefficient of each film layer of the second surface.
Further, the high refractive index material of the first surface of the first flat optical element is Si, and the low refractive index material is SiO2(ii) a The second surface of the first flat optical element is made of Ge as high refractive index material and YF as low refractive index material3And the intermediate refractive index material is ZnS.
Further, the specific structure of the first surface of the first flat optical element is as follows:
Sub|2.0658H 0.1335L4.9438H 0.2804L 1.9670H 0.4191L 1.7501H0.6748L1.4928H 1.4128L 1.4595H 0.5955L 1.1344H 1.1176L 1.3968H0.5952L 1.0274H0.5330L 0.9159H 0.9536L 0.5335H 1.4038L 0.1548H
1.4737L 0.3959H|Air；
the second surface of the first flat optical element has the following specific structure:
Sub|7.7189H’0.2885L’2.2440H’1.7503L’1.6387M|Air。
further, the specific structure of the second flat optical element is as follows:
Air|α6Hα5Lα4H 1L(1H 1L)^8α3Hα2L α1H|Sub’|β1Hβ2L|Air
wherein the substrate Sub' is a fused silica or glass substrate having a unit optical thickness of λ0’/4，λ0' is a second reference wavelength, α1～α6The optical thickness coefficient of each film on the first surface of the second flat optical element β1～β2The optical thickness coefficient of each film layer of the second surface of the second flat optical element.
Further, the specific structure of the first surface of the second flat optical element is as follows:
Sub’|0.3227H 1.3957L 0.7061H(1L 1H)^81L 0.9286H 1.1779L
0.3915H|Air；
the second surface of the second flat optical element has the following specific structure:
Sub’|0.1832H 1.9525L|Air。
in addition, the invention also provides a design method of the color separation element, and the design method of the specific structure of the first flat optical element comprises the following steps:
selected reference wavelength lambda00.9 μm;
setting an initial film system structure of the first surface of the first plate optical element to Sub |0.6(0.5H 1L0.5H) ^40.8(0.5H 1L0.5H) ^4(0.5H 1L0.5H) ^4| Air;
setting the first surface of the first flat optical element in the wavelength range lambda0The reflectivity in the waveband range of +/-0.3 mu m is the maximum value, and the transmittance in the waveband range of 3.0-5.0 mu m is the maximum value; optimizing the initial film system structure of the first surface, wherein the optimized film system structure of the first surface is as follows:
Sub|x1Hx2Lx3H x4L……x23H x24Lx25H|Air
setting an initial film system structure of the second surface of the first flat optical element to Sub |8.0H '0.3L' 2.2H '1.8L' 1.6M | Air;
setting the transmittance of the second surface of the first flat optical element in the wavelength range of 3.0-5.0 μm as the maximum value, and optimizing the initial film system structure of the second surface, wherein the optimized film system structure of the second surface is as follows:
Sub|y1H’y2L’y3H’y4L’y5M|Air。
in addition, the invention also provides a design method of the color separation element, and the design method of the specific structure of the second flat plate optical element comprises the following steps:
selecting a second reference wavelength λ0' is 0.77 μm;
setting the initial film system structure of the first surface of the second plate optical element to Sub' | (0.5H 1L0.5H) ^11| Air;
setting the transmittance of the first surface of the second flat plate optical element in a wave band range of 1.06 +/-0.03 mu m as a maximum value, and optimizing the initial film system structure of the first surface, wherein the optimized film system structure of the first surface is as follows:
Sub’|α1Hα2Lα3H(1L 1H)^81Lα4Hα5Lα6H|Air
setting the initial film system structure of the second surface of the second flat optical element to Sub' |0.2H 2.0L | Air;
setting the transmittance of the second surface of the second flat plate optical element in the wavelength range of 1.06 +/-0.01 mu m as a maximum value, and optimizing the initial film system structure of the second surface, wherein the optimized film system structure of the second surface is as follows:
Sub’|β1Hβ2L|Air。
(III) advantageous effects
The invention provides a visible light, laser and mid-infrared band color separation element and a design method thereof, wherein two parallel flat optical elements with working angles of 45 degrees are adopted to carry out color separation in sequence according to infrared band transmission, visible light reflection and laser transmission methods, the average spectral coefficient of a mid-infrared band reaches more than 96 percent, the average spectral coefficient of visible light reaches more than 98 percent, and the spectral coefficient of a 1.06 mu m band reaches more than 98 percent.
Drawings
FIG. 1 is a schematic structural diagram of a color separation device according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a first planar optical element according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a second planar optical element according to an embodiment of the present invention;
FIG. 4 is an optical constant of a Si thin film according to an embodiment of the present invention;
FIG. 5 shows SiO in an embodiment of the present invention2Optical constants of the film;
FIG. 6 is a graph of spectral reflectance of a first surface A according to an embodiment of the present invention;
FIG. 7 shows the optical constants of Ge films in accordance with an embodiment of the present invention;
FIG. 8 is a diagram of an embodiment of YF of the present invention3Optical constants of the film;
FIG. 9 shows optical constants of a ZnS thin film according to an embodiment of the present invention;
FIG. 10 is a graph of the spectral transmittance of a second surface B according to an embodiment of the present invention;
FIG. 11 is a graph of spectral transmittance of a first surface C according to an embodiment of the present invention;
FIG. 12 is a graph of spectral transmittance of a second surface D in accordance with an embodiment of the present invention;
fig. 13 is a spectral efficiency curve of the dichroic filter according to the embodiment of the present invention.
Detailed Description
In order to make the objects, contents and advantages of the present invention clearer, the following detailed description of the embodiments of the present invention will be made in conjunction with the accompanying drawings and examples.
The present embodiment provides a visible light, laser and mid-infrared wavelength range color separation device, which has a structure as shown in fig. 1. The dichroic filter includes two parallel plate optical elements having a working angle of 45 °, wherein a first surface of the first plate optical element is opposite to a first surface of the second plate optical element. The intermediate infrared band is separated in a transmission mode, the visible light band is separated in a secondary reflection mode, and the laser band is separated in a reflection and transmission mode.
The structure of the first flat optical element is shown in fig. 2. A silicon substrate is used as a first flat optical element of the color separation optical element, and an optical multilayer color separation film with visible light waveband and laser waveband reflection and medium wave infrared waveband transmission is arranged on a first surface A of the silicon substrate; and a second surface B opposite to the first surface A and provided with a medium wave infrared band antireflection optical multilayer film.
The structure of the second plate optical element is shown in fig. 3. As the second flat optical element of the color separation optical element, a fused silica or glass substrate is used, and an optical multilayer color separation film having visible light band reflection and laser band transmission is provided on the first surface C of the fused silica or glass substrate; and an antireflection optical multilayer film having a laser light wavelength band at a second surface D opposite to the first surface C.
1. The design method of the specific structure of the first flat optical element comprises the following steps:
(1) selected reference wavelength lambda00.9 μm and a unit optical thickness of λ0/4。
(2) Selecting the high-refractive-index material H of the first surface A as Si, wherein the optical constants are shown in FIG. 4; the low refractive index material L is SiO2The optical constants are shown in FIG. 5.
(3) Setting the initial film system structure of the first surface A as follows: sub |0.6(0.5H 1L0.5H) ^40.8(0.5H 1L0.5H) ^4(0.5H 1L0.5H) ^4| Air;
(4) setting the reflectivity of the first surface A in a wave band range of 0.6-1.1 mu m as a maximum value, and setting the transmissivity of a wave band of 3.0-5.0 mu m as a maximum value; optimizing the initial film system structure of the first surface A, wherein the optimized film system structure of the first surface A is as follows:
Sub|2.0658H 0.1335L4.9438H 0.2804L 1.9670H 0.4191L 1.7501H0.6748L1.4928H 1.4128L 1.4595H 0.5955L 1.1344H 1.1176L 1.3968H0.5952L 1.0274H0.5330L 0.9159H 0.9536L 0.5335H 1.4038L 0.1548H
1.4737L 0.3959H|Air
the film physical thickness of the first surface a was 2.64 μm, and the surface spectral reflectance thereof was as shown in fig. 6.
(5) Selecting the high refractive index material H' of the second surface B as Ge, and the optical constants of the material are shown in FIG. 7; the low refractive index material L' is YF3The optical constants are shown in FIG. 8; the medium refractive index material M is ZnS, and its optical constants are shown in fig. 9.
(6) Setting the initial film system structure of the second surface B as Sub |8.0H '0.3L' 2.2H '1.8L' 1.6M | Air;
(7) setting the transmittance of the second surface B in the wavelength range of 3.0-5.0 μm as the maximum value, optimizing the initial film system structure of the second surface B, and after the optimization of the film system structure of the second surface B, the following steps are carried out: sub |7.7189H '0.2885L' 2.2440H '1.7503L' 1.6387M | Air.
The second surface B had a film physical thickness of 0.978 μm and a surface spectral transmittance as shown in FIG. 10.
2. The design method of the specific structure of the second flat optical element comprises the following steps:
(1) selected reference wavelength lambda00.77 μm and a unit optical thickness of λ0/4。
(2) Selecting the substrate Sub' as a fused silica material, and selecting the high-refractive-index material H of the first surface C as Si, wherein the optical constants of the high-refractive-index material H are shown in FIG. 4; the low refractive index material L is SiO2，
(3) The first surface C is a main structure of the color separation film, and the initial film system structure of the first surface C is set as follows: sub' | (0.5H1L 0.5.5H) ^11| Air;
(4) setting the transmittance of the first surface C in a wave band range of 1.06 +/-0.03 mu m of the wavelength range as a maximum value, optimizing three layers of an initial film system structure of the first surface C close to the substrate and three layers of the initial film system structure of the first surface C close to the air, and after optimizing the film system structure of the first surface C, respectively:
Sub’|0.3227H 1.3957L 0.7061H(1L 1H)^81L 0.9286H 1.1779L
0.3915H|Air；
the surface spectral transmittance of the first surface C is shown in fig. 11.
(5) The second surface D is an antireflection film with a laser waveband, and the initial film system structure of the second surface D is set as Sub' |0.2H 2.0L | Air;
(6) setting the transmittance of the second surface D in the wavelength range of 1.06 +/-0.01 mu m as a maximum value, and optimizing the initial film system structure of the second surface D, wherein the optimized film system structure of the second surface is as follows: sub' |0.1832H 1.9525L | Air.
The surface spectral transmittance of the second surface D is shown in fig. 12.
3. The first flat optical element and the second flat optical element are arranged according to the mode of figure 1 to form a final visible light, laser and mid-infrared band color separation element, and mid-infrared band transmission, visible light reflection and laser transmission are sequentially realized. The spectral efficiency of this dichroic filter is shown in fig. 13. Wherein, the average spectral coefficient of the middle infrared band reaches more than 96 percent, the average spectral coefficient of the visible light reaches more than 98 percent, and the spectral coefficient of the 1.06 mu m band reaches more than 98 percent.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.
Claims (7)
1. A visible light, laser and mid-infrared band color separation element is characterized in that the color separation element comprises two parallel flat optical elements with working angles of 45 degrees, and a first surface of a first flat optical element is opposite to a first surface of a second flat optical element; the visible light wave band is 0.6-0.9 μm, the laser wave band is 1.06 μm, and the mid-infrared wave band is 3.0-5.0 μm;
the first flat optical element uses a silicon substrate, and an optical multilayer color separation film with visible light waveband and laser waveband reflection and intermediate infrared waveband transmission is arranged on the first surface of the silicon substrate; a second surface of the silicon substrate opposite to the first surface is provided with a middle infrared band antireflection optical multilayer film;
the second flat plate optical element uses a fused quartz or glass substrate, and an optical multilayer color separation film with visible light waveband reflection and laser waveband transmission is arranged on the first surface of the fused quartz or glass substrate; an antireflection optical multilayer film having a laser wavelength band on a second surface of the fused silica or glass substrate opposite to the first surface; wherein,
the first flat optical element has the following specific structure:
Air|x25H x24L x23H……x4L x3H x2L x1H|Sub|y1H’y2L’y3H’y4L’y5M|Air
wherein, the substrate Sub is a silicon substrate, and H and L are high refractive index and low refractive index materials of the first surface respectively; h 'and L' are respectively high refractive index and low refractive index materials of the second surface, M is a medium refractive index material, and the unit optical thickness is lambda0/4，λ0Is a reference wavelength; x is the number of1～x25The optical thickness coefficient of each layer of film of the first surface is respectively; y is1～y5The optical thickness coefficient of each layer of thin film of the second surface is respectively.
2. The dichroic element as claimed in claim 1, wherein the high refractive index material of the first surface of the first plate optical element is Si and the low refractive index material is SiO2(ii) a The second surface of the first flat optical element is made of Ge with high refractive index and YF with low refractive index3And the intermediate refractive index material is ZnS.
3. The color separation element of claim 2,
the specific structure of the first surface of the first flat optical element is as follows:
Sub|2.0658H 0.1335L 4.9438H 0.2804L 1.9670H 0.4191L 1.7501H 0.6748L1.4928H 1.4128L 1.4595H 0.5955L 1.1344H 1.1176L 1.3968H 0.5952L 1.0274H0.5330L 0.9159H 0.9536L 0.5335H 1.4038L 0.1548H 1.4737L 0.3959H|Air；
the specific structure of the second surface of the first flat optical element is as follows:
Sub|7.7189H’0.2885L’2.2440H’1.7503L’1.6387M|Air。
4. the dichroic element as claimed in claim 2, wherein the second plate optical element is specifically configured as:
Air|α6H α5L α4H 1L(1H 1L)^8 α3H α2L α1H|Sub’|β1H β2L|Air
wherein the substrate Sub' is a fused silica or glass substrate having a unit optical thickness of λ0’/4，λ0' is a second reference wavelength, α1～α6The optical thickness coefficient of each film on the first surface of the second flat optical element β1～β2An optical thickness coefficient of each film for the second surface of the second flat optical element.
5. The dichroic element as claimed in claim 4,
the specific structure of the first surface of the second flat optical element is as follows:
Sub’|0.3227H 1.3957L 0.7061H(1L 1H)^8 1L 0.9286H 1.1779L 0.3915H|Air；
the second surface of the second flat optical element has a specific structure as follows:
Sub’|0.1832H 1.9525L|Air。
6. a method for designing a dichroic filter according to claim 2, wherein the specific structure of the first flat optical element is designed by the method comprising the steps of:
selecting a reference wavelengthλ00.9 μm;
setting an initial film system structure of the first surface of the first flat optical element to Sub |0.6(0.5H 1L0.5H) ^40.8(0.5H 1L0.5H) ^4(0.5H 1L0.5H) ^4| Air;
setting the first surface of the first flat optical element in a wavelength range λ0The reflectivity in the waveband range of +/-0.3 mu m is the maximum value, and the transmittance in the waveband range of 3.0-5.0 mu m is the maximum value; optimizing the initial film system structure of the first surface, wherein the film system structure of the first surface is optimized as follows:
Sub|x1H x2L x3H x4L……x23H x24L x25H|Air
setting an initial film system structure of the second surface of the first flat optical element to Sub |8.0H '0.3L' 2.2H '1.8L' 1.6M | Air;
setting the transmittance of the second surface of the first flat optical element in the wavelength range of 3.0-5.0 μm as the maximum value, and optimizing the initial film system structure of the second surface, wherein the optimized film system structure of the second surface is as follows:
Sub|y1H’y2L’y3H’y4L’y5M|Air。
7. a method for designing the dichroic filter according to claim 4, wherein the specific structure of the second flat optical element is designed by the method comprising the steps of:
selecting a second reference wavelength λ0' is 0.77 μm;
setting an initial film-system structure of the first surface of the second plate optical element to Sub' | (0.5H1L 0.5H) ^11| Air;
setting the transmittance of the first surface of the second flat plate optical element in a wave band range of 1.06 +/-0.03 mu m as a maximum value, and optimizing the initial film system structure of the first surface, wherein after the optimization of the film system structure of the first surface, the film system structure of the first surface is as follows:
Sub’|α1H α2L α3H(1L 1H)^8 1L α4H α5L α6H|Air
setting an initial film system structure of the second surface of the second flat optical element to Sub' |0.2H 2.0L | Air;
setting the transmittance of the second surface of the second flat optical element in the wavelength range of 1.06 +/-0.01 mu m as a maximum value, and optimizing the initial film system structure of the second surface, wherein the optimized film system structure of the second surface is as follows:
Sub’|β1H β2L|Air。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710694610.XA CN107300783B (en) | 2017-08-15 | 2017-08-15 | A kind of visible light, laser and middle infrared band recombination dichroic elements and design method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710694610.XA CN107300783B (en) | 2017-08-15 | 2017-08-15 | A kind of visible light, laser and middle infrared band recombination dichroic elements and design method |
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|---|---|
| CN107300783A CN107300783A (en) | 2017-10-27 |
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| CN108152973B (en) * | 2017-12-13 | 2020-07-17 | 北京华航无线电测量研究所 | Visible light and medium wave infrared common-caliber composite optical system |
| CN109696744B (en) * | 2018-12-04 | 2020-12-08 | 湖北久之洋红外系统股份有限公司 | Multiband integrated sensor optical system |
| CN109765685B (en) * | 2019-03-28 | 2021-12-24 | 西安应用光学研究所 | Double-view-field transmission type multi-sensor single-aperture optical system |
| CN110609573A (en) * | 2019-08-26 | 2019-12-24 | 核工业北京地质研究院 | Unmanned aerial vehicle carries high spectral remote sensing real-time monitoring system |
| CN111934191A (en) * | 2020-08-19 | 2020-11-13 | 苏州长光华芯光电技术有限公司 | Semiconductor laser coupling structure |
| CN115079314B (en) * | 2022-07-25 | 2024-01-16 | 无锡泓瑞航天科技有限公司 | Mid-infrared spectrum optical window suitable for low-temperature and high-temperature environments |
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