CN107459726B - 中性层聚合物、其制备方法以及包含该聚合物的制品 - Google Patents

中性层聚合物、其制备方法以及包含该聚合物的制品 Download PDF

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CN107459726B
CN107459726B CN201710264644.5A CN201710264644A CN107459726B CN 107459726 B CN107459726 B CN 107459726B CN 201710264644 A CN201710264644 A CN 201710264644A CN 107459726 B CN107459726 B CN 107459726B
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copolymer
segment
additional
block copolymer
copolymers
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CN107459726A (zh
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R·夏尔马
P·D·胡斯塔德
P·特雷福纳斯三世
D·王
李明琦
J·J·张
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Dow Global Technologies LLC
DuPont Electronic Materials International LLC
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Dow Global Technologies LLC
Rohm and Haas Electronic Materials LLC
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    • C08L25/00Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
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    • BPERFORMING OPERATIONS; TRANSPORTING
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    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
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    • C09D125/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
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CN201710264644.5A 2013-06-24 2014-06-24 中性层聚合物、其制备方法以及包含该聚合物的制品 Active CN107459726B (zh)

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Application Number Priority Date Filing Date Title
US13/924,891 US20140377465A1 (en) 2013-06-24 2013-06-24 Neutral layer polymers, methods of manufacture thereof and articles comprising the same
US13/924,891 2013-06-24
US14/297,095 2014-06-05
US14/297,095 US9382444B2 (en) 2013-06-24 2014-06-05 Neutral layer polymers, methods of manufacture thereof and articles comprising the same
CN201410288684.XA CN104231514B (zh) 2013-06-24 2014-06-24 中性层聚合物、其制备方法以及包含该聚合物的制品

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Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6239813B2 (ja) 2012-07-18 2017-11-29 株式会社Screenセミコンダクターソリューションズ 基板処理装置および基板処理方法
US9802400B2 (en) 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US9382444B2 (en) 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
JP6702649B2 (ja) * 2013-12-31 2020-06-03 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC ブロックコポリマーの性質を制御する方法及びブロックコポリマーから製造された物品
JP2015170723A (ja) * 2014-03-06 2015-09-28 Jsr株式会社 パターン形成方法及び自己組織化組成物
US10011713B2 (en) * 2014-12-30 2018-07-03 Dow Global Technologies Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US11021630B2 (en) * 2014-12-30 2021-06-01 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US10294359B2 (en) 2014-12-30 2019-05-21 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US9574107B2 (en) 2015-02-16 2017-02-21 International Business Machines Corporation Fluoro-alcohol additives for orientation control of block copolymers
US10259907B2 (en) * 2015-02-20 2019-04-16 Az Electronic Materials (Luxembourg) S.À R.L. Block copolymers with surface-active junction groups, compositions and processes thereof
TWI588200B (zh) * 2015-02-26 2017-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI669337B (zh) 2015-02-26 2019-08-21 美商羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI612379B (zh) * 2015-02-26 2018-01-21 Rohm And Haas Electronic Materials Llc 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI627219B (zh) 2015-02-26 2018-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
EP3296358A4 (en) * 2015-05-11 2018-12-19 National University Corporation Nagoya University Non-covalent bonding soft elastomer and production process therefor
FR3037071B1 (fr) * 2015-06-02 2019-06-21 Arkema France Procede de reduction de la defectivite d'un film de copolymere a blocs
FR3037070B1 (fr) * 2015-06-02 2019-05-31 Arkema France Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose
TWI627220B (zh) * 2015-06-03 2018-06-21 羅門哈斯電子材料有限公司 用於圖案處理之組合物及方法
US10532546B2 (en) 2015-06-04 2020-01-14 Lg Chem, Ltd. Composite for neutral layer
US9368350B1 (en) * 2015-06-23 2016-06-14 International Business Machines Corporation Tone inverted directed self-assembly (DSA) fin patterning
JP6039028B1 (ja) 2015-09-11 2016-12-07 株式会社東芝 自己組織化材料及びパターン形成方法
KR20180112778A (ko) * 2016-02-08 2018-10-12 제이에스알 가부시끼가이샤 콘택트 홀 패턴의 형성 방법 및 조성물
CN109476797B (zh) * 2016-07-21 2021-09-07 大塚化学株式会社 嵌段共聚物、组合物和膜
US10691019B2 (en) * 2016-10-07 2020-06-23 Jsr Corporation Pattern-forming method and composition
JP2018154760A (ja) * 2017-03-17 2018-10-04 東芝メモリ株式会社 パターン形成材料及びパターン形成方法
US11193036B2 (en) 2017-07-14 2021-12-07 Lg Chem, Ltd. Neutral layer composition
US10347486B1 (en) * 2017-12-19 2019-07-09 International Business Machines Corporation Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography
US10961383B2 (en) * 2018-02-01 2021-03-30 Brewer Science, Inc. Gradient block copolymers for directed self-assembly
JP7465820B2 (ja) 2018-06-01 2024-04-11 ダウ グローバル テクノロジーズ エルエルシー ボトルブラシポリマーを使用したシリカスケールの阻害
JP7135554B2 (ja) * 2018-08-03 2022-09-13 Jsr株式会社 下層膜形成用組成物、自己組織化膜の下層膜及びその形成方法並びに自己組織化リソグラフィープロセス
JP7354042B2 (ja) * 2020-03-27 2023-10-02 パナソニックホールディングス株式会社 電気音響変換器

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929510A (en) * 1988-04-29 1990-05-29 State University Of New York Biocompatible polymer articles
CN1187505A (zh) * 1997-01-07 1998-07-15 电气化学工业株式会社 嵌段共聚物、嵌段共聚物组合物及其制成的热收缩薄膜
CN103289285A (zh) * 2012-02-10 2013-09-11 罗门哈斯电子材料有限公司 嵌段共聚物和与其相关的方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19829397A1 (de) * 1998-07-01 2000-01-05 Basf Ag Verwendung mikrophasenseparierter Polymermischungen für die Herstellung von permeablen Membranen
US7160551B2 (en) 2002-07-09 2007-01-09 The Board Of Trustees Of The University Of Illinois Injectable system for controlled drug delivery
US7407554B2 (en) 2005-04-12 2008-08-05 International Business Machines Corporation Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent
CN101528782A (zh) * 2006-05-25 2009-09-09 阿科玛股份有限公司 酸官能化的梯度嵌段共聚物
JP2008231233A (ja) 2007-03-20 2008-10-02 Kyoto Univ 高分子薄膜、パターン基板、磁気記録用パターン媒体及びこれらの製造方法
US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
US8425982B2 (en) 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
JP5519684B2 (ja) * 2008-10-28 2014-06-11 アーケマ・インコーポレイテッド 水分流動性ポリマー膜
KR101535227B1 (ko) * 2008-12-31 2015-07-08 삼성전자주식회사 블록 공중합체를 이용한 미세 패턴 형성 방법
US8114306B2 (en) 2009-05-22 2012-02-14 International Business Machines Corporation Method of forming sub-lithographic features using directed self-assembly of polymers
JP5300799B2 (ja) * 2010-07-28 2013-09-25 株式会社東芝 パターン形成方法及びポリマーアロイ下地材料
US8304493B2 (en) 2010-08-20 2012-11-06 Micron Technology, Inc. Methods of forming block copolymers
JP5555111B2 (ja) 2010-09-27 2014-07-23 株式会社日立製作所 シルセスキオキサンを有する高分子薄膜、微細構造体及びこれらの製造方法
JP2014505119A (ja) * 2010-11-24 2014-02-27 ダウ コーニング コーポレーション ブロックコポリマーの形態の制御
US9156682B2 (en) 2011-05-25 2015-10-13 The University Of Massachusetts Method of forming oriented block copolymer line patterns, block copolymer line patterns formed thereby, and their use to form patterned articles
WO2013040483A1 (en) 2011-09-15 2013-03-21 Wisconsin Alumni Research Foundation Directed assembly of block copolymer films between a chemically patterned surface and a second surface
US8691925B2 (en) 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
NL2010004A (en) * 2012-01-13 2013-07-16 Asml Netherlands Bv Self-assemblable polymer and methods for use in lithography.
KR20140136933A (ko) 2012-02-10 2014-12-01 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 블록 공중합체 박막에서 도메인 배향을 조절하기 위해 화학 증착된 필름의 사용
US9802400B2 (en) 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US9382444B2 (en) 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
US20140377465A1 (en) * 2013-06-24 2014-12-25 Rohm And Haas Electronic Materials Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929510A (en) * 1988-04-29 1990-05-29 State University Of New York Biocompatible polymer articles
CN1187505A (zh) * 1997-01-07 1998-07-15 电气化学工业株式会社 嵌段共聚物、嵌段共聚物组合物及其制成的热收缩薄膜
CN103289285A (zh) * 2012-02-10 2013-09-11 罗门哈斯电子材料有限公司 嵌段共聚物和与其相关的方法

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KR101686059B1 (ko) 2016-12-13
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