CN107344985A - 共聚物和含其的树脂组合物、封装膜及封装结构 - Google Patents
共聚物和含其的树脂组合物、封装膜及封装结构 Download PDFInfo
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- CN107344985A CN107344985A CN201610912808.6A CN201610912808A CN107344985A CN 107344985 A CN107344985 A CN 107344985A CN 201610912808 A CN201610912808 A CN 201610912808A CN 107344985 A CN107344985 A CN 107344985A
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- Prior art keywords
- copolymer
- methyl
- resin
- formula
- phenyl
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- 229920001577 copolymer Polymers 0.000 title claims abstract description 47
- 239000011342 resin composition Substances 0.000 title abstract 2
- 238000004806 packaging method and process Methods 0.000 title description 2
- 229920006280 packaging film Polymers 0.000 title 1
- 239000012785 packaging film Substances 0.000 title 1
- -1 polysiloxane Polymers 0.000 claims abstract description 82
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 30
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 24
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 20
- 125000003118 aryl group Chemical group 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 239000001257 hydrogen Substances 0.000 claims abstract description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 6
- 125000005160 aryl oxy alkyl group Chemical group 0.000 claims abstract description 6
- 239000011347 resin Substances 0.000 claims description 99
- 229920005989 resin Polymers 0.000 claims description 98
- 239000007789 gas Substances 0.000 claims description 25
- 230000004888 barrier function Effects 0.000 claims description 22
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 13
- 239000003822 epoxy resin Substances 0.000 claims description 13
- 229920000647 polyepoxide Polymers 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 7
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 7
- 239000004695 Polyether sulfone Substances 0.000 claims description 6
- 239000004642 Polyimide Substances 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 6
- 229920000515 polycarbonate Polymers 0.000 claims description 6
- 229920006393 polyether sulfone Polymers 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 claims description 6
- 239000004425 Makrolon Substances 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 238000006467 substitution reaction Methods 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 claims description 3
- 125000001118 alkylidene group Chemical group 0.000 claims description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 3
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 3
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims description 2
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 2
- OSFBJERFMQCEQY-UHFFFAOYSA-N propylidene Chemical group [CH]CC OSFBJERFMQCEQY-UHFFFAOYSA-N 0.000 claims description 2
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 claims 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 150000004702 methyl esters Chemical class 0.000 claims 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 claims 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 claims 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 abstract description 2
- 238000005538 encapsulation Methods 0.000 abstract 2
- 125000006274 (C1-C3)alkoxy group Chemical group 0.000 abstract 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 30
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 19
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 15
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 13
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 12
- 239000002243 precursor Substances 0.000 description 11
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 9
- 239000000017 hydrogel Substances 0.000 description 9
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 9
- 239000012299 nitrogen atmosphere Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 238000010792 warming Methods 0.000 description 9
- 239000003643 water by type Substances 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 7
- YOIZTLBZAMFVPK-UHFFFAOYSA-N 2-(3-ethoxy-4-hydroxyphenyl)-2-hydroxyacetic acid Chemical compound CCOC1=CC(C(O)C(O)=O)=CC=C1O YOIZTLBZAMFVPK-UHFFFAOYSA-N 0.000 description 7
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical compound COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 238000004383 yellowing Methods 0.000 description 7
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 6
- 239000004926 polymethyl methacrylate Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 5
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 5
- 229920002799 BoPET Polymers 0.000 description 5
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 5
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 5
- 150000002460 imidazoles Chemical class 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 150000003573 thiols Chemical class 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical class CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- OFZRSOGEOFHZKS-UHFFFAOYSA-N (2,3,4,5,6-pentabromophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=C(Br)C(Br)=C(Br)C(Br)=C1Br OFZRSOGEOFHZKS-UHFFFAOYSA-N 0.000 description 2
- BKKVYNMMVYEBGR-UHFFFAOYSA-N (2,3,4,5,6-pentabromophenyl) prop-2-enoate Chemical compound BrC1=C(Br)C(Br)=C(OC(=O)C=C)C(Br)=C1Br BKKVYNMMVYEBGR-UHFFFAOYSA-N 0.000 description 2
- NIJWSVFNELSKMF-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenyl) 2-methylprop-2-enoate Chemical class CC(=C)C(=O)OC1=C(F)C(F)=C(F)C(F)=C1F NIJWSVFNELSKMF-UHFFFAOYSA-N 0.000 description 2
- RFOWDPMCXHVGET-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenyl) prop-2-enoate Chemical compound FC1=C(F)C(F)=C(OC(=O)C=C)C(F)=C1F RFOWDPMCXHVGET-UHFFFAOYSA-N 0.000 description 2
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical class CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Substances ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000004494 ethyl ester group Chemical group 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- ZNAOFAIBVOMLPV-UHFFFAOYSA-N hexadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCOC(=O)C(C)=C ZNAOFAIBVOMLPV-UHFFFAOYSA-N 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 2
- 229920001921 poly-methyl-phenyl-siloxane Polymers 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- NVAZFWGSXWKRIF-UHFFFAOYSA-N triethoxysilyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)OC(=O)C(C)=C NVAZFWGSXWKRIF-UHFFFAOYSA-N 0.000 description 2
- UWLMVZZJRDGMNO-UHFFFAOYSA-N triethoxysilyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)OC(=O)C=C UWLMVZZJRDGMNO-UHFFFAOYSA-N 0.000 description 2
- UZIAQVMNAXPCJQ-UHFFFAOYSA-N triethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C(C)=C UZIAQVMNAXPCJQ-UHFFFAOYSA-N 0.000 description 2
- WDUXKFKVDQRWJN-UHFFFAOYSA-N triethoxysilylmethyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C=C WDUXKFKVDQRWJN-UHFFFAOYSA-N 0.000 description 2
- HLOLETUOZGAKMT-UHFFFAOYSA-N trimethoxysilyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)OC(=O)C(C)=C HLOLETUOZGAKMT-UHFFFAOYSA-N 0.000 description 2
- HBZPRQCNASJKHW-UHFFFAOYSA-N trimethoxysilyl prop-2-enoate Chemical compound CO[Si](OC)(OC)OC(=O)C=C HBZPRQCNASJKHW-UHFFFAOYSA-N 0.000 description 2
- UOKUUKOEIMCYAI-UHFFFAOYSA-N trimethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C(C)=C UOKUUKOEIMCYAI-UHFFFAOYSA-N 0.000 description 2
- JPPHEZSCZWYTOP-UHFFFAOYSA-N trimethoxysilylmethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C=C JPPHEZSCZWYTOP-UHFFFAOYSA-N 0.000 description 2
- HAYWJKBZHDIUPU-UHFFFAOYSA-N (2,4,6-tribromophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=C(Br)C=C(Br)C=C1Br HAYWJKBZHDIUPU-UHFFFAOYSA-N 0.000 description 1
- CNLVUQQHXLTOTC-UHFFFAOYSA-N (2,4,6-tribromophenyl) prop-2-enoate Chemical compound BrC1=CC(Br)=C(OC(=O)C=C)C(Br)=C1 CNLVUQQHXLTOTC-UHFFFAOYSA-N 0.000 description 1
- SIADNYSYTSORRE-UHFFFAOYSA-N (4-chlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(Cl)C=C1 SIADNYSYTSORRE-UHFFFAOYSA-N 0.000 description 1
- XSQUPVXOENTCJV-UHFFFAOYSA-N (6-phenylpyridin-3-yl)boronic acid Chemical compound N1=CC(B(O)O)=CC=C1C1=CC=CC=C1 XSQUPVXOENTCJV-UHFFFAOYSA-N 0.000 description 1
- LMAUULKNZLEMGN-UHFFFAOYSA-N 1-ethyl-3,5-dimethylbenzene Chemical compound CCC1=CC(C)=CC(C)=C1 LMAUULKNZLEMGN-UHFFFAOYSA-N 0.000 description 1
- PAKHBAOIRCNENW-UHFFFAOYSA-N 2,5-dimethylhex-2-enoic acid 2-methylpropyl 2-methylprop-2-enoate Chemical compound C(C(C)C)C=C(C(=O)O)C.C(C(=C)C)(=O)OCC(C)C PAKHBAOIRCNENW-UHFFFAOYSA-N 0.000 description 1
- WFTWWOCWRSUGAW-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl 2-methylprop-2-enoate Chemical compound CCOCCOCCOC(=O)C(C)=C WFTWWOCWRSUGAW-UHFFFAOYSA-N 0.000 description 1
- FTALTLPZDVFJSS-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl prop-2-enoate Chemical compound CCOCCOCCOC(=O)C=C FTALTLPZDVFJSS-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical class OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 description 1
- WNXTZVMMNCCZTP-UHFFFAOYSA-N 2-hydroxyethyl 2-methylprop-2-enoate 5-hydroxy-2-methylpent-2-enoic acid Chemical compound OCCC=C(C(=O)O)C.C(C(=C)C)(=O)OCCO WNXTZVMMNCCZTP-UHFFFAOYSA-N 0.000 description 1
- IPGXHRDWHJEWBI-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate;4-hydroxy-2-methylidenebutanoic acid Chemical compound OCCOC(=O)C=C.OCCC(=C)C(O)=O IPGXHRDWHJEWBI-UHFFFAOYSA-N 0.000 description 1
- VNTAKTZORVLQIC-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate 5-methoxy-2-methylpent-2-enoic acid Chemical compound COCCC=C(C(=O)O)C.C(C(=C)C)(=O)OCCOC VNTAKTZORVLQIC-UHFFFAOYSA-N 0.000 description 1
- LNGIIXGLYTUUHJ-UHFFFAOYSA-N 2-methylbut-2-enoic acid methyl 2-methylprop-2-enoate Chemical compound COC(=O)C(C)=C.CC=C(C)C(O)=O LNGIIXGLYTUUHJ-UHFFFAOYSA-N 0.000 description 1
- IHVJOKCMIVOONZ-UHFFFAOYSA-N 2-methylidenedodecanoic acid prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCCCCCCCC(=C)C(O)=O IHVJOKCMIVOONZ-UHFFFAOYSA-N 0.000 description 1
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 description 1
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- 125000001931 aliphatic group Chemical group 0.000 description 1
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- KKEYFWRCBNTPAC-UHFFFAOYSA-N benzene-dicarboxylic acid Natural products OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 1
- AVXYPAZKABBYHD-UHFFFAOYSA-N benzhydryl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1C(OC(=O)C(=C)C)C1=CC=CC=C1 AVXYPAZKABBYHD-UHFFFAOYSA-N 0.000 description 1
- IJVHTTITHMXYTG-UHFFFAOYSA-N benzhydryl prop-2-enoate Chemical compound C=1C=CC=CC=1C(OC(=O)C=C)C1=CC=CC=C1 IJVHTTITHMXYTG-UHFFFAOYSA-N 0.000 description 1
- XUCHXOAWJMEFLF-UHFFFAOYSA-N bisphenol F diglycidyl ether Chemical compound C1OC1COC(C=C1)=CC=C1CC(C=C1)=CC=C1OCC1CO1 XUCHXOAWJMEFLF-UHFFFAOYSA-N 0.000 description 1
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- 230000007547 defect Effects 0.000 description 1
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- ZZUXGPFNNBRUEG-UHFFFAOYSA-N dodecane prop-2-enoic acid Chemical compound CCCCCCCCCCCC.C(C=C)(=O)O ZZUXGPFNNBRUEG-UHFFFAOYSA-N 0.000 description 1
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- PZDUWXKXFAIFOR-UHFFFAOYSA-N hexadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCOC(=O)C=C PZDUWXKXFAIFOR-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- NOKUWSXLHXMAOM-UHFFFAOYSA-N hydroxy(phenyl)silicon Chemical compound O[Si]C1=CC=CC=C1 NOKUWSXLHXMAOM-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- IQSHMXAZFHORGY-UHFFFAOYSA-N methyl prop-2-enoate;2-methylprop-2-enoic acid Chemical compound COC(=O)C=C.CC(=C)C(O)=O IQSHMXAZFHORGY-UHFFFAOYSA-N 0.000 description 1
- JDQYWEMHMOYPTM-UHFFFAOYSA-N methylsilyl prop-2-enoate Chemical group C[SiH2]OC(=O)C=C JDQYWEMHMOYPTM-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000009490 roller compaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical group CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 230000036301 sexual development Effects 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
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- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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- C08L2203/00—Applications
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Abstract
本公开内容提供共聚物和含其的树脂组合物、封装膜及封装结构。所述共聚物包括以下40至80摩尔%的式(I)所示的重复单元、5至25摩尔%的式(II)所示的重复单元以及5至30摩尔%的式(III)所示的重复单元,其中R1为C6~C13芳基、C7~C13芳烷基、C6~C8卤代芳基或C7~C8芳氧烷基;R3为C3~C16烷基或C3~C6的烷氧基取代的烷基;R5为单键或C1~C3亚烷基,R6及R7分别独立地为C1~C3烷氧基,R8为具有甲基及苯基的聚硅氧烷;R2、R4及R9分别独立地为氢或甲基。
Description
技术领域
本公开内容涉及一种丙烯酸共聚物和含其的树脂组合物、封装膜及封装结构(结构体)。
背景技术
近年来,有机发光二极管(Organic Light-Emitting Diode,OLED)组件往大尺寸、薄型化及可挠性发展,但有机发光二极管组件是一种多结晶的半导体装置,容易受到水气或氧气影响,进而造成组件受损失效,因此有机发光二极管组件需要进行外部密封,以阻绝外界气体。
常见的封装方式是玻璃胶(Frit glass)工艺和围堰填胶(Dam&Filling)工艺。玻璃胶工艺具有阻水氧能力,但不适合于大尺寸、薄型化及可挠性的组件;围堰填胶工艺除了具有阻水气能力外,还具有高的封装机械强度,但是工艺较复杂,不适用于大尺寸或卷对卷工艺。
因此,开发一种新颖的封装材料,可运用于大尺寸、薄型化及可挠性的有机发光二极管组件封装,是目前亟待解决的问题。
发明内容
本公开内容的一实施方式提供一种共聚物,其包括以下40至80摩尔%的式(I)所示的重复单元、5至25摩尔%的式(II)所示的重复单元以及5至30摩尔%的式(III)所示的重复单元:
其中R1为C6~C13芳基、C7~C13芳烷基、C6~C8卤代芳基或C7~C8芳氧烷基;R3为C3~C16烷基或C3~C6的烷氧基取代的烷基;R5为单键或C1~C3亚烷基,R6及R7分别独立地为C1~C3烷氧基,R8为具有甲基及苯基的聚硅氧烷;R2、R4及R9分别独立地为氢或甲基。
本公开内容的一实施方式还提供一种树脂组合物,其包括:如前所述的共聚物;以及环氧树脂,其中该环氧树脂与该共聚物的重量比为0.01至1。
本公开内容的一实施方式再提供一种封装膜,其包括:软性(柔性)基板;离型(脱模)层,其设置于该软性基板上;阻气层,其设置于该离型层上;以及树脂层,其包括如前所述的树脂组合物,其设置于该阻气层上。
本公开内容的一实施方式再提供一种封装结构,其包括:基板;半导体组件,其设置于该基板上;树脂层,其包括如前述的树脂组合物,其覆盖于该半导体组件上;以及阻气层,其设置于该树脂层上。
为让本发明的上述目的、特征及优点能更明显易懂,下文特举优选实施方式,并配合所附的图式,作详细说明如下。
附图说明
图1为本公开内容一实施方式的封装膜的示意图。
图2为本公开内容一实施方式的封装结构的示意图。
具体实施方式
本公开内容提供一种共聚物,其通过如下形成:由第一(甲基)丙烯酸酯、第二(甲基)丙烯酸酯及第三(甲基)丙烯酸酯或由第一(甲基)丙烯酸酯、第二(甲基)丙烯酸酯、第三(甲基)丙烯酸酯及第四(甲基)丙烯酸酯先进行自由基聚合反应(free radicalpolymerization)形成树脂前体,该树脂前体(前驱物)再与硅氧烷低聚物(寡聚物)进行缩合聚合反应(condensation polymerization),从而形成本公开内容的该共聚物。第一(甲基)丙烯酸酯包括芳基、芳烷基、卤代芳基或芳氧烷基,以提升共聚物的耐热性及兼容性(相容性);第二(甲基)丙烯酸酯包括长碳链的烷基或烷氧基取代的烷基,以提升共聚物的可挠性及转印特性;第三(甲基)丙烯酸酯为(甲基)丙烯酰氧基硅烷,可通过硅烷基将硅氧烷低聚物接枝于该树脂前体,达到改善共聚物的耐热性及抗黄变特性;第四(甲基)丙烯酸酯可举例为丙烯酸(acrylic acid)、甲基丙烯酸(methacrylic acid)、丙烯酸甲酯(methylacrylate)、甲基丙烯酸甲酯(methyl methacrylate)、甲基丙烯酸羟乙酯(hydroxyethylmethacrylate)、丙烯酸羟乙酯(hydroxyethyl acrylate)、甲基丙烯酸羟丙酯(hydroxypropyl methacrylate)、丙烯酸羟丙酯(hydroxypropyl acrylate)、或其组合,可进一步提升与基板的附着性。
在一实施方式中,第一(甲基)丙烯酸酯可举例为丙烯酸苄酯(benzyl acrylate)、甲基丙烯酸苄酯(benzyl methacrylate)、丙烯酸二苯甲酯(benzhydryl acrylate)、甲基丙烯酸二苯甲酯(benzhydryl methacrylate)、丙烯酸对氯苯酯(4-chlorophenylacrylate)、甲基丙烯酸对氯苯酯(4-chlorophenyl methacrylate)、丙烯酸五溴苯酯(pentabromophenylacrylate)、甲基丙烯酸五溴苯酯(pentabromophenylmethacrylate)、丙烯酸五氟苯酯(pentafluorophenylacrylate)、甲基丙烯酸五氟苯酯(pentafluorophenylmethacrylate)、丙烯酸2-苯氧基乙酯(2-phenoxyethyl acrylate)、甲基丙烯酸2-苯氧基乙酯(2-phenoxyethyl methacrylate)、丙烯酸苯酯(phenylacrylate)、甲基丙烯酸苯酯(phenyl methacrylate)、丙烯酸2-苯基乙酯(2-phenylethylacrylate)、甲基丙烯酸2-苯基乙酯(2-phenylethyl methacrylate)、丙烯酸2,4,6-三溴苯酯(2,4,6-tribromophenyl acrylate)、甲基丙烯酸2,4,6-三溴苯酯(2,4,6-tribromophenyl methacrylate)、或其组合,但不限于此。
在一实施方式中,第二(甲基)丙烯酸酯可举例为丙烯酸叔戊酯(tert-amylacrylate)、甲基丙烯酸叔戊酯(tert-amyl methacrylate)、丙烯酸2-正丁氧基乙酯(2-n-butoxyethyl acrylate)、甲基丙烯酸2-正丁氧基乙酯(2-n-butoxyethyl methacrylate)、丙烯酸异丁酯(iso-butyl acrylate)、甲基丙烯酸异丁酯(iso-butyl methacrylate)、丙烯酸叔丁酯(tert-butyl acrylate)、甲基丙烯酸叔丁酯(tert-butyl methacrylate)、丙烯酸正丁酯(n-butyl acrylate)、甲基丙烯酸正丁酯(n-butyl methacrylate)、丙烯酸仲丁酯(sec-butyl acrylate)、甲基丙烯酸仲丁酯(sec-butyl methacrylate)、丙烯酸异癸酯(iso-decyl acrylate)、甲基丙烯酸异癸酯(iso-decyl methacrylate)、丙烯酸正癸酯(n-decyl acrylate)、甲基丙烯酸正癸酯(n-decyl methacrylate)、丙烯酸正十二烷基酯(n-dodecyl acrylate)、甲基丙烯酸正十二烷基酯(n-dodecyl methacrylate)、丙烯酸-2-(2-乙氧基乙氧基)乙酯(2-(2-ethoxyethoxy)ethyl acrylate)、甲基丙烯酸-2-(2-乙氧基乙氧基)乙酯(2-(2-ethoxyethoxy)ethyl methacrylate)、丙烯酸异辛酯(2-ethylhexylacrylate)、甲基丙烯酸异辛酯(2-ethylhexyl methacrylate)、丙烯酸十六烷基酯(1-hexadecyl acrylate)、甲基丙烯酸十六烷基酯(1-hexadecyl methacrylate)、丙烯酸正己酯(n-hexyl acrylate)、甲基丙烯酸正己酯(n-hexyl methacrylate)、丙烯酸甲氧基乙酯(2-methoxyethyl acrylate)、甲基丙烯酸甲氧基乙酯(2-methoxyethyl methacrylate)、丙烯酸正辛酯(n-octyl acrylate)、甲基丙烯酸正辛酯(n-octyl methacrylate)、丙烯酸正丙酯(n-propyl acrylate)、甲基丙烯酸正丙酯(n-propyl methacrylate)、或其组合,但不限于此。
在一实施方式中,第三(甲基)丙烯酸酯可举例为甲基丙烯酰氧基三甲氧基硅烷(methacryloxytrimethoxysilane)、丙烯酰氧基三甲氧基硅烷(acryloxytrimethoxysilane)、甲基丙烯酰氧基三乙氧基硅烷(methacryloxytriethoxysilane)、丙烯酰氧基三乙氧基硅烷(acryloxytriethoxysilane)、甲基丙烯酰氧基甲基三甲氧基硅烷(methacryloxymethyltrimethoxysilane)、丙烯酰氧基甲基三甲氧基硅烷(acryloxymethyltrimethoxysilane)、甲基丙烯酰氧基甲基三乙氧基硅烷(methacryloxymethyltriethoxysilane)、丙烯酰氧基甲基三乙氧基硅烷(acryloxymethyltriethoxysilane)、3-甲基丙烯酰氧基丙基甲基二甲氧基硅烷(3-(dimethoxymethylsilyl)propyl methacrylate)、3-丙烯酰氧基丙基甲基二甲氧基硅烷(3-(dimethoxymethylsilyl)propyl acrylate)、3-(丙烯酰氧基)丙基三甲氧基硅烷(3-(trimethoxysilyl)propyl acrylate)、3-(甲基丙烯酰氧基)丙基三甲氧基硅烷(3-(trimethoxysilyl)propyl methacrylate)、3-甲基丙烯酰氧基丙基甲基二乙氧基硅烷(3-(diethoxymethylsilyl)propyl methacrylate)、3-丙烯酰氧基丙基甲基二乙氧基硅烷(3-(diethoxymethylsilyl)propyl acrylate)、3-甲基丙烯酰氧基丙基三乙氧基硅烷(3-(triethoxysilyl)propyl methacrylate)、3-丙烯酰氧基丙基三乙氧基硅烷(3-(triethoxysilyl)propyl acrylate)、或其组合,但不限于此。
在一实施方式中,硅氧烷低聚物可举例为道康宁804、道康宁805、道康宁806、道康宁840、道康宁409或道康宁431(购于Dow Corning公司),但不限于此,其中该硅氧烷低聚物的分子量为500至20000,该聚硅氧烷可具有甲基及苯基且苯基与甲基的摩尔比为0.5至3。当硅氧烷低聚物的分子量大于20000时,整体的反应性会不佳,当硅氧烷低聚物的分子量小于500时,共聚物的耐热特性会有所影响。苯基与甲基摩尔比会影响共聚物的耐黄变和耐热特性,同时也会影响硅氧烷低聚物与丙烯酸酯的兼容性。
(甲基)丙烯酸树脂本身具有高透射及高粘着的特性,但并不耐高温,而硅树脂本身具有耐高温的特性,因此,本公开内容将(甲基)丙烯酸树脂及硅树脂接枝形成该共聚物,可具有抗黄变、耐高温、附着力强及可挠曲的特性。在一实施方式中,该聚合物可作为热转印的封装材料,但不限于此运用。
本公开内容提供一种共聚物,其包括以下40至80摩尔%的式(I)所示的重复单元、5至25摩尔%的式(II)所示的重复单元以及5至30摩尔%的式(III)所示的重复单元:
其中,R1为C6~C13芳基(aryl group)、C7~C13芳烷基(aralkyl group)、C6~C8卤代芳基(halogenated aryl group)或C7~C8芳氧烷基(aryloxyalkyl group);R3为C3~C16烷基(alkyl group)或C3~C6的烷氧基取代的烷基(alkoxy substituted alkylgroup);R5为单键或C1~C3亚烷基(alkylene group),R6及R7分别独立地为C1~C3烷氧基(alkoxy group),R8为具有甲基及苯基的聚硅氧烷(polysiloxane);R2、R4及R9分别独立地为氢或甲基。
在一实施方式中,式(I)所示的重复单元、式(II)所示的重复单元以及式(III)所示的重复单元以无规方式或嵌段方式重复。
在一实施方式中,R1为苄基(benzyl)、苯基(phenyl)、苯乙基(phenylethyl)、4-氯苯基(4-chlorophenyl)、五溴苯基(pentabromophenyl)、五氟苯基(pentafluorophenyl)、2,4,6-三溴苯基(2,4,6-tribromophenyl)、二苯甲基(benzhydryl)或苯氧基乙基(phenoxyethyl),但不限于此。
在一实施方式中,R3为叔戊基(tert-amyl)、正丁氧基乙基(n-butoxyethyl)、叔丁基(tert-butyl)、正丁基(n-butyl)、异丁基(iso-butyl)、仲丁基(sec-butyl)、异癸基(iso-decyl)、正癸基(n-decyl)、正十二烷基(n-dodecyl)、乙氧基乙氧基乙基(2-(2-Ethoxyethoxy)ethyl)、异辛基(ethylhexyl)、十六烷基(hexadecyl)、正己基(n-hexyl)、甲氧基乙基(methoxyethyl)、正辛基(n-octyl)或正丙基(n-propyl),但不限于此。
在一实施方式中,R5为单键或亚丙基(propylene),R6及R7分别独立地为甲氧基(methoxy)或乙氧基(ethoxy),但不限于此。
在一实施方式中,该聚硅氧烷的重复单元包括 的至少一种,使得该聚硅氧烷同时含有甲基及苯基,其中Me为甲基(methyl),Ph为苯基(phenyl)。例如,该聚硅氧烷的重复单元可包括且可任选地进一步包括 中的一种或多种。再例如,该聚硅氧烷的重复单元可包括和中的任一种或两种以及中的任一种或两种。在一实施方式中,该聚硅氧烷具有7至700个重复单元,重均分子量为500至20000,该聚硅氧烷可具有甲基及苯基且该聚硅氧烷的苯基与甲基的摩尔比小于或等于3,例如为0.5至2.5。
在一实施方式中,R8为聚甲基苯基硅氧烷(polymethylphenylsiloxane)、聚二甲基-甲基苯基硅氧烷(polydimethylmethylphenylsiloxane)、聚二苯基-甲基苯基硅氧烷(polydiphenylmethylphenylsiloxane)或聚二甲基-二苯基硅氧烷(polydimethyldiphenylsiloxane),但不限于此。
在另一实施方式中,该共聚物还包括式(IV)所示的重复单元:
其中,R10为氢、甲基、羟乙基(hydroxyethyl)或羟丙基(hydroxypropyl);R11为氢或甲基。
在一实施方式中,式(I)所示的重复单元、式(II)所示的重复单元、式(III)所示的重复单元及式(IV)所示的重复单元以无规方式或嵌段方式重复,其中该共聚物包括30至50摩尔%的式(I)所示的重复单元、5至25摩尔%的式(II)所示的重复单元、5至30摩尔%的式(III)所示的重复单元及10至30摩尔%的式(IV)所示的重复单元。
在一些实施方式中,本公开内容的共聚物例如可应用于树脂组合物、封装膜及封装结构,但并非限于此。
本公开内容提供一种树脂组合物,其包括如前所述的共聚物以及环氧树脂,其中该环氧树脂与该共聚物的重量比可为0.01至1,例如0.01至0.2。在一实施方式中,该环氧树脂占该树脂组合物的含量为5至10重量%,其中该环氧树脂可举例为Epon 825、Epon 826、Epon 827、Epon 828、Epon 830、Epon 834、Epon 862或Epon 863(购于Momentive公司),但不限于此,其中该环氧树脂的重均分子量为150至300,粘度为3至300cps。该环氧树脂可以增加该树脂组合物的耐化学性,并提升成膜的交联密度。若环氧树脂的重均分子量大于300时,会影响交联的反应性。
在一实施方式中,该树脂组合物还包括有机溶剂,其占该树脂组合物的含量为40至80重量%,其中该有机溶剂可举例为丙二醇单甲基醚乙酸酯(Propylene glycolmonomethyl ether acetate,PGMEA)、乙酰丙酮(acetylacetone)、丙酮(acetone)、环己酮(cyclohexanone)、乙酸乙酯(ethyl acetate)或四氢呋喃(tetrahydrofuran),但不限于此。
在一实施方式中,该树脂组合物还包括加速剂,其占该树脂组合物的含量为0.05至5重量%,其中该加速剂可举例为咪唑(imidazole)、脂肪族胺(aliphatic amine)、聚胺(polyamine)、聚醚胺(polyetheramine)或哌嗪(piperazine),但不限于此。
图1为本公开内容一实施方式的封装膜100的示意图,该封装膜100包括软性基板110、离型层120、阻气层130以及树脂层140,其中该离型层120设置于软性基板110上,该阻气层130设置于该离型层120上,该树脂层140包括前述的树脂组合物,设置于该阻气层130上。
在一实施方式中,该软性基板110的厚度为10μm至200μm,可举例为聚对苯二甲酸乙二醇酯(polyethylene terephthalate,PET)、聚甲基丙烯酸甲酯(polymethylmethacrylate,PMMA)、聚醚砜(polyethersulfone)、聚碳酸酯(polycarbonate)或聚酰亚胺(polyimide),但不限于此;该离型层120的厚度为10nm至200nm,可举例为氧化钨或有机硅材料,该有机硅材料可举例为KF96、KS-702或KF96SP(购自崇越电通公司),但不限于此;该阻气层130的厚度为10nm至200nm,该阻气层130为能够有效阻水阻气的无机薄膜,可举例为氧化硅、氮化硅或其组合,但不限于此;该树脂层140的厚度为5μm至600μm,例如20μm至200μm。由于该树脂层140具有本公开内容的共聚物,因此即使在较高厚度的条件下也能具有耐热性、抗黄变性、附着性及可挠性。
在一实施方式中,该离型层120及该阻气层130可采用蒸镀或溅镀的方式依序形成于该软性基板110上,接着再利用刮刀、旋转涂布等方式将树脂层140形成于该阻气层130上,再以烘箱或数字控温器加热至80~120℃的温度进行干燥,形成干膜,可进一步以卷材形式收集。本公开内容的封装膜制法不限于此。
在一实施方式中,该离型层120与该阻气层130之间具有65至6000nN/20mm的附着力(采用180度剥离测试测得,剥离速度为0.3m/min至100m/min)。当离型层随着软性基板被掀离时,利用树脂层本身的附着性可以让阻气层有效固定于树脂层上。
本公开内容的封装膜运用于大尺寸、薄型化及可挠性的有机发光二极管组件的封装时,可以直接采用热滚压法,将封装膜的树脂层覆盖于有机发光二极管组件上。在一实施方式中,可经由机械热压机控制压力、温度、速度和热压时间等参数,完成转印的封装工艺,例如压力为2Kg/cm2、温度为100至120℃、速度0.5m/min。由于树脂层本身具有受热熔融的特性,因此即使有机发光二极管组件表面存在有缺陷微粒,也可以将有机发光二极管组件及缺陷微粒完全覆盖,形成一平坦层,待温度降至室温后,接着,通过增加树脂层的附着性及离型层的作用,可以直接将软性基板及离型层掀离,让树脂层以及阻气层保留于有机发光二极管组件上,形成一封装结构,并且达到大面积阻水阻气的效果。
图2为本公开内容一实施方式的封装结构200的示意图,该封装结构200包括基板210、半导体组件220、树脂层140以及阻气层130,其中该半导体组件220设置于该基板210上,该树脂层140包括前述的树脂组合物,覆盖于该半导体组件220上,该阻气层130设置于该树脂层140上。
在一实施方式中,该基板210可举例为聚对苯二甲酸乙二醇酯(polyethyleneterephthalate,PET)、聚甲基丙烯酸甲酯(polymethylmethacrylate,PMMA)、聚醚砜(polyethersulfone)、聚碳酸酯(polycarbonate)或聚酰亚胺(polyimide),但不限于此;该半导体组件220可举例为有机发光二极管组件、发光二极管或触控面板,但不限于此;该阻气层130为能够有效阻水阻气的无机薄膜,可举例为氧化硅、氮化硅或其组合,但不限于此。
本公开内容的共聚物是利用至少三种(甲基)丙烯酸酯单体共聚而形成的,通过特定的取代基以及通过硅烷基接枝硅氧烷低聚物,使本公开内容的共聚物同时具有耐热性、抗黄变、附着性及可挠性,可作为大面积热转印的封装材料。
应注意的是,上述实施方式仅为举例说明之用,本公开内容的共聚物、树脂组合物、封装膜及封装结构并不限以上述方法或化合物所制得。
实施例1 共聚物1
于氮气气氛下取13克的甲基丙烯酸(methacrylic acid,MAA)、33克的甲基丙烯酸甲酯(methyl methacrylate,MMA)、70克的甲基丙烯酸苄酯(benzyl methacrylate,BZMA)、35克的甲基丙烯酸异辛酯(2-ethylhexyl methacrylate,EHMA)、16克的3-(甲基丙烯酰氧基)丙基三甲氧基硅烷(3-(trimethoxysilyl)propyl methacrylate)、0.8克的硫醇(Thiol)及0.8克的偶氮二异丁腈(Azobisisobutyronitrile,AIBN)溶于180克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至90℃后反应4小时,得到树脂前体。利用热重分析仪(Perkin-Elmer TGA-7)测得平均固含量为49.6%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为46340,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为14250cps。
接着,于氮气气氛下取120.2克的前述树脂前体及18.8克的硅氧烷低聚物(道康宁840,购于Dow Corning公司,由1H-NMR测得苯基与甲基的摩尔比为2.07)溶于300克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至50℃至60℃后反应4小时,得到共聚物1。利用热重分析仪(Perkin-ElmerTGA-7)测得平均固含量为25.5%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为54850,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为3100cps。
实施例2 共聚物2
于氮气气氛下取13克的甲基丙烯酸(methacrylic acid,MAA)、33克的甲基丙烯酸甲酯(methyl methacrylate,MMA)、70克的甲基丙烯酸苄酯(benzyl methacrylate,BZMA)、35克的甲基丙烯酸异辛酯(2-ethylhexyl methacrylate,EHMA)、16克的3-(甲基丙烯酰氧基)丙基三甲氧基硅烷(3-(trimethoxysilyl)propyl methacrylate)、0.8克的硫醇(Thiol)及0.8克的偶氮二异丁腈(Azobisisobutyronitrile,AIBN)溶于180克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至90℃后反应4小时,得到树脂前体。利用热重分析仪(Perkin-Elmer TGA-7)测得平均固含量为49.6%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为46340,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为14250cps。
接着,于氮气气氛下取108.2克的前述树脂前体及33.8克的硅氧烷低聚物(道康宁804,购于Dow Corning公司,由1H-NMR测得苯基与甲基的摩尔比为0.64)溶于300克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至50℃至60℃后反应4小时,得到共聚物2。利用热重分析仪(Perkin-ElmerTGA-7)测得平均固含量为25.1%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为55350,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为2950cps。
实施例3 树脂层1
将100克的共聚物1、6.5克环氧树脂单体(Epon 828,购自Shell chemical公司)及0.13克的咪唑(imidazole)及20克的丙二醇单甲基醚乙酸酯(Propylene glycolmonomethyl ether acetate,PGMEA)溶剂混合形成树脂组合物。
接着,将树脂组合物以旋转涂布方式涂布于10厘米×10厘米大小的PET膜上,厚度为40μm,并在90℃下烘烤2分钟,形成树脂层1。
实施例4 树脂层2
将100克的共聚物2、6.5克环氧树脂单体(Epon 828,购自Shell chemical公司)及0.13克的咪唑(imidazole)及20克的丙二醇单甲基醚乙酸酯(Propylene glycolmonomethyl ether acetate,PGMEA)溶剂混合形成树脂组合物。
接着,将树脂组合物以旋转涂布方式涂布于10厘米×10厘米大小的PET膜上,厚度为40μm,并在90℃下烘烤2分钟,形成树脂层2。
比较例1 树脂层3
于氮气气氛下取25克的甲基丙烯酸(methacrylic acid,MAA)、75克的甲基丙烯酸甲酯(methyl methacrylate,MMA)、14克的甲基丙烯酸苄酯(benzyl methacrylate,BZMA)、16克的甲基丙烯酸羟乙酯(hydroxyethyl methacrylate,2-HEMA)、1克的硫醇(Thiol)及1克的偶氮二异丁腈(Azobisisobutyronitrile,AIBN)溶于300克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至90℃后反应4小时,得到丙烯酸树脂。利用热重分析仪(Perkin-Elmer TGA-7)测得平均固含量为39.6%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为34500,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为4850cps。
接着,取300克的上述丙烯酸树脂、50克的丙烯酸酯单体(乙氧基化二季戊四醇六丙烯酸酯,Ethoxylated Dipentaerythritol Hexaacrylate,产品:A-DPH-12E,购自KOWA公司)、0.3克的光引发剂(1-[4-(苯硫基)苯基]-1,2-辛二酮-2-(邻-苯甲酰基)肟,1,2-octanedione,1-[4-(phenylthio)phenyl]-,2-(o-benzoyl oxime))及300克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂混合形成树脂组合物。
接着将树脂组合物以旋转涂布方式涂布于10厘米×10厘米大小的PET膜上,厚度为40μm,并在90℃下烘烤2分钟,形成树脂层3。
比较例2 树脂层4
于氮气气氛下取22克的甲基丙烯酸(methacrylic acid,MAA)、36克的甲基丙烯酸甲酯(methyl methacrylate,MMA)、72克的甲基丙烯酸苄酯(benzyl methacrylate,BZMA)、16克的甲基丙烯酸羟乙酯(hydroxyethyl methacrylate,2-HEMA)、16克的3-(甲基丙烯酰氧基)丙基三甲氧基硅烷(3-(trimethoxysilyl)propyl methacrylate)、0.4克的硫醇(Thiol)及0.4克的偶氮二异丁腈(Azobisisobutyronitrile,AIBN)溶于220克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至90℃后反应4小时,得到树脂前体。利用热重分析仪(Perkin-Elmer TGA-7)测得平均固含量为40.2%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为24800,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为6200cps。
接着,于氮气气氛下取108.2克的前述树脂前体及33.8克的硅氧烷低聚物(道康宁840,购于Dow Corning公司,由1H-NMR测得苯基与甲基的摩尔比为2.07)溶于300克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至50℃至60℃后反应4小时,得到共聚物3。利用热重分析仪(Perkin-ElmerTGA-7)测得平均固含量为25.5%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为58500,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为2950cps。
将100克的共聚物3、6.5克环氧树脂单体(Epon 828,购自Shell chemical公司)及0.13克的咪唑(imidazole)及20克的丙二醇单甲基醚乙酸酯(Propylene glycolmonomethyl ether acetate,PGMEA)溶剂混合形成树脂组合物。
接着,将树脂组合物以旋转涂布方式涂布于10厘米×10厘米大小的PET膜上,厚度为40μm,并在90℃下烘烤2分钟,形成树脂层4。
比较例3 树脂层5
于氮气气氛下取30克的甲基丙烯酸羟乙酯(hydroxyethyl methacrylate,2-HEMA)、45克的甲基丙烯酸异辛酯(2-ethylhexyl methacrylate,EHMA)、45克的甲基丙烯酸叔丁酯(tert-butyl methacrylate,TBMA)、16克的3-(甲基丙烯酰氧基)丙基三甲氧基硅烷(3-(trimethoxysilyl)propyl methacrylate)、0.8克的硫醇(Thiol)及0.8克的偶氮二异丁腈(Azobisisobutyronitrile,AIBN)溶于350克的丙二醇单甲基醚乙酸酯(Propyleneglycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至90℃后反应4小时,得到树脂前体。利用热重分析仪(Perkin-Elmer TGA-7)测得平均固含量为40.5%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为25500,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为6250cps。
接着,于氮气气氛下取108.2克的前述树脂前体及33.8克的硅氧烷低聚物(道康宁840,购于Dow Corning公司,由1H-NMR测得苯基与甲基的摩尔比为2.07)溶于300克的丙二醇单甲基醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)溶剂中,并以磁石搅拌,升温至50℃至60℃后反应4小时,得到共聚物4。利用热重分析仪(Perkin-ElmerTGA-7)测得平均固含量为26.0%,利用凝胶渗透层析仪(GPC,WATERS Model 600)测得重均分子量为61500,利用粘度仪(BROOKFIELD)在25℃下测得平均粘度为2950cps。
将100克的共聚物4、6.5克环氧树脂单体(Epon 828,购自Shell chemical公司)及0.13克的咪唑(imidazole)及20克的丙二醇单甲基醚乙酸酯(Propylene glycolmonomethyl ether acetate,PGMEA)溶剂混合形成树脂组合物。
接着,将树脂组合物以旋转涂布方式涂布于10厘米×10厘米大小的PET膜上,厚度为40μm,并在90℃下烘烤2分钟,形成树脂层5。
测试例
分别将前述的树脂层1、树脂层2、树脂层3、树脂层4、和树脂层5利用热转印工艺形成于玻璃基板上,进行可挠性测试、附着性测试及耐热性测试,测试结果如下表1。附着性测试采用百格测试(Cross-Cut Tester)方法;耐热性测试以240℃烘烤1小时测量黄变值(b*)。由表1可知,未加入聚硅氧烷共聚的树脂层3具有差的可挠性、附着性及抗黄变特性,未加入式(II)所示的重复单元共聚的树脂层4具有较差的可挠性,未加入式(I)所示的重复单元共聚的树脂层5具有较差的抗黄变效果。相较于树脂层3、树脂层4及树脂层5,采用本公开内容的共聚物的树脂层1及树脂层2具有较好的可挠性、附着性及抗黄变特性。
表1
黄变值(b*) | 附着性 | 可挠性 | |
树脂层1 | 1.61 | 5B | 优 |
树脂层2 | 1.05 | 5B | 优 |
树脂层3 | 5.76 | 2B | 差 |
树脂层4 | 1.25 | 4B | 差 |
树脂层5 | 2.66 | 5B | 优 |
虽然本发明已以数个优选实施方式公开如上,然而其并非用以限定本发明,本领域技术人员在不脱离本发明的精神和范围的情况下可作任意的更动与润饰,因此本发明的保护范围当以所附权利要求所界定的为准。
符号说明
封装膜~100;
软性基板~110;
离型层~120;
阻气层~130;
树脂层~140;
封装结构~200;
基板~210;以及
半导体组件~220。
Claims (24)
1.一种共聚物,其包括以下40至80摩尔%的式(I)所示的重复单元、5至25摩尔%的式(II)所示的重复单元以及5至30摩尔%的式(III)所示的重复单元:
其中,
R1为C6~C13芳基、C7~C13芳烷基、C6~C8卤代芳基或C7~C8芳氧烷基;
R3为C3~C16烷基或C3~C6的烷氧基取代的烷基;
R5为单键或C1~C3亚烷基,R6及R7分别独立地为C1~C3烷氧基,R8为具有甲基及苯基的聚硅氧烷;且
R2、R4及R9分别独立地为氢或甲基。
2.如权利要求1所述的共聚物,进一步包括式(IV)所示的重复单元:
其中,
R10为氢、甲基、羟乙基或羟丙基;且R11为氢或甲基。
3.如权利要求2所述的共聚物,其中该共聚物包括30至50摩尔%的式(I)所示的重复单元、5至25摩尔%的式(II)所示的重复单元、5至30摩尔%的式(III)所示的重复单元及10至30摩尔%的式(IV)所示的重复单元。
4.如权利要求1所述的共聚物,其中R1为苄基、苯基、苯乙基、4-氯苯基、五溴苯基、五氟苯基、2,4,6-三溴苯基、二苯甲基或苯氧基乙基。
5.如权利要求1所述的共聚物,其中R3为叔戊基、正丁氧基乙基、叔丁基、正丁基、异丁基、仲丁基、异癸基、正癸基、正十二烷基、乙氧基乙氧基乙基、异辛基、十六烷基、正己基、甲氧基乙基、正辛基或正丙基。
6.如权利要求1所述的共聚物,其中R5为单键或亚丙基,R6及R7分别独立地为甲氧基或乙氧基。
7.如权利要求1所述的共聚物,其中该聚硅氧烷的重复单元包括的至少一种,使得该聚硅氧烷同时含有甲基及苯基,其中Me为甲基,Ph为苯基。
8.如权利要求7所述的共聚物,其中该聚硅氧烷的苯基与甲基的摩尔比小于或等于3。
9.如权利要求7所述的共聚物,其中该聚硅氧烷的重均分子量为500至20000。
10.一种树脂组合物,包括:
如权利要求1-9中任一项所述的共聚物;
以及环氧树脂,其中该环氧树脂与该共聚物的重量比为0.01至1。
11.如权利要求10所述的树脂组合物,其还包括有机溶剂,该有机溶剂占该树脂组合物的含量为40至80重量%。
12.如权利要求10所述的树脂组合物,其还包括加速剂,该加速剂占该树脂组合物的含量为0.05至5重量%。
13.如权利要求10所述的树脂组合物,其中该环氧树脂占该树脂组合物的含量为5至10重量%。
14.如权利要求10所述的树脂组合物,其中该环氧树脂的重均分子量为150至300,其粘度为3至300cps。
15.一种封装膜,包括:
软性基板;
离型层,其设置于该软性基板上;
阻气层,其设置于该离型层上;以及
树脂层,其包括如权利要求10-14任一项所述的树脂组合物,且设置于该阻气层上。
16.如权利要求15所述的封装膜,其中该离型层与该阻气层之间具有65至6000nN/20mm的附着力。
17.如权利要求15所述的封装膜,其中该离型层包括氧化钨或有机硅材料。
18.如权利要求15所述的封装膜,其中该阻气层包括氧化硅、氮化硅或其组合。
19.如权利要求15所述的封装膜,其中该软性基板包括聚对苯二甲酸乙二醇酯、聚甲基丙烯酸甲酯、聚醚砜、聚碳酸酯或聚酰亚胺。
20.如权利要求15所述的封装膜,其中该软性基板的厚度为2μm至200μm,该离型层的厚度为2nm至200nm,该阻气层的厚度为2nm至200nm,该树脂层的厚度为5μm至600μm。
21.一种封装结构,包括:
基板;
半导体组件,其设置于该基板上;
树脂层,其包括如权利要求10-14任一项所述的树脂组合物,其覆盖于该半导体组件上;以及
阻气层,其设置于该树脂层上。
22.如权利要求21所述的封装结构,其中该基板包括聚对苯二甲酸乙二醇酯、聚甲基丙烯酸甲酯、聚醚砜、聚碳酸酯或聚酰亚胺。
23.如权利要求21所述的封装结构,其中该阻气层包括氧化硅、氮化硅或其组合。
24.如权利要求21所述的封装结构,其中该树脂层的厚度为5μm至600μm,该阻气层的厚度为2nm至200nm。
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