CN106291792A - A kind of infrared color separation film and preparation method thereof - Google Patents
A kind of infrared color separation film and preparation method thereof Download PDFInfo
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- CN106291792A CN106291792A CN201610965085.6A CN201610965085A CN106291792A CN 106291792 A CN106291792 A CN 106291792A CN 201610965085 A CN201610965085 A CN 201610965085A CN 106291792 A CN106291792 A CN 106291792A
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- 238000000926 separation method Methods 0.000 title claims abstract description 39
- 238000002360 preparation method Methods 0.000 title claims description 14
- 239000010408 film Substances 0.000 claims abstract description 99
- 239000000758 substrate Substances 0.000 claims abstract description 35
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000011248 coating agent Substances 0.000 claims abstract description 25
- 238000000576 coating method Methods 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 21
- 239000010409 thin film Substances 0.000 claims abstract description 15
- 239000005083 Zinc sulfide Substances 0.000 claims abstract description 12
- 229910052984 zinc sulfide Inorganic materials 0.000 claims abstract description 12
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000011521 glass Substances 0.000 claims abstract description 8
- 150000002500 ions Chemical class 0.000 claims description 20
- 238000000151 deposition Methods 0.000 claims description 19
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 18
- 230000008021 deposition Effects 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052786 argon Inorganic materials 0.000 claims description 9
- 238000010884 ion-beam technique Methods 0.000 claims description 9
- 238000004062 sedimentation Methods 0.000 claims description 8
- 238000013461 design Methods 0.000 claims description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 6
- 229910001882 dioxygen Inorganic materials 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 230000002745 absorbent Effects 0.000 claims description 5
- 239000002250 absorbent Substances 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- 229920000742 Cotton Polymers 0.000 claims description 3
- 229960000935 dehydrated alcohol Drugs 0.000 claims description 3
- 238000005566 electron beam evaporation Methods 0.000 claims description 3
- 229960004756 ethanol Drugs 0.000 claims description 3
- 239000007888 film coating Substances 0.000 claims description 3
- 238000009501 film coating Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000006213 oxygenation reaction Methods 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 238000005488 sandblasting Methods 0.000 claims description 3
- 239000011259 mixed solution Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 9
- 230000005540 biological transmission Effects 0.000 abstract description 5
- 230000010354 integration Effects 0.000 abstract description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000701 chemical imaging Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000029058 respiratory gaseous exchange Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention discloses a kind of infrared color separation film, comprising: substrate and the dichroic coating system being formed in substrate both side surface and antireflection film system, dichroic coating system is: A/ α L β M γ H/S, antireflection film system is: A/0.45H 1.4L/S, and the symbol implication in film system: A is air, and S is H K9L substrate of glass, it is thin-film material zinc sulfide for H, L is thin-film material aluminium oxide, and M is thin-film material ITO, and α, β and γ represent the multiple of each film system centre wavelength and centre wavelength respectively.Color separation film of the present invention reaches excellent technical specification, without using complicated film structure and very thin thin layer, there are oblique 45 ° of incidences, 1.064 μm transmission 83%, 8 μm～12 μm reflection 86%, effectively light beam wavelength can be guided the detector that different-waveband is corresponding, it is achieved the high accuracy of optical system, miniaturization, high integration and light-weighted target；Color separation film film structure is simple, stable performance, and technological operation is easy, it is easy to accomplish.
Description
Technical field
The invention belongs to optical element design field, relate to a kind of infrared color separation film and preparation method thereof.
Background technology
Infrared color separation film has wide in terms of optic analytical instrument, optical detector, multi-mode composite imaging optical system
Application prospect, be mainly used in infrared multi-spectral imaging observation and spectrum analysis monitor, China's high-resolution earth observation systems
Key special subjects, also proposes research and development demand to infrared color separation film.
The big visual field infrared color separation film of IRMSS, it is desirable to passband average transmittance is high, zone of reflections reflectivity
By force, spectral region width, there is high reliability and high stability.
The development of infrared dichroic coating can realize the high accuracy of optical system, miniaturization, high integration and light-weighted mesh
Mark, in order to expand the condition and range that infrared system can work, research worker is exploring high performance infrared dichroic coating always, infrared
Dichroic coating is always the emphasis of optical thin film research.
At present, the research of infrared color separation film, mainly with the design philosophy that metal inducement is anti-reflection, uses dielectric-metal-medium
Film layer structure realizes, and very thin metal layer thickness is extremely sensitive on the impact of the whole curve of spectrum, and due to the suction of metal level
Receive, the performance of color separation has been affected；Environmental suitability is poor；Widening of transmission area is to sacrifice absorbance and reflectance as generation
Valency, infrared many spectral coverages color separation efficiency is low.
Summary of the invention
(1) goal of the invention
It is an object of the invention to: a kind of infrared color separation film and preparation method thereof is provided, it is achieved 1.064 μm transmissions, 8 μm～12
The color separation film of μm reflection, can guide, incident beam, the detector that different-waveband is corresponding, improve spectrum scanner resolution and become
Picture element amount.
(2) technical scheme
In order to solve above-mentioned technical problem, the present invention provides a kind of infrared color separation film, comprising: substrate 2 and be formed at base
Dichroic coating system in plate 2 both side surface and antireflection film system, dichroic coating system is: A/ α L β M γ H/S, antireflection film system is: A/
0.45H 1.4L/S, the symbol implication in film system: A are air, and S is H-K9L substrate of glass, are thin-film material zinc sulfide for H, L
For thin-film material aluminium oxide, M is thin-film material ITO, α, β and γ represent respectively each film system centre wavelength and centre wavelength times
Number.
Wherein, the H-K9L glass of a diameter of 40mm, thickness 1mm selected by described substrate 2, its aperture N≤3, surface, local light
Circle Δ N≤0.5, nonparallelism ＜ 30 ", surface smoothness B=V.
Wherein, in described dichroic coating system, α=0.245, β=1.55, γ=0.205.
Present invention also offers the preparation method of a kind of infrared color separation film, it comprises the following steps:
S1: vacuum chamber cleans；
S2: before plated film, substrate cleans；
S3: vacuum chamber prepares
Preset Coating Materials aluminium oxide, ITO and zinc sulfide in vacuum chamber electron gun crucible；
S4: film layer is coated with
Open ion source, use ion beam cleaning substrate；According to the dichroic coating system in substrate both side surface and antireflection film system
Structure, utilizes electron beam evaporation methods to carry out film deposition.
Wherein, in described step S4, film layer is coated with in step, and ion source uses argon as working gas, working gas
Purity is not less than 99.995%, gas flow 20sccm.
Wherein, in described step S4, before film layer is coated with, by substrate heating to 300 ± 10 DEG C, and keep 1h.
Wherein, in described step S4, by design film system, by aluminium oxide, ITO and zinc sulfide alternately evaporation to the both sides of substrate
On surface, wherein
During pellumina deposition, ion source argon gas flow 18 ± 2sccm, oxygen gas flow 25 ± 3sccm, ion
Source bundle pressure 180V～250V, ion source line 80V～120V, control sedimentation rate 0.2-0.5nm/s；
During ito film deposition, oxygen gas flow 25 ± 5sccm, sedimentation rate 0.5-1nm/s；
After ito film has deposited, keep oxygenation capacity constant, cool to 200 ± 10 DEG C, carry out ZnS-film deposition；
During ZnS-film deposition, temperature 200 ± 10 DEG C, ion source argon gas flow 18 ± 2sccm, ion beam pressure
180V～220V, ion source line 80V～110V, sedimentation rate 0.05-0.1nm/s.
Wherein, in described step S1, clean vacuum chamber of film coating machine protective shield, electrode, baffle plate and frock with sandblasting machine, then
Dip in dehydrated alcohol with absorbent carbasus and clean vacuum chamber.
Wherein, in described step S2, dip in the ethanol of volume ratio 1:1, ether mixing with absorbent carbasus and defat cotton successively
Solution cleans substrate surface.
Wherein, step S5 is also included: substrate is lowered the temperature, and is not less than 2 × 10 in vacuum-3Pa, cools to 80 ± 8 DEG C, and closedown is taken out
Vacuum system, vacuum chamber takes out after dropping to room temperature and deposits infrared color separation film.
(3) beneficial effect
Infrared color separation film that technique scheme is provided and preparation method thereof, color separation film reaches excellent technical specification,
Without using complicated film structure and very thin thin layer, there is oblique 45 ° of incidences, 1.064 μm transmissions 83%, 8 μm～the reflection of 12 μm
86%, effectively light beam wavelength can be guided detector corresponding to different-waveband, it is achieved the high accuracy of optical system, miniaturization,
High integration and light-weighted target；Color separation film film structure is simple, stable performance, and technological operation is easy, it is easy to accomplish, the most in fact
Existing through engineering approaches application.
Accompanying drawing explanation
Fig. 1 is that infrared color separation film front arranges schematic diagram with anti-face mask layer, and wherein 1 is dichroic coating system, and 2 is substrate, 3
For antireflection film system.
Fig. 2 is the example curve of infrared color separation film transmittance and wavelength.
Detailed description of the invention
For making the purpose of the present invention, content and advantage clearer, below in conjunction with the accompanying drawings and embodiment, the tool to the present invention
Body embodiment is described in further detail.
In order to solve technical problem present in prior art, the present invention, by design, test, develops a kind of 1.064 μ
M transmission, the infrared color separation film of 8～12 μm reflections, it is with H-K9L glass as substrate, and aluminium oxide, tin indium oxide are (hereinafter referred to as
ITO, In2O3: SnO2=95:5) and zinc sulfide be film material, use vacuum film deposition method prepare, by simple film
Architecture realizes color separation function, and technique is easily controllable, prepares color separation film 1.064 μm transmittance and is more than 83%, 8 μm～the reflection of 12 μm
Ratio is more than 86%, and product optical property, the physical strength of film layer and environmental suitability meet actual operation requirements.
Specifically, with reference to shown in Fig. 1, the infrared color separation film of the present embodiment includes substrate 2 and is formed in substrate 2 both side surface
Dichroic coating system and antireflection film system, dichroic coating system is: A/ α L β M γ H/S, antireflection film system is: A/0.45H 1.4L/S, film
Symbol implication in system: A is air, and S is H-K9L substrate of glass, is thin-film material zinc sulfide for H, and L is thin-film material oxidation
Aluminum, M is thin-film material ITO, and α, β and γ represent the multiple of each film system centre wavelength and centre wavelength respectively.
Wherein, the H-K9L glass of a diameter of 40mm, thickness 1mm selected by substrate 2, its aperture N≤3, surface, locally aperture Δ
N≤0.5, nonparallelism ＜ 30 ", surface smoothness B=V；In dichroic coating system, α=0.245, β=1.55, γ=0.205.
Based on above-mentioned infrared color separation film, its preparation method comprises the following steps:
The first step, vacuum chamber cleans
Clean vacuum chamber of film coating machine protective shield, electrode, baffle plate and frock with sandblasting machine, after cleaning, be cleaned by part surface not
Film layer must be had to adhere to, then dip in dehydrated alcohol with absorbent carbasus and clean vacuum chamber.
Second step, cleans before plated film
Successively with absorbent carbasus and defat cotton dip in wet ethanol, ether mixed solution (volume ratio 1:1) is cleaned surface, and is used
" method of breathing out " inspection film surface, till without greasy dirt, grit, scratch.
3rd step, vacuum chamber prepares
Appropriate Coating Materials aluminium oxide, ITO and zinc sulfide are put into electron gun crucible (for 1000mm coater,
Aluminium oxide, ITO and zinc sulfide are respectively 50g, 100g, 100g), Coating Materials purity is not less than 99.99%, blows base with ear washing bulb
Sheet surface, closes door for vacuum chamber immediately after.
4th step, film layer is coated with
Vacuum is not less than 2 × 10-3Pa, opens swivel mount switch, rotational workpieces frame, opens baking, set baking temperature.
Open electron gun deflection power, filament supply and rifle high pressure the most successively.
Opening ion source, with ion beam cleaning substrate 5min, ion source uses argon as working gas, and working gas is pure
Degree, not less than 99.995%, gas flow 20sccm, utilizes the electron beam evaporation methods of Assisted by Ion Beam to carry out film deposition.
By substrate heating to 300 ± 10 DEG C (optimum 300 DEG C), and keep 1h.
By design film system, by aluminium oxide, ITO and zinc sulfide alternately evaporation to two faces of substrate.Coating Materials deposits
Parameter is as follows:
(1) pellumina deposition
Ion source argon gas flow 18 ± 2sccm, oxygen gas flow 25 ± 3sccm, ion beam pressure 180V～
250V, ion source line 80V～120V, regulate electron gun current, full and uniform fritting coating materials, opens baffle plate, controls deposition speed
Rate 0.2-0.5nm/s；
This technological parameter can improve film layer and substrate adhesion, it is achieved thin-film refractive index mates, and meets film layer environment and adapts to
Property requirement.
(2) ito film deposition
Close ion source, oxygen gas flow 25 ± 5sccm, regulate electron gun current, open baffle plate, sedimentation rate 0.5-
1nm/s；
After ito film has deposited, keep oxygenation capacity constant, cool to 200 ± 10 DEG C, carry out ZnS-film deposition；
Under this technological parameter, use electron gun deposition doped ITO (In2O3: SnO2=95:5) Coating Materials, can improve
The film layer transmitance at passband and the reflectance of the zone of reflections, it is ensured that film layer optical property.
(3) ZnS-film deposition
Temperature 200 ± 10 DEG C, ion source argon gas flow 18 ± 2sccm, ion beam pressure 180V～220V, ion source
Line 80V～110V, regulates electron gun current, full and uniform fritting coating materials, opens baffle plate, sedimentation rate 0.05-0.1nm/s；
This technological parameter can improve ito film layer stability, it is achieved thin-film refractive index mates, and meets film layer environment and adapts to
Property requirement.
5th step, substrate is lowered the temperature.
It is not less than 2 × 10 in vacuum-3Pa, cools to 80 ± 8 DEG C, closes pumped vacuum systems, and vacuum chamber takes after dropping to room temperature
Go out to deposit eyeglass.
Shown in reference Fig. 2, infrared color separation film spectrophotometric result number prepared by the present embodiment, reach design requirement.
The above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For Yuan, on the premise of without departing from the technology of the present invention principle, it is also possible to make some improvement and deformation, these improve and deformation
Also should be regarded as protection scope of the present invention.
Claims (10)
1. an infrared color separation film, it is characterised in that including: substrate (2) and the dichroic coating being formed in substrate (2) both side surface
System and antireflection film system, dichroic coating system is: A/ α L β M γ H/S, antireflection film system is: A/0.45H 1.4L/S, the symbol in film system
Number implication: A is air, and S is H-K9L substrate of glass, is thin-film material zinc sulfide for H, and L is thin-film material aluminium oxide, and M is thin film
Material ITO, α, β and γ represent the multiple of each film system centre wavelength and centre wavelength respectively.
Infrared color separation film the most as claimed in claim 1, it is characterised in that described substrate (2) selects a diameter of 40mm, thickness
The H-K9L glass of 1mm, its aperture N≤3, surface, locally aperture Δ N≤0.5, nonparallelism ＜ 30 ", surface smoothness B=V.
Infrared color separation film the most as claimed in claim 1, it is characterised in that in described dichroic coating system, α=0.245, β=1.55,
γ=0.205.
4. the preparation method of the infrared color separation film according to any one of claim 1-3, it is characterised in that include following step
Rapid:
S1: vacuum chamber cleans；
S2: before plated film, substrate cleans；
S3: vacuum chamber prepares
Preset Coating Materials aluminium oxide, ITO and zinc sulfide in vacuum chamber electron gun crucible；
S4: film layer is coated with
Open ion source, use ion beam cleaning substrate；According to the dichroic coating system in substrate both side surface and antireflection film system structure,
Electron beam evaporation methods is utilized to carry out film deposition.
The preparation method of infrared color separation film the most as claimed in claim 4, it is characterised in that in described step S4, film layer is coated with
In step, ion source uses argon to be not less than 99.995% as working gas, working gas purity, gas flow 20sccm.
The preparation method of infrared color separation film the most as claimed in claim 5, it is characterised in that in described step S4, film layer is coated with
Before, by substrate heating to 300 ± 10 DEG C, and keep 1h.
The preparation method of infrared color separation film the most as claimed in claim 6, it is characterised in that in described step S4, by design film
System, is alternately deposited with aluminium oxide, ITO and zinc sulfide in the both side surface of substrate, wherein
During pellumina deposition, ion source argon gas flow 18 ± 2sccm, oxygen gas flow 25 ± 3sccm, ion beam
Pressure 180V～250V, ion source line 80V～120V, control sedimentation rate 0.2-0.5nm/s；
During ito film deposition, oxygen gas flow 25 ± 5sccm, sedimentation rate 0.5-1nm/s；
After ito film has deposited, keep oxygenation capacity constant, cool to 200 ± 10 DEG C, carry out ZnS-film deposition；
ZnS-film deposition time, temperature 200 ± 10 DEG C, ion source argon gas flow 18 ± 2sccm, ion beam pressure 180V～
220V, ion source line 80V～110V, sedimentation rate 0.05-0.1nm/s.
The preparation method of infrared color separation film the most as claimed in claim 4, it is characterised in that in described step S1, use sandblasting machine
Clean vacuum chamber of film coating machine protective shield, electrode, baffle plate and frock, then dip in dehydrated alcohol with absorbent carbasus and clean vacuum chamber.
The preparation method of infrared color separation film the most as claimed in claim 4, it is characterised in that in described step S2, successively with de-
Fat gauze and defat cotton dip in the ethanol of volume ratio 1:1, ether mixed solution cleans substrate surface.
The preparation method of infrared color separation film the most as claimed in claim 4, it is characterised in that also include step S5: substrate drops
Temperature, is not less than 2 × 10 in vacuum-3Pa, cools to 80 ± 8 DEG C, closes pumped vacuum systems, and vacuum chamber takes out deposition after dropping to room temperature
Infrared color separation film.
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| CN107515438A (en) * | 2017-09-06 | 2017-12-26 | 天津津航技术物理研究所 | A kind of infrared wide spectrum cut-off laser of narrowband beam splitter |
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| CN107479190A (en) * | 2017-08-15 | 2017-12-15 | 天津津航技术物理研究所 | A kind of visible ray and LONG WAVE INFRARED all dielectric film recombination dichroic elements and design method |
| CN107479190B (en) * | 2017-08-15 | 2019-08-16 | 天津津航技术物理研究所 | A kind of visible light and LONG WAVE INFRARED all dielectric film recombination dichroic elements and design method |
| CN107515438A (en) * | 2017-09-06 | 2017-12-26 | 天津津航技术物理研究所 | A kind of infrared wide spectrum cut-off laser of narrowband beam splitter |
| CN110527955A (en) * | 2019-09-30 | 2019-12-03 | 长春理工大学 | A kind of step low-refraction Al2O3The preparation method of film |
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