CN208649456U - A kind of antireflective coating structure - Google Patents
A kind of antireflective coating structure Download PDFInfo
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- CN208649456U CN208649456U CN201820914259.0U CN201820914259U CN208649456U CN 208649456 U CN208649456 U CN 208649456U CN 201820914259 U CN201820914259 U CN 201820914259U CN 208649456 U CN208649456 U CN 208649456U
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Abstract
The utility model provides a kind of antireflective coating structure, in the one or both sides of transparent substrate, respectively independent plating is formed with antireflective functional film layer, and the antireflective functional film layer is followed successively by middle refractivity film layer, high refractive index layer, low-index film from glass substrate outward.The utility model be effectively reduced glass surface reflection while, reduce polarizers of big angle scope in interfere color change, make whole film layer have can tempering and bendable Steel Properties, realize full-size be 3.3m*12m anti reflection glass production.
Description
Technical field
The utility model belongs to glass post-processing technical field, and in particular to the anti-reflection of monotone in a kind of polarizers of big angle scope
Penetrate optical coating glass.
Background technique
Currently, the preparation for antireflective coating and antireflective coating structure product, is usually used chemical method and physics
It is prepared by method two ways.Chemical method is usually used sol-gal process or using modes such as organic sprayings, makes anti-reflection
It is placed on glass surface, to realize that glass or other substrates have anti-reflective effect, such as patent CN103782203A, 2017
May 7 disclosed and CN102533040A, disclose on July 4th, 2012 etc..And existing physical coating method is mainly using sputtering
Mode, antireflection layer is coated on to the surface of glass or other substrates, to reach anti-reflective effect, but such patent skill
Art is all to use pure inorganic material high/low or refractive index collocation form low/high, realizes antireflective with the mode of spatter film forming
Effect, thicknesses of layers is thicker, and structure is complex, generally at least 5 film structures, even more.This kind of film layer structure has
Many defects: (1) seriously affecting production efficiency and the quality of production, exists simultaneously the problems such as debugging difficulty is larger, and debug time is long,
It is unfavorable for the large area production of antireflective coating structure；(2) anti-reflection efficiency is low, and effect is not significant, and transmitance does not increase significantly
Add；(3) film layer structure is complicated, it is difficult to carry out tempering processing；(4) it is big that it is easy to appear tone variations in wide-angle range of observation, holds
Easily there is across axis discoloration or redness phenomenon；(5) film surface easily scratches abrasion, not easy to clean.
Summary of the invention
The purpose of this utility model is to provide a kind of antireflective coating structures, can pass through reasonable film layer structure and light
Design optimization is composed, film layer structure is simplified, using magnetron sputtering or other physically or chemically depositional modes, it is successively coated on
Glass surface reduces while glass surface reflection is effectively reduced and interferes color change in polarizers of big angle scope.And it is selected by material
Take, the adjustment of sputtering mode and atmosphere, make whole film layer have can tempering and bendable Steel Properties, to realize that full-size is
The production of 3.3m*12m anti reflection glass realizes the processing flow of steel after first plating, substantially increases production efficiency, and reduce life
Produce cost.
The antireflective coating structure of the utility model, in the one or both sides of glass substrate, respectively independent plating is formed with anti-reflection
Penetrate functional film layer, the antireflective functional film layer is followed successively by middle refractivity film layer, high refractive index layer, low from glass substrate outward
Refractivity film layer.
Wherein, the refractive index of the glass substrate is the bearing substrate of film plating layer between 1.5-1.52, and thickness preferably exists
Between 3-20mm, or the substrate of other forms, such as organic transparent plastic, glass surface preferably carry out at cleaning polishing
Reason, helps to improve the bond strength with film layer.
Wherein, for the refractive index of the middle refractivity film layer between 1.6-1.75, refractive index is slightly higher compared with glass substrate.Film layer
Thickness is between 80-92nm.Preferred film material is SiNxOy, SiBNxOy, SiTiNxOy, SiAlNxOy, SiZrNxOy.
When carrying out plated film using magnetron sputtering, target is selected from one or more of Si, SiB, SiTi, SiAl, SiZr, wherein SiB target
The content of middle B is 0.4-0.6w%, and the content of Ti is 10-20w% in SiTi target, and the content of Al is 5-15w% in SiAl target,
The content of Zr is 20-40w% in SiZr target, and when spatter film forming forms a film under oxygen, nitrogen and argon atmosphere, oxygen and nitrogen
Volume ratio is 1:4-2:3, and Ar tolerance is 400-800sccm.
Wherein, the refractive index of the high refractive index layer is between 2.0-2.5.Thicknesses of layers is between 125-140nm.It is excellent
The film material of choosing is SiNx, SiAlNx, SiBNx, SiTiNx, SiZrNx, TiOx, NbOx, ZrOx.It is carried out using magnetron sputtering
When plated film, when target is selected from Si, SiAl, SiB, SiTi, SiZr, spatter film forming in a nitrogen atmosphere, is formed film layer for SiNx,
SiAlNx,SiBNx,SiTiNx,SiZrNx；When target is selected from TiOx, NbOx, ZrOx, in argon gas and micro- oxygen (oxygen concentration 2
~10v%) spatter film forming under atmosphere, forming film layer is still TiOx, NbOx, ZrOx.
Wherein, the refractive index of the low-index film is between 1.45-1.5.Thicknesses of layers is between 80-100nm.It is excellent
The film material of choosing is SiOx, SiBOx, SiTiOx, SiAlOx, SiZrOx.When carrying out plated film using magnetron sputtering, target is selected from
One or more of Si, SiB, SiAl, SiTi, the spatter film forming under argon gas and oxygen atmosphere, Ar tolerance are 400-
800sccm。
Further, in the antireflective functional film layer, alloy film layer can also obtain for corresponding monometallic target cosputtering
, the sputtering ratio of different elements is controlled by adjusting the size of sputtering power or electric current, this is easy to accomplish in sputtering process
's.
Wherein, the refractive index difference of the middle refractivity film layer and high refractive index layer is greater than 0.3, the high refractive index film
The refractive index difference of layer and low-index film is greater than 0.5.The difference of refractive index ensure that the stabilization of anti-reflective effect.
Wherein, the middle refractivity film layer, high refractive index layer, in low-index film, wherein at least two adjacent membranes
Contain identical component in layer, so as to improve the level of the binding force between film layer.Such as adjacent two layers SiNx and SiOx,
All contain same composition Si element, adjacent two layers NbOx and SiNxOy have oxygen (element) to participate in spatter film forming.
The preferred material of each film layer has good acid-alkali-corrosive-resisting in above-mentioned antireflective functional film layer in the utility model
Performance, weatherability or damage-resistant energy so that film layer can be realized can tempering operations, can be used with monolithic.If to above-mentioned performance
Not stringent particular/special requirement can choose the other materials in ranges of indices of refraction, such as ZnO, ZnSnOx, AZO, can be in non-steel
It is applied under the conditions of change.
Wherein, it is additionally provided with protective film layer on the antireflective functional film layer, the refractive index of the protective film layer exists
Between 1.4-2.3, thickness is between 2-20nm.The material of protective film layer is SiC, ZrOx, film easy to clean, anti-fingerprint liquid film etc.,
Can commercially available or self manufacture raw material sprayed.Above-mentioned SiC and ZrOx material is hard material, can be improved the resistance to of film layer
Scratch performance；Film easy to clean and anti-fingerprint liquid can be easily installed and use process in film layer cleaning.Film easy to clean and anti-finger
Liquid easy to clean available on the market or anti-fingerprint liquid can be coated on the table of film layer by the film forming of line liquid film by way of spraying
Face.Above-mentioned protective layer material is provided with certain high-temperature stability, will not influence the tempering performance of product.The thickness control of protective layer
System in smaller range, on the one hand improves production efficiency, on the other hand meets the control to tone.
Monotone antireflective coating structure provided by the utility model, using the off-line coated technique side of magnetron sputtering method
Formula, only with most 2~3 kinds of plated film target materials, vacuum degree control is in 3~8*10-3Between mbar, by the adjusting of atmosphere,
Realize that single side is coated with film layer structure down to 3 layers of antireflective coating process, film material refractive index collocation form is medium/high/low
Structure, and Application Optics principle of interference is coated on glass surface, and glass is made to show excellent anti-reflective effect, to reach
To large scale, the purpose produced in enormous quantities and be used for Gongjian's decorative curtain wall.In addition, thus being brought due to simplifying film layer structure
Benefit be exactly that debugging difficulty substantially reduces, coating process is easy to control, and technological difficulty is greatly reduced, simultaneously because adopting
With the off-line coated mode of magnetron sputtering, product process flow is single, and preparation process is relatively simple, and more important is film layer knots
After structure simplifies, while may be implemented compatible with other products membrane system target, it can be increased with target quantity, production can be improved and walk
Speed, therefore can be mass-produced, production efficiency is greatly improved, and product size is almost unrestricted, and largest production size is reachable
3.3m*12m can produce the product of various sizes according to customer demand, effectively improve come into force efficiency and product quality.Film layer structure
Simplify and collocation adjustment also solves and is easy to appear the big problem of tone variations in common coated glass wide-angle range of observation, keeps away
Across axis discoloration and the generation of redness phenomenon are exempted from.When the two sides of glass substrate is coated with antireflective functional film layer, 60 degree of side
Reflectivity is observed less than 8% in angle, and front observation reflectivity is less than 1.5%；Antireflective function is coated in the one side of glass substrate
When film layer, front observation reflectivity is less than 5%.In terms of tone, 60 degree of side angle observation tone does not change.
From product film layer structure, using special inorganic and oxide coating material, therefore final anti reflection glass
Product, be able to achieve can tempering heat treatment, therefore can first produce big plate anti reflection glass, and various sizes are cut according to customer demand and are wanted
It asks, or is directly sold to other external coordination factories and carries out following process, be prepared into the product of the various structural requirements such as hollow, interlayer.
Detailed description of the invention
The attached drawing for constituting a part of the utility model is used to provide a further understanding of the present invention, this is practical new
The illustrative embodiments and their description of type are not constituteed improper limits to the present invention for explaining the utility model.?
In attached drawing:
Fig. 1-7 is that the single side of embodiment of this case 1-7 is coated with the structural schematic diagram of film layer respectively.
Specific embodiment
In order to better understand the utility model, the utility model is described in detail below with reference to specific attached drawing.
Using large-scale cleaning equipment, it is desirable that pure water resistivity is greater than 1016Ω carries out at cleaning polishing glass substrate surface
Reason.The refractive index of glass substrate between 1.5-1.52, can be 3mm, 4mm, 5mm, 6mm, 8mm, 10mm, 12mm, 15mm,
19mm is also possible to the substrate of other thickness or other forms, such as organic transparent plastic.
Filming equipment requires background vacuum 10-6~10-7Mbar or more, sputtering technology vacuum level requirements are in 3~8*10-3Between mbar.In the one or both sides of glass substrate, it is respectively independently coated with antireflective functional film layer, the antireflective functional membrane
Layer is followed successively by middle refractivity film layer, high refractive index layer, low-index film from glass substrate outward, and protective film layer is using commercially available
Raw material is formed by the means of conventional spraying.The film plating layer structure of seven specific embodiments is provided in table 1, and in attached drawing
It is shown in 1-7.
Table 1
Table 2-7 is respectively optical detection result of the product of embodiment 1-5 under different viewing angles.
Optical detection result of the product of 2 embodiment 1 of table under different viewing angles (before tempering)
Optical detection result of the product of 3 embodiment 1 of table under different viewing angles (after tempering)
Optical detection result of the product of 4 embodiment 2 of table under different viewing angles (before tempering)
Optical detection result of the product of 5 embodiment 3 of table under different viewing angles (before tempering)
Optical detection result of the product of 6 embodiment 4 of table under different viewing angles (before tempering)
Optical detection result of the product of 7 embodiment 5 of table under different viewing angles (before tempering)
Optical detection result of the product of 8 embodiment 6 of table under different viewing angles (before tempering)
Optical detection result of the product of 9 embodiment 7 of table under different viewing angles (after tempering)
Antireflective coating structure provided by the utility model becomes with viewing angle it can be seen from optical detection result
Change, it is not in across axis or rubicundity phenomenon that color changes in same tone.The antireflective function of double coated simultaneously
Film layer is in the angular region of 60 degree of side, and reflectivity is less than 8%, and less than 1.5%, (embodiment 4-5 can be lower than positive 0 degree of reflectivity
1%)；The positive 0 degree of reflectivity of the antireflective functional film layer that single side is coated with is less than 5%.Antireflective coating structure is able to carry out normally
Tempering processing, tempering processing back reflection rate can further decrease, and transmitance increases, and color is almost unchanged (table 3).Protective film layer
(embodiment 6-7) be added will not antireflective function to coated glass and tone have an adverse effect (table 8-9).
The above is only the preferred embodiment of the utility model only, is not intended to limit the utility model, all at this
Within the spirit and principle of utility model, any modification, equivalent replacement, improvement and so on should be included in the utility model
Protection scope within.
Claims (9)
1. a kind of antireflective coating structure, in the one or both sides of transparent substrate, respectively independent plating is formed with antireflective functional film layer,
The antireflective functional film layer is followed successively by middle refractivity film layer, high refractive index layer, low-index film from glass substrate outward.
2. antireflective coating structure according to claim 1, which is characterized in that the refractive index of the transparent substrate is in 1.5-
Between 1.52, for thickness between 3-20mm, the transparent substrate is glass or organic transparent plastic.
3. antireflective coating structure according to claim 1, which is characterized in that the refractive index of the middle refractivity film layer exists
Between 1.6-1.75, between 2.0-2.5, the refractive index of the low-index film exists the refractive index of the high refractive index layer
Between 1.45-1.5.
4. antireflective coating structure according to claim 1, which is characterized in that the thicknesses of layers of the middle refractivity film layer
Between 80-92nm, the thicknesses of layers of the high refractive index layer is between 125-140nm, the film of the low-index film
Thickness degree is between 80-100nm.
5. antireflective coating structure according to claim 1, which is characterized in that the film material of the middle refractivity film layer
For SiNxOy, SiBNxOy, SiTiNxOy, SiAlNxOy, SiZrNxOy, the film material of the high refractive index layer be SiNx,
SiAlNx, SiBNx, SiTiNx, SiZrNx, TiOx, NbOx, ZrOx, the film material of the low-index film be SiOx,
SiBOx、SiTiOx、SiAlOx、SiZrOx。
6. antireflective coating structure according to claim 1, which is characterized in that the middle refractivity film layer and high refractive index
For the refractive index difference of film layer greater than 0.3, the refractive index difference of the high refractive index layer and low-index film is greater than 0.5.
7. antireflective coating structure according to claim 1, which is characterized in that the middle refractivity film layer, high refractive index
In film layer, low-index film, identical component is contained in wherein at least two adjacent film layers.
8. antireflective coating structure according to claim 1, which is characterized in that also set on the antireflective functional film layer
It is equipped with protective film layer, the refractive index of the protective film layer is between 1.4-2.3, and thickness is between 2-20nm.
9. antireflective coating structure according to claim 8, which is characterized in that the material of the protective film layer be SiC,
ZrOx, film easy to clean or anti-fingerprint liquid film.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108441837A (en) * | 2018-06-13 | 2018-08-24 | 天津南玻节能玻璃有限公司 | A kind of antireflective coating structure |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108441837A (en) * | 2018-06-13 | 2018-08-24 | 天津南玻节能玻璃有限公司 | A kind of antireflective coating structure |
| CN108441837B (en) * | 2018-06-13 | 2024-04-16 | 天津南玻节能玻璃有限公司 | Antireflection coating structure |
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