CN107357045B - A kind of multiple-beam synthesis device applied in synthetic aperture imaging equipment - Google Patents
A kind of multiple-beam synthesis device applied in synthetic aperture imaging equipment Download PDFInfo
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- CN107357045B CN107357045B CN201710760488.1A CN201710760488A CN107357045B CN 107357045 B CN107357045 B CN 107357045B CN 201710760488 A CN201710760488 A CN 201710760488A CN 107357045 B CN107357045 B CN 107357045B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
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Abstract
The present invention proposes that a kind of multiple-beam synthesis device applied in synthetic aperture imaging equipment, the device are mainly made of the more terrace with edge rings in inside, the more terrace with edge rings in outside, the small elliptical reflector in inside, the small elliptical reflector in outside, outer reflector adjustment platform, more terrace with edge ring front rods, more terrace with edge ring rear connecting rods, the first attachment screw, the second attachment screw, third attachment screw, the 4th attachment screw and holding screw.The more terrace with edge rings in inside, the more terrace with edge rings in outside, outer reflector adjustment platform, more terrace with edge ring front rods and more terrace with edge ring rear connecting rods invar material processing and fabricating small by thermal expansion coefficient, inside and outside more terrace with edge rings be connected to a fixed by more terrace with edge rings front and backs connecting rod.Present invention reduces the difficulty of optical manufacturing, it is changed into the combination of small reflector and mechanical parts by optics polygonal pyramid, processing and fabricating cost is reduced on the basis of guaranteeing optical accuracy, and substantially reduces the processing and fabricating period, the yield rate of device is also much higher than traditional beam synthesis part.
Description
Technical field
The invention belongs to the technical fields such as optical engineering, Application Optics, and in particular to one kind is applied to synthetic aperture imaging
Multiple-beam synthesis device in equipment.
Background technique
Multiple-beam synthesis device is mainly used in synthetic aperture imaging equipment, by sub-aperture light beam each in optical device it
Between center away from equal proportion compress, with adapt to optics coherence tomography imaging requirement.Due to duty ratio in synthetic aperture imaging equipment
Limitation, the light beam that beam is closed after compression can not be realized using the method that reflecting mirror is pieced together, and can only be added using optics polygonal pyramid
The reflecting mirror realization that periphery is arranged in pairs or groups therewith, the wherein processing and its difficulty of high-precision optical polygonal pyramid, and not can guarantee finished product
Rate, this limits the development of synthetic aperture imaging technology to a certain extent.And method production light beam of the invention is used to close beam
Device is easily achieved, and the process-cycle is short, low in cost, can promote the hair of synthetic aperture imaging technology to a certain extent
Exhibition.
Summary of the invention
For the above multiple-beam synthesis device realize present on problem, propose it is a kind of be easier to realize be applied to synthesis hole
Multiple-beam synthesis device in diameter imaging device, the device can fundamentally solve the above problems.
In order to achieve the object of the present invention, the technical solution adopted by the present invention are as follows: one kind is set applied to synthetic aperture imaging
Multiple-beam synthesis device in standby, it is characterised in that: including the more terrace with edge rings in inside, the more terrace with edge rings in outside, the small elliptical reflecting in inside
Mirror, the small elliptical reflector in outside, outer reflector adjustment platform, more terrace with edge ring front rods, more terrace with edge ring rear connecting rods, first connect
Screw, the second attachment screw, third attachment screw, the 4th attachment screw and holding screw are connect, wherein the small elliptical reflector in inside
It is adhered in the corresponding recesses of the more terrace with edge sides in inside by silica gel, the small elliptical reflector in outside is adhered to outer lateral reflection by silica gel
Mirror adjusts on platform, so as to keep outside small oval anti-by adjusting the holding screw being connected on outer reflector adjustment platform
Mirror surface and the small elliptical reflecting mirror surface keeping parallelism in inside are penetrated, the outer reflector adjustment platform for being stained with the oval small reflector in outside is logical
Cross third attachment screw be connected to outside more terrace with edge sides corresponding position on, between the more terrace with edge rings of the more terrace with edge rings in inside and outside by
More terrace with edge ring front rods and more terrace with edge ring rear connecting rods pass through the first attachment screw, the second attachment screw and the 4th connection respectively
Screw is connected, and so that the more terrace with edge rings in inside is parallel to each other with the more terrace with edge ring corresponding surfaces in outside, central axis is overlapped.
Further, connect before the more terrace with edge rings in the inside, the more terrace with edge rings in outside, outer reflector adjustment platform, more terrace with edge rings
Extension bar and more terrace with edge ring rear connecting rods invar material processing and fabricating small by thermal expansion coefficient.
Further, the small elliptical reflector of the small elliptical reflector in the inside and outside is using thermal expansion coefficient and invar material
Expect close quartz material processing and fabricating.
Further, the lesser silica gel of elasticity modulus is used between the more terrace with edge rings of the small elliptical reflector in the inside and inside
Bonding, bondline thickness are less than 0.5mm.
Further, the small elliptical reflector in outside adjusts platform by the lesser silica gel of elasticity modulus and outer reflector and glues
It connects, bondline thickness is less than 0.5mm.
The invention has the following advantages over the prior art:
1. the material of main part using low-expansion invar mechanical material as multiple-beam synthesis device, greatly reduces
The difficulty of processing of device and process-cycle.And it is existing very big using the synthesizer optical manufacturing difficulty of optics polygonal pyramid,
And it is at high cost；
2. beam contacts region uses the small reflector that is easily guaranteed that of machining accuracy, the depth of parallelism between small reflector can be with
Stepless changing is realized by adjusting platform, can reduce the machining accuracy of the more terrace with edges of invar, is compared existing beam synthesis part, is adopted
Light beam, which is carried out, with the device of the invention closes beam, it is easier to operate；
3. using the bundling device of the invention compared to the existing conjunction Shu Fangfa using optics polygonal pyramid and multimirror collocation
Part can be applied to the smaller imaging device of light beam duty ratio, and application is more extensive.
Detailed description of the invention
Fig. 1 and Fig. 2 is the two dimension proposed by the present invention applied to the multiple-beam synthesis device in synthetic aperture imaging equipment
Structure diagram.
Fig. 2 is the right view of Fig. 1.
Fig. 3 is the three-dimensional structure letter proposed by the present invention applied to the multiple-beam synthesis device in synthetic aperture imaging equipment
Figure.
Fig. 4 is the adjustment signal proposed by the present invention applied to the multiple-beam synthesis device in synthetic aperture imaging equipment
Figure, wherein Fig. 4 (a) is the first step of Method of Adjustment, and Fig. 4 (b) is the second step of Method of Adjustment.
Part description in Fig. 1 and Fig. 2:
1-inside, six terrace with edge ring, 2-outside, six terrace with edge ring,
The small elliptical reflector in 3-insides, the small elliptical reflector in 4-outsides,
5-outer reflectors adjustment platform, 6-six terrace with edge ring front rods,
7-six terrace with edge ring rear connecting rods, 8,9,10,11-the first, second, third, the 4th attachment screw,
12-holding screws.
Specific embodiment
To make the objectives, technical solutions, and advantages of the present invention clearer, below in conjunction with specific embodiment, and reference
Attached drawing, the present invention is described in more detail.
Two-dimensional structure schematic diagram proposed by the present invention applied to the multiple-beam synthesis device in synthetic aperture imaging equipment is such as
Shown in Fig. 1 and Fig. 2, with the illustration of six terrace with edge rings.Fig. 2 is the right view of Fig. 1.It include: inside six terrace with edge rings 1, six rib of outside
Platform ring 2, the small elliptical reflector 3 in inside, the small elliptical reflector 4 in outside, outer reflector adjust platform 5, six terrace with edge ring front rods
6, six terrace with edge ring rear connecting rods 7, the first attachment screw 8, the second attachment screw 9, third attachment screw 10, the 4th attachment screw 11
With the equal parts of holding screw 12；It is wherein be bonded by silica gel between the small elliptical reflector 3 in inside and six terrace with edge ring 1 of inside；Outside is small
It is be bonded by silica gel between elliptical reflector 4 and outer reflector adjustment platform 5；The outside for being bonded with the small elliptical reflector 4 in outside is anti-
It penetrates between mirror adjustment platform 5 and six terrace with edge ring 2 of outside and is connected by third attachment screw 10；It is connected to outer reflector adjustment platform
Holding screw 12 on 5 can be used to adjust the spatial position of the small elliptical reflector 4 in outside, make itself and the small elliptical reflector 3 in inside
Keeping parallelism；By being connected after six terrace with edge ring front rods 6 and six terrace with edge rings between six terrace with edge ring 2 of six terrace with edge ring 1 of inside and outside
Bar 7 is connected to a fixed by the first attachment screw 8, the second attachment screw 9 and the 4th attachment screw 11 respectively.
Specific step is as follows:
Step 1: the structure diagram of multiple-beam synthesis device of the invention is provided according to Fig. 1, Fig. 2 and Fig. 3, by invar material
It is connected before the similar six terrace with edge ring 1 of inside of material machining shape and six terrace with edge ring 2 of outside, outer reflector adjustment platform 5, six terrace with edge rings
The parts such as bar 6 and six terrace with edge ring rear connecting rods 7.Six terrace with edge ring of medial and lateral can be the more terrace with edge rings in medial and lateral, wherein inside and outside
The more terrace with edge rings in side are determined according to the quantity of combined beam light beam, such as combined beam light beam quantity is 6, then the more terrace with edge rings in medial and lateral are six ribs
Platform ring.
Step 2: the structure diagram of multiple-beam synthesis device of the invention is provided according to Fig. 1, Fig. 2 and Fig. 3, by quartzy material
The small elliptical reflector 3 in material processing inside and the small elliptical reflector 4 in outside, and it is successively that inside is small with the lesser silica gel of elasticity modulus
Elliptical reflector 3 is adhered on six terrace with edge rings, 1 corresponding position of inside.With the lesser silica gel of elasticity modulus successively by the small ellipse in outside
Reflecting mirror 4 is adhered on outer reflector adjustment platform 5.
Step 3: the structure diagram of multiple-beam synthesis device of the invention is provided according to Fig. 1, Fig. 2 and Fig. 3, respectively by six
Terrace with edge ring front rod 6, six terrace with edge ring rear connecting rods 7 are connected to the corresponding position of inside six terrace with edge rings 1 and six terrace with edge ring 2 of outside
On, make inside and outside six terrace with edge rings each face keeping parallelism, central axis be overlapped.
Step 4: outer reflector adjustment platform 5 third of the small elliptical reflector 4 in bonding outside in second step is connected spiral shell
Nail 10 is connected on six terrace with edge rings, 2 corresponding position of outside.And holding screw 12 is installed on the corresponding of outer reflector adjustment platform 5
In hole location.
Step 5: providing the adjustment schematic diagram of multiple-beam synthesis device of the invention according to Fig. 4, an autocollimator is selected
Calibration is measured to a standard flat reflecting mirror, a certain distance is reserved between autocollimator and standard flat reflecting mirror, is protected
Card is intermediate can to place multiple-beam synthesis device.The angle for adjusting standard flat reflecting mirror or autocollimator makes the two mutually hang down
Directly, autocollimator reading is shown as zero, and the position of fixed standard plane mirror and autocollimator.
Step 6: providing the structure diagram of multiple-beam synthesis device of the invention according to Fig. 1, Fig. 2, Fig. 4 provides the present invention
Multiple-beam synthesis device adjustment schematic diagram, between standard flat mirror and autocollimator place multiple-beam synthesis device, make
The sub-light beam optical path of multiple-beam synthesis device is overlapped with autocollimator optical path.Adjust the outer reflector tune of multiple-beam synthesis device
Holding screw 12 and third attachment screw 10 on whole 5 make the small elliptical reflector 4 in outside realize the tune of any direction low-angle
It is whole.By adjusting the angle of the small elliptical reflector 4 in outside, and when the reading for observing autocollimator is zero, it is small to stop adjustment outside
The angle of elliptical reflector 4, lock third attachment screw 10, and guarantee third attachment screw 10 lock after autocollimator reading not
Become.
Step 7: rotation multiple-beam synthesis device, is overlapped each way light beam with autocollimator optical path, each way light
The small elliptical reflector 4 in outside on beam is successively adjusted locking according to the method for above-mentioned steps six.
Embodiment described above is only limitted to explain that the present invention, protection scope of the present invention should include the whole of claim
Content, and the full content of the claims in the present invention can be thus achieved by embodiment person skilled in art.
Claims (4)
1. a kind of multiple-beam synthesis device applied in synthetic aperture imaging equipment, it is characterised in that: including the more terrace with edges in inside
Before ring, the more terrace with edge rings in outside, the small elliptical reflector in inside, the small elliptical reflector in outside, outer reflector adjustment platform, more terrace with edge rings
Connecting rod, more terrace with edge ring rear connecting rods, the first attachment screw, the second attachment screw, third attachment screw, the 4th attachment screw and
Holding screw, wherein the small elliptical reflector in inside is invested in the corresponding recesses of inside more terrace with edge rings side by gluing, outside is small ellipse
Circular irror by gluing invest outer reflector adjust platform on, so as to by adjusting be connected to outer reflector adjustment platform
On holding screw, make the small elliptical reflecting mirror surface in outside and the small elliptical reflecting mirror surface keeping parallelism in inside, it is small ellipse to be stained with outside
The outer reflector adjustment platform of circular irror is connected on the more terrace with edge rings side corresponding position of outside by third attachment screw, interior
Pass through first respectively by more terrace with edge ring front rods and more terrace with edge ring rear connecting rods between the more terrace with edge rings of the more terrace with edge rings in side and outside
Attachment screw, the second attachment screw and the 4th attachment screw are connected, and make the more terrace with edge rings in inside and the more terrace with edge ring corresponding surfaces in outside
It is parallel to each other, central axis is overlapped；
Multiple-beam synthesis device in the synthetic aperture imaging equipment, it is characterised in that: the more terrace with edge rings in the inside, outside
More terrace with edge rings, outer reflector adjustment platform, more terrace with edge ring front rods and more terrace with edge ring rear connecting rods are small by thermal expansion coefficient
Invar material processing and fabricating.
2. the multiple-beam synthesis device in synthetic aperture imaging equipment according to claim 1, it is characterised in that: in described
The small elliptical reflector of the small elliptical reflector in side and outside is processed using the close quartz material of thermal expansion coefficient and invar material and is made
Make.
3. the multiple-beam synthesis device in synthetic aperture imaging equipment according to claim 1, it is characterised in that: in described
Nian Jie using the lesser silica gel of elasticity modulus between the small elliptical reflector in side and the more terrace with edge rings in inside, bondline thickness is less than 0.5mm.
4. the multiple-beam synthesis device in synthetic aperture imaging equipment according to claim 1, it is characterised in that: outside is small
Elliptical reflector is Nian Jie with outer reflector adjustment platform by the lesser silica gel of elasticity modulus, and bondline thickness is less than 0.5mm.
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| CN201710760488.1A CN107357045B (en) | 2017-08-30 | 2017-08-30 | A kind of multiple-beam synthesis device applied in synthetic aperture imaging equipment |
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| CN201710760488.1A CN107357045B (en) | 2017-08-30 | 2017-08-30 | A kind of multiple-beam synthesis device applied in synthetic aperture imaging equipment |
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| CN107357045B true CN107357045B (en) | 2019-07-19 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107953040B (en) * | 2017-12-28 | 2020-03-31 | 中国科学院宁波材料技术与工程研究所 | High-precision laser processing device and system |
| US10892604B2 (en) | 2017-12-29 | 2021-01-12 | Nanjing Casela Technologies Corporation Limited | Fiber optic photon engine |
| CN109739026B (en) * | 2019-03-22 | 2023-11-21 | 中国人民解放军国防科技大学 | Multi-beam combiner |
| TWI803882B (en) * | 2021-06-08 | 2023-06-01 | 揚明光學股份有限公司 | Illumination system |
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| CN102213833A (en) * | 2011-06-23 | 2011-10-12 | 中国人民解放军国防科学技术大学 | Cassegrain type light beam synthesizer with high duty ratio |
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| US9294672B2 (en) * | 2014-06-20 | 2016-03-22 | Qualcomm Incorporated | Multi-camera system using folded optics free from parallax and tilt artifacts |
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| CN102073147A (en) * | 2010-12-23 | 2011-05-25 | 中国科学院西安光学精密机械研究所 | Multi-telescope optical synthetic aperture imaging system and design method thereof |
| CN102213833A (en) * | 2011-06-23 | 2011-10-12 | 中国人民解放军国防科学技术大学 | Cassegrain type light beam synthesizer with high duty ratio |
| CN102608764A (en) * | 2012-03-31 | 2012-07-25 | 中国科学院光电技术研究所 | Multi-beam-hole splicing and synthesizing system based on stable control of light beam directing |
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