CN109975905A - Near infrared ray cut-off filter - Google Patents
Near infrared ray cut-off filter Download PDFInfo
- Publication number
- CN109975905A CN109975905A CN201811599549.1A CN201811599549A CN109975905A CN 109975905 A CN109975905 A CN 109975905A CN 201811599549 A CN201811599549 A CN 201811599549A CN 109975905 A CN109975905 A CN 109975905A
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- Prior art keywords
- refractive index
- near infrared
- infrared ray
- optical multilayer
- film
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- 238000002834 transmittance Methods 0.000 claims description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 34
- 230000005764 inhibitory process Effects 0.000 claims description 31
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 24
- 150000001875 compounds Chemical class 0.000 claims description 23
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 16
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 12
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 12
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 11
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 11
- 239000011521 glass Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
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- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000005083 Zinc sulfide Substances 0.000 claims description 3
- 239000002241 glass-ceramic Substances 0.000 claims description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 3
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 3
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 3
- 239000010980 sapphire Substances 0.000 claims description 3
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- 229940105963 yttrium fluoride Drugs 0.000 claims description 3
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 claims description 3
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 2
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- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 229910009973 Ti2O3 Inorganic materials 0.000 description 2
- 229910009848 Ti4O7 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
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- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical compound [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
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- 229910052715 tantalum Inorganic materials 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
Abstract
The present invention provides a kind of optical multilayer using the less number of plies and the near infrared ray cut-off filter of the photogenic oblique incidence ripple that is able to suppress high incidence angle.The near infrared ray cut-off filter is the near infrared ray cut-off filter for the 1st optical multilayer for having transparent substrate and being arranged at least one interarea of the transparent substrate, made of the low refractive index film that the refractive index at middle refractive index film and wavelength 500nm that it is 1.8~2.21 that 1st optical multilayer, which is by the refractive index at wavelength 500nm, is 1.45~1.49 is alternately laminated, there is the assembled unit of middle the refractive index film and the low refractive index film with 5~35 quantity, the central wavelength for the restricted wave-length coverage of light transmission for being incident in the 1st optical multilayer with 0 ° is 890nm~1200nm, the width of the wave-length coverage is 100nm~300nm.
Description
Technical field
The present invention relates near infrared ray cut-off filters, more particularly to close with optical multilayer on the transparent substrate
Infrared ray cut off filter.
Background technique
Charge-coupled device (Charge Coupled Device (CCD)) is used in digital camera, DV etc.
Imaging sensor, complementary metal oxide semiconductor (Complementary Metal Oxide Semiconductor
(CMOS)) imaging sensor etc. (hereinafter referred to as solid-state imager).However, the spectral characteristic of these solid-state imagers with
The visual sensory characteristics of people is compared, and has stronger sensitivity to infrared light.Therefore, in digital camera, DV etc.
In, carry out the spectrum correction using near infrared ray cut-off filter.
In recent years, the substitution as digital camera, DV, begins to use smart phone, equipped with solid-state image pickup
The thickness of the apparatus casing of element is just thinning.In turn, with the slimming of smart phone, miniaturization, the thickness of apparatus casing
Tend to be further thinning.Therefore, light is incident to from more extensive angle (high incidence angle) and is set to the intracorporal solid-state imager of shell.
If the incident angle of the known optical multilayer light becomes larger, (normal direction relative to optical multilayer is incident
The angle of light become larger), then the transmissison characteristic of light moves to short wavelength side.In addition, also being seen for the light transmitted through optical multilayer
The transmissivity part for measuring the visible light region of the light of high incidence angle declines such phenomenon (hereinafter, in the present specification, referred to as
" oblique incidence ripple (ripple) ").For common solid-state imaging apparatus, as long as the incident angle of light considers 0 °~35 ° or so
?.However, due to the slimming of shell as described above and the incident angle of light becomes much larger, it is desirable that such high incident
The light at angle also has desired optical characteristics.It is therefore desirable to obtain the optically filtering of desired optical characteristics under high incidence angle
Device.
Here, existing as the incident angle of light becomes larger, the slippage of transmissivity also becomes in above-mentioned oblique incidence ripple
Big such problems.For such problems, for example, proposing even if in the case where the incident angle of light is big, also inhibit light
Learn the technology of oblique incidence ripple caused by multilayer film (for example, referring to patent document 1).
Existing technical literature
Patent document
Patent document 1: No. 6119747 bulletins of Japanese Patent No.
Summary of the invention
However, inhibiting the composition of the photogenic oblique incidence ripple of high incident angle for realizing, exist more with high precision
Inhibit oblique incidence ripple, the film sum of optical multilayer becomes more trend, exists and is easy project as damage productivity.
The present invention is to complete in order to solve above-mentioned problem, and its purpose is to provide one kind to be able to use the less number of plies
Optical multilayer and inhibit the near infrared ray cut-off filter of the photogenic oblique incidence ripple of high incidence angle.
Near infrared ray cut-off filter of the invention is characterized in that, is to have transparent substrate and be arranged in the transparent base
The near infrared ray cut-off filter of the 1st optical multilayer at least one interarea of plate, the 1st optical multilayer is by wave
The middle refractive index film that refractive index at long 500nm is 1.8~2.21 and the refractive index at wavelength 500nm be 1.45~1.49 it is low
Made of refractive index film is alternately laminated, there is the combination of middle the refractive index film and the low refractive index film with 5~35 quantity
Unit, the central wavelength of the restricted wave-length coverage of transmission with 0 ° of incident light of the 1st optical multilayer for 890nm~
1200nm, the width of the wave-length coverage are 100nm~300nm.
In near infrared ray cut-off filter of the invention, the preferably described low refractive index film is by being selected from silica, magnesium fluoride, fluorine
Change the compound of one or more of calcium and yttrium fluoride or the mixture comprising one or more of these compounds is constituted, preferably
The middle refractive index film is by 1 in zirconium oxide, tantalum oxide, yttrium oxide, lanthanum titanate, zinc sulphide, titanium oxide and aluminium oxide
Kind or more compound or mixture comprising one or more of these compounds constitute.
Near infrared ray cut-off filter of the invention preferably has the 2nd light at least one interarea of the transparent substrate
Multilayer film is learned, the 2nd optical multilayer, which is by the refractive index at wavelength 500nm, to be more than 2.21 and be 2.8 high foldings below
Penetrate rate film and the low refractive index film it is alternately laminated made of, with 3~30 quantity have the high refractive index film with it is described low
The assembled unit of refractive index film, in the wave-length coverage for transmiting restricted limit of 0 ° of incident light of the 2nd optical multilayer
The a length of 700nm of cardiac wave is 100nm~300nm more than and less than 890nm, the width of the wave-length coverage.
In near infrared ray cut-off filter of the invention, the preferably described high refractive index film by selected from tantalum oxide, titanium oxide and
The compound of one or more of niobium oxide or mixture comprising one or more of these compounds are constituted.
Near infrared ray cut-off filter of the invention preferably makes in the 1st optical multilayer and the 2nd optical multilayer
It is at least one kind of have it is multiple.
In near infrared ray cut-off filter of the invention, the preferably described transparent substrate is by being selected from glass, glass ceramics, water
The material of one or more of crystalline substance, resin and sapphire is constituted.
In near infrared ray cut-off filter of the invention, the preferably described transparent substrate has the wavelength for absorbing near infrared region
Light property.
Near infrared ray cut-off filter of the invention is preferably for 0 ° of incident light, in the model of wavelength 430nm~600nm
The transmission bands with transmitted light are enclosed, there is the inhibition band of the transmission of limitation light in the range of wavelength 750nm~1000nm, it is described
The average transmittance with 0 ° of incident light of band is penetrated with the difference with the average transmittance of 40 ° of incident light (with 0 ° of incident light
Average transmittance-is with the average transmittance of 40 ° of incident light) it is 3% or less.
In near infrared ray cut-off filter of the invention, total layer of the 1st optical multilayer and the 2nd optical multilayer
Preferably 90 layers or less of number.
In this specification, the term of " to " and the symbol of "~" indicate the numerical value on the left of it or more and
The numerical value on right side range below.In addition, near infrared ray indicates the light of such as range of wavelength 750nm~1300nm.
According to the present invention it is possible to provide the optical multilayer for being able to use the less number of plies and inhibit caused by the light of high incidence angle
Oblique incidence ripple near infrared ray cut-off filter.
Detailed description of the invention
Fig. 1 is the sectional view for indicating the near infrared ray cut-off filter of embodiment.
Fig. 2 is the sectional view for the optical multilayer that near infrared ray cut-off filter has.
Fig. 3 is to indicate that the optics for 0 ° of incident light and 40 ° of incident lights of the near infrared ray cut-off filter of embodiment 1 is special
The chart of property.
Fig. 4 is to indicate that the optics for 0 ° of incident light and 40 ° of incident lights of the near infrared ray cut-off filter of embodiment 2 is special
The chart of property.
Fig. 5 is to indicate that the optics for 0 ° of incident light and 40 ° of incident lights of the near infrared ray cut-off filter of embodiment 3 is special
The chart of property.
Fig. 6 is to indicate that the optics for 0 ° of incident light and 40 ° of incident lights of the near infrared ray cut-off filter of comparative example is special
The chart of property.
Symbol description
10 ... near infrared ray cut-off filters, 11 ... transparent substrates, 12 ... the 1st optical multilayers, 13 ... the 2nd optical multilayers
The middle refractive index film of film, L ... low refractive index film, M ....
Specific embodiment
Hereinafter, being described in detail referring to attached drawing to embodiment.
(the 1st embodiment)
Fig. 1 is the sectional view of the near infrared ray cut-off filter 10 of the 1st embodiment.Fig. 2 is near infrared ray cut-off filtering
The sectional view for the 1st optical multilayer 12 that device 10 has.The transmission of the limitation near infrared ray of near infrared ray cut-off filter 10.Cause
This, it is preferred with the average transmittance of 0 ° of incident light in the wave-length coverage of near infrared ray near infrared ray cut-off filter 10
It is 5% or less.Hereinafter, being illustrated referring to Figures 1 and 2 to the composition of near infrared ray cut-off filter 10.
As shown in Figure 1, near infrared ray cut-off filter 10 has transparent substrate 11, the 1st optical multilayer 12 and the 2nd light
Learn multilayer film 13.Near infrared ray cut-off filter 10 has the 1st optical multilayer 12 in an interarea of transparent substrate 11,
Has the 2nd optical multilayer 13 on 1 optical multilayer 12.It's not limited to that for the composition of near infrared ray cut-off filter, can also
To have the 1st optical multilayer 12 in transparent substrate 11 a interarea, has the 2nd optical multilayer 13 in another interarea.
In addition, the sequence of the 1st optical multilayer 12 and the 2nd optical multilayer 13 is not also limited, it can be close red as shown in Figure 1
1st optical multilayer 12 is configured at 11 side of transparent substrate like that by outside line cut-off filter 10, although not shown can also incite somebody to action
2nd optical multilayer 13 is configured at 11 side of transparent substrate.
Here, in general, the blooming of the film with thickness (physical film thickness) d is by nd × cos θ, (θ is vertically to enter
Penetrate be set as 0 ° light incident angle, n be film refractive index) indicate.According to above-mentioned formula, blooming enters film dependent on light
Angle, θ is penetrated, θ becomes bigger, and blooming becomes smaller.Herein, it is believed that because of the office of visible light region caused by optical multilayer
The generation of portion's property transmissivity reduction (so-called oblique incidence ripple) is the journey of the brought blooming reduction because incidence angle becomes larger
Degree is different between the different film of refractive index.
For example, if being accounted for high refractive index film H and low refractive index film L, then as described above, with incident angle θ's
Increase, the blooming of high refractive index film H and low refractive index film L are proportionally reduced with cos θ respectively.At this point, refractive index n is got over
It is small, as the influence of the blooming reduction of the increase of incident angle θ is bigger, therefore, and if incident angle θ increases, high folding
The ratio for penetrating the blooming of rate film H and low refractive index film L substantially deviates with the ratio of the physical film thickness of θ=0 ° design.As
As a result, thinking to generate oblique incidence ripple because the ratio of the blooming of high refractive index film H and low refractive index film L deviates.Separately
Outside, it will also realize that the middle cardiac wave of oblique incidence ripple wave-length coverage of the transmission of optical multilayer limitation light at such as 0 ° of incident angle
1/2 long wavelength nearby generates.
In turn, it is known that the transmissison characteristic of the light of optical multilayer caused by the increase with incident angle θ is to short wavelength's sidesway
It moves to same extent, the generating region of oblique incidence ripple is also from 0 ° of incident angle (vertical incidence) due to the increase of incident angle θ
When oblique incidence ripple generating region move to short wavelength side.Based on such opinion, the near infrared ray of embodiment ends filtering
Device is directed to the 1st optical multilayer 12 and the 2nd optical multilayer 13, using composition described below.
1st optical multilayer 12 be reduce visible light region substantially wavelength 440nm~650nm, preferably 500nm~
The composition of the slippage of the transmissivity of the oblique incidence ripple of 560nm (region G).Therefore, with 0 ° of incident light by limitation transmission
The central wavelength of wave-length coverage (hereinafter, being expressed as " inhibiting band ") is 890nm~1200nm.
The width for the inhibition band being made of the 1st optical multilayer 12 is 100nm~300nm.If inhibiting the width of band small
In 100nm, it is likely that need to be arranged multiple for constituting other optical multilayers of the inhibition band of near infrared ray cut-off filter
Film, cost when making near infrared ray cut-off filter are got higher.If the width for inhibiting band is more than 300nm, in optical multilayer
The design aspect of film becomes advantageous.However, the 1st optical multilayer 12 is alternately laminated by middle refractive index film M and low refractive index film L
Made of constitute due to the refringence of 2 kinds of films it is small, substantially inhibition band be difficult to become larger.Therefore, if in order to single
The 1st optical multilayer 12 constitute more than the inhibition band of 300nm and be designed, then for the middle refractive index film of expecting refraction rate
M, it is difficult to design for low refractive index film L.
It should be noted that when near infrared ray cut-off filter has multiple 1 optical multilayers 12, these multiple 1st optics
The width and central wavelength of the inhibition band of each self-forming of multilayer film 12 are above-mentioned range.That is, being formed in infrared region has
When the near infrared ray cut-off filter of the inhibition band more than 300nm, be preferably 100nm~300nm by each width for inhibiting band,
Different multiple 1st optical multilayers 12 of central wavelength constitute the inhibition band of near infrared ray cut-off filter 10.
Here, inhibiting band as described above preferably with the average transmittance of 0 ° of incident light for 5% wavelength region below.
Average transmittance by inhibiting band is 5% hereinafter, the near infrared ray cut-off filter of present embodiment is used for solid-state image pickup
When element, it is easy to get the photographed images of nature tone.It should be noted that near infrared ray cut-off filter 10, the 1st optical multilayer
The central wavelength of the inhibition band of film 12 and the width of inhibition band can be determined as follows.Aftermentioned 2nd optical multilayer 13
Equally.
The central wavelength of band is inhibited to refer to constitute the middle cardiac wave of the blooming of each layer for the optical multilayer for inhibiting band
The wavelength that long average value calculates.Optical multilayer (the weight of the optical film of different refractivity of inhibition band with central wavelength lambda
It is multiple to constitute) it is indicated by d=λ/(4 × n) cos θ mathematical expression.Here, d indicates that physical film thickness, n indicate the refractive index of film, θ is indicated
The incident angle of light.As described above, the wavelength model of oblique incidence ripple transmission of optical multilayer limitation light at 0 ° of incident angle
1/2 wavelength of the central wavelength enclosed nearby generates, but it is premised on the refractive index of film is certain.However, the folding of actually film
It penetrates rate and changes (there are wavelength dependencies) because of wavelength.Specifically, the short situation of the wavelength of light compares wave for the refractive index of film
The case where growing tall is big.Therefore, the wave-length coverage of oblique incidence ripple transmission of optical multilayer limitation light when than 0 ° of incident angle
The slightly long wavelength side of 1/2 wavelength of central wavelength generate.
Due to such technical background, the central wavelength of the inhibition band of optical multilayer is not only by light
Optical characteristics calculate, but use above-mentioned mathematical expression, by film physical film thickness and refractive index calculate.In addition, inhibiting the width of band
Degree refers in the respective optical characteristics of the 1st optical multilayer 12 or the 2nd optical multilayer 13 with the transmissivity of 0 ° of incident light
As 30% maximum wavelength and the difference of minimal wave length.
In order to realize above-mentioned inhibition band, it is 1.8~2.21 that the 1st optical multilayer 12, which is by the refractive index at wavelength 500nm,
Middle refractive index film M and wavelength 500nm place refractive index be 1.45~1.49 low refractive index film L it is alternately laminated made of knot
Structure.Moreover, the 1st optical multilayer 12 has the assembled unit of refractive index film M and low refractive index film L in one or more.By middle folding
The rate film of penetrating is set as M, and low refractive index film is set as L, and their combination unit is set as ML, and the repeat number of assembled unit is set as k,
By [ML] ^kIndicate such optical multilayer constituted.Repeat number k preferably 5~35.If middle refractive index film M and low-refraction
The repeat number k of the assembled unit (ML) of film L is more than 35, although then can reduce the transmissivity of defined wave-length coverage, but if
Excessively, then productivity is damaged sometimes.In addition, if repeat number k less than 5, is difficult to form the sufficiently low inhibition band of transmissivity.Separately
Outside, therefore, k is preferably 5~34, and more preferably 5~33.
Here, to make constitute the 1st optical multilayer 12 middle refractive index film M wavelength 500nm at refractive index 1.8~
2.21 the reasons why be illustrated.It is verified using simulation softward (TF-Calc) with the central wavelength of the inhibition band of 0 ° of incident light and is
(ML) ^ of 940nmkThe optical characteristics of the optical multilayer of structure.Here, by the refraction at the wavelength 500nm of low refractive index film L
Rate is set as 1.48, k and is set as 15, the refractive index at the wavelength 500nm of centering refractive index film M be 1.8,2.0,2.21,2.3,2.5 this
5 kinds are verified.That is, confirming the variation for making the asynchronous optical characteristics of refractive index of middle refractive index film M by above-mentioned verifying
(the especially generation of oblique incidence ripple).As a result, being incident in 400~450nm of wavelength of the light of above-mentioned optical multilayer with 50 °
The minimum transmittance at place is 87.5% in the refractive index 1.8 of middle refractive index film M, is 71.9% in refractive index 2.0, is reflecting
It is 52.1% when rate 2.21, is 41.6% in refractive index 2.3, is 28.3% in refractive index 2.5.According to these as a result, in
The refractive index of refractive index film has correlation with the minimum transmittance at 400~450nm of wavelength, the minimum transmittance and refractive index
The case where 2.5 (being equivalent to high refractive index film), is compared, and is 67% below by light quantity slip (100- minimum transmittance)
Refractive index 2.21 is set as the upper limit of the refractive index of the middle refractive index film M of the 1st optical multilayer 12.In addition, when refractive index is 1.8,
Minimum transmittance is high, but if refractive index less than 1.8, then inhibits the width of band to narrow, therefore, refractive index 1.8 is set as the 1st light
Learn the lower limit of the refractive index of the middle refractive index film M of multilayer film 12.
The refractive index that 1st optical multilayer 12 passes through low refractive index film L and middle refractive index film M is above-mentioned range, can
Inhibit the oblique incidence ripple in the region G.From the aspect of inhibiting oblique incidence ripple, the middle refraction of the 1st optical multilayer 12 is constituted
The refractive index preferably 1.9~2.1, most preferably 2.0 or so of rate film M.
Low refractive index film L does not have as long as the film that the material for being 1.45~1.49 by the refractive index at wavelength 500nm is constituted
It is particularly limited to.As the material of such low refractive index film L, silica (SiO can be used2Deng), magnesium fluoride (MgF2Deng),
Calcirm-fluoride (CaF2Deng), yttrium fluoride (YF3Deng) etc..These compounds can be used alone or two or more kinds may be used.Separately
Outside, the mixture comprising one or more of these compounds can be used in the material as low refractive index film L.As such
Mixture is the mixture of above compound and other metal oxides, for example, silica and the mixture of aluminium oxide etc..This
When mixture can be metal oxide of more than two kinds mixture, or the combined oxidation of metal of more than two kinds
Object.For example, the mixture of silica and aluminium oxide can be the mixed oxide of the arbitrary ratio of Si and Al, or oxidation
The mixture of the arbitrary ratio of silicon and aluminium oxide., can also be in addition, as long as low refractive index film L refractive index is 1.45~1.49
Contain additive.
Middle refractive index film M does not have as long as the film that the material for being 1.8~2.21 by the refractive index at wavelength 500nm is constituted
It is particularly limited to.As the material of such middle refractive index, zirconium oxide (ZrO can be used2Deng), tantalum oxide (Ta2O5Deng), oxidation
Yttrium (Y2O3Deng), lanthanum titanate (La2Ti2O7Deng), zinc sulphide (ZnS etc.), titanium oxide (Ti4O7、Ti2O3、TiO、TiO2Deng), oxygen
Change aluminium (Al2O3Deng) etc..These compounds can be used alone or two or more kinds may be used.In addition, as middle refractive index
The mixture comprising one or more of these compounds also can be used in the material of film M.It is above-mentioned as such mixture
The mixture of compound and other metal oxides, for example, the mixture of zirconium oxide and tantalum oxide, zirconium oxide and titanium oxide is mixed
Close object etc..Mixture at this time can be the mixture of metal oxide of more than two kinds, or metal of more than two kinds
Composite oxides.For example, the mixture of zirconium oxide and tantalum oxide can be the mixed oxide of the arbitrary ratio of Zr and Ta, it can also
Think the mixture of the arbitrary ratio of zirconium oxide and tantalum oxide.It, can be in addition, the mixture of zirconium oxide and titanium oxide is similarly
For the mixed oxide of the arbitrary ratio of Zr and Ti, or the mixture of the arbitrary ratio of zirconium oxide and titanium oxide.Middle folding
As long as penetrating rate film M refractive index is 1.8~2.21, additive can also be contained.
In 1st optical multilayer 12, the film configured closest to 11 side of transparent substrate can be middle refractive index film M or low refraction
Any one of rate film L.
Constitute each layer of the physical film thickness of middle refractive index film M and low refractive index film L of the 1st optical multilayer 12 substantially
It is determined by the refractive index of respective film and the central wavelength of the 1st optical multilayer 12, it can be further for the mesh of adjustment waveform etc.
And appropriate adjustment, middle refractive index film M and low refractive index film L total total physical film thickness (physics film of the 1st optical multilayer 12
It is thick) it is, for example, 1 μm~20 μm.From the viewpoint of the productivity for improving near infrared ray cut-off filter, the 1st optical multilayer is constituted
Total number of plies of the middle refractive index film M and low refractive index film L of film 12 be preferably 70 layers hereinafter, more preferably 50 layers hereinafter, especially
Preferably 10~45 layers.It should be noted that constituting the object of multiple middle the refractive index film M and low refractive index film L of the 1st optical multilayer 12
It manages film thickness and refractive index can be different from each other, it can also be identical.In addition, middle refractive index film M can also be made of equivalent film.Deng
Effect film is specifically alternately laminated by high refractive index film H and low refractive index film L and is configured to the refractive index of middle refractive index film M
The film of range.For example, 1 middle refractive index film M can be substituted for high refractive index film H/ low refractive index film L/ high refractive index film H's
3 layers of composition.
2nd optical multilayer 13 be inhibit visible light region substantially wavelength 400nm~500nm, preferably 440nm~
The composition of the generation of the oblique incidence ripple of 480nm (B area).Therefore, the central wavelength of the inhibition band of the 2nd optical multilayer 13 is
700nm is more than and less than 890nm.
In addition, the width of the inhibition band of the 2nd optical multilayer 13 is 100nm~300nm.If inhibiting the width mistake of band
It is small, it is likely that need to be arranged other optical multilayers of the inhibition band for constituting near infrared ray cut-off filter, production is close
Cost when infrared ray cut off filter is got higher.In addition, the height that can be used in manufacture is rolled over if inhibiting the width of band excessive
Penetrate rate film H, the selection of low refractive index film L may be almost without.
In order to realize that above-mentioned inhibition band, the 2nd optical multilayer 13 are to be more than 2.21 by the refractive index at wavelength 500nm and be
Structure made of 2.8 high refractive index film H below and low refractive index film L are alternately laminated.Moreover, having one or more height refractions
The assembled unit (HL) of rate film H and low refractive index film L.High refractive index film is set as H, low refractive index film is set as L, by they
Assembled unit is set as HL, and the repeat number of assembled unit is set as m, by [HL] ^mIndicate such optical multilayer constituted.Weight
Plural m preferably 3~30.If the repeat number m of the assembled unit (HL) of high refractive index film H and low refractive index film L is more than 30, though
It so can reduce the transmissivity of defined wave-length coverage, but damage productivity sometimes.In addition, if repeat number m less than 3, it is difficult
To form the sufficiently low inhibition band of transmissivity.Therefore, m is preferably 3~29, and more preferably 3~28.
The combination of the difference biggish high refractive index film H and low refractive index film L of refractive index is easy to become there are oblique incidence ripple quantity
Big trend.Therefore, by the range for keeping the central wavelength and width of the inhibition band of the 2nd optical multilayer 13 above-mentioned, make to come
Derived from the oblique incidence ripple of the 2nd optical multilayer 13 move to visible light region short wavelength side (for example, wavelength 400nm or more and
Range less than 440nm), or move to the wavelength side shorter than visible light region (for example, range that wavelength is less than 400nm).Cause
This, the oblique incidence ripple being able to suppress in visible light region.It should be noted that near infrared ray cut-off filter has multiple 2nd light
When learning multilayer film 13, the width and central wavelength of the inhibition band of these each self-formings of multiple 2nd optical multilayers 13 are above-mentioned
Range.
As long as high refractive index film H is more than 2.21 by the refractive index at wavelength 500nm and is constituted for 2.8 materials below
Film is just not particularly limited.As the material of such high refractive index film H, tantalum oxide (Ta can be used2O5Deng), titanium oxide
(Ti4O7、Ti2O3、TiO、TiO2Deng), niobium oxide (Nb2O5Deng) etc..As the material of high refractive index film H, it also can be used and include
The mixture of one or more of these compounds.In addition, high refractive index film H can be only made of a kind of above-mentioned material, it can also
To be made of material of more than two kinds.In addition, if refractive index be more than 2.21 and for 2.8 hereinafter, if can also contain additive.
Here, tantalum oxide, titanium oxide pass through appropriate adjustment membrance casting condition, film build method etc., the wave of the film enabled to
Refractive index at long 500nm is 1.8~2.21, also can exceed that 2.21 and is 2.8 or less.
In 2nd optical multilayer 13, the film configured closest to 11 side of transparent substrate can be high refractive index film H or low refraction
Any one of rate film L.
Constitute each layer of the physical film thickness of the high refractive index film H and low refractive index film L of the 2nd optical multilayer 13 substantially
It is determined by the refractive index of respective film and the central wavelength of the 2nd optical multilayer 13, it can be further for the mesh of adjustment waveform etc.
And appropriate adjustment, high refractive index film H and low refractive index film L total total physical film thickness (physics film of the 2nd optical multilayer 13
It is thick) it is, for example, 2 μm~10 μm.From the viewpoint of the slimming of near infrared ray cut-off filter, the object of the 2nd optical multilayer 13
It is more thin the more preferred to manage film thickness.From the viewpoint of the productivity for improving near infrared ray cut-off filter, the 2nd optical multilayer is constituted
Total number of plies of 13 high refractive index film H and low refractive index film L be preferably 60 layers hereinafter, more preferably 50 layers hereinafter, especially excellent
It is selected as 6~45 layers.It should be noted that constituting the physics of multiple the high refractive index film H and low refractive index film L of the 2nd optical multilayer 13
Film thickness and refractive index can be different from each other, can also be identical.
In addition, when the 1st optical multilayer 12 and 2 optical multilayer 13 is respectively configured in two surfaces of transparent substrate 11,
Total physical film thickness of total physical film thickness of 1st optical multilayer 12 on two surfaces and the 2nd optical multilayer 13 is preferably each other
As close possible to.This is because in order near infrared ray cut-off filter slimming and when thinly forming transparent substrate 11, such as
1st optical multilayer 12 on two surfaces of fruit transparent substrate 11 and the physical film thickness of the 2nd optical multilayer 13 are substantially different, then have
When generate the small optical multilayer optical multilayer side of physical film thickness near infrared ray cut-off filter 10 and become the warpage of convex.
From the viewpoint of the productivity for improving near infrared ray cut-off filter 10, the 1st optical multilayer 12 and the 2nd optics
Total number of plies of multilayer film 13 is preferably 90 layers hereinafter, more preferably 60 layers~85 layers.
Near infrared ray cut-off filter 10 can be respectively provided with multiple 1st optical multilayers 12, the 2nd optical multilayer 13.
Particularly preferably with 2 or more the 1st optical multilayers 12.As described above, the 1st optical multilayer 12 inhibition band width compared with
It is narrow, but have multiple 1st optical multilayers 12 by near infrared ray cut-off filter 10, the broader wavelength model of range can be limited
The transmission of the light enclosed.
In turn, when being respectively provided with multiple 1st optical multilayers 12,2 optical multilayer 13, as the present inventor the past into
It has gone shown in recording in No. 567063 bulletins of Japanese Patent No. of patent application, being made up of each optical multilayer has difference
Central wavelength inhibition band, the inhibitory effect of the oblique incidence ripple of higher visible wavelength region can be obtained, therefore especially excellent
Choosing.
It should be noted that when near infrared ray cut-off filter 10 has multiple 1 optical multilayers 12, these multiple 1st light
Learning multilayer film 12 can be respectively on the same interarea of transparent substrate 11, can also be respectively on different interareas.
Constitute high refractive index film H, the middle refractive index film M, low refraction of the 1st optical multilayer 12 and the 2nd optical multilayer 13
Rate film L can for example be formed by sputtering method, vacuum vapour deposition, ion beam method, ion plating method, CVD method, particularly preferably by splashing
Penetrate method, vacuum vapour deposition is formed.Transmission bands are the wavelength band that the light of the solid-state imagers such as CCD, CMOS is utilized, physics
The precision of film thickness is critically important.It is excellent in terms of the physical film thickness of sputtering method, vacuum vapour deposition when control forms film.Therefore, energy
It is enough to improve high refractive index film H, the middle refractive index film M, low-refraction for constituting the 1st optical multilayer 12 and the 2nd optical multilayer 13
The precision of the physical film thickness of film L, as a result, it is possible to inhibit oblique incidence ripple.
It should be noted that can also include in the 1st optical multilayer 12 and the 2nd optical multilayer 13 adhesive force strengthening layer,
Antistatic layer of most surface layer (air side) etc. constitutes the layer other than the layer of optical multilayer.In addition, removing the 1st optical multilayer 12
Other than the 2nd optical multilayer 13, can also have adjustment layer.Adjustment layer can be appropriately arranged in 12 He of the 1st optical multilayer
Between 2nd optical multilayer 13 and transparent substrate 11, or compared with the 1st optical multilayer 12 and the 2nd optical multilayer 13
Between air side or the 1st optical multilayer 12 and the 2nd optical multilayer 13.Adjustment layer inhibits because different refractive index is laminated
And the periodical increase and decrease (referred to as ripple) of the optical characteristics (transmissivity) generated.The ripple and above-mentioned oblique incidence ripple are obviously not
Together, and do not have the oblique incidence based on light dependence of angle.By using adjustment layer, the case where except being caused by oblique incidence ripple
In addition, the transmission bands of the optical characteristics of near infrared ray cut-off filter can be made more flat.
Transparent substrate 11 is not particularly limited as long as the light transmission that can at least make visible wavelength region.As transparent base
The material of plate 11, such as the crystallizations such as glass, glass ceramics, crystal, lithium niobate, sapphire, resin (poly terephthalic acid can be enumerated
Polyester resin, polyethylene, polypropylene, the ethylene vinyl acetates such as glycol ester (PET), polybutylene terephthalate (PBT) (PBT)
The acrylic resins such as the polyolefin resins such as ester copolymer, norbornene resin, polyacrylate, polymethyl methacrylate gather
Urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin etc.) etc..
In addition, as transparent substrate 11, or the complex being made of material of more than two kinds among the above.
As transparent substrate 11, the transparent substrate of the light of near-infrared wavelength region is particularly preferably absorbed.This is because passing through
Using the transparent substrate 11 for the light for absorbing near-infrared wavelength region, the picture close with the visual sensory characteristics of the mankind can be obtained
Matter.It should be noted that the transparent substrate 11 as the light for absorbing near-infrared wavelength region, such as can enumerate in fluorophosphate system glass
Cu is added in glass, phosphate-based glass2+The fluorphosphate glass containing CuO of (ion) or the phosphate glass containing CuO (with
Under, they are also summarized into referred to as " glass containing CuO ").
In addition, the transparent substrate 11 as the light for absorbing near-infrared wavelength region, also can be used and is forming transparent resin
Resin material in be added to absorption near infrared ray absorbent transparent substrate.As absorbent, such as dyestuff, face can be enumerated
Material, metal complex based compound, match specifically, phthalocyanine based compound, naphthalene phthalocyanine based compound, dithiol metal can be enumerated
Close object based compound.
In addition, in order to improve the absorbent properties of the near infrared light of near infrared ray cut-off filter 10, also can be used with it is upper
It states the same material of near-infrared absorbing substrate and is formed on the surface of transparent substrate 11 and contain near infrared absorbing coloring matter and transparent
The near infrared ray absorption layer of resin.At this point, near infrared ray absorption layer be formed in transparent substrate 11 and the 1st optical multilayer 12 it
Between or transparent substrate 11 and the 2nd optical multilayer 13 between.In addition, near infrared ray absorption layer can be formed in transparent substrate
11 at least one interarea can also be formed in two interareas.
Near infrared ray cut-off filter 10 preferably has transmission bands in the region of wavelength 430nm~600nm, in wavelength
The region of 750nm~1000nm, which has, inhibits band.In turn, the light of the transmission bands of near infrared ray cut-off filter 10 with 0 ° of incidence
Light (when 0 ° of incidence) average transmittance and difference (0 ° of incident light with the average transmittance of 40 ° of incident light (when 40 ° of incidence)
- 40 ° of incident lights of average transmittance average transmittance) be preferably 3% or less.Difference by above-mentioned average transmittance is 3%
Hereinafter, difference when can reduce the light for transmiting high incidence angle with optical characteristics when 0 ° of incident light of transmission, for example, being capable of benefit
The photographed images of desired color performance are obtained with solid-state imager.It should be noted that transmission bands refer to 0 ° of incident light
The wavelength region that average transmittance is 85% or more.
In addition, the minimum value of transmissivity when 0 ° of incidence of the light of 10 preferred transmission band of near infrared ray cut-off filter with
The difference (minimum transmittance when -40 ° of incidence of minimum transmittance when 0 ° of incidence) of the minimum value of transmissivity when 40 ° of incidence is
5% or less.The generation of oblique incidence ripple when thereby, it is possible to significantly inhibit with high incident angles light.
Spectral luminosity measurement can be used for example with the average transmittance and minimum transmittance of θ ° of incident angle incident light
Determine the spectral-transmission favtor of near infrared ray cut-off filter 10 and calculates.Specifically, average transmittance can be with defined wavelength
The form of the arithmetic average of the measured value of the transmissivity of range calculates.In addition, minimum transmittance can be with defined wave-length coverage
Transmissivity minimum value form measurement.
The near infrared ray cut-off filter of embodiment from the description above, can be with the layer of less optical multilayer
Number inhibits the oblique incidence ripple of the light based on high incidence angle.
Embodiment
Then, it is concretely demonstrated referring to embodiment.It should be noted that the refractive index of each substance as described below refers to wave
Refractive index at long 500nm.
(embodiment 1)
The near infrared ray cut-off filter of the present embodiment have transparent substrate (near-infrared ray absorption glass, plate thickness 0.3mm,
Trade name: NF-50, AGC Techno Glass corporation) and be set to transparent substrate a face optical multilayer.It should
Optical multilayer is to have stacked gradually [ML] ^ from above-mentioned transparent substrate surface sidek1Structure optical multilayer and [H1L] ^m1's
Structure obtained by the optical multilayer of structure.In addition, another face in transparent substrate has by [H2L] ^m2The optics of composition is more
Tunic (antireflection film).It should be noted that the 1st layer from above-mentioned transparent substrate surface side, the 2nd layer, the 57th layer~the 60th layer be not
Belong to [ML] ^k1Structure film and [H1L] ^m1Structure film in any one adjustment layer.
Each optical multilayer is formed by the average value of the central wavelength for the inhibition band for inhibiting the central wavelength of band for each layer.
The width that each optical multilayer is formed by inhibition band is maximum wavelength and minimum wavelength of the transmissivity for 30%
Difference.
[ML] ^k1Be middle refractive index film M be zirconium oxide (ZrO2, refractive index: 2.058), low refractive index film L is silica
(SiO2, refractive index: 1.483), k1 18 adds up to 36 layers of repetition stepped construction.[ML] ^k1Inhibition band central wavelength
For 1038.6nm, inhibit the width of band in the range of 100nm~300nm.
[H1L] ^m1It is high refractive index film H1By tantalum oxide (Ta2O5, refractive index: 2.211) constitute, low refractive index film L is by oxygen
SiClx (SiO2, refractive index: 1.483) being constituted, and m1 9 adds up to 18 layers of repetition stepped construction.[H1L] ^m1Inhibition band
Central wavelength is 815.7nm, in the range of the width for inhibiting band is 100nm~300nm.
It is set to the optical multilayer ([H in another face2L] ^m2) it is high refractive index film H2By titanium oxide (TiO2, refractive index:
2.467) it constitutes, low refractive index film L is by silica (SiO2, refractive index: 1.483) being constituted, and m2 3 adds up to 6 layers of repetition layer
Stack structure.
Optical multilayer ([ML] ^ in a face of the transparent substrate of above-mentioned near infrared ray cut-off filter will be set tok1
[H1L] ^m1) composition it is shown in table 1.In addition, by another face of the transparent substrate for being set near infrared ray cut-off filter
Optical multilayer ([H2L] ^m2) composition be shown in table 2.In Tables 1 and 2, film layer number is the ordinal number of the layer from transparent substrate side,
Film thickness indicates physical film thickness.In addition, using λ=4 × nd × cos θ (λ: central wavelength, n: refractive index, d: physical film thickness, θ: light
Incident angle) formula calculate the central wavelength of each layer.
For the near infrared ray cut-off filter, optical thin film simulation softward (TFCalc, Software Spectra is used
Corporation) it verifies from optical multilayer ([ML] ^k1[H1L] ^m1) side incidence light 0 ° and 40 ° of incidence angle of optical characteristics.
Show the result in Fig. 3.
[table 1]
[table 2]
It should be noted that according to Fig. 3, the near infrared ray cut-off filter of the present embodiment can be calculated for 0 ° of incident light,
There are the transmission bands that average transmittance is 85% or more in the wave-length coverage of 430~600nm and in the near-infrared side of transmission bands
Having average transmittance in the wave-length coverage of 750~1000nm is the inhibition band in 5% region below.
(embodiment 2)
The near infrared ray cut-off filter of the present embodiment has and the same transparent base of transparent substrate used in embodiment 1
The optical multilayer of plate and a face for being set to transparent substrate.Optical multilayer is from above-mentioned transparent substrate surface side successively layer
Folded [ML] ^k2Structure film and [H2L] ^m3Structure film obtained by structure.It should be noted that from above-mentioned transparent substrate surface side
Playing the 1st layer, the 2nd layer, the 57th layer, the 58th layer is to be not belonging to [ML] ^k2Structure film and [H2L] ^m3Structure film in it is any
The adjustment layer of person.The structure of the optical multilayer in a face of the transparent substrate of above-mentioned near infrared ray cut-off filter will be set to
At being shown in table 3.In addition, having optics same as optical multilayer used in embodiment 1 in another face of transparent substrate
Multilayer film is (by [H2L] ^m2The antireflection film of composition).For the near infrared ray cut-off filter, by being simulated using optical thin film
The verifying of software (TFCalc, Software Spectra company) is measured from optical multilayer ([ML] ^k2[H2L] ^m3) side
0 ° of incidence angle, 40 ° of the optical characteristics of incident light.Result is shown in Fig. 4.
[ML] ^k2Be middle refractive index film M be zirconium oxide (ZrO2, refractive index: 2.058), low refractive index film L is silica
(SiO2, refractive index: 1.483), k2 19 adds up to 38 layers of repetition stepped construction.[ML] ^k2Inhibition band central wavelength
For 1064.3nm, inhibit the width of band in the range of 100nm~300nm.
[H2L] ^m3It is high refractive index film H2By titanium oxide (TiO2, refractive index: 2.467) constitute, low refractive index film L is by aoxidizing
Silicon (SiO2, refractive index: 1.483) being constituted, and m3 8 adds up to 16 layers of repetition stepped construction.[H2L] ^m3Inhibition band in
The a length of 800.1nm of cardiac wave, in the range of the width for inhibiting band is 100nm~300nm.
[table 3]
It should be noted that according to Fig. 4, the near infrared ray cut-off filter of the present embodiment can be calculated for 0 ° of incident light,
There are the transmission bands that average transmittance is 85% or more in the wave-length coverage of 430~600nm and in the near-infrared side of transmission bands
Having average transmittance in the wave-length coverage of 750~1000nm is the inhibition band in 5% region below.
(embodiment 3)
The near infrared ray cut-off filter of the present embodiment has and the same transparent base of transparent substrate used in embodiment 1
[the H in one face of plate, transparent substrate2L] ^m4Structure optical multilayer and ultraviolet cutoff filter thereon.It should
Illustrate, the 1st layer~the 6th layer is to be not belonging to [H from the substrate surface side in a face of above-mentioned transparent substrate2L] ^m4Structure
The adjustment layer of film.In addition, having [ML] ^ in another facek3Structure optical multilayer.It should be noted that from above-mentioned transparent base
It is to be not belonging to [ML] ^ that the substrate surface side in another face of plate, which plays the 1st layer~the 6th layer, the 43rd layer~the 46th layer,k3Structure film
Adjustment layer.The optical multilayer ([H in a face of the transparent substrate of above-mentioned near infrared ray cut-off filter will be set to2L]
^m4) composition be shown in table 4, optical multilayer ([ML] ^ in another face will be set tok3) composition be shown in table 5.It is close for this
Infrared ray cut off filter passes through testing using optical thin film simulation softward (TFCalc, Software Spectra corporation)
Card is to measure from optical multilayer ([H2L] ^m4) side incidence light 0 ° of incidence angle, 40 ° of optical characteristics.Result is shown respectively
In Fig. 5.
[H2L] ^m4It is high refractive index film H by titanium oxide (TiO2, refractive index: 2.467) constitute, low refractive index film L is by aoxidizing
Silicon (SiO2, refractive index: 1.483) being constituted, and m4 8 adds up to 16 layers of repetition stepped construction.[H2L] ^m4Inhibition band in
The a length of 795.3nm of cardiac wave, inhibiting the width of band is 255nm.It should be noted that the middle cardiac wave of the inhibition band of ultraviolet cutoff filter
A length of 330.6nm.
[ML] ^k3Be middle refractive index film M be zirconium oxide (ZrO2, refractive index: 2.058), low refractive index film L is silica
(SiO2, refractive index: 1.483), k3 18 adds up to 36 layers of repetition stepped construction.[ML] ^k3Inhibition band central wavelength
For 1039.7nm, inhibit the width of band in the range of 100nm~300nm.
[table 4]
[table 5]
It should be noted that according to Fig. 5, the near infrared ray cut-off filter of the present embodiment can be calculated for 0 ° of incident light,
There are the transmission bands that average transmittance is 85% or more in the wave-length coverage of 430~600nm and in the near-infrared side of transmission bands
Having average transmittance in the wave-length coverage of 750~1000nm is the inhibition band in 5% region below.
(comparative example)
The near infrared ray cut-off filter of comparative example has and the same transparent base of transparent substrate used in embodiment 1
[the H in one face of plate, transparent substrate2L] ^xThe optical multilayer of structure, another face [H2L] ^ZStructure optics it is more
Tunic (antireflection film).The optical multilayer on two sides is the high refractive index film H for constituting film respectively2With the material of low refractive index film L
The total difference of identical and film.The optical multilayer in a face of the transparent substrate of above-mentioned near infrared ray cut-off filter will be set to
The composition of film is shown in table 6, and the composition for being set to the optical multilayer in another face is shown in table 7.The near infrared ray is ended
Filter, by using optical thin film simulation softward (TFCalc, Software Spectra corporation) verifying come measure from
Optical multilayer ([H2L] ^x) side incidence light 0 ° and 40 ° of incidence angle of optical characteristics.Result is shown in Fig. 6.
[H2L] ^xIt is high refractive index film H2By titanium oxide (TiO2, refractive index: 2.467) constitute, low refractive index film L is by aoxidizing
Silicon (SiO2, refractive index: 1.483) being constituted, and x 19 adds up to 38 layers of repetition stepped construction.
[H2L] ^ZBe z be 3, add up to 6 layers of repetition stepped construction.
[table 6]
[table 7]
The optical characteristics of Examples 1 to 3 and the near infrared ray cut-off filter of comparative example is shown in table 8.As optics spy
Property, the difference of average transmittance and average transmittance when 40 ° of incidence when being 0 ° of incidence of the light at wavelength 430nm~600nm
0 ° of incidence of the light at (average transmittance when -40 ° of incidence of average transmittance when 0 ° of incidence), wavelength 430nm~600nm
When minimum transmittance and minimum transmittance when 40 ° of incidence difference (when -40 ° of incidence of minimum transmittance when 0 ° of incidence most
Small transmissivity).
[table 8]
As shown in table 8, it is known that the near infrared ray cut-off filter of the present embodiment and the near infrared ray of comparative example end filtering
Device is compared, and in visible transmission band, 0 ° of incident light and the difference of the average transmittance of 40 ° of incident lights are minimum, is able to use less
The optical multilayer of the number of plies inhibits the photogenic oblique incidence ripple of high incidence angle.
Although the present invention is illustrated referring to detailed or specific embodiment, without departing from the spirit and scope of the present invention
In the case where, various changes or amendment can be applied as known to those skilled in the art.
The application is based on Japanese patent application 2017-253468 filed on December 28th, 2017 and in December, 2018
Japanese patent application 2018-239886 filed in 21 days, content is to be incorporated in this referring in the form of.
Claims (9)
1. a kind of near infrared ray cut-off filter, which is characterized in that have transparent substrate and the transparent substrate is arranged in
The near infrared ray cut-off filter of the 1st optical multilayer at least one interarea,
1st optical multilayer is the middle refractive index film and wavelength for being 1.8~2.21 by the refractive index at wavelength 500nm
Made of the low refractive index film that refractive index at 500nm is 1.45~1.49 is alternately laminated, have in described with 5~35 quantity
The transmission with 0 ° of incident light of the assembled unit of refractive index film and the low refractive index film, the 1st optical multilayer is limited
The central wavelength of the wave-length coverage of system is 890nm~1200nm, and the width of the wave-length coverage is 100nm~300nm.
2. near infrared ray cut-off filter according to claim 1, wherein the low refractive index film by selected from silica,
The compound of one or more of magnesium fluoride, calcirm-fluoride and yttrium fluoride or mixture comprising one or more of these compounds
It constitutes, the middle refractive index film is by being selected from zirconium oxide, tantalum oxide, yttrium oxide, lanthanum titanate, zinc sulphide, titanium oxide and aluminium oxide
One or more of compound or mixture comprising one or more of these compounds constitute.
3. near infrared ray cut-off filter according to claim 1 or 2, wherein at least one of the transparent substrate
Have the 2nd optical multilayer on interarea,
2nd optical multilayer is to be more than 2.21 by the refractive index at wavelength 500nm and be 2.8 high refractive index films below
With the low refractive index film it is alternately laminated made of, there is the high refractive index film and the low-refraction with 3~30 quantity
The assembled unit of film, the central wavelength of the restricted wave-length coverage of transmission with 0 ° of incident light of the 2nd optical multilayer
It is 700nm more than and less than 890nm, the width of the wave-length coverage is 100nm~300nm.
4. near infrared ray cut-off filter according to claim 3, wherein the high refractive index film by selected from tantalum oxide,
The compound of one or more of titanium oxide and niobium oxide or mixture comprising one or more of these compounds are constituted.
5. near infrared ray cut-off filter according to any one of claims 1 to 4, wherein make the 1st optical multilayer
It is at least one kind of with multiple in film and the 2nd optical multilayer.
6. near infrared ray cut-off filter according to any one of claims 1 to 5, wherein the transparent substrate is by selecting
It is constituted from the material of one or more of glass, glass ceramics, crystal, resin and sapphire.
7. near infrared ray cut-off filter described according to claim 1~any one of 6, wherein the transparent substrate has
Absorb the property of the light of the wavelength of near infrared region.
8. near infrared ray cut-off filter according to any one of claims 1 to 7, wherein the near infrared ray cut-off
Filter is for having the transmission bands of transmitted light in the range of wavelength 430nm~600nm, in wavelength 750nm with 0 ° of incident light
The range of~1000nm has the inhibition band of the transmission of limitation light,
The average transmittance with 0 ° of incident light of the transmission bands with the difference of the average transmittance of 40 ° of incident light, i.e., with
The average transmittance-of 0 ° of incident light is with the average transmittance of 40 ° of incident light for 3% or less.
9. near infrared ray cut-off filter according to claim 3 or 4, wherein the 1st optical multilayer and the 2nd light
The total number of plies for learning multilayer film is 90 layers or less.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-253468 | 2017-12-28 | ||
| JP2017253468 | 2017-12-28 | ||
| JP2018239886A JP7326738B2 (en) | 2017-12-28 | 2018-12-21 | Near-infrared cut filter |
| JP2018-239886 | 2018-12-21 |
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| Publication Number | Publication Date |
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| CN109975905A true CN109975905A (en) | 2019-07-05 |
| CN109975905B CN109975905B (en) | 2022-06-24 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201811599549.1A Active CN109975905B (en) | 2017-12-28 | 2018-12-26 | Near infrared cut-off filter |
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| CN111736252A (en) * | 2020-06-05 | 2020-10-02 | 浙江晶驰光电科技有限公司 | Near-infrared transmission optical filter and preparation method thereof |
| CN111736251A (en) * | 2020-06-05 | 2020-10-02 | 浙江晶驰光电科技有限公司 | Intermediate infrared transmission optical filter and preparation method thereof |
| CN112346157A (en) * | 2019-08-09 | 2021-02-09 | 浜松光子学株式会社 | Optical element |
| CN113253374A (en) * | 2021-05-27 | 2021-08-13 | 武汉华星光电技术有限公司 | Fingerprint identification display device |
| CN114514448A (en) * | 2019-12-11 | 2022-05-17 | 日本电气硝子株式会社 | Optical filter and method for manufacturing the same |
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| CN111736252A (en) * | 2020-06-05 | 2020-10-02 | 浙江晶驰光电科技有限公司 | Near-infrared transmission optical filter and preparation method thereof |
| CN111736251A (en) * | 2020-06-05 | 2020-10-02 | 浙江晶驰光电科技有限公司 | Intermediate infrared transmission optical filter and preparation method thereof |
| CN111736252B (en) * | 2020-06-05 | 2022-04-01 | 浙江晶驰光电科技有限公司 | Near-infrared transmission optical filter and preparation method thereof |
| CN111736251B (en) * | 2020-06-05 | 2022-06-17 | 浙江晶驰光电科技有限公司 | Intermediate infrared transmission optical filter and preparation method thereof |
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