CN105842857B - A kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and the film structure of 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings - Google Patents
A kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and the film structure of 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings Download PDFInfo
- Publication number
- CN105842857B CN105842857B CN201610273378.8A CN201610273378A CN105842857B CN 105842857 B CN105842857 B CN 105842857B CN 201610273378 A CN201610273378 A CN 201610273378A CN 105842857 B CN105842857 B CN 105842857B
- Authority
- CN
- China
- Prior art keywords
- layer
- film layer
- film
- color separation
- separation membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
- G02B27/1013—Beam splitting or combining systems for splitting or combining different wavelengths for colour or multispectral image sensors, e.g. splitting an image into monochromatic image components on respective sensors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Laminated Bodies (AREA)
- Optical Filters (AREA)
Abstract
The present invention proposes a kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and the film structure of 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings, including ZnS substrates and color separation membrane system；Color separation membrane system is made up of three kinds of thin-film materials；The film layer number of plies amounts to 51 layers, wherein the 1st layer and the 51st layer is zirconium oxide film layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer.In 0.5~0.8 mu m waveband, transmitance is less than 2%；In 1.064 μm of laser wavelengths, transmitance is less than 1%；It is more than 95% in 3.7~4.8 μm of medium-wave infrared wavelength region rates.The film structure has the characteristics of number of plies is few, thickness is small, it is relatively low to be coated with difficulty, good process repeatability, the film layer firmness of acquisition is high, spectrum property is excellent, it disclosure satisfy that the requirement of the common window electro-optical system of multiband, meet job requirement under 45 ° of tilt conditions, and it is able to take environmental test, adhesion test and the moderate friction tests such as high and low temperature storage, temperature shock.
Description
Technical field
The invention belongs to optical film technology field, anti-0.5~0.8 μm of visible ray of specially a kind of ZnS substrates and 1.064
The film structure of μm laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings, for airborne, carrier-borne, vehicular photoelectric platform multiband
Altogether in the optical system of light path.
Background technology
Current electro-optical system platform is constantly towards small volume, maneuverability, multifunctional unit, the round-the-clock direction hair used
Exhibition, application of the window technique in electro-optical system platform is more and more extensive altogether for multiband, has target acquistion/tracking and monitoring work(
For the modernization optical sensor system of energy all by multiple sensor combinations in single component, these sensors include visible image capturing
Machine and medium-wave infrared thermal imaging system, FLIR (FLIR) and laser range finder.These systems to combine are all logical by one
Observed with aperture window, so as to realize the miniaturization of electro-optical system platform, multifunctional unit, the round-the-clock purpose used.Adopt
With in the multiband altogether optical system of light path technology, color separation filter is the direct Primary Component for determining whole system performance.
Anti- 0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser, the dichroic coating master of saturating 3.7~4.8 μm of medium-wave infrareds
Apply in the multiband altogether electro-optical system of light path.Anti- visible and laser, the dichroic coating film layer of saturating medium-wave infrared are very thick at present,
Typically all at 60 to 80 layers, and working as film layer will work under 45 ° of tilt conditions, and can only be next to increase the method for dieletric reflection heap
Solve the problems, such as zone of reflections width, cause that the membrane system number of plies is more, and thickness is bigger, cause manufacture difficulty especially high.Due to thicknesses of layers
Greatly, so film layer is coated with the time and especially grown, higher is required to film thickness monitoring precision and technology stability；Film layer can be caused simultaneously
Cumulative stress, error accumulation, film layer absorption loss water accumulation, the loss accumulation of film layer structure defect scattering etc. are controlled, make the film of deposition
Layer spectrum property is poor, and firmness is low, cracking even demoulding easily occurs.
For anti-0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser, saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings
Film structure, currently without find pertinent literature report.It is investigated that new, similar document has, and pays elegant China and waits the 5th phase in 2009
《Infrared and laser engineering》Periodical has delivered the paper of entitled " visible-infrared multiwave optical thin film in zinc sulfide-based bottom ", should
Paper discloses author and utilizes ZnS and YbF3The multilayer film that two kinds of materials are formed, realize 0.4 μm~0.7 μm visible and 8 μm
~12 μm of infrared band is high thoroughly, and 1.064 μm and 1.54 μm of laser is high anti-.Difference of the membrane system due to being divided wave band in paper,
Film structure is relatively easy, and the number of plies is few, and it is low that film layer is coated with difficulty.
Feng Jun is just waited the 4th phase in 2004《Optical precision engineering》Periodical delivered it is entitled " it is anti-it is visible, in it is infrared, saturating
The paper of the development of 10.6 μm of superlaser dichronic mirrors ", it the article disclose author and utilize ZnSe and YbF3Two kinds of materials are formed
Multilayer film, and obtain the preferable sample of spectrum property, basically reach ideal indicator.Membrane system light splitting wave band is different in paper,
It is designed using selenizing Zinc material, it is larger in the absorption loss of visible light wave range.
The content of the invention
Technical problems to be solved
To solve the problems, such as that prior art is present, the present invention propose a kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and
The film structure of 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings, in the case of 45 ° of oblique incidences, realize
0.5~0.8 μm of visible ray and 1.064 μm of laser high reflections, 3.7~4.8 μm of medium-wave infrared wave bands are highly transmissive.At 0.5~0.8 μm
Wave band, transmitance are less than 2%；In 1.064 μm of laser wavelengths, transmitance is less than 1%；It is saturating in 3.7~4.8 μm of medium-wave infrared wave bands
Rate is penetrated more than 95%.The film structure has the characteristics of number of plies is few, thickness is small, it is relatively low to be coated with difficulty, good process repeatability,
The film layer firmness of acquisition is high, and spectrum property is excellent, disclosure satisfy that the requirement of the common window electro-optical system of multiband, meets
Job requirement under 45 ° of tilt conditions, and be able to take high and low temperature storage, the environmental test such as temperature shock, adhesion test and in
Spend friction test.
Technical scheme
The technical scheme is that：
Anti- 0.5~0.8 μm of visible ray of a kind of ZnS substrates and 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrareds
The film structure of dichroic coating, it is characterised in that：Including ZnS substrates and color separation membrane system；The color separation membrane system is by three kinds of films
Film layer superposition prepared by material is formed；The film layer number of plies amounts to 51 layers, wherein the 1st layer and the 51st layer is zirconium oxide film layer, the 2nd layer is arrived
Even level in 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer；Each thicknesses of layers is：
Beneficial effect
Present invention employs hardness and intensity are of a relatively high, Stress match is preferable, is absorbed visible to medium-wave infrared wave band
Relatively low ZnS, YbF3Two kinds of thin-film material combinations form assembly of thin films, and use ZrO2Transition zone technology and protective layer skill
Art, solves caused by stress in thin film is accumulated that film layer comes off or is cracked, and improves intensity, the firmness of film layer.In base
The matching of refractive index is realized using non-extreme value layer between bottom and film layer, film layer and air, has been effectively compressed passband ripple, significantly
The transmitance of passband is improved, while reduces the gross thickness of film layer, reduces film layer process for plating difficulty, it is relative to improve film
The control accuracy of thickness degree.In 0.5~0.8 mu m waveband, transmitance is less than 2%；In 1.064 μm of laser wavelengths, transmitance is less than
1%；It is more than 95% in 3.7~4.8 μm of medium-wave infrared wavelength region rates.And it is able to take《GJB 2485-95》Middle 3.4.1.1 is attached
Adhesion tests, 3.4.1.3 moderates friction test, the storage experiment of 3.4.2.1 high/low temperatures,《GJB 150.5A-2009》Temperature shock
Environmental test.
Brief description of the drawings
Fig. 1 is that anti-0.5~0.8 μm of visible ray of ZnS substrates of the present invention and 1.064 μm of laser, saturating 3.7~4.8 μm of medium waves are red
The film structure schematic diagram of outer dichroic coating.
Fig. 2 is the transmittance graph of the embodiment of the present invention 1.
Fig. 3 is the transmittance graph of the embodiment of the present invention 2.
Fig. 4 is the transmittance graph of the embodiment of the present invention 3.
Fig. 5 is the transmittance graph of the embodiment of the present invention 4.
Fig. 6 is the transmittance graph of the embodiment of the present invention 5.
Embodiment
Anti- 0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings
Film structure includes ZnS substrates and color separation membrane system.The film layer that the color separation membrane system is prepared by three kinds of thin-film materials is superimposed structure
Into.Wherein, the first film layer is that zirconium oxide is coated on the surface of the ZnS substrates；Second film layer is fluorination ytterbium, is coated on described
In first film layer；Third membrane layer is zinc sulphide, is coated in second film layer；4th film layer is fluorination ytterbium, and is coated on institute
State in third membrane layer；..., zinc sulphide film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st film layer is oxidation
Zirconium, it is coated in the 50th film layer.That is the film layer number of plies of color separation membrane system amounts to 51 layers, the 1st layer and the 51st layer for oxidation
Zirconium film layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer.
The thickness of described first to the 51st film layer is shown in Table one.
The thickness of one each tunic of table
The film structure is mainly used in the electro-optical system of the common light path of multiband, by the visible ray in main optical path and can swash
Light is separated with medium-wave infrared light, and the color separation filter for being coated with the film layer is the direct crucial device for determining whole system performance
Part.0.5~0.8 mu m waveband is may be implemented in, transmitance is less than 2%；In 1.064 μm of laser wavelengths, transmitance is less than 1%；3.7
~4.8 μm of medium-wave infrared wavelength region rates are more than 95%.And it is able to take the environmental tests such as high/low temperature storage, temperature shock, lead to
Cross adhesive force and moderate friction test.
The present invention is described with reference to specific embodiment：
Embodiment 1：Transparent substrate uses multispectral ZnS, and the film layer that color separation membrane system is prepared by three kinds of thin-film materials is superimposed
Form.Wherein, the first film layer is zirconium oxide, is coated on the surface of the ZnS substrates；Second film layer is fluorination ytterbium, is coated on
In first film layer；Third membrane layer is zinc sulphide, is coated in second film layer；4th film layer is fluorination ytterbium, and is coated with
In the third membrane layer；The like, zinc sulphide film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st film layer
For zirconium oxide, it is coated in the 50th film layer.That is the film layer number of plies of color separation membrane system amounts to 51 layers, the 1st layer and the 51st layer
For zirconium oxide film layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer.Described first
Thickness to the 51st film layer is shown in Table two.
The thickness of two embodiment of table, 1 each tunic
The mu m waveband of film layer 0.5~0.8, mean transmissivity 1.674% are obtained after tested；In 1.064 μm of laser wavelengths,
Transmitance is 0.771%；It is 95.747% in 3.7~4.8 μm of medium-wave infrared wave band average transmittances, referring to Fig. 2.
Embodiment 2：Transparent substrate uses multispectral ZnS, and the film layer that color separation membrane system is prepared by three kinds of thin-film materials is superimposed
Form.Wherein, the first film layer is coated with for zirconium oxide, on the surface of the ZnS substrates；Second film layer is fluorination ytterbium, is coated on
In first film layer；Third membrane layer is zinc sulphide, is coated in second film layer；4th film layer is fluorination ytterbium, and is coated with
In the third membrane layer；The like, zinc sulphide film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st film layer
For zirconium oxide, it is coated in the 50th film layer.That is the film layer number of plies of color separation membrane system amounts to 51 layers, the 1st layer and the 51st layer
For zirconium oxide film layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer.Described first
Thickness to the 51st film layer is shown in Table three.
The thickness of three embodiment of table, 2 each tunic
The mu m waveband of film layer 0.5~0.8, mean transmissivity 1.612% are obtained after tested；In 1.064 μm of laser wavelengths,
Transmitance is 0.766%；It is 95.734% in 3.7~4.8 μm of medium-wave infrared wave band average transmittances, referring to Fig. 3.
Embodiment 3：Transparent substrate uses multispectral ZnS, and the film layer that color separation membrane system is prepared by three kinds of thin-film materials replaces
Superposition is formed.Wherein, the first film layer is zirconium oxide, is coated on the surface of the ZnS substrates；Second film layer is fluorination ytterbium, is plated
System is in first film layer；Third membrane layer is zinc sulphide, is coated in second film layer；4th film layer is fluorination ytterbium, and
It is coated in the third membrane layer；The like, zinc sulphide film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st
Film layer is zirconium oxide, is coated in the 50th film layer.That is the film layer number of plies of color separation membrane system amounts to 51 layers, the 1st layer and
51 layers are zirconium oxide film layer, and the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer.It is described
The thickness of first to the 51st film layer is shown in Table four.
The thickness of four embodiment of table, 3 each tunic
The mu m waveband of film layer 0.5~0.8, mean transmissivity 1.606% are obtained after tested；In 1.064 μm of laser wavelengths,
Transmitance is 0.743%；It is 95.757% in 3.7~4.8 μm of medium-wave infrared wave band average transmittances, referring to Fig. 4.
Embodiment 4：Transparent substrate uses multispectral ZnS, and the film layer that color separation membrane system is prepared by three kinds of thin-film materials replaces
Superposition is formed.Wherein, the first film layer is zirconium oxide, is coated on the surface of the ZnS substrates；Second film layer is fluorination ytterbium, is plated
System is in first film layer；Third membrane layer is zinc sulphide, is coated in second film layer；4th film layer is fluorination ytterbium, and
It is coated in the third membrane layer；The like, zinc sulphide film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st
Film layer is zirconium oxide, is coated in the 50th film layer.That is the film layer number of plies of color separation membrane system amounts to 51 layers, the 1st layer and
51 layers are zirconium oxide film layer, and the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer.It is described
The thickness of first to the 51st film layer is shown in Table five.
The thickness of five embodiment of table, 4 each tunic
The mu m waveband of film layer 0.5~0.8, mean transmissivity 1.692% are obtained after tested；In 1.064 μm of laser wavelengths,
Transmitance is 0.945%；It is 95.763% (referring to Fig. 5) in 3.7~4.8 μm of medium-wave infrared wave band average transmittances.
Embodiment 5：Transparent substrate uses multispectral ZnS, and the film layer that color separation membrane system is prepared by three kinds of thin-film materials replaces
Superposition is formed.Wherein, the first film layer is zirconium oxide, is coated on the surface of the ZnS substrates；Second film layer is fluorination ytterbium, is plated
System is in first film layer；Third membrane layer is zinc sulphide, is coated in second film layer；4th film layer is fluorination ytterbium, and
It is coated in the third membrane layer；The like, zinc sulphide film layer replaces to the 50th film layer with fluorination ytterbium film layer；51st
Film layer is zirconium oxide, is coated in the 50th film layer.That is the film layer number of plies of color separation membrane system amounts to 51 layers, the 1st layer and
51 layers are zirconium oxide film layer, and the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer.It is described
The thickness of first to the 51st film layer is shown in Table six.
The thickness of six embodiment of table, 5 each tunic
The mu m waveband of film layer 0.5~0.8, mean transmissivity 1.622% are obtained after tested；In 1.064 μm of laser wavelengths,
Transmitance is 0.627%；It is 95.693% (referring to Fig. 6) in 3.7~4.8 μm of medium-wave infrared wave band average transmittances.
Claims (6)
1. a kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings
Film structure, it is characterised in that：Including ZnS substrates and color separation membrane system；The color separation membrane system is by three kinds of thin-film material systems
Standby film layer superposition is formed；The film layer number of plies amounts to 51 layers, wherein the 1st layer and the 51st layer is zirconium oxide film layer, the 2nd layer to the 50th layer
In even level be fluorination ytterbium film layer, odd-level be zinc sulphide film layer；
1st layer is coated on ZnS substrates；Each thicknesses of layers is：
2. a kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser and saturating 3.7~4.8 according to claim 1
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that：Including ZnS substrates and color separation membrane system；The color separation membrane system
The film layer superposition prepared by three kinds of thin-film materials is formed；The film layer number of plies amounts to 51 layers, wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer；Each thicknesses of layers is：
3. a kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser and saturating 3.7~4.8 according to claim 1
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that：Including ZnS substrates and color separation membrane system；The color separation membrane system
The film layer superposition prepared by three kinds of thin-film materials is formed；The film layer number of plies amounts to 51 layers, wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer；Each thicknesses of layers is：
4. a kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser and saturating 3.7~4.8 according to claim 1
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that：Including ZnS substrates and color separation membrane system；The color separation membrane system
The film layer superposition prepared by three kinds of thin-film materials is formed；The film layer number of plies amounts to 51 layers, wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer；Each thicknesses of layers is：
5. a kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser and saturating 3.7~4.8 according to claim 1
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that：Including ZnS substrates and color separation membrane system；The color separation membrane system
The film layer superposition prepared by three kinds of thin-film materials is formed；The film layer number of plies amounts to 51 layers, wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer；Each thicknesses of layers is：
6. a kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and 1.064 μm of laser and saturating 3.7~4.8 according to claim 1
The film structure of μm medium-wave infrared dichroic coating, it is characterised in that：Including ZnS substrates and color separation membrane system；The color separation membrane system
The film layer superposition prepared by three kinds of thin-film materials is formed；The film layer number of plies amounts to 51 layers, wherein the 1st layer and the 51st layer is zirconium oxide film
Layer, the even level in the 2nd layer to the 50th layer is fluorination ytterbium film layer, odd-level is zinc sulphide film layer；Each thicknesses of layers is：
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610273378.8A CN105842857B (en) | 2016-04-28 | 2016-04-28 | A kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and the film structure of 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610273378.8A CN105842857B (en) | 2016-04-28 | 2016-04-28 | A kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and the film structure of 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105842857A CN105842857A (en) | 2016-08-10 |
| CN105842857B true CN105842857B (en) | 2018-04-03 |
Family
ID=56589614
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610273378.8A Active CN105842857B (en) | 2016-04-28 | 2016-04-28 | A kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and the film structure of 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105842857B (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107132603B (en) * | 2017-05-27 | 2019-07-23 | 中国科学院上海技术物理研究所 | It is a kind of from ultraviolet to the low polarization sensitivity color separation film of the wide spectrum of short-wave infrared |
| CN107315257B (en) * | 2017-08-15 | 2019-08-16 | 天津津航技术物理研究所 | A kind of medium-wave infrared and long wave infrared region recombination dichroic elements and design method |
| CN107300783B (en) * | 2017-08-15 | 2019-08-16 | 天津津航技术物理研究所 | A kind of visible light, laser and middle infrared band recombination dichroic elements and design method |
| CN107300782B (en) * | 2017-08-15 | 2019-10-18 | 天津津航技术物理研究所 | A kind of middle infrared band laser protection window of visible light-near-infrared-and design method |
| CN107290814B (en) * | 2017-08-15 | 2019-08-16 | 天津津航技术物理研究所 | A kind of visible light, laser and middle infrared band all dielectric film recombination dichroic elements and design method |
| CN107479190B (en) * | 2017-08-15 | 2019-08-16 | 天津津航技术物理研究所 | A kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements and design method |
| CN109696716B (en) * | 2019-01-15 | 2020-12-04 | 西安应用光学研究所 | Film system structure of ultra-wide angle laser, long wave infrared dual-waveband high-strength antireflection film |
| CN110879435B (en) * | 2019-11-18 | 2021-08-06 | 中国科学院上海技术物理研究所 | Medium-long wave infrared wide spectrum color separation sheet with zinc selenide crystal as substrate |
| CN112346160B (en) * | 2020-10-20 | 2023-02-21 | 中国人民解放军国防科技大学 | Nonmetal visible light laser infrared multiband compatible stealth film and preparation method thereof |
| CN112578481B (en) * | 2020-12-11 | 2022-03-15 | 中材人工晶体研究院有限公司 | Large-angle medium-long wave infrared anti-reflection protective film and preparation method thereof |
| CN114236661B (en) * | 2021-11-11 | 2023-09-08 | 中国航空工业集团公司洛阳电光设备研究所 | Single crystal germanium infrared crystal spectroscope and laser long wave infrared beam splitting film preparation method |
| CN117092726B (en) * | 2023-08-30 | 2024-02-13 | 有研国晶辉新材料有限公司 | Optical element and preparation method thereof |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4161387B2 (en) * | 1997-01-23 | 2008-10-08 | 株式会社ニコン | Multilayer antireflection film |
| CN101403806B (en) * | 2008-11-05 | 2010-06-09 | 中国科学院上海技术物理研究所 | Visible/infrared wide optical spectrum color separation filter based on germanium substrate |
| CN101424748B (en) * | 2008-12-01 | 2011-02-09 | 杭州科汀光学技术有限公司 | Visual field, 1.06 mum and 8-12 mum three-wave-band highly effective antireflection film |
| CN102338892B (en) * | 2011-09-29 | 2013-11-13 | 中国航空工业集团公司洛阳电光设备研究所 | Anti-reflection film with ZnS as substrate and large incidence angle at optical bands of 1064nm and 8-10mum and ZnS optical window |
| CN104035147B (en) * | 2014-06-12 | 2015-09-30 | 中国科学院上海技术物理研究所 | Take germanium as the LONG WAVE INFRARED anti-reflection film with sunshine reflection function of substrate |
-
2016
- 2016-04-28 CN CN201610273378.8A patent/CN105842857B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105842857A (en) | 2016-08-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105842857B (en) | A kind of anti-0.5~0.8 μm of visible ray of ZnS substrates and the film structure of 1.064 μm of laser and saturating 3.7~4.8 μm of medium-wave infrared dichroic coatings | |
| CN105143930B (en) | It is stacked for the enhancing of high reflection mirror, durable silver coating | |
| US20170276846A1 (en) | Optical filter and device using the same | |
| CN207352201U (en) | Absorption near infrared filter and image sensor | |
| RU2512089C2 (en) | Variable transmission composite interference filter | |
| EP3610306A2 (en) | Anti-reflection coatings for infrared optics | |
| WO2012073791A1 (en) | Optical functional film for infrared light | |
| TWI796360B (en) | Optical filter and camera device | |
| JPH11231128A (en) | Light-absorbing coating part having high absorptivity | |
| CN105849597A (en) | Composite film having superior optical and solar performance | |
| CN206804911U (en) | Thin optical filter and image sensor | |
| CN112323023B (en) | Multi-band salt spray resistant antireflection film based on ZnS substrate and preparation method thereof | |
| WO2016196919A1 (en) | Solar control film | |
| JP2006106570A (en) | Light absorbing filter | |
| CN204028389U (en) | A kind of automatically cleaning ultra-wideband antireflective film glass | |
| CN208477138U (en) | A kind of narrow band filter and optical system | |
| CN107422402A (en) | A kind of damage resistant hyaline membrane and preparation method thereof | |
| WO2020103206A1 (en) | Polarization-independent filter | |
| CN108196332A (en) | A kind of medium-wave infrared reflection light filter film for filtering out the interference of carbon dioxide infrared absorption | |
| TWI598616B (en) | Optical component and method for manufacturing the same | |
| JP2005165249A (en) | Antireflection film, optical lens equipped therewith and optical lens unit | |
| CN101226244A (en) | Membrane series structure of visible/infrared broad spectrum color-separation plate | |
| CN105842768B (en) | Anti- 0.532 μm and 1.064 μm, the film structure of saturating 0.6 μm of -0.9 μm of spectrum film | |
| JP6955343B2 (en) | Infrared cut filter and imaging optical system | |
| CN105044813A (en) | Broadband depth cutoff blue light fluorescence filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |