CN113862616B - One-time coating forming method of anti-reflection anti-UV vehicle-mounted display panel - Google Patents
One-time coating forming method of anti-reflection anti-UV vehicle-mounted display panel Download PDFInfo
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- CN113862616B CN113862616B CN202111165390.4A CN202111165390A CN113862616B CN 113862616 B CN113862616 B CN 113862616B CN 202111165390 A CN202111165390 A CN 202111165390A CN 113862616 B CN113862616 B CN 113862616B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
Abstract
The invention relates to a one-time coating forming method of an anti-reflection and anti-UV vehicle-mounted display panel, and belongs to the technical field of surface treatment of display panels. In order to solve the problem of poor ultraviolet cut-off, a one-time coating forming method of an anti-reflection and anti-UV vehicle-mounted display panel is provided, the method comprises the steps of placing a glass white piece to be coated after cleaning into a vacuum coating cavity of a coating machine, cleaning by an ion source, alternately performing titanium dioxide coating treatment and silicon dioxide coating treatment for a plurality of times, and forming an anti-reflection and anti-UV coating layer by controlling the thickness and the total layer number of each coating layer in the coating process; and opening the AF target source to perform evaporation treatment so as to form an AF film layer on the surface of the anti-reflection and anti-UV film coating layer, thereby obtaining the vehicle-mounted display panel. The invention has the average cut-off rate of more than 95% in the range of ultraviolet light 100 nm-360 nm, and has the dual functions of high UV resistance and anti-reflection.
Description
Technical Field
The invention relates to a one-time coating forming method of an anti-reflection and anti-UV vehicle-mounted display panel, and belongs to the technical field of surface treatment of display panels.
Background
At present, for intelligent touch electronic products such as touch screens, vehicle-mounted screens, tablet personal computers and the like, coating films are often carried out on the surfaces of transparent glass panels to form optical performances with different functions, such as reducing loss of light reflection and enhancing light transmittance, an AR coating film layer is plated on the surfaces of the glass panels to enhance light transmittance, the existing anti-reflection and anti-reflection glass generally only has high transmittance in a visible light range, but can not realize the function of isolating or cutting ultraviolet rays at the same time, but needs to realize the function by additionally adding a plating layer of an anti-UV film or coating an UV resin material, however, the whole function of a film system is influenced, and particularly the operation of the process is not easy to control by coating UV resin and the formed coating adhesion is not good, and the light transmittance and the UV resistance function cannot reach a better level; there are also anti-reflection and anti-UV functions by an integral film system, but the anti-UV function is not good, and as disclosed in chinese patent document (CN: 111362588A), an anti-UV and anti-reflection glass is produced by plating a niobium oxide layer and a silicon dioxide layer, a niobium dioxide layer and a silicon dioxide and carbon nitride layer sequentially from inside to outside on the front surface of a glass substrate, then plating a niobium oxide and a silicon dioxide layer sequentially from inside to outside on the back surface of the glass substrate in step 3, and then plating a niobium dioxide layer and a silicon dioxide and carbon nitride layer, which is not good for production and processing by both surfaces plating, and more importantly, the overall anti-UV function is not good, the average transmittance to long-wave ultraviolet rays is not more than 24%, and the average ultraviolet reflectance of 200 to 400nm is only about 68%, and the cut-off effect is not good.
Disclosure of Invention
The invention provides a one-time film plating forming method of an anti-reflection and anti-UV vehicle-mounted display panel aiming at the defects in the prior art, and solves the problem how to realize the high anti-UV and anti-reflection performance of a one-time film plating system.
The invention aims at realizing the following technical scheme, and discloses a one-time film coating forming method of an anti-reflection and anti-UV vehicle-mounted display panel, which is characterized by comprising the following steps of:
A. cleaning: placing the cleaned glass white sheet to be coated into a vacuum coating cavity of a coating machine, cleaning by an ion source, and entering the next step after the cleaning;
B. plating an anti-reflection and anti-UV coating layer: after the vacuum coating chamber is kept to be vacuumized, firstly opening a titanium dioxide target source, performing titanium dioxide coating treatment on the front surface of the glass white sheet to form a corresponding coating layer, and closing the titanium dioxide target source; carrying out ion source cleaning on the surface of the film coated with the film; then, a silicon dioxide target source is opened, so that a silicon dioxide coating treatment is carried out on the surface of a coating layer formed by the titanium dioxide coating to form a corresponding coating layer, and then the surface is cleaned by an ion source; the titanium dioxide coating treatment and the silicon dioxide coating treatment are repeatedly and alternately carried out for a plurality of times, and the thickness of each coating layer and the total layer number are controlled in the coating process, so that the anti-reflection and anti-UV coating layer formed by alternately coating the titanium dioxide coating and the silicon dioxide coating is integrally formed, the reflectivity of the formed anti-reflection and anti-UV coating layer to visible light is less than or equal to 1%, and the light transmittance to ultraviolet light is less than or equal to 8%;
C. plating an AF film layer: closing the silica target source, opening the AF target source, and performing evaporation treatment to form an AF film layer on the surface of the anti-reflection and anti-UV film coating layer, so as to obtain the corresponding coated vehicle-mounted display panel.
Through carrying out ion source cleaning treatment after each coating in the anti-reflection and anti-UV coating treatment process, residues on the surface of a coating layer and residual parts in a vacuum coating cavity can be effectively removed, and then next coating is carried out, so that each formed coating layer has purer components, the optical refractive index of each layer is ensured, the adhesive force between each layer is more stable, the influence of interface change on the optical properties is avoided, and the thickness and the total layer number of each coating layer are controlled, so that the visible light reflectivity is less than or equal to 1%, and the ultraviolet light transmittance (R percent) is less than or equal to 8%; the average cut-off rate of the ultraviolet light in the range of 100-360nm mainly reaches over 92%, the ultraviolet light has the effect of good cut-off function of the whole ultraviolet light, the film structure plating of one-time film plating is realized, the dual functional effects of high UV resistance and anti-reflection are achieved, and the film plating treatment is also facilitated.
In the above one-step film forming method of the anti-reflection and anti-UV vehicle-mounted display panel, preferably, the anti-reflection and anti-UV film layer in the step B is sequentially from inside to outside: a titanium dioxide coating layer I with the thickness of 19-20 nm, a silicon dioxide coating layer I with the thickness of 41-43 nm, a titanium dioxide coating layer II with the thickness of 39.0-39.5 nm, a silicon dioxide coating layer II with the thickness of 46-47 nm, a titanium dioxide coating layer III with the thickness of 28.0-28.5 nm, a silicon dioxide coating layer III with the thickness of 62-63 nm, a titanium dioxide coating layer IV with the thickness of 33-34 nm, a silicon dioxide coating layer IV with the thickness of 37-38 nm, a titanium dioxide coating layer V with the thickness of 34-35 nm and a silicon dioxide coating layer V with the thickness of 107-108 nm. Through the film structure and thickness control, the ultraviolet light reflection-preventing film has the performance of ultraviolet light resistance and reflection prevention, and has the effects of high average cut-off rate of ultraviolet light wavelength in the range of 100-360nm and high reflection prevention of visible light. As a further preferable scheme, the anti-reflection and anti-UV coating layer comprises the following components in sequence from inside to outside: a titanium dioxide coating layer I with the thickness of 19.56nm, a silicon dioxide coating layer I with the thickness of 42.25nm, a titanium dioxide coating layer II with the thickness of 39.31nm, a silicon dioxide coating layer II with the thickness of 46.25nm, a titanium dioxide coating layer III with the thickness of 28.2nm, a silicon dioxide coating layer III with the thickness of 62.2nm, a titanium dioxide coating layer IV with the thickness of 33.41nm, a silicon dioxide coating layer IV with the thickness of 37.56nm, a titanium dioxide coating layer V with the thickness of 34.41nm and a silicon dioxide coating layer V with the thickness of 107 nm.
In the one-step film plating forming method of the anti-reflection and anti-UV vehicle-mounted display panel, preferably, in the step B, ce and Cu metal elements are doped in the titanium dioxide of the titanium dioxide target source, the doping amount of the Ce metal element is 0.15% to 0.25%, and the doping amount of the Cu metal element is 0.05% to 0.10%. By doping a small amount of Ce and Cu metal elements in the titanium dioxide, the ultraviolet absorption capability of the coating layer can be improved, the ultraviolet cutoff function of the whole coating layer can be improved, particularly the ultraviolet absorption capability of the whole coating layer in the range of 200-360 nm is improved, the whole coating layer has a better cutoff function for ultraviolet light, the average cutoff rate of the whole coating layer in the range of 100-360nm can be up to more than 99% on the basis of guaranteeing the light transmittance of the whole coating layer for visible light, and the visible light transmittance can still be up to more than 99%. As a further preferred aspect, the mass ratio of the doping amounts of Ce and Cu is 0.15: 0.06-0.08.
In the one-step film forming method of the anti-reflection and anti-UV vehicle-mounted display panel, preferably, the AF film layer in the step C is made of an anti-UV AF material. Through adopting the AF material that has anti UV function to form, the function of guaranteeing anti UV that can be better has the effect of high fingerprint resistance concurrently.
In the above one-step film forming method of an anti-reflection and anti-UV vehicle-mounted display panel, preferably, the AF film layer in step C is performed under ultraviolet light irradiation during vapor deposition. Through carrying out ultraviolet irradiation in the in-process of carrying out AF membrane coating by vaporization, can make the AF membrane just go on under ultraviolet irradiation environment in the course of working, can promote the AF membrane better and reach the function of resisting UV, keep its durability of using, better adhesion is on the rete surface in the use.
In the one-step coating forming method of the anti-reflection and anti-UV vehicle-mounted display panel, preferably, in the step a, the ion source cleaning is performed by introducing argon into a vacuum coating cavity to convert the argon into plasma to form an ion beam, and the ion beam is made to strike the front surface of the glass white sheet for cleaning for 5-8 min. The surface energy and the distribution uniformity of the surface of the glass white sheet are improved, and the adhesion capability of the anti-reflection and anti-UV coating layer is improved.
In the one-step film forming method of the anti-reflection UV-resistant vehicular display panel, preferably, during the film forming treatment of the titanium dioxide in the step B, oxygen is introduced to convert the oxygen into plasma to form an ion beam, and the ion beam strikes the surface for auxiliary film forming. The titanium dioxide target source is turned on, and oxygen is synchronously introduced, so that the titanium dioxide target source is converted into plasma to form ion beams, and the ion beams are beaten on the surface of the glass white sheet. Under the impact of ion beams, the surface can form a fine uneven microstructure, the roughness of the surface is improved, the adhesive force of a film layer in the film coating process can be increased, and the compactness of the film layer is improved.
In the one-step film forming method of the anti-reflection and anti-UV vehicle-mounted display panel, preferably, argon is synchronously introduced during film forming treatment of the silicon dioxide in the step B, so that the argon is converted into plasma to form ion beams, and the ion beams strike the surface for auxiliary film forming. Argon is synchronously introduced when the titanium dioxide target source is turned on, so that the titanium dioxide target source is converted into plasma to form ion beams, and the ion beams are sprayed on the surface of the previous coating layer. The surface of the film can form a fine uneven microstructure, the roughness of the surface is improved, the adhesive force of the film in the film coating process can be increased, and the compactness of the film is improved.
In summary, compared with the prior art, the invention has the following advantages:
1. the anti-reflection and anti-UV film system structure is improved, so that the anti-reflection and anti-UV film system has the functions of having the reflectivity less than or equal to 1% for visible light and having the transmissivity (R%) less than or equal to 8% for ultraviolet light; the average cut-off rate of ultraviolet light in the range of 100 nm-360 nm reaches more than 95%, the effect of good integral cut-off function is achieved, the film structure plating of one-time film plating is achieved, the dual-function effect of high UV resistance and anti-reflection is achieved, and the film plating treatment is facilitated.
2. By doping a small amount of Ce and Cu metal elements in the titanium dioxide, the ultraviolet absorption capability of the coating layer can be improved, the ultraviolet cutoff function of the whole coating layer can be improved, particularly the ultraviolet absorption capability of the whole coating layer in the range of 200-360 nm is improved, the whole coating layer has a better cutoff function for ultraviolet light, the average cutoff rate of the whole coating layer in the range of 100-360nm can be up to more than 99% on the basis of guaranteeing the light transmittance of the whole coating layer for visible light, and the visible light transmittance can still be up to more than 99%.
Detailed Description
The technical scheme of the present invention will be further specifically described by means of specific examples, but the present invention is not limited to these examples.
Example 1
Placing transparent glass white sheet (organic glass) to be processed into vacuum coating cavity of electron beam evaporator (2050 coating machine), vacuumizing, and keeping vacuum value less than or equal to 2.0x10 -5 The method comprises the steps of supporting a plasma cleaning process by starting an ion source, namely, starting a power supply, controlling the power to be about 5kw, opening an argon gas channel for cleaning, introducing argon gas, starting the ion source to work, converting the argon gas into plasma through the ion source to form an ion beam, beating the ion beam on the surface of a glass white sheet to clean the ion source for 10 minutes, closing the argon gas channel after the cleaning of the ion source is finished, stopping introducing the argon gas, synchronously stopping the ion source, waiting for 5 minutes, maintaining vacuumizing, and vacuumizing the vacuum coating cavity to be less than or equal to 2.0x10 -5 After the support is stabilized, controlling the temperature to be 60-65 ℃; then the oxygen channel is opened, oxygen is introduced, the ion source is synchronously started to work, the power is controlled to be about 6Kw, the oxygen is converted into plasma through the ion source to form ion beams, the ion beams are applied to the surface to perform auxiliary coating, the adhesive force of the film layer is increased, the compactness of the film layer is improved, and after the ion source works, titanium dioxide (TiO 2 ) The target source is used for synchronously depositing the evaporated titanium dioxide on the front surface of the glass white sheet in a nano molecular form to carry out titanium dioxide coating, wherein the thickness is controlled in the process to form a titanium dioxide coating layer I with the thickness of 19.56nm, the titanium dioxide target source is closed, an oxygen channel is closed, oxygen is stopped, and the ion source synchronously stops working;
and then the surface of the titanium dioxide coating layer I is cleaned by an ion source, which is specifically as follows: opening an argon channel for cleaning, introducing argon, synchronously starting an ion source, controlling the power to be about 6kw, converting the argon into plasma through the ion source to form an ion beam, beating the ion beam to the surface to perform ion source cleaning for 8 minutes, closing the argon channel after the cleaning is finished, stopping introducing the argon, synchronously stopping the ion source, waiting for 5 minutes, and then keeping pumpingVacuum-pumping the vacuum coating cavity to less than or equal to 2.0x10 -5 After the ion source works, a silicon dioxide target source is turned on, evaporated silicon dioxide is synchronously deposited on the surface of a titanium dioxide coating layer I in a nano molecular form, the thickness of the coating film is controlled, a silicon dioxide coating layer I with the thickness of 42.25nm is formed, then the silicon dioxide target source is turned off, the argon gas is stopped from being fed in, and the ion source synchronously stops working;
and then cleaning the surface of the formed silicon dioxide coating layer I by an ion source, specifically: opening an argon channel for cleaning, introducing argon, synchronously starting an ion source, controlling the power to be about 6kw, converting the argon into plasma through the ion source to form an ion beam, beating the ion beam to the surface to carry out ion source cleaning for 8 minutes, closing the argon channel after the cleaning is finished, stopping introducing the argon, synchronously stopping the ion source from working, keeping vacuumizing after waiting for 5 minutes, and vacuumizing the vacuum coating cavity to be less than or equal to 2.0x10 -5 After the support is stabilized, controlling the temperature to be 60-65 ℃; then, the titanium dioxide coating treatment and the silicon dioxide coating treatment are repeatedly and alternately carried out for a plurality of times, corresponding cleaning operation is carried out after each coating is finished, and the thickness of each coating layer and the total layer number are controlled in the coating process, so that the anti-reflection and anti-UV coating layer formed by alternately coating the titanium dioxide coating and the silicon dioxide coating is integrally formed, the reflectivity of the formed anti-reflection and anti-UV coating layer to visible light is less than or equal to 1 percent, and the transmittance to ultraviolet light is less than or equal to 7.5 percent; the thickness and total number of coating layers of the anti-reflection and anti-UV coating layer are as follows:
a titanium dioxide coating layer I with the thickness of 19.56nm, a silicon dioxide coating layer I with the thickness of 42.25nm, a titanium dioxide coating layer II with the thickness of 39.31nm, a silicon dioxide coating layer II with the thickness of 46.25nm, a titanium dioxide coating layer III with the thickness of 28.2nm, a silicon dioxide coating layer III with the thickness of 62.2nm, a titanium dioxide coating layer IV with the thickness of 33.41nm, a silicon dioxide coating layer IV with the thickness of 37.56nm, a titanium dioxide coating layer V with the thickness of 34.41nm and a silicon dioxide coating layer V with the thickness of 107 nm; and after the process is finished, closing the silicon dioxide target source, stopping argon gas introduction, synchronously stopping the operation of the ion source, maintaining the vacuumizing state, opening the AF target source for evaporation treatment to form an AF film layer on the surface of the silicon dioxide film coating layer five on the outermost layer of the anti-reflection and anti-UV film coating layer, controlling the thickness to be 15nm, closing the target source after the process is finished, cooling, and taking out the product from the film coating machine after the process is emptied to obtain the corresponding vehicle-mounted display panel after film coating.
And performing performance test on the obtained coated vehicle-mounted display panel, wherein the transmittance of visible light is more than 99%, and the transmittance of ultraviolet light in the range of 100-360nm is less than or equal to 7.5%, which is equivalent to the blocking rate of UV being more than 92.5%.
Example 2
Placing a transparent glass white sheet (acrylic glass) to be processed into a vacuum coating cavity of an electron beam evaporator (2050 coating machine), vacuumizing, and keeping the vacuum value smaller than or equal to 2.0x10 -5 The method comprises the steps of supporting a plasma source to clean, namely, starting a power supply, controlling the power to be about 5kw, opening an argon channel for cleaning, introducing argon, synchronously starting the ion source to enable the argon to be converted into plasma through the ion source to form an ion beam, beating the ion beam on the surface of a glass white sheet to clean the ion source for 8 minutes, closing the argon channel after the cleaning of the ion source is finished, stopping introducing the argon, synchronously stopping the ion source, waiting for 5 minutes, maintaining vacuumizing, and vacuumizing the vacuum coating cavity to be less than or equal to 2.0x10 -5 After the support is stabilized, controlling the temperature to be 60-65 ℃, then opening an oxygen channel, introducing oxygen, synchronously starting the ion source to work, controlling the power to be about 6Kw, converting the oxygen into plasma through the ion source to form an ion beam, beating the ion beam on the surface to perform auxiliary coating, and opening titanium dioxide (TiO 2 ) A target source for synchronously depositing the vaporized titanium dioxide in the form of nanometer moleculesPerforming titanium dioxide coating on the front surface of the glass white sheet, controlling the thickness in the process to form a titanium dioxide coating layer I with the thickness of 19.12nm, closing a titanium dioxide target source, closing an oxygen channel, stopping oxygen introduction, and synchronously stopping the operation of the ion source;
ion source cleaning is carried out on the surface of the titanium dioxide coating layer I, and the ion source cleaning method specifically comprises the following steps: opening an argon channel for cleaning, introducing argon, synchronously starting an ion source, controlling the power to be about 6kw, converting the argon into a plasma pentabody through the ion source to form an ion beam, beating the ion beam to the surface to carry out ion source cleaning for 5 minutes, closing the argon channel after the cleaning is finished, stopping introducing the argon, synchronously stopping the ion source from working, keeping vacuumizing after waiting for 5 minutes, and vacuumizing the vacuum coating cavity to be less than or equal to 2.0x10 -5 After the ion source works, a silicon dioxide target source is opened, evaporated silicon dioxide is synchronously deposited on the surface of a titanium dioxide coating layer I in a nano molecular form, the thickness of the coating film is controlled, a silicon dioxide coating layer I with the thickness of 42.96nm is formed, then the silicon dioxide target source is closed, the argon gas is stopped from being introduced, and the ion source synchronously stops working;
and then cleaning the surface of the formed silicon dioxide coating layer I by an ion source, specifically: opening an argon channel for cleaning, introducing argon, synchronously starting an ion source, controlling the power to be about 6kw, converting the argon into plasma through the ion source to form an ion beam, beating the ion beam to the surface to clean the ion source for 6 minutes, closing the argon channel after the cleaning is finished, stopping introducing the argon, synchronously stopping the ion source, waiting for 4 minutes, maintaining vacuumizing, and vacuumizing the vacuum coating cavity to be less than or equal to 2.0x10 -5 After the support is stabilized, controlling the temperature to be 60-65 ℃; then, the titanium dioxide coating treatment and the silicon dioxide coating treatment are repeatedly and alternately carried out for a plurality of times, and after each coating is finished, the method also comprises the steps ofThe corresponding cleaning operation is carried out, and in the film coating process, through controlling the thickness of each film coating layer and the total layer number, the anti-reflection and anti-UV film coating layer formed by alternately plating the titanium dioxide film coating and the silicon dioxide film coating is integrally formed, the reflectivity of the formed anti-reflection and anti-UV film coating layer to visible light is less than or equal to 1.0%, and the light transmittance to ultraviolet light is less than or equal to 6.5%; the thickness and total number of coating layers of the anti-reflection and anti-UV coating layer are as follows:
a titanium dioxide coating layer I with the thickness of 19.12nm, a silicon dioxide coating layer I with the thickness of 42.96nm, a titanium dioxide coating layer II with the thickness of 39.49nm, a silicon dioxide coating layer II with the thickness of 46.04nm, a titanium dioxide coating layer III with the thickness of 28.41nm, a silicon dioxide coating layer III with the thickness of 62.14nm, a titanium dioxide coating layer IV with the thickness of 33.87nm, a silicon dioxide coating layer IV with the thickness of 37.15nm, a titanium dioxide coating layer V with the thickness of 34.11nm and a silicon dioxide coating layer V with the thickness of 108 nm; and after the process is finished, closing the silicon dioxide target source, stopping argon gas introduction, synchronously stopping the operation of the ion source, maintaining the vacuumizing state, opening the AF target source for evaporation treatment to form an AF film layer on the surface of the silicon dioxide film coating layer five on the outermost layer of the anti-reflection and anti-UV film coating layer, controlling the thickness to be 18nm, closing the target source after the process is finished, cooling, and taking out the product from the film coating machine after the process is emptied to obtain the corresponding vehicle-mounted display panel after film coating.
And performing performance test on the obtained coated vehicle-mounted display panel, wherein the light transmittance of visible light is more than 99%, and the light transmittance of ultraviolet light in the range of 100-360nm is less than or equal to 6.5%, which is equivalent to the blocking rate of UV being more than 93.5%.
Example 3
The specific processing method of the vehicle-mounted display panel in this embodiment is the same as that in embodiment 1, and the difference is only that in the titanium dioxide film plating treatment process of each layer in the anti-reflection and anti-UV film plating layer, a small amount of Ce and Cu metal elements are doped in the target titanium dioxide, the doping amount of Ce metal element in the titanium dioxide film plating layer of each layer is 0.15%, and the doping amount of Cu metal element is 0.05%. Specifically, the thickness and total number of coating layers of the anti-reflection and anti-UV coating layer formed by the coating are as follows:
a titanium dioxide coating layer I with the thickness of 19.66nm, a silicon dioxide coating layer I with the thickness of 42.28nm, a titanium dioxide coating layer II with the thickness of 39.41nm, a silicon dioxide coating layer II with the thickness of 46.55nm, a titanium dioxide coating layer III with the thickness of 28.31nm, a silicon dioxide coating layer III with the thickness of 62.5nm, a titanium dioxide coating layer IV with the thickness of 33.11nm, a silicon dioxide coating layer IV with the thickness of 37.86nm, a titanium dioxide coating layer V with the thickness of 34.61nm and a silicon dioxide coating layer V with the thickness of 106.3 nm; wherein, each of the titanium dioxide coating layer I, the titanium dioxide coating layer II, the titanium dioxide coating layer III, the titanium dioxide coating layer IV and the titanium dioxide coating layer V is doped with Ce and Cu metal elements (based on the weight of the titanium dioxide coating layer of each layer) in the mass percent, for example, the titanium dioxide coating layer I is equal to titanium dioxide: ce: the mass ratio of Cu is 99.8:0.15:0.05.
other specific coating processes and operations are the same as those of example 1, and will not be described here again.
The test result shows that the transmittance of visible light reaches more than 99%, the transmittance of ultraviolet light in the range of 100-360nm is less than or equal to 1.0%, and the blocking rate of ultraviolet light reaches more than 99.0%.
Example 4
The specific processing method of the vehicle-mounted display panel in this embodiment is the same as that in embodiment 1, and the difference is only that in the titanium dioxide film plating treatment process of each layer in the anti-reflection and anti-UV film plating layer, a small amount of Ce and Cu metal elements are doped in the target titanium dioxide, the doping amount of Ce metal element in the titanium dioxide film plating layer of each layer is 0.25%, and the doping amount of Cu metal element is 0.10%. Specifically, the thickness and total number of coating layers of the anti-reflection and anti-UV coating layer formed by the coating are as follows:
a titanium dioxide coating layer I with the thickness of 19.10nm, a silicon dioxide coating layer I with the thickness of 42.88nm, a titanium dioxide coating layer II with the thickness of 39.11nm, a silicon dioxide coating layer II with the thickness of 46.69nm, a titanium dioxide coating layer III with the thickness of 28.42nm, a silicon dioxide coating layer III with the thickness of 62.3nm, a titanium dioxide coating layer IV with the thickness of 33.71nm, a silicon dioxide coating layer IV with the thickness of 37.16nm, a titanium dioxide coating layer V with the thickness of 34.21nm and a silicon dioxide coating layer V with the thickness of 106.7 nm; and wherein each of the first titanium dioxide coating layer, the second titanium dioxide coating layer, the third titanium dioxide coating layer, the fourth titanium dioxide coating layer and the fifth titanium dioxide coating layer is doped with the above-mentioned metal elements of Ce and Cu (based on the weight of the titanium dioxide coating layer of each layer), such as titanium dioxide in the first titanium dioxide coating layer is equivalent to: ce: the mass ratio of Cu is 99.75:0.25:0.10. other specific coating processes and operations are the same as those of example 1, and will not be described here again.
The test result shows that the transmittance of visible light reaches more than 99%, the transmittance of ultraviolet light in the range of 100-360nm is less than or equal to 0.8%, and the blocking rate of ultraviolet light reaches more than 99.2%.
Example 5
The specific processing method of the vehicle-mounted display panel in this embodiment is the same as that in embodiment 1, and the difference is only that in the titanium dioxide film plating treatment process of each layer in the anti-reflection and anti-UV film plating layer, a small amount of Ce and Cu metal elements are doped in the target titanium dioxide, the doping amount of Ce metal element in the titanium dioxide film plating layer of each layer is 0.25%, and the doping amount of Cu metal element is 0.10%. Specifically, the thickness and total number of coating layers of the anti-reflection and anti-UV coating layer formed by the coating are as follows:
a titanium dioxide coating layer I with the thickness of 19.56nm, a silicon dioxide coating layer I with the thickness of 42.36nm, a titanium dioxide coating layer II with the thickness of 39.24nm, a silicon dioxide coating layer II with the thickness of 46.39nm, a titanium dioxide coating layer III with the thickness of 28.31nm, a silicon dioxide coating layer III with the thickness of 62.23nm, a titanium dioxide coating layer IV with the thickness of 33.53nm, a silicon dioxide coating layer IV with the thickness of 37.42nm, a titanium dioxide coating layer V with the thickness of 34.14nm and a silicon dioxide coating layer V with the thickness of 106.2 nm; and wherein each of the first titanium dioxide coating layer, the second titanium dioxide coating layer, the third titanium dioxide coating layer, the fourth titanium dioxide coating layer and the fifth titanium dioxide coating layer is doped with the above-mentioned metal elements of Ce and Cu (based on the weight of the titanium dioxide coating layer of each layer), such as titanium dioxide in the first titanium dioxide coating layer is equivalent to: ce: the mass ratio of Cu is 99.75:0.25:0.10. and wherein each of the first titanium dioxide coating layer, the second titanium dioxide coating layer, the third titanium dioxide coating layer, the fourth titanium dioxide coating layer and the fifth titanium dioxide coating layer is doped with the above-mentioned metal elements of Ce and Cu (based on the weight of the titanium dioxide coating layer of each layer), such as titanium dioxide in the first titanium dioxide coating layer is equivalent to: ce: the mass ratio of Cu is 99.8:0.15:0.06.
other specific coating processes and operations are the same as those of example 1, and will not be described here again.
The test result shows that the transmittance of visible light reaches more than 99.2%, the transmittance of ultraviolet light in the range of 100-360nm is less than or equal to 0.7%, and the blocking rate of ultraviolet light reaches more than 99.3%.
Example 6
The specific processing method of the vehicle-mounted display panel in this embodiment is the same as that in embodiment 1, and the difference is that the AF film layer is specifically obtained by adopting the following method:
and after the film coating of the anti-reflection and anti-UV film coating layer in the previous step is finished, closing a silicon dioxide target source, keeping a vacuumizing state, then opening an anti-UV AF target source for vapor deposition treatment to form an AF film layer on the surface of the silicon dioxide film coating layer five on the outermost layer of the anti-reflection and anti-UV film coating layer, irradiating by UV in the film coating process, controlling the thickness at 18nm, closing the target source and an ultraviolet lamp after finishing, cooling, evacuating, and taking out a product from a film coating machine to obtain the corresponding vehicle-mounted display panel after film coating.
Other specific coating processes and operations are the same as those of example 1, and will not be described here again.
The test result shows that the transmittance of visible light reaches more than 99.1%, the transmittance of ultraviolet light in the range of 100-360nm is less than or equal to 7.5%, the blocking rate of ultraviolet light reaches more than 92.5%, and the anti-fingerprint effect can be maintained after the ultraviolet light irradiates for 1000 hours for a long time.
The specific embodiments described herein are offered by way of illustration only. Those skilled in the art may make various modifications or additions to the described embodiments or substitutions thereof without departing from the spirit of the invention or exceeding the scope of the invention as defined in the accompanying claims.
While the invention has been described in detail and with reference to specific embodiments thereof, it will be apparent to one skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope thereof.
Claims (8)
1. The one-time coating forming method of the anti-reflection and anti-UV vehicle-mounted display panel is characterized by comprising the following steps of:
A. cleaning: placing the cleaned glass white sheet to be coated into a vacuum coating cavity of a coating machine, cleaning by an ion source, and entering the next step after the cleaning;
B. plating an anti-reflection and anti-UV coating layer: after the vacuum coating chamber is kept to be vacuumized, firstly opening a titanium dioxide target source, performing titanium dioxide coating treatment on the front surface of the glass white sheet to form a corresponding coating layer, and closing the titanium dioxide target source; carrying out ion source cleaning on the surface of the film coated with the film; then, a silicon dioxide target source is opened, so that a silicon dioxide coating treatment is carried out on the surface of a coating layer formed by the titanium dioxide coating to form a corresponding coating layer, and then the surface is cleaned by an ion source; the titanium dioxide coating treatment and the silicon dioxide coating treatment are repeatedly and alternately carried out for a plurality of times, and the thickness of each coating layer and the total layer number are controlled in the coating process, so that the anti-reflection and anti-UV coating layer formed by alternately coating the titanium dioxide coating and the silicon dioxide coating is integrally formed, the reflectivity of the formed anti-reflection and anti-UV coating layer to visible light is less than or equal to 1%, and the light transmittance to ultraviolet light is less than or equal to 8%; the anti-reflection and anti-UV coating layer comprises the following components in sequence from inside to outside: a titanium dioxide coating layer I with the thickness of 19-20 nm, a silicon dioxide coating layer I with the thickness of 41-43 nm, a titanium dioxide coating layer II with the thickness of 39.0 nm-39.5 nm, a silicon dioxide coating layer II with the thickness of 46-47 nm, a titanium dioxide coating layer III with the thickness of 28.0 nm-28.5 nm, a silicon dioxide coating layer III with the thickness of 62-63 nm, a titanium dioxide coating layer IV with the thickness of 33 nm-34 nm, a silicon dioxide coating layer IV with the thickness of 37-38 nm, a titanium dioxide coating layer V with the thickness of 34 nm-35 nm and a silicon dioxide coating layer V with the thickness of 107-108 nm; the titanium dioxide of the titanium dioxide target source is doped with Ce and Cu metal elements, the doping amount of the Ce metal elements is 0.15-0.25%, and the doping amount of the Cu metal elements is 0.05-0.10%;
C. plating an AF film layer: closing the silica target source, opening the AF target source, and performing evaporation treatment to form an AF film layer on the surface of the anti-reflection and anti-UV film coating layer, so as to obtain the corresponding coated vehicle-mounted display panel.
2. The one-time coating forming method of the anti-reflection and anti-UV vehicle-mounted display panel according to claim 1, wherein the anti-reflection and anti-UV coating layer comprises the following steps in sequence from inside to outside: a titanium dioxide coating layer I with the thickness of 19.56nm, a silicon dioxide coating layer I with the thickness of 42.25nm, a titanium dioxide coating layer II with the thickness of 39.31nm, a silicon dioxide coating layer II with the thickness of 46.25nm, a titanium dioxide coating layer III with the thickness of 28.2nm, a silicon dioxide coating layer III with the thickness of 62.2nm, a titanium dioxide coating layer IV with the thickness of 33.41nm, a silicon dioxide coating layer IV with the thickness of 37.56nm, a titanium dioxide coating layer V with the thickness of 34.41nm and a silicon dioxide coating layer V with the thickness of 107 nm.
3. The one-step film forming method of an anti-reflection and anti-UV vehicle-mounted display panel according to claim 1 or 2, wherein the AF film layer in the step C is made of an anti-UV AF material.
4. The one-step coating forming method of the anti-reflection and anti-UV vehicle-mounted display panel according to claim 3, wherein the AF film layer in the step C is performed under ultraviolet irradiation during evaporation.
5. The one-step coating forming method of the anti-reflection and anti-UV vehicle-mounted display panel according to claim 1 or 2, wherein in the step a, the ion source cleaning is to convert argon gas into plasma to form an ion beam by introducing the ion beam into a vacuum coating cavity, so that the ion beam is applied to the front surface of a glass white sheet for cleaning for 5-8 min.
6. The one-shot coating molding method of an anti-reflection and anti-UV vehicle-mounted display panel according to claim 1 or 2, wherein the glass white sheet is made of organic glass.
7. The one-time coating molding method of the anti-reflection and anti-UV vehicle-mounted display panel according to claim 1 or 2, wherein the glass white sheet is made of acrylic.
8. The one-shot coating molding method of an anti-reflection and anti-UV vehicle-mounted display panel according to claim 1 or 2, wherein the glass white sheet is made of PMMA.
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| CN113862611A (en) * | 2021-09-30 | 2021-12-31 | 台州星星光电科技有限公司 | Strong-alkali-resistant sapphire glass panel surface coating method |
| CN115061226B (en) * | 2022-04-19 | 2023-05-12 | 深圳菲比特光电科技有限公司 | Film forming method of antireflection film |
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