CN103075966B - Displacement measurement system - Google Patents
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- CN103075966B CN103075966B CN201210591981.2A CN201210591981A CN103075966B CN 103075966 B CN103075966 B CN 103075966B CN 201210591981 A CN201210591981 A CN 201210591981A CN 103075966 B CN103075966 B CN 103075966B
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Abstract
The invention provides a kind of displacement measurement system, mainly comprise: a laser instrument, in order to export double-frequency laser, one data acquisition and processing unit and a feedback unit, described feedback unit comprises one first catoptron and the second catoptron relative spacing and be arranged in parallel, described first catoptron has a first surface directly to receive incident laser, the normal of described first surface and described incident laser shape have angle α, described second catoptron comprises one the 3rd surface, four surface relative with described first surface and the 5th surface, described 3rd surface is relative with described first surface and parallel, described 3rd surface comprises a reflector space and regional transmission, described reflector space is provided with reflectance coating, described regional transmission is provided with anti-reflection film, described 5th surface is oppositely arranged with described regional transmission, and surface is provided with reflectance coating and has angle β with described 3rd surperficial shape.
Description
Technical field
The invention belongs to displacement measuring technology field, especially about a kind of nano-grade displacement measuring system based on Fabry-Perot external cavity feedback.
Background technology
Nano measurement is the basis of nano science development, and nano science is mainly studied, to be found and processing structure size is less than the material of 100 nanometers, device and system, to obtain required function and performance, and be used widely in fields such as material, chemistry, biology, the energy and medical and health.Along with the arrival of nanometer era, the demand that the product of nanoscale detects is increased day by day, also higher standard is proposed to nano measurement technology simultaneously.Nano measurement needs to reach nano level resolution in millimetre-sized measurement range, needs the requirement considering the aspects such as environmental baseline, system complexity and traceability simultaneously.
Nano measurement technology is according to the standard of range, resolution and uncertainty of measurement, two large classes can be divided into: a class is mentioned laser interferometer, be characterized in that range is large, can reach tens meters, but the divided method such as displacement electronics phase demodulation being less than half optical wavelength is realized; Another kind of is beat method Fabry-Perot-type (Fabry-Perot, F-P) interferometer technique, X ray interferometer technique, optics+X ray interferometer technique, frequency measurement technology and frequency comb technology etc., their feature is that resolution and uncertainty of measurement are low, can reach sub-nanometer even micromicron magnitude.But mentioned laser interferometer is due to the impact of the nonlinearity errons such as electronic noise, the displacement measurement within half-wavelength is also unreliable, is therefore difficult to meet high-resolution requirement.And the range of beat Fabry-Perot interferometer technology etc. is little, generally in micron dimension, limit its range of application.
Displacement measurement method based on laser feedback has that structure is simple, autocollimation and the high advantage of cost performance.But, traditional laser feedback that utilizes is measured in the measurement mechanism of displacement, owing to adopting uncollimated external cavity feedback, the feedback order of laser beam in feedback exocoel and resolution can not directly obtain, but after needing interferometer to demarcate, just can know the resolution of this device, when realizing nano level displacement measurement resolution, the self-calibration of resolution cannot be realized.
Summary of the invention
In sum, necessaryly the nano level displacement measurement resolution of a kind of tool is provided and directly can obtains the displacement measurement system of resolution.
A kind of displacement measurement system, mainly comprise: a laser instrument, in order to export double-frequency laser, described laser instrument to comprise in resonant reflec-tors in one first, a gain tube, an anti-reflection window, a birefringence element and one second resonant reflec-tors along the axis coaxial setting successively of Output of laser, described birefringence element is arranged in second between resonant reflec-tors and described anti-reflection window, and resonant reflec-tors and described anti-reflection window interval arrange in order to produce a point frequency laser respectively and in described second, one data acquisition and processing unit, described data acquisition and processing unit comprise Amici prism resonant reflec-tors in described first and arrange the laser exported to receive laser instrument, and laser is divided into o light and e light, one first photodetector and the second photodetector and described Amici prism interval arrange receive described o light and e light and be converted to two path signal, one filter amplification circuit is electrically connected to process two path signal with described first photodetector and the second photodetector, one signal processing unit is electrically connected to calculate umber of pulse with described filter amplification circuit, one display device is electrically connected to show umber of pulse with described signal processing unit, wherein, comprise a feedback unit further, described feedback unit comprises one first catoptron and the second catoptron relative spacing and be arranged in parallel, described first catoptron has a first surface directly to receive incident laser, the normal of described first surface and described incident laser shape have angle α, described second catoptron comprises one the 3rd surface, four surface relative with described first surface and the 5th surface, described 3rd surface is relative with described first surface and parallel, described 3rd surface comprises a reflector space and regional transmission, described reflector space is provided with reflectance coating, described regional transmission is provided with anti-reflection film, described 5th surface is oppositely arranged with described regional transmission, and surface is provided with reflectance coating and has angle β with described 3rd surperficial shape, the laser inciding feedback unit from laser instrument is directly incident on the first catoptron, after multiple reflections between the first catoptron and the reflector space of the second catoptron, described 5th surface is incided from described regional transmission, and return described laser instrument through the 5th surface reflection Hou Zaiyanyuan road.
Compared with prior art, displacement measurement system provided by the invention, by arranging the second catoptron and the first catoptron forms feedback unit in feedback unit, utilize the weak feedback effect of substance high-order that laser comes and goes between the first catoptron and the second catoptron, on the one hand there is high-order frequency-doubled effect, nano level displacement measurement resolution can be reached; On the other hand, the resolution of described displacement measurement system can be counted according to the reflected light in feedback unit simultaneously and be obtained, and demarcates without the need to other devices, because the method is more simple, therefore has broad application prospects.
Accompanying drawing explanation
Fig. 1 is the structural representation of the displacement measurement system that the embodiment of the present invention provides.
Fig. 2 is the structural representation of the second catoptron in displacement measurement system described in Fig. 1.
Fig. 3 is the sectional view in the second catoptron III-III direction along the line shown in Fig. 2.
Fig. 4 is the index path of laser in feedback unit described in displacement measurement system shown in Fig. 1.
Fig. 5 is the index path of laser shown in Fig. 4 in the second catoptron.
Fig. 6 A is the feedback intensity modulation curve that traditional bit shift measurement system measures displacement.
Fig. 6 B is the feedback intensity modulation curve of the displacement measurement system measurement displacement described in Fig. 1.
Fig. 7 A is the feedback intensity modulation curve in displacement measurement system described in Fig. 1 during feedback order n=7.
Fig. 7 B is the feedback intensity modulation curve in displacement measurement system described in Fig. 1 during feedback order n=21.
Fig. 7 C is the feedback intensity modulation curve in displacement measurement system described in Fig. 1 during feedback order n=33.
Main element symbol description
First catoptron 1
Second catoptron 2
Resonant reflec-tors 3 in second
Birefringence element 4
Anti-reflection window 5
Gain tube 6
Resonant reflec-tors 7 in first
Amici prism 8
First photodetector 9
Second photodetector 10
Filter amplification circuit 11
Signal processing unit 12
Display device 13
Laser instrument 20
Feedback unit 30
Data acquisition and processing unit 40
First surface 101
3rd surface 201
Reflector space 201a
Regional transmission 201b
4th surface 202
5th surface 203
Following specific embodiment will further illustrate the present invention in conjunction with above-mentioned accompanying drawing.
Embodiment
Displacement measurement system provided by the invention and measuring method thereof is described in detail below with reference to accompanying drawing.
Refer to Fig. 1, first embodiment of the invention provides a kind of displacement measurement system, and described displacement measurement system comprises laser instrument 20, feedback unit 30 and a data acquisition and processing unit 40.The laser exported from described laser instrument 20 enters described feedback unit 30, returns described laser instrument 20, and enter data acquisition and processing unit 40 after feedback unit 30 feedback reflection.
Described laser instrument 20, for exporting double-frequency laser; May be selected to be as gas laser, solid state laser or semiconductor laser etc.In the present embodiment, described laser instrument 20 is a helium-neon laser.Described laser instrument 20 comprises a shell 15, and to be arranged in one first in shell 15 resonant reflec-tors 3 in resonant reflec-tors 7, gain tube 6, anti-reflection window 5, birefringence element 4 and one second.Described shell 15 contributes to the temperature and the thermal equilibrium that keep laser instrument 20 inside.Described gain tube 6 is fixed in described shell 15 by a bracing frame 14.Be appreciated that support frame as described above 14, shell 15 is an alternate configurations.In resonant reflec-tors 7 in described first, gain tube 6, anti-reflection window 5, birefringence element 4 and second, resonant reflec-tors 3 is along the axis coaxial setting successively of described laser instrument 20 Output of laser, and forms the inner chamber of laser instrument.Described birefringence element 4 is for generation of frequency splitting, and make described laser instrument 20 export double-frequency laser, the material of described birefringence element 4 can be quartz crystal, bilingual stone etc., also can produce the material of frequency splitting for other.Described birefringence element 4 in described anti-reflection window 5 and described second between resonant reflec-tors 3, and and in described anti-reflection window 5 and described second resonant reflec-tors 3 interval arrange.Described birefringence element 4 has two relative planes on Output of laser axis direction, and described two planes all plate anti-reflection film.The chamber of the inner chamber of described laser instrument 20 is long can be 180mm ~ 200mm.
Described data acquisition and processing unit 40 in order to receive the interference laser exported from resonant reflec-tors 7 in described laser instrument 20 first, and carry out data processing and calculate umber of pulse.Described data acquisition and processing unit 40 comprise Amici prism 8, first photodetector 9, second photodetector 10, filter amplification circuit 11, signal processing unit 12 and a display device 13.Described Amici prism 8 resonant reflec-tors 7 in first of described laser instrument 20 is arranged, and to receive from laser instrument 20 laser that in first, resonant reflec-tors 7 exports, and the laser of output is divided into o light, the e light component that two-way has phasic difference in space.Described first photodetector 9, second photodetector 10 in order to detect the o light and e light component that are exported by Amici prism 8 respectively, and is converted into two path signal.Described filter amplification circuit 11 is electrically connected with described first photodetector 9 and the second photodetector 10, and carries out current/voltage-converted, amplification and filtering process to two path signal.Described signal processing unit 12 processes for the two path signal exported filter amplification circuit 11 and realizes counting, the umber of pulse N produced during to calculate change in optical path length, and according to the direction of motion of the relatively advanced or delayed judgement testee in the position of two path signal.Further, be electrically connected with described signal processing unit 12 by described display device 13, show for number of pulses N.Be appreciated that described display device 13 is only an optional structure, described umber of pulse N also obtains by other counting elements.
See also Fig. 2 and Fig. 3, described feedback unit 30 comprises one first catoptron 1 and the second catoptron 2 and interval relative with described first catoptron 1 is arranged, and its spacing d can be more than or equal to 1 millimeter and be less than or equal to 1000 millimeters, as 2 millimeters, 5 millimeters, 10 millimeters, 20 millimeters etc.When other parameter constants, described spacing is less, then the minute mark rate of described displacement measurement system is higher.Described feedback unit 30 forms the FP feedback exocoel of described laser instrument 20.The material of described first catoptron 1 and the second catoptron 2 can be glass, also can be other transparent solid materials.Described first catoptron 1 has a first surface 101 towards described laser instrument 20, makes Output of laser can be directly incident on described first surface 101.Described first surface 101 is plane, and the surface of described first surface 101 is coated with reflectance coating to reflect incident laser.The normal of described first surface 101 and described incident laser institute shape have angle α, and described α is greater than zero degree and is less than 90 degree, and preferably, described α can be more than or equal to 1 degree and be less than or equal to 10 degree.When maintaining α and being constant, described first catoptron 1 can move along described laser instrument 20 Output of laser axis direction, to change the spacing between the first catoptron 1 and the second catoptron 2.In the present embodiment, the material of described first catoptron 1 is glass, and thickness is 3 millimeters, and described α is 4 degree.
Described second catoptron 2 comprises one parallel in the 3rd surface 201 of first surface 101 towards first surface 101 in described first catoptron 1, and four surface 202 and five surface 203 relative with described 3rd surface 201, described 4th surface 202 and the 5th surface 203 are arranged back to described first surface 101.Described 4th surface 202 can be a plane, curved surface, folding face etc., in the present embodiment, described 4th surface 202 is a plane parallel with described 3rd surface 201, and the distance between described 4th surface 202 and described 3rd surface 201 is the thickness d of described second catoptron 2.Described 5th surface 203 is a plane, is connected with described 4th surface 202, forms one join line on described 5th surface 203 with the junction on described 4th surface 202.Described 4th surface 202 is arranged near the shoot laser of described laser instrument 20, and described 5th surface 203 is arranged away from the shoot laser of described laser instrument 20.Described 5th surface 203 to have angle β with described 3rd surperficial 201 shapes.Described 5th surface 203 away from described Output of laser direction gradually near described 3rd surface 201.Described 5th surface 203 edge and the 4th surface 102 from described boundary line are the width l that on β angular direction, maximum development length is defined as described 5th surface 203
2, described l
210 millimeters can be more than or equal to.In the present embodiment, the width l on described 5th surface 203
2equal 10 millimeters.
The angle that described 3rd surface 201 is formed with described Laser output direction is α, described 3rd surface 201 definition can have a reflector space 201a and near described incident laser away from the regional transmission 201b of described incident laser according to function is different.The surface of described reflector space 201a is coated with reflectance coating, for reflecting the laser reflected from first surface 101, the surface of described regional transmission 201b is coated with anti-reflection film, for the laser that transmission is reflected from described first surface 101, makes described laser enter to inject described 5th surface 203.After being mapped to described first surface 101 from laser instrument 20 import and export, through multiple reflections between first surface 101 and reflector space 201a, incide described 5th surface 203 from described regional transmission 201b.Particularly, the width of described reflector space 201a can be 50 millimeters to 100 millimeters, the width l of described regional transmission 201b
1be defined as described regional transmission 201b along being maximum span on α angle direction with the shoot laser of laser instrument 20.Preferably, the width l of described regional transmission 201b
1be more than or equal to 10 millimeters.In the present embodiment, the width l of described regional transmission 201b
1equal 10 millimeters.
Further, the width l on described 5th surface 203
2with the width l of described regional transmission 201b
1meet following relation:
Wherein, d is the distance in the second catoptron 2 between the 3rd surface 201 and the 4th surface 202, to ensure that the laser inciding feedback unit 30 from laser instrument 20 can incide described 5th surface 203 after multiple reflections, and after the reflecting film reflects on the 5th surface 203, Zai Yanyuan road is reflected back in described laser instrument 20.Preferably, the width l on described 5th surface 203
2be greater than the width l of described regional transmission 201b
1, thus enable the laser reflected from first surface 101 incide described 5th surface 203.
See also Fig. 4 and Fig. 5, after the laser of described laser instrument 20 outgoing incides the first catoptron 1, reflex to the reflector space 201a on the 3rd surface 201 described in described second catoptron 2, and after coming and going n time (feedback order), incide the 5th surface 203 of described second catoptron 2 from the regional transmission 201b on described 3rd surface 201.The refractive index n of described α, β and described second catoptron 2
2meet following relation:
After making to incide the 5th surface 203 of the second catoptron 2 from the laser of described regional transmission 201b incidence, can from original optical path return laser light device 20.
The principle of described displacement measurement system is as follows.Described first catoptron 1 is fixed on object under test one surface.Be appreciated that described first catoptron 1 can omit when namely described object under test surface itself has a plane of reflection.Divided two crossed polarized light o light and the e light of generation by birefringence element 4, when light feedback, light field can be divided into two parts.Reflector space is the inner chamber propagation field of light beam after laser instrument 20 inner chamber comes and goes one week, and regional transmission is the propagation field that light beam comes and goes that in feedback unit 30 n week (i.e. feedback order) Hou Zaiyanyuan road turns back to laser instrument 20 inner chamber.Inner chamber propagation field superposes with the propagation field turning back to inner chamber after feedback unit 30 comes and goes n week and forms self-mixed interference, and under low light level feedback condition, the output intensity of o light and e light can be expressed as:
In formula: I
o0and I
e0the output intensity of two crossed polarized lights when being unglazed feedback, ζ
oand ζ
ethe laser feedback factor, ν
oand ν
ebe the optical frequency of o light and e light, l is that the chamber of feedback unit 30 is long.(1), when formula shows there is light feedback, the output intensity of two crossed polarized lights is all modulated, and waveform is similar to cosine curve.Especially, the fringe density of the feedback fringe formed in display device 13 determines primarily of feedback order n.Wherein, the size of feedback order n can by the geometry of feedback unit 30 by calculating.
When the first catoptron 1 of feedback unit 30 moves right Δ b, then the total light path increment produced comprises two parts:
Reflector space is that the light path caused by the first catoptron 1 displacement increases to 2m × Δ b, and wherein m is the round number of times of incident laser in feedback unit 30 (laser incides the second catoptron from the first catoptron, then returns the first catoptron for once coming and going);
Regional transmission is when to be laser beam move on the surface of the first catoptron 1 and the second catoptron 2, the light path of last light beam in the second catoptron 2 described in feedback unit 30 is caused to change, and when producing additional optical distance-AC(owing to moving right, light path in the second catoptron 2 reduces, so get negative sign);
So when the first catoptron 1 moves right Δ b, total light path increment Delta l of generation is
Δl=2m×Δb-AC。Wherein, additional optical distance AC can obtain as follows:
When the first catoptron 1 moves right Δ b, on second catoptron 2, each reflection light point amount of movement is from the teeth outwards KT=2sin α × Δ b, so feedback light beam is after m secondary reflection, the amount of movement of last luminous point on the second catoptron 2 surface is AB=2msin α × Δ b;
In right-angle triangle ABC (C is right-angled apices), additional optical distance AC=AB × sin β × n
2, so AC=2mn
2sin α sin β × Δ b.
So when the first catoptron 1 moves right Δ b, total light path increment Delta l is
Δl=2m×Δb-2mn
2sinαsinβ×Δb。（2）
The umber of pulse N that total light path increment produces is
The first catoptron 1 can be obtained by formula (2) and (3) to move right the expression formula of Δ b
From (4) formula, the resolution δ (i.e. resolution) of measuring system is
Wherein, α is incident angle, and it is constant, and λ is optical maser wavelength.As can be seen from formula (5), the resolution of measuring system is only relevant with the round number of times m of laser in feedback unit 30, namely the q that counts to the reflected light on the first catoptron 1 surface is relevant, coming and going the count pass of q of number of times m and reflected light is, m=2 × q-1), as long as so calculate the number of reflection light point in feedback unit 30, just can obtain the optical resolution of measuring system exactly, and no longer need other reference instrument to demarcate.The resolution of described displacement measurement system can be less than 10 nanometers, as being less than 8 nanometers, being less than 5 nanometers, being less than 2 nanometers.
As shown in Fig. 6 A and Fig. 6 B, when Fig. 6 B is displacement measurement system of the present invention measurement, first catoptron 1 moves along laser axis, the laser intensity curve that first photodetector 9, second photodetector 10 obtains, for very close high-order frequency multiplication striped, it is tens times of the weak feedback of tradition shown in Fig. 6 A.Refer to Fig. 7 A, Fig. 7 B, Fig. 7 C, give the intensity modulation curve of feedback unit 30 under different feedback order condition.As can be seen from Fig. 7 A, counting when the reflected light in feedback unit 30 is 3, and when namely feedback order is 7, the density of intensity modulation curve is about 7 times of traditional weak feedback; As can be seen from Figure 7B, counting when the reflected light in feedback unit 30 is 11, and when namely feedback order is 21, the density of intensity modulation curve is about 21 times of traditional weak feedback; As can be seen from Fig. 7 C, counting when the reflected light in feedback unit 30 is 17, and when namely feedback order is 33, the density of intensity modulation curve is about 33 times of traditional weak feedback, and now corresponding optical resolution is 9.6nm; And, go back presence bit difference between the feedback fringe that two polarization states are orthogonal.After first photodetector 9, second photodetector 10 detects this feedback fringe, filter amplification circuit 11 pairs of signals are utilized to carry out filter amplifying processing; Then signal processing unit 12, realizes the digital conversion of signal and further shaping, filtering, and processes the edge of the two paths of signals that the first photodetector 9, second photodetector 10 exports and calculate umber of pulse; Meanwhile, according to the direction of motion of the relatively advanced or delayed judgment object in the position of two paths of signals, and direction and umber of pulse are presented in display device 13.
The present invention is based on the displacement measurement system of FP feedback exocoel, utilize the weak feedback effect of laser substance high-order, not only there is high-order frequency-doubled effect, reach nano level displacement measurement resolution; But also electronic fine-grainedly further can reach the Measurement Resolution of Subnano-class and the direction of motion of recognition object; In addition, the method also has the advantage of optical resolution self-calibration, can according to the reflected light of FP feedback chamber mirror count the system that obtains resolution and do not need other reference instrument to demarcate.Described displacement measurement system has that resolution is high, structure is simple, can be traceable to the features such as optical maser wavelength.
In addition, those skilled in the art also can do other change in spirit of the present invention, and these changes done according to the present invention's spirit, all should be included in the present invention's scope required for protection certainly.
Claims (10)
1. a displacement measurement system, mainly comprises:
One laser instrument, in order to export double-frequency laser;
One data acquisition and processing unit, in order to receive the interference laser of laser instrument output and to carry out data processing;
It is characterized in that, comprise a feedback unit further, described feedback unit comprise one first catoptron and the second catoptron relatively and interval arrange, described first catoptron has a first surface directly to receive incident laser, the normal of described first surface and described incident laser shape have angle α, described second catoptron comprises one the 3rd surface and five surface relative with described 3rd surface, described 3rd surface is in the face of described first surface and be arrangeding in parallel with described first surface, described 5th surface is arranged back to described first surface, the double-frequency laser that described 5th surface exports away from described laser instrument arranges and has reflectance coating, and to have angle β with described 3rd surperficial shape, and away from the double-frequency laser direction of described output gradually near described 3rd surface, described 3rd surface comprises one near the reflector space of described incident laser and the regional transmission away from described incident laser, described reflector space is provided with reflectance coating, described regional transmission is provided with anti-reflection film, the laser inciding feedback unit from laser instrument is directly incident on the first catoptron, between the first catoptron and the reflector space of the second catoptron after multiple reflections, described 5th surface is incided from described regional transmission, and return described laser instrument through the 5th surface reflection Hou Zaiyanyuan road.
2. displacement measurement system as claimed in claim 1, is characterized in that, the refractive index n of described α, β and described second catoptron
2meet following relation:
3. displacement measurement system as claimed in claim 1, it is characterized in that, described angle α is more than or equal to 1 degree and is less than or equal to 10 degree.
4. displacement measurement system as claimed in claim 1, is characterized in that, described second catoptron comprises four surface relative and parallel with described 3rd surface further, and described 4th surface is connected with described 5th surface, the width l on described 5th surface
2with the width l of described regional transmission
1meet following relation:
wherein, d is the distance in the second catoptron between the 3rd surface and the 4th surface.
5. displacement measurement system as claimed in claim 1, it is characterized in that, the width of described second catoptron regional transmission is more than or equal to 10 millimeters.
6. displacement measurement system as claimed in claim 1, it is characterized in that, the resolution δ of described displacement measurement system is:
wherein, λ is optical maser wavelength, and m is the round number of times of incident laser in feedback unit.
7. displacement measurement system as claimed in claim 1, it is characterized in that, the displacement b of the first catoptron is obtained by following formula:
wherein, λ is optical maser wavelength, and m is the round number of times of incident laser in feedback unit, the umber of pulse that N light path increment produces.
8. displacement measurement system as claimed in claim 1, it is characterized in that, the optical resolution of described displacement measurement system is less than 8 nanometers.
9. displacement measurement system as claimed in claim 1, it is characterized in that, described laser instrument to comprise in resonant reflec-tors in one first, a gain tube, an anti-reflection window, a birefringence element and one second resonant reflec-tors along the axis coaxial setting successively of Output of laser, described birefringence element is arranged in second between resonant reflec-tors and described anti-reflection window, and resonant reflec-tors and described anti-reflection window interval are arranged in order to produce a point frequency laser respectively and in described second.
10. displacement measurement system as claimed in claim 9, it is characterized in that, described data acquisition and processing unit comprise Amici prism resonant reflec-tors in described first and arrange the laser exported to receive laser instrument, and laser is divided into o light and e light, one first photodetector and the second photodetector and described Amici prism interval arrange receive described o light and e light and be converted to two path signal, one filter amplification circuit is electrically connected to process two path signal with described first photodetector and the second photodetector, one signal processing unit is electrically connected to calculate umber of pulse with described filter amplification circuit.
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| CN104482884B (en) * | 2014-11-20 | 2017-10-03 | 中国工程物理研究院激光聚变研究中心 | Narrow angle measuring device and its measuring method |
| CN106654839A (en) * | 2016-10-13 | 2017-05-10 | 南通大学 | Displacement self-sensing helium-neon laser system |
| CN106767656B (en) * | 2017-02-22 | 2019-02-05 | 西安交通大学 | A kind of high-accuracy calibration device and scaling method of rolling angle measurement system |
| CN108919395A (en) * | 2018-07-11 | 2018-11-30 | 中国科学院电子学研究所 | For increasing the device of light beam light path |
| CN109238153B (en) * | 2018-09-12 | 2024-03-26 | 清华大学深圳研究生院 | Dual-optical-frequency comb thickness measuring optical path structure, system, method, device and storage medium |
| CN114509026B (en) * | 2022-04-19 | 2022-08-19 | 中国科学院西安光学精密机械研究所 | Sub-arc second-level angle measurement system and method and relative deformation angle measurement method |
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