CN103075966A - Displacement measuring system - Google Patents
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- CN103075966A CN103075966A CN2012105919812A CN201210591981A CN103075966A CN 103075966 A CN103075966 A CN 103075966A CN 2012105919812 A CN2012105919812 A CN 2012105919812A CN 201210591981 A CN201210591981 A CN 201210591981A CN 103075966 A CN103075966 A CN 103075966A
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Abstract
The invention provides a displacement measuring system, which mainly comprises a laser, a data collecting and processing unit and a feedback unit, wherein the laser is used for outputting double-frequency laser, the feedback unit comprises a first reflecting mirror and a second reflecting mirror in relative separated and parallel arrangement, the first reflecting mirror is provided with a first surface for directly receiving incident laser, the normal line of the first surface forms an included angle alpha with the incident laser, the second reflecting mirror comprises a third surface, a fourth surface and a fifth surface, the fourth surface is opposite to the first surface, the third surface is opposite and parallel to the first surface, the third surface comprises a reflecting region and a transmission region, the reflecting region is provided with a reflecting film, the transmission region is provided with an antireflection film, the fifth surface is in arrangement opposite to the transmission region, and in addition, the surface is provided with a reflecting film and forms an included angle beta with the third surface.
Description
Technical field
The invention belongs to the displacement measuring technology field, especially about a kind of nano-grade displacement measuring system based on the feedback of Fabry-Perot exocoel.
Background technology
Nano measurement is the basis of nano science development, and nano science mainly is that research, discovery and processing structure size are less than material, device and the system of 100 nanometers, obtaining needed function and performance, and be used widely in fields such as material, chemistry, biology, the energy and medical and health.Along with the arrival of nanometer era, the demand that the product of nanoscale is detected increases day by day, also the nano measurement technology has been proposed higher standard simultaneously.Nano measurement need to reach nano level resolution in millimetre-sized measurement range, need simultaneously to consider the requirement of the aspects such as environmental baseline, system complex degree and traceability.
The nano measurement technology is according to the standard of range, resolution and uncertainty of measurement, can be divided into two large classes: a class is mentioned laser interferometer, be characterized in that range is large, can reach tens meters, but will realize with divided methods such as electronics phase demodulations the displacement less than half optical wavelength; Another kind of is beat method Fabry-Perot-type (Fabry-Perot, F-P) interferometer technique, X ray interferometer technique, optics+X ray interferometer technique, frequency measurement technology and frequency comb technology etc., their characteristics are that resolution and uncertainty of measurement are low, can reach inferior nanometer even micromicron magnitude.Yet mentioned laser interferometer is owing to the impact of the nonlinearity errons such as electronic noise, and therefore half-wavelength is difficult to satisfy high-resolution requirement with interior displacement measurement and unreliable.And the range of beat Fabry-Perot interferometer technology etc. is little, generally in micron dimension, has limited its range of application.
Have advantages of that based on the displacement measurement method of laser feedback simple in structure, autocollimation and cost performance are high.Yet, traditional laser feedback that utilizes is measured in the measurement mechanism of displacement, owing to adopting uncollimated exocoel feedback, feedback order and the resolution of laser beam in the feedback exocoel can not directly obtain, but just can know the resolution of this device after needing interferometer to demarcate, when realizing nano level displacement measurement resolution, can't realize the certainly demarcation of resolution.
Summary of the invention
In sum, the necessary displacement measurement system that the nano level displacement measurement resolution of a kind of tool is provided and can directly obtains resolution.
A kind of displacement measurement system, mainly comprise: a laser instrument, in order to export double-frequency laser, described laser instrument comprises that one first inner chamber catoptron, a gain tube, an anti-reflection window, a birefringence element and one second inner chamber catoptron are along the successively coaxial setting of axis of Output of laser, described birefringence element is arranged between the second inner chamber catoptron and the described anti-reflection window, and arranges in order to produce a minute frequency laser with described the second inner chamber catoptron and described anti-reflection window interval respectively; One data acquisition and processing unit, described data acquisition and processing unit comprise that an Amici prism arranges to receive the laser of laser instrument output near described the first inner chamber catoptron, and laser is divided into o light and e light, one first photodetector and the second photodetector and described Amici prism interval arrange to receive described o light and e light and are converted to two path signal, one filter amplification circuit is electrically connected to process two path signal with described the first photodetector and the second photodetector, one signal processing unit is electrically connected to calculate umber of pulse with described filter amplification circuit, and a display device is electrically connected to show umber of pulse with described signal processing unit; Wherein, further comprise a feedback unit, described feedback unit comprises one first catoptron and the second catoptron relative spacing and be arranged in parallel, described the first catoptron has a first surface with direct reception incident laser, the normal of described first surface and described incident laser form an angle α, described the second catoptron comprises one the 3rd surface, four surface and five surface relative with described first surface, described the 3rd surface is relative with described first surface and parallel, described the 3rd surface comprises a reflector space and regional transmission, described reflector space is provided with reflectance coating, described regional transmission is provided with anti-reflection film, described the 5th surface is oppositely arranged with described regional transmission, and the surface is provided with reflectance coating and forms an angle β with described the 3rd surface, the laser that incides feedback unit from laser instrument is directly incident on the first catoptron, behind Multi reflection between the reflector space of the first catoptron and the second catoptron, incide described the 5th surface from described regional transmission, and behind the 5th surface reflection, return described laser instrument along former road again.
Compared with prior art, displacement measurement system provided by the invention, by being set, the second catoptron and the first catoptron form feedback unit in feedback unit, utilize laser feedback effect a little less than the substance high-order that comes and goes between the first catoptron and the second catoptron, have the high-order frequency-doubled effect on the one hand, can reach nano level displacement measurement resolution; On the other hand, the resolution of described displacement measurement system can be counted according to the reflected light in the feedback unit and obtain simultaneously, demarcate and need not other devices, so method is simpler, therefore has broad application prospects.
Description of drawings
Fig. 1 is the structural representation of the displacement measurement system that provides of the embodiment of the invention.
Fig. 2 is the structural representation of the second catoptron in the described displacement measurement system of Fig. 1.
Fig. 3 is the sectional view of the second catoptron shown in Figure 2 III-III direction along the line.
Fig. 4 is the index path of laser in the described feedback unit of displacement measurement system shown in Figure 1.
Fig. 5 is the index path of laser shown in Figure 4 in the second catoptron.
Fig. 6 A is the feedback intensity modulation curve of traditional bit shift measurement systematic survey displacement.
Fig. 6 B is that the described displacement measurement system of Fig. 1 is measured the feedback intensity modulation curve of displacement.
Fig. 7 A is the feedback intensity modulation curve during feedback order n=7 in the described displacement measurement system of Fig. 1.
Fig. 7 B is the feedback intensity modulation curve during feedback order n=21 in the described displacement measurement system of Fig. 1.
Fig. 7 C is the feedback intensity modulation curve during feedback order n=33 in the described displacement measurement system of Fig. 1.
The main element symbol description
The first catoptron 1
The second catoptron 2
The second inner chamber catoptron 3
Gain tube 6
The first inner chamber catoptron 7
The first photodetector 9
The second photodetector 10
Filter amplification circuit 11
Data acquisition and processing unit 40
The 3rd surface 201
The 4th surface 202
The 5th surface 203
Following specific embodiment further specifies the present invention in connection with above-mentioned accompanying drawing.
Embodiment
Describe displacement measurement system provided by the invention and measuring method thereof in detail below with reference to accompanying drawing.
See also Fig. 1, first embodiment of the invention provides a kind of displacement measurement system, and described displacement measurement system comprises a laser instrument 20, one feedback units 30 and a data acquisition and processing unit 40.Enter described feedback unit 30 from the laser of described laser instrument 20 outputs, after feedback unit 30 feedbacks reflection, return described laser instrument 20, and enter data acquisition and processing unit 40.
Described laser instrument 20 is used for the output double-frequency laser; May be selected to be and be gas laser, solid state laser or semiconductor laser etc.In the present embodiment, described laser instrument 20 is a helium-neon laser.Described laser instrument 20 comprises a shell 15, and is arranged at one first inner chamber catoptron 7, a gain tube 6, an anti-reflection window 5, a birefringence element 4 and one second inner chamber catoptron 3 in the shell 15.Described shell 15 helps to keep temperature and the thermal equilibrium of laser instrument 20 inside.Described gain tube 6 can be fixed in the described shell 15 by a bracing frame 14.Be appreciated that support frame as described above 14, shell 15 are an optional structure.Described the first inner chamber catoptron 7, gain tube 6, anti-reflection window 5, birefringence element 4 and the second inner chamber catoptron 3 are along the successively coaxial setting of axis of described laser instrument 20 Output of lasers, and the inner chamber of formation laser instrument.Described birefringence element 4 makes described laser instrument 20 output double-frequency lasers for generation of frequency splitting, and the material of described birefringence element 4 can be quartz crystal, bilingual stone etc., also can produce for other material of frequency splitting.Described birefringence element 4 and arranges with described anti-reflection window 5 and described the second inner chamber catoptron 3 intervals between described anti-reflection window 5 and described the second inner chamber catoptron 3.Described birefringence element 4 has two relative planes at the Output of laser axis direction, and anti-reflection film is all plated on described two planes.The chamber length of the inner chamber of described laser instrument 20 can be 180mm～200mm.
The interference laser that described data acquisition and processing unit 40 are exported from described laser instrument 20 first inner chamber catoptrons 7 in order to reception, and carry out data and process and calculate umber of pulse.Described data acquisition and processing unit 40 comprise an Amici prism 8, the first photodetector 9, the second photodetector 10, a filter amplification circuit 11, a signal processing unit 12 and a display device 13.Described Amici prism 8 arranges near the first inner chamber catoptron 7 of described laser instruments 20, receiving the laser of the first inner chamber catoptron 7 outputs from laser instrument 20, and the laser of output is divided into o light, the e light component that two-way has phasic difference in the space.Described the first photodetector 9, the second photodetector 10 be in order to surveying respectively o light and the e light component by Amici prism 8 outputs, and be converted into two path signal.Described filter amplification circuit 11 is electrically connected with described the first photodetector 9 and the second photodetector 10, and two path signal is carried out current/voltage-converted, amplification and filtering process.Described signal processing unit 12 is used for counting is processed and realized to the two path signal of filter amplification circuit 11 outputs, the umber of pulse N that produces during with the calculating change in optical path length, and the direction of motion of or lag behind judgement testee relatively leading according to the position of two path signal.Further, can be electrically connected with described signal processing unit 12 by described display device 13, be used for number of pulses N and show.Be appreciated that described display device 13 only is an optional structure, described umber of pulse N also can obtain by other counting elements.
See also Fig. 2 and Fig. 3, described feedback unit 30 comprises one first catoptron 1 and the second catoptron 2 and the 1 relative and interval setting of described the first catoptron, and its spacing d can be more than or equal to 1 millimeter less than or equal to 1000 millimeters, such as 2 millimeters, 5 millimeters, 10 millimeters, 20 millimeters etc.In the situation that other parameter constants, described spacing is less, and then the minute mark rate of described displacement measurement system is higher.Described feedback unit 30 consists of the FP feedback exocoel of described laser instrument 20.The material of described the first catoptron 1 and the second catoptron 2 can be glass, also can be other transparent solid materials.Described the first catoptron 1 has a first surface 101 towards described laser instrument 20, makes Output of laser can be directly incident on described first surface 101.Described first surface 101 is the plane, and the surface of described first surface 101 is coated with reflectance coating with the laser of reflection incident.The normal of described first surface 101 and described incident laser form an angle α, and less than 90 degree, preferred, described α can be more than or equal to 1 degree less than or equal to 10 degree greater than zero degree for described α.In the situation that it is constant to keep α, described the first catoptron 1 can move along described laser instrument 20 Output of laser axis directions, to change the spacing between the first catoptron 1 and the second catoptron 2.In the present embodiment, the material of described the first catoptron 1 is glass, and thickness is 3 millimeters, and described α is 4 degree.
Described the second catoptron 2 comprise one in described the first catoptron 1 first surface 101 and parallel in the 3rd surface 201 of first surface 101, and four surface 202 and five surface 203 relative with the described the 3rd surperficial 201, the 202 and the 5th surface 203, described the 4th surface arranges back to described first surface 101.Described the 4th surface 202 can be a plane, curved surface, folding face etc., in the present embodiment, described the 4th surface 202 be one with 201 parallel planes, described the 3rd surface, the distance between described the 4th surface 202 and described the 3rd surface 201 is the thickness d of described the second catoptron 2.Described the 5th surface 203 is a plane, is connected the junction formation one handing-over line on described the 5th surface 203 with described the 4th surface 202 with described the 4th surface 202.Described the 4th surface 202 is near the shoot laser setting of described laser instrument 20, and described the 5th surface 203 is away from the shoot laser setting of described laser instrument 20.Described the 5th surface 203 forms an angle β with described the 3rd surface 201.Described the 5th surface 203 on away from described Output of laser direction gradually near described the 3rd surface 201.Described the 5th surface 203 begins along being the width l that maximum development length on the β angular direction is defined as described the 5th surface 203 with the 4th surface 102 from described boundary line
2, described l
2Can be more than or equal to 10 millimeters.In the present embodiment, the width l on described the 5th surface 203
2Equal 10 millimeters.
Described the 3rd surface 201 is α with the formed angle of described Laser output direction, can define a reflector space 201a and a regional transmission 201b away from described incident laser who has near described incident laser in described the 3rd surface 201 according to the function difference.The surface of described reflector space 201a is coated with reflectance coating, be used for reflection from the laser of first surface 101 reflections, the surface of described regional transmission 201b is coated with anti-reflection film, is used for transmission from the laser of described first surface 101 reflections, makes described laser enter to inject described the 5th surface 203.After being mapped to described first surface 101 from laser instrument 20 import and exports, between first surface 101 and reflector space 201a, through Multi reflection, incide described the 5th surface 203 from described regional transmission 201b.Particularly, the width of described reflector space 201a can be 50 millimeters to 100 millimeters, the width l of described regional transmission 201b
1Be defined as described regional transmission 201b at the maximum span that is along the shoot laser with laser instrument 20 on the α angle direction.Preferably, the width l of described regional transmission 201b
1More than or equal to 10 millimeters.In the present embodiment, the width l of described regional transmission 201b
1Equal 10 millimeters.
Further, the width l on described the 5th surface 203
2Width l with described regional transmission 201b
1Satisfy following relation:
Wherein, d is the distance between the 201 and the 4th surface 202, the 3rd surface in the second catoptron 2, to guarantee that the laser that incides feedback unit 30 from laser instrument 20 can incide described the 5th surface 203 behind Multi reflection, and after the reflectance coating reflection on the 5th surface 203, be reflected back in the described laser instrument 20 along former road again.Preferably, the width l on described the 5th surface 203
2Width l greater than described regional transmission 201b
1Thereby, make from the laser of first surface 101 reflections and can incide described the 5th surface 203.
See also Fig. 4 and Fig. 5, described laser instrument 20 emitting lasers incide after the first catoptron 1, reflex to the reflector space 201a on described the second catoptron 2 described the 3rd surfaces 201, and after round n time (feedback order), incide the 5th surface 203 of described the second catoptron 2 from the regional transmission 201b on described the 3rd surface 201.The refractive index n of described α, β and described the second catoptron 2
2Satisfy following relation:
So that after inciding the 5th surface 203 of the second catoptron 2 from the laser of described regional transmission 201b incident, can be from original optical path return laser light device 20.
The principle of described displacement measurement system is as follows.Described the first catoptron 1 is fixed in object under test one surface.Be appreciated that described the first catoptron 1 can omit when described object under test surface itself namely has a plane of reflection.Two the crossed polarized light o light that is produced by birefringence element 4 division and e light, in the situation that the light feedback, light field can be divided into two parts.Reflector space is the inner chamber propagation field of light beam after laser instrument 20 inner chambers come and go a week, and regional transmission is light beam turns back to laser instrument 20 inner chambers again along former road after 30 interior round n weeks (being the feedback order) at feedback unit propagation field.The inner chamber propagation field forms self-mixed interference with the propagation field stack that turns back to inner chamber at feedback unit 30 round n after week, and the output intensity of o light and e light can be expressed as under low light level feedback condition:
In the formula: I
O0And I
E0The output intensity of two crossed polarized lights when being unglazed feedback, ζ
oAnd ζ
eThe laser feedback factor, ν
oAnd ν
eBe the optical frequency of o light and e light, l is that the chamber of feedback unit 30 is long.(1) formula shows that when the light feedback was arranged, the output intensity of two crossed polarized lights was all modulated, and waveform is similar to cosine curve.The fringe density of the feedback fringe that forms in the display device 13 especially, is mainly determined by feedback order n.Wherein, the geometry that the size of feedback order n can be by feedback unit 30 is by calculating.
When the first catoptron 1 of feedback unit 30 moved right Δ b, the total light path increment that then produces comprised two parts:
Reflector space is to increase to 2m * Δ b by the light path that 1 displacement of the first catoptron causes, wherein m is the round number of times (laser from first catoptron incide second catoptron, return first catoptron for once come and go again) of incident laser in feedback unit 30;
Regional transmission is that laser beam is when moving on the surface of the first catoptron 1 and the second catoptron 2, cause the light path of last light beam in the second catoptron 2 described in the feedback unit 30 to change, and produce additional optical distance-AC(because when moving right, light path in the second catoptron 2 reduces, so get negative sign);
So when the first catoptron 1 moved right Δ b, total light path increment Delta l of generation was
Δl=2m×Δb-AC。Wherein, additional optical distance AC can obtain as follows:
When the first catoptron 1 moves right Δ b, each reflection light point amount of movement from the teeth outwards is KT=2sin α * Δ b on the second catoptron 2, so the feedback light beam is behind the m secondary reflection, last luminous point is AB=2msin α * Δ b at the second catoptron 2 lip-deep amount of movements;
In right-angle triangle ABC (C is the summit, right angle), additional optical distance AC=AB * sin β * n
2So, AC=2mn
2Sin α sin β * Δ b.
So when the first catoptron 1 moved right Δ b, total light path increment Delta l was
Δl=2m×Δb-2mn
2sinαsinβ×Δb。（2）
The umber of pulse N that total light path increment produces is
Can get the move right expression formula of Δ b of the first catoptron 1 by formula (2) and (3)
By (4) formula as can be known, the resolution δ of measuring system (being resolution) is
Wherein, α is incident angle, and it is constant, and λ is optical maser wavelength.Can find out from formula (5), the resolution of measuring system is only relevant with the round number of times m of laser in the feedback unit 30, namely relevant with the reflected light on the first catoptron 1 surface q that counts, coming and going the count pass of q of number of times m and reflected light is, m=2 * q-1), as long as so calculate the number of reflection light point in the feedback unit 30, just can obtain exactly the optical resolution of measuring system, and no longer need other benchmark instrument to demarcate.The resolution of described displacement measurement system can be less than 10 nanometers, as less than 8 nanometers, less than 5 nanometers, less than 2 nanometers.
Shown in Fig. 6 A and Fig. 6 B, when Fig. 6 B is displacement measurement system measurement of the present invention, the first catoptron 1 moves along the laser axis, the laser intensity curve that the first photodetector 9, the second photodetector 10 obtain, being very close high-order frequency multiplication striped, is tens times of the weak feedback of tradition shown in Fig. 6 A.See also Fig. 7 A, Fig. 7 B, Fig. 7 C, provided the intensity modulation curve of feedback unit 30 under different feedback order conditions.Can find out from Fig. 7 A, it is 3 that the reflected light in feedback unit 30 is counted, and namely the feedback order is 7 o'clock, and the density of intensity modulation curve is about 7 times of the weak feedback of tradition; As can be seen from Figure 7B, it is 11 that the reflected light in feedback unit 30 is counted, and namely the feedback order is 21 o'clock, and the density of intensity modulation curve is about 21 times of the weak feedback of tradition; Can find out from Fig. 7 C, it is 17 that the reflected light in feedback unit 30 is counted, and namely the feedback order is 33 o'clock, and the density of intensity modulation curve is about 33 times of the weak feedback of tradition, and this moment, corresponding optical resolution was 9.6nm; And, go back presence bit between the feedback fringe of two polarization state quadratures and differ.After the first photodetector 9, the second photodetector 10 detect this feedback fringe, utilize 11 pairs of signals of filter amplification circuit to carry out filter amplifying processing; Then signal processing unit 12, realize the digital conversion of signal and further shaping, filtering, and umber of pulse is processed and calculated at the edge of the two paths of signals of the first photodetector 9,10 outputs of the second photodetector; Simultaneously, the direction of motion of or hysteresis judgment object relatively leading according to the position of two paths of signals, and direction and umber of pulse be presented on the display device 13.
The present invention is based on the displacement measurement system of FP feedback exocoel, utilize the weak feedback effect of laser substance high-order, not only have the high-order frequency-doubled effect, reach nano level displacement measurement resolution; But also the further electronic fine-grained Measurement Resolution of Subnano-class and the direction of motion of recognition object of reaching; In addition, the method also has advantages of optical resolution from demarcating, can according to the reflected light of FP feedback chamber mirror count the system that obtains resolution and not other benchmark instruments of needs demarcate.Described displacement measurement system have resolution high, simple in structure, can be traceable to the characteristics such as optical maser wavelength.
In addition, those skilled in the art also can do other and change in spirit of the present invention, and certainly these variations of doing according to spirit of the present invention all should be included in the present invention's scope required for protection.
Claims (10)
1. displacement measurement system mainly comprises:
One laser instrument is in order to export double-frequency laser;
One data acquisition and processing unit are in order to the interference laser that receives laser instrument output and carry out data and process;
It is characterized in that, further comprise a feedback unit, described feedback unit comprises one first catoptron and the second catoptron relatively and the interval arranges, described the first catoptron has a first surface with direct reception incident laser, the normal of described first surface and described incident laser form an angle α, described the second catoptron comprises one the 3rd surface and five surface relative with described the 3rd surface, described the 3rd surface be arranged in parallel to described first surface and with described first surface, described the 5th surface is back to described first surface setting, described the 5th surface is away from described shoot laser setting and have reflectance coating, and form an angle β with described the 3rd surface, and on away from described Output of laser direction gradually near described the 3rd surface, described the 3rd surface comprise one near the reflector space of described incident laser and away from described incident laser thoroughly
Penetrate the zone, described reflector space is provided with reflectance coating, described regional transmission is provided with anti-reflection film, the laser that incides feedback unit from laser instrument is directly incident on the first catoptron, between the reflector space of the first catoptron and the second catoptron behind Multi reflection, incide described the 5th surface from described regional transmission, and behind the 5th surface reflection, return described laser instrument along former road again.
2. displacement measurement system as claimed in claim 1 is characterized in that, the refractive index n of described α, β and described the second catoptron
2Satisfy following relation:
3. displacement measurement system as claimed in claim 1 is characterized in that, described angle α spends less than or equal to 10 more than or equal to 1 degree.
4. displacement measurement system as claimed in claim 1 is characterized in that, described the second catoptron further comprises four surface relative and parallel with described the 3rd surface, and described the 4th surface is connected the width l on described the 5th surface with described the 5th surface
2Width l with described regional transmission
1Satisfy following relation:
5. displacement measurement system as claimed in claim 1 is characterized in that, the width of described the second catoptron regional transmission is more than or equal to 10 millimeters.
6. displacement measurement system as claimed in claim 1 is characterized in that, the resolution δ of described displacement measurement system is:
Wherein, λ is optical maser wavelength, and m is the round number of times of incident laser in feedback unit.
7. displacement detection system as claimed in claim 1 is characterized in that, the displacement b of the first catoptron obtains by following formula:
Wherein, λ is optical maser wavelength, and m is the round number of times of incident laser in feedback unit, the umber of pulse that N light path increment produces.
8. displacement measurement system as claimed in claim 1 is characterized in that, the optical resolution of described displacement measuring device is less than 8 nanometers.
9. displacement measurement system as claimed in claim 1, it is characterized in that, described laser instrument comprises that one first inner chamber catoptron, a gain tube, an anti-reflection window, a birefringence element and one second inner chamber catoptron are along the successively coaxial setting of axis of Output of laser, described birefringence element is arranged between the second inner chamber catoptron and the described anti-reflection window, and arranges in order to produce a minute frequency laser with described the second inner chamber catoptron and described anti-reflection window interval respectively.
10. displacement measurement system as claimed in claim 1, it is characterized in that, described data acquisition and processing unit comprise that an Amici prism arranges to receive the laser of laser instrument output near described the first inner chamber catoptron, and laser is divided into o light and e light, one first photodetector and the second photodetector and described Amici prism interval arrange to receive described o light and e light and are converted to two path signal, one filter amplification circuit is electrically connected to process two path signal with described the first photodetector and the second photodetector, and a signal processing unit is electrically connected to calculate umber of pulse with described filter amplification circuit.
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| CN104482884A (en) * | 2014-11-20 | 2015-04-01 | 中国工程物理研究院激光聚变研究中心 | Small-angle measurement device and measurement method thereof |
| CN106654839A (en) * | 2016-10-13 | 2017-05-10 | 南通大学 | Displacement self-sensing helium-neon laser system |
| CN106767656A (en) * | 2017-02-22 | 2017-05-31 | 西安交通大学 | The high-accuracy calibration device and scaling method of a kind of rolling angle measurement system |
| CN108919395A (en) * | 2018-07-11 | 2018-11-30 | 中国科学院电子学研究所 | For increasing the device of light beam light path |
| CN109238153A (en) * | 2018-09-12 | 2019-01-18 | 清华大学深圳研究生院 | Double frequency comb thickness measuring light channel structures, system, method, apparatus and storage medium |
| CN114509026A (en) * | 2022-04-19 | 2022-05-17 | 中国科学院西安光学精密机械研究所 | Sub-arc second-level angle measurement system and method and relative deformation angle measurement method |
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| CN104482884B (en) * | 2014-11-20 | 2017-10-03 | 中国工程物理研究院激光聚变研究中心 | Narrow angle measuring device and its measuring method |
| CN106654839A (en) * | 2016-10-13 | 2017-05-10 | 南通大学 | Displacement self-sensing helium-neon laser system |
| CN106767656A (en) * | 2017-02-22 | 2017-05-31 | 西安交通大学 | The high-accuracy calibration device and scaling method of a kind of rolling angle measurement system |
| CN108919395A (en) * | 2018-07-11 | 2018-11-30 | 中国科学院电子学研究所 | For increasing the device of light beam light path |
| CN109238153A (en) * | 2018-09-12 | 2019-01-18 | 清华大学深圳研究生院 | Double frequency comb thickness measuring light channel structures, system, method, apparatus and storage medium |
| CN109238153B (en) * | 2018-09-12 | 2024-03-26 | 清华大学深圳研究生院 | Dual-optical-frequency comb thickness measuring optical path structure, system, method, device and storage medium |
| CN114509026A (en) * | 2022-04-19 | 2022-05-17 | 中国科学院西安光学精密机械研究所 | Sub-arc second-level angle measurement system and method and relative deformation angle measurement method |
| CN114509026B (en) * | 2022-04-19 | 2022-08-19 | 中国科学院西安光学精密机械研究所 | Sub-arc second-level angle measurement system and method and relative deformation angle measurement method |
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