CN107357045A - Multi-beam synthesizer applied to synthetic aperture imaging equipment - Google Patents
Multi-beam synthesizer applied to synthetic aperture imaging equipment Download PDFInfo
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- CN107357045A CN107357045A CN201710760488.1A CN201710760488A CN107357045A CN 107357045 A CN107357045 A CN 107357045A CN 201710760488 A CN201710760488 A CN 201710760488A CN 107357045 A CN107357045 A CN 107357045A
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- 238000003384 imaging method Methods 0.000 title claims abstract description 21
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 30
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 30
- 239000000463 material Substances 0.000 claims abstract description 13
- 229910001374 Invar Inorganic materials 0.000 claims abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 239000000741 silica gel Substances 0.000 claims description 10
- 229910002027 silica gel Inorganic materials 0.000 claims description 10
- 239000010453 quartz Substances 0.000 claims description 2
- 238000004026 adhesive bonding Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000003325 tomography Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The invention provides a multi-beam synthesis device applied to synthetic aperture imaging equipment, which mainly comprises an inner side multi-prismatic table ring, an outer side multi-prismatic table ring, an inner side small elliptical reflector, an outer side reflector adjusting table, a multi-prismatic table ring front connecting rod, a multi-prismatic table ring rear connecting rod, a first connecting screw, a second connecting screw, a third connecting screw, a fourth connecting screw and a set screw. The inner multi-edge platform ring, the outer reflector adjusting platform, the front multi-edge platform ring connecting rod and the rear multi-edge platform ring connecting rod are made of invar steel materials with small thermal expansion coefficients, and the inner multi-edge platform ring and the outer multi-edge platform ring are connected and fixed through the front multi-edge platform ring connecting rod and the rear multi-edge platform ring connecting rod. The invention reduces the difficulty of optical processing, changes the optical polygonal pyramid into the combination of a small reflector and a mechanical part, reduces the processing and manufacturing cost on the basis of ensuring the optical precision, greatly shortens the processing and manufacturing period, and has the yield of the device far higher than that of the traditional beam combining device.
Description
Technical field
The invention belongs to the technical fields such as optical engineering, Application Optics, and in particular to one kind is applied to synthetic aperture imaging
Multiple-beam synthesis device in equipment.
Background technology
Multiple-beam synthesis device is mainly used in synthetic aperture imaging equipment, by each sub-aperture light beam in optical device it
Between centre-to-centre spacing equal proportion compression, with adapt to optics coherence tomography imaging requirement.Due to dutycycle in synthetic aperture imaging equipment
Limitation, the light beam of beam is closed after compression to be realized using the method that speculum is pieced together, and can only be added using optics polygonal pyramid
The speculum realization that periphery is arranged in pairs or groups therewith, the wherein processing of high-precision optical polygonal pyramid and its difficulty, and finished product can not be ensured
Rate, this limits the development of synthetic aperture imaging technology to a certain extent.And use the method for the present invention to make light beam and close beam
Device is easily achieved, and the process-cycle is short, and cost is cheap, can promote the hair of synthetic aperture imaging technology to a certain extent
Exhibition.
The content of the invention
For above multiple-beam synthesis device realize present on problem, propose it is a kind of be easier to realize be applied to synthesis hole
Multiple-beam synthesis device in the imaging device of footpath, the device can fundamentally solve the above problems.
In order to realize the purpose of the present invention, the technical solution adopted by the present invention is：One kind is set applied to synthetic aperture imaging
Multiple-beam synthesis device in standby, it is characterised in that：Including the more terrace with edge rings in inner side, the more terrace with edge rings in outside, the small elliptical reflecting in inner side
Mirror, the small elliptical reflector in outside, outer reflector adjustment platform, more terrace with edge ring front rods, more terrace with edge ring rear connecting rods, first connect
Screw, the second attachment screw, the 3rd attachment screw, the 4th attachment screw and holding screw are connect, wherein the small elliptical reflector in inner side
It is adhered to by silica gel in the corresponding recesses of the more terrace with edge sides in inner side, the small elliptical reflector in outside is adhered to outer lateral reflection by silica gel
On mirror adjustment platform, so as to be connected to the holding screw on outer reflector adjustment platform by adjustment, make outside small oval anti-
Minute surface and the small elliptical reflecting minute surface keeping parallelism in inner side are penetrated, the outer reflector adjustment platform for being stained with the oval small reflector in outside leads to
Cross the 3rd attachment screw be connected to outside more terrace with edge sides relevant position on, between the more terrace with edge rings of the more terrace with edge rings in inner side and outside by
More terrace with edge ring front rods and more terrace with edge ring rear connecting rods pass through the first attachment screw, the second attachment screw and the 4th connection respectively
Screw is connected, and the more terrace with edge rings in inner side is parallel to each other with the more terrace with edge ring corresponding surfaces in outside, central axis overlaps.
Further, connect before the more terrace with edge rings in the inner side, the more terrace with edge rings in outside, outer reflector adjustment platform, more terrace with edge rings
Extension bar and more terrace with edge ring rear connecting rods are by the small invar material processing and fabricating of thermal coefficient of expansion.
Further, the small elliptical reflector of the small elliptical reflector in the inner side and outside is using thermal coefficient of expansion and invar material
Expect close quartz material processing and fabricating.
Further, the less silica gel of modulus of elasticity is used between the more terrace with edge rings of the small elliptical reflector in the inner side and inner side
Bonding, bondline thickness are less than 0.5mm.
Further, the small elliptical reflector in outside adjusts platform with outer reflector by the less silica gel of modulus of elasticity and glued
Connect, bondline thickness is less than 0.5mm.
The present invention has the following advantages that compared with prior art：
1. using material of main part of low-expansion invar mechanical material as multiple-beam synthesis device, greatly reduce
The difficulty of processing of device and process-cycle.And it is existing very big using the synthesizer optical manufacturing difficulty of optics polygonal pyramid,
And cost is high；
2. beam contacts region uses the small reflector that is easily guaranteed that of machining accuracy, the depth of parallelism between small reflector can be with
Stepless changing is realized by adjusting platform, the machining accuracy of the more terrace with edges of invar can be reduced, compared to existing beam synthesis part, is adopted
Light beam, which is carried out, with the device of the invention closes beam, it is more easy to operate；
3. the bundling device of the invention is used using optics polygonal pyramid and the conjunction Shu Fangfa of multimirror collocation compared to existing
Part can be applied to the smaller imaging device of light beam dutycycle, and application is more extensive.
Brief description of the drawings
Fig. 1 and Fig. 2 is the two dimension of the multiple-beam synthesis device proposed by the present invention being applied in synthetic aperture imaging equipment
Structure diagram.
Fig. 2 is Fig. 1 right view.
Fig. 3 is the three-dimensional structure letter of the multiple-beam synthesis device proposed by the present invention being applied in synthetic aperture imaging equipment
Figure.
Fig. 4 is the adjustment signal of the multiple-beam synthesis device proposed by the present invention being applied in synthetic aperture imaging equipment
Figure, wherein, Fig. 4 (a) is the first step of Method of Adjustment, and Fig. 4 (b) is the second step of Method of Adjustment.
Part description in Fig. 1 and Fig. 2：
The terrace with edge ring of 1-inner side six, the terrace with edge ring of 2-outside six,
The small elliptical reflector in 3-inner side, the small elliptical reflector in 4-outside,
5-outer reflector adjustment platform, 6-six terrace with edge ring front rods,
7-six terrace with edge ring rear connecting rods, the 8,9,10,11-the first, second, the 3rd, the 4th attachment screw,
12-holding screw.
Embodiment
For the object, technical solutions and advantages of the present invention are more clearly understood, below in conjunction with specific embodiment, and reference
Accompanying drawing, the present invention is described in more detail.
The two-dimensional structure sketch of the multiple-beam synthesis device proposed by the present invention being applied in synthetic aperture imaging equipment is such as
Shown in Fig. 1 and Fig. 2, illustrated with six terrace with edge rings.Fig. 2 is Fig. 1 right view.Including：The terrace with edge ring 1 of inner side six, the rib of outside six
Platform ring 2, the small elliptical reflector 3 in inner side, the small elliptical reflector 4 in outside, outer reflector adjustment platform 5, six terrace with edge ring front rods
6th, six terrace with edge ring rear connecting rods 7, the first attachment screw 8, the second attachment screw 9, the 3rd attachment screw 10, the 4th attachment screw 11
With the grade part of holding screw 12；It is wherein be bonded by silica gel between the small elliptical reflector 3 in inner side and the terrace with edge ring 1 of inner side six；Outside is small
Elliptical reflector 4 is be bonded by silica gel between adjusting platform 5 with outer reflector；The outside for being bonded with the small elliptical reflector 4 in outside is anti-
Penetrate between mirror adjustment platform 5 and the terrace with edge ring 2 of outside six and be connected by the 3rd attachment screw 10；It is connected to outer reflector adjustment platform
Holding screw 12 on 5 can be used to adjust the locus of the small elliptical reflector 4 in outside, make its elliptical reflector 3 small with inner side
Keeping parallelism；By being connected after six terrace with edge ring front rods 6 and six terrace with edge rings between the terrace with edge ring 1 of inner side six and the terrace with edge ring 2 of outside six
Bar 7 is connected to a fixed by the first attachment screw 8, the second attachment screw 9 and the 4th attachment screw 11 respectively.
Comprise the following steps that：
The first step：The structure diagram of the multiple-beam synthesis device of the present invention is provided according to Fig. 1, Fig. 2 and Fig. 3, by invar material
Connected before the similar terrace with edge ring 1 of inner side six of material machining shape and the terrace with edge ring 2 of outside six, outer reflector adjustment platform 5, six terrace with edge rings
The grade part of 6 and six terrace with edge ring rear connecting rod of bar 7.The terrace with edge ring of medial and lateral six can be the more terrace with edge rings in medial and lateral, wherein inside and outside
The more terrace with edge rings in side determine according to the quantity of combined beam light beam, such as combined beam light beam quantity is 6, then the more terrace with edge rings in medial and lateral are six ribs
Platform ring.
Second step：The structure diagram of the multiple-beam synthesis device of the present invention is provided according to Fig. 1, Fig. 2 and Fig. 3, by quartzy material
The small elliptical reflector 3 in material processing inner side and the small elliptical reflector 4 in outside, and it is successively that inner side is small with the less silica gel of modulus of elasticity
Elliptical reflector 3 is adhered on the relevant position of six terrace with edge ring 1 of inner side.With the less silica gel of modulus of elasticity successively by the small ellipse in outside
Speculum 4 is adhered on outer reflector adjustment platform 5.
3rd step：The structure diagram of the multiple-beam synthesis device of the present invention is provided according to Fig. 1, Fig. 2 and Fig. 3, respectively by six
Terrace with edge ring front rod 6, six terrace with edge ring rear connecting rods 7 are connected to the relevant position of six terrace with edge rings 1 of inner side and the terrace with edge ring 2 of outside six
On, make inside and outside six terrace with edge rings each face keeping parallelism, central axis overlap.
4th step：The outer reflector adjustment platform 5 of the small elliptical reflector 4 in bonding outside in second step is connected into spiral shell with the 3rd
Nail 10 is connected on the relevant position of six terrace with edge ring 2 of outside.And holding screw 12 is installed on the corresponding of outer reflector adjustment platform 5
In hole position.
5th step：The adjustment schematic diagram of the multiple-beam synthesis device of the present invention is provided according to Fig. 4, selectes an autocollimator
Demarcation is measured to a standard flat speculum, a certain distance is reserved between autocollimator and standard flat speculum, is protected
Multiple-beam synthesis device can be laid among card.The angle of standard flat speculum or autocollimator is adjusted, both is mutually hung down
Directly, autocollimator reading is shown as zero, and the position of fixed standard plane mirror and autocollimator.
6th step：The structure diagram of the multiple-beam synthesis device of the present invention is provided according to Fig. 1, Fig. 2, Fig. 4 provides the present invention
Multiple-beam synthesis device adjustment schematic diagram, between standard flat mirror and autocollimator lay multiple-beam synthesis device, make
The sub-light beam optical path of multiple-beam synthesis device overlaps with autocollimator light path.The outer reflector for adjusting multiple-beam synthesis device is adjusted
The attachment screw 10 of holding screw 12 and the 3rd on whole 5, the small elliptical reflector 4 in outside is set to realize the tune of any direction low-angle
It is whole.By adjusting the angle of the small elliptical reflector 4 in outside, and when the reading for observing autocollimator is zero, it is small to stop adjustment outside
The angle of elliptical reflector 4, lock the 3rd attachment screw 10, and ensure the 3rd attachment screw 10 locking after autocollimator reading not
Become.
7th step：Multiple-beam synthesis device is rotated, each way light beam is overlapped with autocollimator light path, each way light
The small elliptical reflector 4 in outside on beam is adjusted locking according to the method for above-mentioned steps six successively.
Embodiment described above is only limitted to explain the present invention, and protection scope of the present invention should include the whole of claim
Content, and the full content of the claims in the present invention can be realized by embodiment person skilled in art.
Claims (5)
- A kind of 1. multiple-beam synthesis device being applied in synthetic aperture imaging equipment, it is characterised in that：Including the more terrace with edges in inner side Before ring, the more terrace with edge rings in outside, the small elliptical reflector in inner side, the small elliptical reflector in outside, outer reflector adjustment platform, more terrace with edge rings Connecting rod, more terrace with edge ring rear connecting rods, the first attachment screw, the second attachment screw, the 3rd attachment screw, the 4th attachment screw and Holding screw, wherein the small elliptical reflector in inner side is invested in the corresponding recesses of the more terrace with edge sides in inner side by gluing, the small ellipse in outside Speculum is adjusted on platform by the gluing outer reflector that invests, and is adjusted so as to be connected to outer reflector by adjustment on platform Holding screw, make the small elliptical reflecting minute surface in outside and the small elliptical reflecting minute surface keeping parallelism in inner side, it is oval small to be stained with outside The outer reflector adjustment platform of speculum is connected on the more terrace with edge sides relevant position of outside by the 3rd attachment screw, and inner side is more The first connection is passed through by more terrace with edge ring front rods and more terrace with edge ring rear connecting rods respectively between the more terrace with edge rings of terrace with edge ring and outside Screw, the second attachment screw and the 4th attachment screw are connected, and make the more terrace with edge rings in inner side and the more terrace with edge ring corresponding surfaces in outside mutual Parallel, central axis overlaps.
- 2. the multiple-beam synthesis device in synthetic aperture imaging equipment according to claim 1, it is characterised in that：In described The more terrace with edge rings in side, the more terrace with edge rings in outside, outer reflector adjustment platform, more terrace with edge ring front rods and more terrace with edge ring rear connecting rods By the small invar material processing and fabricating of thermal coefficient of expansion.
- 3. the multiple-beam synthesis device in synthetic aperture imaging equipment according to claim 1, it is characterised in that：In described The small elliptical reflector of the small elliptical reflector in side and outside is made using the thermal coefficient of expansion quartz material processing close with invar material Make.
- 4. the multiple-beam synthesis device in synthetic aperture imaging equipment according to claim 1, it is characterised in that：In described Nian Jie using the less silica gel of modulus of elasticity between the small elliptical reflector in side and the more terrace with edge rings in inner side, bondline thickness is less than 0.5mm.
- 5. the multiple-beam synthesis device in synthetic aperture imaging equipment according to claim 1, it is characterised in that：Outside is small Elliptical reflector is Nian Jie with outer reflector adjustment platform by the less silica gel of modulus of elasticity, and bondline thickness is less than 0.5mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710760488.1A CN107357045B (en) | 2017-08-30 | 2017-08-30 | Multi-beam synthesizer applied to synthetic aperture imaging equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710760488.1A CN107357045B (en) | 2017-08-30 | 2017-08-30 | Multi-beam synthesizer applied to synthetic aperture imaging equipment |
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| Publication Number | Publication Date |
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| CN107357045A true CN107357045A (en) | 2017-11-17 |
| CN107357045B CN107357045B (en) | 2019-07-19 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107953040A (en) * | 2017-12-28 | 2018-04-24 | 中国科学院宁波材料技术与工程研究所 | A kind of high-precision laser machining device and system |
| CN109739026A (en) * | 2019-03-22 | 2019-05-10 | 中国人民解放军国防科技大学 | Multi-beam combiner |
| CN111699425A (en) * | 2017-12-29 | 2020-09-22 | 南京镭芯光电有限公司 | Photon source comprising a plurality of light sources and an optical housing for receiving light emitted by the light sources |
| CN115453808A (en) * | 2021-06-08 | 2022-12-09 | 扬明光学股份有限公司 | Lighting system |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107953040A (en) * | 2017-12-28 | 2018-04-24 | 中国科学院宁波材料技术与工程研究所 | A kind of high-precision laser machining device and system |
| CN107953040B (en) * | 2017-12-28 | 2020-03-31 | 中国科学院宁波材料技术与工程研究所 | High-precision laser processing device and system |
| CN111699425A (en) * | 2017-12-29 | 2020-09-22 | 南京镭芯光电有限公司 | Photon source comprising a plurality of light sources and an optical housing for receiving light emitted by the light sources |
| US11385420B2 (en) | 2017-12-29 | 2022-07-12 | Nanjing Casela Technologies Corporation Limited | Photon source comprising a plurality of optical sources and an optical shell to receive the light emitted by the optical source |
| CN109739026A (en) * | 2019-03-22 | 2019-05-10 | 中国人民解放军国防科技大学 | Multi-beam combiner |
| CN109739026B (en) * | 2019-03-22 | 2023-11-21 | 中国人民解放军国防科技大学 | Multi-beam combiner |
| CN115453808A (en) * | 2021-06-08 | 2022-12-09 | 扬明光学股份有限公司 | Lighting system |
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| CN107357045B (en) | 2019-07-19 |
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