CN101493534B - Dereflection screen of display and method for making same - Google Patents
Dereflection screen of display and method for making same Download PDFInfo
- Publication number
- CN101493534B CN101493534B CN2008102438405A CN200810243840A CN101493534B CN 101493534 B CN101493534 B CN 101493534B CN 2008102438405 A CN2008102438405 A CN 2008102438405A CN 200810243840 A CN200810243840 A CN 200810243840A CN 101493534 B CN101493534 B CN 101493534B
- Authority
- CN
- China
- Prior art keywords
- film layer
- base material
- layer
- dereflection
- screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a reflection-reduction screen of display devices and a preparation method thereof. Dual surfaces of the reflection-reduction screen substrate begin closely to the surface of the substrate (1); a TiO2 film layer, a SiO2 film layer (3), a TiO2 film layer (4) and a SiO2 film layer (5) are arranged so as to compose an AR reflection-reduction composite film system; the preparation method comprises the following steps: the surface of the reflection-reduction screen substrate (1) is processed; the TiO2 and the SiO2 are respectively vaporized by an electronic gun; the surface of the substrate is sequentially coated by the TiO2 film layer (2), the SiO2 film layer (3), the TiO2 film layer (4) and the SiO2 film layer (5); furthermore, an ion source is opened so as to pump the oxygen in for aiding; the other surface is automatically turned to be coated after one surface is coated; the film-coating process is repeated; the technical proposal adopted overcomes defects that the deflation is severe and the pollution of the organic substance is caused and the like as a hydrolysis method is used for preparing the AR reflection-reduction film, leads the transmissivity of the prepared AR reflection-reduction film to achieve more than 98%, the reflectivity less than 0.5%, and improves the quality of the display devices.
Description
Technical field
The present invention relates to a kind of Dereflection screen of display and preparation method thereof.
Background technology
AR antireflecting film, major function are the reflected light that reduces or eliminates optical frames surfaces such as lens, prism, level crossing, thereby increase the light transmission capacity of these elements, reduce or eliminate the parasitic light of system.The Dereflection screen of displays such as present handset viewing window is the AR antireflecting film that adopts Hydrolyze method to make at glass surface deposition of titanium oxide rete, silica coating and titanium oxide film layer trilamellar membrane, but glass exists frangible, cracked to problems such as human body generation injuries, so plastic basis materials such as use PC/PMMA prepare Dereflection screen and just increasing advantage arranged; But plastic plates such as prior art Hydrolyze method use PC/PMMA prepare Dereflection screen, base material combines the defective that exists exit serious and organic pollutants etc. to be difficult to overcome with the AR antireflection film layer, be to improve the quality of display, seeking the method that a kind of Dereflection screen substrate preparation at displays such as PC/PMMA has the AR antireflecting film of fine adhesion still is a difficult point.
Summary of the invention
Technical matters to be solved by this invention provides a kind of Dereflection screen of display and preparation method thereof, and purpose is to provide a kind of and has the AR antireflecting film of fine adhesion and transmittance in PC/PMMA Dereflection screen substrate preparation, improves the quality of display.
For achieving the above object, the technical scheme that the present invention takes is: a kind of Dereflection screen of display, AR antireflection compound film system by Dereflection screen base material and its two-sided setting is formed, and AR antireflection compound film system is by being formed at the two-sided titanium oxide film layer that all sets gradually of base material, silica coating, titanium oxide film layer and silica coating.
Suitably select thin-film refractive index, make the reflected light on optical frames surface to eliminate fully; If the optical thickness of rete is 1/4th of an a certain wavelength, the optical path difference of adjacent two-beam is π just, and promptly direction of vibration is opposite, and the result of stack makes optical surface reduce the reflected light of this wavelength.Generally speaking, adopt individual layer AR antireflecting film to be difficult to the antireflective effect that reaches desirable, in order to realize zero reflection at single wavelength, or reach good antireflective effect, often adopt anti-reflection film system double-deck, three layers even more multi-layered number at the spectral region of broad, the present invention is through practice, select four layer series, obtained good effect, film is that the number of plies is too much, five layers or six layers even more multi-layered, antireflective effect reduces on the contrary.
Described ground floor titanium dioxide film layer thickness is 8～20nm, and second layer silicon dioxide film layer thickness is 35～45nm, and the 3rd layer of titanium dioxide film layer thickness is 90～110nm, and the 4th layer of silicon dioxide film layer thickness is 110～130nm.
The preparation method of described Dereflection screen of display comprises: activation processing is carried out to its surface in the clean and dry back of radiation shield substrate surface treatment, and vacuum tightness is 3 * 10
-5～5 * 10
-5Torr evaporates titania, at first at Dereflection screen substrate surface deposition layer of titanium dioxide rete, evaporation silicon dioxide, deposition second layer silica coating on the ground floor titanium oxide film layer, same condition deposits the 3rd layer of titanium oxide film layer and the 4th layer of silica coating again.
Described substrate surface activation processing adopts the ion gun aerating oxygen to finish, and oxygen flow is 10～30sccm.
It is auxiliary to open the ion gun aerating oxygen in the time of described each film deposition, and oxygen flow is 8～20sccm.
Before the plated film Dereflection screen base material is adopted-100～-120 ℃ of deep cooling low temperature dryings, deep cooling low temperature is to use deep cooling low temperature machine to finish.
Described vacuum indoor temperature remains on 60～80 ℃.
Need after the subzero treatment base material is carried out temper, to eliminate stress the tissue of stabilized base material and performance.The present invention is after subzero treatment, and base material is not done temper, but directly carries out vacuum coating in 60～80 ℃ environment, and base material still has stable matrix, and institute's coatings and base material have good adhesion.
Described Dereflection screen base material is the PC/PMMA plastic injection piece, is of a size of length * wide=10～400 * 10～550mm, and thickness is 0.1～5mm.
The present invention compared with prior art, adopt the method for vacuum coating to prepare AR antireflecting film system, use by rational oxygen flow and-100～-120 ℃ of deep cooling low temperature, successfully solved the Dereflection screen of display base material and combined of the influence of the oxide of venting and material surface with the AR antireflection film layer rete, overcome the influence of material outgassing and organic pollutants, by the rete of AR antireflecting film system reasonably is set, make the AR antireflecting film have good adhesion and very high transmitance; The AR antireflecting film transmitance of preparation reaches more than 98%, has obtained the Dereflection screen of display of double-sided reflecting rate in the good anti-reflective effect below 0.5%, has improved the quality of display.
Description of drawings
The present invention is described in further detail below in conjunction with accompanying drawing.
Fig. 1 is the structural representation of a kind of Dereflection screen of display of this present invention.
Be labeled as among the figure: 1, base material; 2, titanium oxide film layer; 3, silica coating; 4, titanium oxide film layer; 5, silica coating.
Embodiment
Description below by to specific embodiment is described in further detail the specific embodiment of the present invention.
Fig. 1 is the structural representation of a kind of Dereflection screen of display of this present invention, Dereflection screen of display base material 1 is begun the two-sided AR antireflection compound film system that titanium oxide film layer 2, silica coating 3, titanium oxide film layer 4 and silica coating 5 films are formed that is provided with from the one deck by base material 1, make Dereflection screen.
Get length * wide 10～400 * 10～550mm, thickness be 0.1～5mm the PC/PMMA moulding several pieces.
1) base material 1PC/PMMA moulding is dehumidified baking, baking condition is 70 ℃, 1 hour time;
2) after the baking with on the base material 1 load facility substrate frame, tear the diaphragm on surface off, and carry out electrostatic precipitation;
3) base material 1 is packed in the vacuum chamber, carry out vacuum suction earlier, when bleeding deep cooling low temperature machine is opened, operating temperature-100 ℃ is thoroughly removed the moisture above the base material 1; Open heater heats again, make the vacuum indoor temperature remain on 80 ℃;
4) when vacuum tightness arrival 3 * 10
-5During torr, open in no cathode ion source, and base material 1 surface is cleaned and surface activation process, and oxygen flow is 10sccm, and time set is 30s;
5) continue to vacuumize after closing ion gun, when arriving 4 * 10
-5During torr, it is auxiliary to open electron gun and aerating oxygen, and oxygen flow is 10sccm, the titania in the heating crucible, and titania evaporation back deposits the titanium oxide film layer 2 that a layer thickness is 10nm at substrate surface; Deposit second layer silica coating 3 with electron gun evaporation silicon dioxide on ground floor titanium oxide film layer 2 again under the condition as hereinbefore, thickness is 35nm; Deposit the 3rd layer successively and be titanium oxide film layer 4, thickness is at 90nm; The 4th layer is silica coating 5, and thickness is opened ion gun in the time of each layer deposition and assisted at 110nm, and the flow of ion gun aerating oxygen is 8sccm, and the flow of electron gun aerating oxygen is 15sccm;
6) plated after the one side, auto-reverse to other one side, same parameter repeats above-mentioned coating process.After finishing, plated film, takes out product with the vacuum chamber venting.
Use the GB1318-77 standard to detect, its transmitance reaches more than 98% after measured, reflectivity is less than 0.5%, other beauty defects such as idea, scratch, film is colored, color spot is invisible, surface quality is higher than examination criteria, and institute's coatings has obtained high-quality display by wiping experiment and stability test.
1) base material 1PC/PMMA moulding is dehumidified baking, baking condition is 60 ℃, 1 hour time;
2) after the baking on the substrate frame with base material 1 load facility, tear the diaphragm on surface off, and carry out electrostatic precipitation;
3) base material 1 is packed in the vacuum chamber, carry out vacuum suction earlier, when bleeding deep cooling low temperature machine is opened, operating temperature-110 ℃ is thoroughly removed the moisture on base material 1 surface; Open heater heats simultaneously, keep 60 ℃ of vacuum indoor temperatures;
4) when vacuum tightness arrival 4 * 10
-5During torr, open in no cathode ion source, and base material 1 surface is cleaned and surface activation process, and oxygen flow is 20sccm, and the time is 30s;
5) close ion gun, continue to vacuumize arriving 4.5 * 10
-5During torr, open the titania in the electron gun heating crucible, deposit the titanium oxide film layer 2 that a layer thickness is 15nm at substrate surface; The second layer is a silica coating 3, and thickness is 40nm; The 3rd layer is titanium oxide film layer 4, and thickness is 100nm; The 4th layer is silica coating 5, and thickness is 120nm, opens ion gun in the time of each layer deposition and assists, and the flow of ion gun aerating oxygen is 12sccm, and the flow of electron gun aerating oxygen is 15sccm;
6) plated after the one side, auto-reverse to other one side, same parameter repeats above-mentioned coating process.After finishing, plated film, takes out product with the vacuum chamber venting.
Use the GB1318-77 standard to detect, its transmitance reaches more than 98.5% after measured, reflectivity is less than 0.5%, other beauty defects such as idea, scratch, film is colored, color spot is invisible, surface quality is higher than examination criteria, and institute's coatings has obtained high-quality display by wiping experiment and stability test.
1) base material 1PC/PMMA moulding is dehumidified baking, 80 ℃ of baking conditions, 1 hour time;
2) after the baking on the substrate frame with base material 1 load facility, tear the diaphragm on surface off, and carry out electrostatic precipitation;
3) base material 1 is packed in the vacuum chamber, carry out vacuum suction earlier, when bleeding deep cooling low temperature machine is opened, operating temperature-120 ℃ is thoroughly removed the moisture of substrate surface; Open heater heats simultaneously, keep the vacuum indoor temperature at 70 ℃;
4) when vacuum tightness arrival 4 * 10
-5During torr, open in no cathode ion source, and base material 1 surface is cleaned and surface activation process, and oxygen flow is 30sccm, and the time is 30s;
5) close ion gun, continue pumping high vacuum and arrive 5 * 10
-5During torr, opening the titania in the electron gun heating crucible, is the titanium oxide film layer 2 of 15nm at base material 1 surface deposition one layer thickness; The second layer is a silica coating 3, and thickness is 40nm; The 3rd layer is titanium oxide film layer 4, and thickness is at 100nm; The 4th layer is silica coating 5, and thickness is opened ion gun in the time of each layer deposition and assisted at 120nm, and the flow of ion gun aerating oxygen is 20sccm, and the flow of electron gun aerating oxygen is 15sccm;
6) after having plated one side, auto-reverse to other one side, same parameter repeats above-mentioned coating process.After finishing, plated film, takes out product with the vacuum chamber venting.
Use the GB1318-77 standard to detect, its transmitance reaches more than 98% after measured, reflectivity is less than 0.5%, other beauty defects such as idea, scratch, film is colored, color spot is invisible, surface quality is higher than examination criteria, and institute's coatings has obtained high-quality display by wiping experiment and stability test.
The present invention can use without prejudice to the concrete form of spirit of the present invention or principal character and summarize.Above-mentioned embodiment only is can not limit the present invention to explanation of the present invention, and therefore, implication suitable with claims of the present invention and any change in the scope all should be thought to be included in the scope of claims.
Claims (1)
1. the preparation method of a Dereflection screen of display is characterized in that: activation processing is carried out to its surface in the clean and dry back of radiation shield base material (1) surface treatment, and vacuum tightness is 4 * 10
-5～5 * 10
-5Torr evaporates titania, at first at Dereflection screen base material (1) surface deposition layer of titanium dioxide rete (2), evaporation silicon dioxide, go up deposition second layer silica coating (3) in ground floor titanium oxide film layer (2), same condition deposits the 3rd layer of titanium oxide film layer (4) and the 4th layer of silica coating (5) again;
The radiation shield base material is PC/PMMA;
Described base material (1) surface activation process adopts the ion gun aerating oxygen, and oxygen flow is 10～30sccm;
It is auxiliary to open the ion gun aerating oxygen in the time of described each film deposition, and oxygen flow is 8～20sccm;
Described Dereflection screen base material (1) surface is to adopt-100～-120 ℃ of deep cooling low temperature dryings; And the base material after subzero treatment is not done temper, but directly carries out vacuum coating in 60～80 ℃ environment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008102438405A CN101493534B (en) | 2008-12-16 | 2008-12-16 | Dereflection screen of display and method for making same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008102438405A CN101493534B (en) | 2008-12-16 | 2008-12-16 | Dereflection screen of display and method for making same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101493534A CN101493534A (en) | 2009-07-29 |
| CN101493534B true CN101493534B (en) | 2010-09-15 |
Family
ID=40924223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008102438405A Expired - Fee Related CN101493534B (en) | 2008-12-16 | 2008-12-16 | Dereflection screen of display and method for making same |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101493534B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101141232B1 (en) | 2010-06-22 | 2012-05-04 | 엘지이노텍 주식회사 | Conductive film with high transmittance having a number of anti reflection coating, touch panel using the same and manufacturing method thereof |
| CN102837467B (en) * | 2011-06-22 | 2015-04-08 | 信义光伏产业(安徽)控股有限公司 | Transparent conductive film glass and preparation method thereof |
| CN102506383A (en) * | 2011-12-14 | 2012-06-20 | 深圳市杰瑞表面技术有限公司 | Method for improving luminous flux of lamp glass by vacuum-plating antireflection coating |
| CN102732830B (en) * | 2012-05-14 | 2014-06-18 | 南昌欧菲光科技有限公司 | Plating method for anti-reflection film with high transmittance and low reflectivity |
| CN113862616B (en) * | 2021-09-30 | 2023-10-20 | 台州星星光电科技有限公司 | One-time coating forming method of anti-reflection anti-UV vehicle-mounted display panel |
| CN115094388B (en) * | 2022-07-08 | 2024-02-09 | 广东信大科技有限公司 | Heating pipe coating method and rose gold pipe prepared by heating pipe coating method |
-
2008
- 2008-12-16 CN CN2008102438405A patent/CN101493534B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN101493534A (en) | 2009-07-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101493534B (en) | Dereflection screen of display and method for making same | |
| US9459379B2 (en) | Optical member and method for producing same | |
| US5783299A (en) | Polarizer plate with anti-stain layer | |
| CN108424007B (en) | Photovoltaic glass antireflection film | |
| JP3387204B2 (en) | Polarizing plate, method for manufacturing polarizing plate, and liquid crystal display device | |
| CN106086791B (en) | A kind of manufacturing method of the windows be protected panel with AG+AR+AF plated films | |
| KR101194257B1 (en) | Transparent substrate for solar cell having a broadband anti-reflective multilayered coating thereon and method for preparing the same | |
| KR102355771B1 (en) | Multi-layer antireflective coated articles | |
| CN108642447A (en) | A kind of curved surface film-coated plate and preparation method thereof and include its solar components | |
| US8098432B2 (en) | Optical multi-layer thin film, optical element, and method for producing the optical multi-layer thin film | |
| CN108441837A (en) | A kind of antireflective coating structure | |
| CN110563342A (en) | Low-reflectivity coated glass and preparation method thereof | |
| KR101456220B1 (en) | Transparent substrate having an anti-reflective multilayered coating thereon and method for preparing the same | |
| JP2007310335A (en) | Front surface mirror | |
| CN208632386U (en) | Half-reflection and half-transmission coated glass | |
| CN111175993A (en) | Eimei anti-reflection anti-infrared light lens and preparation method thereof | |
| JP2013182091A (en) | Antireflection film and method for forming the same | |
| JPH07104102A (en) | Water repellant reflection preventive film for glass-made optical parts and production thereof | |
| US11204446B2 (en) | Anti-reflection film and an optical component containing the anti-reflection film | |
| CN111830604A (en) | Anti-reflection and anti-reflection composite film for glass substrate and preparation method thereof | |
| JPH0925562A (en) | Thin anitireflection multilater coating film, formation of the same coating film and film forming device therefor | |
| CN113151783A (en) | Combined reflective film and preparation method thereof | |
| WO2015200050A1 (en) | Low-e panels and methods for forming the same | |
| CN116479377B (en) | Method for improving film cracking of plastic surface optical film in xenon lamp irradiation test | |
| WO2024066779A1 (en) | Imitation ceramic structure, preparation method therefor, and electronic device housing |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100915 Termination date: 20171216 |