CN107459726B - 中性层聚合物、其制备方法以及包含该聚合物的制品 - Google Patents
中性层聚合物、其制备方法以及包含该聚合物的制品 Download PDFInfo
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- CN107459726B CN107459726B CN201710264644.5A CN201710264644A CN107459726B CN 107459726 B CN107459726 B CN 107459726B CN 201710264644 A CN201710264644 A CN 201710264644A CN 107459726 B CN107459726 B CN 107459726B
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- C—CHEMISTRY; METALLURGY
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/08—Copolymers of styrene
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- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
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- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
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- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
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- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
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- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
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- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/08—Heat treatment
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/06—Polystyrene
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- C—CHEMISTRY; METALLURGY
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- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
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- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
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- C—CHEMISTRY; METALLURGY
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- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
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- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
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- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
- C09D125/02—Homopolymers or copolymers of hydrocarbons
- C09D125/04—Homopolymers or copolymers of styrene
- C09D125/08—Copolymers of styrene
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
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- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Thermal Sciences (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/924,891 US20140377465A1 (en) | 2013-06-24 | 2013-06-24 | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| US13/924,891 | 2013-06-24 | ||
| US14/297,095 | 2014-06-05 | ||
| US14/297,095 US9382444B2 (en) | 2013-06-24 | 2014-06-05 | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| CN201410288684.XA CN104231514B (zh) | 2013-06-24 | 2014-06-24 | 中性层聚合物、其制备方法以及包含该聚合物的制品 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410288684.XA Division CN104231514B (zh) | 2013-06-24 | 2014-06-24 | 中性层聚合物、其制备方法以及包含该聚合物的制品 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107459726A CN107459726A (zh) | 2017-12-12 |
| CN107459726B true CN107459726B (zh) | 2020-07-14 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710264644.5A Active CN107459726B (zh) | 2013-06-24 | 2014-06-24 | 中性层聚合物、其制备方法以及包含该聚合物的制品 |
| CN201410288684.XA Active CN104231514B (zh) | 2013-06-24 | 2014-06-24 | 中性层聚合物、其制备方法以及包含该聚合物的制品 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201410288684.XA Active CN104231514B (zh) | 2013-06-24 | 2014-06-24 | 中性层聚合物、其制备方法以及包含该聚合物的制品 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9382444B2 (https=) |
| JP (2) | JP2015007233A (https=) |
| KR (1) | KR101686059B1 (https=) |
| CN (2) | CN107459726B (https=) |
| TW (1) | TWI548689B (https=) |
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| JP6239813B2 (ja) | 2012-07-18 | 2017-11-29 | 株式会社Screenセミコンダクターソリューションズ | 基板処理装置および基板処理方法 |
| US9802400B2 (en) | 2013-06-24 | 2017-10-31 | Dow Global Technologies Llc | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers |
| US9382444B2 (en) | 2013-06-24 | 2016-07-05 | Dow Global Technologies Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| JP6702649B2 (ja) * | 2013-12-31 | 2020-06-03 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | ブロックコポリマーの性質を制御する方法及びブロックコポリマーから製造された物品 |
| JP2015170723A (ja) * | 2014-03-06 | 2015-09-28 | Jsr株式会社 | パターン形成方法及び自己組織化組成物 |
| US10011713B2 (en) * | 2014-12-30 | 2018-07-03 | Dow Global Technologies Llc | Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same |
| US11021630B2 (en) * | 2014-12-30 | 2021-06-01 | Rohm And Haas Electronic Materials Llc | Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same |
| US10294359B2 (en) | 2014-12-30 | 2019-05-21 | Rohm And Haas Electronic Materials Llc | Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same |
| US9574107B2 (en) | 2015-02-16 | 2017-02-21 | International Business Machines Corporation | Fluoro-alcohol additives for orientation control of block copolymers |
| US10259907B2 (en) * | 2015-02-20 | 2019-04-16 | Az Electronic Materials (Luxembourg) S.À R.L. | Block copolymers with surface-active junction groups, compositions and processes thereof |
| TWI588200B (zh) * | 2015-02-26 | 2017-06-21 | 羅門哈斯電子材料有限公司 | 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件 |
| TWI669337B (zh) | 2015-02-26 | 2019-08-21 | 美商羅門哈斯電子材料有限公司 | 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件 |
| TWI612379B (zh) * | 2015-02-26 | 2018-01-21 | Rohm And Haas Electronic Materials Llc | 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件 |
| TWI627219B (zh) | 2015-02-26 | 2018-06-21 | 羅門哈斯電子材料有限公司 | 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件 |
| EP3296358A4 (en) * | 2015-05-11 | 2018-12-19 | National University Corporation Nagoya University | Non-covalent bonding soft elastomer and production process therefor |
| FR3037071B1 (fr) * | 2015-06-02 | 2019-06-21 | Arkema France | Procede de reduction de la defectivite d'un film de copolymere a blocs |
| FR3037070B1 (fr) * | 2015-06-02 | 2019-05-31 | Arkema France | Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose |
| TWI627220B (zh) * | 2015-06-03 | 2018-06-21 | 羅門哈斯電子材料有限公司 | 用於圖案處理之組合物及方法 |
| US10532546B2 (en) | 2015-06-04 | 2020-01-14 | Lg Chem, Ltd. | Composite for neutral layer |
| US9368350B1 (en) * | 2015-06-23 | 2016-06-14 | International Business Machines Corporation | Tone inverted directed self-assembly (DSA) fin patterning |
| JP6039028B1 (ja) | 2015-09-11 | 2016-12-07 | 株式会社東芝 | 自己組織化材料及びパターン形成方法 |
| KR20180112778A (ko) * | 2016-02-08 | 2018-10-12 | 제이에스알 가부시끼가이샤 | 콘택트 홀 패턴의 형성 방법 및 조성물 |
| CN109476797B (zh) * | 2016-07-21 | 2021-09-07 | 大塚化学株式会社 | 嵌段共聚物、组合物和膜 |
| US10691019B2 (en) * | 2016-10-07 | 2020-06-23 | Jsr Corporation | Pattern-forming method and composition |
| JP2018154760A (ja) * | 2017-03-17 | 2018-10-04 | 東芝メモリ株式会社 | パターン形成材料及びパターン形成方法 |
| US11193036B2 (en) | 2017-07-14 | 2021-12-07 | Lg Chem, Ltd. | Neutral layer composition |
| US10347486B1 (en) * | 2017-12-19 | 2019-07-09 | International Business Machines Corporation | Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography |
| US10961383B2 (en) * | 2018-02-01 | 2021-03-30 | Brewer Science, Inc. | Gradient block copolymers for directed self-assembly |
| JP7465820B2 (ja) | 2018-06-01 | 2024-04-11 | ダウ グローバル テクノロジーズ エルエルシー | ボトルブラシポリマーを使用したシリカスケールの阻害 |
| JP7135554B2 (ja) * | 2018-08-03 | 2022-09-13 | Jsr株式会社 | 下層膜形成用組成物、自己組織化膜の下層膜及びその形成方法並びに自己組織化リソグラフィープロセス |
| JP7354042B2 (ja) * | 2020-03-27 | 2023-10-02 | パナソニックホールディングス株式会社 | 電気音響変換器 |
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2014
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- 2014-06-24 CN CN201710264644.5A patent/CN107459726B/zh active Active
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| US20170327712A1 (en) | 2017-11-16 |
| US20140378592A1 (en) | 2014-12-25 |
| KR20150000429A (ko) | 2015-01-02 |
| CN107459726A (zh) | 2017-12-12 |
| CN104231514B (zh) | 2017-05-17 |
| JP2019178339A (ja) | 2019-10-17 |
| CN104231514A (zh) | 2014-12-24 |
| JP2015007233A (ja) | 2015-01-15 |
| KR101686059B1 (ko) | 2016-12-13 |
| TWI548689B (zh) | 2016-09-11 |
| TW201518382A (zh) | 2015-05-16 |
| US9382444B2 (en) | 2016-07-05 |
| US10167411B2 (en) | 2019-01-01 |
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